CN110133892A - The manufacturing method of display panel, display device and display panel - Google Patents
The manufacturing method of display panel, display device and display panel Download PDFInfo
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- CN110133892A CN110133892A CN201910470424.7A CN201910470424A CN110133892A CN 110133892 A CN110133892 A CN 110133892A CN 201910470424 A CN201910470424 A CN 201910470424A CN 110133892 A CN110133892 A CN 110133892A
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- hole
- collimation
- membrane substrates
- color membrane
- black matrix
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/13338—Input devices, e.g. touch panels
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133354—Arrangements for aligning or assembling substrates
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133357—Planarisation layers
Abstract
The present invention provides the manufacturing method of a kind of display panel, display device and display panel.Display panel includes: the array substrate being oppositely arranged and color membrane substrates;Positioned at color membrane substrates close to the first alignment mark of array substrate side;Positioned at array substrate close to the fingerprint Identification sensor of color membrane substrates side;Positioned at color membrane substrates close to the first black matrix" of array substrate side;Positioned at the first black matrix" close to the first planarization layer of array substrate side;Wherein, the first black matrix" includes the first collimation through-hole, and the first planarization layer includes the first contraposition through-hole;Orthographic projection and fingerprint Identification sensor orthographic projection on color membrane substrates of the first collimation through-hole on color membrane substrates is overlapping, the first black matrix" the first alignment mark of exposure and first contraposition through-hole the first alignment mark of exposure.In the present invention, the first alignment mark on the first contraposition through-hole exposure color membrane substrates in the first planarization layer, to form smooth subsequent film referring to the first alignment mark after forming the first planarization layer.
Description
[technical field]
The present invention relates to the manufactures of field of display technology more particularly to a kind of display panel, display device and display panel
Method.
[background technique]
Currently, as a kind of information input tool to be widely used in mobile phone, tablet computer, public place big for display panel
In the various display products such as the information enquiry machine in the Room.A kind of side of the fingerprint identification technology as user identity authentication and access control
Formula the advantages of due to it with high security and is widely used in display panel.
Fig. 1 is the structural schematic diagram of prior art display panel 100.
As shown in Figure 1, in the prior art, display panel 100 includes array substrate 110A, color membrane substrates 110B, first
Alignment mark 120, fingerprint Identification sensor 130, black matrix" 140, planarization layer 150.Black matrix" 140 includes collimation through-hole
141.Planarization layer 150 covers the first alignment mark 120.But (it is micro- to be greater than 2 when the thickness of planarization layer 150 is larger
Rice) when, the light transmittance of planarization layer 150 is very low (being, for example, less than 10%), and planarization layer 150 covers the first alignment mark 120, with
First alignment mark 120 when manufacturing subsequent film on planarization layer 150 is caused to cannot be used for reference to contraposition.
[summary of the invention]
In order to solve the above technical problem, the present invention provides the manufactures of a kind of display panel, display device and display panel
Method.
In a first aspect, the present invention provides a kind of display panel, comprising:
The array substrate and color membrane substrates being oppositely arranged;
Positioned at the color membrane substrates close to the first alignment mark of the array substrate side;
Positioned at the array substrate close to the fingerprint Identification sensor of the color membrane substrates side;
Positioned at the color membrane substrates close to the first black matrix" of the array substrate side;
Positioned at first black matrix" close to the first planarization layer of the array substrate side;
Wherein, first black matrix" includes the first collimation through-hole, and first planarization layer includes that the first contraposition is logical
Hole;
Orthographic projection and the fingerprint Identification sensor of the first collimation through-hole on the color membrane substrates are in the coloured silk
Orthographic projection in ilm substrate is overlapping, the first black matrix" exposure first alignment mark and the first contraposition through-hole
Exposure first alignment mark.
Optionally, the display panel further include: positioned at first planarization layer close to the array substrate side
Second black matrix", positioned at second black matrix" close to the second planarization layer of the array substrate side;
Second black matrix" includes the second collimation through-hole;
Orthographic projection and the first collimation through-hole of the second collimation through-hole on the color membrane substrates are in the color film
Orthographic projection on substrate is overlapping.
Optionally, the distance between the first collimation through-hole and the second collimation through-hole are greater than 6 microns and are less than
15 microns, the aperture of the first collimation through-hole and described second collimates the aperture of through-hole both greater than or equal to 4 microns.
Optionally, the second black matrix" exposure first alignment mark;
Second planarization layer includes the second contraposition through-hole;
Orthographic projection and the first contraposition through-hole of the second contraposition through-hole on the color membrane substrates are in the color film
Orthographic projection on substrate is overlapping.
Optionally, the second black matrix" exposure first alignment mark, the thickness of second planarization layer are small
In 2 microns.
Optionally, the display panel further include: positioned at first planarization layer close to the array substrate side
Second alignment mark;
Orthographic projection of second alignment mark on the color membrane substrates and first alignment mark are in the color film
Orthographic projection on substrate does not overlap.
Optionally, the display panel further include: positioned at second planarization layer close to the array substrate side
Third black matrix", positioned at the third black matrix" close to the third planarization layer of the array substrate side;
The third black matrix" includes third collimation through-hole;
Orthographic projection and the first collimation through-hole of the third collimation through-hole on the color membrane substrates are in the color film
Orthographic projection on substrate is overlapping.
Optionally, the third black matrix" exposure first alignment mark;
The third planarization layer includes third contraposition through-hole;
Orthographic projection and the first contraposition through-hole of the third contraposition through-hole on the color membrane substrates are in the color film
Orthographic projection on substrate is overlapping.
Optionally, the third black matrix" exposure first alignment mark, the thickness of the third planarization layer are small
In 2 microns.
Optionally, the distance between the first collimation through-hole and third collimation through-hole are greater than 15 microns and are less than
25 microns, the aperture of the first collimation through-hole, the aperture of the second collimation through-hole and the third collimate the aperture of through-hole
Both greater than or equal to 4 microns.
Optionally, the display panel further include: viewing area and the non-display area around the viewing area;
The fingerprint Identification sensor is located at the viewing area, and first alignment mark is located at the non-display area.
Second aspect, the present invention provide a kind of display device, including the display panel.
The third aspect, the present invention provide a kind of manufacturing method of display panel, and the manufacturing method of the display panel is used for
Display panel is manufactured, the display panel includes: the array substrate being oppositely arranged and color membrane substrates, is leaned on positioned at the array substrate
The fingerprint Identification sensor of the nearly color membrane substrates side;
The manufacturing method of the display panel includes:
The first black matrix" and the first alignment mark are formed in the color membrane substrates close to the array substrate side;
The first planarization layer is formed in first black matrix" close to the array substrate side;
The first contraposition through-hole is formed in first planarization layer;
Wherein, first black matrix" includes the first collimation through-hole, and the first collimation through-hole is in the color membrane substrates
On orthographic projection and orthographic projection of the fingerprint Identification sensor on the color membrane substrates it is overlapping, the first contraposition through-hole is sudden and violent
Reveal first alignment mark.
Optionally, the manufacturing method of the display panel further include:
The second black matrix" is formed in first planarization layer close to the array substrate side;
The second planarization layer is formed in second black matrix" close to the array substrate side;
Wherein, second black matrix" includes the second collimation through-hole, and the second collimation through-hole is in the color membrane substrates
On orthographic projection and the orthographic projection of the first collimation through-hole on the color membrane substrates it is overlapping.
Optionally, the manufacturing method of the display panel further include:
The second contraposition through-hole is formed in second planarization layer;
Wherein, orthographic projection of the second contraposition through-hole on the color membrane substrates is with the first contraposition through-hole described
Orthographic projection on color membrane substrates is overlapping.
In the present invention, array substrate and color membrane substrates are oppositely arranged, and the first alignment mark is located at color membrane substrates close to battle array
Column substrate side, the first black matrix" are located at color membrane substrates close to array substrate side.Fingerprint Identification sensor is located at array base
For plate close to color membrane substrates side, the first black matrix" includes the first collimation through-hole, the first collimation through-hole on color membrane substrates just
The orthographic projection of projection and fingerprint Identification sensor on color membrane substrates is overlapping;When finger contact display panel is close to color membrane substrates one
When the surface of side, towards display panel close to the surface emitting light of color membrane substrates side, emergent ray reaches aobvious display panel
Show panel close to the surface of color membrane substrates side, finger is towards array substrate close to color membrane substrates side reflection light, reflected light
Line reaches fingerprint Identification sensor by the first collimation through-hole, refers to so that fingerprint Identification sensor receives collimated ray and then realizes
Line identification.First planarization layer is located at the first black matrix" close to array substrate side, and the first planarization layer includes the first contraposition
Through-hole, the first black matrix" the first alignment mark of exposure and first contraposition through-hole the first alignment mark of exposure;First planarization
Layer is located on the first black matrix", the first black matrix" of the first planarization layer overlay pattern, so as in the first planarization layer
It is upper to form smooth subsequent film;First black matrix" and the first contraposition through-hole all expose the first alignment mark, the first register guide
Note in the first planarization layer far from being visible at the first black matrix" side, so as to the reference the after forming the first planarization layer
One alignment mark forms subsequent film.
[Detailed description of the invention]
In order to illustrate the technical solution of the embodiments of the present invention more clearly, below will be to needed in the embodiment attached
Figure is briefly described, it should be apparent that, drawings in the following description are only some embodiments of the invention, for this field
For those of ordinary skill, without creative efforts, it can also be obtained according to these attached drawings other attached drawings.
Fig. 1 is the structural schematic diagram of prior art display panel 100;
Fig. 2 is the structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 3 is another structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 4 is another structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 5 A is another structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 5 B is another structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 6 is another structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 7 is another structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 8 is another structural schematic diagram of display panel of the embodiment of the present invention 200;
Fig. 9 is the structural schematic diagram of display device of the embodiment of the present invention 300;
Figure 10 is the process schematic of the manufacturing method 400 of display panel of the embodiment of the present invention;
Figure 11 is another process schematic of the manufacturing method 400 of display panel of the embodiment of the present invention;
Figure 12 is another process schematic of the manufacturing method 400 of display panel of the embodiment of the present invention.
[specific embodiment]
For a better understanding of the technical solution of the present invention, being retouched in detail to the embodiment of the present invention with reference to the accompanying drawing
It states.
It will be appreciated that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Base
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts it is all its
Its embodiment, shall fall within the protection scope of the present invention.
The term used in embodiments of the present invention is only to be not intended to be limiting merely for for the purpose of describing particular embodiments
The present invention.In the embodiment of the present invention and the "an" of singular used in the attached claims, " described " and "the"
It is also intended to including most forms, unless the context clearly indicates other meaning.
It should be appreciated that term "and/or" used herein is only a kind of incidence relation for describing affiliated partner, indicate
There may be three kinds of relationships, for example, A and/or B, can indicate: individualism A, exist simultaneously A and B, individualism B these three
Situation.In addition, character "/" herein, typicallys represent the relationship that forward-backward correlation object is a kind of "or".
It will be appreciated that though device may be described in embodiments of the present invention using term first, second etc., but these
Device should not necessarily be limited by these terms.These terms are only used to for device being distinguished from each other out.For example, not departing from the embodiment of the present invention
In the case where range, first device can also be referred to as second device, and similarly, second device can also be referred to as the first dress
It sets.
The embodiment of the present invention provides the manufacturing method of a kind of display panel, display device and display panel.
Fig. 2 is the structural schematic diagram of display panel of the embodiment of the present invention 200.
As shown in Fig. 2, display panel 200 includes: the array substrate 210 being oppositely arranged and color membrane substrates 220;Positioned at color film
First alignment mark 242 of the substrate 220 close to 210 side of array substrate;Positioned at array substrate 210 close to color membrane substrates 220 1
The fingerprint Identification sensor 230 of side;Positioned at color membrane substrates 220 close to the first black matrix" 240 of 210 side of array substrate;Position
In the first black matrix" 240 close to the first planarization layer 250 of 210 side of array substrate;Wherein, the first black matrix" 240 wraps
The first collimation through-hole 241 is included, the first planarization layer 250 includes the first contraposition through-hole 251;First collimation through-hole 241 is in color film base
Orthographic projection and orthographic projection of the fingerprint Identification sensor 230 on color membrane substrates 220 on plate 220 is overlapping, the first black matrix" 240
The first alignment mark of exposure 242 and the first contraposition the first alignment mark 242 of exposure of through-hole 251.
Herein, the overlapping part superposition for referring to two orthographic projections of two orthographic projections or the whole weight of two orthographic projections
It closes.
In embodiments of the present invention, array substrate 210 and color membrane substrates 220 are oppositely arranged, and the first alignment mark 242 is located at
For color membrane substrates 220 close to 210 side of array substrate, the first black matrix" 240 is located at color membrane substrates 220 close to array substrate 210
Side;First black matrix" 240 and the first alignment mark 242 are by being once patterned and formed on color membrane substrates 220.Fingerprint is known
Individual sensor 230 is located at array substrate 210 close to 220 side of color membrane substrates, and the first black matrix" 240 includes the first collimation through-hole
241, first collimation through-hole 241 on color membrane substrates 220 orthographic projection and fingerprint Identification sensor 230 on color membrane substrates 220
Orthographic projection it is overlapping;When finger contact display panel 200 is close to the surface of 220 side of color membrane substrates, 200 direction of display panel
Display panel 200 is close to the surface emitting light of 220 side of color membrane substrates, and emergent ray arrival display panel 200 is close to color film
The surface of 220 side of substrate, towards array substrate 210 close to 220 side reflection light of color membrane substrates, reflection light passes through finger
First collimation through-hole 241 reaches fingerprint Identification sensor 230, so that fingerprint Identification sensor 230 receives collimated ray and then reality
Existing fingerprint recognition.First planarization layer 250 is located at the first black matrix" 240 close to 210 side of array substrate, the first planarization layer
250 include the first contraposition through-hole 251, the first black matrix" 240 exposure the first alignment mark 242 and the first contraposition through-hole 251
The first alignment mark 242 of exposure;First planarization layer 250 is located on the first black matrix" 240, the covering of the first planarization layer 250
Patterned first black matrix" 240, to form smooth subsequent film on the first planarization layer 250;First black square
Battle array 240 and the first contraposition through-hole 251 all expose the first alignment mark 242, and the first alignment mark 242 is in the first planarization layer 250
Far from being visible at 240 side of the first black matrix", so as to the first alignment mark of reference after forming the first planarization layer 250
242 form smooth subsequent film.
Fig. 3 is another structural schematic diagram of display panel of the embodiment of the present invention 200.
As shown in figure 3, display panel 200 further include: positioned at the first planarization layer 250 close to 210 side of array substrate
Second black matrix" 260, positioned at the second black matrix" 260 close to the second planarization layer 270 of 210 side of array substrate;Second
Black matrix" 260 includes the second collimation through-hole 261;Orthographic projection and first of the second collimation through-hole 261 on color membrane substrates 220 are quasi-
Orthographic projection of the clear opening 241 on color membrane substrates 220 is overlapping.
In embodiments of the present invention, the second black matrix" 260 is located at the first planarization layer 250 close to array substrate 210 1
Side, the first alignment mark 242 are visible at 210 side of array substrate in the first planarization layer 250, the second black matrix"
260 the first alignment marks 242 of reference are by being patterned and formed on the first planarization layer 250, so that the second black matrix" 260 is right
Quasi- predetermined position, in case the second black matrix" 260 is out of position.Second collimation through-hole 261 on color membrane substrates 220 just
Projection and orthographic projection of the first collimation through-hole 241 on color membrane substrates 220 are overlapping;First collimation through-hole 241 is in color membrane substrates 220
On orthographic projection and orthographic projection of the fingerprint Identification sensor 230 on color membrane substrates 220 it is overlapping;When finger contacts display panel
200 close to the surface of 220 side of color membrane substrates when, display panel 200 is towards display panel 200 close to 220 side of color membrane substrates
Surface emitting light, emergent ray reaches display panel 200 close to the surface of 220 side of color membrane substrates, and finger is towards array
Substrate 210 passes through the first collimation through-hole 241 and the second collimation through-hole close to 220 side reflection light of color membrane substrates, reflection light
261 reach fingerprint Identification sensor 230, so that fingerprint Identification sensor 230 receives collimated ray and then realizes fingerprint recognition;The
Surely clear opening 241, the first planarization layer 250 and the second collimation through-hole 261 constitute a collimating structure, this collimating structure
Bore is equal to the aperture of the first collimation through-hole 241 or the aperture of the second collimation through-hole 261, the depth of this collimating structure are equal to
The sum of the depth of first collimation through-hole 241, the thickness of the first planarization layer 250 and depth of the second collimation through-hole 261, this is quasi-
The ratio between the depth of straight structure and bore are greater than the ratio between depth and aperture of the first collimation through-hole 241, so that the light of finger reflection
It is improved by the collimation of the first collimation through-hole 241 and the second collimation through-hole 261, to improve fingerprint recognition performance.Second is flat
Smoothization layer 270 is located at the second black matrix" 260 close to 210 side of array substrate, and the of 270 overlay pattern of the second planarization layer
Two black matrix"s 260, to form smooth subsequent film on the second planarization layer 270.
As shown in figure 3, the distance between the first collimation through-hole 241 and the second collimation through-hole 261 are greater than 6 microns and are less than
15 microns, the aperture of the first collimation through-hole 241 and second collimates the aperture of through-hole 261 both greater than or equal to 4 microns.
In embodiments of the present invention, the distance between the first collimation through-hole 241 and the second collimation through-hole 261 are greater than 6 microns
And less than 15 microns, the aperture of the aperture of the first collimation through-hole 241 and the second collimation through-hole 261 is both greater than or micro- equal to 4
Rice, for example, the aperture of the first collimation through-hole 241 and the aperture of the second collimation through-hole 261 are both greater than or equal to 4 microns and small
In or equal to 10 microns;The distance between first collimation through-hole 241 and the second collimation through-hole 261 are approximately equal to the first planarization
The thickness of layer 250, the first collimation through-hole 241, the first planarization layer 250 and the second collimation through-hole 261 constitute a collimating structure,
The ratio between the depth of this collimating structure and bore are fallen in the range of 3:1 to 10:1, it be greater than the depth of single collimation through-hole with
The ratio between aperture, so that the light of finger reflection is further by the collimation of the first collimation through-hole 241 and the second collimation through-hole 261
It improves, to improve fingerprint recognition performance.
As shown in figure 3, the second black matrix" 260 exposes the first alignment mark 242;Second planarization layer 270 includes second
Align through-hole 271;Orthographic projection of the second contraposition through-hole 271 on color membrane substrates 220 is with the first contraposition through-hole 251 in color membrane substrates
Orthographic projection on 220 is overlapping.
In embodiments of the present invention, the first alignment mark 242 of the second black matrix" 260 exposure;Meanwhile second planarization layer
270 include the second contraposition through-hole 271, orthographic projection of the second contraposition through-hole 271 on color membrane substrates 220 and the first contraposition through-hole
251 orthographic projection on color membrane substrates 220 is overlapping;First contraposition the first alignment mark 242 of exposure of through-hole 251;Second contraposition is logical
Hole 271 also exposes the first alignment mark 242;First alignment mark 242 is in the second planarization layer 270 far from the second black matrix"
Be visible at 260 sides, so as to after forming the second planarization layer 270 referring to the first alignment mark 242 formed it is smooth after
Continuous film layer.
Fig. 4 is another structural schematic diagram of display panel of the embodiment of the present invention 200.
As shown in figure 4, the second black matrix" 260 exposes the first alignment mark 242, the thickness of the second planarization layer 270 is small
In 2 microns.
In embodiments of the present invention, the thickness of the second planarization layer 270 is less than 2 microns;The thickness of second planarization layer 270
Smaller, the light transmittance of the second planarization layer 270 is very high, the second planarization layer 270 the first alignment mark 242 of exposure;Meanwhile second
Black matrix" 260 exposes the first alignment mark 242;First alignment mark 242 is in the second planarization layer 270 far from the second black square
Battle array is visible at 260 sides, smooth to be formed after forming the second planarization layer 270 referring to the first alignment mark 242
Subsequent film.Second planarization layer 270 does not have to contraposition through-hole the first alignment mark 242 of exposure, in order to avoid in the second planarization layer 270
Place forms contraposition through-hole, to simplify the manufacture of the second planarization layer 270.
Fig. 5 A is another structural schematic diagram of display panel of the embodiment of the present invention 200;Fig. 5 B is that the embodiment of the present invention is shown
Another structural schematic diagram of panel 200.
As shown in Fig. 5 A, 5B, display panel 200 further include: be located at the first planarization layer 250 close to array substrate 210 1
Second alignment mark 262 of side;Orthographic projection of second alignment mark 262 on color membrane substrates 220 and the first alignment mark 242 exist
Orthographic projection on color membrane substrates 220 does not overlap.
As shown in Figure 5A, the second alignment mark 262 of the second black matrix" 260 exposure;Second planarization layer 270 includes the 4th
Align through-hole 272;4th contraposition the second alignment mark 262 of exposure of through-hole 272.
In embodiments of the present invention, the second black matrix" 260 is formed in the second alignment mark 262 by once patterning
First planarization layer 250 is close to 210 side of array substrate;Second planarization layer 270 include the 4th contraposition through-hole 272, the 4th pair
Position the second alignment mark 262 of exposure of through-hole 272, orthographic projection of second alignment mark 262 on color membrane substrates 220 and the first contraposition
Orthographic projection of the label 242 on color membrane substrates 220 does not overlap;When the second planarization layer 270 covers the first alignment mark 242,
4th contraposition the second alignment mark 262 of exposure of through-hole 272, meanwhile, the second black matrix" 260 the second alignment mark 262 of exposure, the
Two alignment marks 262 in the second planarization layer 270 far from being visible at 260 side of the second black matrix", to form the
Smooth subsequent film is formed referring to the second alignment mark 262 after two planarization layers 270.
As shown in Figure 5 B, the second alignment mark 262 of the second black matrix" 260 exposure;The thickness of second planarization layer 270 is small
In 2 microns.
In embodiments of the present invention, the second black matrix" 260 is formed in the second alignment mark 262 by once patterning
First planarization layer 250 is close to 210 side of array substrate;The thickness of second planarization layer 270 is less than 2 microns, the second register guide
Note 262 is not overlapped in the orthographic projection on color membrane substrates 220 with orthographic projection of first alignment mark 242 on color membrane substrates 220;The
Two planarization layers 270 exposure the first alignment mark 242 and the second alignment mark 262, meanwhile, the second black matrix" 260 exposure the
One alignment mark 242 and the second alignment mark 262, the first alignment mark 242 and the second alignment mark 262 are in the second planarization layer
270 at 260 side of the second black matrix" far from being visible, to align after forming the second planarization layer 270 referring to first
Label 242 or the second alignment mark 262 form smooth subsequent film.
Fig. 6 is another structural schematic diagram of display panel of the embodiment of the present invention 200.
As shown in fig. 6, display panel 200 further include: positioned at the second planarization layer 270 close to 210 side of array substrate
Third black matrix" 280, positioned at third black matrix" 280 close to the third planarization layer 290 of 210 side of array substrate;Third
Black matrix" 280 includes that third collimates through-hole 281;Third collimates orthographic projection of the through-hole 281 on color membrane substrates 220 and the first standard
Orthographic projection of the clear opening 241 on color membrane substrates 220 is overlapping.
In embodiments of the present invention, third black matrix" 280 is located at the second planarization layer 270 close to array substrate 210 1
Side, the first alignment mark 242 are visible at 210 side of array substrate in the second planarization layer 270, third black matrix"
280 the first alignment marks 242 of reference are by being patterned and formed on the second planarization layer 270, so that third black matrix" 280 is right
Quasi- predetermined position, in case third black matrix" 280 is out of position.Third collimate through-hole 281 on color membrane substrates 220 just
Projection and orthographic projection of the first collimation through-hole 241 on color membrane substrates 220 are overlapping;First collimation through-hole 241 is in color membrane substrates 220
On orthographic projection, the second orthographic projection of the collimation through-hole 261 on color membrane substrates 220, fingerprint Identification sensor 230 is in color membrane substrates
Orthographic projection on 220 is overlapping;When finger contact display panel 200 is close to the surface of 220 side of color membrane substrates, display panel
200 towards display panel 200 close to the surface emitting light of 220 side of color membrane substrates, emergent ray reaches display panel 200 and leans on
The surface of nearly 220 side of color membrane substrates, finger is towards array substrate 210 close to 220 side reflection light of color membrane substrates, reflected light
Line collimates through-hole 261 by the first collimation through-hole 241, second and third collimates through-hole 281 and reaches fingerprint Identification sensor 230,
So that fingerprint Identification sensor 230 receives collimated ray and then realizes fingerprint recognition;First collimation through-hole 241, first planarizes
Layer 250, second collimates through-hole 261, the second planarization layer 270, third collimation through-hole 281 and constitutes a collimating structure, this is quasi-
The bore of straight structure is equal to the aperture of the first collimation through-hole 241, the aperture of the second collimation through-hole 261 or third and collimates through-hole
281 aperture, the depth of this collimating structure be equal to the depth of the first collimation through-hole 241, the first planarization layer 250 thickness,
The sum of the depth of second collimation through-hole 261, the thickness of the second planarization layer 270 and depth of third collimation through-hole 281, this is quasi-
The ratio between the depth of straight structure and bore are greater than the ratio between depth and aperture of single collimation through-hole, so that the light of finger reflection passes through
First collimation through-hole 241, second collimates through-hole 261 and the collimation of third collimation through-hole 281 improves, to improve fingerprint recognition
Performance.Third planarization layer 290 is located at third black matrix" 280 close to 210 side of array substrate, and third planarization layer 290 covers
Patterned third black matrix" 280 is covered, to form smooth subsequent film on third planarization layer 290.
As shown in fig. 6, third black matrix" 280 exposes the first alignment mark 242;Third planarization layer 290 includes third
Align through-hole 291;Third aligns orthographic projection of the through-hole 291 on color membrane substrates 220 with the first contraposition through-hole 251 in color membrane substrates
Orthographic projection on 220 is overlapping.
In embodiments of the present invention, first alignment mark 242 of the exposure of third black matrix" 280;Meanwhile third planarization layer
290 include that third aligns through-hole 291, and third aligns orthographic projection of the through-hole 291 on color membrane substrates 220 and the first contraposition through-hole
251 orthographic projection on color membrane substrates 220 is overlapping;Orthographic projection and first pair of the second contraposition through-hole 271 on color membrane substrates 220
Orthographic projection of the position through-hole 251 on color membrane substrates 220 is overlapping, the first contraposition the first alignment mark 242 of exposure of through-hole 251;First
It aligns through-hole 251, second and aligns through-hole 271 and all exposed first alignment mark 242 of third contraposition through-hole 291;First register guide
Note 242 in third planarization layer 290 far from being visible at 280 side of third black matrix", to form third planarization
Smooth subsequent film is formed referring to the first alignment mark 242 after layer 290.
Fig. 7 is another structural schematic diagram of display panel of the embodiment of the present invention 200.
As shown in fig. 7, third black matrix" 280 exposes the first alignment mark 242, the thickness of third planarization layer 290 is small
In 2 microns.
In embodiments of the present invention, the thickness of third planarization layer 290 is less than 2 microns;The thickness of third planarization layer 290
Smaller, the light transmittance of third planarization layer 290 is very high, the first alignment mark 242 of exposure of third planarization layer 290;Meanwhile third
Black matrix" 280 exposes the first alignment mark 242;First alignment mark 242 is in third planarization layer 290 far from third black square
Battle array is visible at 280 sides, smooth to be formed after forming third planarization layer 290 referring to the first alignment mark 242
Subsequent film.Third planarization layer 290 does not have to contraposition through-hole the first alignment mark 242 of exposure, in order to avoid in third planarization layer 290
Place forms contraposition through-hole, to simplify the manufacture of third planarization layer 290.
As shown in fig. 7, the distance between the first collimation through-hole 241 and third collimation through-hole 281 are greater than 15 microns and small
In 25 microns, the aperture in the aperture of the first collimation through-hole 241, the aperture of the second collimation through-hole 261 and third collimation through-hole 281 is all
More than or equal to 4 microns.
In embodiments of the present invention, the distance between the first collimation through-hole 241 and third collimation through-hole 281 are greater than 15 microns
And less than 25 microns, the aperture of the first collimation through-hole 241, the aperture of the second collimation through-hole 261 and third collimate through-hole 281
Aperture both greater than or is equal to 4 microns, for example, the aperture and the in the aperture of the first collimation through-hole 241, the second collimation through-hole 261
The aperture of three collimation through-holes 281 is both greater than or equal to 4 microns and less than or equal to 10 microns;First collimation through-hole 241
The distance between third collimation through-hole 281 is approximately equal to the thickness of the first planarization layer 250 and the thickness of the second planarization layer 270
The sum of degree, the first collimation through-hole 241, the first planarization layer 250, second collimation through-hole 261, the second planarization layer 270 and third
It collimates through-hole 281 and constitutes a collimating structure, so that the light of finger reflection is logical by the first collimation collimation of through-hole 241, second
The spot diameter of hole 261 and third collimation through-hole 281 is fallen in the range of 200 microns to 500 microns, so that the light of finger reflection
Line falls in 12 ° extremely by the beam divergence angle that the first collimation through-hole 241, second collimates through-hole 261 and third collimation through-hole 281
In the range of 30 °, further to improve fingerprint recognition performance.
Fig. 8 is another structural schematic diagram of display panel of the embodiment of the present invention 200.
As shown in figure 8, display panel 200 further include: the viewing area AA and non-display area NA around viewing area AA;Fingerprint is known
Individual sensor 230 is located at viewing area AA, and the first alignment mark 242 is located at non-display area NA.
In embodiments of the present invention, in the AA of viewing area, liquid crystal is provided between array substrate 210 and color membrane substrates 220
Layer LC, the first planarization layer 250 are provided with color blocking layer CF close to the side of liquid crystal layer LC, and viewing area AA is towards color membrane substrates 220
It shines far from 210 side of array substrate.Fingerprint Identification sensor 230 is located at viewing area AA, and the first collimation through-hole 241, second is quasi-
Clear opening 261 and third collimation through-hole 281 are also all located at viewing area AA;When finger contact viewing area AA is close to color membrane substrates 220
When the surface of side, finger passes through the first collimation towards the 210 side reflection light of array substrate in the AA of viewing area, reflection light
Through-hole 241, second collimates through-hole 261 and third collimation through-hole 281 reaches fingerprint Identification sensor 230, so that fingerprint recognition passes
Sensor 230 receives collimated ray and then realizes fingerprint recognition.First alignment mark 242 is located at non-display area NA, the first register guide
Note 242 will not influence the light of viewing area AA.
Optionally, display panel further includes the 4th black matrix, can be in order to realize the accurate contraposition of the 4th black matrix
Third alignment mark is arranged in three black matrix same layer positions, if third flatness layer thickness is larger, in third planarization layer setting the
Five contraposition through-hole exposure third alignment marks, if third flatness layer thickness is smaller, third alignment mark is remote in third planarization layer
From being visible at third black matrix" side, then subsequent film directly is formed referring to third alignment mark.That is, in order to
It realizes the accurate contraposition for forming subsequent black matrix film, alignment mark can be set in the black matrix same layer formed before, as right
The specific black matrix layer of position label setting and the type and quantity of alignment mark, can determine, the present invention according to actual needs
It does not limit this.
It will be appreciated by those skilled in the art that fingerprint Identification sensor 230 can be PIN type photodiode or other
Sensor;It is located in array substrate 210 although Fig. 2 to Fig. 8 only shows fingerprint Identification sensor 230, fingerprint recognition sensing
Device 230 is not in contact with array substrate 210;Array substrate 210 is disposed with buffer layer close to 220 side of color membrane substrates, partly leads
Body layer, the first insulating layer, the first metal layer, second insulating layer, second metal layer, the 4th planarization layer etc.;Array substrate 210 is leaned on
Nearly 220 side of color membrane substrates is provided with driving transistor etc., and the active area of transistor is driven to be located at semiconductor layer, drives transistor
Gate insulating layer be located at the first insulating layer, drive the grid of transistor to be located at the first metal layer, drive transistor source electrode and
Drain electrode is located at second metal layer, and the 4th planarization layer is covered in array substrate 210;When fingerprint Identification sensor 230 is PIN type
When photodiode, fingerprint Identification sensor 230 is located at semiconductor layer;Fingerprint Identification sensor 230 may be located on array base
Other positions on plate 210, here without limitation.Although liquid crystal layer LC, array substrate 210 and coloured silk is not shown in Fig. 2 to Fig. 7
Liquid crystal layer LC is provided between ilm substrate 220.
Fig. 9 is the structural schematic diagram of display device of the embodiment of the present invention 300.
As shown in figure 9, display device 300 includes display panel 200.Display device 300 is realized aobvious using display panel 200
Show, such as smart phone or similar device.Display panel 200 is as described above, repeat no more.
Figure 10 is the process schematic of the manufacturing method 400 of display panel of the embodiment of the present invention.
As shown in Fig. 2,10, the manufacturing method 400 of display panel is wrapped for manufacturing display panel 200, display panel 200
It includes: the array substrate 210 and color membrane substrates 220 being oppositely arranged, positioned at array substrate 210 close to the finger of 220 side of color membrane substrates
Line identification sensor 230;The manufacturing method 400 of display panel includes: S401, forms the first black matrix" 240 and the first contraposition
Label 242 is in color membrane substrates 220 close to 210 side of array substrate;S402 forms the first planarization layer 250 in the first black square
Battle array 240 is close to 210 side of array substrate;S403 forms the first contraposition through-hole 251 in the first planarization layer 250;Wherein, first
Black matrix" 240 includes the first collimation through-hole 241, and orthographic projection and fingerprint of the first collimation through-hole 241 on color membrane substrates 220 are known
Orthographic projection of the individual sensor 230 on color membrane substrates 220 is overlapping, the first contraposition the first alignment mark 242 of exposure of through-hole 251.
In embodiments of the present invention, array substrate 210 and color membrane substrates 220 are oppositely arranged, deposit first the first film layer in
On color membrane substrates 220, then the first film layer is patterned, formed the first black matrix" 240 and the first alignment mark 242 in
Color membrane substrates 220 are close to 210 side of array substrate.First black matrix" 240 includes the first collimation through-hole 241, and fingerprint recognition passes
Sensor 230 is located at array substrate 210 close to 220 side of color membrane substrates, the first collimation through-hole 241 on color membrane substrates 220 just
Projection is overlapping with orthographic projection of the fingerprint Identification sensor 230 on color membrane substrates 220;When finger contact display panel 200 is close
When the surface of 220 side of color membrane substrates, display panel 200 is sent out towards display panel 200 close to the surface of 220 side of color membrane substrates
Light is penetrated, emergent ray reaches display panel 200 close to the surface of 220 side of color membrane substrates, and finger is leaned on towards array substrate 210
220 side reflection light of nearly color membrane substrates, reflection light reach fingerprint Identification sensor 230 by the first collimation through-hole 241, with
So that fingerprint Identification sensor 230 is received collimated ray and then realizes fingerprint recognition.First planarization layer 250 is formed in the first black
Matrix 240 is formed in the first planarization layer 250, the first black matrix" close to 210 side of array substrate, the first contraposition through-hole 251
240 the first alignment marks of exposure 242 and the first contraposition the first alignment mark 242 of exposure of through-hole 251;First planarization layer 250
On the first black matrix" 240, the first black matrix" 240 of 250 overlay pattern of the first planarization layer, so as to flat first
Smooth subsequent film is formed on smoothization layer 250;First black matrix" 240 and the first contraposition through-hole 251 all expose the first contraposition
Label 242, the first alignment mark 242 in the first planarization layer 250 far from being visible at 240 side of the first black matrix", with
Just smooth subsequent film is formed referring to the first alignment mark 242 after forming the first planarization layer 250.
Figure 11 is another process schematic of the manufacturing method 400 of display panel of the embodiment of the present invention.
As shown in Fig. 3,11, the manufacturing method 400 of display panel further include: S404 forms the second black matrix" 260 in the
One planarization layer 250 is close to 210 side of array substrate;S405 forms the second planarization layer 270 and leans in the second black matrix" 260
Nearly 210 side of array substrate;Wherein, the second black matrix" 260 includes the second collimation through-hole 261, and the second collimation through-hole 261 is in coloured silk
Orthographic projection and orthographic projection of the first collimation through-hole 241 on color membrane substrates 220 in ilm substrate 220 is overlapping.
In embodiments of the present invention, the second film layer is deposited first in the first planarization layer 250 close to array substrate 210 1
Then side patterns the second film layer, so that the second black matrix" 260 is formed in the first planarization layer 250 close to array
210 side of substrate;First alignment mark 242 is visible at 210 side of array substrate in the first planarization layer 250, the
Two black matrix"s 260 referring to the first alignment mark 242 by being patterned and formed on the first planarization layer 250 so that second is black
Colour moment battle array 260 is directed at predetermined position, in case the second black matrix" 260 is out of position.Second black matrix" 260 includes second
Through-hole 261 is collimated, orthographic projection of the second collimation through-hole 261 on color membrane substrates 220 is with the first collimation through-hole 241 in color membrane substrates
Orthographic projection on 220 is overlapping;Orthographic projection and fingerprint Identification sensor 230 of the first collimation through-hole 241 on color membrane substrates 220 exist
Orthographic projection on color membrane substrates 220 is overlapping;When finger contact display panel 200 is close to the surface of 220 side of color membrane substrates, show
Show that surface emitting light of the panel 200 towards display panel 200 close to 220 side of color membrane substrates, emergent ray reach display surface
Plate 200 is close to the surface of 220 side of color membrane substrates, and finger is towards array substrate 210 close to 220 side reflected light of color membrane substrates
Line, reflection light reaches fingerprint Identification sensor 230 by the first collimation through-hole 241 and the second collimation through-hole 261, so that fingerprint
Identification sensor 230 receives collimated ray and then realizes fingerprint recognition;First collimation through-hole 241, the first planarization layer 250 and the
Two collimation through-holes 261 constitute a collimating structures, the bore of this collimating structure be equal to the first collimation through-hole 241 aperture or
The aperture of second collimation through-hole 261, the depth of this collimating structure are equal to the depth of the first collimation through-hole 241, the first planarization
The sum of the depth of the thickness of layer 250 and the second collimation through-hole 261, it is quasi- that the ratio between the depth of this collimating structure and bore are greater than first
The ratio between the depth of clear opening 241 and aperture, so that the light of finger reflection passes through the first collimation through-hole 241 and the second collimation through-hole
261 collimation improves, to improve fingerprint recognition performance.It is close that second planarization layer 270 is formed in the second black matrix" 260
210 side of array substrate, the second black matrix" 260 of 270 overlay pattern of the second planarization layer, so as in the second planarization layer
Smooth subsequent film is formed on 270.
As shown in Fig. 3,11, the manufacturing method 400 of display panel further include: S406 forms the second contraposition through-hole 271 in the
Two planarization layers 270;Wherein, orthographic projection of the second contraposition through-hole 271 on color membrane substrates 220 exists with the first contraposition through-hole 251
Orthographic projection on color membrane substrates 220 is overlapping.
In embodiments of the present invention, the second contraposition through-hole 271 is formed in the second planarization layer 270, the second contraposition through-hole 271
It is overlapped in the orthographic projection on color membrane substrates 220 with orthographic projection of the first contraposition through-hole 251 on color membrane substrates 220;First contraposition
Through-hole 251 exposes the first alignment mark 242;Second contraposition through-hole 271 also exposes the first alignment mark 242;Meanwhile second black
Matrix 260 exposes the first alignment mark 242;First alignment mark 242 is in the second planarization layer 270 far from the second black matrix"
Be visible at 260 sides, so as to after forming the second planarization layer 270 referring to the first alignment mark 242 formed it is smooth after
Continuous film layer.
Figure 12 is another process schematic of the manufacturing method 400 of display panel of the embodiment of the present invention.
As shown in Fig. 6,12, the manufacturing method 400 of display panel further include: S407 forms third black matrix" 280 in the
Two planarization layers 270 are close to 210 side of array substrate;S408 forms third planarization layer 290 and leans in third black matrix" 280
Nearly 210 side of array substrate;S409 forms third contraposition through-hole 291 in third planarization layer 290;Wherein, third black matrix"
280 include that third collimates through-hole 281, and third collimates orthographic projection of the through-hole 281 on color membrane substrates 220 and the first collimation through-hole
241 orthographic projection on color membrane substrates 220 is overlapping;Third black matrix" 280 exposes the first alignment mark 242;Third contraposition is logical
Hole 291 is overlapped in the orthographic projection on color membrane substrates 220 with orthographic projection of the first contraposition through-hole 251 on color membrane substrates 220.
In embodiments of the present invention, third membrane layer is deposited first in the second planarization layer 270 close to array substrate 210 1
Then side patterns third membrane layer, so that third black matrix" 280 is formed in the second planarization layer 270 close to array
210 side of substrate;First alignment mark 242 is visible at 210 side of array substrate in the second planarization layer 270, the
Three black matrix"s 280 referring to the first alignment mark 242 by being patterned and formed on the second planarization layer 270 so that third is black
Colour moment battle array 280 is directed at predetermined position, in case third black matrix" 280 is out of position.Third black matrix" 280 includes third
Through-hole 281 is collimated, third collimates orthographic projection of the through-hole 281 on color membrane substrates 220 with the first collimation through-hole 241 in color membrane substrates
Orthographic projection on 220 is overlapping;First orthographic projection of the collimation through-hole 241 on color membrane substrates 220, the second collimation through-hole 261 are in coloured silk
The orthographic projection of orthographic projection, fingerprint Identification sensor 230 on color membrane substrates 220 in ilm substrate 220 is overlapping;When finger contact is aobvious
When showing surface of the panel 200 close to 220 side of color membrane substrates, display panel 200 is towards display panel 200 close to color membrane substrates
The surface emitting light of 220 sides, emergent ray reach display panel 200 close to the surface of 220 side of color membrane substrates, finger court
To array substrate 210 close to 220 side reflection light of color membrane substrates, reflection light is collimated by the first collimation through-hole 241, second
Through-hole 261 and third collimation through-hole 281 reach fingerprint Identification sensor 230, so that fingerprint Identification sensor 230 receives collimated light
Line realizes fingerprint recognition in turn;First collimation through-hole 241, the first planarization layer 250, second collimation through-hole 261, second planarize
Layer 270, third collimation through-hole 281 constitute a collimating structure, and the bore of this collimating structure is equal to the first collimation through-hole 241
The aperture in aperture, the aperture of the second collimation through-hole 261 or third collimation through-hole 281, the depth of this collimating structure are equal to the
Surely the depth of clear opening 241, the thickness of the first planarization layer 250, the depth of the second collimation through-hole 261, the second planarization layer
The sum of the depth of 270 thickness and third collimation through-hole 281, the ratio between the depth of this collimating structure and bore are greater than single collimation
The ratio between the depth of through-hole and aperture, so that the light of finger reflection collimates 261 and of through-hole by the first collimation through-hole 241, second
The collimation that third collimates through-hole 281 improves, to improve fingerprint recognition performance.It is black that third planarization layer 290 is formed in third
Colour moment battle array 280 is close to 210 side of array substrate, the third black matrix" 280 of 290 overlay pattern of third planarization layer, so as to
Smooth subsequent film is formed on third planarization layer 290.Third contraposition through-hole 291 is formed in third planarization layer 290, the
Three contraposition through-holes 291 are in orthographic projection of the orthographic projection with the first contraposition through-hole 251 on color membrane substrates 220 on color membrane substrates 220
It is overlapping;Second contraposition through-hole 271 aligns through-hole 251 on color membrane substrates 220 with first in the orthographic projection on color membrane substrates 220
Orthographic projection is overlapping, the first contraposition the first alignment mark 242 of exposure of through-hole 251;First contraposition through-hole 251, second aligns through-hole 271
The first alignment mark 242 is all exposed with third contraposition through-hole 291;Meanwhile the first alignment mark of exposure of third black matrix" 280
242;First alignment mark 242 in third planarization layer 290 far from being visible at 280 side of third black matrix", so as to
It is formed after third planarization layer 290 and forms smooth subsequent film referring to the first alignment mark 242.
Optionally, also can be located at the first planarization layer close to array substrate side the second alignment mark, second
Orthographic projection of the alignment mark on color membrane substrates is not overlapped with orthographic projection of first alignment mark on color membrane substrates.Utilize second
Accurate contraposition when alignment mark is realized to form third black matrix.That is, to form the standard of subsequent black matrix film to realize
Alignment mark can be arranged in the black matrix same layer that is formed before in really contraposition, as the specific black matrix layer of alignment mark setting,
And the type and quantity of alignment mark, it can determine according to actual needs, which is not limited by the present invention.
In conclusion the present invention provides the manufacturing method of a kind of display panel, display device and display panel.Display panel
It include: the array substrate being oppositely arranged and color membrane substrates;Positioned at color membrane substrates close to the first alignment mark of array substrate side;
Positioned at array substrate close to the fingerprint Identification sensor of color membrane substrates side;Positioned at color membrane substrates close to the of array substrate side
One black matrix";Positioned at the first black matrix" close to the first planarization layer of array substrate side;Wherein, the first black matrix" packet
The first collimation through-hole is included, the first planarization layer includes the first contraposition through-hole;Orthographic projection of the first collimation through-hole on color membrane substrates
It is overlapping with orthographic projection of the fingerprint Identification sensor on color membrane substrates, the first black matrix" exposure the first alignment mark and first
Align through-hole the first alignment mark of exposure.In the present invention, the first contraposition through-hole exposure color membrane substrates in the first planarization layer
On the first alignment mark, to form smooth subsequent film referring to the first alignment mark after forming the first planarization layer.
The foregoing is merely illustrative of the preferred embodiments of the present invention, is not intended to limit the invention, all in essence of the invention
Within mind and principle, any modification, equivalent substitution, improvement and etc. done be should be included within the scope of the present invention.
Claims (15)
1. a kind of display panel characterized by comprising
The array substrate and color membrane substrates being oppositely arranged;
Positioned at the color membrane substrates close to the first alignment mark of the array substrate side;
Positioned at the array substrate close to the fingerprint Identification sensor of the color membrane substrates side;
Positioned at the color membrane substrates close to the first black matrix" of the array substrate side;
Positioned at first black matrix" close to the first planarization layer of the array substrate side;
Wherein, first black matrix" includes the first collimation through-hole, and first planarization layer includes the first contraposition through-hole;
Orthographic projection and the fingerprint Identification sensor of the first collimation through-hole on the color membrane substrates are in the color film base
Orthographic projection on plate is overlapping, the first black matrix" exposure first alignment mark and the first contraposition through-hole exposure
First alignment mark.
2. display panel according to claim 1, which is characterized in that further include: it is close to be located at first planarization layer
Second black matrix" of the array substrate side, positioned at second black matrix" close to the second of the array substrate side
Planarization layer;
Second black matrix" includes the second collimation through-hole;
Orthographic projection and the first collimation through-hole of the second collimation through-hole on the color membrane substrates are in the color membrane substrates
On orthographic projection it is overlapping.
3. display panel according to claim 2, which is characterized in that the first collimation through-hole and second collimation are logical
The distance between hole is greater than 6 microns and less than 15 micron, the aperture of the first collimation through-hole and the second collimation through-hole
Aperture both greater than or be equal to 4 microns.
4. display panel according to claim 2, which is characterized in that the second black matrix" exposure first contraposition
Label;
Second planarization layer includes the second contraposition through-hole;
Orthographic projection and the first contraposition through-hole of the second contraposition through-hole on the color membrane substrates are in the color membrane substrates
On orthographic projection it is overlapping.
5. display panel according to claim 2, which is characterized in that the second black matrix" exposure first contraposition
Label, the thickness of second planarization layer is less than 2 microns.
6. display panel according to claim 2, which is characterized in that further include: it is close to be located at first planarization layer
Second alignment mark of the array substrate side;
Orthographic projection of second alignment mark on the color membrane substrates and first alignment mark are in the color membrane substrates
On orthographic projection do not overlap.
7. display panel according to claim 4, which is characterized in that further include: it is close to be located at second planarization layer
The third black matrix" of the array substrate side, positioned at the third black matrix" close to the third of the array substrate side
Planarization layer;
The third black matrix" includes third collimation through-hole;
Orthographic projection and the first collimation through-hole of the third collimation through-hole on the color membrane substrates are in the color membrane substrates
On orthographic projection it is overlapping.
8. display panel according to claim 7, which is characterized in that third black matrix" exposure first contraposition
Label;
The third planarization layer includes third contraposition through-hole;
Orthographic projection and the first contraposition through-hole of the third contraposition through-hole on the color membrane substrates are in the color membrane substrates
On orthographic projection it is overlapping.
9. display panel according to claim 7, which is characterized in that third black matrix" exposure first contraposition
Label, the thickness of the third planarization layer is less than 2 microns.
10. display panel according to claim 8, which is characterized in that the first collimation through-hole and the third collimate
The distance between through-hole is greater than 15 microns and less than 25 micron, and the aperture of the first collimation through-hole, second collimation are logical
The aperture in hole and the aperture of third collimation through-hole are both greater than or equal to 4 microns.
11. display panel according to claim 1, which is characterized in that further include: viewing area and around the viewing area
Non-display area;
The fingerprint Identification sensor is located at the viewing area, and first alignment mark is located at the non-display area.
12. a kind of display device, which is characterized in that including display panel described in any one of claim 1 to 11.
13. a kind of manufacturing method of display panel, which is characterized in that the manufacturing method of the display panel is for manufacturing display surface
Plate, the display panel include: the array substrate being oppositely arranged and color membrane substrates, are located at the array substrate close to the color film
The fingerprint Identification sensor of substrate side;
The manufacturing method of the display panel includes:
The first black matrix" and the first alignment mark are formed in the color membrane substrates close to the array substrate side;
The first planarization layer is formed in first black matrix" close to the array substrate side;
The first contraposition through-hole is formed in first planarization layer;
Wherein, first black matrix" includes the first collimation through-hole, and the first collimation through-hole is on the color membrane substrates
Orthographic projection and orthographic projection of the fingerprint Identification sensor on the color membrane substrates are overlapping, the first contraposition through-hole exposure institute
State the first alignment mark.
14. the manufacturing method of display panel according to claim 13, which is characterized in that further include:
The second black matrix" is formed in first planarization layer close to the array substrate side;
The second planarization layer is formed in second black matrix" close to the array substrate side;
Wherein, second black matrix" includes the second collimation through-hole, and the second collimation through-hole is on the color membrane substrates
The orthographic projection of orthographic projection and the first collimation through-hole on the color membrane substrates is overlapping.
15. the manufacturing method of display panel according to claim 14, which is characterized in that further include:
The second contraposition through-hole is formed in second planarization layer;
Wherein, orthographic projection and the first contraposition through-hole of the second contraposition through-hole on the color membrane substrates are in the color film
Orthographic projection on substrate is overlapping.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201910470424.7A CN110133892B (en) | 2019-05-31 | 2019-05-31 | Display panel, display device, and method for manufacturing display panel |
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