CN107046080A - 一种无接触插片石墨舟 - Google Patents
一种无接触插片石墨舟 Download PDFInfo
- Publication number
- CN107046080A CN107046080A CN201710096812.4A CN201710096812A CN107046080A CN 107046080 A CN107046080 A CN 107046080A CN 201710096812 A CN201710096812 A CN 201710096812A CN 107046080 A CN107046080 A CN 107046080A
- Authority
- CN
- China
- Prior art keywords
- groove
- silicon chip
- piece
- hole
- boat
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 title claims abstract description 28
- 229910002804 graphite Inorganic materials 0.000 title claims abstract description 28
- 239000010439 graphite Substances 0.000 title claims abstract description 28
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 60
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 60
- 239000010703 silicon Substances 0.000 claims abstract description 60
- 230000001681 protective effect Effects 0.000 claims abstract description 9
- 238000003780 insertion Methods 0.000 claims abstract description 5
- 230000037431 insertion Effects 0.000 claims abstract description 5
- 239000007789 gas Substances 0.000 claims description 12
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 6
- 239000000919 ceramic Substances 0.000 claims description 5
- 239000011261 inert gas Substances 0.000 claims description 3
- 229910052757 nitrogen Inorganic materials 0.000 claims description 3
- 230000009466 transformation Effects 0.000 abstract description 5
- 239000011148 porous material Substances 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 5
- 230000008569 process Effects 0.000 description 4
- 238000000576 coating method Methods 0.000 description 3
- 238000009826 distribution Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000001771 vacuum deposition Methods 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 235000008216 herbs Nutrition 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6732—Vertical carrier comprising wall type elements whereby the substrates are horizontally supported, e.g. comprising sidewalls
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Photovoltaic Devices (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710096812.4A CN107046080B (zh) | 2017-02-22 | 2017-02-22 | 一种无接触插片石墨舟 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201710096812.4A CN107046080B (zh) | 2017-02-22 | 2017-02-22 | 一种无接触插片石墨舟 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN107046080A true CN107046080A (zh) | 2017-08-15 |
CN107046080B CN107046080B (zh) | 2019-01-29 |
Family
ID=59544544
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201710096812.4A Active CN107046080B (zh) | 2017-02-22 | 2017-02-22 | 一种无接触插片石墨舟 |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN107046080B (zh) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109082649A (zh) * | 2018-09-06 | 2018-12-25 | 深圳市捷佳伟创新能源装备股份有限公司 | 一种稳定镀膜的载片装置 |
CN109440084A (zh) * | 2018-09-29 | 2019-03-08 | 东方日升新能源股份有限公司 | 一种用于太阳能电池双面镀膜的石墨舟 |
CN110060951A (zh) * | 2019-05-21 | 2019-07-26 | 常州时创能源科技有限公司 | 一种硅片镀膜用石墨舟 |
CN113430503A (zh) * | 2021-07-15 | 2021-09-24 | 大连连城数控机器股份有限公司 | 一种可镀多种膜的管式pecvd石墨舟结构 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201012941Y (zh) * | 2007-01-29 | 2008-01-30 | 刘卓 | 硅片生产中使用的石墨舟 |
CN202022971U (zh) * | 2011-04-01 | 2011-11-02 | 石金精密科技(深圳)有限公司 | 底部电极接触石墨舟 |
CN102487109A (zh) * | 2009-12-22 | 2012-06-06 | 无锡尚德太阳能电力有限公司 | 一种水平石墨舟 |
CN206506950U (zh) * | 2017-01-03 | 2017-09-22 | 华东师范大学第一附属中学 | 一种花草种植箱 |
-
2017
- 2017-02-22 CN CN201710096812.4A patent/CN107046080B/zh active Active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN201012941Y (zh) * | 2007-01-29 | 2008-01-30 | 刘卓 | 硅片生产中使用的石墨舟 |
CN102487109A (zh) * | 2009-12-22 | 2012-06-06 | 无锡尚德太阳能电力有限公司 | 一种水平石墨舟 |
CN202022971U (zh) * | 2011-04-01 | 2011-11-02 | 石金精密科技(深圳)有限公司 | 底部电极接触石墨舟 |
CN206506950U (zh) * | 2017-01-03 | 2017-09-22 | 华东师范大学第一附属中学 | 一种花草种植箱 |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN109082649A (zh) * | 2018-09-06 | 2018-12-25 | 深圳市捷佳伟创新能源装备股份有限公司 | 一种稳定镀膜的载片装置 |
CN109440084A (zh) * | 2018-09-29 | 2019-03-08 | 东方日升新能源股份有限公司 | 一种用于太阳能电池双面镀膜的石墨舟 |
CN110060951A (zh) * | 2019-05-21 | 2019-07-26 | 常州时创能源科技有限公司 | 一种硅片镀膜用石墨舟 |
CN110060951B (zh) * | 2019-05-21 | 2024-02-13 | 常州时创能源股份有限公司 | 一种硅片镀膜用石墨舟 |
CN113430503A (zh) * | 2021-07-15 | 2021-09-24 | 大连连城数控机器股份有限公司 | 一种可镀多种膜的管式pecvd石墨舟结构 |
Also Published As
Publication number | Publication date |
---|---|
CN107046080B (zh) | 2019-01-29 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN107046080A (zh) | 一种无接触插片石墨舟 | |
CN206505899U (zh) | 一种管式镀膜水平石墨舟 | |
TWI514445B (zh) | 用於化學氣相沉積的裝置 | |
JP4859472B2 (ja) | プラズマプロセス装置 | |
JP2009054997A5 (zh) | ||
US11293097B2 (en) | Apparatus for distributing gas and apparatus for processing substrate including the same | |
KR101100284B1 (ko) | 박막 증착 장치 | |
KR20140135202A (ko) | 성막 장치 | |
CN103866288B (zh) | 一种用于原子层薄膜沉积的反应装置及方法 | |
CN103258763A (zh) | 一种多尺寸晶圆共用的晶圆载台结构 | |
KR20080050304A (ko) | 표면 텍스쳐링을 구비한 플라즈마 반응기 기판 | |
CN107068603A (zh) | 基板排列方法和装置、基板接收方法和装置、基板液处理方法和装置以及基板处理系统 | |
CN206505900U (zh) | 一种卡点位置优化的石墨舟 | |
CN109628905A (zh) | 载板和镀膜设备 | |
CN101770932B (zh) | 等离子体处理设备 | |
CN206502866U (zh) | 一种卡点位置可调的石墨舟 | |
CN206505940U (zh) | 一种无接触插片石墨舟 | |
CN101748378B (zh) | 成膜载板及太阳能电池的生产方法 | |
US9297075B2 (en) | Plasma deposition apparatus and plasma deposition method | |
CN103794535B (zh) | 晶体硅太阳能电池片链式传送的平行滚轮装置 | |
CN206502864U (zh) | 一种新型镀膜石墨舟 | |
CN206505901U (zh) | 一种高导电石墨舟 | |
JP3649898B2 (ja) | プラズマcvd装置を用いた多層薄膜形成装置 | |
KR20100126533A (ko) | 롤-성형 표면을 갖는 서셉터 및 이를 제조하기 위한 방법 | |
JP2008235393A (ja) | 成膜装置及び成膜方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
CB02 | Change of applicant information | ||
CB02 | Change of applicant information |
Address after: 528137 No. 69, C District, Leping Town Industrial Park, Sanshui District, Foshan, Guangdong Applicant after: Guangdong Asahi Polytron Technologies Inc Address before: 528137 No. 69, C District, Leping Town Industrial Park, Sanshui District, Foshan, Guangdong Applicant before: Guangdong Aiko Solar Energy Technology Co., Ltd. |
|
GR01 | Patent grant | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address | ||
CP03 | Change of name, title or address |
Address after: 528000 No.3, Qili Avenue South, Leping Town, Sanshui District, Foshan City, Guangdong Province Patentee after: Guangdong aixu Technology Co.,Ltd. Address before: 528137 No. 69, C District, Leping Town Industrial Park, Sanshui District, Foshan, Guangdong Patentee before: Guangdong Aixu Technology Co.,Ltd. |