CN107620066A - A kind of display screen acidic etching liquid - Google Patents
A kind of display screen acidic etching liquid Download PDFInfo
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- CN107620066A CN107620066A CN201710825401.4A CN201710825401A CN107620066A CN 107620066 A CN107620066 A CN 107620066A CN 201710825401 A CN201710825401 A CN 201710825401A CN 107620066 A CN107620066 A CN 107620066A
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- display screen
- phosphate
- etching liquid
- acid
- acidic etching
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Abstract
The invention discloses a kind of display screen acidic etching liquid, and it is made up of the raw material of following percentage by weight：Nitric acid 23 25%, hydrofluoric acid 30 50%, phosphate 5 14%, acetic acid 5 25%, fluorochemical 0.01 3%, ferric trichloride 1.2 1.8%, ammonium fluoride 8.5 9.4%, surfactant 8 12%, additive 5 8% and deionized water.The present invention adds fluorochemical and suitable additive in etching solution, does not introduce any metal ion and anion, the oxidation layer surface noresidue after etching, and can assign etching solution relatively low surface tension, increases etching solution permeability；Surfactant has the property of high surface hydrophobic oleophobic, compared with the other surfaces activating agent of equivalent, can greatly reduce the surface tension of solution, therefore its dosage is few, and production cost is relatively low.
Description
Technical field
The present invention relates to etching solution technical field, and in particular to a kind of display screen acidic etching liquid.
Background technology
In panel display apparatus, the process that metal wiring is formed on substrate generally includes following process：Sputtering forms gold
Belong to film；Coat, expose on metal film, development photoresist, so as to form photoresist in selective area；And to gold
Category film is etched.In addition, also including clean process before and after discrete units process etc..This etching work procedure refers to will be photic anti-
Erosion agent is used as mask, with the process of selective area kish film.The etching work procedure of generally use is to use plasma etc.
Dry-etching or using etching solution Wet-type etching.
The content of the invention
The present invention is intended to provide a kind of display screen acidic etching liquid.
The present invention provides following technical scheme：
A kind of display screen acidic etching liquid, it is made up of the raw material of following percentage by weight：Nitric acid 23-25%, hydrogen
Fluoric acid 30-50%, phosphate 5-14%, acetic acid 5-25%, fluorochemical 0.01-3%, ferric trichloride 1.2-1.8%, fluorination
Ammonium 8.5-9.4%, surfactant 8-12%, additive 5-8% and deionized water.
The fluorochemical is selected from by ammonium fluoride, sodium fluoride, fluorinated phosphate, ammonium acid fluoride, two sodium bifluorides and two
It is more than one or both of group that fluorinated phosphate is formed.
The phosphate is more than one or both of group being made up of diammonium hydrogen phosphate and potassium dihydrogen phosphate.
The additive is that polyethyleneglycol perfluorinated nonene base ether, perfluoro hexyl sulfonic acid polyglycerol ester, octylame, polyglycereol are complete
One or more in fluorine nonenyl ether, polyethylene glycol perfluorinated nonene ylmethyl ether, perfluoro hexyl sulfonic acid macrogol ester.
The surfactant is N- alkyl glucose amides, polyisobutene/maleic anhydride derivative, N- aryloxy group polyhydroxys
One or more of mixtures in base-fatty acid amide.
Compared with prior art, the beneficial effects of the invention are as follows：The present invention adds fluorochemical and conjunction in etching solution
Suitable additive, any metal ion and anion are not introduced, the oxidation layer surface noresidue after etching, and etching solution can be assigned
Relatively low surface tension, increase etching solution permeability；Surfactant has the property of high surface hydrophobic oleophobic, with equivalent
Other surfaces activating agent compare, can greatly reduce the surface tension of solution, therefore its dosage is few, production cost is relatively low.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
A kind of display screen acidic etching liquid of embodiment 1, it is made up of the raw material of following percentage by weight：Nitric acid
23%th, hydrofluoric acid 30%, phosphate 5%, acetic acid 5%, fluorochemical 0.01%, ferric trichloride 1.2%, ammonium fluoride 8.5%,
Surfactant 8%, additive 5% and deionized water.
The fluorochemical is selected from by ammonium fluoride, sodium fluoride, fluorinated phosphate, ammonium acid fluoride, two sodium bifluorides and two
It is more than one or both of group that fluorinated phosphate is formed.
The phosphate is more than one or both of group being made up of diammonium hydrogen phosphate and potassium dihydrogen phosphate.
The additive is that polyethyleneglycol perfluorinated nonene base ether, perfluoro hexyl sulfonic acid polyglycerol ester, octylame, polyglycereol are complete
One or more in fluorine nonenyl ether, polyethylene glycol perfluorinated nonene ylmethyl ether, perfluoro hexyl sulfonic acid macrogol ester.
The surfactant is N- alkyl glucose amides, polyisobutene/maleic anhydride derivative, N- aryloxy group polyhydroxys
One or more of mixtures in base-fatty acid amide.
A kind of display screen acidic etching liquid of embodiment 2, it is made up of the raw material of following percentage by weight：Nitric acid
25%th, hydrofluoric acid 50%, phosphate 14%, acetic acid 25%, fluorochemical 3%, ferric trichloride 1.8%, ammonium fluoride 9.4%,
Surfactant 12%, additive 8% and deionized water.
The fluorochemical is selected from by ammonium fluoride, sodium fluoride, fluorinated phosphate, ammonium acid fluoride, two sodium bifluorides and two
It is more than one or both of group that fluorinated phosphate is formed.
The phosphate is more than one or both of group being made up of diammonium hydrogen phosphate and potassium dihydrogen phosphate.
The additive is that polyethyleneglycol perfluorinated nonene base ether, perfluoro hexyl sulfonic acid polyglycerol ester, octylame, polyglycereol are complete
One or more in fluorine nonenyl ether, polyethylene glycol perfluorinated nonene ylmethyl ether, perfluoro hexyl sulfonic acid macrogol ester.
The surfactant is N- alkyl glucose amides, polyisobutene/maleic anhydride derivative, N- aryloxy group polyhydroxys
One or more of mixtures in base-fatty acid amide.
A kind of display screen acidic etching liquid of embodiment 3, it is made up of the raw material of following percentage by weight：Nitric acid
24%th, hydrofluoric acid 40%, phosphate 11%, acetic acid 15%, fluorochemical 1.4%, ferric trichloride 1.5%, ammonium fluoride
8.6%th, surfactant 10%, additive 7% and deionized water.
The fluorochemical is selected from by ammonium fluoride, sodium fluoride, fluorinated phosphate, ammonium acid fluoride, two sodium bifluorides and two
It is more than one or both of group that fluorinated phosphate is formed.
The phosphate is more than one or both of group being made up of diammonium hydrogen phosphate and potassium dihydrogen phosphate.
The additive is that polyethyleneglycol perfluorinated nonene base ether, perfluoro hexyl sulfonic acid polyglycerol ester, octylame, polyglycereol are complete
One or more in fluorine nonenyl ether, polyethylene glycol perfluorinated nonene ylmethyl ether, perfluoro hexyl sulfonic acid macrogol ester.
The surfactant is N- alkyl glucose amides, polyisobutene/maleic anhydride derivative, N- aryloxy group polyhydroxys
One or more of mixtures in base-fatty acid amide.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit requires rather than the explanation limits, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each
Embodiment only includes an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
The other embodiment that art personnel are appreciated that.
Claims (5)
1. a kind of display screen acidic etching liquid, it is characterised in that it is made up of the raw material of following percentage by weight：Nitric acid
23-25%, hydrofluoric acid 30-50%, phosphate 5-14%, acetic acid 5-25%, fluorochemical 0.01-3%, ferric trichloride 1.2-
1.8%th, ammonium fluoride 8.5-9.4%, surfactant 8-12%, additive 5-8% and deionized water.
A kind of 2. display screen acidic etching liquid according to claim 1, it is characterised in that：The fluorochemical is choosing
One kind in the group that free ammonium fluoride, sodium fluoride, fluorinated phosphate, ammonium acid fluoride, two sodium bifluorides and bifluoride phosphoric acid are formed
It is or two or more.
A kind of 3. display screen acidic etching liquid according to claim 1, it is characterised in that：The phosphate is choosing
It is more than one or both of group that free diammonium hydrogen phosphate and potassium dihydrogen phosphate are formed.
A kind of 4. display screen acidic etching liquid according to claim 1, it is characterised in that：The additive is poly- second two
Alcohol list perfluorinated nonene base ether, perfluoro hexyl sulfonic acid polyglycerol ester, octylame, polyglycereol perfluorinated nonene base ether, polyethylene glycol perfluor nonyl
One or more in enylmethyl ether, perfluoro hexyl sulfonic acid macrogol ester.
A kind of 5. display screen acidic etching liquid according to claim 1, it is characterised in that：The surfactant is N-
One or more in alkyl glucose amide, polyisobutene/maleic anhydride derivative, N- aryloxy polyhydroxies-fatty acid amide
Mixture.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710825401.4A CN107620066A (en) | 2017-09-14 | 2017-09-14 | A kind of display screen acidic etching liquid |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710825401.4A CN107620066A (en) | 2017-09-14 | 2017-09-14 | A kind of display screen acidic etching liquid |
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| CN107620066A true CN107620066A (en) | 2018-01-23 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710825401.4A Pending CN107620066A (en) | 2017-09-14 | 2017-09-14 | A kind of display screen acidic etching liquid |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109135752A (en) * | 2018-09-21 | 2019-01-04 | 湖北兴福电子材料有限公司 | A kind of phosphate etching solution and its preparation method |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102586780A (en) * | 2012-02-21 | 2012-07-18 | 上海正帆科技有限公司 | Acidic etching solution, as well as preparation method and application thereof |
| CN102597162A (en) * | 2009-10-30 | 2012-07-18 | 东友Fine-Chem股份有限公司 | Etching solution composition |
| CN102925894A (en) * | 2012-10-09 | 2013-02-13 | 江阴润玛电子材料股份有限公司 | Acid copper etching liquid and preparation process thereof |
| CN103666478A (en) * | 2013-12-13 | 2014-03-26 | 江阴润玛电子材料股份有限公司 | Non-ionic ammonium hydrogen fluoride etching solution with low surface tension |
| CN104498952A (en) * | 2014-11-24 | 2015-04-08 | 模德模具(东莞)有限公司 | Stereoscopic texture oxidation liquid medicine |
-
2017
- 2017-09-14 CN CN201710825401.4A patent/CN107620066A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102597162A (en) * | 2009-10-30 | 2012-07-18 | 东友Fine-Chem股份有限公司 | Etching solution composition |
| CN102586780A (en) * | 2012-02-21 | 2012-07-18 | 上海正帆科技有限公司 | Acidic etching solution, as well as preparation method and application thereof |
| CN102925894A (en) * | 2012-10-09 | 2013-02-13 | 江阴润玛电子材料股份有限公司 | Acid copper etching liquid and preparation process thereof |
| CN103666478A (en) * | 2013-12-13 | 2014-03-26 | 江阴润玛电子材料股份有限公司 | Non-ionic ammonium hydrogen fluoride etching solution with low surface tension |
| CN104498952A (en) * | 2014-11-24 | 2015-04-08 | 模德模具(东莞)有限公司 | Stereoscopic texture oxidation liquid medicine |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109135752A (en) * | 2018-09-21 | 2019-01-04 | 湖北兴福电子材料有限公司 | A kind of phosphate etching solution and its preparation method |
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