CN106893987A - The preparation method and Ta C coatings of a kind of physical vapour deposition (PVD) Ta C coatings - Google Patents
The preparation method and Ta C coatings of a kind of physical vapour deposition (PVD) Ta C coatings Download PDFInfo
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- CN106893987A CN106893987A CN201710263404.3A CN201710263404A CN106893987A CN 106893987 A CN106893987 A CN 106893987A CN 201710263404 A CN201710263404 A CN 201710263404A CN 106893987 A CN106893987 A CN 106893987A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3464—Sputtering using more than one target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/021—Cleaning or etching treatments
- C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
- C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
Abstract
The present invention relates to physical vapour deposition (PVD) hard coat, a kind of Ta C hard multi-layer coatings are specifically disclosed.The present invention is included using Ti targets and graphite target, coating preparation process：Step one：Plasma cleaning；Step 2：Depositing Ti prime coat；Step 3：Prepare Ti and carbon combination layer；Step 4：The deposition unformed non-hydrogen amorphous layer of tetrahedron.Physical vapour deposition (PVD) Ta C coatings of the invention are combined technique using ion sputtering and glow discharge technique, and with preparation process is simple, depositing temperature is low, pollution-free, consumptive material is few and the features such as film forming even compact.Ta C coating hardness of the invention close to diamond hardness, with hardness is higher, self lubricity more preferably and the more low advantage of coefficient of friction.Ta C coatings of the invention are applied to soft metal process tool and plastic forming die, can substantially reduce abrasion, suppress adhesion, improve cutter and die life.
Description
Technical field
The present invention relates to metal tools, plastic mould field of surface modification, and in particular to a kind of physical vapour deposition (PVD) Ta-C
The preparation method and Ta-C coatings of coating.
Background technology
With the high speed development of advanced manufacturing technology, to cutter, mould and component of machine in precision, service life and work(
Can on propose requirement higher, particularly their surface quality and determine the qualification rate of product to be processed, production efficiency, with
And the performance of plant equipment parts etc..It is a large amount of it was verified that vapour deposition hard coat is one kind can be effectively improved and improve
The method of material surface performance.Gas phase deposition technology, especially physical vapour deposition (PVD) (Physical Vapor nearly ten years
Deportation, abbreviation PVD) technology achieves the development advanced by leaps and bounds, TiN prepared by all kinds of PVD techniques, TiCN, TiAlN,
The coatings such as DLC greatly improve all kinds of performances of material surface, such as wear-resisting, antifriction, anticorrosive, shock resistance and anti-oxidant
Performance etc..Hard coat technology with making all kinds of cutters, mould and mechanical wearing piece play bigger in terms of performance and benefit
Advantage, with huge application potential.
The content of the invention
The purpose of the present invention be prepare a kind of Ta-C (tetrahedral amorphous carbon, tetrahedral amorphous carbon,
Or tetrahedron is unformed non-hydrogen amorphous) laminated coating.
The present invention combines glow discharge and ion sputtering, there is provided a kind of preparation of physical vapour deposition (PVD) Ta-C coatings
Method.
A kind of preparation method of physical vapour deposition (PVD) Ta-C coatings, for preparing Ta-C coatings, the preparation in matrix surface
The technique that method is combined using ion sputtering and glow discharge technique, mainly comprises the following steps：
Step one：Using glow discharge technique, plasma cleaning matrix surface impurity；
Argon ion bombardment is carried out in the vacuum furnace chamber for having heated to remove matrix surface impurity, temperature is in vacuum furnace chamber
70-90 DEG C, vacuum is 9 × 10-5-1.3×10-4Pa, argon ion bombardment frequency is 13-17Hz；
Step 2：Using ion sputtering depositing Ti prime coat；
To argon gas (Ar) is passed through in vacuum furnace chamber, argon gas (Ar) flow is 40-70sccm, and vacuum furnace chamber temperature is 75-
95 DEG C, vacuum is 8.5 × 10-5-1.1×10-4Pa, Ti target are powered, in matrix surface depositing Ti prime coat coating, Ti targets electricity
It is 210-280mA to flow, and voltage is 340-400V, sedimentation time 5-6min；
Step 3：Ti and carbon combination layer are prepared using ion sputtering；
Continue to be passed through argon gas (Ar), argon gas (Ar) flow is 30-60sccm, and vacuum furnace chamber temperature is 80-100 DEG C, very
Reciprocal of duty cycle is 8 × 10-5-1×10-4Pa, makes Ti targets and graphite target be powered simultaneously, the combination of depositing Ti and carbon on the outside of Ti prime coats
Body coating；Wherein, Ti target currents are 200-260mA, and voltage is 350-400V, and graphite target current is 220-280mA, and voltage is
360-420V, sedimentation time 3-4min；
Step 4：The unformed non-hydrogen amorphous layer of tetrahedron is deposited using ion sputtering；
Argon gas (Ar) is kept to be passed through, argon gas (Ar) flow is 55-90sccm, vacuum furnace chamber temperature is 80-95 DEG C, vacuum
Spend is 9 × 10-5-1.15×10-4Pa, stops Ti targets and is powered, and keeps graphite target to be powered, and is made on the outside of the combination layer of Ti and carbon
The unformed non-hydrogen amorphous layer of standby tetrahedron, graphite target current is 200-260mA, and voltage is 350-400V, sedimentation time 1.5-
2h。
For laminated coating, the adhesion between each layer is most important, and adhesion has with the physical property of each layer
Much relations, if adhesion is poor between each layer, such as coating is bad with transition zone bond strength, can produce larger stress collection
In and flexural deformation, ultimately result in disbonding.Additionally, in mechanical processing process, influenceed by alternate load, coating with
Substrate combinating strength deficiency can also cause that coating is peeled off from matrix.Preparation technology is the principal element for influenceing coating performance, different
The coating performance that processing step is prepared is widely different.Matrix and bottom in the product that different preparation technology influences is prepared
Layer, bottom and transition zone, transition zone and outermost bond strength.Preparation technology parameter setting is improper, will cause amorphous carbon
Layer Ta-C is not enough with the bond strength of transition zone, it is impossible to reach the addition by transition zone to improve the purpose that film/base junction is made a concerted effort,
Amorphous carbon layer is easily influenceed by alternate load with transition zone and is peeled off from matrix in machining, it is impossible to meet machining
It is required that.The present invention adjusts matrix by step one to various cleanings and the setting and the setting of parameter of coating procedure in step 4
Layer is unformed with tetrahedron non-hydrogen amorphous with Ti prime coats, Ti prime coats and Ti and carbon combination layer, Ti and carbon combination layer
Physical property matching between layer, substantially increases the adhesion between each layer.
Also, the technology that the present invention is also combined using ion sputtering with glow discharge, the Ta-C coatings of preparation show
Good bond strength, and required preparation temperature is low (70~100 DEG C), and matrix will not be made to anneal, it is to avoid matrix is because of system
Standby temperature is high and softening in turn results in the defect that matrix softens, film substrate bond strength is low.
In preparation method of the invention, step one using glow discharge technique clean matrix surface impurity so that coating with
Matrix is more easy to combine；Step 2, three, four prepare Ta-C coatings using ion sputtering, and ion sputtering substantially increases film layer
Ion energy, the film/base junction for forming film layer is made a concerted effort.
Preferably, when argon ion bombardment is cleaned, the bias of matrix is 450-550V, and argon gas (Ar) flow is 30-
90sccm。
Preferably, for deposit Ta-C coatings used by target be graphite target (purity is 99.9%) and Ti target (purity
For 99.9%).Further preferably, the shape of the graphite target and Ti targets is round shape flat target.The present invention uses round shape plane
Target, compared to general conventional rectangle target, evenly, target utilization rate is higher, thus consumptive material is few for the loss of target.
The present invention also provides a kind of Ta-C coatings, and the Ta-C coatings include combination layer, four of Ti prime coats, Ti and carbon
The unformed non-hydrogen amorphous layer of face body, the combination layer and the unformed hydrogen-free amorphous of tetrahedron of the Ti prime coats, Ti and carbon
Carbon-coating is successively set on matrix.And preferably, the Ta-C coating layer thicknesses are 2.5-3 μm, wherein, Ti prime coat thickness is
The combination bulk layer thickness of 0.1-0.15, Ti and carbon is 0.1-0.15 μm, and the unformed non-hydrogen amorphous thickness degree of tetrahedron is 2.2-
2.7μm。
The present invention also provides a kind of workpiece, and above-mentioned Ta-C coatings are coated with the workpiece.
Beneficial effects of the present invention are：
The invention provides a kind of preparation method of physical vapour deposition (PVD) Ta-C coatings, the preparation method has depositing temperature
(70-100 DEG C) low, to alloy substrate not damaged and few pollution-free, consumptive material the features such as.Coating hardness prepared by the present invention is reachable
HV5000, close to the hardness of diamond.Ta-C coatings of the invention are applied to soft metal process tool and plastic forming die,
Abrasion can be substantially reduced, suppressed adhesion, improved cutter and die life.
Brief description of the drawings
Fig. 1 is Ta-C coatings of the invention and its prepares schematic diagram；
Fig. 2 is the structural representation of the equipment furnace chamber for preparing physical vapour deposition (PVD) Ta-C coatings of the embodiment of the present invention；
Fig. 3 is the photo before the ball valve coating of the embodiment of the present invention 2；
Fig. 4 is the photo of the whole machine of ball valve after the Ta-C coatings of the embodiment of the present invention 2；
Fig. 5 is the photo that the whole machine of ball valve after the Ta-C coatings of the embodiment of the present invention 2 open and close hot endurancing；
Fig. 6 is the photo of the Ta-C coated carbides milling cutters of the embodiment of the present invention 3.
Specific embodiment
The present invention provides the preparation method and Ta-C coatings of a kind of physical vapour deposition (PVD) Ta-C coatings, and is provided with described
The workpiece of Ta-C coatings.
Physical vapour deposition (PVD) (Physical Vapor Deposition, PVD) is using physics side under a kind of vacuum condition
Method, gaseous atom is gasificated into by solid or fluent material surface, and molecule or partial ionization have into ion in body surface deposition
The technology of certain specific function film.The technique has pollution-free, and consumptive material is few, the advantages of film forming even compact.Using the technique
Ta-C (tetrahedral amorphous carbon) coating of preparation is applied to component of machine, plastic mould and soft metal process tool, can be with
Significantly improve its service life and processing characteristics.
Refer to Fig. 1, Ta-C coatings of the invention, including Ti prime coats, Ti and carbon combination layer and tetrahedron without
Shape non-hydrogen amorphous layer, and the combination layer and tetrahedron of the Ti prime coats, Ti and carbon are unformed non-hydrogen amorphous
Layer is successively set on matrix.And preferably, the Ta-C coating layer thicknesses are 2.5-3 μm, wherein, Ti prime coat thickness is
0.1-O.15 μm, the combination bulk layer thickness of Ti and carbon is 0.1-0.15 μm, and the unformed non-hydrogen amorphous thickness degree of tetrahedron is
2.2-2.7μm.Fig. 1 is simultaneously visible, there is carbon, titanium, argon ion simultaneously in the prepared atmosphere of the coating.
Ta-C coatings prepared by the present invention are mainly used in component of machine, plastic mould and soft metal process tool, use
In the hardness of lifting matrix surface, coating hardness reaches HV5000.Because Ta-C coating hardness is too high, coating is with matrix hardness not
Matching, it is poor to easily cause basal body binding force, therefore, by between coating and matrix introducing transitionality coating, (Ti beats the present invention
Bottom, Ti and carbon combination layer), relaxed between Ta-C coatings and matrix because of the difference of physical property, also alleviate coating with
Stress concentration between matrix.Additionally, for metal cutting process cutlery, alternating download is received in metal cutting process
The influence of lotus, easily produces fatigue stress.If only preparing individual layer Ta-C coatings in tool surface, face coat easily receives fatigue load
And hand over the influence of stress to produce fatigue crack.With continuing for cutting process, crackle extends readily along tool surface, and
Eventually flake off.Laminated coating of the invention not only can increase crack propagation distance, can be played well with On Crack Propagation
Inhibition.
Fig. 2 is referred to, is a kind of example that the present invention prepares the equipment that Ta-C coatings are used, wherein, C is prepared product qi-regulating
Graphite target needed for mutually depositing Ta-C coatings, there is provided coating prepares required carbon；Ti is to prepare physical vapour deposition (PVD) Ta-C coatings
Required Ti targets, there is provided coating prepares required Ti.
Herein, the scope for being represented by " numerical value to another numerical value ", is that one kind avoids enumerating in the description
The summary representation of all numerical value in the scope.Therefore, the record of a certain special value scope, covers the number range
Interior any number and the relatively fractional value scope defined by any number in the number range, as bright in the description
Text writes out any number as should be compared with fractional value scope.
With reference to specific embodiment, the present invention is expanded on further.It should be understood that these embodiments are merely to illustrate this hair
It is bright, rather than limit protection scope of the present invention.Those skilled in the art are according to changing that the present invention makes in actual applications
Enter and adjust, still fall within protection scope of the present invention.
Embodiment one：
The present embodiment is to prepare Ta-C hard coats in cemented carbide substrate surfaces.
Preparation method is as follows：
Pre-treatment：Hard alloy test piece is carried out alcohol washes remove surface greasy dirt and impurity, then to alcohol washes after
Test piece carry out 45min ultrasonic wave cleaning；
Plasma cleaning is carried out to substrate material surface：Matrix material is heated to 75 DEG C, vacuum drying oven in vacuum furnace chamber
Argon gas is passed through in chamber, argon flow amount is 50sccm, and substrate bias are 500V, and scavenging period is 40min, and vacuum is 1.1 × 10- 4Pa, argon ion bombardment frequency is 15Hz；Matrix surface impurity is further cleaned using glow discharge technique so that coating and base
Body is more easy to combine；
Depositing Ti prime coat：Continue to argon gas (Ar) is passed through in vacuum furnace chamber, argon gas (Ar) flow is 65sccm, vacuum drying oven
Chamber temperature is 87 DEG C, and vacuum is 9.5 × 10-5Pa, makes Ti targets be powered and is deposited, and Ti target currents are 240mA, and voltage is
370V, sedimentation time 5min, obtain Ti prime coats, and thickness is 0.12 μm；
Prepare Ti and carbon combination layer：Continue to be passed through argon gas (Ar), argon gas (Ar) flow is 56sccm, temperature in vacuum furnace chamber
It is 84 DEG C to spend, and vacuum is 9.2 × 10-5Pa, makes Ti targets and graphite target be powered simultaneously, and Ti target currents are 230mA, and voltage is
360V, graphite target current is 240mA, and voltage is 390V, sedimentation time 4min, obtains the combination layer of Ti and carbon, and thickness is
0.11μm；
The deposition unformed non-hydrogen amorphous layer of tetrahedron：Argon gas (Ar) is kept to be passed through, argon gas (Ar) flow is 75sccm, very
Empty furnace chamber temperature is 89 DEG C, and vacuum is 9.5 × 10-5Pa, stops Ti targets and is powered, and keeps graphite target to be powered, graphite target current
It is 240mA, voltage is 390V, sedimentation time 1.8h, obtains the unformed non-hydrogen amorphous layer of tetrahedron, thickness is 2.6 μm.
Hard alloy test piece after coating is tested, 2.83 μm of the thickness of Ta-C coatings, micro-hardness is HV5200.
Compare has and significantly improves with DLC coatings (diamond-like coating) (HV3200), Ta-C coating hardness.
For coating, if out-of-flatness on surface microscopic, product is easily produced to cut knurl.Coating surface of the invention is fine and close
It is smooth, it is possible to reduce product cuts the generation of knurl, and then reduces machined surface roughness, improves workpiece surface quality.And coating
Surface compact is smooth, no significant defect, and then the coating as aluminium alloy process tool can enable aluminum alloy to be arranged in process
Bits are smooth, and film/film-substrate binding strength is high, are difficult to peel off in process.
Embodiment 2：
Apply aspects of the present inventions to ball valve product.
The high-temp and-pressure ball valve of a model DN125 of Nantong company production, its design parameter requirement is as follows：
(1) spheroid, valve seat be pressure-resistant and seal test pressure：8.09MPa；
(2) medium temperature：475℃；
(3) Applicable media：Superheated steam；
(4) spheroid, valve base sealing are secondary requires：Ensure that the spheroid hardness after surface treatment reaches HRC60-65, seat hardness
Up to more than HRC50-55, and ensure that spheroid is HRC6-10 with sealing surface of seat difference of hardness.
The machine life requirement of the ball valve：High temperature and high pressure steam system valve opens and closes hot endurancing 2000 times.
Using with the identical preparation method of embodiment 1 Ta-C coatings are prepared on the ball valve surface.
Afterwards, carried out to the ball valve (such as Fig. 3) without Ta-C coatings and by the ball valve (such as Fig. 4) after Ta-C coatings whole
Machine opens and closes hot durability field test test such as Fig. 5.Test result is confirmed, if without coating, the whole machine of ball valve is opened and closed
Hot endurancing can only achieve 5 times；By after Ta-C coatings, the one side thickness of coating is 2.5-3.0 microns, and wherein Ti beats
Underlayer thickness is 0.1-0.15 μm, and the combination bulk layer thickness of Ti and carbon is 0.1-0.15 μm, and tetrahedron is unformed non-hydrogen amorphous
Thickness degree is 2.2-2.7 μm, and the whole machine of ball valve opens and closes hot endurancing can be reached 2500 times, fully meet machine life
It is required that.
Embodiment 3：
Apply aspects of the present inventions to the cutter of aluminium alloy processing.
The plasticity of aluminium alloy is low, and fusing point is also low, and its viscous knife problem is serious during processing aluminium alloy, chip removal poor-performing, surface
Roughness is also higher, and often needs to obtain the aluminum alloy part of minute surface in producing, and is that this can only use diamond cutter,
But cost is very high.
The Ta-C coatings of present invention research can be prepared in carbide tool surface, with wear-resisting, aluminum-resistant alloys adhesion
The features such as, minute surface Milling Process can be carried out at high speed to aluminium alloy.
The method that Ta-C coatings are prepared on hard alloy cutter is essentially identical with embodiment, and difference is as follows：
The preparation four steps sedimentation time of the cutter of the processing aluminium alloy is 1.6h, obtains the unformed hydrogen-free of tetrahedron non-
Brilliant carbon-coating, thickness is 2.3 μm, 2.53 μm of the gross thickness of Ta-C coatings.
The following is the machined parameters that the above-mentioned hard alloy cutter for being coated with Ta-C coatings is used for aluminium alloy：
(1) aluminium alloy is processed for annealed condition, Brinell hardness HB80 or so；
(2) hard alloy cutter of selection is external diameter 10mm, and surface carries Ta-C coatings (as shown in Figure 6)；
(3) cutting speed：2500m/min；The amount of feeding：0.02-0.1mm/r；Cutting depth：0.02-0.3mm；
(4) coolant：Kerosene.
Confirmed by cutting test, be processed using hard alloy cutter of the surface with Ta-C coatings, aluminium alloy adds
The chip removal of work process is smooth, without there is any viscous knife phenomenon, aluminum alloy surface light after processing, surface roughness Ra 0.05 with
Under.
Ta-C coatings prepared by the present invention have advantages below：
Firstth, hardness is high, the fine and close smooth, no significant defect of coating surface, self lubricity more preferably and coefficient of friction is lower；
When Ta-C coatings prepared by the present invention are used for process tool, in process, the outermost tetrahedral amorphous carbon-coating of coating has
Processing self-lubricating property.By experimental verification, Ta-C coatings milling cutter processing 2A50 aluminium alloys are compared and DLC coatings, the aluminium for obtaining
The finished surface of alloy more smooth finish, coefficient of friction as little as 0.01；
Secondth, the whole machine that applying can greatly improve ball valve located at ball valve surface opens and closes hot durability, and then greatly improves
The machine life of ball valve；
3rd, the surface of the hard alloy cutter located at processing aluminium alloy is applied, in can solve the problem that aluminium alloy process
Viscous knife problem.
Preparation method of the invention has further the advantage that：
Firstth, the present invention adds the method for glow discharge that Ta-C coatings are prepared on workpiece substrate by ion sputtering, uses
Target be Ti targets and C targets, do not chemically reacted in deposition process, it is pollution-free；
Secondth, 70~100 DEG C of depositing temperature of the present invention, less than the temperature of most alloy substrates, to alloy-based
Body not damaged, toughness and intensity on workpiece do not influence, can be as the final of high-accuracy cutter, mould and fretting wear part
Handling process.
Under the teaching of the present invention and above-described embodiment, those skilled in the art are easy to it is envisioned that the present invention is cited
Or each raw material for enumerating or its equivalent alterations, each processing method or its equivalent alterations can realize the present invention, and each original
The parameter bound value of material and processing method, interval value can realize the present invention, embodiment numerous to list herein.
Claims (7)
1. a kind of preparation method of physical vapour deposition (PVD) Ta-C coatings, for preparing Ta-C coatings in matrix surface, its feature exists
In the technique that the preparation method is combined using ion sputtering and glow discharge technique mainly comprises the following steps：
Step one：Using glow discharge technique, plasma cleaning matrix surface impurity；
Argon ion bombardment is carried out in the vacuum furnace chamber for having heated to remove matrix surface impurity, temperature is 70- in vacuum furnace chamber
90 DEG C, vacuum is 9 × 10-5-1.3×10-4Pa, argon ion bombardment frequency is 13-17Hz；
Step 2：Using ion sputtering depositing Ti prime coat；
To argon gas is passed through in vacuum furnace chamber, argon flow amount is 40-70sccm, and vacuum furnace chamber temperature is 75-95 DEG C, and vacuum is
8.5×10-5-1.1×10-4Pa, Ti target are powered, and in matrix surface depositing Ti prime coat coating, Ti target currents are 210-280mA,
Voltage is 340-400V, sedimentation time 5-6min；
Step 3：Ti and carbon combination layer are prepared using ion sputtering；
Continue to be passed through argon gas, argon flow amount is 30-60sccm, and vacuum furnace chamber temperature is 80-100 DEG C, and vacuum is 8 × 10-5-
1×10-4Pa, makes Ti targets and graphite target be powered simultaneously, the combination coating of depositing Ti and carbon on the outside of Ti prime coats；Wherein, Ti
Target current is 200-260mA, and voltage is 350-400V, and graphite target current is 220-280mA, and voltage is 360-420V, during deposition
Between 3-4min；
Step 4：The unformed non-hydrogen amorphous layer of tetrahedron is deposited using ion sputtering；
Argon gas is kept to be passed through, argon flow amount is 55-90sccm, vacuum furnace chamber temperature is 80-95 DEG C, and vacuum is 9 × 10-5-
1.15×10-4Pa, stops Ti targets and is powered, and keeps graphite target to be powered, and tetrahedron is prepared without fixed on the outside of the combination layer of Ti and carbon
The non-hydrogen amorphous layer of type, wherein graphite target current are 200-260mA, and voltage is 350-400V, sedimentation time 1.5-2h.
2. the preparation method of physical vapour deposition (PVD) Ta-C coatings as claimed in claim 1, it is characterised in that argon ion bombardment is clear
When washing, the bias of matrix is 450-550V, and argon gas (Ar) flow is 30-90sccm.
3. the preparation method of physical vapour deposition (PVD) Ta-C coatings as claimed in claim 1, it is characterised in that for what is deposited
Target used by Ta-C coatings is the graphite target that purity is 99.9% and the Ti targets that purity is 99.9%.
4. the preparation method of the physical vapour deposition (PVD) Ta-C coatings as described in claim 1 or 3, it is characterised in that the graphite
The shape of target and Ti targets is round shape flat target.
5. a kind of Ta-C coatings, it is characterised in that the Ta-C coatings include combination layer, the four sides of Ti prime coats, Ti and carbon
The unformed non-hydrogen amorphous layer of body, the combination layer and tetrahedron of the Ti prime coats, Ti and carbon is unformed non-hydrogen amorphous
Layer is successively set on matrix.
6. Ta-C coatings as claimed in claim 5, it is characterised in that the Ta-C coating layer thicknesses are 2.5-3 μm, wherein, Ti
Prime coat thickness is 0.1-0.15 μm, and the combination bulk layer thickness of Ti and carbon is 0.1-0.15 μm, the unformed hydrogen-free amorphous of tetrahedron
Carbon layers having thicknesses are 2.2-2.7 μm.
7. a kind of workpiece, it is characterised in that the Ta-C coatings described in claim 5 or 6 are coated with the workpiece.
Priority Applications (1)
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109351975A (en) * | 2018-10-31 | 2019-02-19 | 北京工商大学 | A kind of the micropore stainless steel base and its preparation process of physical gaseous phase deposition coating |
| CN111850484A (en) * | 2020-07-24 | 2020-10-30 | 太原理工大学 | Device and method for preparing tough amorphous carbon-based multiphase hybrid film |
| CN112853281A (en) * | 2020-12-29 | 2021-05-28 | 东莞市华升真空镀膜科技有限公司 | Carbon-based multilayer film and preparation method and application thereof |
| CN112981322A (en) * | 2021-02-05 | 2021-06-18 | 苏州吉恒纳米科技有限公司 | Super-wear-resistant and impact-resistant multilayer DLC coating for piston ring and production process |
| CN113957393A (en) * | 2021-09-28 | 2022-01-21 | 西安交通大学 | Method for improving surface wear performance and service life of nitride coating cutter |
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Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140178659A1 (en) * | 2012-12-26 | 2014-06-26 | Shanghua Wu | Al2o3 or al2o3-contained multilayer coatings for silicon nitride cutting tools by physical vapor deposition and methods of making the same |
| CN104046943A (en) * | 2013-03-15 | 2014-09-17 | 蒸汽技术公司 | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
| CN207176061U (en) * | 2017-04-20 | 2018-04-03 | 上海应用技术大学 | A kind of physical vapour deposition (PVD) Ta C coatings and the workpiece provided with the coating |
-
2017
- 2017-04-20 CN CN201710263404.3A patent/CN106893987B/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20140178659A1 (en) * | 2012-12-26 | 2014-06-26 | Shanghua Wu | Al2o3 or al2o3-contained multilayer coatings for silicon nitride cutting tools by physical vapor deposition and methods of making the same |
| CN104046943A (en) * | 2013-03-15 | 2014-09-17 | 蒸汽技术公司 | Low pressure arc plasma immersion coating vapor deposition and ion treatment |
| CN207176061U (en) * | 2017-04-20 | 2018-04-03 | 上海应用技术大学 | A kind of physical vapour deposition (PVD) Ta C coatings and the workpiece provided with the coating |
Non-Patent Citations (1)
| Title |
|---|
| 刘海浪;羊建高;黄如愿;: "硬质合金涂层刀具研究进展" * |
Cited By (7)
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| CN109351975A (en) * | 2018-10-31 | 2019-02-19 | 北京工商大学 | A kind of the micropore stainless steel base and its preparation process of physical gaseous phase deposition coating |
| CN111850484A (en) * | 2020-07-24 | 2020-10-30 | 太原理工大学 | Device and method for preparing tough amorphous carbon-based multiphase hybrid film |
| CN112853281A (en) * | 2020-12-29 | 2021-05-28 | 东莞市华升真空镀膜科技有限公司 | Carbon-based multilayer film and preparation method and application thereof |
| CN112981322A (en) * | 2021-02-05 | 2021-06-18 | 苏州吉恒纳米科技有限公司 | Super-wear-resistant and impact-resistant multilayer DLC coating for piston ring and production process |
| CN113957393A (en) * | 2021-09-28 | 2022-01-21 | 西安交通大学 | Method for improving surface wear performance and service life of nitride coating cutter |
| CN113957402A (en) * | 2021-09-28 | 2022-01-21 | 西安交通大学 | Method for prolonging service life of compressor sliding blade, sewing machine needle cylinder and other moving parts |
| CN114657521A (en) * | 2022-03-24 | 2022-06-24 | 安徽坤擎机械科技有限公司 | Wear-resistant spring air hole sleeve treatment process |
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