CN107224849A - A kind of low temperature plasma waste gas cleaning device - Google Patents
A kind of low temperature plasma waste gas cleaning device Download PDFInfo
- Publication number
- CN107224849A CN107224849A CN201710644452.7A CN201710644452A CN107224849A CN 107224849 A CN107224849 A CN 107224849A CN 201710644452 A CN201710644452 A CN 201710644452A CN 107224849 A CN107224849 A CN 107224849A
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- processing unit
- photocatalyst
- temperature plasma
- low
- waste gas
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/8678—Removing components of undefined structure
- B01D53/8687—Organic components
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/869—Multiple step processes
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2251/00—Reactants
- B01D2251/10—Oxidants
- B01D2251/104—Ozone
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/80—Type of catalytic reaction
- B01D2255/802—Photocatalytic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/804—UV light
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
Abstract
The present invention relates to VOCs treatment technology, more particularly to a kind of low temperature plasma waste gas cleaning device, it includes casing and is located at the first photocatalyst processing unit, the second photocatalyst processing unit and low-temperature plasma processing unit of the casing internal, the first photocatalyst processing unit is located at the treatment region input front end of the low-temperature plasma processing unit, and the second photocatalyst processing unit is located at the treatment region output rear end of low-temperature plasma processing unit.Its purpose is to design a kind of cleaning plant for waste gas of plasma good to VOCs treatment effect.Compared with prior art, fast with reaction speed, collection ozone high grade oxidation combination technique and low-temperature plasma treatment technology wide using scope ensure that the treatment effect to organic exhaust gas, the advantages of processing does not finally produce secondary pollution.
Description
Technical field
The present invention relates to VOCs treatment technology, more particularly to a kind of low temperature plasma waste gas cleaning device.
Background technology
In industrial processes, such as chemical industry, synthetic leather, application, printing, plastic cement, rubber, chemical fibre, shoemaking, wood industry industry
Substantial amounts of organic exhaust gas is produced, the toxicity of the organic compounds of different industries is also different, wherein 10 in industrial waste gas
Harm of the common organic waste gas to human body is planted to be mainly shown as：
Damage the nervous centralis of people more the organic matter of benzene class, the obstacle of nervous system can be caused, when the concentration mistake of benzene vapor
When high (in air content up to 2%), the poisoning that lethal can be caused acute.
The organic matter of polycyclic aromatic hydrocarbon has strong carcinogenicity.
The organic matter of benzoic acid class can make the protein of cell deform or solidify, and cause systemic toxicity profiles.
When occurring the organic matter poisoning of nitrile, the forfeiture for can cause expiratory dyspnea, severe asphyxia, even realizing is until dead
Die.
The nitrobenzene influence nervous system of organic matter, blood phase and liver, spleen organ dysfunction, the large area of skin absorb can so that
People is dead.
The organic matter of aromatic amine is carcinogenic, and diphenylamines, benzidine etc. can cause the symptom of anoxic into human body.
Organic nitrogen compound can be carcinogenic.
The activity of CHE, makes the obstacle of nervous system generating function in the compound reduction blood of organophosphor.
In organosulfur compound, the mercaptan of low concentration can cause discomfort, high concentration can causing death.
In oxygen-containing organic compound, the oxirane of suction high concentration can causing death.
Methacrylaldehyde has strong impulse to mucous membrane；Amylalcohol can play headache, vomiting, diarrhoea etc..
At present, domestic organic waste gas particularly industrial organic exhaust gas is absorbed using activated carbon, although installation has preferably initial stage
Adsorption effect, but over time, adsorption effect reduction, until saturation；Saturated activity charcoal after replacing is dangerous waste, place
Reason is bad to form secondary pollution.
Although in the market also has the similar organic waste gas purifier based on plasma, because treatment technology is single, knot
Structure is not compact, the shortcomings of energy consumption is big, causes user to bear.
The content of the invention
The purpose of the present invention is a kind of cleaning plant for waste gas of plasma good to VOCs treatment effect of design.
To achieve the above object, the present invention uses following technical scheme：A kind of low temperature plasma waste gas cleaning device,
It is characterized in that it is comprising casing and is located at the first photocatalyst processing unit of the casing internal, the second photocatalyst processing dress
Put and be located at the processing of the low-temperature plasma processing unit with low-temperature plasma processing unit, the first photocatalyst processing unit
Area's input front end, the second photocatalyst processing unit is located at the treatment region output rear end of the low-temperature plasma processing unit.
The present invention improves exhaust-gas treatment effect, to the technical side to further effectively decompose all kinds of organic compounds
Case is further set：The first photocatalyst processing unit or the second photocatalyst processing unit include photocatalyst fluorescent tube
Support, photocatalyst Catalytic Layer, ultraviolet lamp tube, if the photocatalyst Catalytic Layer is provided with dried layer on the photocatalyst lamp pipe holder,
The ultraviolet lamp tube is located between the photocatalyst Catalytic Layer spatially.
The present invention improves exhaust-gas treatment effect, to the technical side to further effectively decompose all kinds of organic compounds
Case is further set：The low-temperature plasma processing unit includes plasma generator support and plasma generator.
The present invention is in order to the pollutant in organic exhaust gas is filtered out, it is ensured that subsequent treatment area processing organic exhaust gas has preferable
Ecotopia, the technical scheme is further set：Inputted in the treatment region of the first photocatalyst processing unit
Front end is provided with filter, and the filter includes primary efficient filter screen, medium air filtration net, high efficiency particulate air.
The present invention in order that processing after waste gas in injurious factor can react thorough, generate harmless products, to described
Technical scheme is further set：Filled in the second photocatalyst processing unit treatment region output rear end provided with combined reaction
Put, the combined reaction device includes stop grid and gas cushion space.
The present invention is by the way that the polluter in waste gas is reacted with the active group with higher-energy, final conversion
For CO2And H2The materials such as O, so as to realize the purpose for reaching cleaning organic waste gas.
Brief description of the drawings
The present invention is described in further detail with reference to the accompanying drawings and examples.
Fig. 1 is the present embodiment principal section structural representation.
Embodiment
As shown in figure 1, the present embodiment is touched comprising casing 4 and the filter A being located inside the casing 4, the first light
Matchmaker's processing unit B1, the second photocatalyst processing unit B2, low-temperature plasma processing unit C and combined reaction device D, wherein：
The filter A is located at the treatment region input front end of the first photocatalyst processing unit B1, the filtering dress
Put A and include primary efficient filter screen 1, medium air filtration net 2, high efficiency particulate air 3.Roughing efficiency air filter 1 is dirty by the bulky grain in organic exhaust gas
Contaminate thing to intercept, medium effeciency filter 2 intercepts the small particles of pollution thing in organic exhaust gas, and high efficiency particulate air filter 3 is by organic exhaust gas
Molecule pollutant is filtered out, it is ensured that subsequent treatment area processing organic exhaust gas has preferable ecotopia.
The first photocatalyst processing unit B1 is located at the treatment region input front end of the low-temperature plasma processing unit C,
The second photocatalyst processing unit B2 is located at the treatment region output rear end of the low-temperature plasma processing unit C.
The first photocatalyst processing unit B1 or the second photocatalyst processing unit B2 includes photocatalyst lamp pipe holder 5, light
Catalyst Catalytic Layer 6, ultraviolet lamp tube 7, it is described if the photocatalyst Catalytic Layer 6 is provided with dried layer on the photocatalyst lamp pipe holder 5
Ultraviolet lamp tube 7 is located between the photocatalyst Catalytic Layer 6 spatially.
Photocatalyst processing unit utilizes ozone high grade oxidation combination technique, the 185nm spectrum produced by ultraviolet lamp tube with
253.7nm spectrum are irradiated to exhaust gas constituents, and the oxygen molecule in waste gas decomposition produces ozone, and oxygen is carried out to waste gas using ozone
Change and decompose, while photocatalyst Catalytic Layer 6 is under light illumination, valence-band electrons are excited to conduction band, form electronics and hole, with suction
Invest the O on its surface2And H2O is acted on, and generates superoxide anion radical, O2- and hydroxyl radical free radical-OH, its free radical tool
There is very strong oxidative decomposition capacity, C-C keys, c h bond, C-N keys, C-O keys, O-H keys, the N-H keys that can be destroyed in organic matter are decomposed
Organic matter is carbon dioxide, water and nitrogen.
The low-temperature plasma processing unit C includes plasma generator support 8 and plasma generator 9.By plasma
The low temperature plasma that generator 9 is produced, the purified treatment to waste gas includes two aspects：
One is that the moment high energy produced by high-frequency discharge opens some organic wastes enough during plasma is produced
The chemical energy of qi leel, is allowed to be decomposed into simple substance atom or harmless molecule；
Two be processing of the plasma to organic exhaust gas, and it has three basic processes：
One) substantial amounts of high energy electron, negative ions, excitation state grain are included in the direct bombardment of high energy electron, plasma
Son and the free radical with strong oxidizing property, these active particles and part organic exhaust gas molecular collision are combined, under electric field action,
Organic exhaust gas molecule is set to be in excitation state；
Two) oxidation of O atom, OH free radicals or ozone, when the energy that organic exhaust gas molecule is obtained is more than its molecular bond energy
Combination energy when, the chemical bond rupture of organic exhaust gas molecule directly resolves into simple substance atom or obtains harmless by single atomic building
Gas molecule, while a large amount of OH, HO2, O isoreactivity free radicals and the extremely strong O of oxidisability that produce3, sent out with pernicious gas molecule
Biochemical reaction, ultimately generates harmless products；
Three) reaction of molecular fragment+oxygen；
The each group composition activate, ionize by said process, cracking in waste gas, is allowed to decompose, some row such as oxidation
Complicated chemical reaction, is eventually converted into CO2And H2The innocuous substances such as O.
The combined reaction device D is located at the second photocatalyst processing unit B2 treatment regions output rear end, the synthesis
Reaction unit D includes stop grid 10 and gas cushion space 11.
The effect of the combined reaction device D includes two aspects：One is that grid 10 is formed to waste gas in the process of circulation
It is certain to stop the effect of being mixed；Two be that complete OH, HO2, O isoreactivity free radical and the extremely strong O of oxidisability are not reacted in part3,
It is mixed in the stop of grid 10 under effect, the space provided by gas buffer space 11 is sent out with pernicious gas molecule again with the time
Biochemical reaction, makes pernicious gas molecule all chemically react, and generates harmless products.
In summary, the present invention has advantages below compared with prior art：
1st, it is fast with electron energy height, reaction speed；
2nd, all types of industries waste gas can be handled, it is wide using scope.
3rd, collection ozone high grade oxidation combination technique and low-temperature plasma treatment technology, ensure that the processing to organic exhaust gas
Effect.
4th, it is harmless products to handle final discharge product, will not produce pollution to environment.
5th, processing procedure does not produce secondary pollution.
Claims (5)
1. a kind of low temperature plasma waste gas cleaning device, it is characterised in that it is comprising casing (4) and is located in the casing (4)
First photocatalyst processing unit (B1), the second photocatalyst processing unit (B2) and the low-temperature plasma processing unit (C) in portion, it is described
First photocatalyst processing unit (B1) is located at the treatment region input front end of the low-temperature plasma processing unit (C), described second
Photocatalyst processing unit (B2) is located at the treatment region output rear end of low-temperature plasma processing unit (C).
2. a kind of low temperature plasma waste gas cleaning device according to claim 1, it is characterised in that first photocatalyst
Processing unit (B1) or the second photocatalyst processing unit (B2) include photocatalyst lamp pipe holder (5), photocatalyst Catalytic Layer (6), purple
Outer fluorescent tube (7), the photocatalyst Catalytic Layer (6) in the photocatalyst lamp pipe holder (5) if on be provided with dried layer, the ultraviolet lamp tube
(7) it is located between the photocatalyst Catalytic Layer (6) spatially.
3. a kind of low temperature plasma waste gas cleaning device according to claim 2, it is characterised in that the low-temperature plasma
Processing unit (C) includes plasma generator support (8) and plasma generator (9).
4. low temperature plasma waste gas cleaning device according to claim 3, it is characterised in that at first photocatalyst
Manage device (B1) treatment region input front end be provided with filter (A), the filter (A) comprising primary efficient filter screen (1), in
Imitate screen pack (2), high efficiency particulate air (3).
5. a kind of low temperature plasma waste gas cleaning device according to claim 4, it is characterised in that touched in second light
The treatment region output rear end of matchmaker's processing unit (B2) is provided with combined reaction device (D), and the combined reaction device (D) includes stop
Grid (10) and gas cushion space (11).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710644452.7A CN107224849A (en) | 2017-07-29 | 2017-07-29 | A kind of low temperature plasma waste gas cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710644452.7A CN107224849A (en) | 2017-07-29 | 2017-07-29 | A kind of low temperature plasma waste gas cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN107224849A true CN107224849A (en) | 2017-10-03 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201710644452.7A Pending CN107224849A (en) | 2017-07-29 | 2017-07-29 | A kind of low temperature plasma waste gas cleaning device |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20070001387A (en) * | 2005-06-29 | 2007-01-04 | 주식회사 엘지화학 | Plasma and photocatalysis hybrid system for eliminating volatile organic compounds and a bad smell |
| CN104307358A (en) * | 2014-10-23 | 2015-01-28 | 西安华陆环保设备有限公司 | Odor purification device |
| CN204799002U (en) * | 2015-02-10 | 2015-11-25 | 中山市上品环境净化技术有限公司 | High -efficient purifier |
| CN106731541A (en) * | 2016-11-21 | 2017-05-31 | 国佳环境科技湖北连锁有限公司 | Low temperature plasma waste gas cleaning device and purification method |
| CN206631408U (en) * | 2017-04-06 | 2017-11-14 | 陈锦霖 | A kind of low temperature plasma waste gas cleaning device |
-
2017
- 2017-07-29 CN CN201710644452.7A patent/CN107224849A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20070001387A (en) * | 2005-06-29 | 2007-01-04 | 주식회사 엘지화학 | Plasma and photocatalysis hybrid system for eliminating volatile organic compounds and a bad smell |
| CN104307358A (en) * | 2014-10-23 | 2015-01-28 | 西安华陆环保设备有限公司 | Odor purification device |
| CN204799002U (en) * | 2015-02-10 | 2015-11-25 | 中山市上品环境净化技术有限公司 | High -efficient purifier |
| CN106731541A (en) * | 2016-11-21 | 2017-05-31 | 国佳环境科技湖北连锁有限公司 | Low temperature plasma waste gas cleaning device and purification method |
| CN206631408U (en) * | 2017-04-06 | 2017-11-14 | 陈锦霖 | A kind of low temperature plasma waste gas cleaning device |
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Application publication date: 20171003 |
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