CN107167071A - Synchronous phase shift interference measurement apparatus based on depolarization Amici prism - Google Patents
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Abstract
本发明涉及一种基于消偏振分光棱镜的同步相移干涉测量装置，属于光学干涉检测技术领域。该系统包括激光器(1)、第一透镜(2)、针孔滤波器(3)、第二透镜(4)、偏振片(5)、第一消偏振分光棱镜(6)、偏振分光棱镜(7)、参考镜(8)、测试镜(9)、1/4波片(10)、第二消偏振分光棱镜(11)、反射镜(12)、偏振相移阵列(13)、CMOS相机(14)。该装置可以实时获取两幅干涉图样，降低了对环境的要求，在操作中不需要改变光路，也不需要移动任何实验器件，操作方便灵活，稳定性高，系统复杂性低，较基于正交光栅分光的同步相移干涉装置而言，其结构简单、成本更低。
The invention relates to a synchronous phase-shift interferometry device based on a depolarization beam splitting prism, which belongs to the technical field of optical interference detection. The system includes a laser (1), a first lens (2), a pinhole filter (3), a second lens (4), a polarizer (5), a first depolarizing beamsplitter (6), and a polarizing beamsplitter ( 7), reference mirror (8), test mirror (9), 1/4 wave plate (10), second depolarization beam splitter prism (11), mirror (12), polarization phase shift array (13), CMOS camera (14). The device can obtain two interference patterns in real time, which reduces the requirements on the environment. It does not need to change the optical path during operation, nor does it need to move any experimental devices. It is convenient and flexible to operate, high in stability, and low in system complexity. As far as the synchronous phase-shift interference device of grating light splitting is concerned, its structure is simple and its cost is lower.
Description
技术领域technical field
本发明涉及光学干涉检测技术领域，具体涉及一种基于消偏振分光棱镜的同步相移干涉测量装置。The invention relates to the technical field of optical interference detection, in particular to a synchronous phase-shifting interferometry device based on a depolarization beam splitting prism.
背景技术Background technique
表面形貌测量在工业生产和制造业中有着十分重要的应用，光滑物体的表面三维形状需要精确测量以保证制造质量，光学相移干涉因为具有非接触、无损和精度高等优点，已被长期用作表面形貌测量的计量工具。传统的相移技术主要通过驱动压电陶瓷来移动参考镜，在时域采集多幅干涉图样，然而这容易受到压电陶瓷的非线性误差和环境因素的不稳定的影响，例如环境振动或空气湍流，从而造成测量偏差。为便于干涉技术适用于测量动态物体，最近几年兴起了同步相移干涉测量技术，它可以瞬间获取多幅相移干涉图像，由于这种实时性，大大降低了环境干扰的影响，提高了系统的精度和稳定性。Surface topography measurement has very important applications in industrial production and manufacturing. The three-dimensional shape of the surface of smooth objects needs to be accurately measured to ensure the quality of manufacturing. Optical phase shift interference has been used for a long time because of its advantages of non-contact, non-destructive and high precision. A metrology tool for surface topography measurement. The traditional phase shifting technology mainly moves the reference mirror by driving the piezoelectric ceramics, and collects multiple interference patterns in the time domain. However, this is easily affected by the nonlinear error of the piezoelectric ceramics and the instability of environmental factors, such as environmental vibration or air Turbulence, which causes measurement deviations. In order to facilitate the application of interferometry to the measurement of dynamic objects, synchronous phase-shift interferometry technology has emerged in recent years, which can instantly acquire multiple phase-shift interferometry images. Due to this real-time performance, the impact of environmental interference is greatly reduced and the system is improved. accuracy and stability.
同步相移干涉测量技术基于空间移相，在同一时刻采集多幅具有恒定相移量的干涉图样，这样环境振动对每一幅干涉图样的影响都是相同的，从而能从根本上杜绝环境振动对干涉测量的影响。Synchronous phase-shift interferometry technology is based on spatial phase shifting, and collects multiple interference patterns with constant phase shift at the same time, so that the impact of environmental vibration on each interference pattern is the same, so that environmental vibration can be fundamentally eliminated Effects on interferometry.
中国专利《可实时测量的同步相移斐索干涉装置》，公开号为CN102589414A，公开日为2012年7月18日，该专利通过采用一个表面平整度非常高的1/4波片代替传统斐索干涉仪中的标准参考平晶，使参考光束与物光束经历了完全相同的路径，提高了系统的抗干扰能力。他们使用一对正交Ronchi光栅实现了光束的分离，并结合偏振片组通过一次曝光获得四幅相移干涉图样，实现了测量的实时性，但是该系统采用了高质量的1/4波片和光栅对，导致了装置的成本高。Chinese patent "Synchronous Phase-Shift Fizeau Interferometer for Real-time Measurement", the publication number is CN102589414A, and the publication date is July 18, 2012. This patent replaces the traditional Fizeau by using a 1/4 wave plate with a very high surface flatness The standard reference flat crystal in the cable interferometer makes the reference beam and the object beam go through exactly the same path, which improves the anti-interference ability of the system. They used a pair of orthogonal Ronchi gratings to separate the beams, combined with a polarizer group to obtain four phase-shifted interference patterns through one exposure, and achieved real-time measurement. However, the system uses high-quality 1/4 wave plates and The pair of gratings leads to high cost of the device.
西安光机所的姚保利等提出一种基于分光棱镜的两步相移干涉测量装置(P.Gao，B.L.Yao，J.Min，R.Guo，J.Zheng，T.Ye.Parallel two-step phase-shifting microscopicinterferometry based on a cube beamsplitter.Optics Communications,2011,284(18):4136-4140)。该装置利用分光棱镜将具有正交偏振的光束分束为两束，其中一束光束中的物光束的光强比参考光束的光强强，另外一束光束的的情况刚好相反，他们采用了一个1/4波片和1/2波片来保证两束光束中的参考光束和物光束的光强分布相同，从而获得条纹对比度较好的相移干涉图样，但该装置采用了1/4波片和1/2波片来调控条纹对比度，这无疑增加了系统的复杂度。Yao Baoli of Xi'an Institute of Optics and Mechanics proposed a two-step phase-shift interferometry device based on a spectroscopic prism (P.Gao, B.L.Yao, J.Min, R.Guo, J.Zheng, T.Ye.Parallel two-step phase-shifting microscopic interferometry based on a cube beam splitter. Optics Communications, 2011, 284(18): 4136-4140). The device uses a beam splitting prism to split the beam with orthogonal polarization into two beams. The light intensity of the object beam in one beam is stronger than that of the reference beam, and the situation of the other beam is just the opposite. They adopted A 1/4 wave plate and a 1/2 wave plate are used to ensure that the light intensity distribution of the reference beam and the object beam in the two beams are the same, so as to obtain a phase-shifted interference pattern with better fringe contrast, but the device uses a 1/4 Wave plate and 1/2 wave plate are used to adjust the fringe contrast, which undoubtedly increases the complexity of the system.
发明内容Contents of the invention
本发明的目的是为了解决现有同步干涉测量系统的结构复杂、成本高等问题，提供一种基于消偏振分光棱镜的同步相移干涉测量装置。The object of the present invention is to provide a synchronous phase-shift interferometry device based on a depolarization beam splitter to solve the problems of complex structure and high cost of the existing synchronous interferometry system.
本发明的技术解决方案为:Technical solution of the present invention is:
本发明所述基于消偏振分光棱镜的同步相移干涉测量装置,它包括照明模块、偏振干涉模块、同步相移模块，照明模块依次包括激光器和准直扩束系统，该准直扩束系统包括第一透镜、针孔滤波器和第二透镜，第一透镜的后焦面与第二透镜的前焦面保持共焦，针孔滤波器位于第一透镜的后焦面，以第一透镜的光轴方向为z轴方向建立xyz三维直角坐标系；偏振干涉模块依次包括偏振片、第一消偏振分光棱镜、偏振分光棱镜、参考镜和测试镜，偏振分光棱镜放置在第一消偏振分光棱镜的反射光路上，参考镜和测试镜分别放置在偏振分光棱镜的透射光路和反射光路上，且距偏振分光棱镜距离相等；同步相移模块依次包括1/4波片、平行分光模块、偏振相移阵列和CMOS相机，平行分光模块包括第二消偏振分光棱镜和反射镜。The synchronous phase-shift interferometry device based on the depolarization beam-splitter prism of the present invention includes an illumination module, a polarization interference module, and a synchronous phase-shift module, and the illumination module sequentially includes a laser and a collimating beam expanding system, and the collimating beam expanding system includes The first lens, the pinhole filter and the second lens, the rear focal plane of the first lens is confocal with the front focal plane of the second lens, the pinhole filter is located at the rear focal plane of the first lens, and the The optical axis direction is the z-axis direction to establish an xyz three-dimensional rectangular coordinate system; the polarization interference module sequentially includes a polarizer, a first depolarization beam-splitter prism, a polarization beam-splitter prism, a reference mirror and a test mirror, and the polarization beam-splitter prism is placed on the first depolarization beam-splitter prism The reference mirror and the test mirror are respectively placed on the transmitted light path and reflected light path of the polarization beam splitter prism, and the distance from the polarization beam splitter prism is equal; the synchronous phase shift module includes a 1/4 wave plate, a parallel beam splitter module, a polarization phase shift array and CMOS camera, the parallel beam splitting module includes a second depolarizing beam splitting prism and a mirror.
所述偏振片沿垂直于z轴的方向放置，且其偏振方向分别与x轴和y轴成45°角，要求偏振方向沿x轴的p分量和沿y轴的s分量光强相等，使后续采集得到的两幅干涉图样的条纹对比度保持一致。The polarizer is placed along a direction perpendicular to the z-axis, and its polarization direction is at an angle of 45° to the x-axis and y-axis respectively, and the light intensity of the p component along the x-axis and the s-component along the y-axis of the polarization direction are required to be equal, so that The fringe contrast of the two interference patterns obtained in subsequent acquisitions is consistent.
所述1/4波片的快轴方向分别沿与x轴和y轴成45°角的方向放置。The directions of the fast axes of the 1/4 wave plate are respectively placed along directions forming an angle of 45° with the x-axis and the y-axis.
所述反射镜沿与x轴成-45°角的方向放置。The mirrors are placed along a direction at an angle of -45° to the x-axis.
所述偏振相移阵列为两偏振片组成的1*2阵列，两偏振片的方位差相差45°角。The polarization phase shift array is a 1*2 array composed of two polarizers, and the azimuth difference of the two polarizers is 45°.
一种基于消偏振分光棱镜的同步相移干涉测量方法，它的实现过程如下：A method of synchronous phase-shift interferometry based on a depolarizing beamsplitter, its realization process is as follows:
启动激光器，使光源发射的光束经准直扩束系统和偏振片后形成平行线偏振光，入射至第一消偏振分光棱镜反射后，经偏振分光棱镜反射与透射后形成参考光束和物光束汇合至1/4波片，此时参考光束和物光束形成偏振方向正交的圆偏振光，随后一同入射至第二消偏振分光棱镜，第二消偏振分光棱镜的反射光束经反射镜反射后与第二消偏振分光棱镜的透射光束一同平行入射至偏振相移阵列，偏振相移阵列出射的偏振光束在CMOS相机感光平面上产生干涉图样，采集得到的两幅干涉图样以右边图像为第一幅干涉图样，左边图像为第二幅干涉图样，两幅干涉图样按顺序的强度分别为I1和I2，经过相位提取算法与相位解包裹算法的处理得到测试镜的相位分布，实现同步相移干涉测量。Start the laser, so that the beam emitted by the light source passes through the collimating beam expander system and the polarizer to form parallel linearly polarized light, which is incident on the first depolarizing beam splitter and reflected, then reflected and transmitted by the polarizing beam splitter to form the reference beam and the object beam. to the 1/4 wave plate. At this time, the reference beam and the object beam form circularly polarized light with orthogonal polarization directions, and then enter the second depolarizing beamsplitter together. The reflected beam of the second depolarizing beamsplitting prism is reflected by the mirror. The transmitted light beams of the second depolarizing beamsplitter prism are parallel incident to the polarization phase-shifting array, and the polarized light beams emitted by the polarization phase-shifting array generate interference patterns on the photosensitive plane of the CMOS camera. The image on the right is the first of the two collected interference patterns Interference pattern, the image on the left is the second interference pattern, the intensities of the two interference patterns in sequence are I 1 and I 2 respectively, and the phase distribution of the test mirror is obtained through the phase extraction algorithm and the phase unwrapping algorithm to realize the synchronous phase shift Interferometry.
本发明的有益效果是：The beneficial effects of the present invention are:
1、可以实时获取两幅干涉图样，由于两幅干涉图样是在同一时刻获取的，外界环境干扰相同，降低了对环境的要求。1. Two interference patterns can be obtained in real time. Since the two interference patterns are obtained at the same time, the external environment interference is the same, which reduces the requirements for the environment.
2、本发明装置在操作中不需要改变光路，也不需要移动任何实验器件，操作方便灵活，稳定性高，系统复杂性低。2. The device of the present invention does not need to change the optical path during operation, nor does it need to move any experimental devices, so the operation is convenient and flexible, the stability is high, and the system complexity is low.
3、两幅干涉图样对比度相同，可简化后续图像处理的难度。3. The contrast of the two interference patterns is the same, which can simplify the difficulty of subsequent image processing.
4、本发明装置较现有的同步相移干涉装置而言，其结构简单、成本更低。4. Compared with the existing synchronous phase-shift interference device, the device of the present invention has a simpler structure and lower cost.
附图说明Description of drawings
图1是本发明所述基于消偏振分光棱镜的同步相移干涉测量装置的结构示意图；Fig. 1 is the structural representation of the synchronous phase-shift interferometry device based on the depolarization beam splitter of the present invention;
图2是图1的偏振相移阵列的偏振方向示意图。FIG. 2 is a schematic diagram of the polarization direction of the polarization phase shift array in FIG. 1 .
具体实施方式detailed description
下面结合附图及具体实施方式详细介绍本发明。The present invention will be described in detail below in conjunction with the accompanying drawings and specific embodiments.
如图1所示，本发明实施例的基于消偏振分光棱镜的同步相移干涉测量装置包括：激光器(1)、第一透镜(2)、针孔滤波器(3)、第二透镜(4)、偏振片(5)、第一消偏分光棱镜(6)、偏振分光棱镜(7)、参考镜(8)、测试镜(9)、1/4波片(10)、第二消偏振分光棱镜(11)、反射镜(12)、偏振相移阵列(13)、CMOS相机(14)。As shown in Figure 1, the synchronous phase-shift interferometry device based on the depolarization beam splitter of the embodiment of the present invention comprises: laser (1), first lens (2), pinhole filter (3), second lens (4 ), polarizer (5), first depolarization beamsplitter prism (6), polarization beamsplitter prism (7), reference mirror (8), test mirror (9), 1/4 wave plate (10), second depolarization Dichroic prism (11), reflection mirror (12), polarization phase shift array (13), CMOS camera (14).
本发明所包含的部件功能如下：The part functions included in the present invention are as follows:
1、激光器(1)，波长在可见光范围，输出一束线偏振光且功率稳定。1. The laser (1) has a wavelength in the range of visible light and outputs a beam of linearly polarized light with stable power.
2、第一透镜(2)、针孔滤波器(3)、第二透镜(4)组成准直扩束系统，第一透镜的后焦面与第二透镜的前焦面保持共焦，针孔滤波器位于第一透镜的后焦面。2. The first lens (2), the pinhole filter (3), and the second lens (4) form a collimating beam expander system. The rear focal plane of the first lens is confocal with the front focal plane of the second lens. The aperture filter is located at the back focal plane of the first lens.
3、偏振片(5)改变入射光的偏振方向，且其偏振方向分别与x轴和y轴成45°角。3. The polarizer (5) changes the polarization direction of the incident light, and its polarization direction forms an angle of 45° with the x-axis and the y-axis respectively.
4、第一消偏振分光棱镜(6)，第二消偏振分光棱镜(11)，用于偏振光束的透射与反射，并保持出射光的偏振态不变。4. The first depolarizing beam-splitting prism (6) and the second depolarizing beam-splitting prism (11) are used for the transmission and reflection of the polarized light beam, and keep the polarization state of the outgoing light unchanged.
5、偏振分光棱镜(7)用于产生两束偏振方向正交的线偏振光束。5. The polarization splitter prism (7) is used to generate two linearly polarized light beams with orthogonal polarization directions.
6、1/4波片(10)其快轴方向分别与参考光束和物光束的偏振方向成45°角，使得参考光束和物光束成为偏振方向正交的圆偏振光束，用于后续形成同步相移干涉。6. The direction of the fast axis of the 1/4 wave plate (10) forms an angle of 45° with the polarization directions of the reference beam and the object beam respectively, so that the reference beam and the object beam become circularly polarized beams with orthogonal polarization directions for subsequent synchronization phase shift interference.
7、反射镜(12)与x轴成-45°角的方向放置，改变第二消偏振分光棱镜的反射光束的传播方向，使其与第二消偏振分光棱镜的透射光束的传播方向平行。7, reflecting mirror (12) is placed in the direction of -45 ° angle with x-axis, changes the propagation direction of the reflected light beam of the second depolarization beam splitter, makes it parallel with the propagation direction of the transmission beam of the second depolarization beam splitter prism.
8、偏振相移阵列(13)，是由两个偏振方向按逆时针顺序依次成0°、45°的两块偏振片组成，通过一次曝光就可以采集到两幅相移量分别为0°、90°的干涉图样。8. The polarization phase-shift array (13) is composed of two polarizers whose polarization directions are 0° and 45° in counterclockwise order, and two phase shifts of 0° can be collected through one exposure , 90° interference pattern.
9、CMOS相机(14)具有合适灰度阶、像素尺寸和像素数量。9. The CMOS camera (14) has suitable gray scale, pixel size and pixel quantity.
本发明所提出的光路如图 1 所示：The optical path proposed by the present invention is shown in Figure 1:
激光器(1)发射的光束经由第一透镜(2)、针孔滤波器(3)和第二透镜(4)所组成的准直扩束系统准直扩束后入射至偏振片(5)，该偏振片的偏振方向分别与x轴和y轴成45°角，保证了偏振方向沿x轴的p分量和沿y轴的s分量光强相等，从而使后续采集得到的两幅干涉图样条纹对比度保持一致，偏振片(5)的出射光束变成一束偏振方向可调的线偏振光，该线偏振光经过第一消偏振分光棱镜(6)反射至偏振分光棱镜(7)，通过偏振分光棱镜(7)后的光束被分解为一束偏振方向垂直于纸面的s分量和一束偏振方向平行于纸面的p分量，从偏振分光棱镜(7)的分光面透射的p分量经过参考镜(8)反射后作为参考光束，另外一束从偏振分光棱镜(7)的分光面反射的s分量经过测试镜(9)反射后作为物光束，该物光束携带了测试镜(9)表面的面型信息，通过调节参考镜(8)与反射镜(9)的空间位置，使反射的s分量与透射的p分量经过偏振分光棱镜(7)后重新汇合在一起，这样就可以得到一对偏振方向正交的参考光束与物光束；然后参考光束与物光束一同经过第一消偏振分光棱镜(6)透射后入射至1/4波片(10)，该1/4波片的快轴方向分别与参考光束和物光束的偏振方向成45°角，此时出射光束变成一对偏振方向正交的圆偏振光束，随后入射至第二消偏振分光棱镜(11)，第二消偏振分光棱镜(11)的反射光束经过反射镜(12)改变传播方向后与第二消偏振分光棱镜(11)的透射光束的传播方向平行，该反射镜沿与x轴成-45°角放置，然后这两束光束一同入射至偏振相移阵列(13)实现偏振相移干涉，通过CMOS相机(14)同步采集两幅相移干涉图样。The beam emitted by the laser (1) enters the polarizer (5) after being collimated and expanded by the collimated beam expander system composed of the first lens (2), the pinhole filter (3) and the second lens (4), The polarization direction of the polarizer is at an angle of 45° to the x-axis and y-axis respectively, which ensures that the light intensity of the p-component along the x-axis and the s-component along the y-axis of the polarization direction are equal, so that the two interference pattern fringes obtained by subsequent acquisition Contrast remains consistent, the output beam of the polarizer (5) becomes a linearly polarized light with adjustable polarization direction, the linearly polarized light is reflected to the polarization beamsplitter prism (7) through the first depolarization beamsplitter prism (6), and passes through The light beam behind the beam splitting prism (7) is decomposed into an s component whose polarization direction is perpendicular to the paper surface and a p component whose polarization direction is parallel to the paper surface, and the p component transmitted from the beam splitting surface of the polarization beam splitting prism (7) passes through The reference mirror (8) is used as the reference beam after being reflected, and the s component reflected from the beam-splitting surface of the polarizing beam splitter (7) is used as the object beam after being reflected by the test mirror (9). The object beam carries the test mirror (9) The surface information of the surface, by adjusting the spatial position of the reference mirror (8) and the reflector (9), makes the reflected s component and the transmitted p component rejoin after passing through the polarization beam splitter prism (7), so that it can be obtained A pair of reference beams and object beams with orthogonal polarization directions; then the reference beams and the object beams are transmitted together through the first depolarization beam splitter prism (6) and then incident on the 1/4 wave plate (10), the 1/4 wave plate The direction of the fast axis is at an angle of 45° to the polarization directions of the reference beam and the object beam respectively, at this moment, the outgoing beam becomes a pair of circularly polarized beams with orthogonal polarization directions, and then enters the second depolarizing beamsplitter prism (11), and the second The reflected beam of the depolarization beam splitter (11) is parallel to the propagation direction of the transmitted beam of the second depolarization beam splitter (11) after the reflector (12) changes the propagation direction, and the reflector forms an angle of -45° with the x axis. placed, and then the two beams are incident together into the polarization phase-shift array (13) to realize polarization phase-shift interference, and two phase-shift interference patterns are collected synchronously by a CMOS camera (14).
偏振相移阵列(13)的结构示意如图2 所示，使用偏振相移阵列(13)对干涉图样进行偏振滤波，每幅干涉图样分别通过偏振片组的一个偏振片，由于每个偏振片的偏振方向不同，在两幅干涉图样中引入不同的相移，从而得到两幅不同相移的干涉图样。用这两幅不同相移的干涉图样的强度分布就可以计算测试镜的相位分布。The structural representation of the polarization phase-shift array (13) is shown in Figure 2. The polarization phase-shift array (13) is used to carry out polarization filtering on the interference pattern, and each interference pattern passes through a polarizer of the polarizer group respectively. Since each polarizer The polarization directions of the two interference patterns are different, and different phase shifts are introduced into the two interference patterns, thereby obtaining two interference patterns with different phase shifts. The phase distribution of the test mirror can be calculated from the intensity distribution of the two interference patterns with different phase shifts.
以上所述，仅为本发明中的具体实施方式，但本发明的保护范围并不局限于此，任何熟悉该技术的人在本发明所揭露的技术范围内的局部修改或替换，都应涵盖在本发明的包含范围之内。The above is only a specific implementation mode in the present invention, but the protection scope of the present invention is not limited thereto, any partial modification or replacement within the technical scope disclosed in the present invention by anyone familiar with the technology shall cover within the scope of the present invention.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108303372A (en) * | 2018-01-29 | 2018-07-20 | 哈尔滨工业大学 | Device and method for simultaneous super-resolution measurement of beam phase shift and polarization rotation |
| CN111947592A (en) * | 2020-06-29 | 2020-11-17 | 中国科学院上海光学精密机械研究所 | A dynamic dual-wavelength phase-shifting interferometric measurement device and measurement method |
| CN119164283A (en) * | 2024-11-19 | 2024-12-20 | 法博思(宁波)半导体设备有限公司 | Fizeau interferometer and interferometric measurement system |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102589414A (en) * | 2012-02-21 | 2012-07-18 | 中国科学院西安光学精密机械研究所 | Synchronous phase-shifting Fizeau interference device capable of measuring in real time |
| CN102944169A (en) * | 2012-11-26 | 2013-02-27 | 中国科学院长春光学精密机械与物理研究所 | Simultaneous polarization phase-shifting interferometer |
| CN103245285A (en) * | 2013-04-22 | 2013-08-14 | 哈尔滨工程大学 | Reflective point-diffraction carrier synchronization phase-shifting interference detection device and detection method |
| CN104748672A (en) * | 2015-03-05 | 2015-07-01 | 哈尔滨工业大学 | Interference-mount separating type nonlinear error correcting method and device for single-frequency laser interferometer |
| CN204881510U (en) * | 2015-04-28 | 2015-12-16 | 林燕彬 | With relevant appearance of wading of shifting in steps with adjustable |
| WO2016121248A1 (en) * | 2015-01-30 | 2016-08-04 | 浜松ホトニクス株式会社 | Interference observation device |
| CN106225667A (en) * | 2016-08-05 | 2016-12-14 | 合肥工业大学 | A kind of single frequency laser interferometer nonlinear error compensation device |
-
2017
- 2017-06-30 CN CN201710520160.2A patent/CN107167071A/en active Pending
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102589414A (en) * | 2012-02-21 | 2012-07-18 | 中国科学院西安光学精密机械研究所 | Synchronous phase-shifting Fizeau interference device capable of measuring in real time |
| CN102944169A (en) * | 2012-11-26 | 2013-02-27 | 中国科学院长春光学精密机械与物理研究所 | Simultaneous polarization phase-shifting interferometer |
| CN103245285A (en) * | 2013-04-22 | 2013-08-14 | 哈尔滨工程大学 | Reflective point-diffraction carrier synchronization phase-shifting interference detection device and detection method |
| WO2016121248A1 (en) * | 2015-01-30 | 2016-08-04 | 浜松ホトニクス株式会社 | Interference observation device |
| CN104748672A (en) * | 2015-03-05 | 2015-07-01 | 哈尔滨工业大学 | Interference-mount separating type nonlinear error correcting method and device for single-frequency laser interferometer |
| CN204881510U (en) * | 2015-04-28 | 2015-12-16 | 林燕彬 | With relevant appearance of wading of shifting in steps with adjustable |
| CN106225667A (en) * | 2016-08-05 | 2016-12-14 | 合肥工业大学 | A kind of single frequency laser interferometer nonlinear error compensation device |
Non-Patent Citations (1)
| Title |
|---|
| 刘晓军 等: "同步相移干涉表面精密测量", 《中国机械工程》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108303372A (en) * | 2018-01-29 | 2018-07-20 | 哈尔滨工业大学 | Device and method for simultaneous super-resolution measurement of beam phase shift and polarization rotation |
| CN111947592A (en) * | 2020-06-29 | 2020-11-17 | 中国科学院上海光学精密机械研究所 | A dynamic dual-wavelength phase-shifting interferometric measurement device and measurement method |
| CN111947592B (en) * | 2020-06-29 | 2021-10-08 | 中国科学院上海光学精密机械研究所 | A dynamic dual-wavelength phase-shifting interferometric measurement device and measurement method |
| CN119164283A (en) * | 2024-11-19 | 2024-12-20 | 法博思(宁波)半导体设备有限公司 | Fizeau interferometer and interferometric measurement system |
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