CN107253134A - A kind of rubbing head of not ponding - Google Patents

A kind of rubbing head of not ponding Download PDF

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Publication number
CN107253134A
CN107253134A CN201710606798.8A CN201710606798A CN107253134A CN 107253134 A CN107253134 A CN 107253134A CN 201710606798 A CN201710606798 A CN 201710606798A CN 107253134 A CN107253134 A CN 107253134A
Authority
CN
China
Prior art keywords
lid
rubbing head
matrix
clip assemblies
top cover
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CN201710606798.8A
Other languages
Chinese (zh)
Other versions
CN107253134B (en
Inventor
赵德文
路新春
陈祥玉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tianjin Hwatsing Technology Co Ltd (hwatsing Co Ltd)
Tsinghua University
Original Assignee
Tianjin Hwatsing Technology Co Ltd (hwatsing Co Ltd)
Tsinghua University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tianjin Hwatsing Technology Co Ltd (hwatsing Co Ltd), Tsinghua University filed Critical Tianjin Hwatsing Technology Co Ltd (hwatsing Co Ltd)
Priority to CN201710606798.8A priority Critical patent/CN107253134B/en
Publication of CN107253134A publication Critical patent/CN107253134A/en
Priority to PCT/CN2018/096003 priority patent/WO2019019941A1/en
Application granted granted Critical
Publication of CN107253134B publication Critical patent/CN107253134B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/11Lapping tools
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/10Greenhouse gas [GHG] capture, material saving, heat recovery or other energy efficient measures, e.g. motor control, characterised by manufacturing processes, e.g. for rolling metal or metal working

Abstract

The invention discloses a kind of rubbing head of not ponding, the rubbing head includes:Clip assemblies;Lid, lid is movably mounted on clip assemblies and accommodating chamber is limited between clip assemblies;Matrix, matrix can be arranged on clip assemblies and in accommodating chamber up or down, and matrix is closely coupled with lid;Diaphragm, diaphragm is connected with clip assemblies and matrix respectively, and limits closed chamber.The rubbing head of not ponding according to embodiments of the present invention, gapless between lid and the top of matrix, prevent polishing fluid from entering inside rubbing head, will not so extrude polishing fluid inside rubbing head under the relative motion of clip assemblies and matrix, not interfere with glossing and polishing effect.

Description

A kind of rubbing head of not ponding
Technical field
The present invention relates to a kind of chemical-mechanical polisher technical field, more particularly, to a kind of polishing of not ponding Head.
Background technology
Sealed between on the outside of the lid and clip assemblies of polissoir in correlation technique, between having between lid and matrix Gap, the gap that polishing fluid can be between lid and matrix enters the inside of polissoir, in polishing process, is deposited on polishing and sets Standby interior polishing fluid can outwards overflow, and then influence the polishing effect of the substrate of polissoir.
The content of the invention
It is contemplated that at least solving one of technical problem present in prior art.Therefore, the present invention proposes one kind not The rubbing head of ponding, the rubbing head can avoid polishing fluid from entering inside rubbing head and then influence polishing effect.
The rubbing head of not ponding according to embodiments of the present invention includes:Clip assemblies;Lid, the lid is movably pacified Accommodating chamber is limited on the clip assemblies and between the clip assemblies;Matrix, described matrix can be up or down On clip assemblies and in the accommodating chamber, described matrix and the lid are closely coupled;Diaphragm, the diaphragm point It is not connected with the clip assemblies and described matrix, and limits closed chamber.
The rubbing head of not ponding according to embodiments of the present invention, by the way that matrix and lid are in close contact so that lid with Gapless between the top of matrix, prevents polishing fluid from entering inside rubbing head, the relative motion so in clip assemblies and matrix Under will not inside the rubbing head extrusion polishing fluid, not interfere with glossing and polishing effect.
According to one embodiment of present invention, described matrix and the inner roof wall face of the lid are connected.
Alternatively, described matrix includes:Middle shaft part, the axis hole middle shaft part described in insertion, the lid along the vertical direction Center be provided with through hole, the upper end of the middle shaft part passes through the through hole;Outer portion, the outer portion is set around the middle shaft part Put, the outer portion is connected with the lid by bolt.
According to the optional example of the present invention, the upper surface of the clip assemblies is located at provided with the second groove and part Gland in the lid, the lid when moving up and down with the gland is at least part of coincides.
According to further example of the invention, the first sealing ring is provided between the gland and the clip assemblies.
Alternatively, one in the inner top surface of the upper surface of the outer portion and the lid is provided with the second sealing ring.
Alternatively, the internal perisporium of the outer peripheral face of the middle shaft part and the through hole is brought into close contact.
Alternatively, the lid includes:Top cover, described matrix is closely coupled in the diaphragm and the top cover;Coaming plate, institute Coaming plate is stated to set and extend downwardly from the periphery edge of the top cover around the top cover.
According to optional example of the invention, the top cover is horizontally disposed with.
According to optional example of the invention, it is connected between the top cover and the coaming plate by arc sections.
According to optional example of the invention, it is connected between the top cover and the coaming plate by rake.
According to optional example of the invention, the top cover inclines gradually downward along the heart therefrom to the direction at the coaming plate Tiltedly set.
The additional aspect and advantage of the present invention will be set forth in part in the description, and will partly become from the following description Obtain substantially, or recognized by the practice of the present invention.
Brief description of the drawings
The above-mentioned and/or additional aspect and advantage of the present invention will become from description of the accompanying drawings below to embodiment is combined Substantially and be readily appreciated that, wherein:
Fig. 1 is the schematic diagram of rubbing head according to embodiments of the present invention;
Fig. 2 is the schematic diagram of rubbing head according to embodiments of the present invention;
Fig. 3 is the schematic diagram of rubbing head in accordance with another embodiment of the present invention;
Fig. 4 is the schematic diagram of rubbing head according to embodiments of the present invention;
Fig. 5 is the schematic diagram of the rubbing head according to another embodiment of the invention;
Fig. 6 is the schematic diagram of rubbing head according to embodiments of the present invention.
Reference:
100:Rubbing head;
10:Clip assemblies;11:Middle pivot;12:Second groove;13:3rd groove;14:Retaining ring;
20:Lid;20a:Accommodating chamber;21:Top cover;22:Coaming plate;
23:Arc sections;24:Rake;
30:Matrix;30a:Axis hole;31:Middle shaft part;32:Outer portion;321:First groove;322:Pressure ring;
40:Diaphragm;
50:Gland;
60:First sealing ring;
70:Second sealing ring.
Embodiment
Embodiments of the invention are described below in detail, the example of the embodiment is shown in the drawings, wherein from beginning to end Same or similar label represents same or similar element or the element with same or like function.Below with reference to attached The embodiment of figure description is exemplary, is only used for explaining the present invention, and is not considered as limiting the invention.
In the description of the invention, it is to be understood that term " " center ", " on ", " under ", " vertical ", " level ", The orientation or position relationship of the instruction such as " top ", " bottom " " interior ", " outer ", " axial direction ", " radial direction ", " circumference " are based on shown in the drawings Orientation or position relationship, are for only for ease of the description present invention and simplify description, rather than indicate or imply signified device or Element must have specific orientation, with specific azimuth configuration and operation, therefore be not considered as limiting the invention.This Outside, " first " is defined, one or more this feature can be expressed or be implicitly included to the feature of " second ".In this hair In bright description, unless otherwise indicated, " multiple " are meant that two or more.
In the description of the invention, it is necessary to illustrate, unless otherwise clearly defined and limited, term " installation ", " phase Even ", " connection " should be interpreted broadly, for example, it may be being fixedly connected or being detachably connected, or be integrally connected;Can To be mechanical connection or electrical connection;Can be joined directly together, can also be indirectly connected to by intermediary, Ke Yishi The connection of two element internals.For the ordinary skill in the art, with concrete condition above-mentioned term can be understood at this Concrete meaning in invention.
The rubbing head 100 of not ponding according to embodiments of the present invention is described below with reference to Fig. 1-Fig. 6.
As shown in figure 1, rubbing head 100 according to embodiments of the present invention includes clip assemblies 10, lid 20, matrix 30 and film Piece 40.
Wherein, lid 20 is arranged on clip assemblies 10, and can be moved (such as Fig. 1 and Fig. 2 institutes relative to clip assemblies 10 Show, lid 20 is moved up and down relative to clip assemblies 10), accommodating chamber 20a, matrix are limited between lid 20 and clip assemblies 10 30 are arranged on clip assemblies 10 and can be moved up and down relative to clip assemblies 10, and matrix 30 is located in accommodating chamber 20a, matrix 30 is closely coupled with lid 20;Diaphragm 40 is connected with clip assemblies 10 and matrix 30 respectively, diaphragm 40 respectively with clip assemblies 10 are connected with matrix 30, and limit closed chamber, gapless between matrix 30 and lid 20, and diaphragm 40 is in clip assemblies 10 There is cushioning effect in relative motion with matrix 30.
Rubbing head 100 according to embodiments of the present invention, by the way that matrix 30 and lid 20 is closely coupled, it is ensured that lid 20 With the sealing between the top of matrix 30, it is to avoid polishing fluid, which enters, causes the heavy of polishing fluid in accommodating chamber 20a in accommodating chamber 20a Product, so in matrix 30 and snip 10 relative motion of component, will not extrude polishing fluid, therefore do not interfere with accommodating chamber 20a Polishing effect and glossing, it is ensured that stability and good polishing effect that rubbing head 100 is used.
It should be further stated that, the upper end of rotary drive mechanism (not shown) and rubbing head 100 is fixed, and drives throwing Shaven head rotation, substrate (not shown) is pressed together between polishing pad (not shown) and the clip assemblies on polishing disk (not shown).Throw CD rotates under drive mechanism drive, movable along planned orbit while 100 autobiography of rubbing head, substrate and polishing pad it Between supply appropriate polishing fluid, so, under chemistry, the comprehensive function of machinery, realize to the polishing effect of substrate.
Rubbing head 100 is in polishing process, and the supply period of supply and polishing fluid for polishing fluid is respectively provided with strictly It is required that, by matrix 30 and lid 20 it is closely coupled when, polishing fluid can not be deposited on inside rubbing head 100, efficiently avoid base The phenomenon of the polishing fluid of extrusion deposition occurs with the relative motion of clip assemblies 10 for body 30, when being polished to substrate, only fits The polishing fluid of amount supply is sprinkled upon on substrate, and the period of supply polishing fluid also complies with glossing, does not interfere with the throwing to substrate Light effect.
Alternatively, the inner roof wall face of matrix 30 and lid 20 is connected, and prevents polishing fluid from entering from the top of lid 20 Inside rubbing head 100, it is to avoid may extrude the polishing fluid being deposited on inside rubbing head 100 when matrix 30 is moved up and down, and then Influence polishing effect.
According to one embodiment of present invention, the center of clip assemblies 10 has the middle pivot 11 upwardly extended, middle pivot 11 are fixed in the axis hole 30a on matrix 30, have the axis hole 30a being engaged with middle pivot 11, maincenter at the center of matrix 30 Axle 11 can be stretched into axis hole 30a, so as to realize the mating connection of matrix 30 and clip assemblies 10.
Alternatively, matrix 30 includes middle shaft part 31 and outer portion 32, axis hole 30a insertion middle shaft parts 31 in the vertical direction, Through hole is provided with lid 20, and the external diameter of middle shaft part 31 and the diameter of through hole are equal, the upper end of the middle shaft part 31 of matrix 30 can Through the through hole of lid 20, being closely connected for matrix 30 and lid 20 is realized.
The outer portion 32 of matrix 30 is set around middle shaft part 31, and diaphragm 40 has cushioning effect, outer portion to outer portion 32 32 upper surface and the internal face of lid 20 are closely coupled so that keep being closely connected between outer portion 32 and lid 20, Specifically, matrix 30 can be bolted with outer portion 32 so that connected between matrix 30 and lid 20 it is even closer, can Lean on, it is ensured that it is closely overall that matrix 30 is connected formation one with lid 20.
In addition, after passing through through hole in the upper end of middle shaft part 31, between middle shaft part 31 and through hole, lid 20 and outer portion 32 it Between be bolted, the two for be fitted close so that accommodating chamber 20a formation one closing cavity, effectively prevent polishing Liquid enters the deposition that polishing fluid is caused in accommodating chamber 20a, it is to avoid is extruded and polished due to matrix 30 and the relative motion of snip component 10 Liquid influences polishing effect, it is ensured that the smooth execution of glossing.
It should be noted that by being provided with through hole on matrix 30, the vacuum of chamber is controlled by external gas source, it is real The relative motion of existing clip assemblies 10 and matrix 30, wherein matrix 30 is fixed, inflates and causes into chamber when external gas source When forming malleation in chamber, clip assemblies 10 move (as shown in Figure 2) towards the direction away from matrix 30, when external gas source is from chamber When interior pumping to form negative pressure in chamber, the direction of clip assemblies 10 to close matrix 30 is moved until (such as Fig. 1 that sets back It is shown).
Further, it is provided with the lower surface of outer portion 32 outside the first groove 321, the insertion matrix 30 of the first groove 321 Side face, i.e. lower surface of the first groove 321 along outer portion 32 circumferentially extends to form first annular groove, in the lower surface of outer portion 32 Neighboring at be provided with pressure ring 322, one end of diaphragm 40 is pressed into the first groove 321 by pressure ring 322 so that diaphragm 40 One end be closely connected with outer portion 32, to ensure cushioning effect of the diaphragm 40 to matrix 30.
According to further example of the invention, the upper surface of clip assemblies 10 is provided with the second groove 12, in addition in intermediate plate group It is additionally provided with gland 50 on part 10, the part of gland 50 is located in lid 20, the other end of diaphragm 40 is pressed on the by gland 50 In two grooves 12, circumference of second groove 12 along clip assemblies 10 is formed as the second annular groove, by another side pressure of diaphragm 40 Enter in the second annular groove so that the connection between clip assemblies 10 and diaphragm 40 is reliable, it is ensured that matrix 30 and lid 20 are in film The cushioning effect of piece 40, and diaphragm 40 is without departing from clip assemblies 10.
Alternatively, when lid 20 is moved up and down, and gland 50 is at least part of overlaps, and can both avoid lid Body 20 departs from gland 50, it is also ensured that the inside of rubbing head 100 is closed cavity.
According to an optional example of the invention, the first sealing ring 60, first are provided between gland 50 and clip assemblies 10 Sealing ring 60 is used for the gap between the lower surface of sealing gland 50 and clip assemblies 10, it is to avoid polishing fluid is by gland 50 and intermediate plate group Gap between part 10 enters the inside of rubbing head 100, it is ensured that the sealing between gland 50 and clip assemblies 10.
Gland 50 is internally provided with fourth annular groove, and the fourth annular groove of gland 50 is arranged on the top of clip assemblies 10 On annular boss, gland 50 is arranged on the top of matrix 30, and the manhole at the middle part of lid 20 is arranged on the top of matrix 30, lid The top of body 20 and matrix 30 is provided with the second sealing ring 70, there is one between the internal face of lid 20 and the outside wall surface of gland 50 Fixed gap, to ensure that the adaptivity that the gland 50 on lid 20 and the opposing clip component 10 of matrix 30 is done along the vertical direction is moved It is dynamic.
Alternatively, the second sealing ring 70 is provided between the upper surface of outer portion 32 and the inner roof wall face of lid 20, is passed through The gap that second sealing ring 70 comes between the inner roof wall face of sealing cover body 20 and the upper surface of outer portion 32, it is ensured that lid 20 and outer portion Sealing between 32, prevents gap of the polishing fluid between lid 20 and outer portion 32 from entering in accommodating chamber 20a, effectively keeps away Exempt from polishing process because being extruded for polishing fluid causes polishing effect not good enough.
Alternatively, the internal perisporium of the outer peripheral face of middle shaft part 31 and through hole is fitted close, it is to be understood that middle pivot 11 Outside dimension is equal with the diameter of through hole so that the just tight fit of middle pivot 11 and through hole, it is ensured that middle pivot 11 and lid Sealing between 20.
According to still another embodiment of the invention, the 3rd groove 13, the 3rd groove are provided with the lower surface of clip assemblies 10 13 circumferentially extend to form the 3rd annular groove along the periphery of the lower surface of clip assemblies 10, i.e. the 3rd annular groove insertion clip assemblies 10 outer peripheral face, retaining ring 14 is provided with the 3rd groove 13, to prevent rubbing head 100 to be thrown out of in operation process, to throwing Shaven head 100 has fixation.
As shown in figure 1, according to optional embodiment of the present invention, lid 20 includes top cover 21 and coaming plate 22, and matrix 30 is in film Piece 40 with top cover 21 is closely coupled connects, be in close contact between the lower wall surface and matrix 30 of top cover 21, coaming plate 22 around top cover 21 into Annular is set and from the periphery of top cover 21 along extending downwardly, accommodating chamber 20a is closed by top cover 21 and the collective effect of coaming plate 22, Form a closed cavity, it is to avoid polishing fluid is by entering in accommodating chamber 20a.
As shown in figure 1, according to optional example of the invention, top cover 21 is horizontally disposed with, the surface of top cover 21 is in horizontal plane cloth Put, convenient formation.
As shown in figure 1, in some specific examples of the present invention, being connected between top cover 21 and coaming plate 22 by arc sections 23 Connect so that the transition between top cover 21 and coaming plate 22 is naturally, good appearance.
Fig. 2 is the schematic diagram of the extreme position of the example shown in Fig. 1, that is, is arranged on pressure ring 322 and intermediate plate on matrix 30 There is maximal clearance in the top of component 10, now, and the coaming plate 22 on the vertical direction of lid 20 has one section mutually with gland 50 The position of coincidence, in CMP process, the polishing fluid of splashing can glide along the top of lid 20, be dropped in polishing disk On (not shown), so it is possible to prevente effectively from polishing fluid enters the inside of rubbing head 100, prevent polishing fluid in matrix 30 and intermediate plate It is extruded during 10 relative motion of component and then influences polishing effect.
As shown in figure 3, in other specific examples of the present invention, passing through the phase of rake 24 between top cover 21 and coaming plate 22 Connection, so, falling the polishing fluid on lid 20 can be glided along top cover 21 by rake 24, be conducive to polishing fluid to glide It is dropped on polishing disk.
Fig. 4 is the schematic diagram of the extreme position of the example shown in Fig. 3, that is, is arranged on pressure ring 322 and intermediate plate on matrix 30 There is maximal clearance in the top of component 10, now, and the coaming plate 22 of the vertical direction of lid 20 has one section with gland 50 and overlaps position Put, the polishing fluid of splashing can glide along the top of lid 20, be dropped on polishing disk, so effectively can prevent polishing fluid from entering The inside of rubbing head 100, prevents polishing fluid to be extruded and then influences polishing effect.
Reference picture 5, according to the present invention optional example, top cover 21 along the heart therefrom to the direction at coaming plate 22 gradually Dip down and tiltedly set, the surface of top cover 21 is formed as taper surface, top cover 21 and the direct transition and linkage of coaming plate 22, so splashes When polishing fluid is splashed down on top cover 21, it can downwards be slid along taper, prevent polishing fluid from accumulating on top cover 21, final drop Fall on polishing disk.
Fig. 6 is the schematic diagram of the extreme position of the example shown in Fig. 5, that is, is arranged on pressure ring 322 and intermediate plate on matrix 30 There is maximal clearance in the top of component 10, now, and the coaming plate 22 on the vertical direction of lid 20 is overlapped with gland 50 in the presence of one section Position, the polishing fluid of splashing can glide along the taper surface of lid 20, be dropped on polishing disk, so can effectively prevent polishing fluid Into the inside of rubbing head 100, polishing fluid is prevented to be extruded in the course of work of rubbing head 100 and then influence polishing effect.
Alternatively, lid 20, gland 50, the second sealing ring 70 and the first sealing ring 60 collectively form a rubbing head 100 Protector, can effectively prevent polishing fluid enter rubbing head 100 inside, while meeting the adaptivity of rubbing head 100 It is required that.
Other of the rubbing head 100 of not ponding according to embodiments of the present invention are constituted and operated for the common skill in this area All it is known for art personnel, is not detailed herein.
In the description of this specification, reference term " one embodiment ", " some embodiments ", " illustrative examples ", The description of " example ", " specific example " or " some examples " etc. means to combine specific features, the knot that the embodiment or example are described Structure, material or feature are contained at least one embodiment of the present invention or example.In this manual, to above-mentioned term Schematic representation is not necessarily referring to identical embodiment or example.Moreover, specific features, structure, material or the spy of description Point can in an appropriate manner be combined in any one or more embodiments or example.
Although an embodiment of the present invention has been shown and described, it will be understood by those skilled in the art that:Not In the case of departing from the principle and objective of the present invention a variety of change, modification, replacement and modification can be carried out to these embodiments, this The scope of invention is limited by claim and its equivalent.

Claims (12)

1. a kind of rubbing head of not ponding, it is characterised in that including:
Clip assemblies;
Lid, the lid is movably mounted on the clip assemblies and receiving is limited between the clip assemblies Chamber;
Matrix, described matrix can be arranged on clip assemblies and in the accommodating chamber up or down, described matrix and institute State lid closely coupled;
Diaphragm, the diaphragm is connected with the clip assemblies and described matrix respectively, and limits closed chamber.
2. the rubbing head of not ponding according to claim 1, it is characterised in that described matrix and the inner roof wall of the lid Face is connected.
3. the rubbing head of not ponding according to claim 2, it is characterised in that described matrix includes:
Middle shaft part, axis hole middle shaft part described in insertion along the vertical direction, the center of the lid is provided with through hole, the middle shaft part Upper end pass through the through hole;
Outer portion, the outer portion is set around the middle shaft part, and the outer portion is connected with the lid by bolt.
4. the rubbing head of not ponding according to claim 1, it is characterised in that the upper surface of the clip assemblies is provided with the Two grooves and part be located at the lid in gland, the lid when moving up and down with least part of phase of the gland Overlap.
5. the rubbing head of not ponding according to claim 4, it is characterised in that between the gland and the clip assemblies Provided with the first sealing ring.
6. the rubbing head of not ponding according to claim 3, it is characterised in that the upper surface of the outer portion and the lid One in the inner top surface of body is provided with the second sealing ring.
7. the rubbing head of not ponding according to claim 3, it is characterised in that the outer peripheral face of the middle shaft part leads to described The internal perisporium in hole is brought into close contact.
8. the rubbing head of the not ponding according to any one of claim 1-7, it is characterised in that the lid includes:
Top cover, described matrix and the top cover are closely coupled;
Coaming plate, the coaming plate sets around the top cover and extended downwardly from the periphery edge of the top cover.
9. the rubbing head of not ponding according to claim 8, it is characterised in that the top cover is horizontally disposed with.
10. the rubbing head of not ponding according to claim 9, it is characterised in that lead between the top cover and the coaming plate Arc sections are crossed to be connected.
11. the rubbing head of not ponding according to claim 9, it is characterised in that lead between the top cover and the coaming plate Rake is crossed to be connected.
12. the rubbing head of not ponding according to claim 8, it is characterised in that the top cover along at the heart therefrom to institute The direction at coaming plate is stated obliquely to set gradually downward.
CN201710606798.8A 2017-07-24 2017-07-24 Polishing head without accumulated water Active CN107253134B (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
CN201710606798.8A CN107253134B (en) 2017-07-24 2017-07-24 Polishing head without accumulated water
PCT/CN2018/096003 WO2019019941A1 (en) 2017-07-24 2018-07-17 Polishing head capable of preventing water accumulation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710606798.8A CN107253134B (en) 2017-07-24 2017-07-24 Polishing head without accumulated water

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CN107253134B CN107253134B (en) 2024-01-12

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107900893A (en) * 2017-11-20 2018-04-13 上海华力微电子有限公司 One kind grinding arm cover board
CN109048627A (en) * 2018-08-27 2018-12-21 清华大学 Rubbing head and chemical-mechanical polisher
WO2019019941A1 (en) * 2017-07-24 2019-01-31 清华大学 Polishing head capable of preventing water accumulation

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6241593B1 (en) * 1999-07-09 2001-06-05 Applied Materials, Inc. Carrier head with pressurizable bladder
US6572462B1 (en) * 1998-05-04 2003-06-03 Motorola, Inc. Carrier assembly for chemical mechanical planarization systems and method
CN102172888A (en) * 2011-02-16 2011-09-07 清华大学 Polishing head
CN103144027A (en) * 2013-04-02 2013-06-12 清华大学 Air cylinder for polishing head
CN103192317A (en) * 2013-04-02 2013-07-10 清华大学 Polishing head
CN207139536U (en) * 2017-07-24 2018-03-27 清华大学 A kind of rubbing head of not ponding

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6572462B1 (en) * 1998-05-04 2003-06-03 Motorola, Inc. Carrier assembly for chemical mechanical planarization systems and method
US6241593B1 (en) * 1999-07-09 2001-06-05 Applied Materials, Inc. Carrier head with pressurizable bladder
CN102172888A (en) * 2011-02-16 2011-09-07 清华大学 Polishing head
CN103144027A (en) * 2013-04-02 2013-06-12 清华大学 Air cylinder for polishing head
CN103192317A (en) * 2013-04-02 2013-07-10 清华大学 Polishing head
CN207139536U (en) * 2017-07-24 2018-03-27 清华大学 A kind of rubbing head of not ponding

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019019941A1 (en) * 2017-07-24 2019-01-31 清华大学 Polishing head capable of preventing water accumulation
CN107900893A (en) * 2017-11-20 2018-04-13 上海华力微电子有限公司 One kind grinding arm cover board
CN109048627A (en) * 2018-08-27 2018-12-21 清华大学 Rubbing head and chemical-mechanical polisher

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