CN106526908A - Air floatation type support pin device and method - Google Patents
Air floatation type support pin device and method Download PDFInfo
- Publication number
- CN106526908A CN106526908A CN201610767759.1A CN201610767759A CN106526908A CN 106526908 A CN106526908 A CN 106526908A CN 201610767759 A CN201610767759 A CN 201610767759A CN 106526908 A CN106526908 A CN 106526908A
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- Prior art keywords
- support pin
- crystal liquid
- liquid substrate
- color film
- robotic arm
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
Abstract
The invention provides an air floatation type support pin device and method, and relates to a design method for air floatation type support pins, which can overcome defects that the product quality is affected in the prior art. The air floatation type support pin device includes a support plate (2), support pins (4) and a liquid crystal substrate (1), and is characterized in that at least one group of support pins (4) are arranged on the support plate (2); clean compressed air pipes are arranged in the support pins (4); two clamps are arranged on the support plate (2); openings of the two clamps are arranged opposite to each other, and the clamps are clamped on two oppsite edges of a glass substrate; a plurality of air holes are formed in the support pins (4); the clean compressed air pipes pass through at least one group of support pins (4) to provide air flow for the support pins (4); and vent holes corresponding to the air holes are formed in side walls, inside the support pins (4), of the cleaned compressed air pipes. The air floatation type support pin device and method can be applied to the manufacturing field of thin film transistor liquid crystal display.
Description
Technical field
The present invention relates to the manufacturing technology that tft liquid crystal shows, more particularly to a kind of support pin of air floatation type sets
Meter method.
Background technology
Thin Film Transistor-LCD (TFT-LCD) is one kind of most liquid crystal displays, and it uses thin film transistor (TFT)
Technology improves image quality.Although Thin Film Transistor-LCD (TFT-LCD) is collectively referred to as liquid crystal display (LCD), no
It is kind of an active-matrix liquid crystal display (LCD) to cross it.It is used on TV, flat-panel screens and scialyscope.
In the manufacturing technology of existing liquid crystal display, wherein, ultraviolet curing (UV Curing) is one important
Processing procedure, after liquid crystal mixture is filled, needs make liquid crystal complete to match somebody with somebody under the collective effect of ultraviolet and electric field to crystal liquid substrate
To process.
The principle that orientation is carried out by ultraviolet curing is to apply electric field in the upper and lower both sides of crystal liquid substrate, and liquid crystal is adopted
Ultraviolet irradiates, so that the reaction monomers in liquid crystal are moved up and down in the presence of electric field, and in the effect of ultraviolet
Lower generation polyreaction, so as to form both alignment layers on liquid crystal upper and lower base plate, to realize carrying out liquid crystal the effect of orientation.In liquid
In brilliant process of alignment, ultraviolet, electric field and reaction temperature are three very important factors.
It is in order to realize uniformity that ultraviolet is irradiated to crystal liquid substrate, many by the way of thimble supporting substrate at present, such as
Shown in Fig. 1 and Fig. 2, a kind of crystal liquid substrate orientation equipment schematic diagram of the prior art is shown.Wherein, the crystal liquid substrate orientation
Equipment supports crystal liquid substrate 1 by multiple rows of thimble 13, and wherein, multiple rows of top assorted 13 is connected with the viewing area 10 of crystal liquid substrate 1
Touch；Additionally by the conducting probe 14 pairs positioned at 1 two ends of crystal liquid substrate, the crystal liquid substrate 1 applies electric field.But, this existing
In technology, as thimble can not reach completely insulation effect, therefore the orientation produced due to the contact of thimble is easily produced not
Uniform situation.
In order to reduce this uneven situation, in some versions, by the quantity of reduction thimble 13, or make thimble
13 positions contacted with crystal liquid substrate 1 avoid viewing area 10.
As shown in figure 3, showing another kind of crystal liquid substrate orientation equipment schematic diagram of the prior art.This existing
In technology, the quantity of thimble 13 is substantially reduce the number.But, in this prior art, due to the reduction of thimble quantity, can go out again
Existing crystal liquid substrate produces the situation of bending (bending), due to generating bending, may result in conducting probe and crystal liquid substrate
Loose contact (as shown in the B in Fig. 3), so that the voltage outside applying to crystal liquid substrate is that loose contact occur, so as to
Orientation is caused to occur abnormal.In addition, crystal liquid substrate occur deformation where, can also produce its reception ultraviolet quantity with
The quantity of the ultraviolet received by other normal regions is different, generally where there is deformation, its ultraviolet for being received
Quantity can more lower (see shown in the A in Fig. 3), can so cause each region orientation speed difference, so as to produce orientation
It is uneven.
As shown in figure 4, showing another kind of crystal liquid substrate orientation equipment schematic diagram of the prior art.In this orientation
In equipment, its thimble 13 can be with alternating movement, to support crystal liquid substrate 1.Thimble 14 can so be reduced with crystal liquid substrate 1 same
The time of contact of one position, as thimble 14 and crystal liquid substrate 1 inevitably need to contact, therefore existing this technology can only
The appearance of the uneven situation of orientation is reduced, but the appearance of the uneven situation of orientation can not be avoided completely.
A kind of orientation equipment of existing air-flotation type crystal liquid substrate, including heating platform 2, is provided with multiple pores 7, gas
Hole 7 is used for delivery temperature uniformly and hot blast vertically upward；Bracing frame 3, is arranged at the surrounding of heating platform 2, for supporting simultaneously
The crystal liquid substrate 1 of orientation is treated in clamping, is further provided with the machine for carrying out permutation positioning to crystal liquid substrate 1 on bracing frame 3
Structure, and the clamping device 6 gripped by crystal liquid substrate 1；Multiple support pins 4, are uniformly arranged on heating platform 2
In, which can be moved about 3 in the same direction with bracing frame, support the bottom of crystal liquid substrate 1 at least part time；Wherein, pore 7
Jet amount is gradually decreased from 2 center of heating platform to 2 edge of heating platform；Further, also include supporting for driving respectively
Frame and the drive mechanism of support pin motion.Wherein, heating platform 2 includes：Zone of heating 8, for realizing carrying out heating platform
Heating, in one embodiment, zone of heating is the electric heating layer using Muscovitum as dielectric；First heat transfer layer 9, positioned at plus
On thermosphere 8；Second heat transfer layer 11, under zone of heating 8；Wherein, it is further provided with gas in the first heat transfer layer 9 to lead to
Road 12, gas passage 12 are formed with multiple pores 7 on 9 surface of the first heat transfer layer, wherein, the air pump of the gas passage 12 and outside
(not shown), before the gas of outside air pump carries out gas passage 12 can such as be filtered and be preheated, wherein, the
The quantity of the pore 12 set by one heat transfer layer, 9 centre position and/or size ratio are set by 9 marginal position of the first heat transfer layer
The quantity and/or size of pore 12 is big.First heat transfer layer 9 and the second heat transfer layer 11 can be using the excellent materials of heat conductivility
(such as aluminum or aluminum alloy), being capable of uniform conductive heat energy；Black can be formed with Jing anodisings in 9 upper surface of the first heat transfer layer
Or compared with dark colour, the heat energy of zone of heating 8 can be made to be converted into infrared ray, the infrared ray by 1 sorption enhanced of crystal liquid substrate can be
Heat energy is to heat crystal liquid substrate 1, above-mentioned anodising, while may also operate as protecting the surface of the first heat transfer layer 9, to prevent
Cracking produces gap；Zone of heating 8 and the temperature control of outside air pump, make from pore 7 temperature of the hot blast for vertically spraying upwards begin
Between being in 50 ± 5 DEG C eventually.In addition, probe 5 is provided with the first heat transfer layer 9, for positioning to crystal liquid substrate 1.Under
Face, further in conjunction with Fig. 5 to Fig. 8, further illustrates the idiographic flow of the alignment method of the air-flotation type crystal liquid substrate of present invention offer,
The alignment method of the air-flotation type crystal liquid substrate comprises the steps：First, crystal liquid substrate is positioned over into bracing frame and support pin
On, bracing frame is positioned to crystal liquid substrate and is gripped；Generally need to carry to enter in an orientation room by crystal liquid substrate
Row orientation is processed, and the orientation room needs to keep a relatively more fixed temperature (such as 50 DEG C or so), and carrying crystal liquid substrate can be with
Completed by the equipment of such as mechanical hand.Then, bracing frame and support pin move down the first distance, so that heating
The heat of platform more effectively passes to crystal liquid substrate, and in one embodiment, first distance can be 0.1-50mm.So
Afterwards, the uniform hot blast of temperature is vertically sprayed upwards by multiple pores on heating platform surface, make crystal liquid substrate suspend and distance
One predetermined altitude of support pin, drives support pin to move down second distance, and probe is increased and support under crystal liquid substrate
Portion, wherein, by the setting of the quantity and size of pore, can control the jet amount of pore from heating platform center to heating
Platform edges are gradually decreased, in one embodiment, the temperature of the hot blast that multiple pores vertically spray upwards in 50 ± 5 DEG C it
Between, and second distance can be 0.1-5mm, predetermined altitude can be 0.1～1mm；To crystal liquid substrate applied voltage, and apply purple
UV light, carries out process of alignment；After the completion of orientation, unclamp probe, and make support pin move up second distance, it is multiple
Pore stops spraying hot blast driving bracing frame and support pin moves up the first distance, and removes crystal liquid substrate.
To sum up, existing support pin (OVEN PIN) the problems in the design needs to improve：
Due to existing glass substrate, in oven (Oven) interior baking, support pin is directly connect with crystal liquid substrate (Glass)
Touch, then the position for contacting occurs that display brightness is uneven, cause the risk of various vestiges (PIN Mura), and a support
Pin (OVEN PIN) and gripper shoe (PIN) position fix immutable, it is impossible to which guarantee is bright for display occurs in different product
Degree is uneven, causes the position of various vestiges (PIN Mura) the just area where support pin is contacted with crystal liquid substrate, from
And affect product quality.
The content of the invention
For above-mentioned the problems of the prior art, present applicant proposes a kind of support pin device and method of air floatation type.
A kind of support pin device of air floatation type includes gripper shoe, support pin and crystal liquid substrate, it is characterised in that PIN
It is provided with plate in least one set support pin, support pin and clean compressed air pipe (CDA) pipe is installed；
Two clips are set above the gripper shoe, and the mouth of two clips is oppositely arranged, and it is relative that clip is clipped in glass substrate
On two sides answered；
Multiple pores are provided with the support pin；Clean compressed air pipe (CDA) pipe is through least one set support
Pin, provides air-flow for support pin, wherein clean compressed air pipe (CDA) pipe on the side wall inside support pin with institute
State the corresponding passage of pore；
The crystal liquid substrate is located above support pin.
A kind of support pin method detailed process of air floatation type is：
Glass substrate is sent into color film oven by step one, robotic arm contact glass substrate；
On step 2, the clip that glass substrate is placed in color film oven；
Step 3, clean compressed air pipe (CDA) pipe opened in support pin pipe, provide gas for support pin pipe
Stream, is suspended in the glass substrate on the clip in color film oven above support pin using air-flow；
Step 4, robotic arm vacuum breaker, make glass substrate in non-vacuum, and robotic arm exits color film baking
Stove；
Step 5, color film oven start to toast glass substrate, and after baking terminates, robotic arm enters color film oven and connects
Contact glass substrate；
Step 6, clean compressed air pipe (CDA) pipe closed in support pin pipe；
Step 7, the upper piece of clip are moved along lower piece opposite direction, unclamp glass substrate, and robotic arm takes out glass base
Plate.
Above-mentioned technical characteristic can be combined in any suitable manner or be substituted by equivalent technical characteristic, as long as can reach
To the purpose of the present invention.
Beneficial effects of the present invention are：
Keep former support pin (OVEN PIN) and gripper shoe (PIN) position constant, in support pin (OVEN PIN)
Exotic material clean compressed air pipe (CDA) pipeline is accessed, former gripper shoe (PIN) is designed to into gas flow tube shown in top right plot
Road, after glass substrate enters oven (Oven), clean compressed air pipe (CDA) is opened, using air-flow by crystal liquid substrate
(Glass) it is suspended in above support pin (OVEN PIN), so as to avoid gripper shoe (PIN) with crystal liquid substrate (Glass)
Contact, prevents display brightness uneven, causes the generation of various vestiges (PIN Mura).
A pair of double rollers (Double roller) are respectively added at crystal liquid substrate (Glass) fore-and-aft direction edge, works as glass substrate
(Glass), after entering oven (Oven Chamber), crystal liquid substrate (Glass) marginal zone falls on lower roller (roller),
Then upper roller (roller) Y-direction is moved down, so that double roller (Double roller) clamps crystal liquid substrate (Glass), is reached
The purpose for preventing crystal liquid substrate (Glass) from drifting about.
The embodiment of the present invention provides a kind of OVEN PIN device and methods of air floatation type, by air-flow by crystal liquid substrate
(Glass) be suspended in above support pin (OVEN PIN), do not contact with any material, so as to avoid gripper shoe (PIN) with
The contact of crystal liquid substrate (Glass), prevents display brightness uneven, causes the generation of various vestiges (PIN Mura).
And, in the embodiment of the present invention, the jet amount of pore is from the heating platform center to the heating platform edge
Gradually decrease, it is ensured that crystal liquid substrate stably can be suspended in above heating platform in whole process of alignment.
Description of the drawings
Hereinafter the present invention will be described in more detail based on embodiment refer to the attached drawing.Wherein：
Fig. 1 is a kind of structure longitudinal section of the orientation equipment of existing crystal liquid substrate；
Fig. 2 is the elevational schematic view in Fig. 1；
Fig. 3 is the arrangement works schematic diagram of the orientation equipment of existing another kind of crystal liquid substrate；
Fig. 4 is the arrangement works schematic diagram of the orientation equipment of existing another crystal liquid substrate；
Fig. 5 is a kind of orientation equipment first state structural representation of air-flotation type crystal liquid substrate of prior art；
Fig. 6 is a kind of orientation equipment the second status architecture schematic diagram of air-flotation type crystal liquid substrate of prior art；
Fig. 7 is a kind of orientation equipment third state structural representation of air-flotation type crystal liquid substrate of prior art；
Fig. 8 is the structural representation of heating platform in a kind of orientation equipment of air-flotation type crystal liquid substrate of prior art；
Fig. 9 is support pin (OVEN PIN) schematic device for being provided with clean compressed air pipe (CDA)；OVENPIN
For support pin；
Figure 10 is support pin (OVEN PIN) the device pictorial diagram for being provided with clean compressed air pipe (CDA).
In the accompanying drawings, identical part uses identical reference.Accompanying drawing is not according to actual ratio.
Specific embodiment
Below in conjunction with accompanying drawing, the invention will be further described.
Specific embodiment one：With reference to Fig. 9, the stupid embodiment of 10 explanations, a kind of support of air floatation type of present embodiment
Push pin device includes gripper shoe (PIN) 2, support pin 4 and crystal liquid substrate 1, it is characterised in that be provided with gripper shoe (PIN) 2
Least one set support pin 4, installs clean compressed air pipe (CDA) in support pin 4；
Two clips are set above gripper shoe (PIN) 2, and the mouth of two clips is oppositely arranged, and clip is clipped in glass base
On two corresponding sides of plate；
Multiple pores are provided with the support pin 4；Clean compressed air pipe (CDA) passes through least one set support pin
4, be support pin 4 provide air-flow, wherein clean compressed air pipe (CDA) on the side wall inside support pin 4 with institute
State the corresponding passage of pore；
The crystal liquid substrate 1 is located above support pin 4, and 4 air-flow of support pin is for hanging by glass plate.
Keep former gripper shoe (PIN) and 4 position of support pin constant, exotic material is accessed in gripper shoe (PIN) clean
Former support pin 4 is designed to airflow pipeline shown in top right plot by pure compression air hose (CDA) pipeline, when glass substrate enters roasting
Open afterwards by clean compressed air pipe (CDA) for stove (Oven), and glass substrate is suspended in support pin (OVEN PIN) using air-flow
Top, so as to avoid contact of the support pin (OVEN PIN) with glass substrate, prevents display brightness uneven, causes each
Plant the generation of vestige (PIN Mura).
A pair of double rollers (Double roller) are added respectively at glass substrate fore-and-aft direction edge, when glass substrate enters roasting
After stove (Oven Chamber), glass substrate edge area falls on lower roller (roller), then upper roller (roller) Y-direction
Move down, so that double roller (Double roller) clamps glass substrate, reach the purpose for preventing glass substrate from drifting about.
Specific embodiment two：Present embodiment from unlike specific embodiment one, a kind of air floatation type
Support needle device also includes bracing frame 3；Support frame as described above 3 is arranged at the surrounding of the gripper shoe (PIN) 2, for supporting and pressing from both sides
Hold crystal liquid substrate 1；
Support frame as described above 3 is moved about 4 in the same direction with support pin；
The CDA pipes are clean compressed air pipe (clean dried air)；
The clean compressed air Guan Youyi bars main road and at least one branch road.
Specific embodiment three：Present embodiment from unlike specific embodiment one or two, gripper shoe (PIN)
For heating platform, multiple pores 7 on heating platform, are provided with, the pore is used for delivery temperature uniformly and heat vertically upward
Wind；The jet amount of pore 7 is gradually decreased from the heating platform center to the heating platform edge；
, with the pore vertical with bus, gripper shoe (PIN) is with vertical with bus for clean compressed air pipe (CDA) pipe
Straight pore.
The heating platform includes：
Zone of heating 8, for realizing heating the heating platform；
First heat transfer layer 9, on the zone of heating 8；
Second heat transfer layer 11, under the zone of heating 8；
Wherein, gas passage is further provided with first heat transfer layer 9, and the gas passage is in the described first heat transfer
9 surface of layer are formed with the plurality of pore 7.First heat transfer layer, 9 upper surface Jing anodisings, form black or deeper face
Color, so that the heat energy of the zone of heating 8 is converted into infrared ray.
The zone of heating 8 is the electric heating layer 8 using Muscovitum as dielectric.
The mechanism for carrying out permutation positioning to the crystal liquid substrate 1 is further provided with support frame as described above 3, and it is right
The clamping device 6 gripped by crystal liquid substrate 1.
Probe 5 is provided with first heat transfer layer 9, for positioning to the crystal liquid substrate 1.
Further include the drive mechanism for driving support frame as described above 3 and the motion of support pin 4 respectively.
Comprise the steps：
Crystal liquid substrate 1 is positioned on bracing frame 3 and support pin 4,3 pairs of crystal liquid substrates of support frame as described above 1 are carried out
Position and grip；
Support frame as described above 3 and the support pin 4 move down the first distance；
The uniform hot blast of temperature is vertically sprayed upwards by multiple pores 7 on heating platform surface, makes the crystal liquid substrate 1
Suspend and apart from 4 one predetermined altitude of the support pin, drive the support pin 4 to move down second distance, and make probe 5
The bottom of the crystal liquid substrate 1 is supported in rising；
To 1 applied voltage of the crystal liquid substrate, and apply ultraviolet light, carry out process of alignment；
After the completion of orientation, unclamp the probe 5, and make support pin 4 move up second distance, the plurality of gas
Hole 7 stops spraying hot blast；
Drive support frame as described above 3 and the support pin 4 to move up the first distance, and remove the crystal liquid substrate 1.
The jet amount for controlling the pore 7 is gradually decreased from the heating platform center to the heating platform edge, and
Make the crystal liquid substrate 1 suspend and apart from the support pin 4 predetermined altitude be 0.1～1mm.
Between the temperature of the hot blast that the plurality of pore 7 vertically sprays upwards is in 50 ± 5 DEG C.
Specific embodiment four：Unlike one of present embodiment and specific embodiment one to three, a kind of gas
The support pin equipment of floating type also includes the drive mechanism for driving clip to move.
Specific embodiment five：A kind of support pin method detailed process of air floatation type of present embodiment is：
Glass substrate is sent into color film oven (CF OVEN) by step one, robotic arm contact glass substrate；
Step 2, for prevent glass substrate occur in resuspension procedure drift, glass substrate is placed in into color film oven (CF
OVEN on the clip in)；
Step 3, the clean compressed air pipe (CDA) opened in support pin (OVEN PIN) 4, are support pin
(OVEN PIN) 4 provides air-flow, is suspended in the glass substrate on the clip in color film oven (CF OVEN) using air-flow and props up
Above support pin (OVEN PIN) support pin 4；So as to avoid gripper shoe (PIN) contact with crystal liquid substrate (Glass), prevent
Only display brightness is uneven, causes the generation of various vestiges (PIN Mura).
Step 4, robotic arm vacuum breaker, make glass substrate in non-vacuum, and robotic arm exits color film baking
Stove；
Machine (robot) is by way of inhaling vacuum pressure, crystal liquid substrate (Glass) (1) is adsorbed in machine
(robot) on arm, so the meaning of vacuum breaker is exactly to destroy between machine (robot) arm and crystal liquid substrate (Glass) (1)
Vacuum (air pressure) effect, make crystal liquid substrate (Glass) (1) in non-vacuum, so as to machine (robot) arm can just be moved back
Behave excellently film oven (CF OVEN).
Step 5, color film oven (CF OVEN) start to toast glass substrate, and after baking terminates, robotic arm enters color
Film oven (CF OVEN) contacts glass substrate；
Step 6, the clean compressed air pipe (CDA) closed in support pin (OVEN PIN) 4；
Step 7, the upper piece of clip are moved along lower piece opposite direction, unclamp crystal liquid substrate 1, and robotic arm takes out liquid crystal
Substrate (Glass) 1；
Color film oven, is mainly responsible for carrying out the baking of color film (CF) glass substrate.Toasting maximum purpose is exactly：To pass through
Photoresistance after development, by the mode that heat energy evaporates, by the solvent (Solvent) remained in photoresistance, minimizes state, to reach
Into the purpose of color film film forming.
Specific embodiment six：Unlike one of present embodiment and specific embodiment one to five, the step one
Middle robotic arm contacts glass substrate, and glass substrate is sent into color film oven；Detailed process is：
Robotic arm contacts glass substrate, starts to inhale vacuum, glass substrate is adsorbed in robotic arm by vacuum pressure
On, glass substrate is sent into color film oven by robotic arm.
Specific embodiment seven：Unlike one of present embodiment and specific embodiment one to six, the step 2
In for prevent glass substrate occurs in resuspension procedure drift about, the folder that glass substrate is placed in color film oven (CF OVEN)
On son；Detailed process is：
Clip in the color film oven includes piece and a lower piece, for preventing glass substrate from sending out in resuspension procedure
Raw drift, two glass substrate corresponding sides are placed on lower piece of clip, by upper piece of clip along lower piece direction
Move to glass substrate, until clip props up piece up and down and clamps glass substrate.
Specific embodiment eight：Unlike one of present embodiment and specific embodiment one to seven, the clip is solid
It is scheduled in color film oven, and is located above support pin (OVEN PIN) 4.
Specific embodiment nine：Unlike one of present embodiment and specific embodiment one to eight, the step 5
Film oven (CF OVEN) of prizing starts to toast glass substrate, and after baking terminates, robotic arm enters color film oven (CF
OVEN) contact glass substrate；Detailed process is：
Color film oven starts to toast glass substrate, and after baking terminates, robotic arm enters color film oven contact glass
Substrate, robotic arm start to inhale vacuum, glass substrate is adsorbed on robotic arm by vacuum pressure；That is this when
Wait and there is vacuum action between device (robot) arm and crystal liquid substrate (Glass).
Air pipe line is set inside the robotic arm, for controlling robotic arm vacuum breaker and inhaling vacuum, is dried with color film
Oven (CF OVEN) air pressure onrelevant.
Although describing the present invention herein with reference to specific embodiment, it should be understood that, these realities
Apply the example that example is only principles and applications.It should therefore be understood that can carry out to exemplary embodiment
Many modifications, and other arrangements are can be designed that, the spirit of the present invention limited without departing from claims
And scope.It should be understood that can be by way of different from described by original claim come with reference to different appurtenances
Profit is required and feature specifically described herein.It will also be appreciated that the feature with reference to described by separate embodiments can be used
In other described embodiments.
Claims (9)
1. the support pin device of a kind of air floatation type, which includes gripper shoe (2), support pin (4) and crystal liquid substrate (1), and which is special
Levy and be：It is provided with gripper shoe (2) in least one set support pin (4), support pin (4) and clean compressed air pipe is installed；
Two clips are set above gripper shoe (2), and the mouth of two clips is oppositely arranged, and it is corresponding that clip is clipped in glass substrate
Two sides on；
Multiple pores are provided with support pin (4)；Clean compressed air pipe pipe passes through least one set support pin (4),
There is provided air-flow for support pin (4), wherein clean compressed air pipe on the internal side wall of support pin (4) with the gas
The corresponding passage in hole；
Described crystal liquid substrate (1) is located above support pin (4).
2. the support pin device of air floatation type according to claim 1, it is characterised in that：Also include bracing frame (3), it is described
Bracing frame (3) is arranged at the surrounding of the gripper shoe (2), for supporting and clamping crystal liquid substrate (1)；
Support frame as described above (3) is moved up and down in the same direction with support pin (4)；
The clean compressed air Guan Youyi bars main road and at least one branch road.
3. the support pin device of air floatation type according to claim 2, it is characterised in that：Described gripper shoe (2) are heating
Platform, is provided with multiple pores (7) on heating platform, the pore is used for delivery temperature uniformly and hot blast vertically upward；Gas
The jet amount in hole (7) is gradually decreased from the heating platform center to the heating platform edge；
, with the pore vertical with bus, gripper shoe (2) is with the pore vertical with bus for the clean compressed air pipe.
4. the support pin device of air floatation type according to claim 3, it is characterised in that：Also include for driving clip to transport
Dynamic drive mechanism.
5. a kind of support pin method of the air floatation type of the support pin device of the air floatation type being applied to described in claim 1, its
It is characterised by：The support pin method detailed process of the air floatation type is：
Crystal liquid substrate (1) is sent into color film oven by step one, robotic arm contact crystal liquid substrate (1)；
On step 2, the clip that crystal liquid substrate (1) is placed in color film oven；
Step 3, the clean compressed air pipe opened in support pin (4) pipe, are that support pin (4) provides air-flow, utilize
Air-flow is suspended in the crystal liquid substrate (1) on the clip in color film oven above support pin (4)；
Step 4, robotic arm vacuum breaker, make crystal liquid substrate (1) in non-vacuum, and robotic arm exits color film oven；
Step 5, color film oven start to toast crystal liquid substrate (1), and after baking terminates, robotic arm enters color film oven and connects
Tactile crystal liquid substrate (1)；
Step 6, the clean compressed air pipe closed in support pin (4) pipe；
Step 7, the upper piece of clip are moved along lower piece opposite direction, unclamp crystal liquid substrate (1), and robotic arm takes out liquid crystal base
Plate (1).
6. the support pin method of air floatation type according to claim 5, it is characterised in that：Robotic arm in the step one
Crystal liquid substrate (1) is sent into color film oven by contact crystal liquid substrate (1)；Detailed process is：
Robotic arm contact crystal liquid substrate (1), starts to inhale vacuum, crystal liquid substrate (1) is adsorbed in robot arm by vacuum pressure
On arm, crystal liquid substrate (1) is sent into color film oven by robotic arm.
7. the support pin method of air floatation type according to claim 6, it is characterised in that：By liquid crystal base in the step 2
On the clip that plate (1) is placed in color film oven；Detailed process is：
Clip in the color film oven includes piece and a lower piece, and two crystal liquid substrate (1) corresponding sides are placed in
On lower piece of clip, the upper piece of clip is moved to crystal liquid substrate (1) along lower piece direction, until clip props up piece folder up and down
Firmly crystal liquid substrate (1).
8. the support pin method of air floatation type according to claim 7, it is characterised in that：The clip is fixed on color film and dries
In oven, and it is located above support pin (4) pipe.
9. the support pin method of air floatation type according to claim 8, it is characterised in that：The step 5 prize film baking
Stove starts to toast crystal liquid substrate (1), and after baking terminates, robotic arm enters color film oven contact crystal liquid substrate (1)；Concrete mistake
Cheng Wei：
Color film oven starts to toast crystal liquid substrate (1), and after baking terminates, robotic arm enters color film oven contact liquid crystal base
Plate (1), robotic arm start to inhale vacuum, crystal liquid substrate (1) is adsorbed on robotic arm by vacuum pressure；The robot arm
Air pipe line is set inside arm, for controlling robotic arm vacuum breaker and inhaling vacuum.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610767759.1A CN106526908A (en) | 2016-08-30 | 2016-08-30 | Air floatation type support pin device and method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610767759.1A CN106526908A (en) | 2016-08-30 | 2016-08-30 | Air floatation type support pin device and method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106526908A true CN106526908A (en) | 2017-03-22 |
Family
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| Application Number | Title | Priority Date | Filing Date |
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| CN201610767759.1A Pending CN106526908A (en) | 2016-08-30 | 2016-08-30 | Air floatation type support pin device and method |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107193142A (en) * | 2017-07-19 | 2017-09-22 | 武汉华星光电技术有限公司 | Alignment film cure system |
| CN108034929A (en) * | 2017-12-27 | 2018-05-15 | 深圳市华星光电技术有限公司 | A kind of substrate bearing device applied to vacuum sputtering equipment |
| CN108946133A (en) * | 2018-05-24 | 2018-12-07 | 武汉华星光电技术有限公司 | The limit thimble and arranging-in-row device of arranging-in-row device |
| CN110006228A (en) * | 2019-04-19 | 2019-07-12 | 武汉华星光电半导体显示技术有限公司 | A kind of oven and baking furnace operation method |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107193142A (en) * | 2017-07-19 | 2017-09-22 | 武汉华星光电技术有限公司 | Alignment film cure system |
| CN108034929A (en) * | 2017-12-27 | 2018-05-15 | 深圳市华星光电技术有限公司 | A kind of substrate bearing device applied to vacuum sputtering equipment |
| CN108946133A (en) * | 2018-05-24 | 2018-12-07 | 武汉华星光电技术有限公司 | The limit thimble and arranging-in-row device of arranging-in-row device |
| CN110006228A (en) * | 2019-04-19 | 2019-07-12 | 武汉华星光电半导体显示技术有限公司 | A kind of oven and baking furnace operation method |
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Application publication date: 20170322 |