CN107256848A - Semiconductor package assembly and a manufacturing method thereof - Google Patents

Semiconductor package assembly and a manufacturing method thereof Download PDF

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Publication number
CN107256848A
CN107256848A CN201710377401.2A CN201710377401A CN107256848A CN 107256848 A CN107256848 A CN 107256848A CN 201710377401 A CN201710377401 A CN 201710377401A CN 107256848 A CN107256848 A CN 107256848A
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CN
China
Prior art keywords
semiconductor package
integrated circuit
circuit die
functional surfaces
carrier plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710377401.2A
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Chinese (zh)
Inventor
穆新
曹若培
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rirong semiconductor (Shanghai) Co.,Ltd.
Original Assignee
Ase Assembly & Test (shanghai) Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ase Assembly & Test (shanghai) Ltd filed Critical Ase Assembly & Test (shanghai) Ltd
Priority to CN201710377401.2A priority Critical patent/CN107256848A/en
Publication of CN107256848A publication Critical patent/CN107256848A/en
Pending legal-status Critical Current

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/50Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
    • H01L21/56Encapsulations, e.g. encapsulation layers, coatings
    • H01L21/568Temporary substrate used as encapsulation process aid

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)

Abstract

The present invention is on semiconductor package assembly and a manufacturing method thereof.Semiconductor package part according to an embodiment of the invention is included:Integrated circuit die and the insulation shell for covering the integrated circuit die.The integrated circuit die has functional surfaces and the pad face relative with the functional surfaces, and the pad face is provided with some pads.Wherein the functional surfaces are both exposed to outside insulation shell with some pads.Semiconductor package assembly and a manufacturing method thereof provided in an embodiment of the present invention, simply high-quality ultra-thin semiconductor packaging part can be obtained by processing procedure compared to prior art, and production cost is low.

Description

Semiconductor package assembly and a manufacturing method thereof
Technical field
The present invention relates to technical field of semiconductors, more particularly to semiconductor package assembly and a manufacturing method thereof.
Background technology
With electronic product small, in the industry to the size requirement of semiconductor package part also more and more thinner, for example, have The thickness of the semiconductor package part of required by electronic product is even only 0.3+/- 0.03mm.In this case, if still used Traditional package substrate and the encapsulation mode of injection molding have two kinds of situations:One kind is to use more thin substrate, for example, 0.1mm The thick substrate injection-moulded housing thick with 0.2mm;It is another, be use thinner injection-moulded housing, for example 0.2mm thick substrates with Injection-moulded housing thick 0.1mm.And in actual production, both of which haves the shortcomings that certain and inferior position, if using thin Substrate, then thin substrate process is complex and high cost;On the other hand, as used thin injection-moulded housing, then because needed for injection Die cap (mold cap) is very thin and causes injection difficult, and overall thickness is difficult control.
To sum up, be adapt to electronic market lightening demand, existing semiconductor packaging still need to constantly improve and Innovation.
The content of the invention
An object of the present invention is to provide a kind of semiconductor package assembly and a manufacturing method thereof, and it can realize very thin half Semiconductor package part after conductor packaging part, such as 0.3+/- 0.03mm.
Semiconductor package part according to an embodiment of the invention is included:Integrated circuit die and cover the integrated circuit die Insulation shell.The integrated circuit die has functional surfaces and the pad face relative with the functional surfaces, if the pad face is provided with Dry pad.Wherein the functional surfaces are both exposed to outside insulation shell with some pads.
In another embodiment of the invention, the functional surfaces can be a sensing face.The semiconductor package part does not include lead, Package substrate or lead frame are not included yet.The semiconductor package part can be Background Grid array packages.
One embodiment of the invention additionally provides the manufacture method of semiconductor package part, and it is included:One encapsulating carrier plate is provided; In setting a viscous material layer on encapsulating carrier plate, the viscous material layer has the encapsulation position for being configured to paste integrated circuit die Put;The functional surfaces of integrated circuit die or pad face are pasted on package position;Integrated circuit die is carried out plastic packaging to be formed Cover the plastic packaging colloid of integrated circuit die;And the plastic packaging colloid of polishing is until expose weldering when functional surfaces are pasted on package position Pad in card, exposes functional surfaces when pad face is pasted on package position.
According to still another embodiment of the invention, the encapsulating carrier plate can be package substrate or metallic plate, the semiconductor packages The manufacture method of part further comprises planting tin ball on pad.The package position is by the upper surface through encapsulating carrier plate to lower surface Encapsulation groove define, the viscous material layer is pasted on encapsulation trench bottom.The viscous material layer can be one side glue.And according to the present invention Another embodiment, the viscous material layer can be the double faced adhesive tape on the surface for being pasted on the encapsulating carrier plate, and the package position is provided In the Free Surface of viscous material layer, the Free Surface is relative with the surface for being pasted on encapsulating carrier plate.The semiconductor package part Manufacture method further comprises heating encapsulating carrier plate Free Surface and integrated circuit die and plastic packaging so that the viscous material layer Colloid is separated.
Semiconductor package assembly and a manufacturing method thereof provided in an embodiment of the present invention, can obtain high-quality compared to prior art Ultra-thin semiconductor packaging part, and processing procedure is simple, and production cost is low.
Brief description of the drawings
It is the top view of semiconductor package part according to an embodiment of the invention shown in Fig. 1
Fig. 2 is the upward view of semiconductor package part in Fig. 1
Fig. 3 is the side sectional view of semiconductor package part in Fig. 1
It is the schematic flow sheet of the manufacture method of semiconductor package part according to an embodiment of the invention shown in Fig. 4 a-4d
It is the schematic flow sheet of the manufacture method of semiconductor package part according to another embodiment of the present invention shown in Fig. 5 a-5c
Embodiment
Spirit for a better understanding of the present invention, makees furtherly below in conjunction with the part preferred embodiment of the present invention to it It is bright.
It is the top view of semiconductor package part 100 according to an embodiment of the invention shown in Fig. 1, Fig. 2 is semiconductor in Fig. 1 The upward view of packaging part 100, and Fig. 3 is then the side sectional view of semiconductor package part 100 in Fig. 1.
As Figure 1-3, semiconductor package part 100 according to an embodiment of the invention can be a LGA (Land Grid Array, Background Grid array packages) packaging part, it includes an at least integrated circuit die 12 and coats the integrated circuit die 12 Insulation shell 14.The integrated circuit die 12 has functional surfaces 120 and the pad face 122 relative with the functional surfaces 120.The function Face 120 is exposed to the upper surface 140 of insulation shell 14, and has different work(according to the purposes difference of integrated circuit die 12 Can, it can for example be to provide the sensing face of sensing function.Pad face 122 is provided with some pads 124 being arranged in array, if should Dry pad 124 is exposed to the lower surface 142 of insulation shell 14.Some pads 124 can further be planted upper tin ball (diagram), with The semiconductor package part 100 is attached on related circuit plate (not shown), so as to realize integrated circuit die 12 and external electrical Circuit connection configuration between road.Different from traditional semiconductor package part, the semiconductor package part 100 is without any lead, envelope Substrate or lead frame are filled, the input/output connection of its integrated circuit die 12 can be provided by pad 124.
It can be seen that, semiconductor package part 100 provided in an embodiment of the present invention can be such that functional surfaces 120 are both exposed to pad 124 Outside insulation shell 14, the thickness of whole semiconductor package part 100 is mainly determined by the thickness of integrated circuit die 12, so as to the greatest extent The thickness of semiconductor package part 100 may be reduced, very thin semiconductor package part 100, for example, 0.3+/- 0.03mm is obtained.
The embodiment of the present invention additionally provides the manufacture method of semiconductor package part 100, and it can manufacture above-mentioned very thin partly lead Body packaging part 100.According to one embodiment of the invention, the manufacture method of the semiconductor package part 100 mainly includes:One envelope is provided Loading plate 20;In setting a viscous material layer 24 on encapsulating carrier plate 20, the viscous material layer 24, which has, to be configured to paste integrated The package position 22 of circuit die 12;One of the functional surfaces 120 of integrated circuit die 12 and pad face 122 are pasted on this Package position 22;Then the integrated circuit die 12 is carried out plastic packaging to form the plastic packaging colloid of the masking integrated circuit die 12 26;And the plastic packaging colloid 12 of polishing is until expose the pad 124 or functional surfaces 120 of integrated circuit die 12.Specific manufacture Process can make further demonstration by following different embodiment.
It is the flow signal of the manufacture method of semiconductor package part 100 according to an embodiment of the invention shown in Fig. 4 a-4d Figure.Understand herein for the sake of, Fig. 4 c and 4d shows semiconductor package part 100 more lesser amount of than Fig. 4 a, 4b.
With reference to Fig. 4 a, the encapsulating carrier plate 20 can be a strip-shaped packaging substrate in the present embodiment, on the encapsulating carrier plate 20 Provided with some package positions 22, each package position 22 through its upper surface 200 to the encapsulation groove of lower surface (not shown) by defining. These package positions 22 can be into array arrangement.The size for encapsulating groove is suitable or bigger with the integrated circuit die 12 to be encapsulated, Depth should be less than the thickness of corresponding integrated circuit nude film 12 so that its pad 124 when integrated circuit die 12 is contained in wherein can be convex Stretch outside encapsulation groove.
As shown in Figure 4 b, the bottom of some encapsulation grooves 22 is covered by viscous material layer 24.For example, in the encapsulating carrier plate A viscous material layer 24 can be laid in 20 one side, such as lower surface, for example, pastes one layer of adhesive plaster.Specifically, in the present embodiment, The upper surface 200 of encapsulating carrier plate 20 can be made to be put into upward in laminator (not shown), viscous material layer 24 is pasted by laminator In the lower surface of encapsulating carrier plate 20, the viscous material layer 24 can be one side glue, so as to subsequently can be directly from being torn on encapsulating carrier plate 20 Under.Viscous material layer 24 exposes its glued portion in encapsulation trench bottom accordingly, so as to provide Pasting integrated circuit die 12 package position.
Hereafter, as illustrated in fig. 4 c, some integrated circuit dies 12 to be packaged are placed respectively according to flag bit (not shown) Package position 22 in encapsulation groove accordingly, make its functional surfaces 120 for the cementation of viscous material layer 24 and pad face 122 upward So that pad 124 is convexedly stretched in outside encapsulation groove, it can then carry out the PROCESS FOR TREATMENT of injection molding and be formed and cover the integrated circuit The insulation shell 14 of the plastic packaging colloid 26 of nude film 12, i.e. single semiconductor package part 100 of later stage.In the encapsulation larger-size feelings of groove Under condition, it is preferred that the integrated circuit die 12 housed is arranged at the centre position of encapsulation groove.
The technique of the injection molding can be traditional injection molding process, and it can will include some integrated circuit dies 12 Cover the upper surface 200 of whole encapsulating carrier plate 20 inside.As shown in figure 4d, after injection molding terminates, plastic packaging is encapsulated and carried The plastic packaging colloid 26 of the upper surface 200 of plate 20 carries out polishing until exposing the pad 124 of each integrated circuit die 12, then It can carry out planting the operation such as tin ball, segmentation, finishing on pad 124 obtaining the semiconductor package part 100 of single.Cohesive material Layer 24 can be removed when injection is completed or segmentation is repaired, and there is no particular limitation.
It can be seen that, the manufacture method of semiconductor package part 100 according to an embodiment of the invention is without routing, and encapsulating carrier plate 20 are removed after encapsulation terminates, so that the thickness of semiconductor package part 100 is completely by the thickness of integrated circuit die 12 Determine, thus can accomplish very thin.In other embodiments, encapsulating carrier plate 20 can be other materials, for example, gold such as steel plate Belong to plate, it is not limited to package substrate, so that recycling can be realized.
The manufacture method of semiconductor package part 100 provided in an embodiment of the present invention can also be real by more easy method It is existing, the Free Surface that integrated circuit die 12 is set directly at viscous material layer 24 (is contacted with encapsulating carrier plate 20 The relative another surface in surface), so as to save the trouble slotted on encapsulating carrier plate 20.
It is that the flow of the manufacture method of semiconductor package part 100 according to another embodiment of the present invention is shown shown in Fig. 5 a-5c It is intended to.
With reference to Fig. 5 a, the encapsulating carrier plate 20 can be the smooth package substrate or steel plate of a strip in the present embodiment, no Encapsulation groove 22 with hollow out.The cohesive material of a double faced adhesive tape can be laid in the one side of the encapsulating carrier plate 20, such as upper surface 200 Layer 24.Specifically, in the present embodiment, the upper surface 200 of encapsulating carrier plate 200 can be upward put into laminator (not shown), Viscous material layer 24 can be pasted onto the upper surface 200 of encapsulating carrier plate 20 by laminator.In the Free Surface of the viscous material layer 24 Some package positions 22 are marked out on 240, four ends angle of a package position 22 can be such as marked with cross.The Free Surface 240 is relative with the face that encapsulating carrier plate 20 is bonded with the viscous material layer 24.
Then, as shown in Figure 5 b, some integrated circuit dies 12 to be packaged can be individually positioned in corresponding encapsulation position Put 22, and make its functional surfaces 120 be 24 cementations of the viscous material layer, can then carry out injection molding PROCESS FOR TREATMENT and shape Into the insulation shell 14 for covering the integrated circuit die 12.It is preferred that, the center of integrated circuit die 12 is correspondingly arranged in encapsulation The centre position of groove 22.
The technique of the injection molding can be traditional injection molding process, and it can will include some integrated circuit dies 12 Cover the upper surface 200 of whole encapsulating carrier plate 20 inside.As shown in Figure 5 c, after injection molding terminates, plastic packaging is encapsulated and carried The plastic packaging colloid 26 of the upper surface 200 of plate 20 carries out polishing until exposing the pad 124 of each integrated circuit die 12.May be used also Encapsulating carrier plate 20 is heated so that the Free Surface 240 of viscous material layer 24 can be with each integrated circuit die 12 and plastic packaging colloid 26 separation, and one side can be still bonded on encapsulating carrier plate 20 in addition.Then it can carry out planting tin ball, segmentation, finishing etc. on pad 124 Operation is so as to obtain the semiconductor package part 100 of single.Viscous material layer 24 can completely be gone when injection is completed or segmentation is repaired Remove, there is no particular limitation.
Although above-described embodiment is only demonstrated is pasted on viscous material layer 24 by the functional surfaces 120 of integrated circuit die 12 On, the situation for the exposed pad 124 of plastic packaging colloid 26 of then polishing.Those skilled in the art are complete based on above-mentioned disclosure and enlightenment It is appreciated that and grasps in other embodiments entirely, also the pad face 122 of integrated circuit die 12 can be pasted on cohesive material On layer 24, plastic packaging colloid 26 of then polishing exposes functional surfaces 120.Because concrete technology is similar, here is omitted.
The technology contents and technical characterstic of the present invention have revealed that as above, but those skilled in the art still may base Make a variety of replacements and modification without departing substantially from spirit of the present invention in teachings of the present invention and announcement.Therefore, protection model of the invention The content disclosed in embodiment should be not limited to by enclosing, and should include various replacements and modification without departing substantially from the present invention, and be this patent Application claims are covered.

Claims (12)

1. a kind of semiconductor package part, it is included:
Integrated circuit die, has:
Functional surfaces;And
Pad face, it is relative with the functional surfaces, and the pad face is provided with some pads;And
Insulation shell, covers the integrated circuit die;Wherein described functional surfaces are both exposed to described exhausted with some pads Outside edge housing.
2. semiconductor package part as claimed in claim 1, wherein the functional surfaces are a sensing face.
3. semiconductor package part as claimed in claim 1, wherein the semiconductor package part does not include lead.
4. semiconductor package part as claimed in claim 1, wherein the semiconductor package part does not include package substrate or lead Framework.
5. semiconductor package part as claimed in claim 1, wherein the semiconductor package part is Background Grid array packages.
6. a kind of manufacture method of semiconductor package part, it is included:
One encapsulating carrier plate is provided;
In setting a viscous material layer on the encapsulating carrier plate, the viscous material layer, which has, to be configured to paste integrated circuit die Package position;The integrated circuit die has functional surfaces and the pad face relative with the functional surfaces;
One in the functional surfaces of the integrated circuit die and pad face is pasted on the package position;
Plastic packaging is carried out to the integrated circuit die and covers the plastic packaging colloid of the integrated circuit die to be formed;And
Polish the plastic packaging colloid until:Expose the weldering on the pad face when the functional surfaces are pasted on the package position Disk;Expose the functional surfaces when the pad face is pasted on the package position.
7. manufacture method as claimed in claim 6, wherein the encapsulating carrier plate is package substrate or metallic plate.
8. manufacture method as claimed in claim 6, wherein the package position by the upper surface through the encapsulating carrier plate extremely The encapsulation groove of lower surface is defined, and the viscous material layer is pasted on the encapsulation trench bottom.
9. manufacture method as claimed in claim 8, wherein the viscous material layer is one side glue.
10. manufacture method as claimed in claim 6, wherein the viscous material layer is the table for being pasted on the encapsulating carrier plate The double faced adhesive tape in face, the package position is provided in the Free Surface of the viscous material layer, and the Free Surface is pasted with described It is relative in the surface of the encapsulating carrier plate.
11. manufacture method as claimed in claim 10, it further comprises heating the encapsulating carrier plate so that the sticky material The Free Surface of the bed of material is separated with the integrated circuit die and the plastic packaging colloid.
12. manufacture method as claimed in claim 6, it further comprises planting tin ball on the pad.
CN201710377401.2A 2017-05-25 2017-05-25 Semiconductor package assembly and a manufacturing method thereof Pending CN107256848A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710377401.2A CN107256848A (en) 2017-05-25 2017-05-25 Semiconductor package assembly and a manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710377401.2A CN107256848A (en) 2017-05-25 2017-05-25 Semiconductor package assembly and a manufacturing method thereof

Publications (1)

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CN107256848A true CN107256848A (en) 2017-10-17

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Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1535479A (en) * 2000-08-16 2004-10-06 ض� Direct build-up layer on encapsulated die package
JP2009252859A (en) * 2008-04-03 2009-10-29 Shinko Electric Ind Co Ltd Semiconductor device and method of manufacturing the same
CN102074514A (en) * 2009-11-23 2011-05-25 三星半导体(中国)研究开发有限公司 Encapsulation element and manufacturing method thereof
US20130175686A1 (en) * 2012-01-10 2013-07-11 Intel Mobile Communications GmbH Enhanced Flip Chip Package
US20140357020A1 (en) * 2013-06-03 2014-12-04 Aleksandar Aleksov Methods for high precision microelectronic die integration
US20160211214A1 (en) * 2015-01-20 2016-07-21 Taiwan Semiconductor Manufacturing Company Ltd. Power amplifier package and method thereof
CN105957836A (en) * 2016-06-01 2016-09-21 格科微电子(上海)有限公司 Fan-out type wafer-level packaging method for semiconductor device
CN206864454U (en) * 2017-05-25 2018-01-09 日月光封装测试(上海)有限公司 Semiconductor package part

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1535479A (en) * 2000-08-16 2004-10-06 ض� Direct build-up layer on encapsulated die package
JP2009252859A (en) * 2008-04-03 2009-10-29 Shinko Electric Ind Co Ltd Semiconductor device and method of manufacturing the same
CN102074514A (en) * 2009-11-23 2011-05-25 三星半导体(中国)研究开发有限公司 Encapsulation element and manufacturing method thereof
US20130175686A1 (en) * 2012-01-10 2013-07-11 Intel Mobile Communications GmbH Enhanced Flip Chip Package
US20140357020A1 (en) * 2013-06-03 2014-12-04 Aleksandar Aleksov Methods for high precision microelectronic die integration
US20160211214A1 (en) * 2015-01-20 2016-07-21 Taiwan Semiconductor Manufacturing Company Ltd. Power amplifier package and method thereof
CN105957836A (en) * 2016-06-01 2016-09-21 格科微电子(上海)有限公司 Fan-out type wafer-level packaging method for semiconductor device
CN206864454U (en) * 2017-05-25 2018-01-09 日月光封装测试(上海)有限公司 Semiconductor package part

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Effective date of registration: 20201229

Address after: No. 669, GuoShouJing Road, Pudong New Area pilot Free Trade Zone, Shanghai, 201203

Applicant after: Rirong semiconductor (Shanghai) Co.,Ltd.

Address before: 6th floor, no.669 GuoShouJing Road, Pudong New Area pilot Free Trade Zone, Shanghai 201203

Applicant before: ASE ASSEMBLY & TEST (SHANGHAI) Ltd.