CN107502865B - A kind of production method of wide-angle imaging mould group optical filter - Google Patents

A kind of production method of wide-angle imaging mould group optical filter Download PDF

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CN107502865B
CN107502865B CN201710723855.0A CN201710723855A CN107502865B CN 107502865 B CN107502865 B CN 107502865B CN 201710723855 A CN201710723855 A CN 201710723855A CN 107502865 B CN107502865 B CN 107502865B
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optical filter
film
substrate
wide
mould group
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CN107502865A (en
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范辛
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Suzhou Jing Bang Photoelectric Polytron Technologies Inc
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Suzhou Jing Bang Photoelectric Polytron Technologies Inc
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24Vacuum evaporation
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08Oxides
    • C23C14/083Oxides of refractory metals or yttrium
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10Glass or silica
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters

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  • Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Optical Filters (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

The present invention relates to optical filter processing technology fields, disclose a kind of production method of wide-angle imaging mould group optical filter, the following steps are included: 1) baseplate material selects: using the following resin film material of 0.1mm thickness and the 0.21mm thickness smalt as substrate, 2) Coating Materials selects: using the quartzy silicon ring of high-purity as low-refraction evaporation material, uses the titanium oxide of crystalline state high-purity as high refractive index evaporation material.The production method of the wide-angle imaging mould group optical filter, by using ultra-thin resin substrate and smalt as substrate, by processes such as vacuum evaporation, surface inspection, small pieces cuttings, cutting processing is carried out using automatically scanning inspection, cut-off equipment, it is tested for the property using detection devices such as Hitachi U4150 spectral photometry device, image analyzer, high-low temperature test chambers, hence it is evident that improve the colour cast and ghost problem of traditional optical filter.

Description

A kind of production method of wide-angle imaging mould group optical filter
Technical field
The present invention relates to optical filter processing technology field, specially a kind of production of wide-angle imaging mould group optical filter Method.
Background technique
CCM refers to camera module, is a kind of core devices for various novel portable picture pick-up devices;It is mainly used in The fields such as mobile phone, laptop, tablet computer, smart home, vehicle-mounted, VR/AR and security monitoring, with traditional camera system phase Than having many advantages, such as miniaturization, low power consumption, low cost, high image quality.
The imaging process of camera is exactly by the digitized process of optical signal.Light passes through camera lens first, reaches photosensitive member Part may be CCD or CMOS, and the effect of the two is all to convert light into digital signal, and then digital signal is transmitted To a special outer reason device (DSP), be transferred to after picture signal enhancing and compression optimization again mobile phone or other deposit It stores up in equipment.Camera module is mainly by camera lens (lens), sensor (sensor), back-end image processing chip (Backend IC), four parts of soft board (FPC) form.The most important factor critical component for determining a camera quality is exactly: camera lens, Optical filter, imaging sensor and digital signal processing chip.
On daytime, due to including visible light and infrared light in the light of nature, when these light enter video camera simultaneously Camera lens, after being reflected by stationary lens, it is seen that light and infrared light will be in different target surface imaging, and visible light is imaged as colour Image, infrared light are imaged as black white image, and infrared light will form the virtual image in this target surface, thus the color of influence diagram elephant and Quality.
Cutoff filter is alternately to plate high low-refraction on optical base-substrate using precision optics coating technique Optical film realizes that visible region (400-630nm) is high thoroughly, the optical filter of infrared (700-1100nm) cut-off.Infrared cutoff Optical filter mainly has reflective and two kinds absorption: 1) reflective: to intercept infrared light using substrate plating IR rear surface reflection.Instead Intercepting for infrared light can be easy to appear as biggish offset occurs for the variation of incident angle by penetrating formula cutoff filter By the secondary imaging of reflected light, halation and ghost phenomenon are formed.2) absorption: to utilize the light absorption object being dispersed in baseplate material Quality Control lambda1-wavelength absorbs infrared light and visible light is allowed to pass through.Currently, the substrate that absorption optical filter uses is usually Smalt, i.e. phosphate glass or silicate glass, surface still need to plating IR, and effect is the transmission for further decreasing infrared light Rate.It is necessary in the optical design of pick-up lens in the case where high-end intelligent use market requires more and more thinner trend to camera module The incident light for receiving greater angle causes the bad phenomenon of conventional reflective IR optical filter more obvious.Absorption smalt IR It has clear improvement to colour cast existing for reflection optical filter and ghost problem, the softer nature of Photograph image color of shooting.
The traditional infrared edge filter IRCF technological process of production is using Germany's Xiao Te D263 glass substrate by large stretch of Cutting, ultrasonic cleaning, vacuum evaporation, small pieces cutting (may include round as a ball processing), finished product ultrasonic cleaning, product surface inspection The processes such as test.This traditional handicraft has the problems such as operating procedure is more, entirety yield is not high, production capacity is by restricting.Wherein, ultrasonic wave Cleaning and vacuum evaporation process are affected to IRCF product surface finish.With the expansion and industrial grade in the market IRCF Promotion, to product surface require it is higher and higher, some medium and small plated film enterprises be unable to satisfy high-end market requirement, for this purpose, we A kind of production method of wide-angle imaging mould group optical filter is proposed to solve the above problems.
Summary of the invention
(1) the technical issues of solving
In view of the deficiencies of the prior art, the present invention provides a kind of production method of wide-angle imaging mould group optical filter, tools The standby high advantage of product quality, solves the problems, such as the colour cast and ghost of traditional optical filter.
(2) technical solution
To realize the high purpose of the said goods quality, the invention provides the following technical scheme: a kind of 1. wide-angle imaging mould groups With the production method of optical filter, comprising the following steps:
1) baseplate material selects: use the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as Substrate.
2) Coating Materials selects: using the quartzy silicon ring of high-purity as low-refraction evaporation material, uses crystalline state The titanium oxide of high-purity is as high refractive index evaporation material.
3) surface nitrogen, which destatics, blows leaching: substrate and Coating Materials being put into clean area, then sprayed by blower by blowing Mouth, which is sprayed, blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and blowing the leaching time is 15s.
4) cleaning of plated film frock clamp: plated film frock clamp is attached using water sand blasting process removal surface before plated film Foreign particles, and carry out 350 DEG C of high-temperature bakings and ion before clamping coated basal plate and destatic processing.
5) vacuum evaporation is handled: using the following resin film material of 0.1mm thickness and 0.21mm thickness indigo plant in step 1) Glass is substrate to carry out surface vacuum IAD auxiliary vapor deposition multi-layered infrared cut-off (IR-CUT) film;Use wafer type clamping jig It is deposited under low-temperature condition, guarantees that deformation occurs during vapor deposition for substrate, using vacuum coater to step 2) In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, guarantee optical filter coating consistency, assisted using IAD low After warm vacuum evaporation 30-50 layers of infrared cut coating, until material guarantees that flatness is met the requirements, undeformed generation.
6) surface inspection and film on surface protection processing: when 0 ° → 30 ° variations of material incidence angle, guarantee △ λ (T= 50%) central wavelength drift variation should be less than 5nm;After the drift variation of △ λ (T=15%) spectral wavelength should be less than 20nm, use Laminator carries out film on surface protection.
7) once inspection is handled film layer: by material after 130 DEG C of heat runs, heating time 15-30min is seen Examine whether film layer problem of Cracking occurs.
8) film layer quadratic search is handled: the material for not occurring problem of Cracking in step 7) being carried out boiling test, boils examination The time tested is 30-60min, and whether observation film layer the problem of falling off occurs.
9) material is hung: by the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application The detection devices such as Hitachi U4150 spectral photometry device, image analyzer, high-low temperature test chamber are tested for the property, and check product light It learns performance and whether appearance meets production and require.
10) cutoff process of material: road cutting off processing after carrying out using complete-automatic check, cut-off equipment is wanted according to production It asks and carries out shape cutting off processing, complete the processing and fabricating of wide-angle imaging mould group optical filter.
11) classification and packing processes of product: being handled according to different shape cutting off processing, is used wide-angle imaging mould group Optical filter carries out labeling check-in bag packaging.
12) product warehousing: the labeling check-in packaged wide-angle imaging mould group of bag in step 11) is put in storage with optical filter Storage, MW temperature should be 15-25 DEG C.
(3) beneficial effect
Compared with prior art, the present invention provides a kind of production method of wide-angle imaging mould group optical filter, have with It is lower the utility model has the advantages that
1, the production method of the wide-angle imaging mould group optical filter, by using ultra-thin resin substrate and smalt as base Plate carries out cutting using automatically scanning inspection, cut-off equipment and adds by processes such as vacuum evaporation, surface inspection, small pieces cuttings Work is tested for the property using detection devices such as Hitachi U4150 spectral photometry device, image analyzer, high-low temperature test chambers, hence it is evident that The colour cast and ghost problem of traditional optical filter are improved, various aspects of performance can replace existing traditional glass substrate optical filter, from And the high-end intelligent use market (smart phone, mobile unit application, intelligent monitoring etc.) being growing is coped with, it brings considerable Economic benefit.
2, the production method of the wide-angle imaging mould group optical filter uses the quartz of high-purity by preferred Coating Materials Silicon ring is as low-refraction evaporation material;Use the titanium oxide of crystalline state high-purity as high refractive index evaporation material, to plated film Film Design is improved, to substantially reduce large angle incidence spectral centroid wave length shift, ensure that the high quality of product.
Specific embodiment
Below in conjunction with the embodiment of the present invention, technical solution in the embodiment of the present invention is clearly and completely retouched It states, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.Based on the present invention In embodiment, every other implementation obtained by those of ordinary skill in the art without making creative efforts Example, shall fall within the protection scope of the present invention.
Embodiment one:
A kind of production method of wide-angle imaging mould group optical filter, comprising the following steps:
1) baseplate material selects: use the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as Substrate.
2) Coating Materials selects: using the quartzy silicon ring of high-purity as low-refraction evaporation material, uses crystalline state The titanium oxide of high-purity is as high refractive index evaporation material.
3) surface nitrogen, which destatics, blows leaching: substrate and Coating Materials being put into clean area, then sprayed by blower by blowing Mouth, which is sprayed, blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and blowing the leaching time is 15s.
4) cleaning of plated film frock clamp: plated film frock clamp is attached using water sand blasting process removal surface before plated film Foreign particles, and carry out 350 DEG C of high-temperature bakings and ion before clamping coated basal plate and destatic processing.
5) vacuum evaporation is handled: using the following resin film material of 0.1mm thickness and 0.21mm thickness indigo plant in step 1) Glass is substrate to carry out surface vacuum IAD auxiliary vapor deposition multi-layered infrared cut-off (IR-CUT) film;Use wafer type clamping jig It is deposited under low-temperature condition, guarantees that deformation occurs during vapor deposition for substrate, using vacuum coater to step 2) In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, guarantee optical filter coating consistency, assisted using IAD low After warm vacuum evaporation 30-50 layers of infrared cut coating, until material guarantees that flatness is met the requirements, undeformed generation.
6) surface inspection and film on surface protection processing: when 0 ° → 30 ° variations of material incidence angle, guarantee △ λ (T= 50%) central wavelength drift variation should be less than 5nm;After the drift variation of △ λ (T=15%) spectral wavelength should be less than 20nm, use Laminator carries out film on surface protection.
7) once inspection is handled film layer: by material after 130 DEG C of heat runs, heating time 15min observes film Whether layer there is problem of Cracking.
8) film layer quadratic search is handled: the material for not occurring problem of Cracking in step 7) being carried out boiling test, boils examination The time tested is 30min, and whether observation film layer the problem of falling off occurs.
9) material is hung: by the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application The detection devices such as Hitachi U4150 spectral photometry device, image analyzer, high-low temperature test chamber are tested for the property, and check product light It learns performance and whether appearance meets production and require.
10) cutoff process of material: road cutting off processing after carrying out using complete-automatic check, cut-off equipment is wanted according to production It asks and carries out shape cutting off processing, complete the processing and fabricating of wide-angle imaging mould group optical filter.
11) classification and packing processes of product: being handled according to different shape cutting off processing, is used wide-angle imaging mould group Optical filter carries out labeling check-in bag packaging.
12) product warehousing: the labeling check-in packaged wide-angle imaging mould group of bag in step 11) is put in storage with optical filter Storage, MW temperature should be 15-25 DEG C.
Embodiment two:
A kind of production method of wide-angle imaging mould group optical filter, comprising the following steps:
1) baseplate material selects: use the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as Substrate.
2) Coating Materials selects: using the quartzy silicon ring of high-purity as low-refraction evaporation material, uses crystalline state The titanium oxide of high-purity is as high refractive index evaporation material.
3) surface nitrogen, which destatics, blows leaching: substrate and Coating Materials being put into clean area, then sprayed by blower by blowing Mouth, which is sprayed, blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and blowing the leaching time is 15s.
4) cleaning of plated film frock clamp: plated film frock clamp is attached using water sand blasting process removal surface before plated film Foreign particles, and carry out 350 DEG C of high-temperature bakings and ion before clamping coated basal plate and destatic processing.
5) vacuum evaporation is handled: using the following resin film material of 0.1mm thickness and 0.21mm thickness indigo plant in step 1) Glass is substrate to carry out surface vacuum IAD auxiliary vapor deposition multi-layered infrared cut-off (IR-CUT) film;Use wafer type clamping jig It is deposited under low-temperature condition, guarantees that deformation occurs during vapor deposition for substrate, using vacuum coater to step 2) In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, guarantee optical filter coating consistency, assisted using IAD low After warm vacuum evaporation 30-50 layers of infrared cut coating, until material guarantees that flatness is met the requirements, undeformed generation.
6) surface inspection and film on surface protection processing: when 0 ° → 30 ° variations of material incidence angle, guarantee △ λ (T= 50%) central wavelength drift variation should be less than 5nm;After the drift variation of △ λ (T=15%) spectral wavelength should be less than 20nm, use Laminator carries out film on surface protection.
7) once inspection is handled film layer: by material after 130 DEG C of heat runs, heating time 30min observes film Whether layer there is problem of Cracking.
8) film layer quadratic search is handled: the material for not occurring problem of Cracking in step 7) being carried out boiling test, boils examination The time tested is 45min, and whether observation film layer the problem of falling off occurs.
9) material is hung: by the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application The detection devices such as Hitachi U4150 spectral photometry device, image analyzer, high-low temperature test chamber are tested for the property, and check product light It learns performance and whether appearance meets production and require.
10) cutoff process of material: road cutting off processing after carrying out using complete-automatic check, cut-off equipment is wanted according to production It asks and carries out shape cutting off processing, complete the processing and fabricating of wide-angle imaging mould group optical filter.
11) classification and packing processes of product: being handled according to different shape cutting off processing, is used wide-angle imaging mould group Optical filter carries out labeling check-in bag packaging.
12) product warehousing: the labeling check-in packaged wide-angle imaging mould group of bag in step 11) is put in storage with optical filter Storage, MW temperature should be 15-25 DEG C.
Embodiment three:
A kind of production method of wide-angle imaging mould group optical filter, which comprises the following steps:
1) baseplate material selects: use the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as Substrate.
2) Coating Materials selects: using the quartzy silicon ring of high-purity as low-refraction evaporation material, uses crystalline state The titanium oxide of high-purity is as high refractive index evaporation material.
3) surface nitrogen, which destatics, blows leaching: substrate and Coating Materials being put into clean area, then sprayed by blower by blowing Mouth, which is sprayed, blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and blowing the leaching time is 15s.
4) cleaning of plated film frock clamp: plated film frock clamp is attached using water sand blasting process removal surface before plated film Foreign particles, and carry out 350 DEG C of high-temperature bakings and ion before clamping coated basal plate and destatic processing.
5) vacuum evaporation is handled: using the following resin film material of 0.1mm thickness and 0.21mm thickness indigo plant in step 1) Glass is substrate to carry out surface vacuum IAD auxiliary vapor deposition multi-layered infrared cut-off (IR-CUT) film;Use wafer type clamping jig It is deposited under low-temperature condition, guarantees that deformation occurs during vapor deposition for substrate, using vacuum coater to step 2) In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, guarantee optical filter coating consistency, assisted using IAD low After warm vacuum evaporation 30-50 layers of infrared cut coating, until material guarantees that flatness is met the requirements, undeformed generation.
6) surface inspection and film on surface protection processing: when 0 ° → 30 ° variations of material incidence angle, guarantee △ λ (T= 50%) central wavelength drift variation should be less than 5nm;After the drift variation of △ λ (T=15%) spectral wavelength should be less than 20nm, use Laminator carries out film on surface protection.
7) once inspection is handled film layer: by material after 130 DEG C of heat runs, heating time 30min observes film Whether layer there is problem of Cracking.
8) film layer quadratic search is handled: the material for not occurring problem of Cracking in step 7) being carried out boiling test, boils examination The time tested is 60min, and whether observation film layer the problem of falling off occurs.
9) material is hung: by the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application The detection devices such as Hitachi U4150 spectral photometry device, image analyzer, high-low temperature test chamber are tested for the property, and check product light It learns performance and whether appearance meets production and require.
10) cutoff process of material: road cutting off processing after carrying out using complete-automatic check, cut-off equipment is wanted according to production It asks and carries out shape cutting off processing, complete the processing and fabricating of wide-angle imaging mould group optical filter.
11) classification and packing processes of product: being handled according to different shape cutting off processing, is used wide-angle imaging mould group Optical filter carries out labeling check-in bag packaging.
12) product warehousing: the labeling check-in packaged wide-angle imaging mould group of bag in step 11) is put in storage with optical filter Storage, MW temperature should be 15-25 DEG C.
The beneficial effects of the present invention are: by using ultra-thin resin substrate and smalt as substrate, by vacuum evaporation, The processes such as surface inspection, small pieces cutting carry out cutting processing using automatically scanning inspection, cut-off equipment, using Hitachi U4150 The detection devices such as spectral photometry device, image analyzer, high-low temperature test chamber are tested for the property, hence it is evident that improve traditional optical filter Colour cast and ghost problem, various aspects of performance can replace existing traditional glass substrate optical filter, thus what reply was growing High-end intelligent use market (smart phone, mobile unit application, intelligent monitoring etc.), brings considerable economic benefit.Meanwhile it is logical Preferred Coating Materials is crossed, uses the quartzy silicon ring of high-purity as low-refraction evaporation material;Use the oxygen of crystalline state high-purity Change titanium as high refractive index evaporation material, plated film Film Design is improved, to substantially reduce large angle incidence spectrum Central wavelength drift, ensure that the high quality of product.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with A variety of variations, modification, replacement can be carried out to these embodiments without departing from the principles and spirit of the present invention by understanding And modification, the scope of the present invention is defined by the appended.

Claims (1)

1. a kind of production method of wide-angle imaging mould group optical filter, which comprises the following steps:
1) baseplate material selects: using the following resin film material of 0.1mm thickness and the 0.21mm thickness smalt as substrate;
2) Coating Materials selects: use the quartzy silicon ring of high-purity as low-refraction evaporation material, it is high-purity using crystalline state The titanium oxide of degree is as high refractive index evaporation material;
3) surface nitrogen, which destatics, blows leaching: substrate and Coating Materials being put into clean area, then spray mouth spray by blowing by blower Substrate surface is blown down by the clean nitrogen high wind of high efficiency filter out and adsorbs dust, and blowing the leaching time is 15s;
4) cleaning of plated film frock clamp: plated film frock clamp uses water sand blasting process removal surface attachment before plated film Foreign particles, and 350 DEG C of high-temperature bakings of progress and ion destatic processing before clamping coated basal plate;
5) vacuum evaporation is handled: using the following resin film material of 0.1mm thickness and 0.21mm thickness smalt in step 1) End (IR-CUT) film for substrate to carry out surface vacuum IAD auxiliary vapor deposition multi-layered infrared;Using wafer type clamping jig low It is deposited under temperature state, guarantees that deformation occurs during vapor deposition for substrate, using vacuum coater in step 2) Material carries out clamping plated film, realizes that coating film thickness is uniformly distributed, and guarantees optical filter coating consistency, true using IAD assisted cryogenic After 30-50 layers of infrared cut coating is deposited in sky, until material guarantees that flatness is met the requirements, undeformed generation;
6) surface inspection and film on surface protection processing: when 0 ° → 30 ° variations of material incidence angle, guarantee in △ λ T=50% The variation of heart wave length shift should be less than 5nm;△ λ T=15% spectral wavelength drift variation should be less than 20nm after, using laminator into The protection of row film on surface;
7) once inspection is handled film layer: by material after 130 DEG C of heat runs, heating time 15-30min observes film Whether layer there is problem of Cracking;
8) film layer quadratic search is handled: the material for not occurring problem of Cracking in step 7) is subjected to boiling test, boiling test Time is 30-60min, and whether observation film layer the problem of falling off occurs;
9) material is hung: by the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, using Hitachi The detection devices such as U4150 spectral photometry device, image analyzer, high-low temperature test chamber are tested for the property, and check that product is optical Whether energy and appearance, which meet production, requires;
10) cutoff process of material: using complete-automatic check, cut-off equipment carry out after road cutting off processing, according to production requirement into Row shape cutting off processing completes the processing and fabricating of wide-angle imaging mould group optical filter;
11) classification and packing processes of product: being handled according to different shape cutting off processing, is filtered to wide-angle imaging mould group Piece carries out labeling check-in bag packaging;
12) product warehousing: the labeling check-in packaged wide-angle imaging mould group of bag in step 11) is carried out with optical filter into inventory It puts, MW temperature should be 15-25 DEG C.
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CN110467341A (en) * 2019-09-12 2019-11-19 东莞市微科光电科技有限公司 A kind of laser cutting parameter suitable for smalt
CN111427112A (en) * 2020-03-31 2020-07-17 苏州市联超光电科技有限公司 Infrared light filter and preparation process thereof
CN112899622A (en) * 2021-01-20 2021-06-04 苏州京浜光电科技股份有限公司 Production method of dual-purpose dual-channel resin optical filter
CN112921274A (en) * 2021-01-20 2021-06-08 苏州京浜光电科技股份有限公司 Production and processing method of high-performance optical filter
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