CN107159667A - Glass cleaning procedure for making mirror substrate - Google Patents

Glass cleaning procedure for making mirror substrate Download PDF

Info

Publication number
CN107159667A
CN107159667A CN201710434921.2A CN201710434921A CN107159667A CN 107159667 A CN107159667 A CN 107159667A CN 201710434921 A CN201710434921 A CN 201710434921A CN 107159667 A CN107159667 A CN 107159667A
Authority
CN
China
Prior art keywords
glass
mirror substrate
cleaning procedure
glass cleaning
mass concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201710434921.2A
Other languages
Chinese (zh)
Inventor
王文友
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to CN201710434921.2A priority Critical patent/CN107159667A/en
Publication of CN107159667A publication Critical patent/CN107159667A/en
Pending legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

The invention discloses a kind of glass cleaning procedure for being used to make mirror substrate, comprise the following steps:The first step, glass is put into solvent, and heating, ultrasonic wave clean 1~2min, pull out, dry naturally;Second step, the hydrofluoric acid and mass concentration for being 2~3% by mass concentration is after 10~20% perchloric acid are mixed, to be sprayed on glass surface, then dried with cotton;3rd step, glass is hung in vapor 10~20min of placement;4th step, takes out glass under vacuum condition, 40~50 DEG C dry.The glass of the present invention is used to make mirror substrate, surfacing and colour-fast.Ultrasonication can not only make glass cleaning cleaner and can make the closer not fugitive color of the compactness of metallic reflector and glass, vapor can dissolve dirt, remove the pollution particle of glass surface and be difficult to the pollution in place to go, there are the dissolving, disperse of height, repair, clean effect significantly, makes mirror-smooth smooth.

Description

Glass cleaning procedure for making mirror substrate
Technical field
The present invention discloses one kind and belongs to glass cleaning field, more particularly to a kind of glass cleaning for being used to make mirror substrate Method.
Background technology
The preparation of mirror includes two parts:Glass is cleaned first, is cut out by specification after glass, is first rinsed just with running water Anti- two sides, is then coated in the one side to be plated with water by iron oxide red, and iron oxide red is wiped after dry, and washing is clean.Again with micro chlorine Change stannous solution and clean the face to be plated of glass.Remnants stannous chloride is washed down after washing with water.Finally use clean water(It is most handy to steam Distilled water)Rush glass.Then it is silver-plated, the glass of wash clean is lain on horizontal yoke or batten, take silvering solution a and Reducing solution portion is stirred evenly down.Decoction is spent with not pouring off.About every square metre 2 deciliters or so.Treat that it is gradually anti-on glass Silver mirror should be gone out, unnecessary decoction is outwelled, rinsed with water, thousands of points of ten gelatin dries.One layer is being applied above again after dry Iron oxide red primer or other antirust paint liquid have become mirror.
Application No. CN200810111762.3 Chinese patent application discloses a kind of glass cleaner, by following raw material Composition:Water (90%-95%), isopropanol (3%-5%), double octyl group butanedioic acid sodium salts (2%-7%) etc..It is involved in the present invention The advantage of glass cleaner be:Cost is low, configures convenient and simple;Glass is chronically exposed in air and produced on its surface Raw pollution particle and it is difficult to the pollution in place to go and has the dissolving, disperse of height, repair.Clean effect is notable.But be used for Making the glass of mirror substrate has higher requirement for cleaning performance, and general cleaning agent cleaning is not enough to reach this want Ask.
The content of the invention
The invention aims to solve the problem of prior art mirror substrate glass cleaning difficulty is big, there is provided one kind Glass cleaning procedure for making mirror substrate, by using ultrasonication technology before Chemical cleaning, makes follow-up clear Wash and be more prone to and cleaning performance is more preferable.
In order to solve the above-mentioned technical problem, the present invention uses following technical scheme:
Glass cleaning procedure for making mirror substrate, comprises the following steps:
The first step, glass is put into solvent, is heated to 40~50 DEG C, ultrasonic wave cleans 1~2min, pulls out, dries naturally;
Second step, the hydrofluoric acid and mass concentration for being 2~3% by mass concentration is after 10~20% perchloric acid are mixed, to be sprayed on glass Glass surface, is then dried with cotton;
3rd step, glass is hung in vapor 10~20min of placement;
4th step, takes out glass under vacuum condition, 40~50 DEG C dry.
Preferably, in the first step, the solvent is ethylene glycol or isopropanol.
Preferably, in the first step, the frequency of the ultrasonic wave is 10~200KHz.
Preferably, in the first step, under the conditions of 45 DEG C, the ultrasonic wave for being 50KHz with frequency cleans 1.2min.
Preferably, in second step, the mass ratio 1 of hydrofluoric acid and perchloric acid:5.
The glass of the present invention is used to make mirror substrate, surfacing and colour-fast.Ultrasonication can not only make glass Cleaning is cleaner and can make the closer not fugitive color of the compactness of metallic reflector and glass, and vapor can dissolve dirt Thing, removes the pollution particle of glass surface and is difficult to the pollution in place to go, there is the dissolving, disperse of height, repair, clean effect Significantly, make final obtained mirror-smooth smooth.
Embodiment
The present invention is further described in detail with reference to specific embodiment.
Embodiment 1
Glass cleaning procedure for making mirror substrate, comprises the following steps:
The first step, glass is put into solvent ethylene glycol or isopropanol, is heated to 45 DEG C, and the ultrasonic wave for being 50KHz with frequency is clear 1.2min is washed, is pulled out, is dried naturally;
Second step, the hydrofluoric acid and mass concentration for being 2.5% by mass concentration is after 15% perchloric acid is mixed, to be sprayed on glass table Face, is then dried with cotton;The mass ratio 1 of the hydrofluoric acid and perchloric acid:5;
3rd step, glass is hung in vapor placement 15min;
4th step, takes out glass under vacuum condition, 45 DEG C dry.
Embodiment 2
Glass cleaning procedure for making mirror substrate, comprises the following steps:
The first step, glass is put into solvent ethylene glycol or isopropanol, is heated to 40 DEG C, and the ultrasonic wave for being 10KHz with frequency is clear 1min is washed, is pulled out, is dried naturally;
Second step, the hydrofluoric acid and mass concentration for being 2% by mass concentration is after 10% perchloric acid is mixed, to be sprayed on glass surface, Then dried with cotton;The mass ratio 1 of the hydrofluoric acid and perchloric acid:5;
3rd step, glass is hung in vapor placement 10min;
4th step, takes out glass under vacuum condition, 40 DEG C dry.
Embodiment 3
Glass cleaning procedure for making mirror substrate, comprises the following steps:
The first step, glass is put into solvent ethylene glycol or isopropanol, is heated to 50 DEG C, and the ultrasonic wave for being 200KHz with frequency is clear 2min is washed, is pulled out, is dried naturally;
Second step, the hydrofluoric acid and mass concentration for being 3% by mass concentration is after 20% perchloric acid is mixed, to be sprayed on glass surface, Then dried with cotton;The mass ratio 1 of the hydrofluoric acid and perchloric acid:5;
3rd step, glass is hung in vapor placement 20min;
4th step, takes out glass under vacuum condition, 50 DEG C dry.
Embodiment 4
Glass cleaning procedure for making mirror substrate, comprises the following steps:
The first step, glass is put into solvent ethylene glycol or isopropanol, is heated to 48 DEG C, and the ultrasonic wave for being 110KHz with frequency is clear 1min is washed, is pulled out, is dried naturally;
Second step, the hydrofluoric acid and mass concentration for being 2.3% by mass concentration is after 16% perchloric acid is mixed, to be sprayed on glass table Face, is then dried with cotton;The mass ratio 1 of the hydrofluoric acid and perchloric acid:5;
3rd step, glass is hung in vapor placement 14min;
4th step, takes out glass under vacuum condition, 48 DEG C dry.
Reference examples 1
Difference with embodiment 4 is:The first step soaked in solvent.
Glass cleaning procedure for making mirror substrate, comprises the following steps:
The first step, glass is put into solvent ethylene glycol or isopropanol, pulled out, is dried naturally;
Second step, the hydrofluoric acid and mass concentration for being 2.3% by mass concentration is after 16% perchloric acid is mixed, to be sprayed on glass table Face, is then dried with cotton;The mass ratio 1 of the hydrofluoric acid and perchloric acid:5;
3rd step, glass is hung in vapor placement 14min;
4th step, takes out glass under vacuum condition, 48 DEG C dry.
Reference examples 2
Difference with embodiment 3 is:Omit the 3rd step.
Glass cleaning procedure for making mirror substrate, comprises the following steps:
The first step, glass is put into solvent ethylene glycol or isopropanol, is heated to 50 DEG C, and the ultrasonic wave for being 200KHz with frequency is clear 2min is washed, is pulled out, is dried naturally;
Second step, the hydrofluoric acid and mass concentration for being 3% by mass concentration is after 20% perchloric acid is mixed, to be sprayed on glass surface, Then dried with cotton;The mass ratio 1 of the hydrofluoric acid and perchloric acid:5;
3rd step, takes out glass under vacuum condition, 50 DEG C dry.
Silver-colored (Ag) metallic reflector of last layer is plated with physical method on the glass of embodiment and reference examples, one is then applied again To two layers of protective paint, test performance.
As can be seen from the table, glass of the invention is used to make mirror substrate, surfacing and colour-fast.Ultrasonication is not It is only capable of making glass cleaning cleaner and the closer not fugitive color of the compactness of metallic reflector and glass can be made, vapor can To dissolve dirt, remove the pollution particle of glass surface and be difficult to the pollution in place to go, there is the dissolving, disperse of height, repair, Clean effect significantly, makes final obtained mirror-smooth smooth.

Claims (5)

1. the glass cleaning procedure for making mirror substrate, it is characterised in that comprise the following steps:
The first step, glass is put into solvent, is heated to 40~50 DEG C, ultrasonic wave cleans 1~2min, pulls out, dries naturally;
Second step, the hydrofluoric acid and mass concentration for being 2~3% by mass concentration is after 10~20% perchloric acid are mixed, to be sprayed on glass Glass surface, is then dried with cotton;
3rd step, glass is hung in vapor 10~20min of placement;
4th step, takes out glass under vacuum condition, 40~50 DEG C dry.
2. the glass cleaning procedure according to claim 1 for being used to make mirror substrate, it is characterised in that in the first step, The solvent is ethylene glycol or isopropanol.
3. the glass cleaning procedure according to claim 1 or 2 for being used to make mirror substrate, it is characterised in that the first step In, the frequency of the ultrasonic wave is 10~200KHz.
4. the glass cleaning procedure according to claim 3 for being used to make mirror substrate, it is characterised in that in the first step, Under the conditions of 45 DEG C, the ultrasonic wave for being 50KHz with frequency cleans 1.2min.
5. the glass cleaning procedure according to claim 1 for being used to make mirror substrate, it is characterised in that in second step, The mass ratio 1 of hydrofluoric acid and perchloric acid:5.
CN201710434921.2A 2017-06-10 2017-06-10 Glass cleaning procedure for making mirror substrate Pending CN107159667A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201710434921.2A CN107159667A (en) 2017-06-10 2017-06-10 Glass cleaning procedure for making mirror substrate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201710434921.2A CN107159667A (en) 2017-06-10 2017-06-10 Glass cleaning procedure for making mirror substrate

Publications (1)

Publication Number Publication Date
CN107159667A true CN107159667A (en) 2017-09-15

Family

ID=59825667

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201710434921.2A Pending CN107159667A (en) 2017-06-10 2017-06-10 Glass cleaning procedure for making mirror substrate

Country Status (1)

Country Link
CN (1) CN107159667A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109604245A (en) * 2018-12-04 2019-04-12 芜湖通潮精密机械股份有限公司 A kind of organic glass surface contaminant cleaning treatment method

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1891358A (en) * 2005-06-27 2007-01-10 岛田理化工业株式会社 Substrate cleaning system and substrate cleaning method
US20110146909A1 (en) * 2004-06-09 2011-06-23 Lam Research Corporation Methods for wet cleaning quartz surfaces of components for plasma processing chambers
CN102466988A (en) * 2010-11-03 2012-05-23 中国科学院微电子研究所 High-temperature water vapor and water mixed jet cleaning system and method
CN103111434A (en) * 2013-01-15 2013-05-22 安徽康蓝光电股份有限公司 Final cleaning technique in sapphire processing
CN103241957A (en) * 2013-05-28 2013-08-14 湖北优尼科光电技术有限公司 Method for thinning and etching glass substrate
JP2013214757A (en) * 2013-05-17 2013-10-17 Dainippon Screen Mfg Co Ltd Substrate processing method
CN104926147A (en) * 2015-05-29 2015-09-23 中国科学院上海光学精密机械研究所 Method for treating surface of fluorphosphate glass

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20110146909A1 (en) * 2004-06-09 2011-06-23 Lam Research Corporation Methods for wet cleaning quartz surfaces of components for plasma processing chambers
CN1891358A (en) * 2005-06-27 2007-01-10 岛田理化工业株式会社 Substrate cleaning system and substrate cleaning method
CN102466988A (en) * 2010-11-03 2012-05-23 中国科学院微电子研究所 High-temperature water vapor and water mixed jet cleaning system and method
CN103111434A (en) * 2013-01-15 2013-05-22 安徽康蓝光电股份有限公司 Final cleaning technique in sapphire processing
JP2013214757A (en) * 2013-05-17 2013-10-17 Dainippon Screen Mfg Co Ltd Substrate processing method
CN103241957A (en) * 2013-05-28 2013-08-14 湖北优尼科光电技术有限公司 Method for thinning and etching glass substrate
CN104926147A (en) * 2015-05-29 2015-09-23 中国科学院上海光学精密机械研究所 Method for treating surface of fluorphosphate glass

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109604245A (en) * 2018-12-04 2019-04-12 芜湖通潮精密机械股份有限公司 A kind of organic glass surface contaminant cleaning treatment method

Similar Documents

Publication Publication Date Title
CN104009122B (en) The do over again processing method of silicon chip of a kind of serigraphy
CN102817245A (en) Treatment method for glass fiber cloth
CN104259132A (en) Technology for cleaning sapphire wafer
CN107587129A (en) A kind of stainless steel passivation process for improving stainless steel corrosion resistance
CN109092792A (en) A kind of ceramic substrate surface processing method
CN104324922A (en) Method for removing adhesive residue of touch screen
WO2023202192A1 (en) Method for cleaning single-side-polished lithium niobate wafer
CN102643113B (en) Production method of polytetrafluoroethylene impregnated graphite heat exchange block
CN107159667A (en) Glass cleaning procedure for making mirror substrate
CN109530325A (en) A kind of glass pieces deinking processing method
CN104772313B (en) A kind of cleaning method of sapphire wafer after plated film
CN107460429B (en) A kind of plasma spray process
CN105957800A (en) Substrate surface treatment process
CN205762486U (en) A kind of enamel-covered wire automatic clearing apparatus
CN109755106B (en) Wafer cleaning method
CN106733907A (en) A kind of cleaning method of nuclear fuel element screen work band
CN115338180A (en) Novel ferrite metallization cleaning method
CN109926385B (en) Cleaning method of mobile phone glass
CN103157620A (en) Cleaning fluid and cleaning method of silicon wafer back before metalization
CN109174778A (en) A kind of white glass cleaning process
CN216064749U (en) Glass cleaning system
CN107987634A (en) A kind of self-cleaning nona coating suitable on windshield
CN107838109A (en) A kind of electro-conductive glass cleaning device and electro-conductive glass cleaning method
CN207723128U (en) A kind of electro-conductive glass cleaning device
CN107523448A (en) A kind of cleaning agent of cleaning fan of sucking oil fume heavy oil stain and preparation method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication

Application publication date: 20170915

RJ01 Rejection of invention patent application after publication