CN106950799B - Photosensitive emulsion composition and application thereof in electrochemical-free treatment of thermosensitive CTP (computer to plate) - Google Patents
Photosensitive emulsion composition and application thereof in electrochemical-free treatment of thermosensitive CTP (computer to plate) Download PDFInfo
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- CN106950799B CN106950799B CN201710191993.9A CN201710191993A CN106950799B CN 106950799 B CN106950799 B CN 106950799B CN 201710191993 A CN201710191993 A CN 201710191993A CN 106950799 B CN106950799 B CN 106950799B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
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Abstract
The invention discloses a photosensitive emulsion composition and application thereof in electrochemical treatment-free thermosensitive CTP (computer to plate), wherein the photosensitive emulsion composition comprises the following components in parts by mass: 35-50 parts of a vinyl polymer; 10-30 parts of vinyl sulfonate polymer; 10-20 parts of phenolic resin; 3-5 parts of siloxane resin; 5-15 parts of infrared light absorbing dye; 3-8 parts of other auxiliary agents; the vinyl polymer is a copolymer of N- (4-acetoxyphenyl) maleimide, N-dimethylformamide and hydroxyethyl acrylate, the hydroxyl value of the vinyl polymer is 10-30 mgKOH, and the vinyl sulfonate polymer is a copolymer of N-butyl vinyl benzene sulfonate, acrylic acid and ethyl methacrylate. The photosensitive emulsion composition can be directly coated on an aluminum plate without electrolysis and oxidation treatment to prepare a thermosensitive CTP plate after being prepared into a coating liquid, and the prepared thermosensitive CTP can meet the subsequent printing quality requirement and has good hydrophilicity and strong printing resistance.
Description
Technical Field
The invention relates to the technical field of CTP plate making, in particular to a photosensitive resist composition and application thereof in electrochemical treatment-free thermosensitive CTP plates.
Background
Ctp (computer to plate) technology is a digital direct plate making technology appearing in the nineties of the twentieth century, and is a technology for copying graphic and text information to a plate material through a laser plate making machine by a computer. The CTP plate is of various types, and comprises a silver salt diffusion CTP plate, a UV-CTP plate, a thermosensitive CTP plate, a violet laser CTP and the like, wherein the thermosensitive CTP plate is a printing plate for infrared laser scanning exposure direct imaging, and the thermosensitive CTP plate has the advantages of being capable of operating under bright room conditions, easy in quality control, stable in publishing quality, good in dot reproducibility, high in resolution, capable of being cleaned with sharp dot edges and the like, and is the most mature, stable and best in effect CTP plate making technology at present.
Most CTP plates are coated with a photosensitive layer on the surface of an aluminum plate substrate. In order to make the aluminum plate base have good adsorption effect on the photosensitive layer, the surface of the aluminum plate base is subjected to a series of surface treatments: degreasing → neutralization → electrolysis → oxidation → sealing and so on. The electrolysis and oxidation processes can be collectively called as electrochemical treatment processes, and can obtain the meshes and the oxide layers of the plate surfaces, so that the prepared CTP plate has good hydrophilic performance and printing endurance during printing. However, the power consumption and water consumption of the electrolysis and oxidation process are very large, so that the requirements of environment protection and energy saving in the modern society are difficult to meet, and the electrolysis and oxidation process takes longer time, so that the cost and time for producing the thermosensitive CTP are greatly increased.
Disclosure of Invention
Based on the situation, the invention aims to overcome the defects of the prior art and provide the photosensitive emulsion composition, the coating liquid prepared from the photosensitive emulsion composition can be directly coated on an aluminum plate without electrolysis and oxidation treatment to prepare the thermosensitive CTP plate, and the thermosensitive CTP plate can meet the subsequent printing quality requirement and has good hydrophilicity and strong printing resistance.
Another object of the present invention is to provide a thermosensitive CTP plate.
The invention also aims to provide a preparation method of the thermosensitive CTP plate.
The technical scheme is as follows:
a photosensitive emulsion composition comprises the following components in parts by weight:
35-50 parts of a vinyl polymer;
10-30 parts of vinyl sulfonate polymer;
10-20 parts of phenolic resin;
3-5 parts of siloxane resin;
5-15 parts of infrared light absorbing dye;
3-8 parts of other auxiliary agents;
the vinyl polymer is a copolymer of N- (4-acetoxyphenyl) maleimide, N-dimethylformamide and hydroxyethyl acrylate, the hydroxyl value of the vinyl polymer is 10-30 mgKOH, and the vinyl sulfonate polymer is a copolymer of N-butyl vinyl benzene sulfonate, acrylic acid and ethyl methacrylate.
In the preparation process of the CTP plate, an aluminum substrate is generally required to be subjected to electrochemical treatment so that the CTP plate has good hydrophilic performance and printing endurance during printing, however, the power consumption and water consumption of electrolysis and oxidation processes are very large, and the requirements of environment protection and energy conservation in the modern society are difficult to meet. The invention develops a photosensitive resist composition suitable for the non-electrochemical treatment of CTP plates by selecting a vinyl polymer and a vinyl sulfonate polymer with specific structures from a photosensitive layer of the CTP plates and matching the vinyl polymer and the vinyl sulfonate polymer with phenolic resin, siloxane resin and the like. The invention takes N- (4-acetoxyphenyl) maleimide, N-dimethylformamide and hydroxyethyl acrylate as reactants to prepare a vinyl polymer with good alkali solubility and hydrophilicity, wherein, the chain segments of the N- (4-acetoxyphenyl) maleimide and the N, N-dimethylformamide have better alkali solubility, the vinyl polymer can be better dissolved during exposure and development, and the chain segments of the hydroxyethyl acrylate contain a carboxylic ester structure and have acid-induced phase change property; besides alkali solubility, the existence of an acrylic acid chain segment and an ethyl methacrylate chain segment in the vinyl sulfonate polymer increases the compatibility among all components, and the acrylic acid chain segment also increases the interaction force between the photosensitive resist composition and a substrate and also increases the hydrophilicity of the photosensitive resist; the siloxane resin has good adhesiveness to the aluminum substrate, so that the photosensitive adhesive layer can be firmly adhered to the aluminum substrate. The photosensitive resist composition can be prepared into a photosensitive layer which is directly coated on an aluminum substrate which is only subjected to oil removal treatment, has good adhesion to the aluminum substrate, and the prepared thermosensitive CTP plate has good hydrophilic performance and printing resistance and can meet the quality requirement of subsequent ink printing.
In one embodiment, the hydroxyl value of the vinyl polymer is 10 to 20 mgKOH.
In one embodiment, the vinyl polymer is prepared from N, N-dimethylformamide, N- (4-acetoxyphenyl) maleimide and hydroxyethyl acrylate according to a molar ratio of 1 (1-5): (0.1-0.5) by copolymerization.
In one embodiment, the vinyl polymer has a molecular weight of 10000 to 20000.
In one embodiment, the vinyl sulfonate polymer is prepared from n-butyl vinyl benzene sulfonate and acrylic acid, ethyl methacrylate in a 1: (0.5-1): (2-4) copolymerization.
In one embodiment, the vinyl sulfonate polymer has a molecular weight of 5000 to 10000.
In one embodiment, the infrared light absorbing dye is a cyanine dye having a cationic salt structure and an anionic salt structure.
In one embodiment, the other auxiliary agent is one or more of a stabilizer, a leveling agent, an antifoaming agent and a surfactant.
The heat-sensitive CTP plate comprises an aluminum plate base support and a photosensitive layer coated on the aluminum plate base support, wherein the photosensitive layer is formed by curing a photosensitive coating liquid, and the photosensitive coating liquid comprises the photosensitive glue composition.
The preparation method of the thermosensitive CTP plate comprises the following steps:
s1, plate treatment: carrying out surface treatment on the aluminum substrate by using an alkaline solution, then washing and drying;
s2, preparation of photosensitive coating liquid: uniformly mixing all the components of the photosensitive emulsion composition, adding a solvent, and preparing the photosensitive emulsion composition into a photosensitive coating liquid with the viscosity of 50-70 cp, wherein the solvent is at least two of ethyl acetate, acetone, ethylene glycol monomethyl ether and ethylene glycol monoethyl ether;
s3, coating: coating the photosensitive coating liquid on the treated plate;
s4, drying: and (5) drying the plate.
In one embodiment, the step S4 is: the plate is dried in three sections, wherein 0-20 m of the starting section is baked at 120 ℃ for 1-2 minutes, 20-40 m of the stabilizing section is baked at 180 ℃ for 2-3 minutes, and 40-64 m of the drying section is baked at 210 ℃ for 3-4 minutes.
The invention has the beneficial effects that: the invention develops a photosensitive resist composition suitable for the CTP without electrochemical treatment by starting from the photosensitive layer of the CTP, selecting the vinyl polymer and the vinyl sulfonate polymer with specific structures, matching with phenolic resin, siloxane resin and the like, wherein the photosensitive resist composition can be prepared into a photosensitive layer to be directly coated on an aluminum substrate which is only subjected to oil removal treatment, and the prepared thermosensitive CTP has good hydrophilic performance and printing resistance; in the process of preparing the thermosensitive CTP plate, the aluminum substrate does not need to be electrolyzed and oxidized, so that the power consumption and the water consumption are greatly saved, the requirements of environment protection and energy conservation in the modern society are met, and the cost and the time for producing the thermosensitive CTP are obviously improved.
Detailed Description
In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is further described in detail with reference to the following embodiments. It should be understood that the detailed description and specific examples, while indicating the scope of the invention, are intended for purposes of illustration only and are not intended to limit the scope of the invention.
The following examples used the following raw materials:
phenolic resin: 2123 phenolic resin, chemical technology ltd of shorea;
infrared light absorbing dye: phthalocyanine dye, mitsui chemical company;
other ones not specifically mentioned are common commercial products.
Example 1
Preparation of vinyl Polymer A: mixing N, N-dimethylformamide and benzoyl peroxide, adding the mixture into a three-necked bottle provided with a stirrer, a reflux pipe and a dropping funnel, reacting for 10-30 min at 75 ℃, then dropwise adding N- (4-acetoxyphenyl) maleimide and hydroxyethyl acrylate, reacting for 5 hours at constant temperature after dropwise adding for 1 hour, and continuously adjusting the viscosity with acetone during the reaction process to prevent gelation; wherein the dosage of the N, N-dimethylformamide is 36.5g (0.5mol), the molar ratio of the N, N-dimethylformamide to the N- (4-acetoxyphenyl) maleimide and the hydroxyethyl acrylate is 1:2:0.2, the dosage of the benzoyl peroxide is 0.5 percent of the mass of the N, N-dimethylformamide, and nitrogen is continuously introduced in the reaction process. After the reaction is finished, cooling, adding a large amount of methanol, filtering and drying to obtain an off-white solid. The molecular weight was determined by Gel Permeation Chromatography (GPC) to give a number average molecular weight of 8200, and the hydroxyl value was determined by pyridine acetic anhydride method to be 18.6 mgKOH.
Preparation of vinyl Polymer B: mixing N, N-dimethylformamide and benzoyl peroxide, adding the mixture into a three-necked bottle provided with a stirrer, a reflux pipe and a dropping funnel, reacting for 10-30 min at 75 ℃, then dropwise adding N- (4-acetoxyphenyl) maleimide and hydroxyethyl acrylate, reacting for 5 hours at constant temperature after dropwise adding for 1 hour, and continuously adjusting the viscosity with acetone during the reaction process to prevent gelation; wherein the dosage of the N, N-dimethylformamide is 36.5g (0.5mol), the molar ratio of the N, N-dimethylformamide to the N- (4-acetoxyphenyl) maleimide and the hydroxyethyl acrylate is 1:1:0.5, the dosage of the benzoyl peroxide is 0.5 percent of the mass of the N, N-dimethylformamide, and nitrogen is continuously introduced in the reaction process. After the reaction is finished, cooling, adding a large amount of methanol, filtering and drying to obtain an off-white solid. The molecular weight was 5300 as determined by gel permeation chromatography, and the hydroxyl value was 28.8 as determined by pyridine acetic anhydride method.
Preparation of vinyl Polymer C: mixing N, N-dimethylformamide and benzoyl peroxide, adding the mixture into a three-necked bottle provided with a stirrer, a reflux pipe and a dropping funnel, reacting for 10-30 min at 75 ℃, then dropwise adding N- (4-acetoxyphenyl) maleimide and hydroxyethyl acrylate, reacting for 8 hours at constant temperature after dropwise adding for 1 hour, and continuously adjusting the viscosity with acetone during the reaction process to prevent gelation; wherein the dosage of the N, N-dimethylformamide is 36.5g (0.5mol), the molar ratio of the N, N-dimethylformamide to the N- (4-acetoxyphenyl) maleimide and the hydroxyethyl acrylate is 1:5:0.1, the dosage of the benzoyl peroxide is 0.5 percent of the mass of the N, N-dimethylformamide, and nitrogen is continuously introduced in the reaction process. After the reaction is finished, cooling, adding a large amount of methanol, filtering and drying to obtain an off-white solid. The number average molecular weight of the gel permeation chromatography measured molecular weight was 18800, and the hydroxyl value was 10.8 by the pyridine acetic anhydride method.
Example 2
Preparation of vinyl sulfonate Polymer 1: mixing n-butyl vinylbenzene sulfonate, acrylic acid, ethyl methacrylate and benzoyl peroxide, slowly dropwise adding the mixture into a three-neck flask with a stirrer, a reflux pipe and a dropping funnel, reacting for 7 hours at 70-75 ℃, and continuously adjusting the viscosity with acetone during the reaction process to prevent gelation; wherein the dosage of the n-butyl vinylbenzene sulfonate is 60g (0.25mol), and the molar ratio of the n-butyl vinylbenzene sulfonate to the acrylic acid and the ethyl methacrylate is 1: 3: 0.3, the dosage of the benzoyl peroxide is 0.5 percent of the mass of the n-butyl vinylbenzenesulfonate, and nitrogen is continuously introduced in the reaction process. After the reaction is finished, cooling, adding a large amount of methanol, filtering and drying to obtain beige solid. The molecular weight measured by gel permeation chromatography was 7700.
Preparation of vinyl sulfonate Polymer 2: mixing n-butyl vinylbenzene sulfonate, acrylic acid, ethyl methacrylate and benzoyl peroxide, slowly dropwise adding the mixture into a three-neck flask with a stirrer, a reflux pipe and a dropping funnel, reacting for 8 hours at 70-75 ℃, and continuously adjusting the viscosity with acetone during the reaction process to prevent gelation; wherein the dosage of the n-butyl vinylbenzene sulfonate is 60g (0.25mol), and the molar ratio of the n-butyl vinylbenzene sulfonate to the acrylic acid and the ethyl methacrylate is 1:5:0.1, the dosage of the benzoyl peroxide is 0.5 percent of the mass of the n-butyl vinylbenzenesulfonate, and nitrogen is continuously introduced in the reaction process. After the reaction is finished, cooling, adding a large amount of methanol, filtering and drying to obtain beige solid. The molecular weight was measured by gel permeation chromatography and the number average molecular weight was 9600.
Preparation of vinyl sulfonate Polymer 3: mixing n-butyl vinylbenzene sulfonate, acrylic acid, ethyl methacrylate and benzoyl peroxide, slowly dropwise adding the mixture into a three-necked bottle with a stirrer, a reflux pipe and a dropping funnel, reacting for 6 hours at 70-75 ℃, and continuously adjusting the viscosity with acetone during the reaction process to prevent gelation; wherein the dosage of the n-butyl vinylbenzene sulfonate is 60g (0.25mol), and the molar ratio of the n-butyl vinylbenzene sulfonate to the acrylic acid and the ethyl methacrylate is 1:1:0.5 percent, the dosage of the benzoyl peroxide is 0.5 percent of the mass of the n-butyl vinylbenzenesulfonate, and nitrogen is continuously introduced in the reaction process. After the reaction is finished, cooling, adding a large amount of methanol, filtering and drying to obtain beige solid. The number average molecular weight was 5600 as measured by gel permeation chromatography.
Example 3
The components of the photosensitive emulsion composition are weighed according to the following proportion:
40 parts of vinyl polymer A;
120 parts of vinyl sulfonate polymer;
15 parts of phenolic resin;
5 parts of siloxane resin;
14.5 parts of infrared light absorbing dye;
5.5 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 1.5 parts of flatting agent and 2 parts of surfactant.
In this embodiment, the above-mentioned photoresist composition is used for preparing a thermosensitive CTP plate, which is prepared as follows:
s1, plate treatment: carrying out surface treatment on the aluminum substrate by using an alkaline solution, washing and drying, wherein the alkaline solution is a 10% sodium hydroxide solution;
s2, preparation of photosensitive coating liquid: uniformly mixing the weighed components of the photosensitive resist composition, adding a solvent, and preparing the photosensitive resist composition into a photosensitive coating liquid with the viscosity of 50-70 cp, wherein the solvent is a mixed solution of ethyl acetate and ethylene glycol monomethyl ether;
s3, coating: coating the photosensitive coating liquid on the treated plate;
s4, baking in an S shape, wherein the total length of the plate is 64 meters, 400 electrothermal tubes of 1000W are arranged, the plate is dried in three sections, 0-20 mu in a starting section is baked at 120 ℃ for 1-2 minutes, 20-40 m in a stationary section is baked at 180 ℃ for 2-3 minutes, and 40-64 m in a drying section is baked at 210 ℃ for 3-4 minutes.
Example 4
The components of the photosensitive emulsion composition are weighed according to the following proportion:
35 parts of vinyl polymer A;
130 parts of vinyl sulfonate polymer;
10 parts of phenolic resin;
5 parts of siloxane resin;
5 parts of infrared light absorbing dye;
3 parts of other auxiliary agents;
the other auxiliary agents comprise 1 part of stabilizing agent, 1 part of flatting agent, 0.5 part of defoaming agent and 0.5 part of surfactant.
A thermosensitive CTP plate was prepared according to the preparation method described in example 3.
Example 5
50 parts of vinyl polymer A;
110 parts of vinyl sulfonate polymer;
20 parts of phenolic resin;
3 parts of siloxane resin;
9 parts of infrared light absorbing dye;
8 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 2 parts of flatting agent, 1 part of defoaming agent and 3 parts of surfactant.
A thermosensitive CTP plate was prepared according to the preparation method described in example 3.
Example 6
40 parts of vinyl polymer B;
120 parts of vinyl sulfonate polymer;
15 parts of phenolic resin;
5 parts of siloxane resin;
14.5 parts of infrared light absorbing dye;
5.5 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 1.5 parts of flatting agent and 2 parts of surfactant.
A thermosensitive CTP plate was prepared according to the preparation method described in example 3.
Example 7
40 parts of vinyl polymer C;
120 parts of vinyl sulfonate polymer;
15 parts of phenolic resin;
5 parts of siloxane resin;
14.5 parts of infrared light absorbing dye;
5.5 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 1.5 parts of flatting agent and 2 parts of surfactant.
A thermosensitive CTP plate was prepared according to the preparation method described in example 3.
Example 8
The components of the photosensitive emulsion composition are weighed according to the following proportion:
40 parts of vinyl polymer A;
220 parts of vinyl sulfonate polymer;
15 parts of phenolic resin;
5 parts of siloxane resin;
14.5 parts of infrared light absorbing dye;
5.5 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 1.5 parts of flatting agent and 2 parts of surfactant.
A thermosensitive CTP plate was prepared according to the preparation method described in example 3.
Example 9
The components of the photosensitive emulsion composition are weighed according to the following proportion:
40 parts of vinyl polymer A;
320 parts of vinyl sulfonate polymer;
15 parts of phenolic resin;
5 parts of siloxane resin;
14.5 parts of infrared light absorbing dye;
5.5 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 1.5 parts of flatting agent and 2 parts of surfactant.
A thermosensitive CTP plate was prepared according to the preparation method described in example 3.
Example 10
The components of the photosensitive emulsion composition are weighed according to the following proportion:
40 parts of vinyl polymer A;
120 parts of vinyl sulfonate polymer;
15 parts of phenolic resin;
5 parts of siloxane resin;
14.5 parts of infrared light absorbing dye;
5.5 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 1.5 parts of flatting agent and 2 parts of surfactant.
In this embodiment, the above-mentioned photoresist composition is used for preparing a thermosensitive CTP plate, which is prepared as follows:
a preparation method of a thermosensitive CTP plate comprises the following steps:
s1, plate treatment: carrying out surface treatment on the aluminum substrate by using an alkaline solution, washing and drying, wherein the alkaline solution is 8% of sodium hydroxide solution;
s2, preparation of photosensitive coating liquid: uniformly mixing all components of the photosensitive emulsion composition, adding a solvent, and preparing the photosensitive emulsion composition into a photosensitive coating liquid with the viscosity of 50-70 cp, wherein the solvent is a mixed solution of ethyl acetate, acetone, ethylene glycol monomethyl ether and ethylene glycol monoethyl ether;
s3, coating: coating the photosensitive coating liquid on the treated plate;
s4, baking in an S shape, wherein the total length of the plate is 64 meters, 400 electrothermal tubes of 1000W are arranged, the plate is dried in three sections, 0-20 mu in a starting section is baked at 120 ℃ for 1-2 minutes, 20-40 m in a stationary section is baked at 180 ℃ for 2-3 minutes, and 40-64 m in a drying section is baked at 210 ℃ for 3-4 minutes.
Comparative example 1
Preparation of vinyl Polymer D: mixing N, N-dimethylformamide and benzoyl peroxide, adding the mixture into a three-necked bottle provided with a stirrer, a reflux pipe and a dropping funnel, reacting for 10-30 min at 75 ℃, then dropwise adding N- (4-acetoxyphenyl) maleimide and methyl methacrylate, reacting for 5 hours at constant temperature after 1 hour of dropwise adding, and continuously adjusting the viscosity with acetone during the reaction process to prevent gelation; wherein the dosage of the N, N-dimethylformamide is 36.5g (0.5mol), the molar ratio of N, N-dimethylformamide to N- (4-acetoxyphenyl) maleimide to methyl methacrylate is 1:2:0.2, the dosage of the benzoyl peroxide is 0.5 percent of the mass of the N, N-dimethylformamide, and nitrogen is continuously introduced during the reaction. After the reaction is finished, cooling, adding a large amount of methanol, filtering and drying to obtain an off-white solid. The molecular weight was measured by Gel Permeation Chromatography (GPC) to obtain a number average molecular weight of 8900.
The components of the photosensitive emulsion composition are weighed according to the following proportion:
40 parts of vinyl polymer D;
120 parts of vinyl sulfonate polymer;
15 parts of phenolic resin;
5 parts of siloxane resin;
14.5 parts of infrared light absorbing dye;
5.5 parts of other auxiliary agents;
the other auxiliary agents comprise 2 parts of stabilizing agent, 1.5 parts of flatting agent, 2 parts of defoaming agent and 2 parts of surfactant.
A thermosensitive CTP plate was prepared according to the preparation method described in example 3.
Hydrophilicity tests were performed on the thermosensitive CTP plates prepared in examples 3-10 and comparative example 1, and the results of the test methods are shown in Table 1, and the test methods are as follows: starting a printing machine, observing the separation condition of the ink and the water, if the ink and the water are clearly separated within 60s after starting, the hydrophilicity is excellent, and if the ink and the water are clearly separated within 60 s-120 s, the hydrophilicity is general; if the ink can be separated only after more than 120 seconds, the hydrophilicity is poor.
Dot testing was performed on the UV-CTP plates prepared in examples 3 to 10 and comparative example 1 using an alice plate tester, and the test results are shown in table 1.
TABLE 1
The technical features of the embodiments described above may be arbitrarily combined, and for the sake of brevity, all possible combinations of the technical features in the embodiments described above are not described, but should be considered as being within the scope of the present specification as long as there is no contradiction between the combinations of the technical features.
The above-mentioned embodiments only express several embodiments of the present invention, and the description thereof is more specific and detailed, but not construed as limiting the scope of the invention. It should be noted that, for a person skilled in the art, several variations and modifications can be made without departing from the inventive concept, which falls within the scope of the present invention. Therefore, the protection scope of the present patent shall be subject to the appended claims.
Claims (7)
1. A photosensitive emulsion composition is characterized by comprising the following components in parts by weight:
35-50 parts of a vinyl polymer;
10-30 parts of vinyl sulfonate polymer;
10-20 parts of phenolic resin;
3-5 parts of siloxane resin;
5-15 parts of infrared light absorbing dye;
3-8 parts of other auxiliary agents;
the vinyl polymer is a copolymer of N- (4-acetoxyphenyl) maleimide, N-dimethylformamide and hydroxyethyl acrylate, the hydroxyl value of the vinyl polymer is 10-30 mgKOH, and the vinyl sulfonate polymer is a copolymer of N-butyl vinyl benzene sulfonate, acrylic acid and ethyl methacrylate; the vinyl polymer is prepared from N, N-dimethylformamide, N- (4-acetoxyphenyl) maleimide and hydroxyethyl acrylate according to a molar ratio of 1 (1-5): (0.1-0.5) copolymerization;
the vinyl sulfonate polymer is prepared by mixing n-butyl vinyl benzene sulfonate, acrylic acid and ethyl methacrylate according to a molar ratio of 1: (0.5-1): (2-4) copolymerization.
2. A photoresist composition according to claim 1, wherein the hydroxyl value of the vinyl polymer is 10 to 20 mgKOH.
3. A photoresist composition according to claim 1, wherein the molecular weight of the vinyl polymer is 10000 to 20000.
4. A photoresist composition according to claim 1, wherein the vinyl sulfonate polymer has a molecular weight of 5000 to 10000.
5. A heat-sensitive CTP plate, comprising an aluminum plate base support and a photosensitive layer coated on the aluminum plate base support, wherein the photosensitive layer is formed by curing a photosensitive coating liquid, and the photosensitive coating liquid comprises the photosensitive resist composition of any one of claims 1 to 4.
6. The method for preparing the heat-sensitive CTP plate as claimed in claim 5, which comprises the following steps:
s1, plate treatment: carrying out surface treatment on the aluminum substrate by using an alkaline solution, then washing and drying;
s2, preparation of photosensitive coating liquid: uniformly mixing the components of the photosensitive resist composition according to any one of claims 1 to 4, adding a solvent to prepare the photosensitive resist composition into a photosensitive coating liquid with the viscosity of 50-70 cp, wherein the solvent is at least two of ethyl acetate, acetone, ethylene glycol monomethyl ether and ethylene glycol monoethyl ether;
s3, coating: coating the photosensitive coating liquid on the treated plate;
s4, drying: and (5) drying the plate.
7. The method for preparing a heat-sensitive CTP plate according to claim 6, wherein step S4 is: the plate is dried in three sections, wherein 0-20 m of the starting section is baked at 120 ℃ for 1-2 minutes, 20-40 m of the stabilizing section is baked at 180 ℃ for 2-3 minutes, and 40-64 m of the drying section is baked at 210 ℃ for 3-4 minutes.
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| CN103881025A (en) * | 2012-12-21 | 2014-06-25 | 乐凯华光印刷科技有限公司 | Anti-solvent vinyl polymer with multilayer structure, synthetic method thereof and applications thereof |
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| JP2004170597A (en) * | 2002-11-19 | 2004-06-17 | Toyobo Co Ltd | Photosensitive printing original plate |
| CN101770170A (en) * | 2008-12-30 | 2010-07-07 | 乐凯集团第二胶片厂 | Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same |
| CN102311694A (en) * | 2011-05-10 | 2012-01-11 | 刘华礼 | Rinsing-free CTP (cytidine triphosphate) coating fluid and preparation method thereof |
| CN103881025A (en) * | 2012-12-21 | 2014-06-25 | 乐凯华光印刷科技有限公司 | Anti-solvent vinyl polymer with multilayer structure, synthetic method thereof and applications thereof |
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