CN107177824B - Decorative coating prepared on stainless steel substrate based on magnetron co-sputtering technology - Google Patents
Decorative coating prepared on stainless steel substrate based on magnetron co-sputtering technology Download PDFInfo
- Publication number
- CN107177824B CN107177824B CN201710343167.1A CN201710343167A CN107177824B CN 107177824 B CN107177824 B CN 107177824B CN 201710343167 A CN201710343167 A CN 201710343167A CN 107177824 B CN107177824 B CN 107177824B
- Authority
- CN
- China
- Prior art keywords
- coating
- stainless steel
- compound
- magnetron
- decorative
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0015—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterized by the colour of the layer
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0641—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Abstract
A decorative coating produced on a stainless steel substrate based on the magnetron co-sputtering technique, the film system of the decorative coating comprising one to several compound coatings, each compound coating consisting of a silicon-chromium alloy partially to totally reacted with nitrogen N. The decorative coating film system is suitable for coating a large-area decorative coating on a stainless steel strip or a stainless steel sheet, the coating material is suitable for being combined with a stainless steel base material, the stainless steel base material has inert corrosion resistance protection, and lower electrochemical potential differences are formed between elements of the coating material and alloy elements of the stainless steel base material, so that electrochemical corrosion can be prevented; has a higher surface hardness; excellent adhesion to substrate materials; a wide variety of different colors can be obtained.
Description
Technical Field
The invention relates to a vacuum coating decorative coating, in particular to a decorative coating prepared on a stainless steel substrate based on a magnetron co-sputtering technology.
Background
Decorative coatings are widely used in everyday life. The coating not only improves the appearance and the environmental comfort in the use of product design and architectural design, but also has other functional characteristics, such as: increasing wear resistance and corrosion resistance. The traditional decorative coating method is painting and lacquering. In the decorative coating method for industrial application, the powder coating coloring process is more advantageous and dominant, and has good performance and desirable color. However, in the case of a metallic coating, the metallic luster is masked by the thicker coating layer. Thicker coatings also require higher raw material consumption than an ideal thin coating.
One relatively mature process for applying relatively thin decorative coatings to metal sheets or strips is to use anodized aluminum that is adjacently dyed and sealed. One approach to this has been described in US 3079309A, 1963, to clean aluminium workpieces and then subject them to pre-treatments such as: and (5) carrying out chemical etching treatment. It may also optionally be brightened, for example: the blank is subjected to an electrolytic polishing treatment before being immersed in an electrolyte solution for anodic oxidation treatment. The anodic oxidation layer directly subjected to anodic oxidation treatment is porous and can adsorb a colored dye solution. There are many dyeing processes that are relatively close to the currently known anodizing processes, such as: dyeing with electrolyte in an electrolytic bath with alternating current or dipping in dye solution with the solution temperature raised to boiling point. After dyeing, a sealing process is applied to close the pores on the anodized layer while some of the dye is still captured and adsorbed to the interior of the anodized layer. All of the above described process steps involve the use of liquid solutions and therefore wastewater treatment is necessary. For example: neutralization of the plating solution, such as sulfuric acid or alkali, as well as salt precipitates and dye particles, is necessary.
Another common industrial method of applying relatively thin decorative coatings to metals is dip coating, in which the workpiece is immersed in an aqueous solution to impart corrosion resistance and a decorative color to the metal surface. The inventors of the method have noted environmental problems from US 4631093 a in 1984. He invented a chromate free dipping solution such as: hexavalent and trivalent chromium oxides present a toxic and polluting hazard, but after the use of dipping solutions, they still require the necessary treatment before disposal.
PVD coatings have similar advantages to dyed products compared to powder coating coloring or painting processes. It can maintain the luster of the metal while applying a variety of different colors. Therefore, compared with the coating coloring or painting process, the PVD process can deposit a very thin film coating and use much less raw material for the film deposition. One characteristic of coatings applied by PVD processes is that the coatings do not use any chemical liquids such as staining solutions or electrolytes during the growth process. The coating material is directly converted to the vapor phase in a high vacuum environment prior to deposition on the substrate. Therefore, for the above-mentioned coating technology, the PVD coating technology is a 100% green and environmental-friendly and pollution-free alternative technology.
PVD applications of decorative coatings have been described in several patents. In 1986, U.S. Pat. No. 8, 4758280A describes a method for coating a carbooxynitride of an alloy of titanium (Ti), zirconium (Zr) and hafnium (Hf) by cathodic sputtering. A decorative black abrasion resistant protective film layer is deposited onto the substrate. US 7270895B 2 in 2005 and US 20030072974 a1 in 2001 describe the preparation of metal oxycarbonitride coatings using heat and refractory metals such as: hafnium (Hf), tantalum (Ta), zirconium (Zr), titanium (Ti), etc. as the plating material. The above-mentioned heat-resistant and refractory metals may also be enriched with aluminum (Al). The PVD coating method can be evaporation, sputtering or arc plating. The coatings tend to have mechanical wear resistance similar to those of titanium nitride (TiN), titanium carbonitride (TiCN), zirconium nitride (ZrN) and zirconium carbonitride (ZrCN), but have a wider variety of possible colors. The composition of the metal to metal oxycarbonitride can be adjusted by the addition of a process gas. Adding nitrogen N2And oxygen O2To form nitrogen oxides, for example methane or acetylene may be used in order to form carbides. To be able to enrich the aluminum, this is usually achieved by adding aluminum to the target material. Also in patent US 20030072974A 1Describes a method for obtaining (Zr: Al) C by arc deposition and sputtering deposition in a process chamber simultaneouslyXOYNZA method of mixing. The different CIELAB color values can be obtained by adjusting the fraction of aluminum in one of the heat-resistant and refractory metals and/or by adjusting the CxOyNzThe composition of the mixture and the amount of the process gas introduced are adjusted.
As described above, (Zr: Al) CXOYNZThe coating can provide an excellent coating with a very high hardness and good corrosion stability. But this application is not so advantageous for large area coating. Large area coating requires low material consumption and a scalable process, but it is equally possible to provide a continuous coating process, such as a continuous roll-to-roll metal strip coating process.
Disclosure of Invention
The invention uses the existing (Zr: Al) CXOYNZThe coating is used as a base to provide a decorative coating, and the decorative coating film is suitable for coating a large-area decorative coating on a stainless steel strip or a stainless steel sheet.
The invention adopts the following technical scheme:
a decorative coating produced on a stainless steel substrate based on the magnetron co-sputtering technique, the film system of the decorative coating comprising one to several compound coatings, each compound coating consisting of a silicon-chromium alloy partially to totally reacted with nitrogen N.
Coating of the formula (Si: Cr) N per compoundX(Si: Cr) is the ratio between silicon Si and chromium Cr, this ratio being dominated by pure silicon Si (100% Si: 0% Cr) or by pure chromium Cr (0% Si: 100% Cr) or a mixture of any ratio between the two; the index X is described in Nx as the reaction coefficient with nitrogen N, which can vary between X =0 and X =1, where X =0 refers to 0% nitrogen reaction and X =1 refers to 100% nitrogen reaction or a mixture in nominal stoichiometry.
A subset of the film systems comprises 1 to n single compound coatings, n being a non-specified integer describing the number of compound coatings applied, each compound coating requiring a different composition from the underlying and/or overlying compound coatings, a different mixing ratio of silicon to chromium (Si: Cr) or a different reaction coefficient X or both.
The coating thickness of each single compound coating varied between 5nm and 300 nm.
An optional adhesion layer is applied under the subset of the film series comprising 1 to n single compound coatings and is comprised of metallic chromium Cr.
The coating thickness of the adhesion layer AL is between 20nm and 30 nm.
An optional dielectric layer is applied over the subset of the film series containing 1 to n single compound coatings.
The coating thickness of the optional dielectric layer DL varies between 5nm and 300 nm.
From the above description of the structure of the present invention, compared with the prior art, the present invention has the following advantages:
1. the decorative coating film is suitable for coating a large-area decorative coating on a stainless steel strip or a stainless steel sheet, the coating material is suitable for being combined with a stainless steel base material, the stainless steel base material has inert corrosion resistance protection, and lower electrochemical potential differences exist between the coating material elements and alloy elements of the stainless steel base material, so that electrochemical corrosion can be prevented, for example: electrochemical corrosion caused by a salt mist gas atmosphere.
2. The coating film system has high surface hardness, and special pencil hardness tests are carried out on coating film samples according to ASTM D3363, and the final surface hardness measurement results are all greater than 5H.
3. The coatings all possessed excellent adhesion to the substrate material, with all samples rated 0 according to the cross-grid scratch adhesion test of ISO 2409 international standard.
4. A wide variety of different colors are available and adjustment of these different colors can be done on-line without interrupting the coating process.
Drawings
FIG. 1 is a schematic view of a coating film system of the present invention.
Detailed Description
An embodiment of the present invention will be described with reference to fig. 1. Numerous details are set forth below in order to provide a thorough understanding of the present invention, but it will be apparent to those skilled in the art that the present invention may be practiced without these details.
The coating film comprises a stainless steel base material in the form of a strip or a sheet, the back surface of the coating film is B, and the film coating surface of the coating film is A. If only one surface of the stainless steel base material is subjected to surface treatment suitable for the expected PVD coating, the surface subjected to the surface treatment is a coating surface A; if both sides of the stainless steel base material are similar or both sides are suitable for the intended PVD coating, coating side a may be randomly selected.
An Adhesion Layer (AL) composed of metal chromium Cr is arranged on the coating surface of the stainless steel base material (SST). In common applications, the thickness of such an adhesion layer should be 20nm to 30 nm. However, it is also contemplated that no adhesion layer or an adhesion layer thickness of less than 20nm and both should be included in the present invention.
The first compound coating (CL 1) may be deposited over the adhesion layer, but may also be deposited directly on the coating side a of the stainless steel substrate material. The compound coating is composed of a silicon-chromium alloy that is partially to fully reactive with nitrogen N. The compound coating can thus be described by the formula (Si: Cr) NX. Here (Si: Cr) is described as the ratio between silicon Si and chromium Cr and this ratio can be adjusted either to pure silicon Si (100% Si: 0% Cr) or to pure chromium Cr (0% Si: 100% Cr) or to a mixture between the two in any ratio. In the chemical formula NxThe index X above is described as the coefficient of reaction with nitrogen N. The reaction coefficient X may vary between X =0 and X =1, where X =0 refers to 0% nitrogen reaction and X =1 refers to 100% nitrogen reaction or a mixture meeting a nominal stoichiometry.
Another compound coating (CL 2) may be plated over compound coating CL1, and compound coating CL2 may be described in the same manner as compound coating CL 1. It differs from compound coating CL1 in the different component ratios. That is, the mixing ratio of silicon and chromium (Si: Cr) may be different, or the reaction coefficient X may be different, or both may be different.
Over the compound film layers CL1 and CL2, compound coatings may additionally be plated to n (CLn), where each coating requires a different composition ratio than the underlying and/or overlying coating. The mixing ratio of silicon to chromium (Si: Cr) may be different, or the reaction coefficient X may be different or both may be different. Where n in CLn is a non-specified integer number of coats of the compound applied. The total number of compound coatings applied may be 1 or 2 or any other integer such as 3 or 4 or higher numbers.
Any dielectric layer DL may additionally be plated over the compound coating CL1 or over the film-based coating subset CL 1-CLn. An example of a dielectric layer here is Al2O3、MgF2、SiO2、TiO2. These are merely examples and the types of dielectric layers that can be used in the present invention are not limited to these 4.
The coating of the compound coating may be accomplished by PVD magnetron co-sputtering using two different metals or two different compound targets or a metal and a compound target simultaneously sputtered in the same coating chamber or zone where it reacts with the process gas, such as nitrogen N is introduced to form a new compound coating on the coated sample.
Direct Current (DC) magnetron sputtering, pulsed-DC magnetron sputtering and bipolar alternating current (bi-polar AC) magnetron sputtering are all feasible and can be used for co-sputtering processes of contemplated compound coatings.
The sputtering target used for the co-sputtering process may contain alloying elements such as aluminum Al embedded in silicon Si to form a SiAl target. As long as chromium Cr or silicon Si is a determining element of the target, the present invention shall include the case of using chromium alloy and silicon alloy targets.
The coating of the adhesion layer and the top dielectric layer may be done by using pulsed or non-pulsed dc magnetron sputtering or bipolar or unipolar ac magnetron sputtering and/or common evaporation methods such as boat evaporation or electron beam evaporation.
The coating thickness of each compound coating CL1-CLn can vary from 5nm to 300nm, depending on the application.
The coating thickness of the optional top optical media layer DL may also vary from 5nm to 300nm, with the corresponding thickness depending on the application.
The individual compound coatings CL1-CLn can be adjusted in thickness and/or by adjusting their composition so that the CIELCH color angle h can have a value between 0 ° and 360 °.
The CIELCH color saturation C and the brightness of the colors described by the CIELCH L value or CIELAB L value can also be adjusted by adjusting the thickness of the individual compound coatings CL1-CLn and/or by adjusting their composition.
An additional applied dielectric layer above the compound coating film system can either help to increase the color saturation C or make the color darker or lighter.
Color acquisition sample:
example 1
Color: brighter undersaturated copper color
Film system: SST/Cr/(Si: Cr) Nx-1/(Si: Cr) Nx-2
CIELAB color values: l =62, a =6, b =6
Pencil hardness test grade: >5H
Cross square scratch adhesion experiment: grade 0 (without any sign of stripping)
Approval of outdoor performance: after 72 hours of NSS neutral salt spray testing, there was no sign of corrosion, and the color difference Δ E value between the NSS neutral salt spray tested and the unexperienced samples exposed was < 1.5.
Example 2
Color: dark bronze color
Film system: SST/Cr/(Si: Cr) Nx-1/(Si: Cr) Nx-2
CIELAB color values: l =48, a =4, b =10
Pencil hardness test grade: >5H
Cross square scratch adhesion experiment: grade 0 (without any sign of stripping)
Approval of outdoor performance: after 72 hours of NSS neutral salt spray testing, there was no sign of corrosion, and the color difference Δ E value between the NSS neutral salt spray tested and the unexperienced samples exposed was < 1.5.
Example 3
Color: dark copper color
Film system: SST/Cr/(Si: Cr) Nx-1
CIELAB color values: l =43, a =13, b =10
Pencil hardness test grade: >5H
Cross square scratch adhesion experiment: grade 0 (without any sign of stripping)
Approval of outdoor performance: after 72 hours of NSS neutral salt spray testing, there was no sign of corrosion, and the color difference Δ E value between the NSS neutral salt spray tested and the unexperienced samples exposed was < 1.5.
Example 4
Color: dark gold
Film system: SST/Cr/(Si: Cr) Nx-1
CIELAB color values: l =51, a =3, b =16
Pencil hardness test grade: >5H
Cross square scratch adhesion experiment: grade 0 (without any sign of stripping)
Approval of outdoor performance: after 72 hours of NSS neutral salt spray testing, there was no sign of corrosion, and the color difference Δ E value between the NSS neutral salt spray tested and the unexperienced samples exposed was < 1.5.
Example 5
Color: grey black color
Film system: SST/Cr/(Si: Cr) Nx-1/(Si: Cr) Nx-2/SiO 2
CIELAB color values: l =25, a = -1, b = -2
Pencil hardness test grade: >5H
Cross square scratch adhesion experiment: grade 0 (without any sign of stripping)
Approval of outdoor performance: after 72 hours of NSS neutral salt spray testing, there was no sign of corrosion, and the color difference Δ E value between the NSS neutral salt spray tested and the unexperienced samples exposed was < 5.
The above description is only an embodiment of the present invention, but the design concept of the present invention is not limited thereto, and any insubstantial modifications made by using the design concept should fall within the scope of infringing the present invention.
Claims (3)
1. The decorative coating prepared on the stainless steel substrate based on the magnetron co-sputtering technology is characterized in that: the film system of the decorative coating comprises a plurality of compound coatings, the thickness of each single compound coating varies from 5nm to 300nm, each compound coating has the chemical formula (Si: Cr) NX(Si: Cr) is the ratio between silicon Si and chromium Cr, the index X is described in Nx as the reaction coefficient with nitrogen N, which varies between X =0 and X =1, where X =0 refers to 0% nitrogen reaction and X =1 to 100% nitrogen reaction or a mixture in accordance with a nominal stoichiometry, each compound coating requiring a different composition ratio to the underlying compound coating and/or the overlying compound coating, the mixing ratio of silicon to chromium (Si: Cr) being different or the reaction coefficient X being different or both; plating an adhesion layer under the subset of the film system comprising n single compound coatings, and the adhesion layer is composed of metallic chromium Cr; a dielectric layer is deposited over the subset of the film series comprising the n single compound coatings.
2. Decorative coating produced on a stainless steel substrate based on magnetron co-sputtering technique according to claim 1, characterized in that: the coating thickness of the adhesion layer AL is between 20nm and 30 nm.
3. Decorative coating produced on a stainless steel substrate based on magnetron co-sputtering technique according to claim 1, characterized in that: the thickness of the coating of the dielectric layer DL varies between 5nm and 300 nm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710343167.1A CN107177824B (en) | 2017-05-16 | 2017-05-16 | Decorative coating prepared on stainless steel substrate based on magnetron co-sputtering technology |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710343167.1A CN107177824B (en) | 2017-05-16 | 2017-05-16 | Decorative coating prepared on stainless steel substrate based on magnetron co-sputtering technology |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN107177824A CN107177824A (en) | 2017-09-19 |
| CN107177824B true CN107177824B (en) | 2020-01-03 |
Family
ID=59831165
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710343167.1A Active CN107177824B (en) | 2017-05-16 | 2017-05-16 | Decorative coating prepared on stainless steel substrate based on magnetron co-sputtering technology |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN107177824B (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108823548A (en) * | 2018-07-05 | 2018-11-16 | 江苏伟创真空镀膜科技有限公司 | A kind of bronze-colored coating process of PVD |
| CN110404744A (en) * | 2019-06-17 | 2019-11-05 | 宁波信泰机械有限公司 | One kind having decorative coveringn automobile component |
| CN111057996B (en) * | 2020-01-03 | 2021-12-14 | 创隆实业(深圳)有限公司 | All-solid-state insulation wave-transparent PVD (physical vapor deposition) film layer and preparation method and application thereof |
| CN111663100B (en) * | 2020-06-15 | 2022-05-31 | 福建新越金属材料科技有限公司 | Decorative coating of stainless steel base material |
| DE102020116899A1 (en) | 2020-06-26 | 2021-12-30 | Almeco Gmbh | Association for the production of plastically deformed decorative products |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1432444A (en) * | 2001-12-26 | 2003-07-30 | 住友电气工业株式会社 | Cutting tool with coated surface |
| CN102534480A (en) * | 2010-12-23 | 2012-07-04 | 鸿富锦精密工业（深圳）有限公司 | Coating piece and preparation method thereof |
| CN103370438A (en) * | 2011-02-04 | 2013-10-23 | 欧瑞康贸易股份公司(特吕巴赫) | Hot metal sheet forming or stamping tools with Cr-Si-N coatings |
| CN103382548A (en) * | 2013-06-27 | 2013-11-06 | 中国科学院宁波材料技术与工程研究所 | Preparation method of matrix surface nano compound Me-Si-N superhard coating |
| CN105568230A (en) * | 2015-12-25 | 2016-05-11 | 珠海罗西尼表业有限公司 | Preparation method of functional gradient multi-layer nano coating on surface of steel workpiece and product comprising functional gradient multi-layer nano coating |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7264668B2 (en) * | 2001-10-16 | 2007-09-04 | The Chinese University Of Hong Kong | Decorative hard coating and method for manufacture |
| CN204435777U (en) * | 2015-02-06 | 2015-07-01 | 福建新越金属材料科技有限公司 | A kind of structure improved ornamental copper base band material |
-
2017
- 2017-05-16 CN CN201710343167.1A patent/CN107177824B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1432444A (en) * | 2001-12-26 | 2003-07-30 | 住友电气工业株式会社 | Cutting tool with coated surface |
| CN102534480A (en) * | 2010-12-23 | 2012-07-04 | 鸿富锦精密工业（深圳）有限公司 | Coating piece and preparation method thereof |
| CN103370438A (en) * | 2011-02-04 | 2013-10-23 | 欧瑞康贸易股份公司(特吕巴赫) | Hot metal sheet forming or stamping tools with Cr-Si-N coatings |
| CN103382548A (en) * | 2013-06-27 | 2013-11-06 | 中国科学院宁波材料技术与工程研究所 | Preparation method of matrix surface nano compound Me-Si-N superhard coating |
| CN105568230A (en) * | 2015-12-25 | 2016-05-11 | 珠海罗西尼表业有限公司 | Preparation method of functional gradient multi-layer nano coating on surface of steel workpiece and product comprising functional gradient multi-layer nano coating |
Also Published As
| Publication number | Publication date |
|---|---|
| CN107177824A (en) | 2017-09-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN107177824B (en) | Decorative coating prepared on stainless steel substrate based on magnetron co-sputtering technology | |
| KR20070045269A (en) | Metal product, method of manufacturing a metal product and use thereof | |
| CN107217231A (en) | The decorative coating prepared on aluminum substrates based on the common sputtering technology of magnetic control | |
| KR101346014B1 (en) | Surface treating method of internal/external metal material, and internal/external metal material comprising surface structure manufactured using the same | |
| CN102822387A (en) | Steel sheet for vessel having excellent corrosion resistance | |
| EP1866149B1 (en) | Coated article with dark color | |
| Reiners et al. | Decorative optical coatings | |
| CN111663100B (en) | Decorative coating of stainless steel base material | |
| US7264668B2 (en) | Decorative hard coating and method for manufacture | |
| EP2774958B1 (en) | Coated article with dark color | |
| JPH02254178A (en) | Superimposed plated steel sheet having high corrosion resistance | |
| CN1221373A (en) | Articles having colored metallic coating and process for their manufacture | |
| Perillo | Corrosion behavior of coatings of titanium nitride and titanium-titanium nitride on steel substrates | |
| EP2186927A1 (en) | Coated article with black color | |
| CN111448342B (en) | Method for producing a coating with a coloured surface | |
| US10202679B2 (en) | Coated article having a vivid color | |
| WO2006022588A1 (en) | Strip product and method of manufacturing a strip product | |
| JP7435925B1 (en) | Surface treated steel sheet and its manufacturing method | |
| CN217895726U (en) | High-temperature oxidation-resistant coating for stainless steel substrate | |
| JPH06330349A (en) | Colored ti plated material | |
| WO2024111158A1 (en) | Surface-treated steel sheet and method for producing same | |
| Schuhmacher et al. | Combined processes- novel approaches for alloy coatings on steel sheet | |
| JPH0456798A (en) | Production of chromated galvanized steel sheet excellent in resistance to corrosion and fingerprinting, coating suitability and surface color tone | |
| Srinivasan et al. | Review on Plasma Electrolytic Oxidation of Titanium Coatings | |
| CN113684455A (en) | Method for preparing fingerprint-proof black film based on PVD (physical vapor deposition) and coated part |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |