CN107058966B - A kind of vacuum coating substrate holder - Google Patents

A kind of vacuum coating substrate holder Download PDF

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Publication number
CN107058966B
CN107058966B CN201611136440.5A CN201611136440A CN107058966B CN 107058966 B CN107058966 B CN 107058966B CN 201611136440 A CN201611136440 A CN 201611136440A CN 107058966 B CN107058966 B CN 107058966B
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CN
China
Prior art keywords
substrate
shaft
vacuum coating
transmission shaft
substrate holder
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CN201611136440.5A
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Chinese (zh)
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CN107058966A (en
Inventor
冯斌
任高潮
顾为民
金浩
王德苗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hangzhou bifanke Electronic Technology Co.,Ltd.
Original Assignee
SUZHOU SAVEE VACUUM ELECTRONIC Co Ltd
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Priority to CN201611136440.5A priority Critical patent/CN107058966B/en
Publication of CN107058966A publication Critical patent/CN107058966A/en
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50Substrate holders
    • C23C14/505Substrate holders for rotation of the substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention discloses a kind of vacuum coating substrate holders, including substrate pallet, shaft and transmission shaft, the transmission shaft is connect with rotating mechanism, the substrate pallet is connected by being set to the shaft at center with transmission shaft, the substrate tray bottom is provided with the toroidal cavity using tray center as the center of circle, the substrate tray bottom is additionally provided with angular adjustment bar, angular adjustment bar one end is fixed on plant bottom case, the other end is contact ball end, and the contact ball end can be slided in toroidal cavity.The planetary rotation of simple class of substrate holder may be implemented in the present invention, so that substrate holder can be rotated in process, be overturn, reaching improves technique for vacuum coating to the improvement inner walls of deep holes film thickness uniformity in the case of the step coverage of nonplanar structure, especially deep hole plated film.

Description

A kind of vacuum coating substrate holder
Technical field
The present invention relates to a kind of vacuum coating substrate holders, belong to vacuum coater technical field.
Background technique
Vacuum coater is widely used in various facet coatings fields, but for the plated film of three-dimensional special-shaped structure, The support of the complex mechanisms such as complicated substrate rotation, overturning is generally required, existing vacuum coating substrate holder is difficult to realize this One requires.
Summary of the invention
The technical problem to be solved by the present invention is to overcome the deficiencies of existing technologies, a kind of vacuum coating substrate bottom is provided Seat, can make substrate holder that can rotate, overturn in process, and reaching improves technique for vacuum coating to the platform of nonplanar structure Improvement inner walls of deep holes film thickness uniformity in the case of rank coverage rate, especially deep hole plated film.
In order to solve the above technical problems, the present invention provides a kind of vacuum coating substrate holder, including substrate pallet, shaft and Transmission shaft, the transmission shaft are connect with rotating mechanism, and the substrate pallet is by being set to the shaft at center and transmission shaft phase Even, the substrate tray bottom is provided with the toroidal cavity using tray center as the center of circle, and the substrate tray bottom is also set up Angled adjusting rod, angular adjustment bar one end are fixed on plant bottom case, and the other end is contact ball end, the contact ball end It can be slided in toroidal cavity.
The transmission shaft includes rotating mechanism connecting shaft and joint nut cap, and the rotating mechanism connection the tip of the axis is joint Sphere, the joint sphere are included by ball-joint nut cap, and the ball-joint nut cap is connected with shaft.
The shaft includes structure attachment screw, and structure attachment screw one end is fixedly connected with substrate pallet, another End is rotatablely connected with transmission shaft.
The structure attachment screw is fixed on the bottom of substrate pallet by fixing screws.
The substrate pallet the center point is provided with screw counter bore, and the fixing screws are installed in screw counter bore.
The edge of the substrate pallet is provided with sample stop collar.
The ball-joint nut cap includes upper cap and lower cover cap, and the shrinkage pool for accommodating shaft is provided in the upper cap.
Advantageous effects of the invention:
1. vacuum coating carries out, transmission shaft connect with rotating mechanism and constantly rotates, the sample being put on substrate pallet It moves in a circle in top plan view by center symmetry axis of transmission shaft, on the other hand, due to substrate pallet and angular adjustment bar Sliding contact switchs to circular motion in the plane where it to make substrate pallet under angular adjustment bar position-limiting action It does rotation movement, improves technique for vacuum coating to the step coverage of nonplanar structure, especially deep hole plated film situation to realize Under improvement inner walls of deep holes film thickness uniformity.
2. the contact angle for contacting ball end on angular adjustment bar can change with the bending and height of adjusting rod, in turn The tilt angle of substrate pallet is adjusted, realizes the uniform coated to the sample of different pore size ratio in technique for vacuum coating.
Therefore, the simple class row of substrate holder may be implemented in a kind of vacuum coating substrate holder provided by the present invention Planetary rotation, so that substrate holder can be rotated in process, be overturn, reaching improves technique for vacuum coating to non-planar junction Improvement inner walls of deep holes film thickness uniformity in the case of the step coverage of structure, especially deep hole plated film.
Detailed description of the invention
Fig. 1 is structural schematic diagram of the invention.
Specific embodiment
The invention will be further described below in conjunction with the accompanying drawings.Following embodiment is only used for clearly illustrating the present invention Technical solution, and not intended to limit the protection scope of the present invention.
A kind of vacuum coating substrate holder as shown in Figure 1, including substrate pallet 1, shaft and transmission shaft, the transmission shaft It is connect with rotating mechanism, the substrate pallet 1 is connected by being set to the shaft at center with transmission shaft, the substrate pallet 1 Bottom is provided with the toroidal cavity 1-3 using tray center as the center of circle, and the substrate tray bottom is additionally provided with angular adjustment bar 5, described 5 one end of angular adjustment bar is fixed on plant bottom case, and the other end is that contact ball end 5-1, the contact ball end 5-1 can be Sliding in toroidal cavity 1-3.
The transmission shaft includes rotating mechanism connecting shaft 4 and joint nut cap 3, and the end of the rotating mechanism connecting shaft 4 is Joint sphere 4-1, the joint sphere 4-1 are included by ball-joint nut cap 3, and the ball-joint nut cap 3 is connected with shaft.
The shaft includes structure attachment screw 2, and described 2 one end of structure attachment screw is fixedly connected with substrate pallet 1, separately One end and transmission shaft are rotatablely connected.
The structure attachment screw 2 is fixed on the bottom of substrate pallet 1 by fixing screws 1-4.
1 the center point of substrate pallet is provided with screw counter bore 1-1, and the fixing screws 1-4 is installed on screw counter bore 1-1 It is interior, to avoid 1 surface of substrate pallet is higher than after fixing screws 1-4 installation, jack up the sample of vacuum coating.
The edge of the substrate pallet 1 is provided with sample stop collar 1-2, and the sample in rotary course is prevented to be thrown out of substrate Pallet 1.
The ball-joint nut cap 3 includes being provided with receiving shaft on upper cap 3-1 and lower cover cap 3-2, the upper cap 3-1 Shrinkage pool, since ball-joint nut cap 3 is easy to happen abrasion in rotation.This structure makes ball-joint nut cap 3 be easily installed disassembly, Replacement convenient for safeguarding.
The above is only a preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art For member, without departing from the technical principles of the invention, several improvement and deformations can also be made, these improvement and deformations Also it should be regarded as protection scope of the present invention.

Claims (6)

1. a kind of vacuum coating substrate holder, which is characterized in that including substrate pallet, shaft and transmission shaft, the transmission shaft with Rotating mechanism connection, the substrate pallet are connected by being set to the shaft at center with transmission shaft, the substrate tray bottom It is provided with the toroidal cavity using tray center as the center of circle, the substrate tray bottom is additionally provided with angular adjustment bar, the angle Degree adjusting rod one end is fixed on plant bottom case, and the other end is contact ball end, and the contact ball end can be slided in toroidal cavity Dynamic, the transmission shaft includes rotating mechanism connecting shaft and joint nut cap, and the rotating mechanism connection the tip of the axis is joint sphere, The joint sphere is included by ball-joint nut cap, and the ball-joint nut cap is connected with shaft.
2. a kind of vacuum coating substrate holder according to claim 1, which is characterized in that the shaft includes structure connection Screw, structure attachment screw one end are fixedly connected with substrate pallet, and the other end and transmission shaft are rotatablely connected.
3. a kind of vacuum coating substrate holder according to claim 2, which is characterized in that the structure attachment screw passes through Fixing screws are fixed on the bottom of substrate pallet.
4. a kind of vacuum coating substrate holder according to claim 3, which is characterized in that the substrate pallet the center point is set It is equipped with screw counter bore, the fixing screws are installed in screw counter bore.
5. a kind of vacuum coating substrate holder according to claim 1, which is characterized in that the edge of the substrate pallet is set It is equipped with sample stop collar.
6. a kind of vacuum coating substrate holder according to claim 1, which is characterized in that the ball-joint nut cap includes upper Nut cap and lower cover cap are provided with the shrinkage pool for accommodating shaft in the upper cap.
CN201611136440.5A 2016-12-12 2016-12-12 A kind of vacuum coating substrate holder Active CN107058966B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201611136440.5A CN107058966B (en) 2016-12-12 2016-12-12 A kind of vacuum coating substrate holder

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201611136440.5A CN107058966B (en) 2016-12-12 2016-12-12 A kind of vacuum coating substrate holder

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Publication Number Publication Date
CN107058966A CN107058966A (en) 2017-08-18
CN107058966B true CN107058966B (en) 2019-10-15

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Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107557749B (en) * 2017-09-30 2024-05-17 宣城托新精密科技有限公司 PVD vacuum coating tool fixture
CN110923655B (en) * 2018-09-19 2023-04-28 苏州能讯高能半导体有限公司 Carrying device and coating equipment
CN114807865A (en) * 2022-04-18 2022-07-29 兰州交通大学 Vacuum evaporation equipment capable of coating films on two sides

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102534536A (en) * 2010-12-27 2012-07-04 北京中科信电子装备有限公司 Multi-axis movement device for silicon wafer stage
CN104342635A (en) * 2013-07-25 2015-02-11 三星显示有限公司 Thin film deposition apparatus and method, and method of manufacturing organic light-emitting display apparatus
CN104630734A (en) * 2015-02-13 2015-05-20 北京中科科美真空技术有限责任公司 Rotary sample stage
CN206256161U (en) * 2016-12-12 2017-06-16 苏州求是真空电子有限公司 A kind of vacuum coating substrate holder

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5320815B2 (en) * 2008-05-20 2013-10-23 富士電機株式会社 Thin film forming method for magnetic recording medium and film forming apparatus using the same

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102534536A (en) * 2010-12-27 2012-07-04 北京中科信电子装备有限公司 Multi-axis movement device for silicon wafer stage
CN104342635A (en) * 2013-07-25 2015-02-11 三星显示有限公司 Thin film deposition apparatus and method, and method of manufacturing organic light-emitting display apparatus
CN104630734A (en) * 2015-02-13 2015-05-20 北京中科科美真空技术有限责任公司 Rotary sample stage
CN206256161U (en) * 2016-12-12 2017-06-16 苏州求是真空电子有限公司 A kind of vacuum coating substrate holder

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Effective date of registration: 20220216

Address after: 310024 room 414, building 3, Hejing business center, Gudang street, Xihu District, Hangzhou, Zhejiang

Patentee after: Hangzhou bifanke Electronic Technology Co.,Ltd.

Address before: 215300 Building 1, 232 Yuanfeng Road, Yushan Town, Kunshan City, Suzhou City, Jiangsu Province

Patentee before: SUZHOU ADVANCED VACUUM ELECTRONIC EQUIPMENT CO.,LTD.