CN107101629A - A kind of silicon micro mechanical graphene beam resonant mode gyroscope - Google Patents
A kind of silicon micro mechanical graphene beam resonant mode gyroscope Download PDFInfo
- Publication number
- CN107101629A CN107101629A CN201710324290.9A CN201710324290A CN107101629A CN 107101629 A CN107101629 A CN 107101629A CN 201710324290 A CN201710324290 A CN 201710324290A CN 107101629 A CN107101629 A CN 107101629A
- Authority
- CN
- China
- Prior art keywords
- graphene
- resonance beam
- graphene resonance
- resonance
- gyro
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5607—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating tuning forks
- G01C19/5621—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating tuning forks the devices involving a micromechanical structure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5642—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating bars or beams
- G01C19/5656—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using vibrating bars or beams the devices involving a micromechanical structure
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01C—MEASURING DISTANCES, LEVELS OR BEARINGS; SURVEYING; NAVIGATION; GYROSCOPIC INSTRUMENTS; PHOTOGRAMMETRY OR VIDEOGRAMMETRY
- G01C19/00—Gyroscopes; Turn-sensitive devices using vibrating masses; Turn-sensitive devices without moving masses; Measuring angular rate using gyroscopic effects
- G01C19/56—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces
- G01C19/5705—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis
- G01C19/5712—Turn-sensitive devices using vibrating masses, e.g. vibratory angular rate sensors based on Coriolis forces using masses driven in reciprocating rotary motion about an axis the devices involving a micromechanical structure
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Radar, Positioning & Navigation (AREA)
- Remote Sensing (AREA)
- Gyroscopes (AREA)
Abstract
The invention discloses a kind of silicon micro mechanical graphene beam resonant mode gyroscope, including glass substrate, transfer beams, lever transmission part, fixed mass block driving comb, gyro mass, the first graphene resonance beam, the second graphene resonance beam and frame.Using graphene resonance beam as secondary sensitive structure, the change for indirect sensitization axial stress in transfer beams.Resonance sensitive structure is used as using graphene resonance beam, graphene resonance beam in axisymmetric position is during the axial coriolis force change of impression, one is in axial tension state, another is in the state that is compressed axially (in resonant frequency range), and two graphene resonance beams are identical to sensitive capabilities such as temperature fields.By two symmetrical graphene resonance beams and the characteristics of can the giving full play of graphene resonance beam small volume, flexible structure, big fracture strength and high mechanical quality factor of combining closely of silicon micromechanical gyroscope, variate, high sensitivity and the high measurement accuracy of silicon micro mechanical graphene beam resonant mode gyroscope are realized.
Description
Technical field
The invention belongs to the technical field of micro-/nano electromechanical systems, and in particular to a kind of silicon micro mechanical graphene beam resonant mode
Gyroscope.
Background technology
Gyro can rotate as a kind of sensor for measuring measured object angular speed for discrimination object within the unit interval
Angle, have very important effect in gesture stability and navigator fix field.Due to tradition machinery gyro have volume it is big,
Cost is high, be not suitable for the undesirable elements such as batch production so that silicon micromechanical gyroscope is so that its small volume, light weight, cost be low, power consumption
Small, reliability is high and shows one's talent from the manufacture of numerous gyros the advantages of big measurement range, is obtained in civilian and military industry field
It is widely applied.1988, U.S.'s Draper lab designs simultaneously processed first silicon micromechanical gyroscope, and the gyro passes through
Measure the differential capacitance variable quantity of a pair of electric capacity collection plates to obtain angular speed, precision is apparently higher than classical spinning top.The gyro makes
Capacitance determining method has that temperature drift is small, sensitivity is high, good reliability the characteristics of.But with silicon micro mechanical inertia device structure
Continuing to optimize for size, steps into micro-nano rank field so that the Signal-to-Noise exported by capacitance detecting is very low.Cause
This, Seshia of University of California-Berkeley in 2002 et al. proposes the imagination of silicon micromachine resonant gyro simultaneously
Principle prototype is produced.The clamped tuning fork of both-end (DEFT) is converted into by the change for the coriolis force for producing input angular velocity humorous
The change of vibration frequency, can be effectively prevented from the noise jamming produced in capacitance detecting.The resonance sensing unit wherein used
With the good characteristics that reproducible, resolving power is high and stability is strong, therefore silicon micromachine resonant gyro is as people's research
Emphasis.
The correlation theory research of graphene just has begun to from nineteen forty-seven.Univ Manchester UK physicist in 2004
Andre Geim and Konstantin Novoselov isolate single-layer graphene using micromechanics stripping method success from graphite.
Self-existent two-dimensional graphene crystal is obtained in fields such as high-performance nanometer electronic device, composite, resonant transducers
It is widely applied.Because the theoretic throat of graphene individual layer is 0.335nm, fracture strength is 40N/m close to theoretical limit, room temperature
Lower Young's modulus is 1.0TPa, and Elastic extensibility is much better than the overload capacity of the materials such as silicon, CNT up to 20%.
Because for silicon micro-resonance type gyro, the difference that sensitive material is produced to environmental factors such as temperature, vibrations causes humorous
The change of vibration frequency has important influence to the measurement accuracy and job stability of sensor.Therefore graphene resonance beam is in silicon microcomputer
It can give full play of as sensitive material that small volume, flexible structure, fracture strength be big and mechanical quality factor in tool gyro
High the characteristics of.And the fundamental research of graphene beam resonant mode gyro, key technology break through more than based on empirical theory, tool
Body carries out resonance characteristic research using graphene as sensitive structure, and the resonant mode gyroscope exported with differential composite sensing is still located
In research blank.
The content of the invention
The technical problem to be solved in the present invention is:Overcome the shortcomings of on existing silicon micro-resonance type gyroscope technology, make full use of
There is provided a kind of silicon that a kind of size is small, flexible structure, strong antijamming capability, measurement range are big for the high-quality feature of grapheme material
Micromechanics graphene beam resonant mode gyroscope, realizes graphene resonance beam and the close coupling of silicon micromechanical gyroscope.
The technical solution adopted for the present invention to solve the technical problems is:A kind of silicon micro mechanical graphene beam resonant mode gyro
Instrument, including glass substrate, transfer beams, lever transmission part, fixed mass block driving comb, gyro mass, the first graphene
Resonance beam, the second graphene resonance beam and frame, lever transmission part, fixed mass block driving comb and gyro mass are fixed
On a glass substrate;The fixed pedestal of gyro mass can allow gyro mass to have displacement in normal orientation;Lever is passed
Pass part to link together with gyro mass, left-right parts are in symmetrical structure;First graphene resonance beam and the second graphite
Alkene resonance beam is placed in transfer beams and positioned between lever transmission part and frame, goes into the clamped resonance beam of both-end, and two
The geometric identity of graphene resonance beam the first graphene resonance beam and the second graphene resonance beam, is completely in vacuum ring
Border.
Wherein, the transfer beams, lever transmission part, fixed mass block driving comb it is identical with gyro quality block of material and
It is each attached to above glass substrate, the first graphene resonance beam is identical with the second graphene resonance beam material therefor and is each attached to
In transfer beams and positioned between lever transmission part and frame, an entirety is consequently formed.
Wherein, the transfer beams, lever transmission part, fixed mass block driving comb and gyro quality block of material can pass through
Material etch mode is formed;First graphene resonance beam and the second graphene resonance beam material therefor can pass through stripping and growth side
Formula is obtained.
Wherein, the lever transmission part, fixed mass block driving comb and gyro mass are put in same level
Put structure normal orientation fixed mass block driving comb and axial direction lever transmission part it is full symmetric;First graphene
Resonance beam and the second graphene resonance beam in same level, be placed on it is on same horizontal line and full symmetric along normal direction,
The influence by measuring pressure and environment can be experienced simultaneously.
Wherein, excitation-pick-up mode that the first graphene resonance beam and the second graphene resonance beam are used with
And relevant parameter is consistent;
When described excitation-pick-up mode be electrical way when, metal electrode respectively be located at the first graphene resonance beam and
Wire is respectively welded on two rectangle short side centers of the second graphene resonance beam, metal electrode;
When described excitation-pick-up mode is optical mode, laser facula should be directed at the first graphene resonance beam and the
The center of two graphene resonance beams.
The advantage of the present invention compared with prior art is:
In the present invention, by the way that graphene resonance beam, as the sensitive structure in silicon micromechanical gyroscope key technology, is met
Graphene resonance beam sensitive structure high-precision, inexpensive, small volume, reaction is fast, dynamic range is big, adapt to adverse circumstances
It is strict with, makes gyroscope that there is the performance that the linearity is good, zero stability is high, drift rate is low, anti-impact force is strong, realize humorous
In formula of shaking sensor the characteristics of highly reliable, high mechanical quality factor, symmetrical measurement.Can be in biology, medical treatment, industrial machinery, aviation
Space flight, safety protection field have larger application.
Brief description of the drawings
Fig. 1 is a kind of structure top view of silicon micro mechanical graphene beam resonant mode gyroscope of the invention.
Fig. 2 is a kind of stereochemical structure exploded view of silicon micro mechanical graphene beam resonant mode gyroscope of the invention.
Fig. 3 is a kind of sensitive structure profile of silicon micro mechanical graphene beam resonant mode gyroscope of the invention.
Embodiment
Below in conjunction with the accompanying drawings and embodiment further illustrates the present invention.
As Figure 1-3, a kind of silicon micro mechanical graphene beam resonant mode gyroscope angular-rate sensor, including glass substrate
1st, transfer beams 2, lever transmission part 3, fixed mass block driving comb 4, gyro mass 5, the first graphene resonance beam 6,
Two graphene resonance beams 7 and frame 8.
The gyroscope structure simple shape, transfer beams 2, lever transmission part 3, fixed mass block in glass substrate 1
Four part of devices thickness of driving comb 4 and gyro mass 5 do not influence on integrally-built intrinsic frequency, therefore select state
The Bulk micro machining technology of interior comparative maturity.By using silicon-glass anodic bonding, silicon deep etching process technology, it can be achieved
The large-scale mode of production.
Selection N-type silicon or P-type silicon are simultaneously cleaned up, by the two-sided oxidation of silicon chip, and (front side of silicon wafer enters rower in front
Know) carry out photoetching process.After photoetching, the silica of developing location is etched away.After removing photoresist, used with silica as mask
Downward 3 μm -0.5 μm of the positive silicon face of KOH solution corrosion.Key is formed at fixed mass block driving comb 4 and the anchor point of frame 8
Close.Injected in silicon front and spread phosphorus or boron wait electrostatic bonding.
Go out concave pattern in the photomask surface of glass substrate 1 with silicon similar thermal expansion coefficient, and sputter Au electrodes to be formed
Electrode and lead wait electrostatic bonding.
The heat produced in bonding process can be effectively reduced using the glass substrate 1 with silicon chip similar thermal expansion coefficient should
Power, the stronger thermal stress produced in traditional heating bonding process is avoided by anode/electrostatic bonding under electric field action and is become
Change.In the electric field formed on si-glass contact surface, the nominal price sodium ion in glass drifts about to negative electrode, makes connecing for si-glass
Contacting surface is closely combined together.
Silicon wafer turnover is bonded with glass substrate 1 makes the boss of front side of silicon wafer turn into fixed structure, including transfer beams 2, thick stick
Bar transmitting portions 3, fixed mass block driving comb 4 and gyro mass 5, and it is connected with lead with electrode, continue to use
KOH solution corrosion is thinned, and forms the structure sheaf of silicon micromechanical gyroscope.On silicon chip carry out secondary light quarter, make by lithography transfer beams 2,
Two normal orientations in lever transmission part 3, fixed mass block driving comb 4, gyro mass 5 and two transfer beams 2
Groove, the groove is used for building two graphene beams on axial direction.
First graphene resonance beam 6, the second graphene resonance beam 7 are in same level, and placement direction is in axial direction
Level is consistent, and the method that can be by mechanically pulling off method and chemical vapor deposition is obtained.The thickness of single layer graphene film is
0.335nm, the first graphene resonance beam 6 of the present invention, the second graphene resonance beam 7 formation clamped resonance beam of both-end, thickness
For 1~1000 layer, trench length is 100~10000 times of graphene resonance cantilever thickness, vacuum environment is in, such as Fig. 3 institutes
Show.
Excitation-pick-up mode that first graphene resonance beam 6, the second graphene resonance beam 7 are used is identical, metal
Electrode is located at two resonance beam short side centers respectively.
The driving force and damping force for realizing that reduction is coupled on detection axle are encapsulated using vacuum, gyroscope is greatly enhanced
Quality factor, improve gyroscope performance.
The present invention principle and the course of work be:There are two vibration modes in the micromechanical gyro course of work, one is
Normal vibration pattern, that is, drive vibration mode, normally referred to as with reference to vibration mode, and itself is in resonant condition, in coriolis force
Additional movement can be produced under effect;Another is axial vibration pattern, i.e., the pattern of sensitive vibration, by reflecting the attached of coriolis force
Plus the detection of motion, obtain the angular velocity information being included in coriolis force.
In the present invention, fixed mass block driving comb 4 provides the resonant condition of normal orientation for gyro.When angular speed is defeated
Enter into gyro, gyro mass 5 is used for the change for experiencing angular speed, lever transmission part 3 is used to amplify coriolis force, makes transmission
Beam 2 produces the change of internal stress in the axial direction.Due to each position axial direction internal stress change all same in transfer beams 2, therefore
The two graphene resonance beams (the first graphene resonance beam 6 and the second graphene resonance beam 7) placed in transfer beams 2 at groove can
To experience the change of the internal stress in transfer beams 2.By one in one the first graphene in compressive state of extended state
The change of the internal stress of 6 and second graphene resonance beam of resonance beam 7, the axial coriolis force that gyro mass is exported to it is converted to
Corresponding rate-adaptive pacemaker, by resonant frequency during graphene resonance beam original state and by resonant frequency during axial coriolis force
Change can obtain corresponding axial coriolis force, so the angular speed change that can be inputted.
Claims (5)
1. a kind of silicon micro mechanical graphene beam resonant mode gyroscope, including glass substrate (1), transfer beams (2), lever transmission part
(3), fixed mass block driving comb (4), gyro mass (5), the first graphene resonance beam (6), the second graphene resonance beam
And frame (8) (7), it is characterised in that:Lever transmission part (3), fixed mass block driving comb (4) and gyro mass (5)
It is fixed in glass substrate (1);The fixed pedestal of gyro mass (5) can allow gyro mass (5) in normal orientation
There is displacement;Lever transmission part (3) links together with gyro mass (5), and left-right parts are in symmetrical structure;First graphite
Alkene resonance beam (6) and the second graphene resonance beam (7) are placed in transfer beams (2) and positioned at lever transmission part (3) and frame
(8) between, the clamped resonance beam of both-end, and two graphene resonance beam the first graphene resonance beams (6) and the second graphene are gone into
The geometric identity of resonance beam (7), is completely in vacuum environment.
2. a kind of silicon micro mechanical graphene beam resonant mode gyroscope as claimed in claim 1, it is characterised in that:The transfer beams
(2), lever transmission part (3), fixed mass block driving comb (4) is identical with gyro mass (5) material and is each attached to glass
Above, the first graphene resonance beam (6) is identical with second graphene resonance beam (7) material and is each attached to transmission for glass substrate (1)
On beam (2) and positioned between lever transmission part (3) and frame (8), an entirety is consequently formed.
3. a kind of silicon micro mechanical graphene beam resonant mode gyroscope as claimed in claim 1, it is characterised in that:The transfer beams
(2), lever transmission part (3), fixed mass block driving comb (4) and gyro mass (5) material can pass through material etch etc.
Mode is formed;First graphene resonance beam (6) and second graphene resonance beam (7) material can be obtained by the mode such as stripping and growth
.
4. a kind of silicon micro mechanical graphene beam resonant mode gyroscope as claimed in claim 1, it is characterised in that:The lever is passed
Part (3), fixed mass block driving comb (4) and gyro mass (5) are passed in same level, displacement structure normal orientation
Fixed mass block driving comb (4) and axial direction lever transmission part (3) it is full symmetric;First graphene resonance beam
(6) and the second graphene resonance beam (7) is in same level, be placed on it is on same horizontal line and full symmetric along normal direction,
The influence by measuring pressure and environment can be experienced simultaneously.
5. a kind of silicon micro mechanical graphene beam resonant mode gyroscope as claimed in claim 1, it is characterised in that:First stone
Excitation-pick-up the mode and relevant parameter that black alkene resonance beam (6) is used with the second graphene resonance beam (7) are consistent;
When described excitation-pick-up mode is electrical way, metal electrode is located at the first graphene resonance beam (6) and the respectively
Wire is respectively welded on two rectangle short side centers of two graphene resonance beams (7), metal electrode;
When described excitation-pick-up mode is optical mode, laser facula should be directed at the first graphene resonance beam (6) and second
The center of graphene resonance beam (7).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710324290.9A CN107101629B (en) | 2017-05-10 | 2017-05-10 | Silicon micromechanical graphene beam resonant gyroscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710324290.9A CN107101629B (en) | 2017-05-10 | 2017-05-10 | Silicon micromechanical graphene beam resonant gyroscope |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107101629A true CN107101629A (en) | 2017-08-29 |
CN107101629B CN107101629B (en) | 2019-12-17 |
Family
ID=59669634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710324290.9A Active CN107101629B (en) | 2017-05-10 | 2017-05-10 | Silicon micromechanical graphene beam resonant gyroscope |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107101629B (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108413953A (en) * | 2018-02-27 | 2018-08-17 | 郑州轻工业学院 | A kind of adjustable gain control surface acoustic wave gyroscope based on graphene film |
CN112444239A (en) * | 2019-08-30 | 2021-03-05 | 北京大学 | Geometric compensation type (100) silicon micro-mechanical ring-shaped resonant gyroscope |
CN116907463A (en) * | 2023-09-08 | 2023-10-20 | 华芯拓远(天津)科技有限公司 | High-precision full-decoupling triaxial MEMS gyroscope |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1865851A (en) * | 2006-06-13 | 2006-11-22 | 北京航空航天大学 | Resonant-type micro-mechanical optic fiber gyroscope |
CN101403615A (en) * | 2008-10-24 | 2009-04-08 | 北京航空航天大学 | Direct frequency-output vibration gyroscope structure |
CN102315831A (en) * | 2011-05-04 | 2012-01-11 | 西安电子科技大学 | Preparation method for nano-electromechanical resonator based on graphene |
US8683862B2 (en) * | 2011-11-03 | 2014-04-01 | The United States Of America As Represented By The Secretary Of The Navy | Oscillation apparatus with atomic-layer proximity switch |
CN104215231A (en) * | 2013-06-05 | 2014-12-17 | 中国科学院地质与地球物理研究所 | MEMS high precision resonant beam closed-loop control gyroscope and manufacturing process thereof |
CN104716924A (en) * | 2013-12-11 | 2015-06-17 | 中国科学院苏州纳米技术与纳米仿生研究所 | Graphene resonator and manufacturing method thereof |
CN104819710A (en) * | 2015-05-21 | 2015-08-05 | 北京航空航天大学 | Resonant mode silicon micro-machined gyroscope with temperature compensation structure |
CN106918420A (en) * | 2017-04-21 | 2017-07-04 | 北京航空航天大学 | A kind of pair of Graphene resonance beam type pressure sensor |
-
2017
- 2017-05-10 CN CN201710324290.9A patent/CN107101629B/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1865851A (en) * | 2006-06-13 | 2006-11-22 | 北京航空航天大学 | Resonant-type micro-mechanical optic fiber gyroscope |
CN101403615A (en) * | 2008-10-24 | 2009-04-08 | 北京航空航天大学 | Direct frequency-output vibration gyroscope structure |
CN102315831A (en) * | 2011-05-04 | 2012-01-11 | 西安电子科技大学 | Preparation method for nano-electromechanical resonator based on graphene |
US8683862B2 (en) * | 2011-11-03 | 2014-04-01 | The United States Of America As Represented By The Secretary Of The Navy | Oscillation apparatus with atomic-layer proximity switch |
CN104215231A (en) * | 2013-06-05 | 2014-12-17 | 中国科学院地质与地球物理研究所 | MEMS high precision resonant beam closed-loop control gyroscope and manufacturing process thereof |
CN104716924A (en) * | 2013-12-11 | 2015-06-17 | 中国科学院苏州纳米技术与纳米仿生研究所 | Graphene resonator and manufacturing method thereof |
CN104819710A (en) * | 2015-05-21 | 2015-08-05 | 北京航空航天大学 | Resonant mode silicon micro-machined gyroscope with temperature compensation structure |
CN106918420A (en) * | 2017-04-21 | 2017-07-04 | 北京航空航天大学 | A kind of pair of Graphene resonance beam type pressure sensor |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN108413953A (en) * | 2018-02-27 | 2018-08-17 | 郑州轻工业学院 | A kind of adjustable gain control surface acoustic wave gyroscope based on graphene film |
CN108413953B (en) * | 2018-02-27 | 2020-03-10 | 郑州轻工业学院 | Gain-adjustable surface acoustic wave micro gyroscope based on graphene film |
CN112444239A (en) * | 2019-08-30 | 2021-03-05 | 北京大学 | Geometric compensation type (100) silicon micro-mechanical ring-shaped resonant gyroscope |
CN116907463A (en) * | 2023-09-08 | 2023-10-20 | 华芯拓远(天津)科技有限公司 | High-precision full-decoupling triaxial MEMS gyroscope |
CN116907463B (en) * | 2023-09-08 | 2023-12-15 | 华芯拓远(天津)科技有限公司 | High-precision full-decoupling triaxial MEMS gyroscope |
Also Published As
Publication number | Publication date |
---|---|
CN107101629B (en) | 2019-12-17 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107015025B (en) | A kind of differential type graphene resonance beam acceleration transducer | |
CN102590555B (en) | Resonance dynamic balance capacitance-type triaxial acceleration transducer and manufacture method | |
US6797631B2 (en) | High sensitive micro-cantilever sensor and fabricating method thereof | |
CN102608356B (en) | A kind of double-shaft micromechanical resonant accelerometer structure and production method | |
US10048146B2 (en) | Thickness shear mode resonator sensors and methods of forming a plurality of resonator sensors | |
CN109786422A (en) | Piezoelectric exciting is by micro- resonance pressure sensor chip of pull-type silicon and preparation method thereof | |
CN106918420A (en) | A kind of pair of Graphene resonance beam type pressure sensor | |
CN107688103A (en) | A kind of single-axis accelerometer based on graphene resonance characteristic | |
CN109110724B (en) | Be applied to MEMS force sensitive device's second grade stress isolation structure | |
CN107101629A (en) | A kind of silicon micro mechanical graphene beam resonant mode gyroscope | |
CN102193001A (en) | SAW-MEMS (surface acoustic waves-micro electro mechanical system) acceleration sensor and manufacturing method thereof | |
CN103472260B (en) | A kind of MEMS pitches beam capacitive accelerometer and manufacture method thereof | |
CN108008150A (en) | A kind of low intersecting axle sensitivity piezoresistive accelerometer structure and production method | |
CN102879609B (en) | Capacitive acceleration transducer for H-shaped beam and manufacturing method thereof | |
CN101363731B (en) | Rock quartz micro mechanical gyroscope based on shear stress detection and method for making same | |
CN107255736A (en) | A kind of resonant mode graphene twin-axis accelerometer | |
CN108007448B (en) | A kind of axial symmetry silicon micromechanical gyroscope sensitive structure and its manufacturing method | |
CN102602879B (en) | Two step corrosion manufacture methods of resonance type accelerometer resonance beam and brace summer | |
CN109883581A (en) | A kind of differential resonance pressure sensor chip of beam type | |
CN106053881B (en) | Single-chip silicon integrates high bandwidth high-impact acceleration meter of three axis and preparation method thereof | |
CN109270298B (en) | MEMS accelerometer | |
JP3333285B2 (en) | Semiconductor sensor | |
CN109239399B (en) | Resonant accelerometer based on double-fork resonant beam | |
JP4628018B2 (en) | Capacitive mechanical quantity sensor and manufacturing method thereof | |
JP2006153481A (en) | Dynamic quantity sensor |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |