CN107322406A - A kind of substrate dirtproof cover and substrate edger unit - Google Patents
A kind of substrate dirtproof cover and substrate edger unit Download PDFInfo
- Publication number
- CN107322406A CN107322406A CN201710662883.6A CN201710662883A CN107322406A CN 107322406 A CN107322406 A CN 107322406A CN 201710662883 A CN201710662883 A CN 201710662883A CN 107322406 A CN107322406 A CN 107322406A
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- CN
- China
- Prior art keywords
- substrate
- water curtain
- ground
- cover body
- less
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B9/00—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor
- B24B9/02—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground
- B24B9/06—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain
- B24B9/08—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass
- B24B9/10—Machines or devices designed for grinding edges or bevels on work or for removing burrs; Accessories therefor characterised by a special design with respect to properties of materials specific to articles to be ground of non-metallic inorganic material, e.g. stone, ceramics, porcelain of glass of plate glass
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
- B08B11/04—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto specially adapted for plate glass, e.g. prior to manufacture of windshields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/02—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area using chambers or hoods covering the area
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B55/00—Safety devices for grinding or polishing machines; Accessories fitted to grinding or polishing machines for keeping tools or parts of the machine in good working condition
- B24B55/06—Dust extraction equipment on grinding or polishing machines
Abstract
The present invention relates to display technology field, more particularly to a kind of substrate dirtproof cover and substrate edger unit.Substrate dirtproof cover, including:Cover body, cover body has protection side, and protection side is oppositely arranged in the course of work of substrate edger unit with substrate to be ground;Drenching installation, in the course of work of substrate edger unit, drenching installation is used to form the first water curtain for flowing to substrate on the protection side of cover body, angle between plane and substrate where first water curtain in the side away from side to be ground is less than 90 °, and on the edge direction to be ground of substrate, the length of the first water curtain is more than or equal to the length of substrate;Flusher, in the course of work of substrate edger unit, flusher is used for the lateral substrate discharge cleaning liquid of protection in cover body.The problem of dust quantity that dirtproof cover of the prior art remains after edging technique on glass substrate being solved more, and then reduce OLED display panel yield.
Description
Technical field
The present invention relates to display technology field, more particularly to a kind of substrate dirtproof cover and substrate edger unit.
Background technology
OLED(Organic Light-Emitting Diode;Organic electroluminescent) display panel preparation process in,
Glass substrate need to be cut by laser, edging and cleaning, OLED devices are then formed using vapour deposition method on the glass substrate
Part.It can be produced in edging technique in substantial amounts of glass dust, the production process of OLED display panel to glass baseplate surface
Foreign matter quantitative requirement is higher, and the surface of glass substrate can reduce the OLED formed in subsequent technique after by glass dust pollution
The yield of device.
To reduce the dust pollution caused in edging technique to glass substrate, current solution is in edging technique
During dirtproof cover is set in the top of glass substrate, the lower surface of dirtproof cover is provided with several apopores, in edging procedure,
Dirtproof cover can stop portions glass dust fall into glass baseplate surface, while can by apopore discharge cleaning fluid to glass substrate
Surface is cleaned.However, the dirtproof cover of existing structure can not still be met to the protective capacities and cleaning capacity of glass dust
Requirement of the OLED display panel to glass baseplate surface foreign matter quantity, still remains more glass after edging technique on glass substrate
Glass dust, reduces the yield of OLED display panel.
The content of the invention
The invention provides a kind of substrate dirtproof cover and substrate edger unit, for solving dirtproof cover pair of the prior art
The dust quantity remained caused by glass dust protective capacities and cleaning capacity are not enough after edging technique on glass substrate is more,
And then the problem of reduction OLED display panel yield.
To achieve the above object, the present invention provides following technical scheme:
A kind of substrate dirtproof cover, for substrate edger unit, including:
Cover body, the cover body has protection side, and the protection side is in the course of work of the substrate edger unit with treating
The substrate of grinding is oppositely arranged;
Drenching installation, in the course of work of the substrate edger unit, the drenching installation is used in the cover body
Protection is formed between the first water curtain for flowing to the substrate, the plane and the substrate where first water curtain remote on side
The angle of the side on the side to be ground is less than 90 °, and on the edge direction to be ground of the substrate, the length of first water curtain
Length of the degree more than or equal to the substrate;
Flusher, in the course of work of the substrate edger unit, the flusher is used in the cover body
The lateral substrate discharge cleaning liquid of protection.
In the substrate dirtproof cover that the present invention is provided, drenching installation can be in the course of work of substrate edger unit in cover body
Protection side forms the first water curtain for flowing to substrate, and the first water curtain is more than or equal to substrate in the length of the edge direction to be ground of substrate
Length, can the dust of stop portions substrate edger unit formation fall in substrate surface, and the plane where the first water curtain and institute
State the angle between substrate in the side away from the side to be ground and be less than 90 °, the water curtain for being mixed into dust can be reduced by substrate side
Edge flows to the probability of substrate surface;Meanwhile, flusher can also be clear to substrate discharge in the course of work of substrate edger unit
Wash liq, is rinsed to substrate surface.Therefore, the substrate dirtproof cover that the present invention is provided can be by the first water curtain stop portions powder
Dirt, and the dust of substrate surface is rinsed by flusher, improve protective capacities and cleaning of the dirtproof cover to dust
Ability, reduces the dust quantity remained after edging technique on glass substrate, and then can improve OLED display panel yield.
Alternatively, in the course of work of the substrate edger unit, the drenching installation is additionally operable in the cover body
The second water curtain for flowing to the substrate is formed on protection side, second water curtain is located at first water curtain away from described to be ground
Angle between the side on side, the plane and the substrate where second water curtain in the side away from the side to be ground is small
In 90 °, and on the edge direction to be ground of the substrate, the length of second water curtain is more than or equal to the length of the substrate
Degree.
Further, in the side away from the side to be ground between the plane and the substrate where second water curtain
Angle be less than first water curtain where plane and the substrate between away from the side to be ground side angle.
Further, in the side away from the side to be ground between the plane and the substrate where first water curtain
Angle be less than or equal to 45 °, away from the side to be ground between the plane and the substrate where second water curtain
The angle of side is less than 45 degree.
Further, the drenching installation includes being used to flow out the first gap of first water curtain and for flowing out
Second gap of second water curtain;
First gap is parallel with second gap and is close in a side of the cover body, first gap
It is less than or equal to 30mm with the distance on the side, the distance in second gap and the side is less than or equal to 50mm.
Further, the hydraulic pressure of first water curtain and second water curtain is more than or equal to 0.6MPa and is less than or equal to
1.5MPa。
Alternatively, the flusher includes at least one guiding gutter for being arranged at the protection side, and each guiding gutter is
Rotary structure, and along the bottom surface by each guiding gutter to the direction of opening, the diameter of each guiding gutter gradually increases;
The bottom surface of each guiding gutter is provided with the osculum for being used for discharging cleaning liquid.
Further, each guiding gutter is frustum cone structure.
Further, seamlessly transit and put down between plane where side wall and opening between each water guide groove bottom and side wall
Slip over and cross.
Further, the diameter of the opening of each guiding gutter be less than or equal to 150mm, the diameter of each osculum be less than or
Equal to 30mm.
Further, the flusher includes multiple guiding gutters in protection side array distribution.
Further, in addition to the cover body transmission mechanism being connected, the transmission mechanism is used to drive the cover body
Translated, and/or, gyration.
Present invention also offers a kind of substrate edger unit, including such as the dirtproof cover of above-mentioned technical scheme offer.
Brief description of the drawings
Fig. 1 is the structural representation of dirtproof cover provided in an embodiment of the present invention;
Fig. 2 is structural representation of the dirtproof cover provided in an embodiment of the present invention in protection side;
Fig. 3 is the course of work schematic diagram of dirtproof cover provided in an embodiment of the present invention;
Fig. 4 is the course of work schematic diagram of dirtproof cover provided in an embodiment of the present invention;
Fig. 5 is the partial structural diagram of dirtproof cover provided in an embodiment of the present invention.
Reference:
01, substrate;011, side to be ground;10, cover body;11;Protect side;20, drenching installation;
21, the first gap;22, the second gap;30, flusher;31, guiding gutter;311, osculum;
40, transmission mechanism;100, the first water curtain;200, the second water curtain.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is only a part of embodiment of the invention, rather than whole embodiments.Based on this
Embodiment in invention, the every other reality that those of ordinary skill in the art are obtained under the premise of creative work is not made
Example is applied, the scope of protection of the invention is belonged to.
Referring to shown in Fig. 1 and Fig. 2, the embodiments of the invention provide a kind of substrate dirtproof cover, for substrate edger unit, bag
Include:
Cover body 10, in specific implementation, cover body 10 can be made of sheet metal component, or using the structure system of framework combination covering
Into.The inside of cover body 10 can be hollow structure, in order to install other parts.Shown in Figure 4, cover body 10 has protection side 11,
Protection side 11 is oppositely arranged in the course of work of substrate edger unit with substrate 01 to be ground.
With continued reference to shown in Fig. 1, in addition to drenching installation 20, it is shown in Figure 4, in the course of work of substrate edger unit
In, drenching installation 20 is used to form the first water curtain 100 for flowing to substrate 01 on the protection side 11 of cover body 10, specifically, referring to
Shown in Fig. 1 and Fig. 2, drenching installation 20 includes the first gap 21 for being used to flow out the first water curtain 100, shown in Figure 3, in substrate
In the course of work of edger unit, there is angle theta 1 in the side away from side 011 to be ground between the first gap 21 and substrate 01,
Angle when then the first water curtain 100 is flowed out by the first gap 21 between substrate 01 is also θ 1, the plane where the first water curtain 100
Between substrate 01 away from side 011 to be ground side angle be less than 90 °, it is shown in Figure 3, in the to be ground of substrate 01
On the direction of side 011, the length of the first water curtain 100 is more than the length of substrate 01, in specific implementation, the length of the first water curtain 100
Equal length that can be with substrate 01.
With continued reference to shown in Fig. 1, in addition to flusher 30, in the course of work of substrate edger unit, flusher
30 are used to discharge cleaning liquid to substrate 01 in the protection side 11 of cover body 10.Specifically, referring to shown in Fig. 2 and Fig. 3, flusher
30 include being arranged at multiple guiding gutters 31 of protection side 11, and the bottom surface of each guiding gutter 31 is provided with the row for being used for discharging cleaning liquid
Water hole 311, specifically, cleaning liquid can be water or other liquid.In specific implementation, drenching installation 20 and flusher 30 connect
Water supply installation is connected to, water supply installation is used to provide current the first water curtain 100 of formation for drenching installation 20, and is each osculum
311 provide cleaning liquid, can specifically be realized using water pump.
It is shown in Figure 4, in the dirtproof cover of substrate 01 that the present embodiment is provided, in the course of work of substrate edger unit,
When polishing on the side to be ground 011 to substrate 01, treating that along edging side dust can be formed.The protection side of cover body 10
11 are oppositely arranged with substrate 01, and drenching installation 20 can form in protection side 11 in the course of work of substrate edger unit and flow to base
First water curtain 100 of plate 01, length of first water curtain 100 in the direction of side to be ground 011 of substrate 01 is more than or equal to substrate 01
Length, can the dust of stop portions substrate edger unit formation fall on the surface of substrate 01, and the plane where the first water curtain 100
Angle in the side away from side 011 to be ground between substrate 01 is less than 90 °, then in the first water curtain 100 with the table of substrate 01
The direction on side 011 to be ground can be flowed to after the contact of face, is reduced dust after the first water curtain 100 is mixed into dust by the side of substrate 01
Marginal zone is to the probability on the surface of substrate 01, and therefore, drenching installation 20 can improve the blocking capability to dust, meanwhile, flusher 30
Also cleaning liquid can be discharged to substrate 01 by osculum 311, to the surface of substrate 01 in the course of work of substrate edger unit
It is rinsed, it is flushable to fall to fall into the dust on the surface of substrate 01 through the first water curtain 100, improve the cleaning capacity to dust.
Therefore, the dirtproof cover of substrate 01 that the present invention is provided can be by the stop portions dust of the first water curtain 100, and passes through flushing
Device 30 is rinsed to the dust on the surface of substrate 01, improves protective capacities and cleaning capacity of the dirtproof cover to dust, is reduced
The dust quantity remained after edging technique on glass substrate 01, and then can improve OLED display panel yield.
It is shown in Figure 4 further to improve blocking capability of the dirtproof cover that provides of the application to dust, in substrate edging
In the course of work of equipment, drenching installation 20 is additionally operable to form the second water curtain for flowing to substrate 01 on the protection side 11 of cover body 10
200, the second water curtain 200 is located at side of first water curtain 100 away from side 011 to be ground, then through the part powder of the first water curtain 100
Dirt can be stopped by the second water curtain 200.Specifically, drenching installation 20 includes the second gap for being used to flow out the second water curtain 200
22, it is shown in Figure 3, in the course of work of substrate edger unit, away to be ground between the second gap 22 and substrate 01
There is angle theta 2 in the side on side 011, then angle when the second water curtain 200 is flowed out by the second gap 22 between substrate 01 is also θ
2.To improve the blocking capability of the second water curtain 200, and reduce dust after the second water curtain 200 is mixed into dust by the edge of substrate 01
The probability on the surface of substrate 01 is taken to, in the side away from side 011 to be ground between the plane and substrate 01 where the second water curtain 200
Angle be less than 90 °, and on the direction of side to be ground 011 of substrate 01, the length of the second water curtain 200 is more than or equal to substrate 01
Length.
It is shown in Figure 4, it is that further reduce is taken dust to by the edge of substrate 01 after the second water curtain 200 is mixed into dust
In the folder of the side away from side 011 to be ground between the probability on the surface of substrate 01, the plane and substrate 01 where the second water curtain 200
Angle θ 2 is less than between the plane at the place of the first water curtain 100 and substrate 01 in the angle theta 1 of the side away from side 011 to be ground, enters one
Angle between step ground, the plane and substrate 01 where the first water curtain 100 in the side away from side 011 to be ground is less than or equal to
45 °, the angle between the plane and substrate 01 at the place of the second water curtain 200 in the side away from side 011 to be ground is less than 45 degree.Then
First water curtain 100 and the second water curtain 200 are not likely to produce sputtering after substrate 01 is touched, and the second water curtain 200 can be by the first water
The current that curtain 100 flows to the surface direction of substrate 01 rush at the side to be ground 011 of substrate 01, further reduce in the first water curtain
100 and second water curtain 200 be mixed into the probability that dust is taken to the surface of substrate 01 after dust by the edge of substrate 01.
To reduce the contact area of the first water curtain 100 and the second water curtain 200 and substrate 01, and then reducing be mixed into dust the
One water curtain 100 and the edge of 200 dirt substrate of the second water curtain 01 flow to the probability on the surface of substrate 01, a kind of shown in Figure 2, specific reality
Apply in mode, the first gap 21 is parallel with the second gap 22 and is close in a side of cover body 10, the first gap 21 and side
Distance is less than or equal to 30mm, and the distance in the second gap 22 and side is less than or equal to 50mm.It is then shown in Figure 4, in substrate mill
In the course of work of edge equipment, the first water curtain 100 and the second water curtain 200 flow to the region close to side 011 to be ground on substrate 01
And flowed out at side 011 to be ground, reduce the contact area of the first water curtain 100 and the second water curtain 200 and substrate 01.
To reduce in the impact of the first water curtain 100 and the second water curtain 200 to substrate 01, a kind of embodiment, first
The hydraulic pressure of the water curtain 200 of water curtain 100 and second is more than or equal to 0.6MPa and less than or equal to 1.5MPa, can reduce rushing to substrate 01
Hit, substrate 01 is difficult that vibration occurs under the impact of the first water curtain 100 and the second water curtain 200 or is produced rupture.
After the osculum 311 of flusher 30 is rinsed substrate 01, it is possible to deposit in the protection side 11 of cover body 10
Dust is mixed with residual water, residual water, it is possible to pollution can be again resulted in substrate 01.To reduce the residual of flusher 30
Water, shown in Figure 4, in a kind of embodiment, each guiding gutter 31 is rotary structure, and along by each water guide
The bottom surface of groove 31 is on the direction of opening, and the diameter of each guiding gutter 31 gradually increases, and can reduce the cleaning of the outflow of osculum 311
Liquid is attached to the probability in guiding gutter 31.Specifically, it is shown in Figure 4, in a kind of embodiment, each guiding gutter 31
It is plane for frustum cone structure, i.e. surface where osculum 311.Cleaning liquid for further reduction osculum 311 outflow is attached
The probability in guiding gutter 31, it is shown in Figure 5, in another embodiment, between each bottom surface of guiding gutter 31 and side wall
Seamlessly transit and seamlessly transitted between plane where side wall and opening, specifically, the surface where osculum 311 can be sphere,
The structure can further reduce the cleaning liquid being attached in guiding gutter 31.
To ensure the cleaning capacity of flusher 30, in a kind of embodiment, the opening of each guiding gutter 31 it is straight
Footpath is less than or equal to 150mm, and the diameter of each osculum 311 is less than or equal to 30mm.Further, it is shown in Figure 2, rinse
Device 30 includes multiple guiding gutters 31 in the protection array distribution of side 11.Specifically, the quantity and distribution area of guiding gutter 31 should
It is configured according to the size of substrate 01.
In the course of work of substrate edger unit, dirtproof cover need to be moved to the top of substrate 01 simultaneously before process of lapping starts
Removed after process of lapping terminates, and when substrate 01 has many sides 011 to be ground, dirtproof cover also needs to follow substrate edging
Equipment is rotated to adapt to different sides to be ground 011, to make the cover body 10 of dirtproof cover be translated or gyration, referring to
Shown in Fig. 1 and Fig. 4, in a kind of embodiment, the dirtproof cover that the present embodiment is provided also includes the transmission being connected with cover body 10
Mechanism 40, transmission mechanism 40 is used to drive cover body 10 to carry out translational motion or gyration, or drives the colleague of cover body 10 to be put down
Shifting movement and gyration.In specific implementation, transmission mechanism 40 can be realized using motor or slide rail.
Based on same inventive concept, the present embodiment additionally provides a kind of substrate edger unit, including as above-mentioned embodiment is carried
The dirtproof cover of confession.
Obviously, those skilled in the art can carry out various changes and modification without departing from this hair to the embodiment of the present invention
Bright spirit and scope.So, if these modifications and variations of the present invention belong to the claims in the present invention and its equivalent technologies
Within the scope of, then the present invention is also intended to comprising including these changes and modification.
Claims (13)
1. a kind of substrate dirtproof cover, for substrate edger unit, it is characterised in that including:
Cover body, the cover body have protection side, the protection side in the course of work of the substrate edger unit with it is to be ground
Substrate be oppositely arranged;
Drenching installation, in the course of work of the substrate edger unit, the drenching installation is used for the protection in the cover body
Formed on side between the first water curtain for flowing to the substrate, the plane and the substrate where first water curtain away from described
The angle of the side on side to be ground is less than 90 °, and on the edge direction to be ground of the substrate, the length of first water curtain is big
In or equal to the substrate length;
Flusher, in the course of work of the substrate edger unit, the flusher is used for the protection in the cover body
The lateral substrate discharge cleaning liquid.
2. substrate dirtproof cover according to claim 1, it is characterised in that in the course of work of the substrate edger unit
In, the drenching installation is additionally operable to form the second water curtain for flowing to the substrate, described second on the protection side of the cover body
Water curtain is located at side of first water curtain away from the side to be ground, plane where second water curtain and the substrate it
Between angle in the side away from the side to be ground be less than 90 °, and on the edge direction to be ground of the substrate, described second
The length of water curtain is more than or equal to the length of the substrate.
3. substrate dirtproof cover according to claim 2, it is characterised in that plane and the base where second water curtain
Between plate away from the side to be ground side angle be less than first water curtain where plane and the substrate between
Angle in the side away from the side to be ground.
4. substrate dirtproof cover according to claim 3, it is characterised in that plane and the base where first water curtain
Angle between plate in the side away from the side to be ground is less than or equal to 45 °, plane and institute where second water curtain
State the angle between substrate in the side away from the side to be ground and be less than 45 degree.
5. substrate dirtproof cover according to claim 2, it is characterised in that the drenching installation includes being used for flowing out described the
First gap of one water curtain and the second gap for flowing out second water curtain;
First gap is parallel with second gap and is close in a side of the cover body, first gap and institute
The distance for stating side is less than or equal to 30mm, and the distance in second gap and the side is less than or equal to 50mm.
6. substrate dirtproof cover according to claim 2, it is characterised in that the water of first water curtain and second water curtain
Pressure is more than or equal to 0.6MPa and less than or equal to 1.5MPa.
7. the substrate dirtproof cover according to claim any one of 1-6, it is characterised in that the flusher includes being arranged at
At least one guiding gutter of the protection side, each guiding gutter is rotary structure, and along the bottom surface by each guiding gutter to opening
On the direction of mouth, the diameter of each guiding gutter gradually increases;
The bottom surface of each guiding gutter is provided with the osculum for being used for discharging cleaning liquid.
8. substrate dirtproof cover according to claim 7, it is characterised in that each guiding gutter is frustum cone structure.
9. substrate dirtproof cover according to claim 7, it is characterised in that each smoothed between water guide groove bottom and side wall
Cross and seamlessly transitted between plane where side wall and opening.
10. substrate dirtproof cover according to claim 7, it is characterised in that the diameter of the opening of each guiding gutter be less than or
Equal to 150mm, the diameter of each osculum is less than or equal to 30mm.
11. substrate dirtproof cover according to claim 7, it is characterised in that the flusher includes multiple described anti-
Protect the guiding gutter of side array distribution.
12. substrate dirtproof cover according to claim 7, it is characterised in that the also driver including being connected with the cover body
Structure, the transmission mechanism is used to drive the cover body to be translated, and/or, gyration.
13. a kind of substrate edger unit, it is characterised in that including the dirtproof cover as described in claim any one of 1-12.
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111152095A (en) * | 2020-01-07 | 2020-05-15 | 武汉华星光电半导体显示技术有限公司 | Substrate polishing apparatus and substrate polishing method |
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CN205201232U (en) * | 2015-12-10 | 2016-05-04 | 金雅豪精密金属科技(深圳)股份有限公司 | Water -curtain -type aluminium, magnesium alloy burnishing and polishing dust shaker |
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CN111152095A (en) * | 2020-01-07 | 2020-05-15 | 武汉华星光电半导体显示技术有限公司 | Substrate polishing apparatus and substrate polishing method |
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