CN107421916B - Detection device, process system and detection method - Google Patents
Detection device, process system and detection method Download PDFInfo
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- CN107421916B CN107421916B CN201710301590.5A CN201710301590A CN107421916B CN 107421916 B CN107421916 B CN 107421916B CN 201710301590 A CN201710301590 A CN 201710301590A CN 107421916 B CN107421916 B CN 107421916B
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- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/59—Transmissivity
Abstract
The invention discloses a detection device, a process system and a detection method. The detection device comprises a box body and an ashing detection device, wherein an opening is formed in the light inlet side of the box body, a window body is arranged on the opening, and a slit is formed in the light outlet side of the box body; the window is used for transmitting incident irradiation light to the slit; the slit is used for transmitting the irradiation light to a target substrate positioned outside the light outlet side of the box body; the ashing detection device is used for detecting whether the target substrate is ashed or not. In the technical scheme of the detection device, the process system and the detection method provided by the invention, the ashing detection device can detect whether the target substrate is ashed, and when the ashing detection device detects that the target substrate is ashed, irradiation of irradiating light to the target substrate can be immediately stopped, so that equipment is prevented from being polluted by particles generated by ashing.
Description
Technical Field
The invention relates to the technical field of display, in particular to a detection device, a process system and a detection method.
Background
An Excimer Laser Annealing (ELA) process is an important component of a Low Temperature Polysilicon (LTPS) process. At present, the ELA process is also applied to the flexible display process. In the current flexible display process, a layer of Polyimide (PI) film is coated on a glass substrate, an a-si film is deposited on the PI film, and then the a-si film is crystallized by an ELA device.
In general, the a-si film layer has a thin thickness or a non-uniform thickness, so that in the ELA process, a part of the a-si film layer is prone to be annealed excessively, where the PI film layer located below the part of the a-si film layer is difficult to withstand high-energy laser irradiation, film ashing occurs, and when the film ashing occurs, a large amount of particles (particles) are generated, the particles are splashed, and therefore equipment is seriously polluted, and especially an annealing window (annealing window) is polluted and discarded.
Disclosure of Invention
The invention provides a detection device, a process system and a detection method, which are used for avoiding particle pollution of equipment caused by ashing.
In order to achieve the purpose, the invention provides a detection device which comprises a box body and an ashing detection device, wherein an opening is formed in the light inlet side of the box body, a window body is arranged on the opening, and a slit is formed in the light outlet side of the box body;
the window is used for transmitting incident irradiation light to the slit;
the slit is used for transmitting the irradiation light to a target substrate positioned outside the light outlet side of the box body;
the ashing detection device is used for detecting whether the target substrate is ashed or not.
Optionally, the ashing detection device comprises a gas cleanliness detection device and/or an air transmittance detection device;
the gas cleanliness detection device is used for detecting gas cleanliness so as to judge whether ashing occurs on the target substrate;
the air transmission rate detection device is used for detecting the air transmission rate to judge whether the target substrate is subjected to ashing or not.
Optionally, the gas cleanliness detection device comprises a gas sampling pipeline, and one end of the gas sampling pipeline is arranged on the box body.
Optionally, the gas sampling pipeline is disposed at a position outside the slit on the light exit side of the box body.
Optionally, the air permeability detection device comprises a correlation type photoelectric sensor.
Optionally, the correlation type photoelectric sensor is disposed at a position outside the slit on the light exit side of the box body.
Optionally, the opposite-type photoelectric sensor includes an emitting end and a receiving end, the emitting end and the receiving end are respectively located at two ends of the light emitting side of the box body, and a connection line between the emitting end and the receiving end does not intersect with the slit.
In order to achieve the above object, the present invention provides a process system, which includes an emission device, a target substrate and the above detection device, wherein the emission device is located outside the light incident side of the box body, and the target substrate is located outside the light emergent side of the box body;
the emitting device is used for emitting irradiation light to the window body.
In order to achieve the purpose, the invention provides a detection method, which is based on a detection device, wherein the detection device comprises a box body and an ashing detection device, an opening is arranged on the light inlet side of the box body, a window body is arranged on the opening, and a slit is arranged on the light outlet side of the box body;
the method comprises the following steps:
the window transmits the incident irradiation light to the slit;
the slit transmits the irradiation light to a target substrate positioned outside the light emergent side of the box body;
the ashing detection device detects whether ashing has occurred to the target substrate.
Optionally, the ashing detection device comprises a gas cleanliness detection device and/or an air transmittance detection device;
if the ashing detection device comprises a gas cleanliness detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the gas cleanliness detection device detects the gas cleanliness to judge whether the target substrate is subjected to ashing or not; alternatively, the first and second electrodes may be,
if the ashing detection device comprises an air transmission rate detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the air transmission rate detection device detects the air transmission rate to judge whether the target substrate is ashed or not; alternatively, the first and second electrodes may be,
if the ashing detection device comprises a gas cleanliness detection device and an air transmittance detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the gas cleanliness detection device detects gas cleanliness to determine whether or not ashing has occurred on the target substrate, and the air transmittance detection device detects air transmittance to determine whether or not ashing has occurred on the target substrate.
The invention has the following beneficial effects:
in the technical scheme of the detection device, the process system and the detection method provided by the invention, the ashing detection device can detect whether the target substrate is ashed, and when the ashing detection device detects that the target substrate is ashed, irradiation of irradiating light to the target substrate can be immediately stopped, so that equipment is prevented from being polluted by particles generated by ashing.
Drawings
Fig. 1 is a schematic structural diagram of a detection apparatus according to an embodiment of the present invention;
FIG. 2 is a schematic view of the detecting device of FIG. 1 from another perspective;
FIG. 3 is a schematic view of the light incident side of the detecting device in FIG. 1;
FIG. 4 is an internal schematic view of the detection apparatus of FIG. 3;
fig. 5 is a flowchart of a detection method according to a third embodiment of the present invention.
Detailed Description
In order to make those skilled in the art better understand the technical solution of the present invention, the following describes the detecting device, the processing system and the detecting method provided by the present invention in detail with reference to the attached drawings.
Fig. 1 is a schematic structural diagram of a detection device according to a first embodiment of the present invention, fig. 2 is a schematic view of another view angle of the detection device in fig. 1, fig. 3 is a schematic view of a light incident side of the detection device in fig. 1, and fig. 4 is a schematic view of an interior of the detection device in fig. 3, as shown in fig. 1 to 4, the detection device includes a box 1 and an ashing detection device, an opening 2 is disposed on the light incident side of the box 1, a window 3 is disposed on the opening 2, and a slit 4 is disposed on a light emergent side of the box 1.
The window 3 serves to transmit incident illumination light to the slit. In order to facilitate the display of the structure in the box body 1 and the structure of the opening 2, the window 3 is not shown in fig. 4, as shown in fig. 4, one surface (i.e. the light incident side) of the box body 1 is provided with the opening 2, and the opening 2 is provided for facilitating the arrangement of the window 3. As shown in fig. 3, a window 3 is disposed on the opening 2, the window 3 is a light-transmitting structure, and an emitting device (not shown in the figure) is disposed outside the light incident side of the box 1 (i.e., outside the window 3), and the emitting device can emit irradiation light to the window 3 so that the irradiation light is incident on the window 3. The window 3 may transmit the incident irradiation light to the inside of the case 1, thereby irradiating the irradiation light to the slit 4 on the light outgoing side of the case 1. In this embodiment, preferably, the emitting device is a laser emitting device, and the irradiation light is laser light. In this embodiment, the window 3 is an annealing window. Window 3 may function as a hermetic and light transmissive window.
The slit 4 is used to transmit the irradiation light to the target substrate located outside the light exit side of the case 1. The box 1 is provided with a target substrate (not shown) outside the light-emitting side, for example, the target substrate may include a substrate, a PI film layer and an a-si film layer, wherein the PI film layer is located on the substrate, and the a-si film layer is located on the PI film layer. The irradiation light irradiates the a-si film layer in the target substrate to crystallize the a-si film layer, and specifically, the crystallization of the a-si film layer can be realized through an ELA process.
The ashing detection device is used for detecting whether the target substrate is ashed or not. Specifically, whether or not ashing of the target substrate occurs is specifically: whether or not ashing of the thin film on the target substrate occurs.
In this embodiment, the ashing detection device may include a gas cleanliness detection device and/or an air transmittance detection device.
When the ashing detection device includes the gas cleanliness detection device, the gas cleanliness detection device is used to detect the gas cleanliness to determine whether ashing has occurred on the target substrate. The gas cleanliness is the degree to which the air contains a certain amount of dust (including microorganisms) in the air. In this embodiment, the gas cleanliness detected by the gas cleanliness detection apparatus can be used to determine whether ashing has occurred on the target substrate. Specifically, it may be determined whether the gas cleanliness is greater than a first set threshold, and if it is determined that the gas cleanliness is greater than the first set threshold, it indicates that abnormal increase of particles is detected, thereby determining that ashing has occurred on the target substrate; and if the gas cleanliness is judged to be less than or equal to the first set threshold, indicating that abnormal increase of particles is not detected, and determining that ashing does not occur on the target substrate.
When the ashing detection device includes an air transmission rate detection device, the air transmission rate detection device is configured to detect the air transmission rate to determine whether ashing has occurred on the target substrate. In this embodiment, the air transmittance detected by the air transmittance detection device can be used to determine whether or not ashing has occurred on the target substrate. Specifically, it may be determined whether the air transmission rate is less than a second set threshold, and if it is determined that the air transmission rate is less than the second set threshold, it indicates that the air transmission rate is abnormally reduced, thereby determining that ashing has occurred on the target substrate; and if the air transmission rate is judged to be greater than or equal to the second set threshold value, the air transmission rate is not abnormally reduced, so that the target substrate is determined not to be ashed.
When the ashing detection device includes the gas cleanliness detection device and the air transmittance detection device, it can be determined that ashing has occurred on the target substrate by detecting that ashing has occurred on the target substrate by any of the gas cleanliness detection device and the air transmittance detection device.
In this embodiment, the gas cleanliness detection device includes gas sampling pipeline 51, and the one end of gas sampling pipeline 51 sets up on box 1. Preferably, the gas sampling line 51 is disposed at a position outside the slit 4 on the light-emitting side of the case 1. The number of the gas sampling pipelines 51 can be one or more, in the embodiment, the number of the gas sampling pipelines 51 is multiple, and the multiple gas sampling pipelines 51 are uniformly distributed on the box body 1, so that the target substrate can be detected to be ashed when the target substrate is irradiated by the small-area irradiation light, and the detection accuracy is improved. The gas cleanliness detection device further comprises a gas data processing device (not shown in the figure), the gas data processing device is connected with the gas sampling pipeline 51, the gas sampling pipeline 51 collects gas data and sends the gas data to the gas data processing device, and the gas data processing device can generate air cleanliness according to the gas data. In other words, in the embodiment, the air cleanliness can be directly read from the gas data processing apparatus, so that whether the target substrate is ashed or not can be determined according to the air cleanliness. When the number of the gas sampling pipelines 51 is multiple, each gas sampling pipeline 51 can collect gas data, and the gas processing device can generate corresponding air cleanliness according to each gas data, so that whether the target substrate is ashed or not can be judged according to each air cleanliness, and if the target substrate is ashed according to any one of the air cleanings, the target substrate can be determined to be ashed.
In this embodiment, the air transmittance detection device includes a correlation type photoelectric sensor. Preferably, the opposite-type photoelectric sensor is disposed at a position other than the slit 4 on the light-emitting side of the case 1. Specifically, the opposite-type photoelectric sensor includes an emitting end 52 and a receiving end 53, the emitting end 52 and the receiving end 53 are respectively located at two ends of the light emitting side of the box 1, and a connecting line between the emitting end 51 and the receiving end 52 does not intersect with the slit 4. In this embodiment, the generating end 52 and the receiving end 53 are respectively located at two ends of the light-emitting side of the box body 1, so that the light emitted from the emitting end 51 can pass through the area with the maximum width and polluted air due to ashing, and the air transmittance can be easily detected. In this embodiment, the connecting line between the emitting end 51 and the receiving end 52 does not intersect with the slit 4, and a certain distance is provided between the emitting end 51 and the slit 4 and between the receiving end 52 and the slit 4, thereby ensuring that the transmission of the illumination light by the slit 4 is not affected.
Further, the box body 1 is also provided with a gas inlet 6. The gas inlet 6 is used for introducing inert gas into the box body 1, preferably nitrogen N2. The gas inlet 6 leads inert gas into the box body 1, thereby ensuring the atmosphere of laser annealing.
In this embodiment, the emission device may be controlled to immediately stop emitting the illumination light when it is determined that the target substrate is ashed, thereby preventing further ashing from occurring on the target substrate. Because the irradiation of the irradiation light is stopped at the initial stage of the pollution, the pollution to the equipment is greatly reduced, and the pollution to the equipment can be ignored.
In the detection device provided by the embodiment, the ashing detection device can detect whether the target substrate is ashed, and the irradiation of the irradiation light to the target substrate can be immediately stopped when the ashing detection device detects that the target substrate is ashed, so that the equipment is prevented from being polluted by particles generated by the ashing.
The second embodiment of the invention provides a process system which comprises an emitting device, a target substrate and a detecting device, wherein the emitting device is positioned outside the light inlet side of a box body, and the target substrate is positioned outside the light outlet side of the box body. The emitting device is used for emitting the irradiation light to the window body. In this embodiment, the detection device may adopt the detection device provided in the first embodiment, and details are not described herein.
In the processing system provided by the embodiment, the ashing detection device can detect whether the target substrate is ashed, and the irradiation of the irradiation light to the target substrate can be immediately stopped when the ashing detection device detects that the target substrate is ashed, so that the equipment is prevented from being polluted by particles generated by ashing.
Fig. 5 is a flowchart of a detection method according to a third embodiment of the present invention, and as shown in fig. 5, the detection method is based on a detection device, the detection device includes a box body and an ashing detection device, an opening is disposed on a light incident side of the box body, a window is disposed on the opening, and a slit is disposed on a light emergent side of the box body. The method comprises the following steps:
And 102, transmitting the irradiating light to a target substrate positioned outside the light-emitting side of the box body by the slit.
In step 103, the ashing detection apparatus detects whether or not the target substrate is ashed.
Specifically, the ashing detection device includes a gas cleanliness detection device and/or an air transmittance detection device.
If the ashing detection device comprises a gas cleanliness detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the gas cleanliness detection device detects gas cleanliness to determine whether ashing has occurred on the target substrate.
If the ashing detection device comprises an air transmission rate detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the air transmission rate detection device detects the air transmission rate to judge whether the target substrate is ashed.
If the ashing detection device comprises a gas cleanliness detection device and an air transmittance detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the gas cleanliness detection device detects gas cleanliness to determine whether or not ashing has occurred on the target substrate, and the air transmittance detection device detects air transmittance to determine whether or not ashing has occurred on the target substrate. In this case, the gas cleanliness detection device and the air permeability detection device can simultaneously perform detection, and when the occurrence of ashing on the target substrate is detected by either of the gas cleanliness detection device and the air permeability detection device, it can be determined that ashing has occurred on the target substrate.
The detection method provided by the present embodiment can be implemented by the detection device provided by the first embodiment, and for the description of the detection device, reference may be made to the first embodiment.
In the detection method provided by the embodiment, the ashing detection device can detect whether the target substrate is ashed, and the irradiation of the irradiation light to the target substrate can be immediately stopped when the ashing detection device detects that the target substrate is ashed, so that the equipment is prevented from being polluted by particles generated by the ashing.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and substance of the invention, and these modifications and improvements are also considered to be within the scope of the invention.
Claims (4)
1. A detection device is characterized by comprising a box body and an ashing detection device, wherein an opening is formed in the light inlet side of the box body, a window body is arranged on the opening, and a slit is formed in the light outlet side of the box body;
the window is used for transmitting incident irradiation light to the slit;
the slit is used for transmitting the irradiation light to a target substrate positioned outside the light emergent side of the box body so as to perform laser annealing on the target substrate;
the ashing detection device is used for detecting whether the target substrate is ashed or not;
the ashing detection device comprises a gas cleanliness detection device and/or an air transmittance detection device;
the gas cleanliness detection device is used for detecting gas cleanliness so as to judge whether ashing occurs on the target substrate;
the air transmission rate detection device is used for detecting the air transmission rate to judge whether the target substrate is subjected to ashing or not;
if the ashing detection device comprises a gas cleanliness detection device, the gas cleanliness detection device comprises a gas sampling pipeline and a gas data processing device, the gas sampling pipeline is arranged at a position outside the slit on the light-emitting side of the box body, the number of the gas sampling pipelines is multiple, and the multiple gas sampling pipelines are uniformly distributed on the box body; the gas sampling pipeline is used for acquiring gas data and sending the gas data to the gas data processing device, the gas data processing device is used for generating gas cleanliness according to the gas data, and if the gas cleanliness generated based on the gas data acquired by any gas sampling pipeline is greater than a first set threshold value, ashing of the target substrate is judged to occur;
if the ashing detection device comprises an air transmittance detection device, the air transmittance detection device comprises an opposite type photoelectric sensor, and the opposite type photoelectric sensor is arranged at a position outside the slit on the light outlet side of the box body.
2. The detection device according to claim 1, wherein the correlation type photoelectric sensor comprises an emitting end and a receiving end, the emitting end and the receiving end are respectively located at two ends of the light emitting side of the box body, and a connecting line between the emitting end and the receiving end is not crossed with the slit.
3. A process system comprising an emitter device, a target substrate and the detection device of claim 1 or 2, wherein the emitter device is located outside the light-in side of the chamber body, and the target substrate is located outside the light-out side of the chamber body;
the emitting device is used for emitting irradiation light to the window body.
4. The detection method is characterized in that the detection method is based on a detection device, the detection device comprises a box body and an ashing detection device, an opening is formed in the light inlet side of the box body, a window body is arranged on the opening, and a slit is formed in the light outlet side of the box body;
the method comprises the following steps:
the window transmits the incident irradiation light to the slit;
the slit transmits the irradiation light to a target substrate positioned outside the light emergent side of the box body so as to perform laser annealing on the target substrate;
the ashing detection device detects whether the target substrate is ashed;
the ashing detection device comprises a gas cleanliness detection device and/or an air transmittance detection device;
if the ashing detection device comprises a gas cleanliness detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the gas cleanliness detection device detects the gas cleanliness to judge whether the target substrate is subjected to ashing or not; alternatively, the first and second electrodes may be,
if the ashing detection device comprises an air transmission rate detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the air transmission rate detection device detects the air transmission rate to judge whether the target substrate is ashed or not; alternatively, the first and second electrodes may be,
if the ashing detection device comprises a gas cleanliness detection device and an air transmittance detection device, the ashing detection device detecting whether the target substrate is ashed comprises: the gas cleanliness detection device detects gas cleanliness to judge whether ashing occurs on the target substrate, and the air transmission rate detection device detects air transmission rate to judge whether ashing occurs on the target substrate;
if the ashing detection device comprises a gas cleanliness detection device, the gas cleanliness detection device comprises a gas sampling pipeline and a gas data processing device, the gas sampling pipeline is arranged at a position outside the slit on the light-emitting side of the box body, the number of the gas sampling pipelines is multiple, and the multiple gas sampling pipelines are uniformly distributed on the box body; the gas sampling pipeline is used for acquiring gas data and sending the gas data to the gas data processing device, the gas data processing device is used for generating gas cleanliness according to the gas data, and if the gas cleanliness generated based on the gas data acquired by any gas sampling pipeline is greater than a first set threshold value, ashing of the target substrate is judged to occur;
if the ashing detection device comprises an air transmittance detection device, the air transmittance detection device comprises an opposite type photoelectric sensor, and the opposite type photoelectric sensor is arranged at a position outside the slit on the light outlet side of the box body.
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| US5317380A (en) * | 1991-02-19 | 1994-05-31 | Inspex, Inc. | Particle detection method and apparatus |
| US6008144A (en) * | 1998-02-02 | 1999-12-28 | Industrial Technology Research | Window shutter for laser annealing |
| JP4715016B2 (en) * | 2001-02-15 | 2011-07-06 | ソニー株式会社 | Method for evaluating polysilicon film |
| JP4593243B2 (en) * | 2004-11-18 | 2010-12-08 | 株式会社トプコン | Air particle monitoring device and vacuum processing device |
| JP5540476B2 (en) * | 2008-06-30 | 2014-07-02 | 株式会社Ｉｈｉ | Laser annealing equipment |
| JP5177703B2 (en) * | 2010-03-11 | 2013-04-10 | 新日鐵住金株式会社 | Foreign matter concentration measurement device in continuous annealing furnace |
| CN102489876B (en) * | 2011-11-11 | 2014-06-25 | 北京中科思远光电科技有限公司 | Laser annealing method and laser annealing device adopting laser auxiliary heating |
| CN103915318A (en) * | 2014-03-17 | 2014-07-09 | 京东方科技集团股份有限公司 | Laser annealing device, polycrystalline silicon thin film and manufacturing method thereof |
| CN203950784U (en) * | 2014-05-29 | 2014-11-19 | 京东方科技集团股份有限公司 | A kind of laser annealing apparatus |
| CN105092473B (en) * | 2015-07-13 | 2018-11-02 | 武汉华星光电技术有限公司 | A kind of quality determining method and system of polysilicon membrane |
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