CN107195730B - Texturing cleaning machine and water circulation method - Google Patents
Texturing cleaning machine and water circulation method Download PDFInfo
- Publication number
- CN107195730B CN107195730B CN201710512452.1A CN201710512452A CN107195730B CN 107195730 B CN107195730 B CN 107195730B CN 201710512452 A CN201710512452 A CN 201710512452A CN 107195730 B CN107195730 B CN 107195730B
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- water
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- tank
- rear end
- alkali
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 196
- 238000004140 cleaning Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 title claims abstract description 8
- 210000002268 wool Anatomy 0.000 claims abstract description 29
- 239000003513 alkali Substances 0.000 claims abstract description 27
- 239000002253 acid Substances 0.000 claims abstract description 21
- 238000000861 blow drying Methods 0.000 claims abstract description 13
- 238000007599 discharging Methods 0.000 claims abstract description 13
- 239000007788 liquid Substances 0.000 claims description 13
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 210000005056 cell body Anatomy 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 239000007921 spray Substances 0.000 claims description 7
- 238000005406 washing Methods 0.000 claims description 7
- 238000012546 transfer Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 4
- 238000006386 neutralization reaction Methods 0.000 abstract description 3
- 239000002585 base Substances 0.000 abstract description 2
- 235000012431 wafers Nutrition 0.000 description 8
- 238000003825 pressing Methods 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 2
- 210000004027 cell Anatomy 0.000 description 2
- 238000005202 decontamination Methods 0.000 description 2
- 230000003588 decontaminative effect Effects 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000001914 filtration Methods 0.000 description 2
- 239000002351 wastewater Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000012459 cleaning agent Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 239000003344 environmental pollutant Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 231100000719 pollutant Toxicity 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000008400 supply water Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000004065 wastewater treatment Methods 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/1876—Particular processes or apparatus for batch treatment of the devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B13/00—Accessories or details of general applicability for machines or apparatus for cleaning
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/02—Cleaning by the force of jets or sprays
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
The invention discloses a wool making cleaning machine, which comprises a feeding device, a discharging device, a wool making groove, an alkali groove, an acid groove, a water groove and a blow-drying groove, wherein the water groove is arranged between the wool making groove and the alkali groove, the water groove is arranged between the alkali groove and the acid groove, the water groove is arranged between the acid groove and the blow-drying groove, the feeding device is arranged at the front end of the wool making groove, and the discharging device is arranged at the rear end of the blow-drying groove; the water tank comprises a tank body, water knives, a conveying pipe group and a water receiving disc, wherein the conveying pipe group is arranged in the tank body, the water knives are arranged above and below the conveying pipe group, at least three groups of water knives are arranged, and the water receiving disc is arranged below the water knives at the front end; the concentration of the cleaning water is reduced by independently collecting and using the acid-base neutralization method with different concentrations, so that the water resource is effectively saved, and the production cost is reduced.
Description
Technical Field
The invention relates to the field of solar cell production, in particular to a wool making cleaning machine and a water circulation method.
Background
The production process of the solar cell comprises the steps of primary cleaning, diffusion, etching, secondary cleaning, PECVD, sintering, test sorting and inspection warehousing, wherein the primary cleaning aims to eliminate various pollutants adsorbed on the surface of the silicon wafer, texture treatment is carried out on the surface of the silicon wafer, the reflectivity of the surface of the silicon wafer to light is reduced, and incident light is reflected to an inclined plane at another angle to form secondary or multiple absorption, so that the absorption rate is increased. However, a large amount of water is needed for cleaning, the cleaned water is treated and can be discharged after reaching the standard, and enterprises generally concentrate all the waste water and then treat the waste water, so that the treatment is time-consuming, the steps are complicated, and the treatment cost is high, so that a water-saving wool making cleaning agent is needed.
Disclosure of Invention
Aiming at the defects existing in the prior art, the main purpose of the invention is to overcome the defects of the prior art, and discloses a wool making cleaning machine which comprises a feeding device, a discharging device, a wool making groove, an alkali groove, an acid groove, a water groove and a blow-drying groove, wherein the water groove is arranged between the wool making groove and the alkali groove, the water groove is arranged between the alkali groove and the acid groove, the water groove is arranged between the acid groove and the blow-drying groove, the front end of the wool making groove is provided with the feeding device, and the rear end of the blow-drying groove is provided with the discharging device;
the water tank comprises a tank body, a water knife, a conveying pipe group and a water receiving disc, wherein the conveying pipe group is arranged in the tank body, the water knife is arranged above and below the conveying pipe group, at least three groups of water knives are arranged, and the water receiving disc is arranged below the water knife at the front end;
the water jet comprises a water jet pipe and a jet nozzle, and the jet nozzle is arranged on the water jet pipe.
Further, overflow ports are formed in the side walls of the groove body.
Further, a water inlet is further formed in the tank body, the water overflow port of the water tank at the rear end of the acid tank is connected with the water inlet of the water tank at the rear end of the alkali tank through a water pipe, the water overflow port of the water tank at the rear end of the alkali tank is connected with the water inlet of the water tank at the rear end of the wool making tank, and the water overflow port of the wool making tank is connected with the outside.
Further, the upper pressing wheels are respectively arranged above the feeding end and the discharging end of the conveying pipe group.
Further, the spray nozzle is any one of a conical nozzle, a fan nozzle and a bar nozzle.
Further, the caliber of the spray nozzle is 0.5-1.5mm.
Further, a filtering device is also included.
Further, the water pressure at the spray nozzle is 3-4Mpa.
According to the water circulation method of the wool making cleaning machine, the following steps are adopted:
1) The front end and the middle end of the water tank of the cleaning machine are provided with water in the tank body by a pump, and the rear end of the water tank is provided with clean water by the outside.
2) The front end the water after the water sword washs the silicon chip is direct to be passed through the water collector discharges and collects alone, and middle end and rear end the water after the water sword washs returns in the cell body, the rear end the water after the water sword washs flows to in the cell body, unnecessary water in the cell body passes through the gap is discharged.
Further, in step 2, the overflow port of the water tank at the rear end of the acid tank transmits the excessive liquid into the water tank at the rear end of the alkali tank through a water pipe, the overflow port of the water tank at the rear end of the alkali tank transmits the excessive liquid into the water tank at the rear end of the wool making tank through a water pipe, and the overflow port of the wool making tank discharges and collects the excessive water in the water tank.
The invention has the beneficial effects that:
1, the setting of water collector directly discharges the washing water of high concentration and collects, has reduced the pollution to the washing water in the cell body, has the replenishment of clean washing water in addition, cooperates the work of gap, makes the water in the cell body circulate.
2. The water in the water tank overflows into another water tank, so that acid and alkali are neutralized, and the concentration of cleaning water in the water tank is reduced.
3. The concentration of the cleaning water is reduced by independently collecting and using the acid-base neutralization method with different concentrations, so that the water resource is effectively saved, and the production cost is reduced.
Drawings
FIG. 1 is a front view of a texturing and cleaning machine according to the present invention;
FIG. 2 is a front view of the sink of the present invention;
FIG. 3 is a front view of the water jet knife of the present invention;
the reference numerals are as follows:
1. the device comprises a feeding device 2, a discharging device 3, a texturing groove 4, an alkali groove 5, an acid groove 6, a water groove 7, a blow-drying groove 61, a groove body 62, a water knife 63, a conveying pipe group 64, a water receiving disc 65, an overflow port 66, a water inlet 67, an upper pressing wheel 621, a water knife pipe 622 and a spray nozzle.
Detailed Description
The present invention will be described in further detail with reference to the drawings and examples, in order to make the objects, technical solutions and advantages of the present invention more apparent. It should be understood that the specific embodiments described herein are for purposes of illustration only and are not intended to limit the scope of the invention.
The invention relates to a wool making cleaning machine, which comprises a feeding device 1, a discharging device 2, a wool making groove 3, an alkali groove 4, an acid groove 5, a water groove 6 and a blow-drying groove 7, wherein the water groove 6 is arranged between the wool making groove 3 and the alkali groove 4, the water groove 6 is arranged between the alkali groove 4 and the acid groove 5, the water groove 6 is arranged between the acid groove 5 and the blow-drying groove 7, the feeding device 1 is arranged at the front end of the wool making groove 3, and the discharging device 2 is arranged at the rear end of the blow-drying groove 7;
the water tank 6 comprises a tank body 61, water knives 62, a conveying pipe group 63 and a water receiving disc 64, wherein the conveying pipe group 63 is arranged in the tank body 61, in order to prevent silicon wafers from inclining and displacing during feeding and discharging, upper pressing wheels 67 are respectively arranged above a feeding end and a discharging end of the conveying pipe group 63, the water knives 62 are arranged above and below the conveying pipe group 63, the upper water knives 62 and the lower water knives 62 of the conveying pipe group 63 are in a group, at least three groups of water knives 62 are respectively arranged at the front end, the middle end and the rear end, and in order to ensure that the silicon wafers are not lifted during working of the lower water knives, the pressure of the upper water knives is higher than that of the lower water knives; because the concentration of the liquid after the front-end water knife 62 cleans the silicon wafer is high, a water pan 64 is arranged below the front-end water knife 62 to directly discharge the water after the front-end water knife cleans; because front end and middle end water sword 62 are used for the thick washing of silicon chip, so water sword 62's water supply is through the pump with the water in the cell body 61 pump to in the water sword 62, and the rear end is the fine wash, need to finish the washing as far as on the silicon chip, so the rear end water sword 62 lets in clean water from outside, is provided with gap 65 on the lateral wall of cell body 61, can prevent like this that the liquid in the cell body 61 from excessively influencing the equipment operation.
In order to better utilize water resources, a water inlet 66 is further arranged on the side wall of the tank body 61, the overflow port 65 of the water tank 6 at the rear end of the acid tank 5 is connected with the water inlet 66 of the water tank 6 at the rear end of the alkali tank 4 through a water pipe, the overflow port 65 of the water tank 6 at the rear end of the alkali tank 4 is connected with the water inlet 66 of the water tank 6 at the rear end of the wool making tank 3, the overflow port 65 of the wool making tank 3 is connected with an external collecting and processing device, the rear end water knife 62 in the water tank 6 is continuously introduced with clean water and works in cooperation with the overflow port 65, so that the dilution of liquid in the tank body 61 can be realized, the saturation of cleaning liquid is prevented, in addition, overflowed liquid is discharged into another water tank, the effect of neutralization of acid and alkali can be realized, the concentration of the cleaning liquid is diluted, and on the other hand, the cost for wastewater treatment is reduced; in order to facilitate the transfer of excess liquid between the tanks 6, the overflow 65 is higher than the inlet 66.
The water jet 62 comprises a water jet pipe 621 and jet nozzles 622, the jet nozzles 622 are arranged on the water jet pipe 621, different numbers of jet nozzles 622 can be arranged according to different requirements on water jet quantity, the jet nozzles 622 can select different types of jet nozzles according to different cleaning objects, the jet nozzles can be conical nozzles, fan-shaped nozzles, bar-shaped nozzles and the like, in order to enable the jet range to be wider, the fan-shaped nozzles are adopted as the jet nozzles 622, a plurality of jet nozzles 622 can be selected according to different scattering angles and different hitting distances to cover the whole width direction, and in order to enable the decontamination effect to be better, the caliber of the jet nozzles 622 is 0.5-1.5mm, but because the caliber of the jet nozzles is small, blockage is easy to occur, and a filtering device is also arranged to filter cleaning water; in order to ensure the decontamination capability of the wafer surface, the water pressure at the spray nozzle 622 is controlled to be 3-4Mpa.
According to the water circulation method of the wool making cleaning machine, the following steps are adopted:
1) The front end water blade 62 and the middle end water blade 62 of the water tank 6 of the washing machine supply water in the tank body 61 by a pump, and the rear end water blade 62 supplies clean water from outside.
2) The water after the front end water knife 62 cleans the silicon wafer is directly discharged through the water receiving disc 64 and is singly collected due to high pollution degree, the water after the middle end water knife 62 cleans returns to the tank body 61, the water after the back end water knife 62 cleans flows to the tank body 61, and if the water in the tank body 61 is higher than the overflow port 65, the water in the tank body 61 is discharged through the overflow port 65.
In order to better utilize water resources, in step 2, the overflow port 65 of the water tank 6 at the rear end of the acid tank 5 transmits excessive liquid into the water tank 6 at the rear end of the alkali tank 4 through a water pipe, the overflow port 65 of the water tank 6 at the rear end of the alkali tank 4 transmits excessive liquid into the water tank 6 at the rear end of the texturing tank 3 through a water pipe, and the overflow port 65 of the texturing tank 3 discharges and collects excessive water in the water tank 6.
The foregoing is merely a preferred embodiment of the present invention and is not intended to limit the scope of the present invention; modifications and equivalent substitutions are intended to be included in the scope of the claims without departing from the spirit and scope of the present invention.
Claims (7)
1. The wool making cleaning machine comprises a feeding device, a discharging device, a wool making groove, an alkali groove, an acid groove, a water groove and a blow-drying groove, and is characterized in that the water groove is arranged between the wool making groove and the alkali groove, the water groove is arranged between the alkali groove and the acid groove, the water groove is arranged between the acid groove and the blow-drying groove, the feeding device is arranged at the front end of the wool making groove, and the discharging device is arranged at the rear end of the blow-drying groove;
the water tank comprises a tank body, a water knife, a conveying pipe group and a water receiving disc, wherein the conveying pipe group is arranged in the tank body, the water knife is arranged above and below the conveying pipe group, at least three groups of water knives are arranged, and the water receiving disc is arranged below the water knife at the front end;
the water knife comprises a water knife pipe and a spray nozzle, and the spray nozzle is arranged on the water knife pipe;
an overflow port is arranged on the side wall of the tank body;
the water inlet is further formed in the tank body, the overflow port of the water tank at the rear end of the acid tank is connected with the water inlet of the water tank at the rear end of the alkali tank through a water pipe, the overflow port of the water tank at the rear end of the alkali tank is connected with the water inlet of the water tank at the rear end of the wool making tank, and the overflow port of the wool making tank is connected with the outside;
and upper pinch rollers are respectively arranged above the feeding end and the discharging end of the conveying pipe group.
2. The machine of claim 1, wherein the jet nozzle is any one of a conical nozzle, a fan nozzle, and a bar nozzle.
3. A machine as claimed in claim 2, wherein the jet nozzle has a bore of 0.5-1.5mm.
4. The machine of claim 1, further comprising a filter.
5. A machine as claimed in claim 1, wherein the water pressure at the jet nozzle is 3-4Mpa.
6. A water circulation method of a wool making washing machine according to any one of claims 1-5, characterized by the steps of:
1) The front end and the middle end of the water tank of the cleaning machine are provided with water in the tank body through pumps, and the rear end of the water tank is provided with clean water through the outside;
2) The front end the water after the water sword washs the silicon chip is direct to be passed through the water collector discharges and collects alone, and middle end and rear end the water after the water sword washs returns in the cell body, the rear end the water after the water sword washs flows to in the cell body, unnecessary water in the cell body passes through the gap is discharged.
7. The machine of claim 6, wherein in step 2, said overflow of said water tank at said rear end of said acid tank transfers excess liquid into said water tank at said rear end of said alkali tank via a water pipe, said overflow of said water tank at said rear end of said alkali tank transfers excess liquid into said water tank at said rear end of said texturing tank via a water pipe, and said overflow of said texturing tank discharges and collects excess water in said water tank.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710512452.1A CN107195730B (en) | 2017-06-29 | 2017-06-29 | Texturing cleaning machine and water circulation method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710512452.1A CN107195730B (en) | 2017-06-29 | 2017-06-29 | Texturing cleaning machine and water circulation method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107195730A CN107195730A (en) | 2017-09-22 |
| CN107195730B true CN107195730B (en) | 2023-10-20 |
Family
ID=59880556
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710512452.1A Active CN107195730B (en) | 2017-06-29 | 2017-06-29 | Texturing cleaning machine and water circulation method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107195730B (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112466774B (en) * | 2019-09-06 | 2023-11-17 | 泰州隆基乐叶光伏科技有限公司 | Etching equipment |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202124663U (en) * | 2011-06-16 | 2012-01-25 | 东莞南玻光伏科技有限公司 | Solar battery etching machine |
| CN202527397U (en) * | 2011-09-26 | 2012-11-14 | 郑春晓 | High-pressure water jet cutter cleaning machine for liquid crystal module |
| CN106784062A (en) * | 2016-12-30 | 2017-05-31 | 中建材浚鑫科技股份有限公司 | A kind of silicon chip cleaning and texturing devices and methods therefor |
| CN206947368U (en) * | 2017-06-29 | 2018-01-30 | 昊诚光电（太仓）有限公司 | A kind of etching cleaning machine |
-
2017
- 2017-06-29 CN CN201710512452.1A patent/CN107195730B/en active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN202124663U (en) * | 2011-06-16 | 2012-01-25 | 东莞南玻光伏科技有限公司 | Solar battery etching machine |
| CN202527397U (en) * | 2011-09-26 | 2012-11-14 | 郑春晓 | High-pressure water jet cutter cleaning machine for liquid crystal module |
| CN106784062A (en) * | 2016-12-30 | 2017-05-31 | 中建材浚鑫科技股份有限公司 | A kind of silicon chip cleaning and texturing devices and methods therefor |
| CN206947368U (en) * | 2017-06-29 | 2018-01-30 | 昊诚光电（太仓）有限公司 | A kind of etching cleaning machine |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107195730A (en) | 2017-09-22 |
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Effective date of registration: 20230914 Address after: 215400 417, building 1, 168 Shanghai East Road, Loudong street, Taicang City, Suzhou City, Jiangsu Province Applicant after: TAICANG ZHETAITIAN PRODUCT DESIGN Co.,Ltd. Address before: 215400 No.168, Changsheng North Road, Taicang City, Suzhou City, Jiangsu Province Applicant before: HONSUN PHOTOVOLTAIC (TAICANG) Co.,Ltd. |
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