CN106926114A - A kind of new consolidation nanometer diamond alkene abrasive disk and its preparation technology - Google Patents
A kind of new consolidation nanometer diamond alkene abrasive disk and its preparation technology Download PDFInfo
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- CN106926114A CN106926114A CN201710295086.9A CN201710295086A CN106926114A CN 106926114 A CN106926114 A CN 106926114A CN 201710295086 A CN201710295086 A CN 201710295086A CN 106926114 A CN106926114 A CN 106926114A
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/12—Lapping plates for working plane surfaces
- B24B37/14—Lapping plates for working plane surfaces characterised by the composition or properties of the plate materials
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
- B24D18/0009—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for using moulds or presses
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- Mechanical Engineering (AREA)
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- Polishing Bodies And Polishing Tools (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
A kind of new consolidation nanometer diamond alkene abrasive disk, is made up of basic material addition nanometer diamond alkene, and the basic material is made up of following components in percentage by weight：The modified epoxy resin of E 54 and methyl tetrahydro phthalic anhydride 55~60%, N, N dimethyl benzylamines 0.5~1%, plasticizer 3.5~4%, filler 30~35%, pore creating material 5~6%, the mass ratio of 15~33wt% of raw material based on the addition of nanometer diamond alkene, the epoxy resin of E 54 and methyl tetrahydro phthalic anhydride is 10:9.Present invention consolidation nanometer diamond alkene abrasive disk lapping efficiency is high；Abrasive material utilization rate is high in consolidation nanometer diamond alkene abrasive disk process of lapping, and low cost, environmental pollution is small；Abrasive material will not be embedded in workpiece to be machined surface after the abrasive disk grinding of consolidation nanometer diamond alkene, and follow-up workpiece is cleaned and easy to process.
Description
Technical field
The invention belongs to grinding and polishing technical field, and in particular to a kind of new consolidation nanometer diamond alkene abrasive disk and its system
Standby technique.
Background technology
Since 21 century, the information industry with IC industries as representative enters the stage of developing rapidly, the spy of IC chip
Levy line width and also marched toward nanoscale from micron order, the characteristic line breadth of current IC chip is only 22 nm, wafer size also into
300mm the and 400mm epoch, and to more large scale develop, with meet improve IC chip yield the need for, while with telecommunications
The increasingly lighting of product, Composite and intellectuality, it is desirable to IC chip thickness microminiaturization, and chip list surface state is by direct shadow
The line width capabilities of Chinese percussion instrument part.Current IC chip is surface flattening to use cmp polishing technology, and traditional change
It is, as abrasive material, workpiece surface to be carried out using the grinding technique of free abrasive with carborundum, silica etc. to learn mechanical lapping polishing
Micro Process, so that high-quality finished surface is obtained, but the workpiece after the processing of the grinding technique of this free abrasive easily occurs
Sub-surface damage layer, it is more difficult to obtain the grinding and polishing side of super-smooth surface, the performance of influence product, and this free abrasive
Abrasive material of the method after grinding and polishing processing cannot be reclaimed, and easily cause the waste of abrasive material, while pollution can be produced to environment.
As shown in Figure 1, in process, abrasive material 1 is participated in free abrasive grinding and polishing process principle in free mode
Attrition process, abrasive material 1 is randomly dispersed on grinding pad 3, is contacted with the whole surface of work piece 2, causes the surface of work piece 2
The region that need not be processed also is ground, and is easily caused workpiece dimension and deviates target size, furthermore because free abrasive grinds
Abrasive material 1 is free in mill, and the micropore being easily caused in abrasive disk is blocked, and causes abrasive disk glazing phenomenon occur, while
Need ceaselessly to add the lapping liquid containing abrasive material in process of lapping, cause the waste of abrasive material, substantial amounts of lapping liquid carries mill
Material and scrap discharge, pollute environment.In sum, free abrasive attrition process is primarily present following shortcoming：
1) the selectivity processing in process of lapping to workpiece to be machined surface is poor, and global planarizartion effect is poor；
2) processing efficiency is relatively low, and processing technology is difficult to control；
3) abrasive material utilization rate is low, wastes serious, and high cost is big for environment pollution；
4) abrasive material insertion workpiece to be machined surface is easily caused after grinding, is made troubles to workpiece cleaning and following process.
The content of the invention
It is an object of the invention to provide a kind of new consolidation nanometer diamond alkene abrasive disk, while it is this to provide its preparation method
The another goal of the invention of invention.
To achieve the above object, the technical scheme that the present invention takes is as follows：
A kind of new consolidation nanometer diamond alkene abrasive disk, by basic material addition nanometer diamond alkene be made, the basic material by
Following components in percentage by weight is made：Modified E-54 epoxy resin and methyl tetrahydro phthalic anhydride 55~60%, N, N- dimethylbenzyls
Amine 0.5~1%, plasticizer 3.5~4%, filler 30~35%, pore creating material 5~6%, raw material based on the addition of nanometer diamond alkene
15~33wt%, the mass ratio of E-54 epoxy resin and methyl tetrahydro phthalic anhydride is 10:9.
30~33wt% of raw material based on the addition of nanometer diamond alkene.
The 30wt% of raw material based on the addition of nanometer diamond alkene.
The pore creating material is the mixture of graphite and salt, and the mixed proportion of the two is 1:1~2.
The plasticizer is dibutyl phthalate (DBP), and filler is modified grammite.
The nanometer diamond alkene is by matter by tetra- kinds of varigrained nanometer diamond alkene of 50nm, 100nm, 200nm, 250nm
Amount is than (1 ~ 2)：(2~3)：(3~4)：(4 ~ 5) obtained through following treatment after mixing：
1. ultrasonic alkali cleaning：Mixed nanometer diamond alkene is placed in into alkaline bath ultrasound alkali cleaning and to stir, supersonic frequency is 30~
40KHz, alkali wash water for concentration 10%~15% NaOH solution, alkali wash water temperature be 45~55 DEG C, mixing speed be 25~
35rpm, the alkali cleaning time is 25~35min；The step purpose is by the oily waste degradation of nanometer diamond alkene surface attachment；
2. it is cleaned by ultrasonic：Nanometer diamond alkene after alkali cleaning is placed in deionized water and is cleaned by ultrasonic and is stirred, supersonic frequency is 30
~35KHz, mixing speed is 15~25rpm, and mixing time is 20~25min, and cleaning is until supernatant liquor pH=7 repeatedly；
3. acid-wash activation：Nanometer diamond alkene after cleaning is placed in pickle acid-wash activation and is stirred, pickle is volume ratio
It is 1:10 concentrated hydrochloric acid and concentrated sulfuric acid mixed liquor, temperature is normal temperature, and rotary rpm is 10~15rpm, mixing time is 10~
15min, the step purpose is reached the purpose of raw material surface active；
4. ultrasound washing：Nanometer diamond alkene after acid-wash activation is placed in the washing of deionized water ultrasound and is stirred, supersonic frequency is
30~35KHz, mixing speed is 15~25rpm, and mixing time is 10~15min, and washing is until supernatant liquor pH=7 repeatedly；
5. dry：Toasted using staged, be specifically first warming up to 70 DEG C by 2 DEG C/min of speed, after insulation 30min, then risen
Temperature is incubated 30min to 90 DEG C, is continuously heating to 120 DEG C, is incubated 3h, room temperature is naturally cooled to afterwards stand-by.The purpose of drying is
By the moisture removal in treated raw material.
The preparation method of described new consolidation nanometer diamond alkene abrasive disk, comprises the following steps：
1) pre-treatment
Filler, pore creating material are put into baking oven in 1h is toasted at 100 DEG C, by the moisture removal in raw material, prevent mill from solidifying
Moisture vaporization causes stomata during heating；
2) batch mixing
E-54 epoxy resin and methyl tetrahydro phthalic anhydride are placed in temperature control mixing device in mixing at 80 DEG C, then add accelerator and mixed
Close, maintenance system temperature, stirring is obtained shaping during filler, nanometer diamond alkene, pore creating material are added into temperature control mixing device successively
Slurry, stirring frequency is 20~40rpm, and mixing time is 10 min~1h；
3) vacuum row bubble
Using vacuum equipment in vacuum for 0.1MPa lower pumpings row steeps 10~30min, it is therefore an objective to discharge the bubble in slurry；
4) mould pre-treatment
By being put into baking oven after the inner surface coating releasing agent of the mould of abrasive disk use 2~10min are preheated in 80 DEG C；
5) pour
By step 3）Slurry after vacuum row's bubble is poured in mould after preheat, is smeared uniform and is struck off；
6) secondary row's bubble
It is 10~30min of 0.1MPa lower pumpings row's bubble that template after pouring is put into vacuum equipment in vacuum；
7) resin solidification
Using stepped baking process baking during template after secondary row steeps is put into baking oven, concrete technology is：First rising
Warm speed is that 2 DEG C/min rises to 40 DEG C of insulation 30min by normal temperature, then is warming up to 90 DEG C of insulation 1h, continues to be warmed up to 110 DEG C of insulations
1h, is warmed up to 120~150 DEG C, is incubated 2~10h, and insulation naturally cools to normal temperature after terminating；
8) demoulding
Abrasive disk is peeled off from mould after the completion of solidification, and double faced adhesive tape is sticked in reverse side（Purpose is bonded when subsequently using）, it is complete
Into the preparation of abrasive disk.
Step 4）In mould be made up of sulphurated siliastic.
In the application, filler, pore creating material and nanometer diamond alkene toasted removal moisture content, such purpose are to prevent mill
Moisture vaporization causes stomata during disk solidification heating.
Compared with prior art, the invention has the advantages that：1st, after adding nanometer diamond alkene, the hardness of abrasive disk
Height, wearability is strong, and grinding efficiency is high；2nd, nanometer diamond alkene has and has no toxic side effect, and person nonhazardous is acted on；3rd, consolidation is received
Glass surface roughness after the abrasive disk grinding of rice diamond alkene is low, and surface quality is high；4th, consolidation nanometer diamond alkene abrasive disk grinding
It is high in machining efficiency；5th, abrasive material utilization rate is high in consolidation nanometer diamond alkene abrasive disk process of lapping, and low cost, environmental pollution is small；
6th, abrasive material will not be embedded in workpiece to be machined surface, follow-up workpiece cleaning and processing side after the grinding of consolidation nanometer diamond alkene abrasive disk
Just.
Figure of description
Fig. 1 is free abrasive grinding and polishing process principle figure；
Fig. 2 is the firmness change schematic diagram of the abrasive disk of different nanometer diamond alkene contents；
Fig. 3 is the grinding grinding efficiency change schematic diagram of the abrasive disk of different nanometer diamond alkene contents；
Fig. 4 is the glass processing quantity schematic diagram of different nanometer diamond alkene contents；
Fig. 5 is the schematic diagram of the abrasive disk ground glass surface roughness of different nanometer diamond alkene contents.
Specific embodiment
It should be noted that heretofore described normal temperature and room temperature are defined as 20~30 DEG C.
Wherein, the E-54 epoxy resin that is modified is commercially available, purchased from Wuxi chemical plant；Methyl tetrahydro phthalic anhydride (MTHPA) for commercially available,
Purchased from Wuxi chemical plant；N, N- dimethyl benzylamine are commercially available, purchased from Chemical Reagent Co., Ltd., Sinopharm Group；Plasticizer neighbour's benzene two
Formic acid dibutyl ester is commercially available, purchased from Chemical Reagent Co., Ltd., Sinopharm Group；Filler modified wollastonite is commercially available, Jiangxi spy's ore deposit difficult to understand
Thing Materials Co., Ltd；Releasing agent is epoxy resin parting agent special QV5110, commercially available.
With specific embodiment, the present invention will be further described below.
Embodiment 1
A kind of new consolidation nanometer diamond alkene abrasive disk, by basic material addition nanometer diamond alkene be made, the basic material by
Following components in percentage by weight is made：Modified E-54 epoxy resin and methyl tetrahydro phthalic anhydride (MTHPA) 55%, N, N- dimethyl
Benzylamine 0.5%, plasticizer（Dibutyl phthalate）3.5%th, filler（Modified grammite）35%th, pore creating material 6%, nanometer diamond alkene
Addition based on raw material 30wt%, the mass ratio of E-54 epoxy resin and methyl tetrahydro phthalic anhydride is 10:9.
The pore creating material is the mixture of graphite and salt, and the mixed proportion of the two is 1:1.
The nanometer diamond alkene is by matter by tetra- kinds of varigrained nanometer diamond alkene of 50nm, 100nm, 200nm, 250nm
Amount compares 1：2：3：Obtained through following treatment after 4 mixing：
1. ultrasonic alkali cleaning：Mixed nanometer diamond alkene is placed in alkaline bath ultrasound alkali cleaning and is stirred, supersonic frequency is 30KHz,
Alkali wash water is the NaOH solution of concentration 10%, and alkali wash water temperature is 45 DEG C, and mixing speed is 25rpm, the alkali cleaning time is 25~
35min；The step purpose is by the oily waste degradation of nanometer diamond alkene surface attachment；
2. it is cleaned by ultrasonic：Nanometer diamond alkene after alkali cleaning is placed in deionized water and is cleaned by ultrasonic and is stirred, supersonic frequency is
30KHz, mixing speed is 15rpm, and mixing time is 20min, and cleaning is until supernatant liquor pH=7 repeatedly；
3. acid-wash activation：Nanometer diamond alkene after cleaning is placed in pickle acid-wash activation and is stirred, pickle is volume ratio
It is 1:10 concentrated hydrochloric acid and concentrated sulfuric acid mixed liquor, temperature is normal temperature, and rotary rpm is 10rpm, and mixing time is 10min, the step
Rapid purpose is reached the purpose of raw material surface active；
4. ultrasound washing：Nanometer diamond alkene after acid-wash activation is placed in the washing of deionized water ultrasound and is stirred, supersonic frequency is
30KHz, mixing speed is 15rpm, and mixing time is 10min, and washing is until supernatant liquor pH=7 repeatedly；
5. dry：Toasted using staged, be specifically first warming up to 70 DEG C by 2 DEG C/min of speed, after insulation 30min, then risen
Temperature is incubated 30min to 90 DEG C, is continuously heating to 120 DEG C, is incubated 3h, room temperature is naturally cooled to afterwards stand-by.The purpose of drying is
By the moisture removal in treated raw material.
The preparation method of described new consolidation nanometer diamond alkene abrasive disk, comprises the following steps：
1) pre-treatment
Filler, pore creating material are put into baking oven in 1h is toasted at 100 DEG C, by the moisture removal in raw material, prevent mill from solidifying
Moisture vaporization causes stomata during heating；
2) batch mixing
E-54 epoxy resin and methyl tetrahydro phthalic anhydride are placed in temperature control mixing device in mixing at 80 DEG C, then add accelerator and mixed
Close, maintenance system temperature, stirring is obtained shaping during filler, nanometer diamond alkene, pore creating material are added into temperature control mixing device successively
Slurry, stirring frequency is 20rpm, and mixing time is 10min；
3) vacuum row bubble
Using vacuum equipment in vacuum for 0.1MPa lower pumpings row steeps 10min, it is therefore an objective to discharge the bubble in slurry；
4) mould pre-treatment
By being put into baking oven after the inner surface coating releasing agent of the mould of abrasive disk use 2min are preheated in 80 DEG C；
5) pour
By step 3）Slurry after vacuum row's bubble is poured in mould after preheat, is smeared uniform and is struck off；
6) secondary row's bubble
It is 0.1MPa lower pumpings row's bubble 10min that template after pouring is put into vacuum equipment in vacuum；
7) resin solidification
Using stepped baking process baking during template after secondary row steeps is put into baking oven, concrete technology is：First rising
Warm speed is that 2 DEG C/min rises to 40 DEG C of insulation 30min by normal temperature, then is warming up to 90 DEG C of insulation 1h, continues to be warmed up to 110 DEG C of insulations
1h, is warmed up to 120 DEG C, is incubated 2h, and insulation naturally cools to normal temperature after terminating；
8) demoulding
Abrasive disk is peeled off from mould after the completion of solidification, and double faced adhesive tape is sticked in reverse side, complete the preparation of abrasive disk.
Step 4）In mould be made up of sulphurated siliastic.
Embodiment 2
A kind of new consolidation nanometer diamond alkene abrasive disk, by basic material addition nanometer diamond alkene be made, the basic material by
Following components in percentage by weight is made：Modified E-54 epoxy resin and methyl tetrahydro phthalic anhydride (MTHPA) 60%, N, N- dimethyl
Benzylamine 1%, plasticizer |（Dibutyl phthalate）4%th, filler（Modified grammite）30%th, pore creating material 5%, nanometer diamond alkene
The mass ratio of the 33wt% of raw material based on addition, E-54 epoxy resin and methyl tetrahydro phthalic anhydride is 10:9.
The pore creating material is the mixture of graphite and salt, and the mixed proportion of the two is 1:1~2.
The nanometer diamond alkene is by matter by tetra- kinds of varigrained nanometer diamond alkene of 50nm, 100nm, 200nm, 250nm
Amount compares 2：3：4：Obtained through following treatment after 5 mixing：
1. ultrasonic alkali cleaning：Mixed nanometer diamond alkene is placed in alkaline bath ultrasound alkali cleaning and is stirred, supersonic frequency is 40KHz,
Alkali wash water is the NaOH solution of concentration 15%, and alkali wash water temperature is 55 DEG C, and mixing speed is 35rpm, and the alkali cleaning time is 35min；Should
Step purpose is by the oily waste degradation of nanometer diamond alkene surface attachment；
2. it is cleaned by ultrasonic：Nanometer diamond alkene after alkali cleaning is placed in deionized water and is cleaned by ultrasonic and is stirred, supersonic frequency is
35KHz, mixing speed is 25rpm, and mixing time is 25min, and cleaning is until supernatant liquor pH=7 repeatedly；
3. acid-wash activation：Nanometer diamond alkene after cleaning is placed in pickle acid-wash activation and is stirred, pickle is volume ratio
It is 1:10 concentrated hydrochloric acid and concentrated sulfuric acid mixed liquor, temperature is normal temperature, and rotary rpm is 15rpm, and mixing time is 15min, the step
Rapid purpose is reached the purpose of raw material surface active；
4. ultrasound washing：Nanometer diamond alkene after acid-wash activation is placed in the washing of deionized water ultrasound and is stirred, supersonic frequency is
35KHz, mixing speed is 25rpm, and mixing time is 15min, and washing is until supernatant liquor pH=7 repeatedly；
5. dry：Toasted using staged, be specifically first warming up to 70 DEG C by 2 DEG C/min of speed, after insulation 30min, then risen
Temperature is incubated 30min to 90 DEG C, is continuously heating to 120 DEG C, is incubated 3h, room temperature is naturally cooled to afterwards stand-by.The purpose of drying is
By the moisture removal in treated raw material.
The preparation method of described new consolidation nanometer diamond alkene abrasive disk, comprises the following steps：
1) pre-treatment
Filler, pore creating material are put into baking oven in 1h is toasted at 100 DEG C, by the moisture removal in raw material, prevent mill from solidifying
Moisture vaporization causes stomata during heating；
2) batch mixing
E-54 epoxy resin and methyl tetrahydro phthalic anhydride are placed in temperature control mixing device in mixing at 80 DEG C, then add accelerator and mixed
Close, maintenance system temperature, stirring is obtained shaping during filler, nanometer diamond alkene, pore creating material are added into temperature control mixing device successively
Slurry, stirring frequency is 40rpm, and mixing time is 1h；
3) vacuum row bubble
Using vacuum equipment in vacuum for 0.1MPa lower pumpings row steeps 30min, it is therefore an objective to discharge the bubble in slurry；
4) mould pre-treatment
By being put into baking oven after the inner surface coating releasing agent of the mould of abrasive disk use 10min are preheated in 80 DEG C；
5) pour
By step 3）Slurry after vacuum row's bubble is poured in mould after preheat, is smeared uniform and is struck off；
6) secondary row's bubble
It is 0.1MPa lower pumpings row's bubble 30min that template after pouring is put into vacuum equipment in vacuum；
7) resin solidification
Using stepped baking process baking during template after secondary row steeps is put into baking oven, concrete technology is：First rising
Warm speed is that 2 DEG C/min rises to 40 DEG C of insulation 30min by normal temperature, then is warming up to 90 DEG C of insulation 1h, continues to be warmed up to 110 DEG C of insulations
1h, is warmed up to 150 DEG C, is incubated 10h, and insulation naturally cools to normal temperature after terminating；
8) demoulding
Abrasive disk is peeled off from mould after the completion of solidification, and double faced adhesive tape is sticked in reverse side, complete the preparation of abrasive disk.
Step 4）In mould be made up of sulphurated siliastic.
Embodiment 3
A kind of new consolidation nanometer diamond alkene abrasive disk, by basic material addition nanometer diamond alkene be made, the basic material by
Following components in percentage by weight is made：Modified E-54 epoxy resin and methyl tetrahydro phthalic anhydride 57%, N, N- dimethyl benzylamines 1%,
Plasticizer（Dibutyl phthalate）4%th, filler（Modified grammite）33%th, pore creating material 5%, the addition of nanometer diamond alkene is
The mass ratio of the 20wt% of basic material, E-54 epoxy resin and methyl tetrahydro phthalic anhydride is 10:9.
The pore creating material is the mixture of graphite and salt, and the mixed proportion of the two is 1:1~2.
The nanometer diamond alkene is with embodiment 1.
The preparation method of described new consolidation nanometer diamond alkene abrasive disk, with embodiment 1.
Performance test：
The abrasive disk containing different content nanometer diamond alkene is prepared respectively, and preparation method is carried out following with embodiment 1 to it
Performance test：
Hardness determination：The hardness of abrasive disk is detected with Rockwell apparatus, its running parameter is on-load pressure 588N, and pressure head type is
Steel ball, steel ball size is 3.175mm, and method of testing is that tow sides respectively survey 5 points, wherein a point, center are distinguished in 4 corners
One point；
Grinding grinding efficiency detection：Grind grinding efficiency to be represented with material removal rate, refer to the workpiece volume abraded in the unit interval
Or quality, method of testing is the thickness of the same frit of grinding per minute under identical grinding condition；
Wearability is detected：Abrasive disk is fixed on grinder, mobile phone display screen is ground, under identical grinding condition, with one
Slice lapping disk begins to use to scrapping, and the yield of abrading glass product tests the wearability of abrasive disk；
Abrading glass product surface quality is tested：Surface is carried out to the glass product after grinding using ZYGO types roughness tester
Detection, is averaged using 6 method measurements, measures the roughness of glass.
Fig. 2 is the firmness change schematic diagram of the abrasive disk of different nanometer diamond alkene contents, can be readily apparent that from Fig. 2
Find out, with the raising of nanometer diamond alkene content, the hardness of abrasive disk is improved with the rising of the content of nanometer diamond alkene
, when the content of nanometer diamond alkene is less than 40%, the raising speed of the hardness of abrasive disk less, increases in more stable
State, after the content of nanometer diamond alkene is higher than 40%, the hardness of abrasive disk improves speed quickly, and hardness crosses conference to abrasive disk
Using producing bad performance, therefore the content of nanometer diamond alkene to be advisable no more than 40%.
Fig. 3 is the grinding grinding efficiency change schematic diagram of the abrasive disk of different nanometer diamond alkene contents, a：33%, b：30%,
c：45%, d：15%.It is different as can be seen from Figure 3, the grinding grinding efficiency of the abrasive disk of nanometer diamond alkene content be it is different, when
When the content of nanometer diamond alkene is 30% (a, b), the grinding grinding efficiency of abrasive disk is high, and cutting stabilization is high, when nanometer diamond alkene
When content is improved (c), the grinding grinding efficiency reduction of abrasive disk, cutting stablizes weak, when the content reduction of nanometer diamond alkene
D (), the grinding grinding efficiency reduction of abrasive disk, cutting stability is poor.
Fig. 4 is the glass processing quantity schematic diagram of different nanometer diamond alkene contents, a：33%, b：30%, c：45%, d：15%.
As can be seen from Figure 4 the glass processing quantity of the abrasive disk of different nanometer diamond alkene contents is different, when nanometer diamond alkene
Content when being 30% (a, b), the hardness of abrasive disk is high, and grinding grinding efficiency is high, and cutting stabilization is high, and glass processing quantity is high, about
It is 160000, wearability is high, when the content of nanometer diamond alkene is improved (c), the grinding grinding efficiency reduction of abrasive disk, cutting
Stablize weak, hardness is improved, abrasive disk unstable properties, glass processing quantity is substantially reduced, about 120000, relative to a, b,
Glass throughput reduces 25%, wearability reduction, (d), the grinding grinding efficiency of abrasive disk when the content reduction of nanometer diamond alkene
Reduce, cutting stability is poor, and glass processing quantity is substantially reduced, and about 120000, relative to a, b, glass throughput is reduced
25%, wearability reduction.
Fig. 5 is the schematic diagram of the abrasive disk ground glass surface roughness of different nanometer diamond alkene contents, a：33%, b：
30%, c：45%, d：15%.From figure 5 it can be seen that the glass surface after the abrasive disk grinding of different nanometer diamond alkene contents is thick
Rugosity is different, and when the content of nanometer diamond alkene is 33%, surface roughness Ra is about 0.495, when containing for nanometer diamond alkene
Measure for 30% when, surface roughness Ra is about 0.533, when nanometer diamond alkene content be 45% when, surface roughness Ra is about
0.688, when the content of nanometer diamond alkene is 15%, surface roughness Ra is about 0.541, therefore, it is seen that nanometer diamond alkene contains
It is 15%~33% to measure, and the glass surface roughness for obtaining is low.
To sum up analyze, when nanometer diamond alkene content is 30%~33%, its properties is preferable.
Claims (8)
1. a kind of new consolidation nanometer diamond alkene abrasive disk, it is characterised in that be made up of basic material addition nanometer diamond alkene, institute
Basic material is stated to be made up of following components in percentage by weight：Modified E-54 epoxy resin and methyl tetrahydro phthalic anhydride 55~60%,
N, N- dimethyl benzylamine 0.5~1%, plasticizer 3.5~4%, filler 30~35%, pore creating material 5~6%, the addition of nanometer diamond alkene
The mass ratio of 15~33wt% of raw material based on amount, E-54 epoxy resin and methyl tetrahydro phthalic anhydride is 10:9.
2. new consolidation nanometer diamond alkene abrasive disk as claimed in claim 1, it is characterised in that the addition of nanometer diamond alkene
Based on raw material 30~33wt%.
3. new consolidation nanometer diamond alkene abrasive disk as claimed in claim 1, it is characterised in that the addition of nanometer diamond alkene
Based on raw material 30wt%.
4. new consolidation nanometer diamond alkene abrasive disk as claimed in claim 1, it is characterised in that the pore creating material be graphite and
The mixture of salt, the mixed proportion of the two is 1:1~2.
5. new consolidation nanometer diamond alkene abrasive disk as claimed in claim 1, it is characterised in that the plasticizer is adjacent benzene two
Formic acid dibutyl ester, filler is modified grammite.
6. new consolidation nanometer diamond alkene abrasive disk as claimed in claim 1, it is characterised in that the nanometer diamond alkene is served as reasons
The varigrained nanometer diamond alkene of tetra- kinds of 50nm, 100nm, 200nm, 250nm is in mass ratio (1 ~ 2)：(2~3)：(3~4)：(4~5)
Obtained through following treatment after mixing：1. ultrasonic alkali cleaning：Mixed nanometer diamond alkene is placed in alkaline bath ultrasound alkali cleaning and is stirred,
Supersonic frequency is 30~40KHz, and alkali wash water is the NaOH solution of concentration 10%~15%, and alkali wash water temperature is 45~55 DEG C, stirring
Speed is 25~35rpm, and the alkali cleaning time is 25~35min；2. it is cleaned by ultrasonic：Nanometer diamond alkene after alkali cleaning is placed in deionization
Be cleaned by ultrasonic in water and stir, supersonic frequency be 30~35KHz, mixing speed be 15~25rpm, mixing time be 20~
25min, cleaning is until supernatant liquor pH=7 repeatedly；3. acid-wash activation：Nanometer diamond alkene after cleaning is placed in acid in pickle
Wash and activate and stir, pickle is that volume ratio is 1:10 concentrated hydrochloric acid and concentrated sulfuric acid mixed liquor, temperature is normal temperature, and rotary rpm is
10~15rpm, mixing time is 10~15min；4. ultrasound washing：Nanometer diamond alkene after acid-wash activation is placed in deionized water
Ultrasound washing is simultaneously stirred, and supersonic frequency is 30~35KHz, and mixing speed is 15~25rpm, and mixing time is 10~15min, instead
Rehydration is washed until supernatant liquor pH=7；5. dry：Toasted using staged, be specifically first warming up to 70 by 2 DEG C/min of speed
DEG C, after insulation 30min, then it is warming up to 90 DEG C, 30min is incubated, 120 DEG C are continuously heating to, 3h is incubated, room is naturally cooled to afterwards
Temperature is stand-by.
7. the preparation method of any described new consolidation nanometer diamond alkene abrasive disks of claim 1-6, it is characterised in that including
Following steps：
1) pre-treatment
Filler, pore creating material are put into baking oven in toasting 1h at 100 DEG C；
2) batch mixing
E-54 epoxy resin and methyl tetrahydro phthalic anhydride are placed in temperature control mixing device in mixing at 80 DEG C, then add accelerator and mixed
Close, maintenance system temperature, stirring is obtained shaping during filler, nanometer diamond alkene, pore creating material are added into temperature control mixing device successively
Slurry, stirring frequency is 20~40rpm, and mixing time is 10min~1h；
3) vacuum row bubble
Using vacuum equipment in vacuum for 0.1MPa lower pumpings row steeps 10~30min；
4) mould pre-treatment
By being put into baking oven after the inner surface coating releasing agent of the mould of abrasive disk use 2~10min are preheated in 80 DEG C；
5) pour
By step 3）Slurry after vacuum row's bubble is poured in mould after preheat；
6) secondary row's bubble
It is 10~30min of 0.1MPa lower pumpings row's bubble that template after pouring is put into vacuum equipment in vacuum；
7) resin solidification
Using stepped baking process baking during template after secondary row steeps is put into baking oven, concrete technology is：First rising
Warm speed is that 2 DEG C/min rises to 40 DEG C of insulation 30min by normal temperature, then is warming up to 90 DEG C of insulation 1h, continues to be warmed up to 110 DEG C of insulations
1h, is warmed up to 120~150 DEG C, is incubated 2~10h, and insulation naturally cools to normal temperature after terminating；
8) demoulding
Abrasive disk is peeled off from mould after the completion of solidification, and double faced adhesive tape is sticked in reverse side, complete the preparation of abrasive disk.
8. the preparation method of new consolidation nanometer diamond alkene abrasive disk as claimed in claim 6, it is characterised in that step 4）In
Mould be made up of sulphurated siliastic.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111805415A (en) * | 2020-07-16 | 2020-10-23 | 湖南圣高机械科技有限公司 | Porous resin grinding disc and preparation method thereof |
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2017
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111805415A (en) * | 2020-07-16 | 2020-10-23 | 湖南圣高机械科技有限公司 | Porous resin grinding disc and preparation method thereof |
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