CN107632462A - A kind of shower nozzle, the system and method for control drop diffusion - Google Patents
A kind of shower nozzle, the system and method for control drop diffusion Download PDFInfo
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- CN107632462A CN107632462A CN201711064554.8A CN201711064554A CN107632462A CN 107632462 A CN107632462 A CN 107632462A CN 201711064554 A CN201711064554 A CN 201711064554A CN 107632462 A CN107632462 A CN 107632462A
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- base palte
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Abstract
The present invention discloses a kind of shower nozzle, the system and method for control drop diffusion, including at least one feed nozzle supplied gas towards array base palte direction and at least one return-air nozzle away from array base palte direction air-breathing, wherein described feed nozzle is arranged on above the target area of array base palte, the return-air nozzle is arranged on above the non-target area of array base palte target area periphery, feed nozzle and the return-air nozzle cooperates applies circulating current to the array base palte below shower nozzle, and the drop that array base palte surface is arranged on control spreads.The present invention promotes the diffusion of alignment liquid by the guiding function of air-flow, so as to solve the problems, such as that alignment liquid diffusion is uneven, diffusion velocity is slow；And the technology of the present invention is the bilateral system of flexibility and changeability, is applicable to the array base palte of each size, has volume production feasibility.
Description
Technical field
The present invention relates to field of liquid crystal display, more particularly, to a kind of shower nozzle, the system of control drop diffusion and side
Method.
Background technology
At present in LCD industries into box alignment liquid technique, alignment liquid is coated with two kinds of technology modes of ink-jet and coating, and two
Kind mode has their own characteristics each.
Ink-jetting process is to carry out drop according to designed program using the nozzle on shower nozzle to drip, and forms pattern, drips
Alignment liquid drop by therein tension force to surrounding spread.The defects of due to drop diffusion way, it is easily caused array base
Plate periphery and the diffusion of corner alignment liquid less than, formed during actual volume production the alignment liquid black Mura and periphery Huang Mura in periphery it
The periphery Mura phenomenons of class.During bad generation, typically batch generation, more than 20% is may be up to when serious, is had a strong impact on
Can shipment ratio.
The content of the invention
At least one in order to solve the above-mentioned technical problem,
One embodiment of the present of invention provides a kind of shower nozzle, it is characterised in that including at least one towards array base palte side
To the feed nozzle and at least one return-air nozzle away from array base palte direction air-breathing supplied gas, wherein the feed nozzle
It is arranged on above the target area of array base palte, the return-air nozzle is arranged on the non-target area of array base palte target area periphery
Top, feed nozzle and the return-air nozzle cooperates applies circulating current to the array base palte below shower nozzle, with control
System is arranged on the drop diffusion on array base palte surface.
By the shower nozzle of the embodiment, feed nozzle is arranged on above viewing area, supplies gas drive viewing area surface downwards
Drop preferably spread, return-air nozzle is arranged on above non-display area, upward air-breathing suppresses the drop on non-display area surface
Diffusion.This is helpful to the situation for being not intended to drop occur in the non-display area of array base palte.Two mutual cooperation
Nozzle applies circulating current to the array base palte located at lower section, and circulating current guides the drop expansion to be formed on array base palte surface
Dissipate, improve uniformity of the drop in array base palte diffusion into the surface, so as to solve after being coated on the drop solidification on array base palte surface
The even caused Mura phenomenons of non-uniform film thickness of formation.
Further, feed nozzle and return-air nozzle can move on shower nozzle along the direction parallel to array base palte surface,
So that each feed nozzle alignment is arranged on the drop on the target area, each return-air nozzle alignment nontarget area.
By the preferred embodiment, each nozzle independently can be moved up in the side parallel to array base palte surface with
The drop alignment of lower section, so that it is guaranteed that the air-flow that nozzle applies can be preferably applied on the drop of lower section, is applicable to each chi
Very little array base palte, so that diffusion is evenly, diffuser efficiency is improved, there is volume production feasibility.
Further, drop is alignment liquid drop.
By the preferred embodiment, eliminate in LCD into the Mura phenomenons in box alignment liquid technique.
An alternative embodiment of the invention provides a kind of system for controlling drop diffusion, including：
Shower nozzle as described above；
Terminal control mechanism, it is feed nozzle or return-air nozzle for setting each nozzle on the shower nozzle, makes to supply gas
Nozzle and return-air nozzle cooperate applies circulating current to the array base palte below shower nozzle.
By the diffusion system of the embodiment, feed nozzle is arranged on above viewing area, supplies gas drive viewing area downwards
The drop on surface is preferably spread, and return-air nozzle is arranged on above non-display area, and upward air-breathing suppresses non-display area surface
The diffusion of drop.This is helpful to the situation for being not intended to drop occur in the non-display area of array base palte.Terminal control fills
The nozzle for putting two mutual cooperations of control applies circulating current to the array base palte located at lower section, and circulating current guides to be formed in battle array
The drop diffusion of row substrate surface, improves uniformity of the drop in array base palte diffusion into the surface, so as to solve to be coated on array base
The non-uniform film thickness that is formed is even after the drop solidification of plate surface, diffusion velocity caused Mura phenomenons slowly.
Further, terminal control mechanism also includes：
Flow speed controller, for controlling the flow velocity of circulating current；And/or
Vertical movement device, for controlling nozzle to the distance of array base palte；And/or
Horizontal shift device, for controlling nozzle to be moved along the direction parallel to array base palte surface；And/or
Deflector, for controlling nozzle to be deflected perpendicular to the direction on array base palte surface as axle.
By the preferred embodiment, the flow velocity or nozzle of terminal control mechanism control circulating current come to the distance of substrate
The diffusion velocity of orientation drop is controlled, improves diffuser efficiency.
Further, the drop is alignment liquid drop.
By the preferred embodiment, eliminate in LCD into the Mura phenomenons in box alignment liquid technique.
An alternative embodiment of the invention provides a kind of method for controlling drop diffusion, including：
At least one nozzle above the target area of array base palte is arranged to feed nozzle by S1, terminal control mechanism；
S2, terminal control mechanism set at least one nozzle above the non-target area of array base palte target area periphery
For return-air nozzle；
S3, terminal control mechanism control feed nozzle and return-air nozzle cooperate to the array base palte below shower nozzle
Apply circulating current, the drop that array base palte surface is arranged on control spreads；
Wherein feed nozzle is used to supply gas towards the array base palte direction, and return-air nozzle is used for away from the array base
Plate direction air-breathing.
By the method for diffusion of the embodiment, feed nozzle is arranged on above viewing area by terminal control mechanism, is sent downwards
Gas drives the drop on viewing area surface preferably to spread, and return-air nozzle is arranged on above non-display area, and upward air-breathing suppresses non-
The diffusion of the drop on viewing area surface.This is helpful to the situation for being not intended to drop occur in the non-display area of array base palte
's.The nozzle of two mutual cooperations of control applies circulating current to the array base palte located at lower section, and circulating current guides to be formed
The drop diffusion on array base palte surface, improves uniformity of the drop in array base palte diffusion into the surface, so as to solve to be coated on array
The even caused Mura phenomenons of non-uniform film thickness formed after the drop solidification of substrate surface.
Further, this method further comprises：The flow velocity of circulating current is controlled to change the diffusion velocity of drop.
By the preferred embodiment, change the diffusion velocity of drop by changing the flow velocity of circulating current, improve diffusion
Efficiency.
Further, this method further comprises：Nozzle is controlled to the distance of array base palte to change the expansion of orientation drop
Dissipate speed.
By the preferred embodiment, by changing nozzle to the distance of substrate, to change the diffusion velocity of orientation drop, carry
High diffusivity efficiency.
Further, drop is alignment liquid drop.
By the preferred embodiment, eliminate in LCD into the Mura phenomenons in box alignment liquid technique.
Brief description of the drawings
The embodiment of the present invention is described in further detail below in conjunction with the accompanying drawings；
Fig. 1 is the alignment liquid diffuseness values management-control method schematic diagram according to prior art；
Fig. 2A and Fig. 2 B are the shadow shield method for opening and closing schematic diagram according to prior art；
Fig. 3 is the nozzle and nozzle structure schematic diagram according to one embodiment of the present of invention；
Fig. 4 is the working state schematic representation according to one embodiment of the present of invention；
Fig. 5 is the system schematic according to one embodiment of the present of invention；
Fig. 6 is the method schematic diagram according to one embodiment of the present of invention.
Embodiment
In order to illustrate more clearly of the present invention, the present invention is done further with reference to preferred embodiments and drawings
It is bright.Similar part is indicated with identical reference in accompanying drawing.It will be appreciated by those skilled in the art that institute is specific below
The content of description is illustrative and be not restrictive, and should not be limited the scope of the invention with this.
Solve the problems, such as that the mode that alignment liquid spreads uneven generation Mura phenomenons mainly there are two kinds at present, first, management and control orientation
Liquid diffusion edge position EM values (as shown in Figure 1)；Second, to being opened during the orientation drop precuring of coating in precuring equipment
Work chamber's closure, makes chamber be in communication with the outside, and promotes alignment liquid diffusion (as shown in Figure 2).Both modes have necessarily
Limitation, and in the volume production of reality, while can not also determine using both modes to reach preferable effect, periphery
The bad management and control of Mura has larger uncertainty.Meanwhile alignment liquid diffusion velocity is slow in above two mode, production effect is influenceed
Rate.
As shown in figure 1, the management and control of EM values is mainly the position for controlling orientation drop 10 to be dropped in the edge of viewing area 12, and then control
Orientation drop 10 processed is freely spread to the position of non-display area 14.The alignment liquid distance for being diffused into non-display area 14 in Fig. 1 is aobvious
The distance for showing the edge of area 12 is EM values.Due to the characteristic of drop diffusion, the surely decision orientation drop that also differs is determined even if EM
10 diffusion edge position.In actual volume production, under the conditions of identical EM value management and control, with a batch of array base palte periphery
The bad incidences of Mura also have larger difference.
For the second way, as shown in Figure 2 A and 2B, during orientation 10 precuring of drop being coated with precuring equipment,
The closure 22 of work chamber 20 is changed to Fig. 2 B open mode by Fig. 2A closed mode, chamber is in communication with the outside.
In Fig. 2A, the precuring of orientation drop 10 is with (100-140 DEG C) progress of certain temperature in chamber 20.In fig. 2b, chamber
Room is in communication with the outside, and promotes the circulation of chamber interior air-flow to a certain extent, promotes orientation drop 10 towards the exporter of chamber 20
To diffusion.However, this can reduce the temperature in chamber, the energy consumption of lifting means；Meanwhile after the closure 22 of chamber is opened, match somebody with somebody
It can be evaporated into drop in environment, pollute atmospheric environment and equipment, while can also produce certain penetrating odor, human body is good for
Health has harm.
An embodiment provides it is a kind of control drop diffusion device, in example as shown in Figure 3 with
Shower nozzle illustrates.
Next, illustrate the shower nozzle of the embodiment of the present invention with reference to Fig. 3 and Fig. 4.
As shown in figure 3, shower nozzle 30 includes multiple nozzles, wherein, the feed nozzle supplied gas towards the direction of array base palte 1
300 (being illustrated in figure 3 with square hollow, illustrated in Fig. 4 with hollow triangle) and away from array base palte direction air-breathing
Return-air nozzle 305 (being illustrated in figure 3 with solid squares, illustrated in Fig. 4 with black triangle).
As shown in figure 4, the nozzle above the viewing area 12 of array base palte 1 is arranged to feed nozzle 300；In array base
The nozzle of the top of non-display area 14 of the periphery of plate viewing area 12 is arranged to return-air nozzle 305.
The surface of viewing area 12 of array base palte is coated with orientation drop 10, the feed nozzle 300 during work above viewing area
Array base palte downwards is supplied gas, and orientation drop 10 spreads rapidly under wind-force effect guiding to surrounding.It is non-aobvious in array base palte
Show the 305 upward air-breathing of return-air nozzle of the top of area 14, i.e., face away from the array base palte direction pumping, suppression from array base palte table
The orientation drop 10 that system has diffused into the edge of viewing area 12 continues to spread to non-display area 14.
The direction of one feed nozzle 300 towards array base palte 1 is supplied gas and (supplied gas downwards in figure), a return-air nozzle
305 deviate from the direction air-breathing (being upward air-breathing in figure) of array base palte 1, circulating current are formed, such as the institute of curve arrow 16 in Fig. 4
Show.
Feed nozzle 1 works independently with return-air nozzle 2, does not interfere with each other.This guiding function of air-flow, it can avoid droplets from certainly
By the uncertainty spread, the control of diffusion zone is realized.
The essence of the present invention is at least two nozzles, and one is that feed nozzle one is return-air nozzle.In multiple nozzles
In the case of, multiple nozzles can be grouped, but to be at least still that feed nozzle one is return-air including one in every group
Nozzle.
Based on this, those skilled in the art can understand, according to the teachings of the present invention, shower nozzle 30 can include at least one set
Nozzle, at least two nozzles at least one set of nozzle cooperate applies circulating air to the array base palte below shower nozzle
Flow so as to be coated on the drop diffusion on array base palte surface.
By the shower nozzle of the embodiment, the nozzle of two mutual cooperations applies circulating air to the array base palte located at lower section
Stream, circulating current guide the drop diffusion to be formed on array base palte surface, improve drop in the uniform of array base palte diffusion into the surface
Property, so as to solve to be coated on the even caused Mura phenomenons of non-uniform film thickness formed after the drop solidification on array base palte surface.
In the technique that LCD implements alignment liquid, the drop is orientation drop, at this time, it may be necessary to drip the region of drop
For target area, it is desirable to which it is non-target area to suppress region existing for drop.The target area is viewing area, and non-target area is non-display
Area.
Although above-described embodiment is that the present invention will be described with orientation drop, but those skilled in the art can be bright
, the scheme of the present embodiment can be used in LCD techniques controlling in the scheme of drop diffusion.
In a preferred exemplary, as shown in figure 3, nozzle can be on shower nozzle 30 along the side parallel to the surface of array base palte 1
Xz planar movements into i.e. figure, so that each feed nozzle 300 is directed at the alignment liquid being coated on viewing area 12 at work
Drop 10.
Specifically, the certain area coverage below each pair Jet control, in order to improve the diffuser efficiency of orientation drop, will spray
Mouth is designed to move freely on direction (i.e. xz planes) that can be parallel with substrate surface on shower nozzle.
The selection of nozzle is according to nearby principle, and control is moved with the closest nozzle of orientation drop, as shown in figure 4, really
Protecting in the regional extent controlled positioned at each feed nozzle 300 of the top of viewing area 12 has orientation drop 10, and is directed at orientation
Supplied gas in the direction vertical with array base palte surface of drop 10；Ensure simultaneously positioned at the top of non-display area 14, with feed nozzle
300 coordinate return-air nozzles 305 be aligned non-display areas 14 relevant position carry out return-air, make alignment liquid diffusion evenly with it is fast
Speed.
How those skilled in the art realizes and moves freely if being readily apparent that, such as often row's nozzle may be mounted at a guide rail
On, nozzle, which is controlled, to be moved a certain distance along guide rail to be directed at the alignment liquid of lower section.
Preferably, each nozzle can be independently flexibly using the y-axis in Fig. 3 as axial wobble certain angle, court under default situations
To for straight down, when needing alignment liquid to be spread to some direction, controllable corresponding nozzle adjustment air outlet angle makes alignment liquid
Spread rapidly to assigned direction, realize the controllability of diffusion zone.
In another embodiment of the present invention, there is provided a kind of method for controlling drop diffusion, utilize at least one set of nozzle
Circulating current is applied to the array base palte below nozzle so as to be coated on the drop diffusion on array base palte surface.
In following example, with reference to Fig. 4 and Fig. 6, still illustrated with orientation drop.
S1, the nozzle above the viewing area 12 of array base palte 1 is arranged to feed nozzle 300 at work.
Wherein feed nozzle is illustrated with hollow triangle in Fig. 4, for being supplied gas (in Fig. 4 towards array base palte direction
Supply gas downwards).
S2, terminal control mechanism are by least one spray above the non-display area 14 of the periphery of 1 viewing area of array base palte 12
Mouth is arranged to return-air nozzle 305 at work.
Wherein return-air nozzle is illustrated with black triangle in Fig. 4, for away from array base palte direction air-breathing (
It is upward air-breathing in Fig. 4).
S3, terminal control mechanism 5 control feed nozzle and return-air nozzle to cooperate to the array base below shower nozzle
Plate applies circulating current, and the drop that array base palte surface is arranged on control spreads.
After some orientation drop 10 are coated with the viewing area 12 of array base palte 1, array base palte 1 is put into the chamber of sealing
In, the nozzle movement on control chamber top carries out contraposition setting, it is ensured that treats the nozzle of work all in the size range of array base palte 1
It is interior, and two nozzles in each pair nozzle is respectively at viewing area 12 and non-display area 14.Nozzle operation is controlled, setting is located at
The nozzle of the top of 1 viewing area of array base palte 12 is feed nozzle 300, is supplied gas downwards, promotes lower section alignment liquid 10 to spread, sets position
Nozzle above the non-display area 14 of array base palte 1 is return-air nozzle 305, upward air-breathing, suppresses the alignment liquid 10 of viewing area 12
It is diffused into non-display area 14.
In a preferred embodiment, during nozzle release cycle air-flow is controlled, the flow velocity of circulating current 16 is increased
The diffusion velocity of orientation drop can be accelerated.Nozzle can also be reduced to the distance (Fig. 3 y-axis direction) of array base palte, make to match somebody with somebody
To the wind-force increase suffered by liquid, to accelerate the diffusion velocity of orientation drop, diffuser efficiency is improved.
Another embodiment of the present invention provides a kind of system 5 for controlling drop diffusion, as shown in fig. 6, shower nozzle 30, the spray
First 30 include at least one feed nozzle 300 supplied gas towards the direction of array base palte 1 and at least one deviate from the array base palte
The return-air nozzle 305 of direction air-breathing, wherein the feed nozzle 300 is arranged on the target area 12 of array base palte 1 at work
Top, the return-air nozzle 305 are arranged on the top of non-target area 14 of the periphery of 1 target area of array base palte 12, institute at work
State feed nozzle 300 and return-air nozzle 305 cooperates and applies such as Fig. 4 songs to the array base palte 1 below shower nozzle 30 to arrow
Circulating current shown in first 16, the drop that the surface of array base palte 1 is arranged on control spread；
Nozzle structure and working condition in the present embodiment can be found in above-described embodiment with reference to shown in Fig. 3 and Fig. 4, herein
Repeat no more.
System 5 also includes terminal control mechanism 20, is feed nozzle 300 for setting each nozzle on the shower nozzle 30
Or return-air nozzle 305, feed nozzle 300 and return-air nozzle 305 is cooperated and is applied to the array base palte 1 below shower nozzle 30
Add the circulating current as shown in Fig. 4 songs to arrow 16..
In a specific example, during work, terminal control mechanism 20 is by the spray above the viewing area 12 of array base palte
Mouth is arranged to feed nozzle 300, and the nozzle above the non-display area 14 of array base palte non-display area is arranged into return-air spray
Mouth 305, wherein feed nozzle 300 are supplied gas towards the direction of array base palte 1, and return-air nozzle 305 is with away from the side on the surface of array base palte 1
To air-breathing.
As shown in fig. 6, terminal control mechanism 20 is according to the positioning unit 3000 installed on each nozzle and the array of lower section
Substrate 1 is positioned, and nozzle is controlled in the side parallel with lower section array base palte surface by horizontal shift device 210 described below
Moved on to (the xz planes i.e. shown in Fig. 3), be moved to nozzle according to the size of array base palte and shown with lower section array base palte
Area 12 or the correspondence position of non-display area 14, then switch the working condition of nozzle according to the position of each nozzle, battle array will be located at
The nozzle of the top of viewing area 12 of row substrate is arranged to feed nozzle 300, and alignment liquid 10 downwards is supplied gas, and promotes matching somebody with somebody for lower section
Spread to liquid 10；Nozzle above the non-display area 14 of the non-display area of array base palte 1 is arranged to return-air nozzle 305, from
The 14 upward air-breathing of non-display area of lower section, the alignment liquid 10 for suppressing lower section viewing area 12 diffuse into non-display area 14.
Instantly during the model switching of square array substrate, terminal control mechanism 20 also switches the work shape of corresponding nozzle therewith
State, so that each pair nozzle operation state meets the airflow requirement of new model array base palte diverse location.The set can so be ensured
System can apply to the array base palte of each size, have volume production feasibility.
Preferably, terminal control mechanism 20 also includes：
Flow speed controller 200, for controlling the flow velocity of circulating current；And/or
Vertical movement device 205, for controlling nozzle to the distance of array base palte；And/or
Horizontal shift device 210, for controlling nozzle to be moved along the direction parallel to array base palte surface；And/or
Deflector 215, for controlling nozzle to be deflected perpendicular to the direction on array base palte surface as axle.
Specifically, during nozzle release cycle air-flow is controlled, flow speed controller 200 increases the flow velocity of circulating current,
The diffusion velocity of orientation drop can be accelerated.
Vertical movement device 205 controls nozzle and the movement of lower section array base palte surface vertical direction, reduces nozzle to array
The distance of substrate, increase the wind-force suffered by alignment liquid, to accelerate the diffusion velocity of orientation drop.
Deflector 215 controls nozzle using y-axis as axial deflection certain angle, preferably 0 °~45 °, under making nozzle direction tiltedly
Square outlet, orientation drop corresponding to control spread to specific direction, avoid the uncertain, random of alignment liquid free diffusing
Property.
Obviously, the above embodiment of the present invention is only intended to clearly illustrate example of the present invention, and is not pair
The restriction of embodiments of the present invention, for those of ordinary skill in the field, may be used also on the basis of the above description
To make other changes in different forms, all embodiments can not be exhaustive here, it is every to belong to this hair
Row of the obvious changes or variations that bright technical scheme is extended out still in protection scope of the present invention.
Claims (10)
1. a kind of shower nozzle, it is characterised in that including at least one feed nozzle supplied gas towards array base palte direction and at least one
The individual return-air nozzle away from array base palte direction air-breathing, wherein the feed nozzle is arranged on the target area of array base palte
Top, the return-air nozzle are arranged on above the non-target area of array base palte target area periphery, the feed nozzle and return-air
Nozzle cooperates applies circulating current to the array base palte below shower nozzle, and the liquid on array base palte surface is arranged on control
Drop diffusion.
2. shower nozzle according to claim 1, it is characterised in that the feed nozzle and the return-air nozzle are in the shower nozzle
Upper edge is moved parallel to the direction on array base palte surface, so that each feed nozzle alignment is arranged on the liquid on the target area
Drop, each return-air nozzle alignment nontarget area.
3. shower nozzle according to claim 1 or 2, it is characterised in that the drop is alignment liquid drop.
A kind of 4. system for controlling drop diffusion, it is characterised in that including：
Such as the shower nozzle any one of claim 1-3；
Terminal control mechanism, it is feed nozzle or return-air nozzle for setting each nozzle on the shower nozzle, makes feed nozzle
Cooperated with return-air nozzle and circulating current is applied to the array base palte below shower nozzle.
5. system according to claim 4, it is characterised in that the terminal control mechanism also includes：
Flow speed controller, for controlling the flow velocity of circulating current；And/or
Vertical movement device, for controlling nozzle to the distance of array base palte；And/or
Horizontal shift device, for controlling nozzle to be moved along the direction parallel to array base palte surface；And/or
Deflector, for controlling nozzle to be deflected perpendicular to the direction on array base palte surface as axle.
6. the system according to claim 4 or 5, it is characterised in that the drop is alignment liquid drop.
A kind of 7. method for controlling drop diffusion, it is characterised in that including：
At least one nozzle above the target area of array base palte is arranged to feed nozzle by S1, terminal control mechanism；
At least one nozzle above the non-target area of array base palte target area periphery is arranged to back by S2, terminal control mechanism
Gas jets；
S3, terminal control mechanism control feed nozzle and return-air nozzle cooperate and the array base palte below shower nozzle are applied
Circulating current, the drop that array base palte surface is arranged on control spread；
Wherein feed nozzle is used to supply gas towards the array base palte direction, and return-air nozzle is used for away from the array base palte side
To air-breathing.
8. according to the method for claim 7, it is characterised in that this method further comprises：Control the flow velocity of circulating current
To change the diffusion velocity of drop.
9. according to the method for claim 7, it is characterised in that this method further comprises：Nozzle is controlled to array base palte
Distance to change the diffusion velocity of drop.
10. according to the method any one of claim 7-9, it is characterised in that the drop is alignment liquid drop.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711064554.8A CN107632462A (en) | 2017-11-02 | 2017-11-02 | A kind of shower nozzle, the system and method for control drop diffusion |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711064554.8A CN107632462A (en) | 2017-11-02 | 2017-11-02 | A kind of shower nozzle, the system and method for control drop diffusion |
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| Publication Number | Publication Date |
|---|---|
| CN107632462A true CN107632462A (en) | 2018-01-26 |
Family
ID=61107124
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201711064554.8A Pending CN107632462A (en) | 2017-11-02 | 2017-11-02 | A kind of shower nozzle, the system and method for control drop diffusion |
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| CN106604822A (en) * | 2014-06-27 | 2017-04-26 | 富士胶卷迪马蒂克斯股份有限公司 | High height ink jet printing |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8262192B2 (en) * | 2009-02-17 | 2012-09-11 | Fujifilm Corporation | Ink jet printer for printing electromagnetic wave curing ink |
| CN106604822A (en) * | 2014-06-27 | 2017-04-26 | 富士胶卷迪马蒂克斯股份有限公司 | High height ink jet printing |
| CN104614899A (en) * | 2015-03-02 | 2015-05-13 | 合肥京东方光电科技有限公司 | Liquid crystal pouring method, device for dispersing liquid crystals and liquid crystal screen manufacturing equipment |
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Application publication date: 20180126 |
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| RJ01 | Rejection of invention patent application after publication |