CN106909031B - Exposure sources and exposure system - Google Patents
Exposure sources and exposure system Download PDFInfo
- Publication number
- CN106909031B CN106909031B CN201710200961.0A CN201710200961A CN106909031B CN 106909031 B CN106909031 B CN 106909031B CN 201710200961 A CN201710200961 A CN 201710200961A CN 106909031 B CN106909031 B CN 106909031B
- Authority
- CN
- China
- Prior art keywords
- exposure
- support link
- concave mirror
- exposed
- angle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2008—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the reflectors, diffusers, light or heat filtering means or anti-reflective means used
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
- G02B7/182—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors for mirrors
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention provides a kind of exposure sources and exposure system, belongs to display base plate preparing technical field, and it is single that it can solve the exposure area size of existing proximity printing machine, the problem of equipment complexity.The exposure sources of the present invention include:The concave mirror that can be deformed upon, for reflex exposure light, and ensure the final directive exposure area of the exposure light;Module is adjusted, for changing the curvature of the concave mirror.
Description
Technical field
The invention belongs to display technology field, and in particular to a kind of exposure sources and exposure system.
Background technology
Among prior art, generally use proximity printing machine produces colored filter.
The exposure area size of traditional proximity printing machine is more single, generally only one or two kinds of exposure area.
When producing colored filter, exposure area (region that i.e. exposure light can shine) should be (i.e. to be exposed with region to be exposed
Substrate needs the region that is exposed simultaneously) size is identical.And the size in the region to be exposed of different product is had nothing in common with each other, work as exposure
, it is necessary to which partial occlusion of the exposure area beyond region to be exposed is exposed when light region is more than region to be exposed.It is or existing
Have in technology, can also changing the modes of emplacement of substrate to be exposed, (such as zone length to be exposed is equal to exposure area width, passes through
Rotate substrate to be exposed and correspond to zone length to be exposed with exposure area width and be exposed), to meet the same of exposure demand
Shi Jinliang reduces the waste of exposure illumination.
Inventor has found that at least there are the following problems in the prior art:Exposure area, which is blocked, to be exposed causes exposure to shine
It is not abundant enough to spend utilization;In order to tackle different substrate modes of emplacements to be exposed, it is necessary to increase corresponding exposure auxiliary equipment, lead
Exposure system equipment is caused to repeat to configure, cost is higher.
The content of the invention
It is contemplated that at least solves one of technical problem present in prior art, there is provided exposure can be adjusted flexibly in one kind
Light area size is to tackle the exposure sources of different substrates to be exposed.
Technical scheme is a kind of exposure sources used by solving present invention problem, including:
The concave mirror that can be deformed upon, for reflex exposure light, and ensure that the final directive of the exposure light exposes
Light region;
Module is adjusted, for changing the curvature of the concave mirror.
Preferably, the exposure sources also include:Module is reflected, for by the exposure light from the concave mirror
It is reflected towards exposure area.
Preferably, the adjustment module is arranged at the convex side of the concave mirror.
Preferably, the adjustment module includes:First support link, the second support link and angle adjustment module;Wherein,
The first end of first support link and the first end of the second support link respectively with the concave reflection
Two relative edges connection of mirror, the second end of first support link and the second end of the second support link are rotated and connected
Connect;
The angle adjustment module is used to adjust the angle angle between first support link and the second support link.
It is further preferred that the angle adjustment module includes connecting portion and adjustment unit;Wherein,
The connecting portion is connected between first support link and the second support link;
The adjustment unit is used to make the connecting portion that motion occur to adjust first support link and the second support
Angle angle between connecting rod.
It is further preferred that the connecting portion includes head rod and the second connecting rod;Wherein,
The first end of the head rod and it is connected with the first support link, the first end of second connecting rod
Connected with the second support link;
The second end of the head rod and the second end of the second connecting rod are connected with the adjustment unit;
The adjustment unit is used to drive the second end of the head rod and the second end of the second connecting rod to exist
Moved on direction away from or close to the concave mirror.
It is further preferred that the adjustment unit includes nut and threaded rod;Wherein,
The nut is fixedly connected respectively with the second end of the head rod and the second end of the second connecting rod,
And it is set on the threaded rod;
The threaded rod can drive the nut to be moved on the direction away from or close to the concave mirror when rotating.
It is further preferred that the adjustment unit also includes:
The driver of fixed setting, for driving the threaded rod to rotate.
Another technical solution is a kind of exposure system used by solving present invention problem, including:It is above-mentioned any
Exposure sources described in one.
Preferably, the exposure system also includes:For placing the base station of substrate to be exposed;It is used to place on the base station
The length in the region of substrate to be exposed is different from width dimensions.
The exposure sources of the present invention include the concave mirror that can be deformed upon and adjustment module, and it is adjusted by adjusting module
The curvature of whole concave mirror can make the reflection angle of exposure light change, so that the exposure area ultimately formed
Size changes with the exposure demand of corresponding substrate to be exposed, while exposure illumination is utilized effectively.Therefore, this implementation is utilized
The exposure sources that example provides, it is possible to achieve the substrate to be exposed of different exposure demands is exposed with same modes of emplacement, without
Repeat to set measuring apparatus etc., so as to save exposure cost.
Brief description of the drawings
Fig. 1 is the schematic diagram of two kinds of substrates to be exposed that area size to be exposed is different in embodiments of the invention;
Fig. 2 is the schematic diagram being exposed in embodiments of the invention to a kind of substrate to be exposed;
Fig. 3 is the schematic diagram being exposed in embodiments of the invention to another substrate to be exposed;
Wherein reference is:01st, concave mirror;11st, the first support link;12nd, the second support link;21st, first
Connecting rod;22nd, the second connecting rod;31st, threaded rod;32nd, nut;04th, driver;05th, substrate to be exposed;06th, module is reflected;
07th, base station;08th, region to be exposed.
Embodiment
To make those skilled in the art more fully understand technical scheme, below in conjunction with the accompanying drawings and specific embodiment party
Formula is described in further detail to the present invention.
Embodiment 1:
As shown in Figures 1 to 3, the present embodiment provides a kind of exposure sources.
The exposure sources can be proximity, or other forms, and it can be used for production of colored filter, certainly, its
It can also be used for other exposures.
As shown in Fig. 2 the exposure sources include:The concave mirror 01 that can be deformed upon, for reflex exposure light, and
Ensure the final directive exposure area of exposure light;Module is adjusted, for changing the curvature of concave mirror 01.
Wherein, concave mirror 01 is used to reflect the exposure light that is sent by light source, make exposure light by reflection and after
Resume it is defeated after can finally irradiate to predetermined exposure area, be exposed with treating exposure base 05.
Specifically, as shown in Figures 2 and 3, the present embodiment can deform upon concave mirror 01 by adjusting module, i.e.,
The curvature of concave mirror 01 can be changed, so that the reflection angle of the exposure light of incident concave mirror 01 changes.
That is, by adjusting module exposure light can be realized in diffusion or convergence, exposure after the reflection of concave mirror 01
The size of exposure area can change when light reaches exposure area through subsequent transmission.To with different regions 08 to be exposed
Substrate 05 (as shown in Figure 1) to be exposed, the size of adjustable exposure area makes it be adapted with region 08 to be exposed, so as to not have to
Block exposure area and substrate 05 to be exposed is placed in rotation, illumination can be made full use of, simplify equipment.
Therefore, utilize the present embodiment provide exposure sources, it is possible to achieve the substrate to be exposed 05 of different exposure demands with
Same modes of emplacement is exposed, without repeating to set measuring apparatus etc., so as to save exposure cost.
Preferably, the exposure sources that the present embodiment provides also include reflection module 06, for that will come from concave mirror 01
Exposure light reflection to exposure area.
Exposure light may cannot be used directly for treating exposure base 05 and be exposed after the reflection of concave mirror 01,
The exposure light that reflection module 06 is reflected to concave mirror 01 is needed finally to be irradiated to pre- further with reflection
Fixed exposure area.Preferably, the reflection module 06 is plane mirror.
Preferably, adjustment module is arranged at the convex side of concave mirror 01.
Because exposure light is incident from the concave surface of concave mirror 01 and reflects, therefore it is anti-that adjustment module is placed in into concave surface
The convex side of mirror 01 is penetrated, can make adjustment module will not be to the transmission of exposure light while 01 curvature of concave mirror is adjusted
Impact.
Preferably, adjustment module includes:First support link 11, the second support link 12 and angle adjustment module.Wherein,
The first end of first support link 11 and the first end of the second support link 12 two phases with concave mirror 01 respectively
Opposite side connects, the second end rotation connection of the second end of the first support link 11 and the second support link 12;Angle adjustment
Module is used to adjust the angle angle between the first support link 11 and the second support link 12.
Specifically, as shown in Figures 2 and 3, the first of two support links (i.e. the first support link and the second support link)
End connects two opposite sides of concave mirror 01 respectively, when the first support link and/or the first end of the second support link
When portion moves, the corresponding lateral movement of concave mirror 01 can be driven.The second end of two support links is then the company of rotation
Connect, i.e. two support links can relatively rotate centered on the second end of two support links, so as to change between the two
Angle angle.
And angle adjustment module is used to adjust the angle angle between two support links, make the first support link 11 and second
Distance between the first end of supporting rod 12 changes (the i.e. first end of the first support link and/or the second support link
Move) so that the distance change between the two opposite sides of concave mirror 01, concave mirror 01 is under pressure or pulling force
And (curvature changes) is deformed upon, realize the adjustment of exposure area size.
It is understood that the first support link and the second support link are made up of hard material, angle change is occurring
And its own will not be deformed upon during drive 01 deformation of concave mirror.
It should be noted that one group of relative edge in concave mirror 01 can be provided with multiple adjustment modules, mould is each adjusted
The part in respective regions of group control concave mirror 01 deforms upon, so that the stress of concave mirror 01, deformation are equal
It is even.The quantity of adjustment module can be configured and adjust according to the size and deformation demand of concave mirror 01.
Certainly, in two groups of relative avris of concave mirror 01, can also be designed with adjusting module respectively, so can be two
Direction carries out deformation adjustment, and the length and width of exposure area is variable.
Preferably, angle adjustment module includes connecting portion and adjustment unit.
Connecting portion is connected between the first support link 11 and the second support link 12;Adjustment unit is used to send out connecting portion
It is raw to move to adjust the angle angle between the first support link 11 and the second support link 12.
Wherein, connecting portion motion refers to that connecting portion locally or globally connects with respect to the first support link and/or the second support
Bar moves, for example, connecting portion can by can shape-changing material form, power is produced when it passes through deformation and drives the first support link 11
Rotated with the second support link 12;Or connecting portion can be also made up of multiple stiff parts, pass through the relative fortune between part
It is dynamic that the first support link 11 and the second support link 12 can be driven to rotate.
Preferably, connecting portion includes the connecting rod 22 of head rod 21 and second.The first end of head rod 21 and
It is connected with the first support link 11, the first end of the second connecting rod 22 and the second support link 12 connect, head rod 21
The second end and the second end of the second connecting rod 22 be connected with adjustment unit.Adjustment unit is used to drive head rod
21 the second end and the second end of the second connecting rod 22 move on the direction away from or close to concave mirror 01.
As shown in Figures 2 and 3, the present embodiment is preferably used as company using two connecting rods (i.e. head rod and the second connecting rod)
Socket part, the second end for driving two connecting rods by angle adjustment module are transported in the direction away from or close to concave mirror 01
It is dynamic, because the first end of two connecting rods is connected in two support links, can not move in this direction, therefore the first end of two connecting rods
Portion can be close to each other or remote, so as to drive two support links to rotate (i.e. angulation change between two support links).
Certainly, in order that angle adjustment is flexibly accurate, therefore the first end of two connecting rods is preferably connected to two supports
At the first end of connecting rod.
Preferably, adjustment unit includes nut 32 and threaded rod 31;The second end of nut 32 and head rod 21 and
The second end of second connecting rod 22 is fixedly connected respectively, and is set on threaded rod 31;Threaded rod 31 can drive spiral shell when rotating
Mother 32 moves on the direction away from or close to concave mirror 01.
Obviously, it is inevitable when threaded rod 31 rotates that relative motion occurs with nut 32, and if threaded rod 31 remote or close
The direction of concave mirror 01 is not taken exercises, then necessarily nut 32 is realized remote or close by being rotated on threaded rod 31
Moved on the direction of concave mirror 01, so that with rotation connection (the second end for specially driving two connecting rods) in the direction
Upper motion, and then the angle angle of support link is changed, the curvature of concave mirror 01 is changed.
Preferably, adjustment unit also includes:The driver 04 of fixed setting, for driving threaded rod 31 to rotate.
That is, will not be close or remote while rotating threaded rod 31 by the fixed setting of driver 04
Moved on the direction of concave mirror 01.It is preferred that motor of available fixed setting etc. drives 31 turns of threaded rod as driver 04
It is dynamic.
Certainly, it can also be other devices that can change the curvature of concave mirror 01 to adjust module, be will not be described in detail herein.
The exposure sources of the present embodiment include the concave mirror 01 that can be deformed upon and adjustment module, and it is by adjusting mould
The curvature of group adjustment concave mirror 01 can make the reflection angle of exposure light change, so that the exposure ultimately formed
The size in region changes with the exposure demand of corresponding substrate 05 to be exposed, it is not necessary to is blocked, exposure illumination is obtained effectively
Utilize.Therefore, the exposure sources provided using the present embodiment, it is possible to achieve the substrate to be exposed 05 of different exposure demands is with same
Modes of emplacement is exposed, without repeating to set measuring apparatus etc., so as to save exposure cost.
Embodiment 2:
As shown in Figures 2 and 3, the present embodiment provides a kind of exposure system, including any one exposure sources in embodiment 1.
In the exposure system of the present embodiment, for exposure sources using the exposure sources provided in embodiment 1, detailed description can
With reference to embodiment 1, will not be repeated here.
Preferably, the exposure system also includes:For placing the base station 07 of substrate 05 to be exposed, it is used to place on base station 07
The length in the region of substrate 05 to be exposed is different from width dimensions.
In the present embodiment, the exposure light that concave mirror 01 is reflected finally is radiated on base station 07, will be to be exposed
Substrate 05 is placed with that can be exposed on base station 07.
General substrate 05 to be exposed is not square, and length is different from width, and the exposure area of existing exposure machine is single
One fixation, when region 08 to be exposed mismatches with it, it may be necessary to rotate substrate 05 to be exposed and be exposed.Therefore, base
Two sizes of platform 07 are intended to be equal to the length of substrate 05 to be exposed, and substrate 05 to be exposed could be avoided to exceed base station 07 when rotated
Bearing area scope.In the present embodiment, the exposure area of exposure sources can be adjusted flexibly, that is to say, that can be complete
Meet different demands of the substrate 05 to be exposed to exposure area size.Therefore, in the exposure system, substrate 05 to be exposed can be all the time
It is placed in the same manner on base station 07, and without rotation, as long as therefore 07 1 directions (length) of base station are equal to substrate to be exposed
05 length, another direction (width) can then be only equal to the width of substrate 05 to be exposed, so as to reduce base station 07
Area.
The exposure system of the present embodiment includes the concave mirror 01 that can be deformed upon and adjustment module and base station 07, can
So that the size of exposure area to be adjusted flexibly according to different exposure demands.It adjusts the song of concave mirror 01 by adjusting module
Rate can make the reflection angle of exposure light change, and be treated so that the size of the exposure area ultimately formed changes with corresponding
The exposure demand of exposure base 05, it is not necessary to blocked, while make exposure illumination be utilized effectively.Therefore, this is being utilized
The exposure sources that embodiment provides can realize that the substrate to be exposed 05 of different exposure demands is exposed with same modes of emplacement,
So as to reduce the area of base station 07, without repeating to set measuring apparatus etc., exposure cost is saved.
It is understood that the principle that embodiment of above is intended to be merely illustrative of the present and the exemplary implementation that uses
Mode, but the invention is not limited in this.For those skilled in the art, the essence of the present invention is not being departed from
In the case of refreshing and essence, various changes and modifications can be made therein, and these variations and modifications are also considered as protection scope of the present invention.
Claims (7)
- A kind of 1. exposure sources, it is characterised in that including:The concave mirror that can be deformed upon, for reflex exposure light, and ensure the final directive exposure region of the exposure light Domain;Module is adjusted, for changing the curvature of the concave mirror;The adjustment module includes:First support link, the second support link and angle adjustment module;Wherein,The first end of first support link and the first end of the second support link respectively with the concave mirror Two relative edge's connections, the second end of first support link and the second end rotation connection of the second support link;The angle adjustment module is used to adjust the angle angle between first support link and the second support link;The angle adjustment module includes connecting portion and adjustment unit;Wherein,The connecting portion is connected between first support link and the second support link;The adjustment unit is used to make the connecting portion that motion occur to adjust first support link and the second support link Between angle angle;The connecting portion includes head rod and the second connecting rod;Wherein,The first end of the head rod and it is connected with the first support link, the first end of second connecting rod and Two support links connect;The second end of the head rod and the second end of the second connecting rod are connected with the adjustment unit;The adjustment unit is used for the second end for the second end and the second connecting rod for driving the head rod remote Or moved on the direction of the concave mirror.
- 2. exposure sources according to claim 1, it is characterised in that also include:Reflect module, for by the exposure light reflection from the concave mirror to exposure area.
- 3. exposure sources according to claim 1, it is characterised in thatThe adjustment module is arranged at the convex side of the concave mirror.
- 4. exposure sources according to claim 1, it is characterised in that the adjustment unit includes nut and threaded rod;Its In,The nut is fixedly connected respectively with the second end of the head rod and the second end of the second connecting rod, and is covered It is located on the threaded rod;The threaded rod can drive the nut to be moved on the direction away from or close to the concave mirror when rotating.
- 5. exposure sources according to claim 4, it is characterised in that the adjustment unit also includes:The driver of fixed setting, for driving the threaded rod to rotate.
- A kind of 6. exposure system, it is characterised in that including:Exposure sources in claim 1 to 5 described in any one.
- 7. exposure system according to claim 6, it is characterised in that also include:For placing the base station of substrate to be exposed;It is used for the length and broad-ruler for placing the region of substrate to be exposed on the base station Very little difference.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201710200961.0A CN106909031B (en) | 2017-03-29 | 2017-03-29 | Exposure sources and exposure system |
Applications Claiming Priority (1)
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CN201710200961.0A CN106909031B (en) | 2017-03-29 | 2017-03-29 | Exposure sources and exposure system |
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Publication Number | Publication Date |
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CN106909031A CN106909031A (en) | 2017-06-30 |
CN106909031B true CN106909031B (en) | 2018-04-06 |
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CN201710200961.0A Expired - Fee Related CN106909031B (en) | 2017-03-29 | 2017-03-29 | Exposure sources and exposure system |
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Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1174770A3 (en) * | 2000-07-13 | 2004-05-19 | ASML Netherlands B.V. | Lithographic apparatus |
JP2007317713A (en) * | 2006-05-23 | 2007-12-06 | Canon Inc | Optical element driving device |
CN203217248U (en) * | 2013-04-23 | 2013-09-25 | 合肥京东方光电科技有限公司 | Exposure machine |
DE102014103157B3 (en) * | 2014-03-10 | 2015-06-18 | Jenoptik Optical Systems Gmbh | Adjustable deformable mirror to compensate for aberrations of a beam |
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2017
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