CN106731541A - Low temperature plasma waste gas cleaning device and purification method - Google Patents
Low temperature plasma waste gas cleaning device and purification method Download PDFInfo
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- CN106731541A CN106731541A CN201611042400.4A CN201611042400A CN106731541A CN 106731541 A CN106731541 A CN 106731541A CN 201611042400 A CN201611042400 A CN 201611042400A CN 106731541 A CN106731541 A CN 106731541A
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- Prior art keywords
- waste gas
- low temperature
- temperature plasma
- lacquer spraying
- photocatalysis
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- 239000002912 waste gas Substances 0.000 title claims abstract description 69
- 210000002381 Plasma Anatomy 0.000 title claims abstract description 38
- 238000004140 cleaning Methods 0.000 title claims abstract description 20
- 238000000746 purification Methods 0.000 title claims abstract description 20
- 239000004922 lacquer Substances 0.000 claims abstract description 46
- 238000005507 spraying Methods 0.000 claims abstract description 46
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 25
- 238000007146 photocatalysis Methods 0.000 claims abstract description 23
- 230000001699 photocatalysis Effects 0.000 claims abstract description 23
- 230000003647 oxidation Effects 0.000 claims abstract description 22
- 239000011941 photocatalyst Substances 0.000 claims abstract description 18
- 230000003197 catalytic Effects 0.000 claims abstract description 15
- 238000006243 chemical reaction Methods 0.000 claims abstract description 11
- 238000010525 oxidative degradation reaction Methods 0.000 claims abstract description 6
- 238000001914 filtration Methods 0.000 claims abstract description 4
- 230000015556 catabolic process Effects 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 230000004059 degradation Effects 0.000 claims description 3
- 238000006731 degradation reaction Methods 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 239000011521 glass Substances 0.000 claims 2
- 238000007592 spray painting technique Methods 0.000 claims 2
- 229920000742 Cotton Polymers 0.000 claims 1
- 239000003054 catalyst Substances 0.000 abstract description 3
- 239000007789 gas Substances 0.000 description 9
- 238000005516 engineering process Methods 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N o-xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 4
- 239000000203 mixture Substances 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 239000011490 mineral wool Substances 0.000 description 2
- 239000003973 paint Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- 210000004369 Blood Anatomy 0.000 description 1
- 230000037250 Clearance Effects 0.000 description 1
- 210000004185 Liver Anatomy 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N Propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 208000008425 Protein Deficiency Diseases 0.000 description 1
- 210000003491 Skin Anatomy 0.000 description 1
- 239000004411 aluminium Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminum Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 239000008280 blood Substances 0.000 description 1
- 230000002612 cardiopulmonary Effects 0.000 description 1
- 238000006555 catalytic reaction Methods 0.000 description 1
- 230000001413 cellular Effects 0.000 description 1
- 230000035512 clearance Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000000875 corresponding Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000000149 penetrating Effects 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 230000001360 synchronised Effects 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/10—Particle separators, e.g. dust precipitators, using filter plates, sheets or pads having plane surfaces
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/007—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by irradiation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/32—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00
- B01D53/323—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by electrical effects other than those provided for in group B01D61/00 by electrostatic effects or by high-voltage electric fields
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/75—Multi-step processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/8678—Removing components of undefined structure
- B01D53/8687—Organic components
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/88—Handling or mounting catalysts
- B01D53/885—Devices in general for catalytic purification of waste gases
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/20—Metals or compounds thereof
- B01D2255/207—Transition metals
- B01D2255/20707—Titanium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/80—Type of catalytic reaction
- B01D2255/802—Photocatalytic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/90—Physical characteristics of catalysts
- B01D2255/903—Multi-zoned catalysts
- B01D2255/9032—Two zones
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/702—Hydrocarbons
- B01D2257/7027—Aromatic hydrocarbons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/708—Volatile organic compounds V.O.C.'s
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2258/00—Sources of waste gases
- B01D2258/02—Other waste gases
- B01D2258/0258—Other waste gases from painting equipments or paint drying installations
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/804—UV light
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
Abstract
The invention discloses a kind of low temperature plasma waste gas cleaning device and purification method, purifier includes the cylinder with purification cavity, and filter layer, the first photochemical catalytic oxidation mechanism, reaction of low temperature plasma device and the second photochemical catalytic oxidation mechanism purified in cavity are sequentially arranged in along lacquer spraying waste gas flow direction；First photochemical catalytic oxidation mechanism includes the first ultraviolet lamp layers and the first photocatalyst layer that set gradually, and the second photochemical catalytic oxidation mechanism includes the second ultraviolet lamp layers, the second photocatalyst layer and the 3rd ultraviolet lamp layers that set gradually；It carries out filtration treatment, photocatalysis pretreatment, oxidative degradation treatment, photocatalysis advanced treating to lacquer spraying waste gas successively.One aspect of the present invention combination photocatalysis and non-thermal plasma trap, improve the purification efficiency of lacquer spraying waste gas, on the other hand it is respectively provided with the order of uviol lamp and photochemical catalyst in photocatalysis pretreatment and advanced treatment to be engaged in order to low-temperature plasma reactor, and then realizes further improving lacquer spraying waste gas treatment effeciency.
Description
Technical field
The present invention relates to waste gas purification technology, more particularly, to a kind of low temperature plasma waste gas cleaning device and purification side
Method.
Background technology
In industry is sprayed, usually using " wet process technique ", i.e., resin organic solvent is first made into glue, then
To be painted by oil supply system then carries out levelling and drying by spray gun uniform fold to workpiece surface.It is organic in due to paint
Solvent contains the substantial amounts of VOC with benzene,toluene,xylene etc. as main component.In levelling and drying course
In, substantial amounts of VOC can be evaporated, if the VOC that will be evaporated is direct from paint spray booth
Discharge, then it can mix with air, and rapidly diffuse into the live surrounding enviroment of production operation.
Because lacquer spraying waste gas main component is the organic exhaust gas such as benzene,toluene,xylene, it has penetrating odor, and logical
Cross and breathe or directly act on human body, and then harm is produced to skin, blood, cardiopulmonary, liver, nerve, eyes, so that serious shadow
Ring health.
Lower temperature plasma technology has treatment effeciency higher to the dusty gas of atm number, low concentration, is non-cost performance
Effective treatment technology often high.The method has that efficiency high, low cost, apparatus adaptability are strong, floor space is small, is easy to operation to control
System, start-stop are convenient, synchronous with lacquer spraying technique, the advantages of can be upgraded according to pollutants emission intensity.
At present, there is the treatment that lower temperature plasma technology is applied to lacquer spraying waste gas, but it is to lacquer spraying waste gas
Treatment effeciency is relatively low, it is impossible to meet existing lacquer spraying waste gas processing requirement.
The content of the invention
It is an object of the invention to overcome above-mentioned technical deficiency, a kind of low temperature plasma waste gas cleaning device and purification are proposed
Method, solves the low technical problem of lacquer spraying waste gas treatment effeciency in the prior art.
To reach above-mentioned technical purpose, technical scheme provides a kind of low temperature plasma waste gas cleaning device, bag
The cylinder with purification cavity is included, filter layer, first in the purification cavity are set in turn in along lacquer spraying waste gas flow direction
Photochemical catalytic oxidation mechanism, reaction of low temperature plasma device and the second photochemical catalytic oxidation mechanism；The first photochemical catalytic oxidation mechanism
The first ultraviolet lamp layers and the first photocatalyst layer including being set gradually along lacquer spraying waste gas flow direction, second photocatalytic-oxidation
Changing mechanism includes the second ultraviolet lamp layers, the second photocatalyst layer and the 3rd uviol lamp that are set gradually along lacquer spraying waste gas flow direction
Layer.
Preferably, the described first ultraviolet lamp layers, the second ultraviolet lamp layers and the 3rd ultraviolet lamp layers include along the cylinder
Wall multiple uviol lamps circumferentially.
Preferably, the reaction of low temperature plasma device includes the first reaction of low temperature plasma device for being arranged in series and the
Two reaction of low temperature plasma devices.
Preferably, first photocatalyst layer and the second photocatalyst layer are network structure.
Preferably, the filter layer is that mineral wool filters felt material.
Meanwhile, the present invention also provides a kind of low temperature plasma waste gas cleaning method, comprises the following steps：
(1) lacquer spraying waste gas are carried out tentatively filtering to remove the coating cloud in lacquer spraying waste gas；
(2) lacquer spraying waste gas after step (1) treatment are carried out into photocatalysis pretreatment；
(3) the pretreated lacquer spraying waste gas of photocatalysis are carried out into discharge oxidation degradation treatment；
(4) lacquer spraying waste gas after oxidative degradation is processed carry out photocatalysis advanced treating.
Preferably, time of the photocatalysis pretreatment, oxidative degradation treatment and photocatalysis advanced treating and be 3.16 seconds.
Compared with prior art, one aspect of the present invention combination photocatalysis and non-thermal plasma trap, improve lacquer spraying waste gas
Purification efficiency, be on the other hand respectively provided with photocatalysis pretreatment and advanced treatment the order of uviol lamp and photochemical catalyst with
It is easy to be engaged with low-temperature plasma reactor, and then realizes further improving lacquer spraying waste gas treatment effeciency.
Brief description of the drawings
Fig. 1 is the attachment structure schematic diagram of low temperature plasma waste gas cleaning device of the invention.
Specific embodiment
In order to make the purpose , technical scheme and advantage of the present invention be clearer, it is right below in conjunction with drawings and Examples
The present invention is further elaborated.It should be appreciated that the specific embodiments described herein are merely illustrative of the present invention, and
It is not used in the restriction present invention.
Fig. 1 is referred to, technical scheme provides a kind of low temperature plasma waste gas cleaning device, including with purification
The cylinder 1 of cavity, filter layer 2, the first photocatalytic-oxidation in the purification cavity are set in turn in along lacquer spraying waste gas flow direction
Change mechanism 3, the photochemical catalytic oxidation mechanism 5 of reaction of low temperature plasma device 4 and second；The first photochemical catalytic oxidation mechanism 3 includes
The the first ultraviolet lamp layers 31 set gradually along lacquer spraying waste gas flow direction and the first photocatalyst layer 32, second photocatalytic-oxidation
Changing mechanism 5 includes the second ultraviolet lamp layers 51, the second photocatalyst layer 52 and the 3rd that are set gradually along lacquer spraying waste gas flow direction
Ultraviolet lamp layers 53.
When specifically carrying out lacquer spraying waste gas and processing, lacquer spraying waste gas are filtered by filter layer 2 first with removing waste gas
Coating cloud, photocatalysis pretreatment is then carried out by the first photochemical catalytic oxidation mechanism 3, it is produced by the first ultraviolet lamp layers 31 first
Raw uviol lamp is irradiated to lacquer spraying waste gas, and then by the oxidation processes of the first photocatalyst layer 32, it is conducive to raising light to urge
Change the efficiency of oxidation, so as to the escaping gases such as part dimethylbenzene, butyl acetate, propylene glycol methyl ether acetate be urged in ultraviolet light
CO is decomposed into the presence of change2、H2O and small organic molecule；Thereafter lacquer spraying waste gas enter reaction of low temperature plasma device 4, low temperature
Plasma reactor 4 discharges and the air in waste gas is ionized, and forms active particle, and then promotes most of volatility
The small organic molecule that gas and photocatalysis pretreatment unit are produced is decomposed into CO2And H2O；Finally, lacquer spraying waste gas enter the second light
Catalysis oxidation mechanism 5 simultaneously carries out photocatalysis advanced treating, and the second photochemical catalytic oxidation mechanism 5 be set to first pass through second it is ultraviolet
Lamp layers 51 produce ultraviolet light, then the oxidation processes of the second photocatalyst layer 52, then again by the 3rd ultraviolet lamp layers 53
Ultraviolet light is produced, it is conducive to further improving the treatment effeciency of lacquer spraying waste gas, it is to avoid excessive pollution gas enter
In air.
Wherein, the first ultraviolet lamp layers 31, the second ultraviolet lamp layers 51 and the 3rd ultraviolet lamp layers 53 include described in the present embodiment
Along the inwall of the cylinder 1 multiple uviol lamps circumferentially, on the one hand produced by the uviol lamp arranged along the inwall of cylinder 1 ultraviolet
Lacquer spraying waste gas in cylinder 1 are irradiated by light, on the other hand avoid uviol lamp from stopping the flowing velocity of lacquer spraying waste gas, it is ensured that tool
There is lacquer spraying waste gas treatment effeciency higher.
Because exhaust treatment efficiency is higher, waste gas flow velocity is higher in purification cavity, is easily caused at partial contamination gas
Reason is discharged by purification cavity, therefore reaction of low temperature plasma device 4 described in the present embodiment is including the first low temperature being arranged in series etc.
The reaction of low temperature plasma device 42 of plasma reactor 41 and second, is processed by continuity, is conducive to low temperature plasma anti-
The secondary oxidation degradation treatment of device 4 is answered, escaping gas and small organic molecule are degraded completely.
Wherein, when specifically setting, the first photocatalyst layer 32 described in the present embodiment and the second photocatalyst layer 52 are net
Shape structure, consequently facilitating the circulation of gas, improves exhaust treatment efficiency, specifically, first photocatalyst layer 32 and second
Photocatalyst layer 52 is the cellular Titanium Dioxide net of aluminium base, and the filter layer 2 is then preferably arranged to mineral wool filter felt
Material.
During lacquer spraying waste gas treatment, typically one is set in the outlet side of the present embodiment low temperature plasma waste gas cleaning device
The air-introduced machine of 7.5kW, in order to promote lacquer spraying waste gas quickly to be flowed along purification cavity, and in order to guarantee to have lacquer spraying waste gas
Effect purification, the settable interior airduct through for 0.32m is connected with the inlet end of the present embodiment low temperature plasma waste gas cleaning device, wind
The intake of pipe is 5000m3/h, after lacquer spraying waste gas filtering, photocatalysis pretreatment, oxidative degradation treatment, photocatalysis is carried out successively
Advanced treating, its process time is 3.16 seconds.For the ease of describing the treatment of the present embodiment low temperature plasma waste gas cleaning device
Efficiency, the general volatile gas concentration that the present embodiment chooses manual painting workshop brattice air outlet is 600mg/m3Lacquer spraying waste gas
Processed, because the present embodiment carries out exhausting using high-power air-introduced machine so that enter low temperature plasma waste gas cleaning device
The escaping gas concentration of lacquer spraying waste gas be reduced to 495.9mg/m3, and the specific data such as following table after processing：
As seen from the above table, dimethylbenzene and total VOCs concentration are respectively from the 193.9mg/m of import3、495.9mg/m3Drop to
38.6mg/m3、61.3mg/m3, more than 80%, it can reach related discharging standards to clearance.
Compared with prior art, one aspect of the present invention combination photocatalysis and non-thermal plasma trap, improve lacquer spraying waste gas
Purification efficiency, be on the other hand respectively provided with photocatalysis pretreatment and advanced treatment the order of uviol lamp and photochemical catalyst with
It is easy to be engaged with low-temperature plasma reactor, and then realizes further improving lacquer spraying waste gas treatment effeciency.
The specific embodiment of present invention described above, is not intended to limit the scope of the present invention..Any basis
Various other corresponding change and deformation that technology design of the invention is made, should be included in the guarantor of the claims in the present invention
In the range of shield.
Claims (7)
1. a kind of low temperature plasma waste gas cleaning device, it is characterised in that including the cylinder (1) with purification cavity, along spray painting
Exhaust gas flow direction is set in turn in filter layer (2), the first photochemical catalytic oxidation mechanism (3), low temperature in the purification cavity etc.
Plasma reactor (4) and the second photochemical catalytic oxidation mechanism (5)；The first photochemical catalytic oxidation mechanism (3) is including useless along spray painting
The first ultraviolet lamp layers (31) and the first photocatalyst layer (32) that flow of air direction sets gradually, the second photochemical catalytic oxidation machine
Structure (5) includes the second ultraviolet lamp layers (51), the second photocatalyst layer (52) and that are set gradually along lacquer spraying waste gas flow direction
Three ultraviolet lamp layers (53).
2. low temperature plasma waste gas cleaning device according to claim 1, it is characterised in that the first ultraviolet lamp layers
(31), the second ultraviolet lamp layers (51) and the 3rd ultraviolet lamp layers (53) include the multiple along the cylinder (1) inwall circumferentially
Uviol lamp.
3. low temperature plasma waste gas cleaning device according to claim 2, it is characterised in that the low temperature plasma is anti-
Answering device (4) includes the first reaction of low temperature plasma device (41) (4) being arranged in series and the second reaction of low temperature plasma device
(42)(4)。
4. low temperature plasma waste gas cleaning device according to claim 3, it is characterised in that first photocatalyst layer
And the second photocatalyst layer (52) is network structure (32).
5. low temperature plasma waste gas cleaning device according to claim 4, it is characterised in that the filter layer (2) is glass
Glass cotton filters felt material.
6. a kind of low temperature plasma waste gas cleaning method, it is characterised in that comprise the following steps：
(1) lacquer spraying waste gas are carried out tentatively filtering to remove the coating cloud in lacquer spraying waste gas；
(2) lacquer spraying waste gas after step (1) treatment are carried out into photocatalysis pretreatment；
(3) the pretreated lacquer spraying waste gas of photocatalysis are carried out into discharge oxidation degradation treatment；
(4) lacquer spraying waste gas after oxidative degradation is processed carry out photocatalysis advanced treating.
7. low temperature plasma waste gas cleaning method according to claim 6, it is characterised in that the photocatalysis pretreatment,
Time of oxidative degradation treatment and photocatalysis advanced treating and be 3.16 seconds.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611042400.4A CN106731541A (en) | 2016-11-21 | 2016-11-21 | Low temperature plasma waste gas cleaning device and purification method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201611042400.4A CN106731541A (en) | 2016-11-21 | 2016-11-21 | Low temperature plasma waste gas cleaning device and purification method |
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| Publication Number | Publication Date |
|---|---|
| CN106731541A true CN106731541A (en) | 2017-05-31 |
Family
ID=58974684
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| Application Number | Title | Priority Date | Filing Date |
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| CN201611042400.4A Pending CN106731541A (en) | 2016-11-21 | 2016-11-21 | Low temperature plasma waste gas cleaning device and purification method |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107115790A (en) * | 2017-07-07 | 2017-09-01 | 中山市中开环保设备制造有限公司 | A kind of VOCs emission-control equipments |
| CN107224849A (en) * | 2017-07-29 | 2017-10-03 | 陈锦霖 | A kind of low temperature plasma waste gas cleaning device |
| CN110302668A (en) * | 2019-07-26 | 2019-10-08 | 中科新天地（合肥）环保科技有限公司 | A kind of plasma body cooperative photocatalysis charging crane of organic exhaust gas reaction unit |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2778371Y (en) * | 2005-03-17 | 2006-05-10 | 上海锦惠复洁环境工程有限公司 | Plasma and light catalyzing combined air purifier device |
| CN103056155A (en) * | 2012-12-25 | 2013-04-24 | 浙江工商大学 | Reactor for treating contaminated soil with low-temperature plasma and photocatalysis and treatment method thereof |
| CN204447756U (en) * | 2015-02-02 | 2015-07-08 | 广东东日环保有限公司 | The device of photocatalysis cooperating with low-temperature plasma treatment organic exhaust gas |
| CN205760626U (en) * | 2016-06-29 | 2016-12-07 | 山东昊威环保科技有限公司 | Photoelectric integral emission-control equipment |
-
2016
- 2016-11-21 CN CN201611042400.4A patent/CN106731541A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN2778371Y (en) * | 2005-03-17 | 2006-05-10 | 上海锦惠复洁环境工程有限公司 | Plasma and light catalyzing combined air purifier device |
| CN103056155A (en) * | 2012-12-25 | 2013-04-24 | 浙江工商大学 | Reactor for treating contaminated soil with low-temperature plasma and photocatalysis and treatment method thereof |
| CN204447756U (en) * | 2015-02-02 | 2015-07-08 | 广东东日环保有限公司 | The device of photocatalysis cooperating with low-temperature plasma treatment organic exhaust gas |
| CN205760626U (en) * | 2016-06-29 | 2016-12-07 | 山东昊威环保科技有限公司 | Photoelectric integral emission-control equipment |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107115790A (en) * | 2017-07-07 | 2017-09-01 | 中山市中开环保设备制造有限公司 | A kind of VOCs emission-control equipments |
| CN107224849A (en) * | 2017-07-29 | 2017-10-03 | 陈锦霖 | A kind of low temperature plasma waste gas cleaning device |
| CN110302668A (en) * | 2019-07-26 | 2019-10-08 | 中科新天地（合肥）环保科技有限公司 | A kind of plasma body cooperative photocatalysis charging crane of organic exhaust gas reaction unit |
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