CN106918857B - Device and method for preparing nano grating - Google Patents
Device and method for preparing nano grating Download PDFInfo
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- CN106918857B CN106918857B CN201710253240.6A CN201710253240A CN106918857B CN 106918857 B CN106918857 B CN 106918857B CN 201710253240 A CN201710253240 A CN 201710253240A CN 106918857 B CN106918857 B CN 106918857B
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- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
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Abstract
The invention discloses a device for preparing a nano grating, which comprises an installation base and an L-shaped installation support, wherein the L-shaped installation support is fixedly welded at the top of one side of the installation base, the bottom of the installation base is fixedly welded with a support frame, the top of the installation base is fixedly provided with a motor, an output shaft of the motor is connected with a second rotating connecting piece, one end, far away from the motor, of the second rotating connecting piece is provided with a glue homogenizing table, and the second rotating connecting piece is rotatably connected with the glue homogenizing table. The device for preparing the nano grating is simple in structure and reasonable in design, a photoresist spin coating process is completed by using the photoresist homogenizing table, and the exposure work of the substrate is completed by using the electron beam exposure machine, the intermediate mask, the condensing lens and the reflecting mirror.
Description
Technical Field
The invention relates to the technical field of nano-gratings, in particular to a device and a method for preparing a nano-grating.
Background
Gratings, as an important chemical component, are widely used in the fields of integrated circuits, optical communications, optical interconnects, optical information processing, optical measurements, and the like. With the rapid development of nanotechnology, nanotechnology is one of the most widely studied and most invested scientific and technological fields at present. With the application of the grating in the nanometer scale, the preparation method of the nanometer grating is very important. In the prior art, the preparation method of the nano grating mainly comprises holographic lithography, electron beam lithography, ion beam lithography, X-ray lithography and the like. The method generally has the problems of high investment cost of used equipment, complex operation, harsh process conditions, difficult control, high preparation cost and long period of the nano grating, substandard quality of the obtained nano grating, low qualified rate of finished products and the like. Based on the above statement, the present invention proposes an apparatus and method for manufacturing a nanograting.
Disclosure of Invention
The invention aims to solve the defects in the prior art and provides a device and a method for preparing a nano grating.
A device for preparing nano-gratings comprises an installation base and an L-shaped installation support, wherein the L-shaped installation support is fixedly welded at the top of one side of the installation base, the bottom of the installation base is fixedly welded with a support frame, the top of the installation base is fixedly provided with a motor, an output shaft of the motor is connected with a second rotating connecting piece, one end, far away from the motor, of the second rotating connecting piece is provided with a glue homogenizing table, the second rotating connecting piece is rotatably connected with the glue homogenizing table, one side, close to the glue homogenizing table, of the L-shaped installation support is provided with a first sliding groove, a push rod motor is arranged in the first sliding groove and is in sliding connection with the push rod motor, the output shaft of the push rod motor is fixedly connected with the installation support, the bottom of the installation support is fixedly welded with a glue storage chamber, a glue outlet is arranged below the glue storage chamber, one side, close to the glue homogenizing table, of the L-shaped installation support is fixedly provided with an electron beam exposure machine, and electron beam exposure machine is located the top of push rod motor, one side that the top of L shape installing support is close to even gluey platform is equipped with the second spout, be equipped with first slider and second slider in the second spout, the even second spout sliding connection of first slider and second slider, the one end fixedly connected with intermediate mask version of second spout is kept away from to first slider, the one end fixedly connected with condensing lens of second spout is kept away from to the second slider, the one end bottom fixed mounting that electron beam exposure machine was kept away from at the top of L shape installing support has first rotating connecting piece, the bottom of first rotating connecting piece is equipped with the speculum, just first rotating connecting piece rotates with the speculum and is connected.
Preferably, the central axes of the electron beam exposure machine, the intermediate mask plate and the condensing lens are the same horizontal line.
Preferably, the number of the support frames is 4, and the support frames are distributed at the outer side of the bottom of the mounting base at equal intervals.
The invention also provides a method for preparing the nano grating, which comprises the following steps:
s1, after the substrate is pretreated, plating a metal film with the thickness of 0.08-0.19 mu m on the surface of the substrate, then placing the substrate on a spin coating table, enabling the metal film to face upwards, adjusting the position of a glue outlet to the center position of the substrate by using a push rod motor, dropping a positive photoresist and starting a motor, driving the spin coating table to rotate at a high speed by the motor through a second rotating connecting piece until the surface of the metal film is spin-coated with a layer of positive photoresist with the thickness of 0.2-0.3 mu m, after the positive photoresist is spin-coated uniformly, placing the metal film at 150-190 ℃ and drying for 1-2 min;
s2, dropping a negative photoresist on the surface of the photoresist obtained in the step S1, spin-coating a layer of negative photoresist with the thickness of 0.19-0.25 μm, drying for 1-2 min at 70-90 ℃ and for 1-2 min at 95-105 ℃ after uniform spin-coating;
s3, adjusting the positions of the electron beam exposure machine, the middle mask plate and the condenser lens, adjusting the reflection angle of the reflector, placing the photomask plate above the substrate, ensuring the photomask plate to be tightly attached to the substrate, and setting the exposure dose to be 68-88 mJ/cm2Carrying out exposure treatment;
and S4, placing the substrate subjected to exposure treatment in the step S3 in a sodium hydroxide solution with the concentration of 0.8-1.2% at 25-32 ℃, developing for 18-22S, then placing the substrate in a condition of 95-105 ℃ for drying for 1-2 min, then placing the substrate in an environment of 70-90 ℃ for drying for 28-40 min, removing the photoresist, and cooling to obtain the required nano grating.
Preferably, the substrate preprocessing method in step S1 includes: and (2) soaking the substrate in an acetone solution for 30-50 min, ultrasonically cleaning for 10-15 min, then washing for 10-15 min by using deionized water, and finally drying in an oven at 105-135 ℃ to constant weight.
Preferably, the substrate in step S1 is one of a quartz substrate, a silicon substrate, or a glass substrate; the metal film is one of an aluminum film, a chromium film or a nickel/copper film.
The device for preparing the nano grating is simple in structure and reasonable in design, a photoresist spin coating process is completed by using the photoresist homogenizing table, and the exposure work of the substrate is completed by using the electron beam exposure machine, the intermediate mask, the condensing lens and the reflecting mirror.
Drawings
Fig. 1 is a schematic structural diagram of an apparatus for manufacturing a nanograting.
In the figure: the device comprises a mounting base 1, a 2L-shaped mounting support, a 3 glue outlet, a 4 glue storage chamber, a 5 first chute, a 6 push rod motor, a 7 mounting support, an 8 electron beam exposure machine, a 9 second chute, a 10 first slider, a 11 second slider, a 12 middle mask, a 13 condensing lens, a 14 first rotating connecting piece, a 15 reflector, a 16 glue homogenizing table, a 17 second rotating connecting piece, an 18 motor and a 19 support frame.
Detailed Description
The present invention will be further illustrated with reference to the following specific examples.
Examples
As shown in FIG. 1, the device for preparing nano-gratings provided by the present invention comprises an installation base 1 and an L-shaped installation support 2, wherein the L-shaped installation support 2 is fixedly welded on the top of one side of the installation base 1, the bottom of the installation base 1 is fixedly welded with a support frame 19, the support frames 19 are distributed on the outer side of the bottom of the installation base 1 at equal intervals, the top of the installation base 1 is fixedly installed with a motor 18, the output shaft of the motor 18 is connected with a second rotating connecting piece 17, one end of the second rotating connecting piece 17 far away from the motor 18 is provided with a glue homogenizing table 16, the second rotating connecting piece 17 is rotatably connected with the glue homogenizing table 16, one side of the L-shaped installation support 2 near the glue homogenizing table 16 is provided with a first chute 5, a push rod motor 6 is arranged in the first chute 5, the first chute 5 is slidably connected with the push rod motor 6, the output shaft of the push rod motor 6 is fixedly connected with an installation support 7, the bottom end of the mounting bracket 7 is fixedly welded with a glue storage chamber 4, a glue outlet 3 is arranged below the glue storage chamber 4, one side of the L-shaped mounting bracket 2 close to a glue evening table 16 is fixedly provided with an electron beam exposure machine 8, the electron beam exposure machine 8 is positioned above a push rod motor 6, one side of the top of the L-shaped mounting bracket 2 close to the glue evening table 16 is provided with a second chute 9, a first slide block 10 and a second slide block 11 are arranged in the second chute 9, the first slide block 10 and the second slide block 11 are in sliding connection with each other through the second chute 9, one end of the first slide block 10 far away from the second chute 9 is fixedly connected with a middle mask plate 12, one end of the second slide block 11 far away from the second chute 9 is fixedly connected with a condenser lens 13, the central axes of the electron beam exposure machine 8, the middle mask plate 12 and the condenser lens 13 are in the same horizontal line, the bottom of one end of the top of the L-shaped mounting bracket 2 far away from the electron beam exposure machine 8 is fixedly provided with a first rotating connecting piece 14, the bottom end of the first rotating connecting piece 14 is provided with a reflector 15, and the first rotating connecting piece 14 is rotatably connected with the reflector 15.
The invention provides a method for preparing a nano grating, which comprises the following steps:
s1, placing the glass substrate in an acetone solution for soaking for 40min, ultrasonically cleaning for 12min, then washing for 14min by deionized water, finally placing the glass substrate in an oven at 120 ℃ for drying to constant weight, plating a chromium film with the thickness of 0.15 mu m on the surface of the glass substrate, then placing the glass substrate on a spin coater 16 with the chromium film facing upwards, adjusting the position of a glue outlet 3 to the center position of the glass substrate by using a push rod motor 6, dropping a positive photoresist and starting a motor 18, driving the spin coater 16 to rotate at high speed by the motor 18 through a second rotating connecting piece 17 until the surface of the chromium film is spin-coated with a layer of positive photoresist with the thickness of 0.2 mu m, after the photoresist is uniform in spin coating, placing the glass substrate at 160 ℃ for drying for 2 min;
s2, dropping a negative photoresist on the surface of the photoresist obtained in the step S1, spin-coating a layer of negative photoresist with the thickness of 0.25 μm, drying at 80 ℃ for 1min after uniform spin-coating, and drying at 100 ℃ for 2 min;
s3, adjusting the positions among the electron beam exposure machine 8, the middle mask plate 12 and the condenser lens 13, adjusting the reflection angle of the reflector 15, placing the photomask plate above the glass substrate, ensuring the photomask plate to be tightly attached to the glass substrate, and setting the exposure dose to be 72mJ/cm2Carrying out exposure treatment;
and S4, placing the glass substrate subjected to exposure treatment in the step S3 in a sodium hydroxide solution with the concentration of 1% at 28 ℃, developing for 20S, then placing the glass substrate at 95 ℃ and drying for 2min, then placing the glass substrate at 80 ℃ and drying for 35min, removing the photoresist and cooling to obtain the required nano grating.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered to be within the technical scope of the present invention, and the technical solutions and the inventive concepts thereof according to the present invention should be equivalent or changed within the scope of the present invention.
Claims (6)
1. A device for preparing a nano grating comprises an installation base (1) and an L-shaped installation support (2), wherein the L-shaped installation support (2) is fixedly welded at the top of one side of the installation base (1), and is characterized in that a support frame (19) is fixedly welded at the bottom of the installation base (1), a motor (18) is fixedly installed at the top of the installation base (1), an output shaft of the motor (18) is connected with a second rotating connecting piece (17), one end, far away from the motor (18), of the second rotating connecting piece (17) is provided with a glue homogenizing table (16), the second rotating connecting piece (17) is rotatably connected with the glue homogenizing table (16), one side, close to the glue homogenizing table (16), of the L-shaped installation support (2) is provided with a first sliding groove (5), a push rod motor (6) is arranged in the first sliding groove (5), and the first sliding groove (5) is slidably connected with the push rod motor (6), an output shaft of the push rod motor (6) is fixedly connected with a mounting support (7), a glue storage chamber (4) is fixedly welded at the bottom end of the mounting support (7), a glue outlet (3) is arranged below the glue storage chamber (4), an electron beam exposure machine (8) is fixedly mounted on one side, close to a glue homogenizing table (16), of the L-shaped mounting support (2), the electron beam exposure machine (8) is positioned above the push rod motor (6), a second sliding groove (9) is arranged on one side, close to the glue homogenizing table (16), of the top of the L-shaped mounting support (2), a first sliding block (10) and a second sliding block (11) are arranged in the second sliding groove (9), the first sliding block (10) and the second sliding groove (11) are connected in a sliding mode, an intermediate mask plate (12) is fixedly connected to one end, far away from the second sliding groove (9), of the first sliding block (10), one end fixedly connected with condensing lens (13) of second spout (9) are kept away from in second slider (11), the one end bottom fixed mounting that electron beam exposure machine (8) were kept away from at the top of L shape installing support (2) has first rotating connecting piece (14), the bottom of first rotating connecting piece (14) is equipped with speculum (15), just first rotating connecting piece (14) rotate with speculum (15) and be connected.
2. The apparatus for manufacturing a nanograting device as claimed in claim 1, wherein the central axes of the electron beam exposure machine (8), the reticle (12) and the condenser lens (13) are the same horizontal line.
3. The device for preparing nano-gratings according to claim 1, wherein the number of the supporting frames (19) is 4, and the supporting frames are equally distributed at the outer side of the bottom of the mounting base (1).
4. A method for fabricating a nanograting using the apparatus for fabricating a nanograting according to any one of claims 1 to 3, comprising the steps of:
s1, after the substrate is pretreated, a metal film with the thickness of 0.08-0.19 mu m is plated on the surface of the substrate, then the substrate is placed on a spin coating table (16), the metal film faces upwards, the position of a glue outlet (3) is adjusted to the central position of the substrate by a push rod motor (6), a positive photoresist is dripped, the motor (18) is started, the motor (18) drives the spin coating table (16) to rotate at a high speed through a second rotating connecting piece (17) until the surface of the metal film is coated with a layer of positive photoresist with the thickness of 0.2-0.3 mu m in a spin coating mode, and after the positive photoresist is coated uniformly, the substrate is placed at the temperature of 150-190 ℃ and dried for 1-2 min;
s2, dropping a negative photoresist on the surface of the photoresist obtained in the step S1, spin-coating a layer of negative photoresist with the thickness of 0.19-0.25 μm, drying for 1-2 min at 70-90 ℃ and for 1-2 min at 95-105 ℃ after uniform spin-coating;
s3, adjusting positions among the electron beam exposure machine (8), the middle mask plate (12) and the condensing lens (13), adjusting the reflection angle of the reflector (15), placing the photomask plate above the substrate, ensuring that the photomask plate is tightly attached to the substrate, and carrying out exposure treatment with exposure dose of 68-88 mJ/cm 2;
and S4, placing the substrate subjected to exposure treatment in the step S3 in a sodium hydroxide solution with the concentration of 0.8-1.2% at 25-32 ℃, developing for 18-22S, then placing the substrate in a condition of 95-105 ℃ for drying for 1-2 min, then placing the substrate in an environment of 70-90 ℃ for drying for 28-40 min, removing the photoresist, and cooling to obtain the required nano grating.
5. The method of claim 4, wherein the substrate preprocessing method in step S1 is as follows: and (2) soaking the substrate in an acetone solution for 30-50 min, ultrasonically cleaning for 10-15 min, then washing for 10-15 min by using deionized water, and finally drying in an oven at 105-135 ℃ to constant weight.
6. The method of claim 4, wherein the substrate in step S1 is one of a quartz substrate, a silicon substrate or a glass substrate; the metal film is one of an aluminum film, a chromium film or a nickel/copper film.
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| CN201710253240.6A CN106918857B (en) | 2017-04-18 | 2017-04-18 | Device and method for preparing nano grating |
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| CN201710253240.6A CN106918857B (en) | 2017-04-18 | 2017-04-18 | Device and method for preparing nano grating |
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| CN109352888A (en) * | 2018-12-10 | 2019-02-19 | 中国科学技术大学 | The moulding integrated device of spin coating |
| CN111856636B (en) * | 2020-07-03 | 2021-10-22 | 中国科学技术大学 | Variable-pitch grating mask line density distribution controllable fine adjustment method |
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| DE4329338A1 (en) * | 1993-08-31 | 1995-03-02 | Olympus Optical Co | Method and device for forming a photoresist pattern |
| US5902716A (en) * | 1995-09-05 | 1999-05-11 | Nikon Corporation | Exposure method and apparatus |
| CN101261449A (en) * | 2007-03-06 | 2008-09-10 | 中国科学技术大学 | Grating ion beam etching optical on-line detection device and detection method |
| CN101846760A (en) * | 2010-04-09 | 2010-09-29 | 重庆理工大学 | Method for making nano-grating |
| CN204155062U (en) * | 2014-11-05 | 2015-02-11 | 安徽三安光电有限公司 | A kind of coating developing machine with exposure function |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP6239813B2 (en) * | 2012-07-18 | 2017-11-29 | 株式会社Ｓｃｒｅｅｎセミコンダクターソリューションズ | Substrate processing apparatus and substrate processing method |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE4329338A1 (en) * | 1993-08-31 | 1995-03-02 | Olympus Optical Co | Method and device for forming a photoresist pattern |
| US5902716A (en) * | 1995-09-05 | 1999-05-11 | Nikon Corporation | Exposure method and apparatus |
| CN101261449A (en) * | 2007-03-06 | 2008-09-10 | 中国科学技术大学 | Grating ion beam etching optical on-line detection device and detection method |
| CN101846760A (en) * | 2010-04-09 | 2010-09-29 | 重庆理工大学 | Method for making nano-grating |
| CN204155062U (en) * | 2014-11-05 | 2015-02-11 | 安徽三安光电有限公司 | A kind of coating developing machine with exposure function |
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Effective date of registration: 20210819 Address after: 364000 Yongding Industrial Park, Gaopi Town, Yongding District, Longyan City, Fujian Province Applicant after: FUJIAN ZOOMKING TECHNOLOGY Co.,Ltd. Address before: 364000 406, entrepreneurship building, science and technology entrepreneurship Park, No. 15, Qutan Road, Dongxiao Town, Longyan City, Fujian Province Applicant before: Qiu Kaihong |
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