CN107475683B - A kind of filming equipment and its detection method - Google Patents
A kind of filming equipment and its detection method Download PDFInfo
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- CN107475683B CN107475683B CN201710729613.2A CN201710729613A CN107475683B CN 107475683 B CN107475683 B CN 107475683B CN 201710729613 A CN201710729613 A CN 201710729613A CN 107475683 B CN107475683 B CN 107475683B
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- baffle
- baffle plate
- plate unit
- cavity wall
- detection
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Abstract
It includes coating chamber that the present invention, which provides a kind of filming equipment and its detection method, the filming equipment, and coating chamber includes adjacent the first cavity wall and the second cavity wall；Cavity wall baffle is provided in the first cavity wall of coating chamber；Detection baffle is provided in the second cavity wall of coating chamber, detection baffle includes at least two baffle plate units, and each baffle plate unit includes opposite first surface and second surface, and detection baffle has first state and the second state；Wherein in first state, the first surface of each baffle plate unit is towards the second cavity wall, and the second surface of each baffle plate unit is in same plane；The first surface of first baffle unit in the second state, at least two baffle plate units is opposite with cavity wall baffle, and parallel with cavity wall baffle；And first detection unit, for detecting the spacing between first baffle unit and cavity wall baffle in the second state.The present invention is able to ascend equipment mobility, production capacity, reduces waste of material.
Description
Technical field
The present invention relates to display fabrication techniques field more particularly to a kind of filming equipment and its detection methods.
Background technique
In semiconductor display industry, vacuum equipment uses very extensive.Especially OLED, vacuum equipment are capital equipments.
Vacuum equipment, especially physical vapour deposition (PVD) (PVD) equipment, the Film Contamination sputtering chamber deposited in order to prevent
Cavity wall generally can shelter from cavity wall with baffle (Mask).After the film adhered on baffle is more than certain thickness, then clean gear
Plate realizes recycling.But the service life of baffle depends on wash number, and the clear of profession is mainly entrusted in baffle cleaning at present
Company is washed, the cost cleaned every time is very high, and the haul-cycle time is longer back and forth, and cleaning frequently will cause the larger of operation cost and mention
It rises.Therefore, if cleaning in advance will cause the service life decline of baffle, the frequent operation cost that will lead to of cleaning is excessively high, but if stagnant
After clean, the film adhered on baffle is easy to fall off, and causes the loss of product yield.
In addition, for PVD equipment, such as magnetron sputtering, vapor deposition equipment, need target, but sputtering/vapor deposition of target material surface
Rate is inconsistent, therefore target can locally be consumed in advance, should terminate target life at this time, and continuing to use may damage
Expensive target backboard, and reduce the yield of product；But target life is terminated in advance, will cause the waste of target, target itself
Price is also very expensive.
Service life and target Expenditure Levels for baffle, in the prior art if it is desired to precise measurement, only begins to speak laggard
Row.But normal volume production equipment before manufacture, is needed to carry out after the reasons such as maintenance and measurement of beginning to speak cause equipment to dally
Sample test (Dummy), i.e., carry out normal plated film with glass, until equipment carries out volume production plating with the glass of volume production again after stablizing
Film at least needs 10 hours or more, and is finished before for the glass of sample test with regard to needing to dispose, the amount of being not used to
It produces, causes the raising of equipment operation cost.
It can be seen that the service life of baffle and target life measure at present, open-path measurement is needed, it is also necessary to larger amount of sample
Test carrys out restorer state.Therefore vacuum chamber is begun to speak for equipment mobility, production capacity, and manpower and operation cost influence all
It is very huge.
Summary of the invention
The purpose of the present invention is to provide a kind of filming equipment and its detection methods, are able to ascend equipment mobility, production capacity,
Reduce waste of material.
Technical solution provided by the present invention is as follows:
A kind of filming equipment, including coating chamber, the coating chamber include adjacent the first cavity wall and the second cavity wall；
Cavity wall baffle is provided in the first cavity wall of the coating chamber；
Detection baffle is provided in the second cavity wall of the coating chamber, the detection baffle includes at least two baffles
Unit, each baffle plate unit include opposite first surface and second surface, the detection baffle have first state and
Second state；Wherein in the first state, the first surface of each baffle plate unit is towards second cavity wall, and each baffle plate unit
Second surface be in same plane；First of first baffle unit in second state, at least two baffle plate units
Surface is opposite with the cavity wall baffle, and parallel with the cavity wall baffle；
And first detection unit, for detecting the first baffle unit and the cavity wall in second state
Spacing between baffle.
Further, at least two baffle plate units are from the side close to first cavity wall to separate first cavity wall
Side is arranged successively, and in second state, each baffle plate unit is parallel to each other, and the first surface of at least one baffle plate unit
The second surface of another baffle plate unit adjacent with the baffle plate unit is opposite；
The first detection unit is also used in second state, detects a gear in two adjacent baffle plate units
Spacing between the first surface of plate unit and the second surface of another baffle plate unit.
Further, the baffle plate unit and the cavity wall baffle are hardened using capacitance pole made of conductive material
Structure；
The first detection unit is used to detect the capacitance between the first baffle unit and the cavity wall baffle, with
The spacing between the first baffle unit and the cavity wall baffle is detected, is also used to detect between two adjacent baffle plate units
Capacitance, to detect the of the first surface of a baffle plate unit and another baffle plate unit in two adjacent baffle plate units
Spacing between two surfaces.
Further, more targets are provided in the coating chamber of the filming equipment, it is each in the detection baffle
The baffle plate unit corresponding one target setting, and each baffle plate unit can be around the rotation parallel with second cavity wall
Axis rotation, so that the detection baffle has the first state and second state；
Wherein each baffle plate unit includes the first side parallel with the rotary shaft of the baffle plate unit and with described first
The opposite second side in side, in the first state, the second surface of each baffle plate unit towards the surface of the target, simultaneously
It is parallel with the surface of the target；In second state, each baffle plate unit is vertical with the surface of the target, and each baffle
The first side of unit is located at the side close to the target of the baffle plate unit, and the first side is towards the target
Centre of surface region.
Further, the surface of the target includes the first end surface region for being located at its centre of surface region two sides
With second end surface region, and when the baffle plate unit rotate between second cavity wall be in the first angle when, the gear
The first end surface region on surface of the first side of plate unit towards the target, when the baffle plate unit rotate to it is described
When between the second cavity wall being in the second angle, the first side of the baffle plate unit is towards second end surfaces on the surface of the target
Region；
The filming equipment further includes second detection unit, and the second detection unit is used for:
When the baffle plate unit is rotated between second cavity wall in first angle, the baffle list is detected
Spacing between the first side of member and the surface of target corresponding with the baffle plate unit；
When the baffle plate unit is rotated to second state, detect the baffle plate unit first side and with the gear
Spacing between the surface of the corresponding target of plate unit；
When the baffle plate unit is rotated between second cavity wall in second angle, the baffle list is detected
Spacing between the first side of member and the surface of target corresponding with the baffle plate unit.
Further, the second detection unit be used for detect the baffle plate unit first side and with the baffle plate unit
Capacitance between the surface of corresponding target, the first side target corresponding with the baffle plate unit to detect the baffle plate unit
Spacing between the surface of material.
A kind of detection method of filming equipment, the method are applied to filming equipment as described above, which comprises
It before plated film, controls the detection baffle and is in second state, detect first in the detection baffle
Spacing between baffle plate unit and the cavity wall baffle, as the first benchmark distance values；
In plated film, controls the detection baffle and be in the first state；
It after plated film, controls the detection baffle and is in second state, detect first in the detection baffle
Spacing between baffle plate unit and the cavity wall baffle, as the first detection distance values；
According to the difference of the first benchmark distance values and the first detection distance values, obtain sinking on the cavity wall baffle
Long-pending film thickness.
Further, it before plated film, controls the detection baffle and is in second state, detect the detection baffle
In in adjacent two baffle plate units between the first surface of baffle plate unit and the second surface of another baffle plate unit
Spacing, as the second benchmark distance values；
In plated film, controls the detection baffle and be in the first state；
After plated film, controls the detection baffle and be in second state, detect in two adjacent baffle plate units
Spacing between the first surface of one baffle plate unit and the second surface of another baffle plate unit, as the second detection spacing
Value；
According to the difference of the detection distance values of the second benchmark distance values and second, obtain sinking on the detection baffle
Long-pending film thickness.
Further, before plated film, control the baffle plate unit rotate between second cavity wall in described the
When one angle, when the baffle plate unit is rotated to second state, when the baffle plate unit rotate to second chamber
Between wall be in second angle when, detect respectively the baffle plate unit first side and target corresponding with the baffle plate unit
Surface between spacing, as third benchmark distance values；
After plated film, control the baffle plate unit rotate between second cavity wall be in first angle when,
It rotates when the baffle plate unit is rotated to second state, when the baffle plate unit to being in institute between second cavity wall
When stating the second angle, detected between the first side of the baffle plate unit and the surface of target corresponding with the baffle plate unit respectively
Spacing, as third detect distance values；
The difference that distance values are detected according to the third benchmark distance values and third, the surface for obtaining the target are carved
Lose depth value.
Further, in the method, by detecting the capacitor between the first baffle unit and the cavity wall baffle
Value, to detect the spacing between the first baffle unit and the cavity wall baffle in the detection baffle；
By detecting the capacitance between two adjacent baffle plate units, to detect in two adjacent baffle plate units one
Spacing between the first surface of baffle plate unit and the second surface of another baffle plate unit；
By detecting the electricity between the first side of the baffle plate unit and the surface of target corresponding with the baffle plate unit
Capacitance, the spacing between the surface of the first side target corresponding with the baffle plate unit to detect the baffle plate unit.
It is had the beneficial effect that brought by the present invention:
Filming equipment and film plating process provided by the present invention, by the way that detection baffle is arranged in coating chamber, in plated film,
Control detection baffle be in first state, and the material that when plated film is sputtered out, which can be fallen in, to be detected on baffle and cavity wall baffle,
Prevent the cavity wall of pollution coating chamber；And when needing to measure the cavity wall baffle service life, first before plated film, control detection
Baffle is in the second state, so that the first surface of the first baffle unit of baffle plate unit and the cavity wall baffle cleaned up are flat
Row, measures spacing between the two, and after used a period of time, control detection baffle is in the second state again, and measures
Spacing between the first surface of the first baffle unit and the cavity wall baffle for being deposited with film, the first baffle measured twice
The difference of spacing between the first surface and cavity wall baffle of unit, the film thickness as deposited on cavity wall baffle, thus
The film thickness adhered on cavity wall baffle can be accurately measured, that is, realizes the accurate monitoring to the cavity wall baffle service life, and be not necessarily to
Operation of beginning to speak is carried out, the waste in cavity wall baffle service life can be reduced with significant increase equipment mobility and production capacity.
Detailed description of the invention
Fig. 1 shows structural schematic diagram of the filming equipment provided in an embodiment of the present invention in first state, wherein in figure not
Illustrate target；
Fig. 2 indicates the top view of Fig. 1, and the target before use is wherein illustrated in figure；
Fig. 3 indicates structural schematic diagram of the filming equipment provided in an embodiment of the present invention in the second state, wherein in figure not
Illustrate target；
Fig. 4 indicates the top view of Fig. 3, and the target before use is wherein illustrated in figure；
Fig. 5 indicates the filming equipment provided in the embodiment of the present invention before target use, when the baffle plate unit rotates
Structural schematic diagram when between second cavity wall in the first angle；
Fig. 6 indicates the filming equipment provided in the embodiment of the present invention before target use, when the baffle plate unit rotates
Structural schematic diagram when between second cavity wall in the second angle；
Fig. 7 indicates the filming equipment provided in the embodiment of the present invention after target consumption, when the baffle plate unit rotates
Structural schematic diagram when between second cavity wall in the first angle；
Fig. 8 shows the filming equipments provided in the embodiment of the present invention after target consumption, when the baffle plate unit rotates
Structural schematic diagram when the second state；
Fig. 9 indicates the filming equipment provided in the embodiment of the present invention after target consumption, when the baffle plate unit rotates
Structural schematic diagram when between second cavity wall in the second angle；
Specific embodiment
In order to make the object, technical scheme and advantages of the embodiment of the invention clearer, below in conjunction with the embodiment of the present invention
Attached drawing, the technical solution of the embodiment of the present invention is clearly and completely described.Obviously, described embodiment is this hair
Bright a part of the embodiment, instead of all the embodiments.Based on described the embodiment of the present invention, ordinary skill
Personnel's every other embodiment obtained, shall fall within the protection scope of the present invention.
For filming equipment in the prior art cavity wall baffle exist need its service life of open-path measurement, will lead to it is at high cost,
The problems such as production capacity is low, the present invention provides a kind of filming equipment and film plating process, are able to ascend equipment mobility, production capacity, reduce
Waste of material.
As shown in Figures 1 to 4, filming equipment provided by the embodiment of the present invention, including coating chamber 100, the plated film
Chamber 100 includes adjacent the first cavity wall 110 and the second cavity wall 120；
Cavity wall baffle 200 is provided in the first cavity wall 110 of the coating chamber 100；
Detection baffle 300 is provided in the second cavity wall 120 of the coating chamber 100, the detection baffle 300 includes
At least two baffle plate units 310, each baffle plate unit 310 include opposite first surface 311 and second surface 312, until
It include the first baffle unit 310a near first cavity wall in few two baffle plate units；The detection baffle 300 has
First state and the second state；Wherein in the first state, the first surface 311 of each baffle plate unit 310 is towards described second
Cavity wall 120, and the second surface 312 of each baffle plate unit 310 is in same plane；In second state, at least two baffles
The first surface 311 of first baffle unit 310a in unit 310 and the cavity wall baffle 200 are opposite, and keep off with the cavity wall
Plate 200 is parallel；
And first detection unit, in second state, detect the first baffle unit 310a with it is described
Spacing between cavity wall baffle 200.
Filming equipment provided by the embodiment of the present invention, by the way that detection baffle 300 is arranged in coating chamber 100, in plated film
When, as depicted in figs. 1 and 2, control detection baffle 300 is in first state, and the material that when plated film is sputtered out can be fallen in
It detects on baffle 300 and cavity wall baffle 200, prevents the cavity wall of pollution coating chamber 100；And needing to measure cavity wall baffle 200
When service life, as shown in Figure 3 and Figure 4, first before plated film, control detection baffle 300 is in the second state, so that baffle
The first surface 311 of the first baffle unit 310a of unit 310 is parallel with the cavity wall baffle 200 cleaned up, measurement the two
Between spacing, as the first benchmark distance values；After used a period of time, control detection baffle 300 is in the second shape again
State, and between measuring between the first surface 311 of the first baffle unit 310a and the cavity wall baffle 200 for being deposited with film
Away from, as the first detection distance values, the first surface 311 of the first baffle unit 310a measured twice and cavity wall baffle 200 it
Between spacing difference, i.e., the difference of the described first benchmark distance values and the first detection distance values, as cavity wall baffle 200
On the film thickness that is deposited realized to cavity wall so as to accurately measure the film thickness adhered on cavity wall baffle 200
The accurate monitoring in 200 service life of baffle can reduce cavity wall without carrying out operation of beginning to speak with significant increase equipment mobility and production capacity
The waste in 200 service life of baffle.
It should be noted that in the above scheme, the coating chamber generally has the cavity wall there are six face, the first cavity wall
110 and second cavity wall 120 be two faces adjacent in six faces of cavity wall of coating chamber, such as: with direction as shown in the figure it is upper,
Under, for six cavity walls in left, right, front and rear face, first cavity wall 110 can be the cavity wall on the left side, second cavity wall
120 can be any surface cavity wall in upper and lower, the forward and backward face adjacent with left side cavity wall.In addition, in general, in coating chamber
At least four face cavity walls need that baffle is arranged, and the cavity wall can be arranged in each face cavity wall of coating chamber according to actual needs
Baffle and the detection baffle.
In addition, in embodiment provided by the present invention, it is preferred that as shown in Figure 3 and Figure 4, at least two baffle plate units
310 are arranged successively from the side close to first cavity wall 110 to far from the side of first cavity wall 110, and described the
Two-state, each baffle plate unit 310 are parallel to each other, and the first surface 311 of at least one baffle plate unit 310 and with the baffle plate unit
The second surface 312 of 310 adjacent another baffle plate units 310 is opposite；The first detection unit is also used in second shape
When state, the of the first surface 311 of a baffle plate unit and another baffle plate unit in two adjacent baffle plate units 310 is detected
Spacing between two surfaces 312.
Using the above scheme, in plated film, control detection baffle 300 is in first state, what when plated film was sputtered out
Material can be fallen on detection baffle 300, prevent the cavity wall of pollution coating chamber 100；And it is needing to measure detection 300 longevity of baffle
When life, first before plated film, control detection baffle 300 is in the second state, so that each baffle plate unit 310 is mutually flat
Row, and the first surface 311 of at least one baffle plate unit 310 and another baffle plate unit 310 adjacent with the baffle plate unit 310
Second surface 312 is opposite, measures in two adjacent baffle plate units 310 first surface 311 of a baffle plate unit and another
Spacing between the second surface 312 of baffle plate unit, as the second benchmark distance values；After used a period of time, then secondary control
System detection baffle 300 is in the second state, and measures the first surface of a baffle plate unit in two adjacent baffle plate units 310
Spacing between 311 and the second surface 312 of another baffle plate unit, as the second detection distance values, what is measured twice is adjacent
Two baffle plate units 310 between spacing difference, i.e., described second benchmark distance values and the second detection distance values
Difference, the as film thickness that is deposited on detection baffle 300 are adhered on detection baffle 300 so as to accurately measure
Film thickness realizes the accurate monitoring to detection 300 service life of baffle.
In addition, for filming equipment, after the reasons such as plant maintenance cause equipment to dally, before reproduction, need into
Row sample test carries out normal plated film using mother glass in the prior art, by measuring mother glass surface film thickness, comes
Whether detection device is stable, until just carrying out volume production plated film with the glass of volume production after equipment is stablized.And mother glass is finished and just need to
It disposes, is not used to volume production, cause the raising of equipment operation cost.
And using the above scheme, due to adhere on the detection baffle 300 film thickness may not need begin to speak it is accurate at any time
Measurement therefore, can before manufacture, directly by measuring the detection gear after the reasons such as plant maintenance cause equipment to dally
Whether stable film thickness accompanying by plate 300 carrys out detection device, and reduces mother glass, reduces cost.
In addition, it should be noted that, for the measurement method of the spacing between parallel-plate can there are many, in institute of the present invention
In the preferred embodiment of offer, the baffle plate unit 310 and the cavity wall baffle 200 are using capacitor made of conductive material
Electrode plate structure, the first detection unit is for detecting between the first baffle unit 310a and the cavity wall baffle 200
Capacitance is also used to detect adjacent to detect the spacing between the first baffle unit 310a and the cavity wall baffle 200
Capacitance between two baffle plate units 310, to detect the first table of a baffle plate unit in two adjacent baffle plate units 310
Spacing between face 311 and the second surface 312 of another baffle plate unit.
Using the above scheme, it is detected by the capacitance between detection first baffle unit 310a and cavity wall baffle 200
Spacing between the first baffle and cavity wall baffle 200, by detect the capacitance between two neighboring baffle plate unit 310 come
The spacing between two neighboring baffle plate unit 310 is detected, this sample loading mode measurement accuracy is high, and measurement method is simple.
Specifically, for measuring cavity wall baffle 200 and detection 300 service life of baffle, measurement process is as follows:
After being installed after cavity wall cleaning, as depicted in figs. 1 and 2, controls the detection baffle 300 and be in the second state, examine
Parallel plate capacitor is formed between the first surface 311 and cavity wall baffle 200 of the first baffle unit 310a surveyed in baffle 300, it can
To measure to obtain the capacitor C1 between the first surface 311 of first baffle unit 310a at this time and cavity wall baffle 200, first baffle
Parallel plate capacitor is formed between the second surface 312 of unit 310a and the first surface 311 of second baffle unit 310b, can be surveyed
Capacitor C2 between the second surface 312 of first baffle unit 310a and the first surface 311 of second baffle unit 310b out；It uses
After a period of time, the capacitor between the first surface 311 and cavity wall baffle 200 of first baffle unit 310a is measured with the same manner
Capacitor C2 ' between the second surface 312 of C1 ', first baffle unit 310a and the first surface 311 of second baffle unit 310b.
Due to parallel plate capacitor C=(ε × S)/d, wherein ε is dielectric constant, is definite value；S is the face of baffle plate unit 310
Product, spacing of the d between parallel-plate, therefore, from C1 and C1 ' between capacitance difference, first baffle unit can be calculated
The film thickness of the changing value △ d of spacing d between 310a and cavity wall baffle 200, as cavity wall baffle 200 attachment.Similarly,
Capacitor C2 and C2 ' between the second surface 312 of one baffle plate unit 310a and the first surface 311 of second baffle unit 310b it
Between capacitance difference, the thick degree of 312 coherent film of second surface of first baffle unit 310a can be calculated, i.e., entire detection gear
Accompanying film thickness on plate 300.
It should be noted that the above is only a kind of preferred embodiment for measuring distance measurement between parallel-plate is provided, in reality
Border application in, can also be measured using other modes first baffle unit 310a first surface 311 and cavity wall baffle 200 it
Between spacing and two neighboring baffle plate unit 310 in a baffle plate unit 310 first surface 311 to another baffle plate unit
Spacing between 310 second surface 312.
In addition, open-path measurement is also required to for the measurement of target life in the prior art, provided by the present invention excellent
It selects in embodiment, the filming equipment can also be without beginning to speak to measure the service life of target.
In preferred embodiment provided by the invention, as shown in Figure 2 and Figure 4, in the coating chamber 100 of the filming equipment
More targets 500 are provided with, the corresponding target 500 of each baffle plate unit 310 in the detection baffle 300 is arranged,
And each baffle plate unit 310 can be rotated around the rotary shaft parallel with second cavity wall 120, so that the detection baffle
300 have the first state and second state；
Wherein each baffle plate unit 310 includes the first side parallel with the rotary shaft of the baffle plate unit 310, described
When first state, the second surface 312 of each baffle plate unit 310 towards the surface of the target 500 and with the target 500
Surface is parallel；In second state, each baffle plate unit 310 is vertical with the surface of the target 500, and each baffle plate unit
310 first side 313 is located at the side close to the target 500 of the baffle plate unit 310, and 313 face of the first side
To the centre of surface region of the target 500.
In above scheme, each baffle plate unit 310 is that the switching of first state and the second state is realized using rotation mode；
Also, since each baffle plate unit 310 and each target 500 are arranged in a one-to-one correspondence, in first state, the of each baffle plate unit 310
Two surface of the surfaces 312 towards target 500, and be arranged in parallel with 500 surface of target, and each baffle plate unit 310 all has one
Second side, the second side are side of the baffle plate unit 310 near the side on the surface of target 500.
The surface of target 500 includes central area and the first end surface region for being located at its centre of surface region two sides
With second end surface region, wherein the loss of target 500 usually detects its first end surface region, second end surface district respectively
The depth etched at domain and central area.
As shown in Figures 5 to 9, for each baffle plate unit 310 along predetermined direction rotary course, first side 313 can successively
By the first end surface region 501 on 500 surface of target, centre of surface region 502 and second end surface region 503, wherein
When the baffle plate unit 310 rotation is between second cavity wall 120 in the first angle, the baffle plate unit
The first end surface region 501 on surface of 310 first side 313 towards the target 500,
When the baffle plate unit 310 rotation to second state, the table of each baffle plate unit 310 and the target 500
Face is vertical, and the first side 313 of each baffle plate unit 310 is located at the side close to the target 500 of the baffle plate unit 310,
And centre of surface region 502 of the first side 313 towards the target 500；
When the baffle plate unit 310 rotation is between second cavity wall 120 in the second angle, the baffle plate unit
The second end surface region 503 on surface of 310 first side 313 towards the target 500；
The filming equipment further includes second detection unit, and the second detection unit is used for:
When the baffle plate unit 310 rotation is between second cavity wall 120 in first angle, described in detection
Spacing between the first side 313 of baffle plate unit 310 and the surface of target 500 corresponding with the baffle plate unit 310；
When the baffle plate unit 310 rotation to second state, the first side of the baffle plate unit 310 is detected
Spacing between 313 and the surface of target 500 corresponding with the baffle plate unit 310；
When the baffle plate unit 310 rotation is between second cavity wall 120 in second angle, described in detection
Spacing between the first side 313 of baffle plate unit 310 and the surface of target 500 corresponding with the baffle plate unit 310.
Using the above scheme, it can use baffle plate unit 310 in the spacing in rotary course between the surface of target 500
Difference measure 500 etching depth value of target, specifically, measurement process is as follows:
As shown in Figures 4 to 6, before plated film, control the baffle plate unit 310 rotation to second cavity wall 120
Between when being in first angle, when the baffle plate unit 310 rotation is to second state, when the baffle plate unit 310
When rotation is between second cavity wall 120 in second angle, the first side of the baffle plate unit 310 is detected respectively
Spacing between 313 and the surface of target 500 corresponding with the baffle plate unit 310, as third benchmark distance values；
As shown in Figure 7 to 9, after used a period of time, the baffle plate unit 310 rotation is controlled to described second
When being in first angle between cavity wall 120, when the baffle plate unit 310 rotation is to second state, when the baffle
When the rotation of unit 310 is between second cavity wall 120 in second angle, the baffle plate unit 310 is detected respectively
Spacing between first side 313 and the surface of target 500 corresponding with the baffle plate unit 310 detects distance values as third；
The difference that distance values are detected according to the third benchmark distance values and third, obtains the table of the target 500
Face etching depth value.
In preferred embodiment provided by the present invention, the second detection unit is for detecting the baffle plate unit 310
First side 313 and target 500 corresponding with the baffle plate unit 310 surface between capacitance, to detect the baffle
Spacing between the surface of the first side 313 of unit 310 target 500 corresponding with the baffle plate unit 310.
Using the above scheme, it is made since the baffle plate unit 310 is all made of conductive material, first side 313 is to lead
Electric material can be detected by detecting the capacitance between the first side 313 of baffle Unit 300 and the surface of target 500
Spacing between the first baffle and cavity wall baffle 200, this sample loading mode measurement accuracy is high, and measurement method is simple.
Specifically, measurement process is as follows:
It is installed in target 500 before use, the rotation of the baffle plate unit 310 is extremely in described between second cavity wall 120
When the first angle, when the baffle plate unit 310 rotation is to second state, when the baffle plate unit 310 rotation to institute
When stating between the second cavity wall 120 in second angle, detect respectively the baffle plate unit 310 first side 313 and with this
Capacitance between the surface of the corresponding target 500 of baffle plate unit 310, respectively C3, C4 and C5；
Target 500 after a period of use, the baffle plate unit 310 rotation to being between second cavity wall 120
When first angle, when the baffle plate unit 310 rotation is to second state, when the baffle plate unit 310 rotation extremely
When being in second angle between second cavity wall 120,313 He of first side of the baffle plate unit 310 is detected respectively
Capacitance between the surface of target 500 corresponding with the baffle plate unit 310, respectively C3 ', C4 ' and C5 '；
Since the first side 313 of baffle plate unit 310 will not adhere to film, by the variation of capacitance, can survey
The variation of 500 etching depth of target is calculated, to realize the accurate monitoring kept mum to 500 service life of target.
It should be noted that the above is only provide the first side 313 and target 500 of a kind of measurement baffle plate unit 310
Surface between the preferred embodiment that measures can also use other modes in practical applications, be not limited thereto.
In addition, additionally providing a kind of detection method of filming equipment in the embodiment of the present invention, the method is applied to this hair
Filming equipment provided by bright embodiment, which comprises
Before plated film, controls the detection baffle 300 and be in second state, detect in the detection baffle 300
First baffle unit 310a and the cavity wall baffle 200 between spacing, as the first benchmark distance values；
In plated film, controls the detection baffle 300 and be in the first state；
After plated film, controls the detection baffle 300 and be in second state, detect in the detection baffle 300
First baffle unit 310a and the cavity wall baffle 200 between spacing, as first detection distance values；
According to the difference of the first benchmark distance values and the first detection distance values, the cavity wall baffle 200 is obtained
The film thickness of upper deposition.
Further, it before plated film, controls the detection baffle 300 and is in second state, detect the detection
In baffle 300 in two adjacent baffle plate units 310 first surface 311 of a baffle plate unit and another baffle plate unit the
Spacing between two surfaces 312, as the second benchmark distance values；
In plated film, controls the detection baffle 300 and be in the first state；
After plated film, controls the detection baffle 300 and be in second state, detect two adjacent baffle plate units
Spacing in 310 between the first surface 311 of a baffle plate unit and the second surface 312 of another baffle plate unit, as
Two detection distance values；
According to the difference of the detection distance values of the second benchmark distance values and second, the detection baffle 300 is obtained
The film thickness of upper deposition.
Further, before plated film, control the rotation of baffle plate unit 310 is extremely between second cavity wall 120
When first angle, when the baffle plate unit 310 rotation is to second state, when the baffle plate unit 310 rotation extremely
When being in second angle between second cavity wall 120,313 He of first side of the baffle plate unit 310 is detected respectively
Spacing between the surface of target 500 corresponding with the baffle plate unit 310, as third benchmark distance values；
After plated film, controls the rotation of baffle plate unit 310 and pressed from both sides between second cavity wall 120 in described first
When angle, when the baffle plate unit 310 rotation is to second state, when the baffle plate unit 310 rotation is to described second
Between cavity wall 120 be in second angle when, detect respectively the baffle plate unit 310 first side 313 and with the baffle list
Spacing between the surface of first 310 corresponding targets 500 detects distance values as third；
The difference that distance values are detected according to the third benchmark distance values and third, obtains the table of the target 500
Face etching depth value.
Further, in the method, by detecting between the first baffle unit 310a and the cavity wall baffle 200
Capacitance, with detect it is described detection baffle 300 in first baffle unit 310a and the cavity wall baffle 200 between
Away from；
By detecting the capacitance between two adjacent baffle plate units 310, to detect two adjacent baffle plate units 310
In spacing between the first surface 311 of a baffle plate unit and the second surface 312 of another baffle plate unit；
By detect the baffle plate unit 310 first side 313 and target 500 corresponding with the baffle plate unit 310
Capacitance between surface, the target corresponding with the baffle plate unit 310 of first side 313 to detect the baffle plate unit 310
Spacing between 500 surface.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, without departing from the technical principles of the invention, several improvement and replacement can also be made, these are improved and replacement
Also it should be regarded as protection scope of the present invention.
Claims (9)
1. a kind of filming equipment, including coating chamber, the coating chamber includes adjacent the first cavity wall and the second cavity wall；It is special
Sign is,
Cavity wall baffle is provided in the first cavity wall of the coating chamber；
Detection baffle is provided in the second cavity wall of the coating chamber, the detection baffle includes at least two baffle lists
Member, each baffle plate unit include opposite first surface and second surface, and the detection baffle has first state and the
Two-state；Wherein in the first state, the first surface of each baffle plate unit is towards second cavity wall, and each baffle plate unit
Second surface is in same plane；First table of the first baffle unit in second state, at least two baffle plate units
Face is opposite with the cavity wall baffle, and parallel with the cavity wall baffle；
And first detection unit, for detecting the first baffle unit and the cavity wall baffle in second state
Between spacing；
More targets, each baffle plate unit corresponding one in the detection baffle are provided in the coating chamber of the filming equipment
A target setting, and each baffle plate unit can be rotated around the rotary shaft parallel with second cavity wall, so that institute
Stating detection baffle has the first state and second state；
Wherein each baffle plate unit includes the first side parallel with the rotary shaft of the baffle plate unit, in the first state
When, the second surface of each baffle plate unit is towards the surface of the target and parallel with the surface of the target；In second shape
When state, each baffle plate unit is vertical with the surface of the target, and the first side of each baffle plate unit is located at leaning on for the baffle plate unit
The side of the nearly target, and centre of surface region of the first side towards the target.
2. filming equipment according to claim 1, which is characterized in that
At least two baffle plate units are arranged successively from the side close to first cavity wall to the side far from first cavity wall,
In second state, each baffle plate unit is parallel to each other, and the first surface of at least one baffle plate unit and with the baffle plate unit
The second surface of adjacent another baffle plate unit is opposite；
The first detection unit is also used in second state, detects a baffle list in two adjacent baffle plate units
Spacing between the first surface of member and the second surface of another baffle plate unit.
3. filming equipment according to claim 2, which is characterized in that
The baffle plate unit and the cavity wall baffle are using capacitor plate structure made of conductive material；
The first detection unit is used to detect the capacitance between the first baffle unit and the cavity wall baffle, with detection
Spacing between the first baffle unit and the cavity wall baffle is also used to detect the electricity between two adjacent baffle plate units
Capacitance, to detect the second table of the first surface of a baffle plate unit and another baffle plate unit in two adjacent baffle plate units
Spacing between face.
4. filming equipment according to claim 1, which is characterized in that
The surface of the target includes the first end surface region and the second end surfaces for being located at its centre of surface region two sides
Region, and when the baffle plate unit is rotated between second cavity wall in the first angle, the first of the baffle plate unit
The first end surface region on surface of the side towards the target, when the baffle plate unit is rotated between second cavity wall
When in the second angle, the first side of the baffle plate unit is towards the second end surface region on the surface of the target；
The filming equipment further includes second detection unit, and the second detection unit is used for:
When the baffle plate unit is rotated between second cavity wall in first angle, the baffle plate unit is detected
Spacing between first side and the surface of target corresponding with the baffle plate unit；
When the baffle plate unit is rotated to second state, detect the baffle plate unit first side and with the baffle list
Spacing between the surface of the corresponding target of member；
When the baffle plate unit is rotated between second cavity wall in second angle, the baffle plate unit is detected
Spacing between first side and the surface of target corresponding with the baffle plate unit.
5. filming equipment according to claim 4, which is characterized in that
The second detection unit be used to detect the baffle plate unit first side and corresponding with baffle plate unit target
Capacitance between surface, between the surface of the first side target corresponding with the baffle plate unit to detect the baffle plate unit
Spacing.
6. a kind of detection method of filming equipment, which is characterized in that the method is applied to such as any one of claim 1 to 5 institute
The filming equipment stated, which comprises
It before plated film, controls the detection baffle and is in second state, detect the first baffle in the detection baffle
Spacing between unit and the cavity wall baffle, as the first benchmark distance values；
In plated film, controls the detection baffle and be in the first state；
It after plated film, controls the detection baffle and is in second state, detect the first baffle in the detection baffle
Spacing between unit and the cavity wall baffle, as the first detection distance values；
According to the difference of the first benchmark distance values and the first detection distance values, obtain depositing on the cavity wall baffle
Film thickness.
7. according to the method described in claim 6, it is characterized in that,
It before plated film, controls the detection baffle and is in second state, detect adjacent in the detection baffle two
Spacing in baffle plate unit between the first surface of baffle plate unit and the second surface of another baffle plate unit, as second
Benchmark distance values；
In plated film, controls the detection baffle and be in the first state；
After plated film, controls the detection baffle and be in second state, detect in two adjacent baffle plate units one
Spacing between the first surface of baffle plate unit and the second surface of another baffle plate unit, as the second detection distance values；
According to the difference of the detection distance values of the second benchmark distance values and second, obtain depositing on the detection baffle
Film thickness.
8. according to the method described in claim 6, it is characterized in that, be applied to filming equipment as claimed in claim 4, it is described
Method further include:
Before plated film, control the baffle plate unit rotate between second cavity wall be in the first angle when, when the gear
It rotates when plate unit is rotated to second state, when the baffle plate unit to being in the second angle between second cavity wall
When, the spacing between the first side of the baffle plate unit and the surface of target corresponding with the baffle plate unit is detected respectively, is made
For third benchmark distance values；
After plated film, control the baffle plate unit rotate between second cavity wall be in first angle when, work as institute
State baffle plate unit when rotating to second state, when the baffle plate unit rotate between second cavity wall in described the
When two angles, between being detected between the first side of the baffle plate unit and the surface of target corresponding with the baffle plate unit respectively
Away from as third detection distance values；
The difference that distance values are detected according to the third benchmark distance values and third, the surface etch for obtaining the target are deep
Angle value.
9. according to the method described in claim 8, it is characterized in that, be applied to filming equipment as described in claim 1, it is described
In method,
By detecting the capacitance between the first baffle unit and the cavity wall baffle, to detect in the detection baffle
Spacing between first baffle unit and the cavity wall baffle；
By detecting the capacitance between two adjacent baffle plate units, to detect a baffle in two adjacent baffle plate units
Spacing between the first surface of unit and the second surface of another baffle plate unit；
By detecting the capacitance between the first side of the baffle plate unit and the surface of target corresponding with the baffle plate unit,
Spacing between the surface of first side target corresponding with the baffle plate unit to detect the baffle plate unit.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710729613.2A CN107475683B (en) | 2017-08-23 | 2017-08-23 | A kind of filming equipment and its detection method |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710729613.2A CN107475683B (en) | 2017-08-23 | 2017-08-23 | A kind of filming equipment and its detection method |
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| CN107475683B true CN107475683B (en) | 2019-06-18 |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10318957A (en) * | 1997-05-19 | 1998-12-04 | Sony Corp | Film-forming device |
| CN101078613A (en) * | 2006-05-10 | 2007-11-28 | 住友电气工业株式会社 | Coating layer thickness measurement mechanism and coating layer forming apparatus using the same |
| CN101313204A (en) * | 2005-11-25 | 2008-11-26 | 英飞康有限责任公司 | Diaphragm arrangement for a vacuum measurement cell |
| CN102080949A (en) * | 2009-12-01 | 2011-06-01 | 无锡华润上华半导体有限公司 | Silicon epitaxial film thickness measuring method and device |
| CN103981505A (en) * | 2014-05-06 | 2014-08-13 | 京东方科技集团股份有限公司 | Monitoring device |
-
2017
- 2017-08-23 CN CN201710729613.2A patent/CN107475683B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10318957A (en) * | 1997-05-19 | 1998-12-04 | Sony Corp | Film-forming device |
| CN101313204A (en) * | 2005-11-25 | 2008-11-26 | 英飞康有限责任公司 | Diaphragm arrangement for a vacuum measurement cell |
| CN101078613A (en) * | 2006-05-10 | 2007-11-28 | 住友电气工业株式会社 | Coating layer thickness measurement mechanism and coating layer forming apparatus using the same |
| CN102080949A (en) * | 2009-12-01 | 2011-06-01 | 无锡华润上华半导体有限公司 | Silicon epitaxial film thickness measuring method and device |
| CN103981505A (en) * | 2014-05-06 | 2014-08-13 | 京东方科技集团股份有限公司 | Monitoring device |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107475683A (en) | 2017-12-15 |
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