CN107523871A - A kind of single-crystal silicon carbide stove - Google Patents

A kind of single-crystal silicon carbide stove Download PDF

Info

Publication number
CN107523871A
CN107523871A CN201610453000.6A CN201610453000A CN107523871A CN 107523871 A CN107523871 A CN 107523871A CN 201610453000 A CN201610453000 A CN 201610453000A CN 107523871 A CN107523871 A CN 107523871A
Authority
CN
China
Prior art keywords
crucible
reative cell
path length
silicon carbide
electrical path
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201610453000.6A
Other languages
Chinese (zh)
Inventor
袁玉平
闫鹏
袁佳斌
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JIANGSU BAIERTE OPTOELECTRONIC DEVICES Co Ltd
Original Assignee
JIANGSU BAIERTE OPTOELECTRONIC DEVICES Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by JIANGSU BAIERTE OPTOELECTRONIC DEVICES Co Ltd filed Critical JIANGSU BAIERTE OPTOELECTRONIC DEVICES Co Ltd
Priority to CN201610453000.6A priority Critical patent/CN107523871A/en
Publication of CN107523871A publication Critical patent/CN107523871A/en
Pending legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10Inorganic compounds or compositions
    • C30B29/36Carbides
    • CCHEMISTRY; METALLURGY
    • C30CRYSTAL GROWTH
    • C30BSINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00Single-crystal growth by pulling from a melt, e.g. Czochralski method

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

The present invention relates to a kind of single-crystal silicon carbide stove, it includes crucible, crucible cover is provided with above the crucible, rotating mechanism is provided with the crucible bottom, supplies room is provided with the crucible, seed crystal is provided with the crucible cover lower surface, the seed crystal is at least provided with one, heat-insulation layer is provided with outside the crucible, the crucible and crucible cover are all located in reative cell, induction coil is provided with outside the reative cell, the distribution height of the induction coil accounts for the 1/2 7/10 of reative cell height, the interior electrical path length of the crucible accounts for 3/5 4/5 of electrical path length in reative cell, pressure control device and monitoring device are provided with the reative cell.Structure setting of the present invention is reasonable, and control is accurate, and product quality is high.

Description

A kind of single-crystal silicon carbide stove
Technical field
The present invention relates to a kind of crystal production device, and in particular to a kind of carborundum crystals process units.
Background technology
At present, the structure setting of silicon carbide crystal growing device is unreasonable, and operating temperature and pressure are difficult to control, and the endless full axial symmetry of induction coil causes the endless full axial symmetry of crystal growth temperature-field caused by graphite crucible, so as to produce asymmetric crystal growth.
The content of the invention
Goal of the invention:The invention aims to overcome deficiency of the prior art, there is provided a kind of structure setting is reasonable, and control is accurate, the high single-crystal silicon carbide stove of product quality.
Technical scheme:In order to solve the above-mentioned technical problem, a kind of single-crystal silicon carbide stove of the present invention, it includes crucible, crucible cover is provided with above the crucible, rotating mechanism is provided with the crucible bottom, supplies room is provided with the crucible, seed crystal is provided with the crucible cover lower surface, the seed crystal is at least provided with one, heat-insulation layer is provided with outside the crucible, the crucible and crucible cover are all located in reative cell, induction coil is provided with outside the reative cell, the distribution height of the induction coil accounts for the 1/2-7/10 of reative cell height, the interior electrical path length of the crucible accounts for the 3/5-4/5 of electrical path length in reative cell, pressure control device and monitoring device are provided with the reative cell.
The crucible and crucible cover are all made up of graphite.
The distribution height of the induction coil accounts for the 3/5 of reative cell height.
The interior electrical path length of the crucible accounts for 7/10 of electrical path length in reative cell.
Beneficial effect:Compared with prior art, its remarkable advantage is the present invention:Overall structure of the present invention sets reasonable, the heat-insulation layer for accounting for the symmetric induction coils of reative cell height 3/5 using distribution height and being located at outside crucible, make temperature stabilization in reative cell, Crystals in Symmetry grows, the crucible of electrical path length 7/10 in reative cell is accounted for using interior electrical path length, ensure that crystal is in most steady production environment, pressure control device and monitoring device are set, and control is accurately.
Brief description of the drawings
Fig. 1 is the structural representation of the present invention.
Embodiment
The present invention is further illustrated with reference to the accompanying drawings and examples.
As shown in Figure 1, a kind of single-crystal silicon carbide stove of the present invention, it includes crucible 1, crucible cover 2 is provided with above the crucible 1, rotating mechanism 3 is provided with the bottom of crucible 1, supplies room 4 is provided with the crucible 1, seed crystal 5 is provided with the lower surface of crucible cover 2, the seed crystal 5 is at least provided with one, heat-insulation layer 6 is provided with outside the crucible 1, the crucible 1 and crucible cover 2 are all located in reative cell 7, induction coil 8 is provided with outside the reative cell 7, the distribution height of the induction coil 8 accounts for the 3/5 of the height of reative cell 7, the interior electrical path length of the crucible 1 accounts for 7/10 of electrical path length in reative cell 7, pressure control device 9 and monitoring device 10 are provided with the reative cell 7;The crucible 1 and crucible cover 2 are all made up of graphite.Overall structure of the present invention sets reasonable, the heat-insulation layer for accounting for the symmetric induction coils of reative cell height 3/5 using distribution height and being located at outside crucible, make temperature stabilization in reative cell, Crystals in Symmetry grows, the crucible of electrical path length 7/10 in reative cell is accounted for using interior electrical path length, ensure that crystal is in most steady production environment, pressure control device and monitoring device are set, and control is accurately.
The invention provides a kind of thinking and method; method and the approach for implementing the technical scheme are a lot; described above is only the preferred embodiment of the present invention; it should be understood that; for those skilled in the art, under the premise without departing from the principles of the invention, some improvements and modifications can also be made; these improvements and modifications also should be regarded as protection scope of the present invention, and the available prior art of each part being not known in the present embodiment is realized.

Claims (4)

  1. A kind of 1. single-crystal silicon carbide stove, it is characterised in that:It includes crucible(1), in the crucible(1)Top is provided with crucible cover(2), in the crucible(1)Bottom is provided with rotating mechanism(3), in the crucible(1)It is interior to be provided with supplies room(4), in the crucible cover(2)Lower surface is provided with seed crystal(5), the seed crystal(5)At least provided with one, in the crucible(1)Outside is provided with heat-insulation layer(6), the crucible(1)And crucible cover(2)All it is located at reative cell(7)It is interior, in the reative cell(7)Outside is provided with induction coil(8), the induction coil(8)Distribution height account for reative cell(7)The 1/2-7/10 of height, the crucible(1)Interior electrical path length account for reative cell(7)The 3/5-4/5 of interior electrical path length, in the reative cell(7)It is provided with pressure control device(9)And monitoring device(10).
  2. 2. single-crystal silicon carbide stove according to claim 1, it is characterised in that:The crucible(1)And crucible cover(2)All it is made up of graphite.
  3. 3. single-crystal silicon carbide stove according to claim 1, it is characterised in that:The induction coil(8)Distribution height account for reative cell(7)The 3/5 of height.
  4. 4. single-crystal silicon carbide stove according to claim 1, it is characterised in that:The crucible(1)Interior electrical path length account for reative cell(7)The 7/10 of interior electrical path length.
CN201610453000.6A 2016-06-22 2016-06-22 A kind of single-crystal silicon carbide stove Pending CN107523871A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201610453000.6A CN107523871A (en) 2016-06-22 2016-06-22 A kind of single-crystal silicon carbide stove

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201610453000.6A CN107523871A (en) 2016-06-22 2016-06-22 A kind of single-crystal silicon carbide stove

Publications (1)

Publication Number Publication Date
CN107523871A true CN107523871A (en) 2017-12-29

Family

ID=60735127

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201610453000.6A Pending CN107523871A (en) 2016-06-22 2016-06-22 A kind of single-crystal silicon carbide stove

Country Status (1)

Country Link
CN (1) CN107523871A (en)

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105040103A (en) * 2015-06-25 2015-11-11 江苏艾科勒科技有限公司 Growing device for high-quality silicon carbide crystals
CN204874827U (en) * 2015-06-25 2015-12-16 江苏艾科勒科技有限公司 High -quality carborundum crystal growing apparatus
CN105316765A (en) * 2014-06-16 2016-02-10 台聚光电股份有限公司 Apparatus for producing a plurality of single crystal silicon carbide crystals and method therefor
CN105442038A (en) * 2015-12-17 2016-03-30 中国电子科技集团公司第二研究所 Crucible rotating-type silicon carbide single crystal growth method
CN105442044A (en) * 2015-12-17 2016-03-30 中国电子科技集团公司第二研究所 Crucible independent rotating mechanism of SiC single crystal growth equipment
CN105568370A (en) * 2016-03-01 2016-05-11 山东大学 Centrally symmetric silicon carbide (SiC) single crystal growing device and method
CN205313716U (en) * 2015-12-17 2016-06-15 中国电子科技集团公司第二研究所 Independent rotary mechanism of crucible in siC growth of single crystal equipment
CN205856655U (en) * 2016-06-22 2017-01-04 江苏拜尔特光电设备有限公司 A kind of single-crystal silicon carbide stove

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN105316765A (en) * 2014-06-16 2016-02-10 台聚光电股份有限公司 Apparatus for producing a plurality of single crystal silicon carbide crystals and method therefor
CN105040103A (en) * 2015-06-25 2015-11-11 江苏艾科勒科技有限公司 Growing device for high-quality silicon carbide crystals
CN204874827U (en) * 2015-06-25 2015-12-16 江苏艾科勒科技有限公司 High -quality carborundum crystal growing apparatus
CN105442038A (en) * 2015-12-17 2016-03-30 中国电子科技集团公司第二研究所 Crucible rotating-type silicon carbide single crystal growth method
CN105442044A (en) * 2015-12-17 2016-03-30 中国电子科技集团公司第二研究所 Crucible independent rotating mechanism of SiC single crystal growth equipment
CN205313716U (en) * 2015-12-17 2016-06-15 中国电子科技集团公司第二研究所 Independent rotary mechanism of crucible in siC growth of single crystal equipment
CN105568370A (en) * 2016-03-01 2016-05-11 山东大学 Centrally symmetric silicon carbide (SiC) single crystal growing device and method
CN205856655U (en) * 2016-06-22 2017-01-04 江苏拜尔特光电设备有限公司 A kind of single-crystal silicon carbide stove

Similar Documents

Publication Publication Date Title
CN102732953B (en) Technology and apparatus for growing single silicon carbide crystals through double seed crystal-assisted vapor transport method
CN101148777A (en) Method and device for growing gallium-mixing silicon monocrystal by czochralski method
CN103911654B (en) The method preparing the monocrystal silicon of a diameter of more than 400mm
CN105531406A (en) Silicon single crystal puller
CN106048718B (en) A kind of polysilicon fritting ingot casting sundries discharging method
CN205856655U (en) A kind of single-crystal silicon carbide stove
CN102978687A (en) Crystal growth method of polycrystalline silicon ingot
CN204417644U (en) A kind of silicon carbide crystal growing device
CN103590109B (en) Czochralski crystal growing furnace magnetic field device and use the crystal pulling method of this magnetic field device
CN105696079A (en) Method for precisely controlling 6-inch silicon carbide monocrystalline growth temperature field
CN107523872A (en) A kind of novel silicon carbide single crystal growing furnace
CN102154683A (en) Monocrystal/polycrystal directional solidification system of metal heating body structure
CN102758245A (en) Deoxidizing type single crystal furnace
CN205856658U (en) A kind of novel silicon carbide single crystal growing furnace
CN107523871A (en) A kind of single-crystal silicon carbide stove
CN103898603A (en) Dual-power polycrystalline silicon ingot casting process
CN204690167U (en) A kind of novel polycrystal silicon ingot ingot furnace
CN203373447U (en) There is seed crystal ingot casting crucible backplate device
CN207130360U (en) A kind of heater
CN202187086U (en) Gradient heater for monocrystal furnace
CN105442044A (en) Crucible independent rotating mechanism of SiC single crystal growth equipment
CN207294941U (en) Square silicon core ingot casting furnace body
CN106119956B (en) A kind of polysilicon fritting casting ingot method
JP6675197B2 (en) Silicon carbide single crystal manufacturing equipment
CN201942784U (en) Thermal field device applicable to 20inch silicon single crystal growth in straight pulling method

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20171229

RJ01 Rejection of invention patent application after publication