CN107502865A - A kind of preparation method of wide-angle imaging module optical filter - Google Patents
A kind of preparation method of wide-angle imaging module optical filter Download PDFInfo
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- CN107502865A CN107502865A CN201710723855.0A CN201710723855A CN107502865A CN 107502865 A CN107502865 A CN 107502865A CN 201710723855 A CN201710723855 A CN 201710723855A CN 107502865 A CN107502865 A CN 107502865A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
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- Engineering & Computer Science (AREA)
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- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Testing Of Optical Devices Or Fibers (AREA)
- Optical Filters (AREA)
Abstract
The present invention relates to optical filter processing and fabricating technical field, discloses a kind of preparation method of wide-angle imaging module optical filter, comprises the following steps:1) selection of baseplate material:Using the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as substrate, 2) selection of Coating Materials:Using the quartzy silicon ring of high-purity as low-refraction evaporation material, high index of refraction evaporation material is used as using the titanium oxide of crystalline state high-purity.The preparation method of the wide-angle imaging module optical filter, by using ultra-thin resin substrate and smalt as substrate, by processes such as vacuum evaporation, surface inspection, small pieces cuttings, cutting processing is carried out using automatically scanning inspection, cut-out equipment, performance test is carried out using detection devices such as Hitachi U4150 spectral photometrys device, image analyzer, high-low temperature test chambers, hence it is evident that improves the colour cast and ghost problem of traditional optical filter.
Description
Technical field
The present invention relates to optical filter processing and fabricating technical field, specially a kind of making of wide-angle imaging module optical filter
Method.
Background technology
CCM refers to camera module, is a kind of core devices for various novel portable picture pick-up devices;It is mainly used in
The fields such as mobile phone, notebook computer, tablet personal computer, smart home, vehicle-mounted, VR/AR and security monitoring, with traditional camera system phase
Than having the advantages that miniaturization, low-power consumption, low cost, high image quality.
The imaging process of camera is exactly by the digitized process of optical signal.Light by camera lens, reaches photosensitive member first
Part is probably CCD, or CMOS, both effects are all to convert light into data signal, and then data signal is transmitted
The outer reason device (DSP) special to one, be transferred to again after picture signal enhancing and compression optimization mobile phone or other deposit
Store up in equipment.Camera module is mainly by camera lens (lens), sensor (sensor), back-end image process chip (Backend
IC), four parts of soft board (FPC) form.Determine that the fine or not most important factor critical component of a camera is exactly:Camera lens,
Optical filter, imaging sensor and digital signal processing chip.
On daytime, due to including visible ray and infrared light in the light of nature, when these light enter video camera simultaneously
Camera lens, after being reflected by stationary lens, it is seen that light and infrared light will be in different target surface imaging, and visible ray is imaged as colour
Image, infrared light are imaged as black white image, and infrared light will form the virtual image in this target surface, so as to influence the color of image and
Quality.
Cutoff filter is alternately to plate high low-refraction on optical base-substrate using precision optics coating technique
Optical film, realize that visible region (400-630nm) is high thoroughly, the optical filter of infrared (700-1100nm) cut-off.IR-cut
Optical filter mainly has reflective and absorption two kinds:1) it is reflective:Surface is reflected to intercept infrared light after plating IR using substrate.Instead
Formula cutoff filter is penetrated for intercepting for infrared light as larger skew occurs for the change of incident angle easily to occur
By the secondary imaging of reflected light, halation and ghost phenomenon are formed.2) it is absorption:Utilize the light absorbs thing being dispersed in baseplate material
Quality Control lambda1-wavelength, absorb infrared light and allow visible ray to pass through.At present, the substrate that absorption optical filter uses is usually
Smalt, i.e. phosphate glass or silicate glass, surface still need to plate IR, and it is the further transmission for reducing infrared light that it, which is acted on,
Rate.It is necessary in the optical design of pick-up lens under requiring the trend of more and more thinner to camera module in high-end intelligent use market
Receive the incident light of greater angle, cause the bad phenomenon of conventional reflective IR optical filters more obvious.Absorption smalt IR
Colour cast existing for reflection optical filter and ghost problem are had clear improvement, the softer nature of Photograph image color of shooting.
The traditional infrared edge filter IRCF technological process of productions are by large stretch of using German Xiao Te D263 glass substrates
Cut-out, ultrasonic wave cleaning, vacuum evaporation, small pieces cutting (round as a ball processing may be included), the cleaning of finished product ultrasonic wave, product surface inspection
The process such as test.This traditional handicraft have operating procedure is more, overall yield is not high, production capacity by restrict the problems such as.Wherein, ultrasonic wave
Cleaning and vacuum evaporation process have a great influence to IRCF product surface finish.Expansion and industrial grade with IRCF markets
Lifting, to product surface require more and more higher, some medium and small plated film enterprises can not meet high-end market requirement, therefore, we
A kind of wide-angle imaging module is proposed to be solved the above problems with the preparation method of optical filter.
The content of the invention
(1) technical problem solved
In view of the shortcomings of the prior art, the invention provides a kind of preparation method of wide-angle imaging module optical filter, tool
The advantages of standby product quality is high, solves the problems, such as the colour cast and ghost of traditional optical filter.
(2) technical scheme
To realize the high purpose of the said goods quality, the present invention provides following technical scheme:A kind of 1. wide-angle imaging module
With the preparation method of optical filter, comprise the following steps:
1) selection of baseplate material:Using the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as
Substrate.
2) selection of Coating Materials:Using high-purity quartzy silicon ring as low-refraction evaporation material, use crystalline state
The titanium oxide of high-purity is as high index of refraction evaporation material.
3) surface nitrogen, which destatics, blows leaching:Substrate and Coating Materials are put into clean area, then sprayed by blower fan by blowing
Mouth sprays blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and it is 15s to blow the leaching time.
4) cleaning of plated film frock clamp:It is attached that plated film frock clamp removes surface before plated film using water sand blasting process
The foreign particles, and 350 DEG C of high-temperature bakings of progress and ion destatic processing before clamping coated basal plate.
5) vacuum evaporation is handled:It is blue using the following resin film material of 0.1mm thickness in step 1) and 0.21mm thickness
Glass is that substrate ends (IR-CUT) film to carry out surface vacuum IAD auxiliary evaporation multi-layered infrareds;Use wafer type clamping jig
It is deposited under low-temperature condition, ensures that substrate does not deform upon during evaporation, using vacuum coater to step 2)
In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, ensure optical filter coating uniformity, aided in using IAD low
After the infrared cut coating of warm vacuum evaporation 30-50 layers, until material ensures that flatness meets to require, undeformed generation.
6) surface inspection and film on surface protection processing:When 0 ° → 30 ° changes of material incidence angle, ensure △ λ (T=
50%) centre wavelength drift change should be less than 5nm;After the drift change of △ λ (T=15%) spectral wavelength should be less than 20nm, use
Laminator carries out film on surface protection.
7) once inspection is handled film layer:By material after 130 DEG C of heat runs, its heat time is 15-30min, is seen
Examine the whether cracking problem of film layer.
8) film layer quadratic search is handled:The material of not cracking problem in step 7) is subjected to boiling test, boils examination
The time tested is 30-60min, and whether observation film layer the problem of coming off occurs.
9) material is hung:By the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application
The detection devices such as Hitachi U4150 spectral photometrys device, image analyzer, high-low temperature test chamber carry out performance test, check product light
Learn performance and whether outward appearance meets to make requirement.
10) cutoff process of material:Road cutting off processing after being carried out using complete-automatic check, cut-out equipment, will according to production
Ask and carry out profile cutting off processing, complete the processing and fabricating of wide-angle imaging module optical filter.
11) classification of product and packing processes:Handled according to different profile cutting off processing, wide-angle imaging module is used
Optical filter carries out labeling check-in bag packaging.
12) product warehousing:The labeling check-in packaged wide-angle imaging module of bag in step 11) is put in storage with optical filter
Storage, its MW temperature should be 15-25 DEG C.
(3) beneficial effect
Compared with prior art, the invention provides a kind of preparation method of wide-angle imaging module optical filter, possess with
Lower beneficial effect:
1st, the preparation method of the wide-angle imaging module optical filter, by using ultra-thin resin substrate and smalt as base
Plate, by processes such as vacuum evaporation, surface inspection, small pieces cuttings, carry out cutting using automatically scanning inspection, cut-out equipment and add
Work, performance test is carried out using detection devices such as Hitachi U4150 spectral photometrys device, image analyzer, high-low temperature test chambers, hence it is evident that
The colour cast and ghost problem of traditional optical filter are improved, various aspects of performance can substitute existing traditional glass substrate optical filter, from
And the high-end intelligent use market (smart mobile phone, mobile unit application, intelligent monitoring etc.) expanded day by day is tackled, bring considerable
Economic benefit.
2nd, the preparation method of the wide-angle imaging module optical filter, by preferred Coating Materials, the quartz of high-purity is used
Silicon ring is as low-refraction evaporation material;Using crystalline state high-purity titanium oxide as high index of refraction evaporation material, to plated film
Film Design is improved, and so as to substantially reduce large angle incidence spectral centroid wave length shift, ensure that the high quality of product.
Embodiment
Below in conjunction with embodiments of the invention, the technical scheme in the embodiment of the present invention is clearly and completely retouched
State, it is clear that described embodiment is only part of the embodiment of the present invention, rather than whole embodiments.Based on the present invention
In embodiment, the every other implementation that those of ordinary skill in the art are obtained under the premise of creative work is not made
Example, belongs to the scope of protection of the invention.
Embodiment one:
A kind of preparation method of wide-angle imaging module optical filter, comprises the following steps:
1) selection of baseplate material:Using the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as
Substrate.
2) selection of Coating Materials:Using high-purity quartzy silicon ring as low-refraction evaporation material, use crystalline state
The titanium oxide of high-purity is as high index of refraction evaporation material.
3) surface nitrogen, which destatics, blows leaching:Substrate and Coating Materials are put into clean area, then sprayed by blower fan by blowing
Mouth sprays blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and it is 15s to blow the leaching time.
4) cleaning of plated film frock clamp:It is attached that plated film frock clamp removes surface before plated film using water sand blasting process
The foreign particles, and 350 DEG C of high-temperature bakings of progress and ion destatic processing before clamping coated basal plate.
5) vacuum evaporation is handled:It is blue using the following resin film material of 0.1mm thickness in step 1) and 0.21mm thickness
Glass is that substrate ends (IR-CUT) film to carry out surface vacuum IAD auxiliary evaporation multi-layered infrareds;Use wafer type clamping jig
It is deposited under low-temperature condition, ensures that substrate does not deform upon during evaporation, using vacuum coater to step 2)
In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, ensure optical filter coating uniformity, aided in using IAD low
After the infrared cut coating of warm vacuum evaporation 30-50 layers, until material ensures that flatness meets to require, undeformed generation.
6) surface inspection and film on surface protection processing:When 0 ° → 30 ° changes of material incidence angle, ensure △ λ (T=
50%) centre wavelength drift change should be less than 5nm;After the drift change of △ λ (T=15%) spectral wavelength should be less than 20nm, use
Laminator carries out film on surface protection.
7) once inspection is handled film layer:By material after 130 DEG C of heat runs, its heat time is 15min, observes film
Layer whether cracking problem.
8) film layer quadratic search is handled:The material of not cracking problem in step 7) is subjected to boiling test, boils examination
The time tested is 30min, and whether observation film layer the problem of coming off occurs.
9) material is hung:By the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application
The detection devices such as Hitachi U4150 spectral photometrys device, image analyzer, high-low temperature test chamber carry out performance test, check product light
Learn performance and whether outward appearance meets to make requirement.
10) cutoff process of material:Road cutting off processing after being carried out using complete-automatic check, cut-out equipment, will according to production
Ask and carry out profile cutting off processing, complete the processing and fabricating of wide-angle imaging module optical filter.
11) classification of product and packing processes:Handled according to different profile cutting off processing, wide-angle imaging module is used
Optical filter carries out labeling check-in bag packaging.
12) product warehousing:The labeling check-in packaged wide-angle imaging module of bag in step 11) is put in storage with optical filter
Storage, its MW temperature should be 15-25 DEG C.
Embodiment two:
A kind of preparation method of wide-angle imaging module optical filter, comprises the following steps:
1) selection of baseplate material:Using the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as
Substrate.
2) selection of Coating Materials:Using high-purity quartzy silicon ring as low-refraction evaporation material, use crystalline state
The titanium oxide of high-purity is as high index of refraction evaporation material.
3) surface nitrogen, which destatics, blows leaching:Substrate and Coating Materials are put into clean area, then sprayed by blower fan by blowing
Mouth sprays blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and it is 15s to blow the leaching time.
4) cleaning of plated film frock clamp:It is attached that plated film frock clamp removes surface before plated film using water sand blasting process
The foreign particles, and 350 DEG C of high-temperature bakings of progress and ion destatic processing before clamping coated basal plate.
5) vacuum evaporation is handled:It is blue using the following resin film material of 0.1mm thickness in step 1) and 0.21mm thickness
Glass is that substrate ends (IR-CUT) film to carry out surface vacuum IAD auxiliary evaporation multi-layered infrareds;Use wafer type clamping jig
It is deposited under low-temperature condition, ensures that substrate does not deform upon during evaporation, using vacuum coater to step 2)
In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, ensure optical filter coating uniformity, aided in using IAD low
After the infrared cut coating of warm vacuum evaporation 30-50 layers, until material ensures that flatness meets to require, undeformed generation.
6) surface inspection and film on surface protection processing:When 0 ° → 30 ° changes of material incidence angle, ensure △ λ (T=
50%) centre wavelength drift change should be less than 5nm;After the drift change of △ λ (T=15%) spectral wavelength should be less than 20nm, use
Laminator carries out film on surface protection.
7) once inspection is handled film layer:By material after 130 DEG C of heat runs, its heat time is 30min, observes film
Layer whether cracking problem.
8) film layer quadratic search is handled:The material of not cracking problem in step 7) is subjected to boiling test, boils examination
The time tested is 45min, and whether observation film layer the problem of coming off occurs.
9) material is hung:By the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application
The detection devices such as Hitachi U4150 spectral photometrys device, image analyzer, high-low temperature test chamber carry out performance test, check product light
Learn performance and whether outward appearance meets to make requirement.
10) cutoff process of material:Road cutting off processing after being carried out using complete-automatic check, cut-out equipment, will according to production
Ask and carry out profile cutting off processing, complete the processing and fabricating of wide-angle imaging module optical filter.
11) classification of product and packing processes:Handled according to different profile cutting off processing, wide-angle imaging module is used
Optical filter carries out labeling check-in bag packaging.
12) product warehousing:The labeling check-in packaged wide-angle imaging module of bag in step 11) is put in storage with optical filter
Storage, its MW temperature should be 15-25 DEG C.
Embodiment three:
A kind of preparation method of wide-angle imaging module optical filter, it is characterised in that comprise the following steps:
1) selection of baseplate material:Using the following resin film material of 0.1mm thickness and 0.21mm thickness smalt as
Substrate.
2) selection of Coating Materials:Using high-purity quartzy silicon ring as low-refraction evaporation material, use crystalline state
The titanium oxide of high-purity is as high index of refraction evaporation material.
3) surface nitrogen, which destatics, blows leaching:Substrate and Coating Materials are put into clean area, then sprayed by blower fan by blowing
Mouth sprays blows down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, and it is 15s to blow the leaching time.
4) cleaning of plated film frock clamp:It is attached that plated film frock clamp removes surface before plated film using water sand blasting process
The foreign particles, and 350 DEG C of high-temperature bakings of progress and ion destatic processing before clamping coated basal plate.
5) vacuum evaporation is handled:It is blue using the following resin film material of 0.1mm thickness in step 1) and 0.21mm thickness
Glass is that substrate ends (IR-CUT) film to carry out surface vacuum IAD auxiliary evaporation multi-layered infrareds;Use wafer type clamping jig
It is deposited under low-temperature condition, ensures that substrate does not deform upon during evaporation, using vacuum coater to step 2)
In material carry out clamping plated film, realize that coating film thickness is uniformly distributed, ensure optical filter coating uniformity, aided in using IAD low
After the infrared cut coating of warm vacuum evaporation 30-50 layers, until material ensures that flatness meets to require, undeformed generation.
6) surface inspection and film on surface protection processing:When 0 ° → 30 ° changes of material incidence angle, ensure △ λ (T=
50%) centre wavelength drift change should be less than 5nm;After the drift change of △ λ (T=15%) spectral wavelength should be less than 20nm, use
Laminator carries out film on surface protection.
7) once inspection is handled film layer:By material after 130 DEG C of heat runs, its heat time is 30min, observes film
Layer whether cracking problem.
8) film layer quadratic search is handled:The material of not cracking problem in step 7) is subjected to boiling test, boils examination
The time tested is 60min, and whether observation film layer the problem of coming off occurs.
9) material is hung:By the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, application
The detection devices such as Hitachi U4150 spectral photometrys device, image analyzer, high-low temperature test chamber carry out performance test, check product light
Learn performance and whether outward appearance meets to make requirement.
10) cutoff process of material:Road cutting off processing after being carried out using complete-automatic check, cut-out equipment, will according to production
Ask and carry out profile cutting off processing, complete the processing and fabricating of wide-angle imaging module optical filter.
11) classification of product and packing processes:Handled according to different profile cutting off processing, wide-angle imaging module is used
Optical filter carries out labeling check-in bag packaging.
12) product warehousing:The labeling check-in packaged wide-angle imaging module of bag in step 11) is put in storage with optical filter
Storage, its MW temperature should be 15-25 DEG C.
The beneficial effects of the invention are as follows:By using ultra-thin resin substrate and smalt as substrate, by vacuum evaporation,
The processes such as surface inspection, small pieces cutting, cutting processing is carried out using automatically scanning inspection, cut-out equipment, using Hitachi U4150
The detection devices such as spectral photometry device, image analyzer, high-low temperature test chamber carry out performance test, hence it is evident that improve traditional optical filter
Colour cast and ghost problem, various aspects of performance can substitute existing traditional glass substrate optical filter, so as to tackle what is expanded day by day
High-end intelligent use market (smart mobile phone, mobile unit application, intelligent monitoring etc.), brings considerable economic benefit.It is meanwhile logical
Preferred Coating Materials is crossed, the quartzy silicon ring using high-purity is used as low-refraction evaporation material;Use the oxygen of crystalline state high-purity
Change titanium as high index of refraction evaporation material, plated film Film Design is improved, so as to substantially reduce large angle incidence spectrum
Centre wavelength is drifted about, and ensure that the high quality of product.
Although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
A variety of changes, modification can be carried out to these embodiments, replace without departing from the principles and spirit of the present invention by understanding
And modification, the scope of the present invention is defined by the appended.
Claims (1)
1. a kind of preparation method of wide-angle imaging module optical filter, it is characterised in that comprise the following steps:
1) selection of baseplate material:Substrate is used as using the following resin film material of 0.1mm thickness and 0.21mm thickness smalt;
2) selection of Coating Materials:Using high-purity quartzy silicon ring as low-refraction evaporation material, it is high-purity using crystalline state
The titanium oxide of degree is as high index of refraction evaporation material;
3) surface nitrogen, which destatics, blows leaching:Substrate and Coating Materials are put into clean area, then mouth spray is sprayed by blowing by blower fan
Go out and blow down substrate surface absorption dust by the clean nitrogen high wind of high efficiency filter, it is 15s to blow the leaching time;
4) cleaning of plated film frock clamp:Plated film frock clamp removes surface attachment before plated film using water sand blasting process
Foreign particles, and 350 DEG C of high-temperature bakings of progress and ion destatic processing before clamping coated basal plate;
5) vacuum evaporation is handled:Use the following resin film material of 0.1mm thickness and 0.21mm thickness smalts in step 1)
End (IR-CUT) film for substrate to carry out surface vacuum IAD auxiliary evaporation multi-layered infrareds;Using wafer type clamping jig low
It is deposited under temperature state, ensures that substrate does not deform upon during evaporation, using vacuum coater in step 2)
Material carries out clamping plated film, realizes that coating film thickness is uniformly distributed, and ensures optical filter coating uniformity, true using IAD assisted cryogenics
After the infrared cut coating of sky evaporation 30-50 layers, until material ensures that flatness meets to require, undeformed generation;
6) surface inspection and film on surface protection processing:When 0 ° → 30 ° changes of material incidence angle, ensure in △ λ (T=50%)
The change of heart wave length shift should be less than 5nm;After the drift change of △ λ (T=15%) spectral wavelength should be less than 20nm, entered using laminator
Row film on surface is protected;
7) once inspection is handled film layer:By material after 130 DEG C of heat runs, its heat time is 15-30min, observes film
Layer whether cracking problem;
8) film layer quadratic search is handled:The material of not cracking problem in step 7) is subjected to boiling test, boiling test
Time is 30-60min, and whether observation film layer the problem of coming off occurs;
9) material is hung:By the material in step 8) after 60 DEG C of temperature, 90%RH humidity are placed 1008 hours, using Hitachi
The detection devices such as U4150 spectral photometrys device, image analyzer, high-low temperature test chamber carry out performance test, check that product is optical
Whether energy and outward appearance, which meet to make, requires;
10) cutoff process of material:Road cutting off processing after being carried out using complete-automatic check, cut-out equipment, enters according to production requirement
Row profile cutting off processing, complete the processing and fabricating of wide-angle imaging module optical filter;
11) classification of product and packing processes:Handled according to different profile cutting off processing, wide-angle imaging module is filtered
Piece carries out labeling check-in bag packaging;
12) product warehousing:The labeling check-in packaged wide-angle imaging module of bag in step 11) is carried out into stock with optical filter
Put, its MW temperature should be 15-25 DEG C.
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CN110467341A (en) * | 2019-09-12 | 2019-11-19 | 东莞市微科光电科技有限公司 | A kind of laser cutting parameter suitable for smalt |
CN111427112A (en) * | 2020-03-31 | 2020-07-17 | 苏州市联超光电科技有限公司 | Infrared light filter and preparation process thereof |
CN112899622A (en) * | 2021-01-20 | 2021-06-04 | 苏州京浜光电科技股份有限公司 | Production method of dual-purpose dual-channel resin optical filter |
CN112921274A (en) * | 2021-01-20 | 2021-06-08 | 苏州京浜光电科技股份有限公司 | Production and processing method of high-performance optical filter |
CN113774328A (en) * | 2021-09-18 | 2021-12-10 | 浙江美迪凯光学半导体有限公司 | AR (argon) coating process on resin sheet |
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