CN107793037A - One kind is used for AMOLED base plate glass attenuation etching liquid additives - Google Patents
One kind is used for AMOLED base plate glass attenuation etching liquid additives Download PDFInfo
- Publication number
- CN107793037A CN107793037A CN201710827757.1A CN201710827757A CN107793037A CN 107793037 A CN107793037 A CN 107793037A CN 201710827757 A CN201710827757 A CN 201710827757A CN 107793037 A CN107793037 A CN 107793037A
- Authority
- CN
- China
- Prior art keywords
- etching
- base plate
- plate glass
- liquid additives
- etching liquid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C15/00—Surface treatment of glass, not in the form of fibres or filaments, by etching
Abstract
The invention discloses one kind to be used for AMOLED base plate glass attenuation etching liquid additives, and it is made up of following composition according to percentage by weight：Hydrofluoric acid 17 21%, phosphoric acid 8 14%, nitric acid 15 24%, sodium hypochlorite 7 12%, brightener 6 13%, leveling agent 5 9%, surfactant 5 10%, solvent 38 54%.Additive of the present invention prepares etching solution, service life length, process stabilizing；Additive of the present invention prepares etching solution, and the plate face of etching is smooth, it is not necessary to following process；Additive of the present invention prepares etching solution, and can to stablize etching speed constant, improves etching coefficient when uniformity, while matching surface activating agent can lift etching speed；The usage amount of hydrochloric acid is effectively reduced, is advantageous to production efficiency in technique, and it is economical and practical, compound method is simple, and pernicious gas is not produced in etching process.
Description
Technical field
The present invention relates to AMOLED technical fields, and in particular to one kind is used for AMOLED base plate glass attenuation etching liquid and added
Agent.
Background technology
In AMOLED glass substrate production processes, acid etching is an important step.With the progress of etching, etching
Copper ion concentration more and more higher in liquid, etching speed is slower and slower, if being changed without that etching progress rate and quality can be had a strong impact on.Acid
Property etching waste liquor not only contains a large amount of copper ions, also containing other valuable chemicals.Therefore producer is substantially all meeting certainly
Row processing entrusts titular businessman to be recycled.
Existing etching solution has the following disadvantages during production and application：1st, price；2nd, short life, etch quantity
It is few；3rd, easily there is thick pit, it is necessary to following process in the plate face of etching；When the 4th, carrying out the etching of the large surface internal or female screw space of a whole page, side
Edge position is more difficult to etch the gradient.
The content of the invention
The present invention is intended to provide a kind of be used for AMOLED base plate glass attenuation etching liquid additives.
The present invention provides following technical scheme：
One kind is used for AMOLED base plate glass attenuation etching liquid additives, and it is according to percentage by weight group by following composition
Into：Hydrofluoric acid 17-21%, phosphoric acid 8-14%, nitric acid 15-24%, sodium hypochlorite 7-12%, brightener 6-13%, leveling agent 5-
9%th, surfactant 5-10%, solvent 38-54%.
The surfactant is the mixing of NPE, polyethers, butyl glycol ether, pH adjusting agent composition
Thing.
The brightener is N, and N- DMDSs are in formamide propane sulfonic acid sodium, polyethyleneimine alkyl compound
One or two combination.
The leveling agent is Triaethanolamine, polyethyleneimine alkyl compound, N, and N- DMDSs are for formamide third
One or more combination in alkyl sulfonic acid sodium and pyridinium hydroxy propyl sulfobetaine.
The solvent is deionized water.
Compared with prior art, the beneficial effects of the invention are as follows：Additive of the present invention prepares etching solution, service life
It is long, process stabilizing；Additive of the present invention prepares etching solution, and the plate face of etching is smooth, it is not necessary to following process；This hair
Bright additive prepares etching solution, and can to stablize etching speed constant, improves etching coefficient when uniformity, while matching surface is lived
Property agent can lift etching speed；The usage amount of hydrochloric acid is effectively reduced, is advantageous to production efficiency in technique, and it is economical and practical,
Compound method is simple, and pernicious gas is not produced in etching process.
Embodiment
Below in conjunction with the embodiment of the present invention, the technical scheme in the embodiment of the present invention is clearly and completely described,
Obviously, described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based in the present invention
Embodiment, the every other embodiment that those of ordinary skill in the art are obtained under the premise of creative work is not made, all
Belong to the scope of protection of the invention.
Embodiment 1 is a kind of to be used for AMOLED base plate glass attenuation etching liquid additives, and it is according to weight by following composition
Percentage forms：Hydrofluoric acid 17%, phosphoric acid 8%, nitric acid 15%, sodium hypochlorite 7%, brightener 6%, leveling agent 5%, surface are lived
Property agent 5%, solvent 38%.
The surfactant is the mixing of NPE, polyethers, butyl glycol ether, pH adjusting agent composition
Thing.
The brightener is N, and N- DMDSs are in formamide propane sulfonic acid sodium, polyethyleneimine alkyl compound
One or two combination.
The leveling agent is Triaethanolamine, polyethyleneimine alkyl compound, N, and N- DMDSs are for formamide third
One or more combination in alkyl sulfonic acid sodium and pyridinium hydroxy propyl sulfobetaine.
The solvent is deionized water.
Embodiment 2 is a kind of to be used for AMOLED base plate glass attenuation etching liquid additives, and it is according to weight by following composition
Percentage forms：Hydrofluoric acid 21%, phosphatase 11 4%, nitric acid 24%, sodium hypochlorite 12%, brightener 13%, leveling agent 9%, table
Face activating agent 10%, solvent 54%.
The surfactant is the mixing of NPE, polyethers, butyl glycol ether, pH adjusting agent composition
Thing.
The brightener is N, and N- DMDSs are in formamide propane sulfonic acid sodium, polyethyleneimine alkyl compound
One or two combination.
The leveling agent is Triaethanolamine, polyethyleneimine alkyl compound, N, and N- DMDSs are for formamide third
One or more combination in alkyl sulfonic acid sodium and pyridinium hydroxy propyl sulfobetaine.
The solvent is deionized water.
Embodiment 3 is a kind of to be used for AMOLED base plate glass attenuation etching liquid additives, and it is according to weight by following composition
Percentage forms：Hydrofluoric acid 19%, phosphatase 11 1%, nitric acid 19%, sodium hypochlorite 11%, brightener 9%, leveling agent 7%, surface
Activating agent 8%, solvent 45%.
The surfactant is the mixing of NPE, polyethers, butyl glycol ether, pH adjusting agent composition
Thing.
The brightener is N, and N- DMDSs are in formamide propane sulfonic acid sodium, polyethyleneimine alkyl compound
One or two combination.
The leveling agent is Triaethanolamine, polyethyleneimine alkyl compound, N, and N- DMDSs are for formamide third
One or more combination in alkyl sulfonic acid sodium and pyridinium hydroxy propyl sulfobetaine.
The solvent is deionized water.
It is obvious to a person skilled in the art that the invention is not restricted to the details of the one exemplary embodiment, Er Qie
In the case of without departing substantially from spirit or essential attributes of the invention, the present invention can be realized in other specific forms.Therefore, no matter
From the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, the scope of the present invention is by appended power
Profit requires rather than the explanation limits, it is intended that all in the implication and scope of the equivalency of claim by falling
Change is included in the present invention.Moreover, it will be appreciated that although the present specification is described in terms of embodiments, not each
Embodiment only includes an independent technical scheme, and this narrating mode of specification is only this area for clarity
Technical staff should be using specification as an entirety, and the technical solutions in the various embodiments may also be suitably combined, forms this
The other embodiment that art personnel are appreciated that.
Claims (5)
1. one kind is used for AMOLED base plate glass attenuation etching liquid additives, it is characterised in that it is according to weight by following composition
Measure percentage composition：Hydrofluoric acid 17-21%, phosphoric acid 8-14%, nitric acid 15-24%, sodium hypochlorite 7-12%, brightener 6-
13%th, leveling agent 5-9%, surfactant 5-10%, solvent 38-54%.
2. one kind according to claim 1 is used for AMOLED base plate glass attenuation etching liquid additives, it is characterised in that：Institute
State the mixture that surfactant forms for NPE, polyethers, butyl glycol ether, pH adjusting agent.
3. one kind according to claim 1 is used for AMOLED base plate glass attenuation etching liquid additives, it is characterised in that：Institute
It is N to state brightener, and N- DMDSs are for one or both of formamide propane sulfonic acid sodium, polyethyleneimine alkyl compound
Combination.
4. one kind according to claim 1 is used for AMOLED base plate glass attenuation etching liquid additives, it is characterised in that：Institute
Leveling agent is stated as Triaethanolamine, polyethyleneimine alkyl compound, N, N- DMDSs for formamide propane sulfonic acid sodium and
One or more combination in pyridinium hydroxy propyl sulfobetaine.
5. one kind according to claim 1 is used for AMOLED base plate glass attenuation etching liquid additives, it is characterised in that：Institute
It is deionized water to state solvent.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710827757.1A CN107793037A (en) | 2017-09-14 | 2017-09-14 | One kind is used for AMOLED base plate glass attenuation etching liquid additives |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710827757.1A CN107793037A (en) | 2017-09-14 | 2017-09-14 | One kind is used for AMOLED base plate glass attenuation etching liquid additives |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107793037A true CN107793037A (en) | 2018-03-13 |
Family
ID=61532407
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710827757.1A Pending CN107793037A (en) | 2017-09-14 | 2017-09-14 | One kind is used for AMOLED base plate glass attenuation etching liquid additives |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107793037A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111117623A (en) * | 2019-12-29 | 2020-05-08 | 武汉风帆电化科技股份有限公司 | Acidic etching auxiliary agent and preparation method thereof |
| CN115043594A (en) * | 2021-03-09 | 2022-09-13 | 易安爱富科技有限公司 | Etching solution for display substrate and preparation method thereof |
-
2017
- 2017-09-14 CN CN201710827757.1A patent/CN107793037A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111117623A (en) * | 2019-12-29 | 2020-05-08 | 武汉风帆电化科技股份有限公司 | Acidic etching auxiliary agent and preparation method thereof |
| CN115043594A (en) * | 2021-03-09 | 2022-09-13 | 易安爱富科技有限公司 | Etching solution for display substrate and preparation method thereof |
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|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20180313 |
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| RJ01 | Rejection of invention patent application after publication |