CN103105741A - Alignment compensation device and exposure device - Google Patents
Alignment compensation device and exposure device Download PDFInfo
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- CN103105741A CN103105741A CN2013100234495A CN201310023449A CN103105741A CN 103105741 A CN103105741 A CN 103105741A CN 2013100234495 A CN2013100234495 A CN 2013100234495A CN 201310023449 A CN201310023449 A CN 201310023449A CN 103105741 A CN103105741 A CN 103105741A
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Abstract
The invention discloses an alignment compensation device and an exposure device, aiming at solving the problem that the existing alignment compensation device is low in local part alignment accuracy. The alignment compensation device comprises an alignment compensation part with light-induced deformation effect, and a light beam generator, wherein the light beam generator is arranged at the position where the set part of the alignment compensation part can be directly irradiated by the light emitted by the light beam generator; the alignment compensation part comprises a compensation glass plate and a micro-compensation layer with light-induced deformation effect; and the micro-compensation layer has light-induced deformation effect, so that the part of the micro-compensation layer irradiated by the light emitted by the light beam generator can deform, and the compensation glass plate is driven to deform. The alignment compensation device and the exposure device can be used for controlling the deformation of any set positions of the alignment compensation part, thus realizing the alignment compensation for the local position, and improving the compensation accuracy.
Description
Technical field
The present invention relates to display panel and make the field, relate in particular to a kind of alignment compensation device and exposure device.
Background technology
In the LCD board manufacturing process, the realization of each thin layer all needs to form specific figure through deposition, exposure, development and photoetching process etc. usually, photoetching process is mainly to form photoetching offset plate figure by mask plate, in order to realize accurate contraposition, need to carry out contraposition and control, but in the production of reality, often occur inclined to one side phenomenon, especially when the resolution of panel was high, corresponding equipment precision Chang Buneng well satisfied the demands.
The existing mask plate that utilizes forms in the photoetching offset plate figure process, often adopt exposure device as shown in Figure 1 to carry out contraposition control, the ultraviolet light that high-pressure sodium lamp sends is mapped on mask plate 1 after forming uniform arc light source, carry out alignment compensation through compensation glass plate 2, can arrive photoresist through optical transform subsystem 3 afterwards and the photoresist of respective regions is exposed, the follow-up photoetching offset plate figure that forms correspondence through operations such as developments.
Above-mentioned when utilizing compensation glass plate 2 to carry out alignment compensation, the periphery of compensation glass plate 2 is installed the motor of some, control by motor, the deformation compensation is carried out in the position of compensation glass plate periphery, and the figure that is X as width in Fig. 1 need to be compensated for as width (1+ α) X, only needs the control by peripheral motor, compensation glass plate 2 is carried out suitable distortion, reflect when making light pass through compensation glass plate 2, off-straight on the path carries out certain compensation.
Yet mask blank 1 size of carrying out in photo-etching technological process is larger, when mask plate 1 central area generation contraposition deviation, can only be by the motor control of compensation glass plate 2 peripheries, yet the very little deviation in central area this moment, need motor the deviation compensation at center could be come in the larger size of periphery adjustment, yet this moment, corresponding peripheral contraposition deviation will be very large, causes existing aligning accuracy not high.
Summary of the invention
The purpose of this invention is to provide a kind of alignment compensation device, system and exposure device, to solve existing alignment compensation device for local location, alignment compensation difficulty, the problem that aligning accuracy is not high.
The objective of the invention is to be achieved through the following technical solutions:
The invention provides a kind of alignment compensation device, this device comprises alignment compensation parts and optical beam generating device, wherein,
Described optical beam generating device is arranged at the position at the described alignment compensation component settings of the light direct irradiation position that makes its emission;
Described alignment compensation parts comprise compensation glass plate and the little layer of compensation with photic anamorphic effect, described little layer of compensation has photic anamorphic effect, deformation can occur in its position by the light irradiation that described optical beam generating device sends, and drives described compensation glass plate generation deformation.
The present invention also provides a kind of exposure device that comprises above-mentioned alignment compensation device on the other hand.
Alignment compensation device provided by the invention and exposure device, setting has the alignment compensation parts of photic anamorphic effect, then the irradiation that sends by optical beam generating device has the alignment compensation parts of photic anamorphic effect, make alignment compensation parts generation deformation, because the direction of light that optical beam generating device sends can be adjusted, therefore, can realize that alignment compensation parts Set arbitrarily position carries out shape control, thereby can realize alignment compensation is carried out in mask plate figure optional position, improve aligning accuracy.
Description of drawings
Fig. 1 is that existing exposure device consists of schematic diagram;
Fig. 2 consists of schematic diagram for the alignment compensation device that the embodiment of the present invention one provides;
Fig. 3 consists of schematic diagram for the exposure device that the embodiment of the present invention two provides;
Fig. 4 adjusts schematic diagram for little layer of compensation contraposition that the embodiment of the present invention provides.
Embodiment
Alignment compensation device provided by the invention, comprise the alignment compensation parts with photic anamorphic effect, and optical beam generating device, the above-mentioned alignment compensation parts of light direct irradiation of this optical beam generating device emission, and can make the illuminated position generation deformation of these alignment compensation parts, make alignment compensation parts correspondence position that corresponding deformation occur by the direction of adjusting the optical beam generating device emission of light, thereby realize the high precision contraposition.
The alignment compensation device that the embodiment of the present invention one provides, comprise alignment compensation parts 5 and optical beam generating device 6, as shown in Figure 2, in the embodiment of the present invention, optical beam generating device 6 is arranged at the light direct irradiation alignment compensation parts 5 configuration part bit positions that make its emission, and the light direct irradiation is also that optical beam generating device 6 can be arranged on the light that can make arbitrarily its emission in the alignment compensation device and is not blocked and shines directly into the position of alignment compensation parts; And alignment compensation parts 5 have little layer of compensation of photic anamorphic effect, at the light that is sent by optical beam generating device 6, the position of irradiation can produce deformation, shines this generation deformation position light generation light path by control and changes, and can realize alignment compensation.
Concrete, in the embodiment of the present invention, the alignment compensation parts comprise compensation glass plate 2 and the little layer of compensation 7 with photic anamorphic effect, wherein, little layer of compensation 7 attaches the one side that is arranged on compensation glass plate 2; Optical beam generating device 6 is arranged on and makes its light that sends can the little layer of compensation 7 configuration part bit positions of direct irradiation, the illuminated position of little layer of compensation 7 produces deformation, macro manifestations is that the stress at this place changes, thereby make be sticked with it generation deformation at position of compensation glass plate 2, and then the light generation light path that shines this generation deformation position is changed, realize alignment compensation.
Preferably, the embodiment of the present invention also can arrange at the side of compensation glass plate 2 mechanical motor, contact with the periphery of compensation glass plate 2 by this machinery motor, directly control and compensation glass plate generation deformation, compensate on a large scale, produce photic distortion by the little layer of compensation 7 of the light irradiation of optical beam generating device 6 emissions, deformation namely occurs, and then make and be in contact with it compensation glass plate 2 deformation occur, carry out alignment compensation among a small circle.
More preferred, in the embodiment of the present invention, compensation glass plate 2 can be set flexibly attach with little layer of compensation 7 part that arranges, little layer of compensation 7 can be attached whole that is arranged on described compensation glass plate 2, after compensation glass plate 2 has carried out on a large scale alignment compensation, utilize little layer of compensation 7 to carry out among a small circle little compensation.
Further, when compensating on a large scale due to compensation glass plate 2, that peripheral position by mechanical motor control and compensation glass plate 2 carries out alignment compensation, and aligning accuracy is also higher, only the center section at the compensation glass plate is difficult to compensation, aligning accuracy is not high, therefore, the embodiment of the present invention can be only attaches on the desired location of the middle part of compensation glass plate 2 little layer of compensation 7 is set, carry out the alignment compensation of peripheral position by compensation glass plate 2, little layer of compensation 7 carries out the alignment compensation in centre position, when economizing on resources, improves aligning accuracy.
Preferably, in order to make little layer of compensation 7 that deformation occur faster, the embodiment of the present invention can arrange at least two optical beam generating devices 6, and at least two optical beam generating devices 6 of general are oppositely arranged on respectively the lateral location place near compensation glass plate 2, the light that makes its each self-emission from different directions relative exposure on little layer of compensation 7, for example can adopt angle a as shown in Figure 2, the angle of angle a and horizontal direction is acute angle, and relative exposure is on little layer of compensation 7.
More preferred, due to the resin with thermal sensitive effect, high-molecular gel for example, amorphous macromolecule, liquid crystal elastic body and light-induced shape-memory macromolecular material etc. all have good photic anamorphic effect, and light transmission rate is high, and good uniformity, so the resin that in the embodiment of the present invention, the optional use of little layer of compensation 7 has a thermal sensitive effect is attached on compensation glass plate 2.
Further, optical beam generating device in the embodiment of the present invention is infrared transmitter preferably, and be arranged on the dual-side of compensation glass plate 2, the little compensation 7 of relative exposure respectively, the Infrared irradiation of the emission of infrared transmitter to the resin with thermal sensitive effect, can make it produce fast thermal effect on the one hand; On the other hand, be arranged on the infrared light of infrared transmitter emission of compensation glass plate both sides away from the ultraviolet light of high-pressure pump light source emission, even shine on the photoresist of bottom glass substrate, also can the characteristic of photoresist do not exerted an influence.
The alignment compensation device that the embodiment of the present invention provides, setting includes the alignment compensation parts of the little layer of compensation of photic anamorphic effect, and the light of launching by optical beam generating device, irradiation alignment compensation parts, make the alignment compensation parts absorb light, thereby generation deformation makes the light that incides this place change light path, realizes the high precision contraposition.
The embodiment of the present invention two is described in detail above-mentioned alignment compensation device in connection with practical application, and the embodiment of the present invention provides a kind of exposure device, and this exposure device comprises the alignment compensation device that relates in above-described embodiment one.
Concrete, the exposure device that the embodiment of the present invention provides, comprise the glass substrate 4 that the photomask blank 1 that has litho pattern in existing exposure device, the light that exposure source is sent carry out the optical transform subsystem 3 of conversion and has zone to be exposed, wherein, it is the photoetching offset plate figure consistent with photomask blank 1 litho pattern that zone to be exposed is coated with photoresist also to be exposed, exposure device in the embodiment of the present invention also comprises the alignment compensation device that relates in embodiment one, namely includes alignment compensation parts 5 and optical beam generating device 6.。
Concrete, alignment compensation parts 5 are arranged between photomask blank 1 and optical transform subsystem 3, and these alignment compensation parts 5 that arrange in the embodiment of the present invention include little layer of compensation 7 and compensation glass plate 2 that photic anamorphic effect material consists of, this little layer of compensation 7 has photic anamorphic effect, can produce deformation after absorbing light, and make compensation glass plate 2 that deformation occur, thereby can make the high-pressure pump exposure source through the light after photomask blank 1, shining this generation deformation position generation light path change, realize alignment compensation.
Further, the setting position of the light beam of optical beam generating device 6 emission in embodiment of the present invention exposure device in can direct irradiation alignment compensation parts 5, make it in the position corresponding with position to be compensated, deformation occur, change the exposure source opticpath and carry out alignment compensation; And can adjust direction and the power of optical beam generating device 6 emission light beams, control flexibly the position that is radiated at alignment compensation parts 5 and the deformation degree occurs, realize accurately location.
Preferably, due to existing exposure device, only the center section at compensation glass plate 2 is difficult to control the deformation compensation, precision is not high, therefore, another preferred embodiment of the present invention can attach little layer of compensation 7 on the compensation glass plate 2 of existing exposure device, jointly consist of alignment compensation parts 5 by little layer of compensation 7 and compensation glass plate 2, carries out alignment compensation.
concrete, in the embodiment of the present invention, little layer of compensation 7 is made of photic anamorphic effect material, and has a photic anamorphic effect, attach with compensation glass plate 2 and arrange, and make compensation glass plate 2 attach the one side of little layer of compensation 7, towards photomask blank 1, optical beam generating device 6 is arranged on and makes its light that sends can the little layer of compensation 7 configuration part bit positions of direct irradiation, after absorbing light, little layer of compensation 7 can produce deformation, STRESS VARIATION occurs, thereby make the compensation glass plate 2 of this corresponding position, generation STRESS VARIATION place that deformation occur, thereby can make the high-pressure pump exposure source through the light after photomask blank 1, shining this generation deformation position generation light path change, light behind the change path is through optical transform subsystem 3, be radiated at the zone to be exposed of glass substrate 4, realize alignment compensation, the exposure device that the embodiment of the present invention provides consists of schematic diagram as shown in Figure 3.
In Fig. 3, width is that the figure of X need to be compensated for as width (1+ β) X, only need to adjust the spacing of light beam between little layer of compensation 7 of optical beam generating device 6 emissions, certainly also can adjust simultaneously power and the beam size of optical beam generating device, control and need the range size μ that compensates on little layer of compensation, as shown in Figure 4, compensation glass plate 2 is carried out suitable distortion, reflect when making light pass through compensation glass plate 2, off-straight on the path carries out alignment compensation.
Preferably, the embodiment of the present invention also can arrange at the side of compensation glass plate 2 mechanical motor, contact with the side of compensation glass plate 2 by this machinery motor, directly control and compensation glass plate generation deformation, compensate on a large scale, after controlling little layer of compensation 7 photic anamorphic effects of generation by optical beam generating device 6, make compensation glass plate 2 that deformation occur, carry out alignment compensation among a small circle.
In the embodiment of the present invention, the mode of above-mentioned employing compensation glass plate 2 and 7 combinations of little layer of compensation is carried out alignment compensation, when improving aligning accuracy, can also improve contraposition efficient.
More preferred, in the embodiment of the present invention, compensation glass plate 2 can be set flexibly attach with little layer of compensation 7 part that arranges, the whole face of compensation glass plate 2 all can be attached little layer of compensation 7, after compensation glass plate 2 has carried out on a large scale alignment compensation, utilize little layer of compensation 7 to carry out among a small circle little compensation.
Further, when compensating on a large scale due to compensation glass plate 2, that peripheral position by mechanical motor control and compensation glass plate 2 carries out alignment compensation, and aligning accuracy is also higher, only the center section at the compensation glass plate is difficult to compensation, aligning accuracy is not high, therefore, the embodiment of the present invention can a center section attaching at compensation glass plate 2 arrange little layer of compensation 7, carry out the alignment compensation of peripheral position by compensation glass plate 2, little layer of compensation 7 carries out the alignment compensation in centre position, when economizing on resources, improves aligning accuracy.
Preferably, in the embodiment of the present invention, can be at least two optical beam generating devices of side edge setting 6 near compensation glass plate 2, and at least two optical beam generating devices 6 of general are oppositely arranged on the dual-side of compensation glass plate 2, and make the light of its emission and horizontal direction at an angle, little layer of compensation 7 is carried out relative exposure, can refer again to Fig. 2, Fig. 3 and Fig. 4, mix with the light of high-pressure pump light source emission with the light of avoiding the optical beam generating device emission, the photoresist characteristic on the bottom glass substrate is affected.
More preferred, due to the resin with thermal sensitive effect, high-molecular gel for example, amorphous macromolecule, liquid crystal elastic body and light-induced shape-memory macromolecular material etc. all have good photic anamorphic effect, and light transmission rate is high, and good uniformity, so the resin that in the embodiment of the present invention, the optional use of little layer of compensation has a thermal sensitive effect is attached on compensation glass plate 2.
Further, optical beam generating device in the embodiment of the present invention can be selected the infrared beam generating means, and being arranged on the dual-side of compensation glass plate 2, the Infrared irradiation of the emission of infrared beam generating means to the resin with thermal sensitive effect, can make it produce fast thermal effect on the one hand; On the other hand, be arranged on the infrared light of infrared beam generating means emission of compensation glass plate both sides away from the ultraviolet light of high-pressure pump exposure source emission, even shine on the photoresist of bottom glass substrate, also can the characteristic of photoresist do not exerted an influence.
Exposure device provided by the invention, by the alignment compensation device is improved, alignment compensation parts with photic anamorphic effect are set between photomask blank and optical transform subsystem, and the light beam irradiates alignment compensation parts of launching by optical beam generating device, the alignment compensation of realization to the setting position of photomask blank improves the precision of alignment compensation.
Obviously, those skilled in the art can carry out various changes and modification and not break away from the spirit and scope of the present invention the present invention.Like this, if within of the present invention these are revised and modification belongs to the scope of claim of the present invention and equivalent technologies thereof, the present invention also is intended to comprise these changes and modification interior.
Claims (7)
1. an alignment compensation device, is characterized in that, this device comprises alignment compensation parts and optical beam generating device, wherein,
Described optical beam generating device is arranged at the position at the described alignment compensation component settings of the light direct irradiation position that makes its emission;
Described alignment compensation parts comprise compensation glass plate and the little layer of compensation with photic anamorphic effect, described little layer of compensation has photic anamorphic effect, deformation can occur in its position by the light irradiation that described optical beam generating device sends, and drives described compensation glass plate generation deformation.
2. alignment compensation device as claimed in claim 1, is characterized in that, this device also comprises mechanical motor, and described mechanical motor contacts with described compensation glass plate periphery, and controls described compensation glass plate generation deformation.
3. alignment compensation device as claimed in claim 2, is characterized in that, described little layer of compensation attaches and is arranged on whole of described compensation glass plate, or is arranged on the desired location of described compensation glass plate middle part.
4. alignment compensation device as claimed in claim 3, is characterized in that, the quantity of described optical beam generating device is at least two, and at least two described optical beam generating devices are oppositely arranged on respectively the side edge of close described compensation glass plate.
5. alignment compensation device as claimed in claim 4, is characterized in that, the material of described little layer of compensation is the resin with thermal sensitive effect.
6. alignment compensation device as claimed in claim 5, is characterized in that, described optical beam generating device is infrared transmitter.
7. an exposure device, is characterized in that, comprises the described alignment compensation device of claim 1-6 any one.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310023449.5A CN103105741B (en) | 2013-01-22 | 2013-01-22 | Alignment compensation device and exposure device |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201310023449.5A CN103105741B (en) | 2013-01-22 | 2013-01-22 | Alignment compensation device and exposure device |
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| Publication Number | Publication Date |
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| CN103105741A true CN103105741A (en) | 2013-05-15 |
| CN103105741B CN103105741B (en) | 2015-01-21 |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
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| WO2015197023A1 (en) * | 2014-06-26 | 2015-12-30 | 无锡华润上华科技有限公司 | Lithography stepper alignment and control method |
| CN107523787A (en) * | 2017-08-22 | 2017-12-29 | 武汉华星光电半导体显示技术有限公司 | A kind of adjustment method and evaporator |
| US10510959B2 (en) | 2017-08-22 | 2019-12-17 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Commissioning method and vapor deposition machine |
| CN111580278A (en) * | 2020-06-11 | 2020-08-25 | 京东方科技集团股份有限公司 | AR or VR glasses |
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| EP1482343A1 (en) * | 2003-05-30 | 2004-12-01 | ORC Manufacturing Co., Ltd. | Optical projection system |
| JP2005275325A (en) * | 2004-03-26 | 2005-10-06 | Fuji Photo Film Co Ltd | Image exposing device |
| CN102262360A (en) * | 2010-05-31 | 2011-11-30 | 株式会社拓普康 | Exposure apparatus |
| CN102411264A (en) * | 2011-11-22 | 2012-04-11 | 上海华力微电子有限公司 | Device and method for equalizing temperature of projection objective for photoetching machine |
| CN102725696A (en) * | 2009-11-20 | 2012-10-10 | 康宁股份有限公司 | Magnification control for lithographic imaging system |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1482343A1 (en) * | 2003-05-30 | 2004-12-01 | ORC Manufacturing Co., Ltd. | Optical projection system |
| JP2005275325A (en) * | 2004-03-26 | 2005-10-06 | Fuji Photo Film Co Ltd | Image exposing device |
| CN102725696A (en) * | 2009-11-20 | 2012-10-10 | 康宁股份有限公司 | Magnification control for lithographic imaging system |
| CN102262360A (en) * | 2010-05-31 | 2011-11-30 | 株式会社拓普康 | Exposure apparatus |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2015197023A1 (en) * | 2014-06-26 | 2015-12-30 | 无锡华润上华科技有限公司 | Lithography stepper alignment and control method |
| US9977342B2 (en) | 2014-06-26 | 2018-05-22 | Csmc Technologies Fab2 Co., Ltd. | Lithography stepper alignment and control method |
| CN107523787A (en) * | 2017-08-22 | 2017-12-29 | 武汉华星光电半导体显示技术有限公司 | A kind of adjustment method and evaporator |
| CN107523787B (en) * | 2017-08-22 | 2019-08-02 | 武汉华星光电半导体显示技术有限公司 | A kind of adjustment method and evaporator |
| US10510959B2 (en) | 2017-08-22 | 2019-12-17 | Wuhan China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | Commissioning method and vapor deposition machine |
| CN111580278A (en) * | 2020-06-11 | 2020-08-25 | 京东方科技集团股份有限公司 | AR or VR glasses |
| WO2021249180A1 (en) * | 2020-06-11 | 2021-12-16 | 京东方科技集团股份有限公司 | Ar/vr glasses |
| CN111580278B (en) * | 2020-06-11 | 2022-06-17 | 京东方科技集团股份有限公司 | AR or VR glasses |
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