CN206631408U - A kind of low temperature plasma waste gas cleaning device - Google Patents
A kind of low temperature plasma waste gas cleaning device Download PDFInfo
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- CN206631408U CN206631408U CN201720381971.4U CN201720381971U CN206631408U CN 206631408 U CN206631408 U CN 206631408U CN 201720381971 U CN201720381971 U CN 201720381971U CN 206631408 U CN206631408 U CN 206631408U
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- photocatalyst
- temperature plasma
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- Physical Or Chemical Processes And Apparatus (AREA)
- Exhaust Gas Treatment By Means Of Catalyst (AREA)
Abstract
It the utility model is related to VOCs treatment technology, more particularly to a kind of low temperature plasma waste gas cleaning device, it includes casing and is located at the first photocatalyst processing unit, the second photocatalyst processing unit and low-temperature plasma processing unit of the casing internal, the first photocatalyst processing unit is located at the treatment region input front end of the low-temperature plasma processing unit, and the second photocatalyst processing unit is located at the treatment region output rear end of low-temperature plasma processing unit.Its purpose is to design a kind of cleaning plant for waste gas of plasma good to VOCs treatment effect.Compared with prior art, the advantages that fast with reaction speed, use range is wide, collects ozone high grade oxidation combination technique and low-temperature plasma treatment technology, can ensure the treatment effect to organic exhaust gas, and processing does not finally produce secondary pollution.
Description
Technical field
VOCs treatment technology is the utility model is related to, more particularly to a kind of low temperature plasma waste gas cleaning device.
Background technology
In industrial processes, such as chemical industry, synthetic leather, application, printing, plastic cement, rubber, chemical fibre, shoemaking, wood industry industry
Substantial amounts of organic exhaust gas is produced, the toxicity of the organic compounds of different industries is also different, wherein 10 in industrial waste gas
Common organically harm of the waste gas to human body of kind is mainly shown as：
The organic matter of benzene class damages the nervous centralis of people more, the obstacle of nervous system can be caused, when the concentration mistake of benzene vapor
When high (in air content up to 2%), the acute poisoning of lethal can be caused.
The organic matter of polycyclic aromatic hydrocarbon has strong carcinogenicity.
The organic matter of benzoic acid class can make the protein of cell deform or solidify, and cause systemic toxicity profiles.
When the organic matter poisoning of nitrile occurs, expiratory dyspnea, severe asphyxia, the forfeiture even realized can be caused until extremely
Die.
The nitrobenzene of organic matter influences nervous system, blood phase and liver, spleen organ dysfunction, the large area of skin absorb can so that
People is dead.
The organic matter of aromatic amine is carcinogenic, and diphenylamines, benzidine etc. can cause the symptom of anoxic into human body.
Organic nitrogen compound can be carcinogenic.
The compound of organophosphor reduces the activity of CHE in blood, makes the obstacle of nervous system generating function.
In organosulfur compound, the mercaptan of low concentration can cause discomfort, high concentration can causing death.
In oxygen-containing organically compound, the oxirane for sucking high concentration can causing death.
Methacrylaldehyde has strong impulse to mucous membrane；Amylalcohol can play headache, vomiting, diarrhoea etc..
At present, domestic organic waste gas particularly industrial organic exhaust gas is absorbed using activated carbon, although installation has preferably initial stage
Adsorption effect, but over time, adsorption effect reduces, until saturation；Saturated activity charcoal after replacing is dangerous waste, place
Managing bad can form secondary pollution.
Although in the market also has the similar organic waste gas purifier based on plasma, because treatment technology is single, knot
The shortcomings of structure is not compact, and energy consumption is big, user is caused to bear.
The content of the invention
The purpose of this utility model is a kind of cleaning plant for waste gas of plasma good to VOCs treatment effect of design.
To achieve the above object, the utility model uses following technical scheme：A kind of low temperature plasma waste gas cleaning
Device, it is characterised in that it includes casing and is located at the first photocatalyst processing unit of the casing internal, the second photocatalyst
Processing unit and low-temperature plasma processing unit, the first photocatalyst processing unit are located at the low-temperature plasma processing unit
Treatment region input front end, the second photocatalyst processing unit be located at the low-temperature plasma processing unit treatment region output
Rear end.
The utility model improves exhaust-gas treatment effect, to the skill to further effectively decompose all kinds of organic compounds
Art scheme is further set：The first photocatalyst processing unit or the second photocatalyst processing unit include photocatalyst
Tube stand, photocatalyst Catalytic Layer, ultraviolet lamp tube, the photocatalyst Catalytic Layer are provided with some on the photocatalyst lamp pipe holder
Layer, the ultraviolet lamp tube are located between the photocatalyst Catalytic Layer spatially.
The utility model improves exhaust-gas treatment effect, to the skill to further effectively decompose all kinds of organic compounds
Art scheme is further set：The low-temperature plasma processing unit includes plasma generator support and plasma occurs
Device.
The utility model ensures that subsequent treatment area processing organic exhaust gas has in order to which the pollutant in organic exhaust gas is filtered out
Preferable ecotopia, the technical scheme is further set：In the treatment region of the first photocatalyst processing unit
Input front end is provided with filter, and the filter includes primary efficient filter screen, medium air filtration net, high efficiency particulate air.
The utility model in order that processing after waste gas in injurious factor can react thorough, generate harmless products, it is right
The technical scheme is further set：Combined reaction is provided with the second photocatalyst processing unit treatment region output rear end
Device, the combined reaction device, which includes, stops grid and gas cushion space.
The utility model is by the way that the polluter in waste gas and the active group with higher-energy are reacted, finally
It is converted into CO2And H2The materials such as O, so as to realize the purpose for reaching cleaning organic waste gas.
Brief description of the drawings
The utility model is described in further detail with reference to the accompanying drawings and examples.
Fig. 1 is the present embodiment principal section structural representation.
Embodiment
As shown in figure 1, filter A, the first light that the present embodiment includes casing 4 and is located inside the casing 4 touch
Matchmaker's processing unit B1, the second photocatalyst processing unit B2, low-temperature plasma processing unit C and combined reaction device D, wherein：
The filter A is located at the treatment region input front end of the first photocatalyst processing unit B1, the filtering dress
Put A and include primary efficient filter screen 1, medium air filtration net 2, high efficiency particulate air 3.Roughing efficiency air filter 1 is dirty by the bulky grain in organic exhaust gas
Contaminate thing to intercept, medium effeciency filter 2 intercepts the small particles of pollution thing in organic exhaust gas, and high efficiency particulate air filter 3 is by organic exhaust gas
Molecule pollutant filters out, and ensures that subsequent treatment area processing organic exhaust gas has preferable ecotopia.
The first photocatalyst processing unit B1 is located at the treatment region input front end of the low-temperature plasma processing unit C,
The second photocatalyst processing unit B2 is located at the treatment region output rear end of the low-temperature plasma processing unit C.
The first photocatalyst processing unit B1 or the second photocatalyst processing unit B2 includes photocatalyst lamp pipe holder 5, light
Catalyst Catalytic Layer 6, ultraviolet lamp tube 7, it is described if the photocatalyst Catalytic Layer 6 is provided with dried layer on the photocatalyst lamp pipe holder 5
Ultraviolet lamp tube 7 is located between the photocatalyst Catalytic Layer 6 spatially.
Photocatalyst processing unit utilizes ozone high grade oxidation combination technique, as caused by ultraviolet lamp tube 185nm spectrum with
253.7nm spectrum are irradiated to exhaust gas constituents, and the oxygen molecule in waste gas decomposition produces ozone, and oxygen is carried out to waste gas using ozone
Change and decompose, while photocatalyst Catalytic Layer 6 is under light illumination, valence-band electrons are excited to conduction band, form electronics and hole, with suction
Invest the O on its surface2And H2O is acted on, and generates superoxide anion radical, O2- and hydroxyl radical free radical-OH, its free radical tool
There is very strong oxidative decomposition capacity, C-C keys, c h bond, C-N keys, C-O keys, O-H keys, the N-H keys that can be destroyed in organic matter, decompose
Organic matter is carbon dioxide, water and nitrogen.
The low-temperature plasma processing unit C includes plasma generator support 8 and plasma generator 9.By plasma
Low temperature plasma caused by generator 9, two aspects are included to the purified treatment of waste gas：
First, during plasma is produced, moment high energy opens some organic wastes enough caused by high-frequency discharge
The chemical energy of qi leel, is allowed to be decomposed into simple substance atom or harmless molecule；
Second, processing of the plasma to organic exhaust gas, it has three basic processes：
One) the direct bombardment of high energy electron, substantial amounts of high energy electron, negative ions, excitation state grain are included in plasma
Son and the free radical with strong oxidizing property, these active particles and part organic exhaust gas molecular collision combine, under electric field action,
Organic exhaust gas molecule is set to be in excitation state；
Two) oxidation of O atom, OH free radicals or ozone, when the energy that organic exhaust gas molecule obtains is more than its molecular bond energy
Combination energy when, the chemical bond rupture of organic exhaust gas molecule, directly resolve into simple substance atom or obtained by single atomic building harmless
Gas molecule, with the O that caused a large amount of OH, HO2, O isoreactivity free radicals and oxidisability are extremely strong3, sent out with pernicious gas molecule
Biochemical reaction, ultimately generates harmless products；
Three) reaction of molecular fragment+oxygen；
Activate, ionize by said process, cracking each group composition in waste gas, being allowed to decompose, some row such as oxidation
Complicated chemical reaction, is eventually converted into CO2And H2The innocuous substances such as O.
The combined reaction device D is located at the second photocatalyst processing unit B2 treatment regions output rear end, the synthesis
Reaction unit D, which is included, stops grid 10 and gas cushion space 11.
The effect of the combined reaction device D includes two aspects：First, grid 10 is formed to waste gas in the process of circulation
It is certain to stop the effect of being mixed；Second, part is without the extremely strong O of complete OH, HO2, O isoreactivity free radical of reaction and oxidisability3,
It is mixed under effect in the stop of grid 10, is sent out again with pernicious gas molecule with the time by the space that gas buffer space 11 provides
Biochemical reaction, pernicious gas molecule is all chemically reacted, generate harmless products.
In summary, the utility model has advantages below compared with prior art：
1st, have electron energy height, reaction speed fast；
2nd, all types of industries waste gas can be handled, use range is wide.
3rd, collect ozone high grade oxidation combination technique and low-temperature plasma treatment technology, the processing to organic exhaust gas can be ensured
Effect.
4th, the final discharge product of processing is harmless products, will not produce pollution to environment.
5th, processing procedure does not produce secondary pollution.
Claims (5)
1. a kind of low temperature plasma waste gas cleaning device, it is characterised in that it includes casing (4) and is located in the casing (4)
First photocatalyst processing unit (B1), the second photocatalyst processing unit (B2) and the low-temperature plasma processing unit (C) in portion, it is described
First photocatalyst processing unit (B1) is located at the treatment region input front end of the low-temperature plasma processing unit (C), and described second
Photocatalyst processing unit (B2) is located at the treatment region output rear end of low-temperature plasma processing unit (C).
A kind of 2. low temperature plasma waste gas cleaning device according to claim 1, it is characterised in that first photocatalyst
Processing unit (B1) or the second photocatalyst processing unit (B2) include photocatalyst lamp pipe holder (5), photocatalyst Catalytic Layer (6), purple
Outer fluorescent tube (7), the photocatalyst Catalytic Layer (6) in the photocatalyst lamp pipe holder (5) if on be provided with dried layer, the ultraviolet lamp tube
(7) it is located between the photocatalyst Catalytic Layer (6) spatially.
A kind of 3. low temperature plasma waste gas cleaning device according to claim 2, it is characterised in that the low-temperature plasma
Processing unit (C) includes plasma generator support (8) and plasma generator (9).
4. low temperature plasma waste gas cleaning device according to claim 3, it is characterised in that at first photocatalyst
The treatment region input front end of reason device (B1) is provided with filter (A), the filter (A) comprising primary efficient filter screen (1), in
Imitate screen pack (2), high efficiency particulate air (3).
5. a kind of low temperature plasma waste gas cleaning device according to claim 4, it is characterised in that touched in second light
The treatment region output rear end of matchmaker's processing unit (B2) is provided with combined reaction device (D), and the combined reaction device (D), which includes, to stop
Grid (10) and gas cushion space (11).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720381971.4U CN206631408U (en) | 2017-04-06 | 2017-04-06 | A kind of low temperature plasma waste gas cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720381971.4U CN206631408U (en) | 2017-04-06 | 2017-04-06 | A kind of low temperature plasma waste gas cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206631408U true CN206631408U (en) | 2017-11-14 |
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| CN201720381971.4U Active CN206631408U (en) | 2017-04-06 | 2017-04-06 | A kind of low temperature plasma waste gas cleaning device |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107224849A (en) * | 2017-07-29 | 2017-10-03 | 陈锦霖 | A kind of low temperature plasma waste gas cleaning device |
-
2017
- 2017-04-06 CN CN201720381971.4U patent/CN206631408U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107224849A (en) * | 2017-07-29 | 2017-10-03 | 陈锦霖 | A kind of low temperature plasma waste gas cleaning device |
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