CN107330411A - A kind of fingerprint identification device and preparation method thereof, touch control display apparatus - Google Patents
A kind of fingerprint identification device and preparation method thereof, touch control display apparatus Download PDFInfo
- Publication number
- CN107330411A CN107330411A CN201710537830.1A CN201710537830A CN107330411A CN 107330411 A CN107330411 A CN 107330411A CN 201710537830 A CN201710537830 A CN 201710537830A CN 107330411 A CN107330411 A CN 107330411A
- Authority
- CN
- China
- Prior art keywords
- photodiode
- forming
- layer
- electrode
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000002360 preparation method Methods 0.000 title abstract 2
- 230000002209 hydrophobic effect Effects 0.000 claims abstract description 62
- 239000000758 substrate Substances 0.000 claims abstract description 50
- 229920002120 photoresistant polymer Polymers 0.000 claims description 43
- 238000000034 method Methods 0.000 claims description 39
- XPBBUZJBQWWFFJ-UHFFFAOYSA-N fluorosilane Chemical compound [SiH3]F XPBBUZJBQWWFFJ-UHFFFAOYSA-N 0.000 claims description 34
- 239000002238 carbon nanotube film Substances 0.000 claims description 27
- 230000008569 process Effects 0.000 claims description 26
- 238000004519 manufacturing process Methods 0.000 claims description 19
- 238000000059 patterning Methods 0.000 claims description 16
- 238000005530 etching Methods 0.000 claims description 13
- 230000006698 induction Effects 0.000 claims description 12
- 238000001312 dry etching Methods 0.000 claims description 3
- 230000003287 optical effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 95
- 230000000694 effects Effects 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 9
- 238000010586 diagram Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 230000000149 penetrating effect Effects 0.000 description 3
- 238000000206 photolithography Methods 0.000 description 3
- 239000011241 protective layer Substances 0.000 description 3
- 230000009286 beneficial effect Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000007641 inkjet printing Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06V—IMAGE OR VIDEO RECOGNITION OR UNDERSTANDING
- G06V40/00—Recognition of biometric, human-related or animal-related patterns in image or video data
- G06V40/10—Human or animal bodies, e.g. vehicle occupants or pedestrians; Body parts, e.g. hands
- G06V40/12—Fingerprints or palmprints
- G06V40/13—Sensors therefor
- G06V40/1318—Sensors therefor using electro-optical elements or layers, e.g. electroluminescent sensing
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
Landscapes
- Engineering & Computer Science (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Image Input (AREA)
- Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
- Measurement Of The Respiration, Hearing Ability, Form, And Blood Characteristics Of Living Organisms (AREA)
Abstract
The invention discloses a kind of fingerprint identification device and preparation method thereof, touch control display apparatus, to avoid the problem of wet hand touches the fingerprint recognition less effective that fingerprint identification device is caused.The fingerprint identification device, including underlay substrate, are arranged on light-inductive unit that is on the underlay substrate and being arranged in array, are arranged on the hydrophobic structure on the light-inductive unit.
Description
Technical Field
The invention relates to the technical field of fingerprint identification, in particular to a fingerprint identification device, a manufacturing method thereof and a touch display device.
Background
Fingerprint identification technology is the most mature and cheap biometric identification technology at present. At present, the technology of fingerprint identification is most widely applied, people can see the figure of the fingerprint identification technology in an access control and attendance system, and more fingerprint identification applications are available in the market: such as notebook computer, mobile phone, automobile, bank payment can all apply the technology of fingerprint identification.
With the advancement of technology, fingerprint recognition technology has begun to slowly enter the computer world. Many companies and research institutions have made great breakthrough progress in the field of fingerprint identification technology, and have launched many application products of fingerprint identification perfectly combined with traditional IT technology, and these products have been accepted by more and more users.
Fingerprint identification devices can be classified into: capacitive, photoelectric, and ultrasonic, among others.
Aiming at the photoelectric fingerprint identification device, after a user touches the photoelectric fingerprint identification device with a wet hand, the wet hand can have certain influence on photoelectric conversion, so that the fingerprint identification effect of the photoelectric fingerprint identification device is influenced.
Disclosure of Invention
In view of this, embodiments of the present invention provide a fingerprint identification device, a manufacturing method thereof, and a touch display device, so as to avoid a problem of poor fingerprint identification effect caused by touching the fingerprint identification device with a wet hand.
The embodiment of the invention provides a fingerprint identification device, which comprises a substrate, photosensitive induction units arranged on the substrate in an array manner, and a hydrophobic structure arranged on the photosensitive induction units.
In a possible implementation manner, in the fingerprint identification device provided in an embodiment of the present invention, the hydrophobic structure includes a carbon nanotube film and a fluorosilane film sequentially disposed on the photosensitive sensing unit.
In a possible implementation manner, in the fingerprint identification device provided in an embodiment of the present invention, the photosensitive sensing unit specifically includes: a photodiode for sensing an optical signal reflected at a ridge or a valley in a fingerprint to be converted into an electrical signal, and a switching transistor for outputting the electrical signal of the photodiode;
the fingerprint identification device further comprises: a voltage signal line for supplying a voltage signal to the photodiode, and a scan line for supplying a scan signal to the switching transistor.
In a possible implementation manner, in the fingerprint identification device provided by the embodiment of the present invention, a projection of the hydrophobic structure on the substrate overlaps a projection of the photodiode on the substrate.
In a possible implementation manner, in the fingerprint identification device according to the above, a projection of the hydrophobic structure on the substrate overlaps a projection of the photodiode and the switching transistor on the substrate.
Correspondingly, the embodiment of the invention also provides a touch display device which comprises any one of the fingerprint identification devices provided by the embodiment of the invention.
Correspondingly, an embodiment of the present invention further provides a method for manufacturing any one of the fingerprint identification devices provided in the embodiment of the present invention, where the method includes:
forming a pattern of the photosensitive induction unit on the substrate base plate by adopting a composition process;
and forming a pattern of a hydrophobic structure on the photosensitive induction unit by adopting a patterning process.
In a possible implementation manner, in the manufacturing method of the fingerprint identification device provided by the embodiment of the present invention, the forming a pattern of the photosensitive sensing unit on the substrate by using a patterning process includes:
forming a pattern of a switching transistor on the substrate base plate, the switching transistor including a gate electrode, a gate insulating layer, an active layer, a source electrode, and a drain electrode; forming a pattern of a photodiode on the substrate base plate, the photodiode including a first electrode, a photosensitive conductive layer, and a second electrode; wherein the first electrode is electrically connected with the source electrode or the drain electrode; or,
forming a pattern of a photodiode on the substrate base plate, the photodiode including a first electrode, a photosensitive conductive layer, and a second electrode; forming a pattern of a switching transistor on the substrate base plate, the switching transistor including a gate electrode, a gate insulating layer, an active layer, a source electrode, and a drain electrode; the first electrode is electrically connected with the source electrode or the drain electrode.
In a possible implementation manner, in the manufacturing method of the fingerprint identification device provided by the embodiment of the present invention, forming a pattern of a hydrophobic structure on the photosensitive sensing unit by using a patterning process includes:
sequentially forming a carbon nano tube film layer and a fluorosilane film layer on the photosensitive sensing unit;
forming a photoresist layer on the fluorosilane film layer;
exposing and developing the photoresist layer by using a mask plate for forming the pattern of the photodiode to form a photoresist complete reserved area and a photoresist complete removed area; wherein the photoresist complete reserve region corresponds to the photodiode;
and etching the photoresist to completely remove the carbon nanotube film and the fluorosilane film corresponding to the region to form a pattern with a hydrophobic structure.
In a possible implementation manner, in the manufacturing method of the fingerprint identification device provided by the embodiment of the present invention, forming a pattern of a hydrophobic structure on the photosensitive sensing unit by using a patterning process includes:
sequentially forming a carbon nano tube film layer and a fluorosilane film layer on the photosensitive sensing unit;
forming a photoresist layer on the fluorosilane film layer;
exposing and developing the photoresist layer by using a mask plate for forming patterns of the photodiode and the switch transistor to form a photoresist complete reserved area and a photoresist complete removed area; wherein the photoresist full reserve region corresponds to the photodiode and the switching transistor;
and etching the photoresist to completely remove the carbon nanotube film and the fluorosilane film corresponding to the region to form a pattern with a hydrophobic structure.
In a possible implementation manner, in the manufacturing method of the fingerprint identification device provided in the embodiment of the present invention, the etching away the carbon nanotube film and the fluorosilane film corresponding to the photoresist completely removed region includes:
and etching the carbon nano tube film layer and the fluorosilane film layer corresponding to the photoresist completely-removed region by adopting a dry etching mode.
The invention has the following beneficial effects:
according to the fingerprint identification device provided by the embodiment of the invention, the hydrophobic structures are arranged on the photosensitive induction units which are arranged in an array manner, and the hydrophobic structures play a role in hydrophobic and oleophobic properties, so that when a user touches the fingerprint identification device with a wet hand, the fingerprint identification effect is improved.
Drawings
Fig. 1 is a schematic structural diagram of a fingerprint identification device according to an embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a second fingerprint identification device according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of a third fingerprint identification device according to an embodiment of the present invention;
FIG. 4 is a schematic structural diagram of a fourth fingerprint identification device according to an embodiment of the present invention;
FIG. 5 is a schematic structural diagram of a fifth fingerprint identification device according to an embodiment of the present invention;
fig. 6 is a schematic flowchart illustrating a method for manufacturing a fingerprint identification device according to an embodiment of the present invention;
fig. 7(a) -7 (e) are schematic structural diagrams of a method for manufacturing a fingerprint identification device according to an embodiment of the present invention after each step is performed.
Detailed Description
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, the present invention is further described with reference to the accompanying drawings and examples. Example embodiments may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the concept of example embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and thus their repetitive description will be omitted. The words expressing the position and direction described in the present invention are illustrated in the accompanying drawings, but may be changed as required and still be within the scope of the present invention. The drawings of the present invention are only for illustrating the relative positional relationship, the layer thicknesses of some parts are exaggerated in a drawing manner for easy understanding, and the layer thicknesses in the drawings do not represent the proportional relationship of the actual layer thicknesses.
It should be noted that in the following description, specific details are set forth in order to provide a thorough understanding of the present invention. The invention can be implemented in a number of ways different from those described herein and similar generalizations can be made by those skilled in the art without departing from the spirit of the invention. Therefore, the present invention is not limited to the specific embodiments disclosed below. As used in the specification and in the claims, certain terms are used to refer to particular components. As one skilled in the art will appreciate, manufacturers may refer to a component by different names. This specification and claims do not intend to distinguish between components that differ in name but not function. In the following description and in the claims, the terms "include" and "comprise" are used in an open-ended fashion, and thus should be interpreted to mean "include, but not limited to. The description which follows is a preferred embodiment of the present application, but is made for the purpose of illustrating the general principles of the application and not for the purpose of limiting the scope of the application. The protection scope of the present application shall be subject to the definitions of the appended claims. It will be understood that when an element such as a layer, film, region or substrate is referred to as being "on" another element, it can be directly on the other element or intervening elements may be present.
The embodiment of the invention provides a fingerprint identification device, a manufacturing method thereof and a touch display device, which are used for solving the problem of poor fingerprint identification effect caused by touching the fingerprint identification device with wet hands.
The following describes in detail specific embodiments of a fingerprint identification device, a manufacturing method thereof, and a touch display device according to embodiments of the present invention with reference to the accompanying drawings.
The thicknesses and shapes of the various film layers in the drawings are not to be considered true proportions, but are merely intended to illustrate the present invention.
Referring to fig. 1, an embodiment of the present invention provides a fingerprint identification device, which includes a substrate base 01, photosensitive sensing units 02 disposed on the substrate base 01 and arranged in an array, and a hydrophobic structure 03 disposed on the photosensitive sensing units 02.
It should be noted that, in order to avoid mutual interference of signals between the photosensitive sensing unit and the hydrophobic structure, a protective layer 07 is disposed between the hydrophobic structure 03 and the photosensitive sensing unit 02, and the protective layer 07 plays an insulating role. The material of the protective layer is not particularly limited herein.
It should be noted that, in the embodiment of the present invention, the hydrophobic structure is disposed on the photosensitive sensing unit and is also disposed on the surface of the fingerprint identification device, so that when a user touches the fingerprint identification device with a finger, the fingerprint of the finger is detected by the photosensitive sensing unit through the hydrophobic and oleophobic actions of the hydrophobic structure. Therefore, the hydrophobic structure in the embodiment of the invention is arranged on the photosensitive induction unit, so as to avoid the problem of poor fingerprint identification effect caused by touching the fingerprint identification device with wet hands.
The hydrophobic structure is arranged on the photosensitive sensing unit, and the hydrophobic structure is a whole layer structure and is arranged on the surface of the fingerprint identification device, or is only arranged above the photosensitive sensing unit, and is not particularly limited herein.
The hydrophobic structure in the embodiment of the present invention refers to a structure or a film layer having a hydrophobic effect and an oleophobic effect. And is not particularly limited herein.
In an embodiment of the fingerprint identification device provided in the embodiment of the present invention, referring to fig. 2, the hydrophobic structure includes a carbon nanotube film 031 and a fluorosilane film 032 sequentially disposed on the photosensitive sensing unit 02. Specifically, the hydrophobic structure may be a film layer formed by a carbon nanotube material and disposed on the photosensitive sensing unit, and then surface treatment is performed by fluorosilane to form a hydrophobic and oleophobic film layer. Wherein the hydrophobic structure may completely cover the photosensitive sensing unit.
In an embodiment, the fingerprint identification apparatus provided in the embodiment of the present invention, referring to fig. 3, the photosensitive sensing unit 02 specifically includes: a photodiode 021 for sensing an optical signal reflected at a ridge or valley in a fingerprint to be converted into an electrical signal, and a switching transistor 022 for outputting the electrical signal of the photodiode; the fingerprint recognition device further includes: a voltage signal line 04 for supplying a voltage signal to the photodiode, and a scan line for supplying a scan signal to the switching transistor.
Specifically, referring to fig. 3, the photodiode 021 includes a first electrode layer 0211, a photosensitive conductive layer 0212, and a second electrode layer 0213, which are sequentially disposed over the substrate base plate 01; wherein, the second electrode layer 0213 is a transparent conductive layer; the first electrode layer 0211 may be a transparent conductive layer or a metal conductive layer. The switching transistor 022 includes a gate electrode 0221, a gate insulating layer 0222, an active layer 0223, and a source electrode 0224 and a drain electrode 0225 which are electrically connected to the active layer 0223, which are sequentially disposed over the substrate 01; wherein, fingerprint identification device still includes: and a scan line (not shown) electrically connected to the gate 0221 of the switching transistor. The source 0224 or the drain 0225 of the switching transistor is electrically connected to the first electrode layer 0211 of the photodiode 021. The fingerprint recognition device further includes: and a voltage signal line 04 electrically connected to the second electrode layer 0213 of the photodiode 021. The second electrode layer 0213 is electrically connected to the voltage signal line 04 through the conductive layer 05.
Further, in order to protect the photodiode or the switching diode in the fingerprint recognition device from insulation, the fingerprint recognition device further includes: and an insulating layer 06 disposed on the layer where the source electrode 0224 or the drain electrode 0225 is located, wherein the conductive layer 05 is disposed on the insulating layer 06 and is electrically connected to the second electrode layer through a via hole penetrating through the insulating layer 06 and the gate insulating layer 0222.
It should be noted that the structure of the photodiode 021 and the switching transistor 022 shown in fig. 3 is only one specific example, but is not limited to the structure shown in fig. 3. In the embodiment of the present invention, the structures of the photodiode and the switching diode are not specifically limited.
In an embodiment, referring to fig. 4, a projection of the hydrophobic structure (the carbon nanotube film 031 and the fluorosilane film 032) on the substrate is overlapped with a projection of the photodiode 021 on the substrate.
Specifically, the hydrophobic structure only covers on photodiode 021 for when wet hand touch fingerprint identification device, play hydrophobic oleophobic effect, improve fingerprint identification's precision.
In an embodiment, referring to fig. 5, the projection of the hydrophobic structure (carbon nanotube film 031 and fluorosilane film 032) on the substrate overlaps with the projection of the photodiode 021 and the switching transistor 022 on the substrate.
Specifically, the hydrophobic structure covers the photodiode and the switch transistor in the photosensitive induction unit for when the finger touches the fingerprint identification device, the hydrophobic and oleophobic effect is played, and the fingerprint identification precision is improved.
It should be noted that the hydrophobic structure in the embodiment of the present invention may also cover the entire surface of the fingerprint identification device.
Based on the same invention concept, an embodiment of the present invention further provides a touch display device, including any one of the fingerprint identification devices provided in the embodiments of the present invention. The specific implementation and beneficial effects of the touch display device provided by the embodiment of the invention are the same as those of the fingerprint identification device, and are not described again here.
Based on the same inventive idea, referring to fig. 6, an embodiment of the present invention further provides a method for manufacturing any one of the fingerprint identification devices provided in the embodiment of the present invention, where the method includes:
s601, forming a pattern of the photosensitive induction unit on the substrate by adopting a composition process;
and S602, forming a pattern of the hydrophobic structure on the photosensitive sensing unit by adopting a patterning process.
The patterning process in the embodiment of the present invention may include only a photolithography process, or may include a photolithography process and an etching step, and may also include other processes for forming a predetermined pattern, such as printing, inkjet printing, and the like; the photolithography process is a process of forming a pattern by using a photoresist, a mask plate, an exposure machine, and the like, including processes of film formation, exposure, development, and the like. In particular implementations, the corresponding patterning process may be selected based on the structure formed in the present invention.
In an embodiment, in the manufacturing method of the fingerprint identification device provided in the embodiment of the present invention, in step S601, forming a pattern of the photosensitive sensing unit on the substrate by using a patterning process, includes:
forming a pattern of a switching transistor on the substrate, the switching transistor including a gate electrode, a gate insulating layer, an active layer, a source electrode, and a drain electrode; forming a pattern of a photodiode on a substrate, the photodiode including a first electrode, a photosensitive conductive layer, and a second electrode; wherein the first electrode is electrically connected with the source electrode or the drain electrode; or,
forming a pattern of a photodiode on a substrate, the photodiode including a first electrode, a photosensitive conductive layer, and a second electrode; forming a pattern of a switching transistor on the substrate, the switching transistor including a gate electrode, a gate insulating layer, an active layer, a source electrode, and a drain electrode; the first electrode is electrically connected with the source electrode or the drain electrode.
Specifically, a gate electrode of the switching transistor is formed while a first electrode of the photodiode is patterned, the first electrode being provided in the same layer as the gate electrode, or the first electrode being made of the same material as the gate electrode; the second electrode may be a transparent conductive layer.
In a specific embodiment, in the manufacturing method of the fingerprint identification device provided in the embodiment of the present invention, the step S602 of forming a pattern of a hydrophobic structure on the photosensitive sensing unit by using a patterning process includes: sequentially forming a carbon nano tube film layer and a fluorosilane film layer on the photosensitive sensing unit; forming a photoresist layer on the fluorosilane film layer; exposing and developing the photoresist layer by using a mask plate for forming a pattern of the photodiode to form a photoresist complete reserved area and a photoresist complete removed area; wherein the photoresist complete retention region corresponds to the photodiode; and etching the photoresist to completely remove the carbon nanotube film and the fluorosilane film corresponding to the region to form a pattern with a hydrophobic structure.
Specifically, when the projection of the hydrophobic structure on the substrate base plate overlaps the projection of the photodiode on the substrate base plate, the pattern of the hydrophobic structure may be formed using a mask for forming the photodiode, thereby saving the mask for forming the hydrophobic structure and simplifying the process. The carbon nanotube film and the fluorosilane film may be formed by deposition or coating, and are not limited herein.
In a specific embodiment, in the manufacturing method of the fingerprint identification device provided in the embodiment of the present invention, the step S602 forms a pattern of a hydrophobic structure on the photosensitive sensing unit by using a patterning process, and includes: sequentially forming a carbon nano tube film layer and a fluorosilane film layer on the photosensitive sensing unit; forming a photoresist layer on the fluorosilane film layer; exposing and developing the photoresist layer by using a mask plate for forming patterns of the photodiode and the switch transistor to form a photoresist complete reserved area and a photoresist complete removed area; wherein the photoresist complete reserve region corresponds to the photodiode and the switching transistor; and etching the photoresist to completely remove the carbon nanotube film and the fluorosilane film corresponding to the region to form a pattern with a hydrophobic structure.
Specifically, when the projection of the hydrophobic structure on the substrate overlaps the projection of the photodiode and the switching transistor on the substrate, the pattern of the hydrophobic structure may be formed using a mask for forming the photodiode and the switching transistor, thereby saving the mask used for forming the hydrophobic structure and simplifying the process. The carbon nanotube film and the fluorosilane film may be formed by deposition or coating, and are not limited herein.
In a specific embodiment, in the method for manufacturing the fingerprint identification device according to the embodiment of the present invention, the etching away the carbon nanotube film and the fluorosilane film corresponding to the photoresist completely removed region includes: and etching the carbon nano tube film layer and the fluorosilane film layer corresponding to the photoresist completely-removed region by adopting a dry etching mode.
The following describes in detail specific steps of a method for manufacturing a fingerprint identification device according to an embodiment of the present invention, including:
step one, forming a pattern of a gate 0221 and a first electrode layer 0211 on a substrate 01 by a patterning process, and forming a pattern of a voltage signal line 04 disposed on the same layer as the gate 0221, as shown in fig. 7 (a);
step two, forming a photosensitive conductive layer 0212 and a second electrode layer 0213 over the first electrode layer 0211, as shown in fig. 7 (b);
step three, forming a gate insulating layer 0222 covering the gate 0221 and the second electrode layer 0213 over the gate 0221, sequentially forming an active layer 0223, and a source 0224 and a drain 0225 electrically connected to the active layer 0223 over the gate insulating layer 0222, as shown in fig. 7 (c);
step four, forming an insulating layer 06 on the layer where the source electrode 0224 or the drain electrode 0225 is located to function as a photodiode and a switching transistor, and forming a pattern of a conductive layer 05 on the insulating layer 06, wherein the conductive layer 05 is electrically connected to the second electrode layer 0213 through a via hole penetrating through the insulating layer 06 and the gate insulating layer 0222, and is electrically connected to the voltage signal line 04 through a via hole penetrating through the insulating layer 06 and the gate insulating layer 0222, as shown in fig. 7 (d);
step five, forming a protection layer 07 on the surface of the structure shown in fig. 7(d), and forming a carbon nanotube film layer 031 and a fluorosilane film layer 032 on the protection layer 07, thereby forming a hydrophobic structure, as shown in fig. 7 (e).
In summary, the fingerprint identification device provided in the embodiment of the present invention includes the hydrophobic structure formed on the photosensitive sensing units arranged in an array, and the hydrophobic structure includes the carbon nanotube film layer and the fluorosilane film layer, so as to perform hydrophobic and oleophobic functions, and avoid the problem of poor fingerprint identification effect when a wet hand touches the fingerprint identification device. Specifically, the projection of the hydrophobic structure on the substrate base plate provided by the embodiment of the invention is overlapped with the projection of the photodiode on the substrate base plate, or the projection of the hydrophobic structure on the substrate base plate is overlapped with the projection of the photodiode and the switch transistor on the substrate base plate, so that the influence of wet hands on the photodiode is avoided through the effect of the hydrophobic structure.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (11)
1. A fingerprint identification device is characterized by comprising a substrate base plate, photosensitive induction units arranged on the substrate base plate in an array mode, and a hydrophobic structure arranged on the photosensitive induction units.
2. The apparatus of claim 1,
the hydrophobic structure comprises a carbon nano tube film layer and a fluorosilane film layer which are sequentially arranged on the photosensitive sensing unit.
3. The device according to claim 1 or 2, wherein the light sensitive sensing unit comprises in particular: a photodiode for sensing an optical signal reflected at a ridge or a valley in a fingerprint to be converted into an electrical signal, and a switching transistor for outputting the electrical signal of the photodiode;
the fingerprint identification device further comprises: a voltage signal line for supplying a voltage signal to the photodiode, and a scan line for supplying a scan signal to the switching transistor.
4. The apparatus of claim 3, wherein a projection of the hydrophobic structure on the substrate base overlaps a projection of the photodiode on the substrate base.
5. The apparatus of claim 3, wherein a projection of the hydrophobic structure on the substrate base overlaps a projection of the photodiode and the switching transistor on the substrate base.
6. A touch display device comprising the fingerprint recognition device of any one of claims 1-5.
7. A method of manufacturing a fingerprint recognition device according to any one of claims 1 to 5, wherein the method comprises:
forming a pattern of the photosensitive induction unit on the substrate base plate by adopting a composition process;
and forming a pattern of a hydrophobic structure on the photosensitive induction unit by adopting a patterning process.
8. The method of claim 7, wherein the patterning of the photosensitive sensor cells on the substrate base plate using a patterning process comprises:
forming a pattern of a switching transistor on the substrate base plate, the switching transistor including a gate electrode, a gate insulating layer, an active layer, a source electrode, and a drain electrode; forming a pattern of a photodiode on the substrate base plate, the photodiode including a first electrode, a photosensitive conductive layer, and a second electrode; wherein the first electrode is electrically connected with the source electrode or the drain electrode; or,
forming a pattern of a photodiode on the substrate base plate, the photodiode including a first electrode, a photosensitive conductive layer, and a second electrode; forming a pattern of a switching transistor on the substrate base plate, the switching transistor including a gate electrode, a gate insulating layer, an active layer, a source electrode, and a drain electrode; the first electrode is electrically connected with the source electrode or the drain electrode.
9. The method of claim 8, wherein forming a pattern of hydrophobic structures over the photosensitive sensing cells using a patterning process comprises:
sequentially forming a carbon nano tube film layer and a fluorosilane film layer on the photosensitive sensing unit;
forming a photoresist layer on the fluorosilane film layer;
exposing and developing the photoresist layer by using a mask plate for forming the pattern of the photodiode to form a photoresist complete reserved area and a photoresist complete removed area; wherein the photoresist complete reserve region corresponds to the photodiode;
and etching the photoresist to completely remove the carbon nanotube film and the fluorosilane film corresponding to the region to form a pattern with a hydrophobic structure.
10. The method of claim 8, wherein forming a pattern of hydrophobic structures over the photosensitive sensing cells using a patterning process comprises:
sequentially forming a carbon nano tube film layer and a fluorosilane film layer on the photosensitive sensing unit;
forming a photoresist layer on the fluorosilane film layer;
exposing and developing the photoresist layer by using a mask plate for forming patterns of the photodiode and the switch transistor to form a photoresist complete reserved area and a photoresist complete removed area; wherein the photoresist full reserve region corresponds to the photodiode and the switching transistor;
and etching the photoresist to completely remove the carbon nanotube film and the fluorosilane film corresponding to the region to form a pattern with a hydrophobic structure.
11. The method according to claim 9 or 10, wherein etching away the carbon nanotube film and the fluorosilane film corresponding to the photoresist completely removed region comprises:
and etching the carbon nano tube film layer and the fluorosilane film layer corresponding to the photoresist completely-removed region by adopting a dry etching mode.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710537830.1A CN107330411A (en) | 2017-07-04 | 2017-07-04 | A kind of fingerprint identification device and preparation method thereof, touch control display apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710537830.1A CN107330411A (en) | 2017-07-04 | 2017-07-04 | A kind of fingerprint identification device and preparation method thereof, touch control display apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107330411A true CN107330411A (en) | 2017-11-07 |
Family
ID=60198580
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710537830.1A Pending CN107330411A (en) | 2017-07-04 | 2017-07-04 | A kind of fingerprint identification device and preparation method thereof, touch control display apparatus |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107330411A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109190563A (en) * | 2018-09-05 | 2019-01-11 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof, display device |
| CN109993149A (en) * | 2019-04-12 | 2019-07-09 | 京东方科技集团股份有限公司 | Terminal, display panel and fingerprint recognition mould group |
| CN110086873A (en) * | 2019-04-30 | 2019-08-02 | 芜湖翼讯飞行智能装备有限公司 | A kind of enterprise's office is with multiple terminals computer without disc system and equipment |
| CN110210442A (en) * | 2019-06-11 | 2019-09-06 | 京东方科技集团股份有限公司 | A kind of ultrasound fingerprint recognition circuit and its driving method, fingerprint identification device |
| CN110783326A (en) * | 2019-10-31 | 2020-02-11 | 京东方科技集团股份有限公司 | Substrate, preparation method thereof, display panel and display device |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1778851A (en) * | 2004-11-23 | 2006-05-31 | 鸿富锦精密工业（深圳）有限公司 | Anti-fingeprinting surface coating |
| CN105977314A (en) * | 2016-06-30 | 2016-09-28 | 京东方科技集团股份有限公司 | Photosensitive element, fingerprint recognition panel, manufacturing method and fingerprint recognition device |
| CN106096595A (en) * | 2016-08-08 | 2016-11-09 | 京东方科技集团股份有限公司 | A kind of fingerprint recognition module, its manufacture method and fingerprint recognition display device |
| CN106298805A (en) * | 2016-09-05 | 2017-01-04 | 京东方科技集团股份有限公司 | A kind of display floater and preparation method thereof and display device |
-
2017
- 2017-07-04 CN CN201710537830.1A patent/CN107330411A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1778851A (en) * | 2004-11-23 | 2006-05-31 | 鸿富锦精密工业（深圳）有限公司 | Anti-fingeprinting surface coating |
| CN105977314A (en) * | 2016-06-30 | 2016-09-28 | 京东方科技集团股份有限公司 | Photosensitive element, fingerprint recognition panel, manufacturing method and fingerprint recognition device |
| CN106096595A (en) * | 2016-08-08 | 2016-11-09 | 京东方科技集团股份有限公司 | A kind of fingerprint recognition module, its manufacture method and fingerprint recognition display device |
| CN106298805A (en) * | 2016-09-05 | 2017-01-04 | 京东方科技集团股份有限公司 | A kind of display floater and preparation method thereof and display device |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109190563A (en) * | 2018-09-05 | 2019-01-11 | 京东方科技集团股份有限公司 | Display panel and preparation method thereof, display device |
| CN109993149A (en) * | 2019-04-12 | 2019-07-09 | 京东方科技集团股份有限公司 | Terminal, display panel and fingerprint recognition mould group |
| CN109993149B (en) * | 2019-04-12 | 2021-10-26 | 京东方科技集团股份有限公司 | Terminal, display panel and fingerprint identification module |
| CN110086873A (en) * | 2019-04-30 | 2019-08-02 | 芜湖翼讯飞行智能装备有限公司 | A kind of enterprise's office is with multiple terminals computer without disc system and equipment |
| CN110210442A (en) * | 2019-06-11 | 2019-09-06 | 京东方科技集团股份有限公司 | A kind of ultrasound fingerprint recognition circuit and its driving method, fingerprint identification device |
| US11361577B2 (en) | 2019-06-11 | 2022-06-14 | Boe Technology Group Co., Ltd. | Ultrasonic fingerprint identification circuit, driving method thereof, and fingerprint identification device |
| CN110783326A (en) * | 2019-10-31 | 2020-02-11 | 京东方科技集团股份有限公司 | Substrate, preparation method thereof, display panel and display device |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107330411A (en) | A kind of fingerprint identification device and preparation method thereof, touch control display apparatus | |
| TWI522932B (en) | Capacitive sensor, device and method | |
| TWI490789B (en) | Fingerprint sensor and integratable electronic display | |
| TWI582678B (en) | Capacitive sensing device, fingerprint sensing device and manufacturing method of capacitive sensing device | |
| WO2018040713A1 (en) | Touch control substrate and manufacturing method therefor, display apparatus, and fingerprint recognition apparatus and method | |
| EP2737390B1 (en) | Capacitive touch panel and a method of manufacturing the same | |
| CN101561729B (en) | Method for producing transparent substrate double-sided conductive film of touch control circuit | |
| US9461645B2 (en) | Method for fabricating touch panel, touch panel, and electronic device having the touch panel | |
| KR102629580B1 (en) | Flexible touch screen panel and method of manufacturing a flexible touch screen panel | |
| US10452219B2 (en) | Touch sensor | |
| US9417745B2 (en) | Touch screen, the manufacturing method of the touch screen and display device | |
| US9433102B2 (en) | Touch screen panel and method for manufacturing the same, and display device | |
| WO2015027633A1 (en) | Touchscreen and manufacturing method therefor, and display device | |
| KR101742753B1 (en) | Touch panel, display device and manufacturing method of touch panel | |
| CN106201136A (en) | Touch base plate and preparation method thereof, touch screen | |
| KR20090100639A (en) | Display panel and manufacturing method of the same | |
| WO2018054174A1 (en) | Pressure sensitive display panel, manufacturing method therefor, and pressure sensitive display device | |
| CN106873840B (en) | One-chip type touch panel structure and its manufacturing method | |
| TW201118454A (en) | Touch panel structure and method of forming the same | |
| KR20180070463A (en) | Display device, display panel, finger print sensing method, and circuit for sensing finger print | |
| CN103455204B (en) | Touch screen, its manufacture method and display device | |
| CN112347880A (en) | Display substrate, display panel and display device | |
| GB2559574A (en) | Touch sensor | |
| KR20160089017A (en) | Touch panel and method of manufacturing the same | |
| US20150253901A1 (en) | Manufacturing method for single-sided multi-layer circuit pattern for touch panel |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20171107 |