CN107505816A - Substrate and liquid crystal panel - Google Patents
Substrate and liquid crystal panel Download PDFInfo
- Publication number
- CN107505816A CN107505816A CN201710814730.9A CN201710814730A CN107505816A CN 107505816 A CN107505816 A CN 107505816A CN 201710814730 A CN201710814730 A CN 201710814730A CN 107505816 A CN107505816 A CN 107505816A
- Authority
- CN
- China
- Prior art keywords
- alignment mark
- substrate
- area
- layer
- black
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 54
- 239000004973 liquid crystal related substance Substances 0.000 title claims abstract description 13
- 230000000903 blocking effect Effects 0.000 claims description 7
- 239000012528 membrane Substances 0.000 claims description 5
- 239000000463 material Substances 0.000 description 6
- 239000010408 film Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 239000011358 absorbing material Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000009738 saturating Methods 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7073—Alignment marks and their environment
- G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
The invention provides a kind of substrate, including substrate, the substrate is provided with alignment mark, formed with planarization layer and black dottle pin layer in the substrate；The planarization layer includes the Part I formed on the alignment mark, with the Part II for being centered around the alignment mark periphery, there is gap, and the area of the Part II is more than the area of the alignment mark between the Part II and the alignment mark；The black dottle pin layer is formed on the planarization layer, and in the gap.The invention provides a kind of liquid crystal panel for including the substrate.The solution of the present invention can ensure that CCD captures enough image informations.
Description
Technical field
The present invention relates to liquid panel technique field, more particularly to a kind of substrate and liquid crystal panel.
Background technology
, it is necessary to be aligned MASK (mask plate) with substrate using alignment system in the film-forming process of liquid crystal panel.
Alignment system can include light source and CCD (charge coupled cell).Contraposition process can include：Source emissioning light line, launch light
After line is through MASK and the film layer deposited, the mark (alignment mark) on substrate is reached.Mark is reflected light, instead
Light (i.e. image information) is penetrated to be caught by CCD.
In the prior art, because some film layers deposited have suitable thickness and are light absorbent, the light of mark reflections
The light intensity of line is more faint, and CCD can not capture effective image information, causes contraposition to fail.
The content of the invention
In view of this, the invention provides a kind of substrate and liquid crystal panel, it can ensure that CCD captures enough image letters
Breath.
A kind of substrate, including substrate, the substrate are provided with alignment mark, formed with planarization layer and black in the substrate
Dottle pin layer；The planarization layer includes the Part I formed on the alignment mark, and is centered around the alignment mark
The Part II of periphery, there is gap between the Part II and the alignment mark, and the area of the Part II is big
In the area of the alignment mark；The black dottle pin layer is formed on the planarization layer, and in the gap.
Wherein, it is also formed with photic zone between the alignment mark and the Part I.
Wherein, the photic zone is color blocking layer.
Wherein, area of knockout is formed between the Part II and the alignment mark, the area of knockout is around described
Alignment mark one week.
Wherein, the substrate is array base palte or color membrane substrates.
A kind of liquid crystal panel, including substrate, the substrate include substrate, and the substrate is provided with alignment mark, the base
Formed with planarization layer and black dottle pin layer on bottom；The planarization layer includes first formed on the alignment mark
Point, and the Part II of the alignment mark periphery is centered around, there is gap between the Part II and the alignment mark,
And the area of the Part II is more than the area of the alignment mark；The black dottle pin layer formed the planarization layer it
On, and in the gap.
Wherein, it is also formed with photic zone between the alignment mark and the Part I.
Wherein, the photic zone is color blocking layer.
Wherein, area of knockout is formed between the Part II and the alignment mark, the area of knockout is around described
Alignment mark one week.
Wherein, the substrate is array base palte or color membrane substrates.
The solution of the present invention, by setting the area of knockout on the planarization layer, to form the Part II
And the Part I on the alignment mark, and on the Part I, it is in the area of knockout and described
The black dottle pin layer is formed on Part II so that the thickness of the black dottle pin layer on the alignment mark is reduced.By
, in contraposition, the conducting path for the light that the alignment mark is reflected shortens for this, and light intensity loss reduces, and more light will
Inject CCD and be captured, so that CCD can obtain higher-quality image information, improve aligning accuracy.
Brief description of the drawings
More clearly to illustrate the construction feature and effect of the present invention, it is entered with specific embodiment below in conjunction with the accompanying drawings
Row describes in detail.
Fig. 1 is the overlooking the structure diagram that the substrate of the embodiment of the present invention is gone after except black dottle pin layer；
Fig. 2 is that Fig. 1 substrate increases the AA cross section structure diagrams after black dottle pin layer.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation describes.Obviously, described embodiment is the part of the embodiment of the present invention, rather than whole embodiments.Based on this hair
Embodiment in bright, the every other reality that those of ordinary skill in the art are obtained on the premise of creative work is not made
Example is applied, should all belong to the scope of protection of the invention.
The embodiments of the invention provide a kind of liquid crystal panel, including substrate.The substrate can be array base palte (i.e. film
Transistor (TFT) array substrate) or color membrane substrates (i.e. colored filter substrate).
A kind of figures 1 and 2 show that concrete structure of the substrate.Wherein, substrate 10 includes substrate 11.Set in substrate 11
There is alignment mark 13, planarization layer and black dottle pin layer 14 are also formed with substrate 11.The planarization layer includes being formed aligning
Part I 121 on mark 13, and it is centered around the Part II 122 of the periphery of alignment mark 13.Part II 122 and contraposition
There is gap, and the area of Part II 122 is more than the area of position mark 13 between mark 13.Black dottle pin layer 14 is formed described
On planarization layer (i.e. on Part I 121 and Part II 122), and in the gap.
Wherein, the planarization layer is used for the landform of planarization of substrates 11, is easy to follow-up film forming.The planarization layer can be with
For organic thin film layer.The planarization layer is located on alignment mark 13, and a range of area around alignment mark 13
Domain, which has been done, hollows out processing, so that planarization layer formation Part I 121 and the two parts of Part II 122, first
Divide between 121 and Part II 122 and area of knockout D (Fig. 1 of diagram is formed (i.e. between Part II 122 and alignment mark 13)
In, the region between dotted line frame and alignment mark 13), i.e., there is gap between Part II 122 and alignment mark 13.Described
The concrete numerical value of gap according to be actually needed determine.
In the present embodiment, as depicted in figs. 1 and 2.The circular alignment marks of area of knockout D 13 1 weeks, i.e. alignment mark 13
All done in all directions and hollowed out processing.Area of knockout D can have rectangular profile.In other embodiments, area of knockout D can
To be distributed only over regional area, and do not form closed loop；Area of knockout D can also be arranged as required into other shapes.
In the present embodiment, the area of Part II 122 is more than the area of alignment mark 13.The area refers to Part II
122nd, the surface area that alignment mark 13 contacts with other film layers.
In the present embodiment, black dottle pin layer (Black Photo Spacer, referred to as BPS) 14 is black light-absorbing material, and
And possessing certain thickness, it has both BM (Black Matrix, black matrix) and PS (Photo Spacer, supporter) function.
The raw material of black dottle pin layer 14 are in half soliqueous gel, and gel is formed after the techniques such as coating, exposure imaging, solidification
Black dottle pin layer 14.
When being applied in substrate 11, gel will cover alignment mark 13, Part I 121, area of knockout D and second
Part 122.Because gel can flow and area of knockout D be present, on alignment mark 13, Part I 121 and Part II 122
Gel will be flowed to area of knockout D.But the good fluidity that gel is not the same just like liquid, the gel layer formed
It is flat surfaces that surface, which is not, but in uneven, it is stepped as shown in Figure 2.Wherein, the Part II of left and right two
Gel layer on 122, and Part I 121 is higher, and the gel layer in two area of knockout D is relatively low.Further, since register guide
The area of note 13 is less than the area of Part II 122, in the presence of material levelling effect, on alignment mark 13
Gel flows into the more of area of knockout D, and the gel on Part II 122 flows into the less of area of knockout D, finally causes first
Gel layer thicknesses on part 121 are less than the gel layer thicknesses on Part II 122.Accordingly, after black dottle pin layer 14 is formed,
Thickness of the thickness of black dottle pin layer 14 on Part I 121 again smaller than the black dottle pin layer 14 on Part II 122.
In the prior art, the planarization layer does not set area of knockout D, and the planarization layer is one complete thin
Film layer, black dottle pin layer are formed directly on the planarization layer.It is black in the prior art under the premise of same gel coating amount
The thickness of black dottle pin layer 14 on the thickness of dottle pin layer, with Part II in the present embodiment 122 is essentially identical.This is due to gel
Bad mobility, plus the material levelling effect on Part II 122 so that after area of knockout D is set, Part II
It is less that area of knockout D gel is flowed on 122, thus can consider that the thickness of the black dottle pin layer 14 on Part II 122 is equal
In the thickness of black dottle pin layer in the prior art.The thickness of black dottle pin layer 14 i.e. on Part II 122 can be used as a comparison
Benchmark, for weighing the thickness of the black dottle pin layer 14 on Part I 121.By upper discussion, the black dottle pin layer on Part I 121
14 thickness is less than the thickness of the black dottle pin layer 14 on Part II 122.Therefore compared to prior art, on Part I 121
The thickness of the black dottle pin layer 14 of (i.e. on alignment mark 13) reduces.
The scheme of the present embodiment, by the planarization layer set area of knockout D, with formed Part II 122 and
Part I 121 on alignment mark 13, and on Part I 121, in the area of knockout and Part II 122
It is upper to form black dottle pin layer 14 so that the thickness of the black dottle pin layer 14 on alignment mark 13 is reduced.Thus in contraposition, contraposition
The conducting path for the light that mark 13 is reflected shortens, and light intensity loss reduces, and more light will inject CCD and be captured,
So as to which CCD can obtain higher-quality image information, thus improve aligning accuracy.
Further, photic zone can also be formed between alignment mark 13 and Part I 121, the photic zone is by can be saturating
Luminescent material is formed.The photic zone is further set equivalent to the height for having increased Part I 121, in same gel coating
Under the premise of amount, the material levelling effect of gel can be more notable so that the black dottle pin on Part I 121 (i.e. on alignment mark 13)
Layer 14 is thinner, thus further shorten the conducting path for the light that alignment mark 13 is reflected so that more light can be by CCD
Capture, so as to further increase aligning accuracy.
The photic zone can be color blocking layer, i.e., described photic zone is formed by color blocking material.The color blocking layer has well
Translucency, and thickness is larger, advantageously reduces the thickness of the black dottle pin layer 14 on alignment mark 13.It is, of course, also possible to using it
He manufactures the photic zone by light transmissive material.
The foregoing is only a specific embodiment of the invention, but protection scope of the present invention is not limited thereto, any
Those familiar with the art the invention discloses technical scope in, can easily expect various equivalent modifications or
Replace, these modifications or substitutions should be all included within the scope of the present invention.Therefore, protection scope of the present invention Ying Yiquan
The protection domain that profit requires is defined.
Claims (10)
- A kind of 1. substrate, it is characterised in thatIncluding substrate, the substrate is provided with alignment mark, formed with planarization layer and black dottle pin layer in the substrate；It is described flat Smoothization layer includes the Part I formed on the alignment mark, and is centered around second of the alignment mark periphery Point, there is gap, and the area of the Part II is more than the register guide between the Part II and the alignment mark The area of note；The black dottle pin layer is formed on the planarization layer, and in the gap.
- 2. substrate according to claim 1, it is characterised in thatPhotic zone is also formed between the alignment mark and the Part I.
- 3. substrate according to claim 2, it is characterised in thatThe photic zone is color blocking layer.
- 4. according to the substrate any one of claim 1-3, it is characterised in thatArea of knockout is formed between the Part II and the alignment mark, the area of knockout is around the alignment mark one Week.
- 5. according to the substrate any one of claim 1-3, it is characterised in thatThe substrate is array base palte or color membrane substrates.
- 6. a kind of liquid crystal panel, including substrate, it is characterised in thatThe substrate includes substrate, and the substrate is provided with alignment mark, formed with planarization layer and black dottle pin in the substrate Layer；The planarization layer includes the Part I formed on the alignment mark, and is centered around the alignment mark periphery Part II, there is gap, and the area of the Part II is more than institute between the Part II and the alignment mark State the area of alignment mark；The black dottle pin layer is formed on the planarization layer, and in the gap.
- 7. liquid crystal panel according to claim 6, it is characterised in thatPhotic zone is also formed between the alignment mark and the Part I.
- 8. liquid crystal panel according to claim 7, it is characterised in thatThe photic zone is color blocking layer.
- 9. according to the liquid crystal panel any one of claim 6-8, it is characterised in thatArea of knockout is formed between the Part II and the alignment mark, the area of knockout is around the alignment mark one Week.
- 10. according to the liquid crystal panel any one of claim 6-8, it is characterised in thatThe substrate is array base palte or color membrane substrates.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710814730.9A CN107505816B (en) | 2017-09-11 | 2017-09-11 | Substrate and liquid crystal display panel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710814730.9A CN107505816B (en) | 2017-09-11 | 2017-09-11 | Substrate and liquid crystal display panel |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107505816A true CN107505816A (en) | 2017-12-22 |
| CN107505816B CN107505816B (en) | 2019-07-23 |
Family
ID=60696145
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710814730.9A Active CN107505816B (en) | 2017-09-11 | 2017-09-11 | Substrate and liquid crystal display panel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107505816B (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110133892A (en) * | 2019-05-31 | 2019-08-16 | 厦门天马微电子有限公司 | The manufacturing method of display panel, display device and display panel |
| CN110764327A (en) * | 2019-10-22 | 2020-02-07 | 深圳市华星光电技术有限公司 | Array substrate and preparation method thereof |
| CN110767084A (en) * | 2019-02-01 | 2020-02-07 | 云谷（固安）科技有限公司 | Display panel, manufacturing method thereof and display device |
| WO2021226743A1 (en) * | 2020-05-09 | 2021-11-18 | 京东方科技集团股份有限公司 | Display panel and manufacturing method therefor, and display device |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120188151A1 (en) * | 2011-01-21 | 2012-07-26 | Samsung Mobile Display Co., Ltd. | Liquid crystal display device and manufacturing method thereof |
| CN102856164A (en) * | 2012-09-07 | 2013-01-02 | 无锡华润上华科技有限公司 | Method for improving clearness of alignment marks |
| CN103926809A (en) * | 2014-03-24 | 2014-07-16 | 京东方科技集团股份有限公司 | Preparation method of substrate |
| CN104777664A (en) * | 2015-04-28 | 2015-07-15 | 深圳市华星光电技术有限公司 | Method for manufacturing black matrix |
| CN105446039A (en) * | 2016-01-04 | 2016-03-30 | 京东方科技集团股份有限公司 | Display substrate, preparing method thereof and display device |
-
2017
- 2017-09-11 CN CN201710814730.9A patent/CN107505816B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20120188151A1 (en) * | 2011-01-21 | 2012-07-26 | Samsung Mobile Display Co., Ltd. | Liquid crystal display device and manufacturing method thereof |
| CN102856164A (en) * | 2012-09-07 | 2013-01-02 | 无锡华润上华科技有限公司 | Method for improving clearness of alignment marks |
| CN103926809A (en) * | 2014-03-24 | 2014-07-16 | 京东方科技集团股份有限公司 | Preparation method of substrate |
| CN104777664A (en) * | 2015-04-28 | 2015-07-15 | 深圳市华星光电技术有限公司 | Method for manufacturing black matrix |
| CN105446039A (en) * | 2016-01-04 | 2016-03-30 | 京东方科技集团股份有限公司 | Display substrate, preparing method thereof and display device |
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110767084A (en) * | 2019-02-01 | 2020-02-07 | 云谷（固安）科技有限公司 | Display panel, manufacturing method thereof and display device |
| CN110133892A (en) * | 2019-05-31 | 2019-08-16 | 厦门天马微电子有限公司 | The manufacturing method of display panel, display device and display panel |
| CN110133892B (en) * | 2019-05-31 | 2022-04-08 | 厦门天马微电子有限公司 | Display panel, display device, and method for manufacturing display panel |
| CN110764327A (en) * | 2019-10-22 | 2020-02-07 | 深圳市华星光电技术有限公司 | Array substrate and preparation method thereof |
| WO2021226743A1 (en) * | 2020-05-09 | 2021-11-18 | 京东方科技集团股份有限公司 | Display panel and manufacturing method therefor, and display device |
| US11957033B2 (en) | 2020-05-09 | 2024-04-09 | Chengdu Boe Optoelectronics Technology Co., Ltd. | Display panel, manufacturing method thereof, and display device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107505816B (en) | 2019-07-23 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107505816B (en) | Substrate and liquid crystal display panel | |
| US10146078B2 (en) | Liquid crystal display panel and array substrate of the same | |
| WO2016173210A1 (en) | Manufacturing method for black matrix | |
| CN105093652B (en) | A kind of substrate and preparation method thereof, display panel, display device | |
| US10254591B2 (en) | Display panel and method for manufacturing the same | |
| TWI300493B (en) | ||
| CN105974636A (en) | Method for manufacturing liquid crystal display panel | |
| CN106022325A (en) | Optical fingerprint sensor module | |
| CN107450224B (en) | Preparation method of COA type array substrate | |
| CN105446039B (en) | Display base plate and preparation method thereof, display device | |
| CN105404048A (en) | Liquid crystal display apparatus | |
| CN106711074A (en) | Substrate processing equipment and alignment control method of to-be-processed substrate | |
| US10365523B2 (en) | Display panel and manufacturing method based on BOA technology | |
| CN105182697A (en) | On Cell structure touch display screen and manufacturing method thereof and display device | |
| CN107608126A (en) | A kind of liquid crystal display panel and its manufacture method | |
| US20180188597A1 (en) | Color filter substrate, method for manufacturing the same and display device | |
| CN106896571A (en) | The preparation method of color membrane substrates and the preparation method of liquid crystal panel | |
| CN102129136A (en) | Color filter substrate structure of liquid crystal display and manufacturing method thereof | |
| US10578784B2 (en) | Color-filter on array (COA) display panel, manufacturing method thereof and COA display device | |
| DE19520626A1 (en) | Projection device with compact, high resolution LCD panel and tiny pixel electrodes | |
| US10852578B2 (en) | Liquid crystal display panel and manufacturing method thereof | |
| KR20080003108A (en) | Color filter substrate of liquid crystal display device and method for fabricating the same | |
| CN104155795A (en) | Method for manufacturing pairing marks of CF substrate | |
| CN101226316B (en) | Method for preparing substrate of LCD | |
| US9880434B2 (en) | Array substrate, display panel, display device and method of repairing display panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee after: TCL China Star Optoelectronics Technology Co.,Ltd. Address before: 9-2 Tangming Avenue, Guangming New District, Shenzhen City, Guangdong Province Patentee before: Shenzhen China Star Optoelectronics Technology Co.,Ltd. |
|
| CP01 | Change in the name or title of a patent holder |