CN115338180A - Novel ferrite metallization cleaning method - Google Patents

Novel ferrite metallization cleaning method Download PDF

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Publication number
CN115338180A
CN115338180A CN202210541575.9A CN202210541575A CN115338180A CN 115338180 A CN115338180 A CN 115338180A CN 202210541575 A CN202210541575 A CN 202210541575A CN 115338180 A CN115338180 A CN 115338180A
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cleaning
ultrasonic
pure water
ferrite
follows
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CN202210541575.9A
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Inventor
唐兴友
孙世刚
徐健
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Coreway Optech Co ltd
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Coreway Optech Co ltd
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Priority to CN202210541575.9A priority Critical patent/CN115338180A/en
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/08Cleaning involving contact with liquid the liquid having chemical or dissolving effect
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04Cleaning involving contact with liquid
    • B08B3/10Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B08CLEANING
    • B08BCLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B2203/00Details of cleaning machines or methods involving the use or presence of liquid or steam
    • B08B2203/007Heating the liquid

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Cleaning By Liquid Or Steam (AREA)

Abstract

A novel ferrite metallization cleaning method relates to the technical field of non-metallic magnetic materials and solves the technical problem that the use of subsequent devices brings huge risks due to the fact that an existing ferrite substrate cannot be thoroughly cleaned.

Description

Novel ferrite metallization cleaning method
Technical Field
The invention relates to the technical field of non-metallic magnetic materials, in particular to a novel ferrite metallization cleaning method.
Background
Ferrite is a metal oxide having ferrimagnetism, is a non-metallic magnetic material, is produced in a process and looks like ceramics, and is also called magnetic porcelain. Different types of ferrites have different surface appearances, and most ferrites have the concentrations of lattice defects such as dense pits, more dislocations, complex grain boundaries and the like. After the polishing treatment, a large amount of organic matters such as polishing agent and polishing paste remain in the surface defects. Therefore, special surface cleaning treatment is required before metallization is performed on the surface of the metal layer, and incomplete cleaning causes defects such as delamination and bubbling of the metallization layer.
The traditional surface cleaning method can not thoroughly clean the ferrite substrate, and inorganic and organic matters caused by residual polishing treatment in surface defects seriously cause metal layer delamination and bubbling, and can bring huge risks to the use of a following device.
Therefore, a novel cleaning method for ferrite metallization is designed to solve the technical problems.
Disclosure of Invention
The invention aims to: in order to solve the technical problem that the ferrite substrate cannot be thoroughly cleaned, which is provided in the background art, so that the subsequent devices are used to bring huge risks, the invention provides a novel ferrite metallization cleaning method.
The invention specifically adopts the following technical scheme for realizing the purpose:
a novel ferrite metallization cleaning method is characterized by comprising the following specific cleaning methods:
(1) The ferrite substrate is put into a cleaning solvent with the temperature of 60 ℃, ultrasonic treatment is carried out for 250w and 10min, and oil stains, polishing agents, polishing pastes, micro-powder particles and the like in the production process of the ferrite substrate can be effectively removed;
(2) And (3) transferring to pure water at 80 ℃ for ultrasonic cleaning for 20min, wherein the ultrasonic power is as follows: 100w;
(3) And (3) transferring to new pure water with the temperature of 80 ℃ for ultrasonic cleaning for 10min, wherein the ultrasonic power is as follows: 100w;
(4) 10% KOH solution heating 90 ℃ ultrasonic cleaning for 30min, ultrasonic power: 230w, slightly corroding the surface of the ferrite substrate to remove dirt;
(5) Ultrasonic cleaning with pure water at 80 ℃ for 2min, wherein the ultrasonic power is as follows: 100w;
(6) Ultrasonic cleaning with 3% hydrochloric acid solution at room temperature for 10min, wherein the ultrasonic power is as follows: 100w, can effectively remove the particulate metal in the production process of the ferrite substrate, and neutralize the alkali liquor and the like in the step 4;
(7) Ultrasonic cleaning with pure water at 80 ℃ for 30min, wherein the ultrasonic power is as follows: 100w;
(8) Carrying out ultrasonic cleaning on the isopropanol organic solvent for 15min, wherein the ultrasonic power is as follows: 200w, organic matters and the like on the surface of the ferrite substrate can be effectively removed;
(9) And (5) drying the ferrite substrate by a drying machine.
Further, all the pure water in the pure water cleaning is pollution-free pure water, and the purpose of the pure water cleaning is also to achieve the cleaning effect.
Further, after the step (9), the ferrite substrate is baked at 200 ℃ for 60min, so that the water vapor in the ferrite substrate can be further volatilized.
Further, the formula of the cleaning solvent in the step (1) is sodium carbonate: 15-30 g/L; sodium bicarbonate: 2-10 g/L; sodium pyrophosphate: 5-15 g/L; sodium silicate: 5-20 g/L; 1-3g/L of emulsifier.
The invention has the beneficial effects that:
1. the cleaning solvent prepared by the cleaning agent contains abundant and efficient surfactant components, and can effectively remove dust, particles, organic matters and other dirt on the surface of ferrite by the aid of ultrasonic heating.
2. The invention can wash the ferrite substrate more deeply by multi-step washing, and avoids the residue in the ferrite substrate.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention will be clearly and completely described below, and it is obvious that the described embodiments are a part of the embodiments of the present invention, but not all of the embodiments.
All other embodiments, which can be obtained by a person skilled in the art without inventive step based on the embodiments of the present invention, are within the scope of protection of the present invention.
It should be noted that: the terms "first," "second," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
In the description of the embodiments of the present invention, it should be noted that the terms "inside", "outside", "upper", and the like refer to an orientation or a positional relationship that is usually placed when the product of the present invention is used, and are used only for convenience of description and simplification of description, but do not indicate or imply that the device or the element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention.
Example 1
Preparing a cleaning solvent: sodium carbonate: 15g/L; sodium bicarbonate: 2g/L; sodium pyrophosphate: 5g/L; sodium silicate: 5g/L; 1g/L of emulsifier.
In the embodiment, the ferrite substrate is firstly put into a prepared cleaning solvent with the temperature of 60 ℃, ultrasonic cleaning is carried out for 10min, then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ for ultrasonic cleaning for 20min, then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ in a new tank for ultrasonic cleaning for 10min, a prepared 10% potassium hydroxide solution is heated to 90 ℃, ultrasonic cleaning is carried out for 30min by increasing ultrasonic power, and then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ again for ultrasonic cleaning for 2min. 3% diluted hydrochloric acid solution is prepared, and ultrasonic cleaning is carried out for 10min at room temperature. Then, the mixture is transferred to hot pure water at 80 ℃ again for ultrasonic cleaning for 30min. Finally, ultrasonic cleaning is carried out for 15min by using IPA. And drying and baking to finish cleaning. Through the cleaning, the metallization binding force on the ferrite base material is greatly improved.
Example 2
Preparing a cleaning solvent: sodium carbonate: 20g/L; sodium bicarbonate: 5g/L; sodium pyrophosphate: 10g/L; sodium silicate: 10g/L; the emulsifier is 2g/L.
In the embodiment, the ferrite substrate is firstly put into a prepared cleaning solvent with the temperature of 60 ℃, ultrasonic cleaning is carried out for 10min, then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ for ultrasonic cleaning for 20min, then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ in a new tank for ultrasonic cleaning for 10min, a prepared 10% potassium hydroxide solution is heated to 90 ℃, ultrasonic cleaning is carried out for 30min by increasing ultrasonic power, and then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ again for ultrasonic cleaning for 2min. 3% diluted hydrochloric acid solution is prepared, and ultrasonic cleaning is carried out for 10min at room temperature. Then, the mixture is ultrasonically cleaned again in hot pure water at 80 ℃ for 30min. Finally, ultrasonic cleaning is carried out for 15min by using IPA. And drying and baking to finish cleaning.
Example 3
Preparing a cleaning solvent: sodium carbonate: 30g/L; sodium bicarbonate: 10g/L; sodium pyrophosphate: 15g/L; sodium silicate: 20g/L; emulsifier 3g/L
In the embodiment, the ferrite substrate is firstly put into a prepared cleaning solvent with the temperature of 60 ℃, ultrasonic cleaning is carried out for 10min, then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ for ultrasonic cleaning for 20min, then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ in a new tank for ultrasonic cleaning for 10min, a prepared 10% potassium hydroxide solution is heated to 90 ℃, ultrasonic cleaning is carried out for 30min by increasing ultrasonic power, and then the ferrite substrate is transferred into hot pure water with the temperature of 80 ℃ again for ultrasonic cleaning for 2min. 3% diluted hydrochloric acid solution is prepared, and ultrasonic cleaning is carried out for 10min at room temperature. Then, the mixture is ultrasonically cleaned again in hot pure water at 80 ℃ for 30min. Finally, ultrasonic cleaning is carried out for 15min by using IPA. And drying and baking to finish cleaning.
The following table is comparative data for conventional products and the present application, specifically as follows:
Figure RE-GDA0003844213330000031
Figure RE-GDA0003844213330000041
as can be seen from the above table, the adhesion of the film layer is significantly better in the three groups of examples than in the control group.
It will be appreciated by those skilled in the art that the invention may be embodied in other specific forms without departing from the spirit or essential characteristics thereof. The embodiments disclosed above are therefore to be considered in all respects as illustrative and not restrictive. All changes which come within the scope of or equivalence to the invention are intended to be embraced therein.

Claims (4)

1. A novel ferrite metallization cleaning method is characterized by comprising the following specific cleaning methods:
(1) Putting the ferrite substrate into a cleaning solvent with the temperature of 60 ℃ and carrying out ultrasonic 250w for 10min;
(2) And (3) transferring to pure water at 80 ℃ for ultrasonic cleaning for 20min, wherein the ultrasonic power is as follows: 100w;
(3) And (3) transferring to new pure water with the temperature of 80 ℃ for ultrasonic cleaning for 10min, wherein the ultrasonic power is as follows: 100w;
(4) 10% KOH solution heating 90 ℃ ultrasonic cleaning for 30min, ultrasonic power: 230w;
(5) Ultrasonic cleaning with pure water at 80 ℃ for 2min, wherein the ultrasonic power is as follows: 100w;
(6) Ultrasonic cleaning with 3% hydrochloric acid solution at room temperature for 10min, wherein the ultrasonic power is as follows: 100w;
(7) Ultrasonic cleaning with pure water at 80 ℃ for 30min, wherein the ultrasonic power is as follows: 100w;
(8) Carrying out ultrasonic cleaning on the isopropanol organic solvent for 15min, wherein the ultrasonic power is as follows: 200w;
(9) And (5) drying the ferrite substrate by a drying machine.
2. The method as claimed in claim 1, wherein the pure water used in the pure water cleaning of claim 1 is non-pollution pure water.
3. The method as claimed in claim 1, wherein the ferrite substrate is baked at 200 ℃ for 60min after step (9).
4. The novel ferrite metallization cleaning method according to claim 1, wherein the formulation of the cleaning solvent in the step (1) is sodium carbonate: 15-30 g/L; sodium bicarbonate: 2-10 g/L; sodium pyrophosphate: 5-15 g/L; sodium silicate: 5-20 g/L; 1-3g/L of emulsifier.
CN202210541575.9A 2022-05-18 2022-05-18 Novel ferrite metallization cleaning method Pending CN115338180A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117835790A (en) * 2024-03-06 2024-04-05 四川科尔威光电科技有限公司 Semiconductor refrigerator substrate metallization method and semiconductor refrigerator metallization substrate

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103624028A (en) * 2013-11-27 2014-03-12 西南应用磁学研究所 Ferrite substrate cleaning technology method based on neutral solution
CN112452936A (en) * 2020-12-15 2021-03-09 中国电子科技集团公司第九研究所 Method for cleaning and processing metal film circuit on ferrite substrate before electroplating
CN113522848A (en) * 2021-07-19 2021-10-22 中国电子科技集团公司第九研究所 Surface activation method for ferrite single crystal substrate
CN113930733A (en) * 2021-09-14 2022-01-14 赛创电气(铜陵)有限公司 Magnetron sputtering method for ferrite processing

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103624028A (en) * 2013-11-27 2014-03-12 西南应用磁学研究所 Ferrite substrate cleaning technology method based on neutral solution
CN112452936A (en) * 2020-12-15 2021-03-09 中国电子科技集团公司第九研究所 Method for cleaning and processing metal film circuit on ferrite substrate before electroplating
CN113522848A (en) * 2021-07-19 2021-10-22 中国电子科技集团公司第九研究所 Surface activation method for ferrite single crystal substrate
CN113930733A (en) * 2021-09-14 2022-01-14 赛创电气(铜陵)有限公司 Magnetron sputtering method for ferrite processing

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN117835790A (en) * 2024-03-06 2024-04-05 四川科尔威光电科技有限公司 Semiconductor refrigerator substrate metallization method and semiconductor refrigerator metallization substrate
CN117835790B (en) * 2024-03-06 2024-06-04 四川科尔威光电科技有限公司 Semiconductor refrigerator substrate metallization method and semiconductor refrigerator metallization substrate

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Application publication date: 20221115