CN107179655A - A kind of developing method and developing apparatus - Google Patents
A kind of developing method and developing apparatus Download PDFInfo
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- CN107179655A CN107179655A CN201710630338.9A CN201710630338A CN107179655A CN 107179655 A CN107179655 A CN 107179655A CN 201710630338 A CN201710630338 A CN 201710630338A CN 107179655 A CN107179655 A CN 107179655A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
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Abstract
The present invention provides a kind of developing method and developing apparatus.The developing method includes：When the substrate that develops is moved on the first base station, the first jet that control is arranged above the first base station sprays development spray liquid；Wherein described development spray liquid is parallel with the long side direction of the sub-pixel unit of substrate to be developed from the direction that the first jet sprays, and the development spray liquid flows through the substrate to be developed after first jet ejection.This method by make first jet spray development spray liquid direction it is parallel with the long side direction of sub-pixel unit on substrate, ensure spray liquid when being flowed on substrate can along sub-pixel unit long side direction, namely along the long side direction of sub-pixel opening on substrate to be developed, compared to prior art, mobility of the spray liquid on substrate can be more improved, reaches raising to color blocking on substrate and the purpose of the flush efficiency of developer solution.
Description
Technical field
The present invention relates to developing technique field, a kind of developing method and developing apparatus are referred in particular to.
Background technology
In TFT-LCD (TFT liquid crystal display) production process, the formation of pattern needs on substrate
By the process such as coating, exposed and developed.Wherein, developing process is mainly used to remove the photoetching on the glass substrate after exposure
Glue, is pre-formed required figure to carry out next step etching procedure.
Fountain, including developer solution spray process, water purification spray are used the developing apparatus of prior art TFT-LCD productions more
Process and air drying process.The device structure schematic diagram of above-mentioned each process is as shown in figure 1, generally base station 1 with respect to the horizontal plane 5 has
Inclination angle theta, injection nozzle carrier 2 is arranged at the top of base station 1, and multiple nozzles 3 are equably fixed on injection nozzle carrier 2.Sprayed in developer solution
Cheng Zhong, glass substrate 4 drives to the base station 1 in region corresponding to the process, and nozzle 3 is with perpendicular to the ejection of the direction of glass substrate 4
Developer solution, and spray on glass substrate 4, to show litho pattern；During water purification spray, glass substrate 4 drives to institute
The base station 1 of corresponding region, nozzle 3 perpendicular to the direction of glass substrate 4 to spray purified water, to remove glass base by purified water
Developer solution on plate 4；In air drying process, glass substrate 4 drives to the base station 1 of corresponding region, and nozzle 3 is with perpendicular to glass substrate
4 direction, which sprays, air-dries gas, is air-dried with the cleaning for realizing glass substrate 4.
However, in above process, nozzle 3, which sprays developer solution, purified water and air-dried gas, only has a flowing side
To, but with the appearance for carrying out litho pattern on glass substrate 4 of developing process, litho pattern can influence developer solution and purified water
Smooth flow on glass substrate 4, so as to cause colored color blocking and developer solution on glass substrate 4 to be difficult what is be cleaned
Problem.
The content of the invention
The purpose of technical solution of the present invention is to provide a kind of developing method and developing apparatus, for solving the aobvious of prior art
It is difficult the problem of being cleaned that image method, which has colored color blocking and developer solution,.
The specific embodiment of the invention provides a kind of developing method, wherein, including：
When the substrate that develops is moved on the first base station, the first jet that control is arranged above the first base station sprays development
Spray liquid；
Direction and the sub-pixel unit of substrate to be developed that wherein described development spray liquid sprays from the first jet
Long side direction is parallel, and the development spray liquid flows through the substrate to be developed after first jet ejection.
Preferably, described developing method, wherein, when the long side direction of the sub-pixel unit of the substrate to be developed is non-
During perpendicular to first direction, the development spray liquid includes the component of second direction from the direction that the first jet sprays, its
Described in second direction be the first direction opposite direction, the first direction is that the substrate to be developed is moved to first
Direction when on base station.
Preferably, described developing method, wherein, when a upper process for the substrate to be developed is by exposure process
During reason, the development spray liquid is developer solution；
When the upper process wait the substrate that develops is by developer solution spray process, the development spray liquid is purification
Water.
Preferably, described developing method, wherein, when the development spray liquid is purified water, make to be arranged at the first base station
The first jet of top sprays purified water, and purified water is rushed to the substrate to be developed after Xian reaches preset duration, methods described
Also include：
Make by purified water rinse described in substrate to be developed be moved to the second base station for performing air drying process, make to set
The second nozzle blowout being placed in above the second base station air-dries gas；
The direction and substrate to be developed that wherein described air-dried gas sprays from the second nozzle are moved to second base
Moving direction when on platform is parallel, and the air-dried gas flows through the substrate to be developed after second nozzle ejection.
Preferably, described developing method, wherein, the developer solution is molten for the potassium hydroxide KOH of concentration 3.5% to 5%
Liquid.
Preferably, described developing method, wherein, spray development spray making to be arranged at the first jet above the first base station
Drench before liquid, methods described also includes：
The substrate to be developed is moved on first base station by drive mechanism.
Preferably, described developing method, wherein, spray development spray making to be arranged at the first jet above the first base station
In the step of drenching liquid, control development spray liquid reaches preset duration to the substrate spray to be developed；
Wherein, the substrate to be developed is rushed after Xian reaches preset duration in control development spray liquid, methods described is also
Including：
The substrate to be developed is moved to by drive mechanism by the second base station for performing next treatment process.
The specific embodiment of the invention also provides a kind of developing apparatus, for the developing method described in as above any one, wherein,
The developing apparatus includes：
First base station, for placing substrate to be developed；
The first jet above first base station is arranged at, providing structure with development spray liquid is connected, wherein described
First jet direction makes the direction of sprayed development spray liquid equal with the long side direction of the sub-pixel unit of substrate to be developed
Capable direction.
Preferably, described developing apparatus, wherein, the first jet is connected by angle adjustment mechanism with fixed support
Connect, the direction of the first jet can be adjusted by the angle adjustment mechanism.
Preferably, described developing apparatus, wherein, the first jet also passes through lifting adjusting structure and the fixed branch
Frame is connected, and the first jet can be adjusted to the distance of the substrate to be developed by the lift adjustment.
Preferably, described developing apparatus, wherein, the development spray liquid is developer solution；
Wherein described developing apparatus also includes：
Second base station, for placing substrate to be developed；
The second nozzle above second base station is arranged at, providing structure with purified water is connected, wherein described second
Nozzle direction makes the direction of the sprayed purified water direction parallel with the long side direction of the sub-pixel unit of substrate to be developed.
Preferably, described developing apparatus, wherein, the developing apparatus also includes：
3rd base station, for placing substrate to be developed；
The 3rd nozzle above the 3rd base station is arranged at, providing structure with gas is connected, wherein the 3rd spray
Mouth direction makes the direction of sprayed gas parallel with the moving direction when substrate that develops is moved on the 3rd substrate
Direction.
One or more embodiments of the invention at least has the advantages that：
Developing method described in the specific embodiment of the invention, by making first jet spray direction and the base of development spray liquid
The long side direction of sub-pixel unit is parallel on plate, it is ensured that can be along the long side of sub-pixel unit when spray liquid flows on substrate
Direction, namely along the long side direction of sub-pixel opening on substrate to be developed, compared to prior art, can more improve spray liquid
Mobility on substrate, reaches that raising, to color blocking on substrate and the purpose of the flush efficiency of developer solution, solves prior art
It is difficult the problem of being cleaned that developing method, which has colored color blocking and developer solution,.
Brief description of the drawings
Fig. 1 is the structural representation that prior art developer solution sprays process；
Fig. 2 is the schematic flow sheet of developing method described in the embodiment of the present invention；
Fig. 3 is the stereoscopic structural representation of the developing apparatus using developing method described in the embodiment of the present invention；
Fig. 4 is the part-structure schematic diagram of the developing apparatus using developing method described in the embodiment of the present invention；
Fig. 5 is that using in developing method described in the specific embodiment of the invention, nozzle sprays the of spray liquid direction of developing
A kind of view；
Fig. 6 is that using in developing method described in the specific embodiment of the invention, nozzle sprays the of spray liquid direction of developing
Two kinds of views；
Fig. 7 is that using in developing method described in the specific embodiment of the invention, nozzle sprays the of spray liquid direction of developing
Three kinds of views.
Embodiment
Below in conjunction with the accompanying drawing in the embodiment of the present invention, the technical scheme in the embodiment of the present invention is carried out clear, complete
Site preparation is described, it is clear that described embodiment is a part of embodiment of the invention, rather than whole embodiments.Based on this hair
Embodiment in bright, the every other implementation that those of ordinary skill in the art are obtained under the premise of creative work is not made
Example, belongs to the scope of protection of the invention.
The embodiment of the present invention provides a kind of developing method, as shown in Fig. 2 the display methods includes：
Step S210, when the substrate that develops is moved on the first base station, control is arranged at the first spray above the first base station
Mouth sprays development spray liquid；
Direction and the sub-pixel unit of substrate to be developed that wherein described development spray liquid sprays from the first jet
Long side direction is parallel, and the development spray liquid flows through the substrate to be developed after first jet ejection.
Developing method described in the specific embodiment of the invention, by making first jet spray direction and the base of development spray liquid
The long side direction of sub-pixel unit is parallel on plate, it is ensured that can be along the long side of sub-pixel unit when spray liquid flows on substrate
Direction, namely along the long side direction of sub-pixel opening on substrate to be developed, compared to prior art, can more improve spray liquid
Mobility on substrate, reaches that raising, to color blocking on substrate and the purpose of the flush efficiency of developer solution, solves prior art
It is difficult the problem of being cleaned that developing method, which has colored color blocking and developer solution,.
It is preferred that during step S210 execution, when the upper process wait the substrate that develops is by exposure process processing,
The development spray liquid that first jet sprays is developer solution；
When the upper process wait the substrate that develops is by developer solution spray process, the development spray that first jet sprays
Pouring liquid is purified water.
Specifically, when step S210 is developer solution spray phase, a upper process for handled substrate to be developed is process
During exposure process processing, the development spray liquid that first jet sprays is developer solution；
When step S210 is water purification spray phase, a upper process for handled substrate to be developed is by developer solution spray
During processing, the development spray liquid that first jet sprays is purified water.
In addition, making to be arranged at the first jet above the first base station to perform water purification spray phase as step S210 and spraying
Purified water, purified water is treated after development substrate rinses and reach the first preset time, and methods described also includes：
The substrate to be developed rinsed by purified water is moved to the second base station for performing air drying process, make to be arranged at
Second nozzle blowout above second base station air-dries gas；
Gas is wherein air-dried from the direction that second nozzle sprays and the movement when substrate that develops is moved on the second base station
Direction is parallel, and air-dried gas flows through the substrate to be developed after second nozzle ejection.
That is, using developing method described in the embodiment of the present invention, by above-mentioned step, being held in the development of substrate to be developed
Row technical process, developer solution spray phase and water purification spray phase, make the direction of developer solution that nozzle is sprayed or purified water with
The long side direction of sub-pixel unit is parallel on substrate to be developed.
With reference to Fig. 3, using during developing method, developing apparatus includes development chamber 10, cleaning chamber described in the embodiment of the present invention
Room 20 and air-dried chamber 30, wherein by setting drive mechanism between development chamber 10, wash chamber 20 and air-dried chamber 30,
Substrate 100 to be developed can enter development chamber 10, and enter wash chamber 20 from development chamber 10, and from wash chamber 20
Into air-dried chamber 30.Specifically, the drive mechanism can be roller or belt transmissioning mode.
In addition, with reference to Fig. 4, in development chamber 10, wash chamber 20 and air-dried chamber 30, being respectively arranged with relative to water
Plane has the base station 200 of inclination angle theta, and fixed support 300 is arranged at the top of base station 200, and multiple nozzles 400 are equably arranged in
On fixed support 300.In the embodiment of the present invention, using the developing apparatus of developing method described in the embodiment of the present invention, nozzle 400 with
It is connected between fixed support 300 by angle adjustment mechanism, passes through the angle adjustment mechanism so that nozzle 400 sprays aobvious
The direction of shadow spray liquid can be adjusted, the long side direction with the sub-pixel unit of substrate to be developed 100 set on base station 200
It is parallel.
Fig. 5 is using the chamber 10 that in a developing method of the present invention wherein embodiment, develops, wash chamber 20 and air-dried
Set nozzle sprays the schematic diagram in the direction of development spray liquid in chamber 30.According to Fig. 5, it will generally be treated by drive mechanism
Development substrate 100 parallel to the moving direction of long side direction to enter development chamber 10, from developing, chamber 10 is moved to cleaning chamber
Room 20 and move into air-dried chamber 30 from wash chamber 20.
With reference to Fig. 4 and Fig. 5, when the long side direction of sub-pixel unit on substrate 100 to be developed (is also tri- pictures of R, G and B
The long side direction of sub-prime unit) with wait develop substrate 100 long side direction it is parallel when, each chamber inner nozzle spray development spray
The direction for drenching liquid is as follows：
In development chamber 10, when when the substrate 100 that develops is moved on the base station of development chamber 10, control is arranged at base
Nozzle on platform sprays developer solution, and the long side direction for being oriented parallel to sub-pixel unit that developer solution sprays from nozzle；The reality
Apply in example, because the long side direction of sub-pixel unit is parallel with the long side direction of substrate 100 to be developed, and substrate to be developed 100
Moving direction parallel to the long side direction of substrate 100 to be developed, therefore developer solution waits to show from being oriented parallel to of spraying of nozzle
The moving direction of shadow substrate 100.It is preferred that to ensure development effect, developer solution flows through substrate to be developed after nozzle ejection
100, and developer solution is opposite with the moving direction of substrate 100 to be developed from the direction that nozzle sprays.Using which, work as nozzle
Treat development substrate 100 and carry out developer solution spray up to after the first preset duration, by drive mechanism, substrate 100 to be developed by from
Development chamber 10 is moved on the base station of wash chamber 20.
In wash chamber 20, when the substrate to be developed 100 sprayed by developer solution is moved to the base station of wash chamber 20
When upper, the nozzle that control is arranged on base station sprays purified water, and purified water is oriented parallel to sub-pixel list from what nozzle sprayed
The long side direction of member；Identical with the process that developer solution is sprayed in the embodiment, purified water is treated from being oriented parallel to of spraying of nozzle
The moving direction of development substrate 100.It is preferred that to ensure cleaning performance, purified water flows through after nozzle ejection treats developing radical
Plate 100, and purified water is opposite with the moving direction of substrate 100 to be developed from the direction that nozzle sprays.Using which, work as spray
Mouth treats development substrate 100 and carries out purification Water spray up to after the second preset duration, passes through drive mechanism, the quilt of substrate 100 to be developed
It is moved to from wash chamber 20 on the base station of air-dried chamber 30.
In air-dried chamber 30, when the substrate to be developed 100 by purification Water spray is moved to the base station of air-dried chamber 30
When upper, the nozzle that control is arranged on base station, which sprays, air-dries gas.In the embodiment, air-dry direction that air-flow sprays from nozzle and
The moving direction when substrate 100 that develops is moved on base station is parallel.It is preferred that for ensure air-dry effect, air-dry air-flow from
The direction that nozzle sprays with after the moving direction of development substrate 100 on the contrary, and it is to flow through and wait to show to air-dry gas after nozzle ejection
Shadow substrate 100.
Fig. 6 is using in another embodiment of developing method of the present invention, develop chamber 10, wash chamber 20 and air-dried chamber
Set nozzle sprays the schematic diagram in the direction of development spray liquid in room 30.With reference to Fig. 4 and Fig. 6, when on substrate 100 to be developed
Length of the long side direction (being also the long side direction of tri- pixel subelements of R, G and B) of sub-pixel unit with substrate 100 to be developed
When edge direction is perpendicular, the direction that each chamber inner nozzle sprays development spray liquid is as follows：
In development chamber 10, when when the substrate 100 that develops is moved on the base station of development chamber 10, control is arranged at base
Nozzle on platform sprays developer solution, and the long side direction for being oriented parallel to sub-pixel unit that developer solution sprays from nozzle；The reality
Apply in example, because the long side direction of sub-pixel unit is vertical with the long side direction of substrate 100 to be developed, and substrate to be developed 100
Moving direction parallel to the long side direction of substrate 100 to be developed, therefore the direction that sprays from nozzle of developer solution is perpendicular to waiting to show
The moving direction of shadow substrate 100.It is preferred that to ensure development effect, developer solution flows through substrate to be developed after nozzle ejection
100.Using which, after nozzle, which treats development substrate 100, carries out developer solution spray up to the first preset duration, tied by being driven
Structure, substrate 100 to be developed is moved on the base station of wash chamber 20 from development chamber 10.
In wash chamber 20, when the substrate to be developed 100 sprayed by developer solution is moved to the base station of wash chamber 20
When upper, the nozzle that control is arranged on base station sprays purified water, and purified water is oriented parallel to sub-pixel list from what nozzle sprayed
The long side direction of member；Identical with the process that developer solution is sprayed in the embodiment, the direction that purified water is sprayed from nozzle is perpendicular to treating
The moving direction of development substrate 100.It is preferred that to ensure cleaning performance, purified water flows through after nozzle ejection treats developing radical
Plate 100.Using which, after nozzle, which treats development substrate 100, carries out purification Water spray up to the second preset duration, pass through transmission
Structure, substrate 100 to be developed is moved on the base station of air-dried chamber 30 from wash chamber 20.
In air-dried chamber 30, when the substrate to be developed 100 by purification Water spray is moved to the base station of air-dried chamber 30
When upper, the nozzle that control is arranged on base station, which sprays, air-dries gas.In the embodiment, air-dry direction that air-flow sprays from nozzle and
The moving direction when substrate 100 that develops is moved on base station is parallel.It is preferred that for ensure air-dry effect, air-dry air-flow from
The direction that nozzle sprays with after the moving direction of development substrate 100 on the contrary, and it is to flow through and wait to show to air-dry gas after nozzle ejection
Shadow substrate 100.
Fig. 7 be using developing method of the present invention another embodiment in, development chamber 10, wash chamber 20 and air-dry
Set nozzle sprays the schematic diagram in the direction of development spray liquid in chamber 30.With reference to Fig. 4 and Fig. 7, when substrate 100 to be developed
Long side direction (being also the long side direction of tri- pixel subelements of R, G and B) and the substrate 100 to be developed of upper sub-pixel unit
When having angle of inclination ɑ (non-zero degree and 90 degree) between long side direction, each chamber inner nozzle sprays the direction of development spray liquid
It is as follows：
In development chamber 10, when when the substrate 100 that develops is moved on the base station of development chamber 10, control is arranged at base
Nozzle on platform sprays developer solution, and the long side direction for being oriented parallel to sub-pixel unit that developer solution sprays from nozzle；The reality
Apply in example, should due to having angle of inclination ɑ between the long side direction of sub-pixel unit and the long side direction of substrate to be developed 100
Angle of inclination ɑ for it is non-zero degree and 90 degree, but substrate to be developed 100 moving direction parallel to substrate 100 to be developed long side side
To, therefore there is angle ɑ between the direction that is sprayed from nozzle of developer solution and the moving direction of substrate to be developed 100.Moreover, development
Liquid includes the component of second direction from the direction that nozzle sprays, and wherein second direction is the moving direction (of substrate 100 to be developed
One direction) opposite direction.In addition, when angle of inclination ɑ is non-zero spends, developer solution also includes the 3rd from the direction that nozzle sprays
The moving direction of the component in direction, wherein third direction perpendicular to substrate 100 to be developed.
It is preferred that to ensure development effect, developer solution flows through substrate 100 to be developed after nozzle ejection.Using the party
Formula, after nozzle, which treats development substrate 100, carries out developer solution spray up to the first preset duration, by drive mechanism, treats developing radical
Plate 100 is moved on the base station of wash chamber 20 from development chamber 10.
In wash chamber 20, when the substrate to be developed 100 sprayed by developer solution is moved to the base station of wash chamber 20
When upper, the nozzle that control is arranged on base station sprays purified water, and purified water is oriented parallel to sub-pixel list from what nozzle sprayed
The long side direction of member；In the embodiment, identical with the process that developer solution is sprayed, purified water develops from the direction that nozzle sprays with waiting
There is angle ɑ between the moving direction of substrate 100.Moreover, purified water includes the component of second direction from the direction that nozzle sprays,
Wherein second direction is the opposite direction of the moving direction (first direction) of substrate 100 to be developed.In addition, when angle of inclination ɑ is
Non-zero when spending, purified water also includes the component of third direction from the direction that nozzle sprays, and wherein third direction is perpendicular to waiting to develop
The moving direction of substrate 100.
It is preferred that to ensure cleaning performance, purified water flows through substrate 100 to be developed after nozzle ejection.Using the party
Formula, after nozzle, which treats development substrate 100, carries out purification Water spray up to the second preset duration, by drive mechanism, treats developing radical
Plate 100 is moved on the base station of air-dried chamber 30 from wash chamber 20.
In air-dried chamber 30, when the substrate to be developed 100 by purification Water spray is moved to the base station of air-dried chamber 30
When upper, the nozzle that control is arranged on base station, which sprays, air-dries gas.In the embodiment, air-dry direction that air-flow sprays from nozzle and
The moving direction when substrate 100 that develops is moved on base station is parallel.It is preferred that for ensure air-dry effect, air-dry air-flow from
The direction that nozzle sprays with after the moving direction of development substrate 100 on the contrary, and it is to flow through and wait to show to air-dry gas after nozzle ejection
Shadow substrate 100.
Using developing method described in the embodiment of the present invention according to more than, no matter on substrate to be developed sub-pixel unit long side
Which kind of angle direction is relative to the angle between the moving direction of substrate to be developed, and process and water purification spray are sprayed in developer solution
Process, make nozzle spray development spray liquid it is parallel with the long side direction of sub-pixel unit, to ensure that spray liquid flows on substrate
When dynamic can along sub-pixel unit long side direction, and preferably when substrate to be developed sub-pixel unit long side direction
Non-perpendicular to when the moving direction for the substrate that develops, to make the direction that development spray liquid sprays from nozzle include with treating developing radical
The component of the moving direction opposite direction of plate, namely the moving direction of nozzle in face of substrate to be developed carry out developer solution spray, with
Ensure that whole substrate to be developed can receive the spray of developer solution comprehensively.
Using which, because the spray direction of developer solution and purified water is parallel with the long side direction of sub-pixel unit,
Compared to prior art, mobility of the spray liquid on substrate can be more improved；In addition, for the opening of different colored color blockings
Direction can effectively improve color blocking and the flush efficiency of developer solution on substrate there is provided different spray directions, improve high color at present
The development residue problem that domain, high transmittance product are present.
Further, in developing method described in the specific embodiment of the invention, in developer solution spray phase, the development sprayed
Liquid is the potassium hydroxide KOH solution of concentration 3.5% to 5%, it is preferred that can be the potassium hydroxide KOH solution that concentration is 4%.
On the other hand the specific embodiment of the invention also provides a kind of developing apparatus, for above-mentioned developing method, wherein, institute
Stating developing apparatus includes：
First base station, for placing substrate to be developed；
The first jet above first base station is arranged at, providing structure with development spray liquid is connected, wherein described
First jet direction makes the direction of sprayed development spray liquid equal with the long side direction of the sub-pixel unit of substrate to be developed
Capable direction.
Using developing apparatus described in the embodiment of the present invention, compared to prior art, set nozzle sprays the spray of developer solution
Drenching direction can be parallel with the long side direction of the sub-pixel unit of substrate to be developed, to ensure spray liquid on substrate to be developed
During flowing can along sub-pixel unit long side direction, namely along the long side direction of sub-pixel opening on substrate to be developed,
Compared to prior art, mobility of the spray liquid on substrate can be more improved, reaches raising to color blocking on substrate and developer solution
Flush efficiency purpose, there is colored color blocking and developer solution is difficult asking of being cleaned in the developing method for solving prior art
Topic.
In the embodiment of the present invention, it is preferred that first jet is connected by angle adjustment mechanism with fixed support, pass through angle
Degree adjustment structure can adjust the direction of first jet, so that the direction for the development spray liquid that first jet is sprayed is developed with waiting
The parallel direction of the long side direction of the sub-pixel unit of substrate.
In addition, first jet is also connected by lifting adjusting structure with fixed support, it can be adjusted by lift adjustment
First jet to substrate to be developed distance so that development spray liquid can directly flow through after first jet ejection and treat developing radical
Plate, it is to avoid developer solution changes direction after first jet ejection or diffusion flow to substrate to be developed again, is produced to development effect
Harmful effect.
The structural representation of developing apparatus with reference to described in Fig. 3 and Fig. 4 embodiment of the present invention, for placing substrate to be developed
Base station 200 (the first base station) with respect to the horizontal plane has inclination angle theta, and fixed support 300 is arranged at the top of base station 100, multiple sprays
Mouth 400 (first jet) is equably arranged on fixed support 300, and it is preferred that nozzle is sprayed according to Fig. 5 to Fig. 7
Go out the direction schematic diagram of spray liquid of developing, in the top of base station 200, parallel to the first base station, the nozzle of uniform arrangement multiple row divides
Development spray liquid is not sprayed towards the substrate to be developed on base station 200.
In addition, the developing apparatus also includes development chamber, wash chamber and air-dried chamber, and each chamber includes respectively
The base station and nozzle of structure setting shown in Fig. 3.
According to the above, when the first base station and first jet are arranged at development chamber, for spraying during developer solution, the development
Device also includes：
Second base station, for placing substrate to be developed；
The second nozzle above second base station is arranged at, providing structure with purified water is connected, wherein described second
Nozzle direction makes the direction of the sprayed purified water direction parallel with the long side direction of the sub-pixel unit of substrate to be developed.
By the setting of above-mentioned second base station and second nozzle, wash chamber is formed, for by developer solution spray
Substrate to be developed carries out purified water flushing.
It is preferred that the developing apparatus also includes：
3rd base station, for placing substrate to be developed；
The 3rd nozzle above the 3rd base station is arranged at, providing structure with gas is connected, wherein the 3rd spray
Mouth direction makes the direction of sprayed gas parallel with the moving direction when substrate that develops is moved on the 3rd substrate
Direction.
By the setting of above-mentioned 3rd base station and the 3rd nozzle, formed and air-dry chamber, for by purified water flushing
Substrate to be developed carries out air-drying processing.
Using developing apparatus described in the embodiment of the present invention, process and water purification spray process are sprayed in developer solution, passes through angle
Adjust structural adjustment nozzle direction, make nozzle spray develop spray liquid it is parallel with the long side direction of sub-pixel unit, can
Ensure spray liquid when being flowed on substrate can along sub-pixel unit long side direction, and preferably when substrate to be developed
The long side direction of sub-pixel unit be non-perpendicular to wait develop substrate moving direction when, development spray liquid is sprayed from nozzle
Direction include component with the moving direction opposite direction of substrate to be developed, namely nozzle is in face of the mobile side of substrate to be developed
To developer solution spray is carried out, to ensure that whole substrate to be developed can receive the spray of developer solution comprehensively.
According to the course of work more than developing apparatus of the present invention, those skilled in the art, which should be able to understand, to be made
Nozzle carries out the specific setting structure of the angle-regulation structure of angle adjustment, and the structure not improves emphasis for the present invention,
This does not elaborate.
Above-described is the preferred embodiment of the present invention, it should be pointed out that come for the ordinary person of the art
Say, some improvements and modifications can also be made under the premise of principle of the present invention is not departed from, and these improvements and modifications also exist
In protection scope of the present invention.
Claims (12)
1. a kind of developing method, it is characterised in that including：
When the substrate that develops is moved on the first base station, the first jet that control is arranged above the first base station sprays development spray
Liquid；
Direction and the long side of the sub-pixel unit of substrate to be developed that wherein described development spray liquid sprays from the first jet
Direction is parallel, and the development spray liquid flows through the substrate to be developed after first jet ejection.
2. developing method according to claim 1, it is characterised in that when the length of the sub-pixel unit of the substrate to be developed
When edge direction is non-perpendicular to first direction, the development spray liquid includes second direction from the direction that the first jet sprays
Component, wherein the second direction is the opposite direction of the first direction, the first direction is the substrate to be developed
It is moved to direction when on the first base station.
3. developing method according to claim 1, it is characterised in that when a upper process for the substrate to be developed is process
During exposure process processing, the development spray liquid is developer solution；
When the upper process wait the substrate that develops is by developer solution spray process, the development spray liquid is purified water.
4. developing method according to claim 3, it is characterised in that when the development spray liquid is purified water, make setting
First jet above the first base station sprays purified water, purified water the substrate to be developed is rushed Xian reach preset duration it
Afterwards, methods described also includes：
Make by purified water rinse described in substrate to be developed be moved to the second base station for performing air drying process, make to be arranged at
Second nozzle blowout above second base station air-dries gas；
Wherein described air-dried gas is moved on second base station from the direction that the second nozzle sprays with substrate to be developed
When moving direction it is parallel, and the air-dried gas flows through the substrate to be developed after second nozzle ejection.
5. developing method according to claim 3, it is characterised in that the developer solution is the hydrogen-oxygen of concentration 3.5% to 5%
Change potassium KOH solution.
6. developing method according to claim 1, it is characterised in that make to be arranged at the first jet above the first base station
Spray before development spray liquid, methods described also includes：
The substrate to be developed is moved on first base station by drive mechanism.
7. developing method according to claim 1, it is characterised in that make to be arranged at the first jet above the first base station
In the step of spraying development spray liquid, control development spray liquid reaches preset duration to the substrate spray to be developed；
Wherein, the substrate to be developed is rushed after Xian reaches preset duration in control development spray liquid, methods described also includes：
The substrate to be developed is moved to by drive mechanism by the second base station for performing next treatment process.
8. a kind of developing apparatus, for the developing method described in any one of claim 1 to 7, it is characterised in that the development dress
Put including：
First base station, for placing substrate to be developed；
The first jet above first base station is arranged at, providing structure with development spray liquid is connected, wherein described first
Nozzle direction makes the direction of sprayed development spray liquid parallel with the long side direction of the sub-pixel unit of substrate to be developed
Direction.
9. developing apparatus according to claim 8, it is characterised in that the first jet is by angle adjustment mechanism and admittedly
Fixed rack is connected, and the direction of the first jet can be adjusted by the angle adjustment mechanism.
10. developing apparatus according to claim 9, it is characterised in that the first jet also passes through lifting adjusting structure
Be connected with the fixed support, by the lift adjustment can adjust the first jet to the substrate to be developed away from
From.
11. developing apparatus according to claim 8, it is characterised in that the development spray liquid is developer solution；
Wherein described developing apparatus also includes：
Second base station, for placing substrate to be developed；
The second nozzle above second base station is arranged at, providing structure with purified water is connected, wherein the second nozzle
Direction makes the direction of the sprayed purified water direction parallel with the long side direction of the sub-pixel unit of substrate to be developed.
12. developing apparatus according to claim 11, it is characterised in that the developing apparatus also includes：
3rd base station, for placing substrate to be developed；
The 3rd nozzle above the 3rd base station is arranged at, providing structure with gas is connected, wherein the 3rd nozzle court
To making the direction of the sprayed gas side parallel with the moving direction when substrate that develops is moved on the 3rd substrate
To.
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| CN201710630338.9A CN107179655A (en) | 2017-07-28 | 2017-07-28 | A kind of developing method and developing apparatus |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109407387A (en) * | 2018-10-29 | 2019-03-01 | 武汉华星光电技术有限公司 | Developing apparatus and substrate developing method |
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Application publication date: 20170919 |