CN106821852A - A kind of facial mask - Google Patents
A kind of facial mask Download PDFInfo
- Publication number
- CN106821852A CN106821852A CN201710098194.7A CN201710098194A CN106821852A CN 106821852 A CN106821852 A CN 106821852A CN 201710098194 A CN201710098194 A CN 201710098194A CN 106821852 A CN106821852 A CN 106821852A
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- Prior art keywords
- skin
- facial mask
- quantum dot
- present
- extract
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/96—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution
- A61K8/97—Cosmetics or similar toiletry preparations characterised by the composition containing materials, or derivatives thereof of undetermined constitution from algae, fungi, lichens or plants; from derivatives thereof
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/19—Cosmetics or similar toiletry preparations characterised by the composition containing inorganic ingredients
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
- A61Q17/005—Antimicrobial preparations
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q19/00—Preparations for care of the skin
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K2800/00—Properties of cosmetic compositions or active ingredients thereof or formulation aids used therein and process related aspects
- A61K2800/40—Chemical, physico-chemical or functional or structural properties of particular ingredients
- A61K2800/59—Mixtures
- A61K2800/592—Mixtures of compounds complementing their respective functions
- A61K2800/5922—At least two compounds being classified in the same subclass of A61K8/18
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- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Veterinary Medicine (AREA)
- Birds (AREA)
- Dermatology (AREA)
- Epidemiology (AREA)
- Inorganic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Biotechnology (AREA)
- Botany (AREA)
- Microbiology (AREA)
- Mycology (AREA)
- Cosmetics (AREA)
- Medicines Containing Plant Substances (AREA)
Abstract
The present invention relates to a kind of facial mask, including following mass percent component：NMF：8 21%, graphene quantum dot：1 5%, hamamelis extract：0.1 5%, arnica extract：0.1 1%, thickener：0.1 3%, conditioner：0.1 0.5%.The graphene quantum dot that the present invention is used has good characterization of adsorption and the rush effect of oozing, the dirt and various noxious materials of skin surface can be adsorbed, the quick nutritional ingredient that will be rich in facial mask is permeated to skin cuticula, skin corium, promotes plant nutrient ingredient to import, and is that skin keeps the skin wet, lifting elasticity, avoid skin from decortication phenomenon occur, and play cleaning skin, suppress the effect of pathogenic bacteria growing, wake-up is sunk into sleep skin, improves skin immunity.
Description
Technical field
The present invention relates to cosmetic field, a kind of facial mask is specifically related to.
Background technology
Many people think that, skin innately has stronger defense function, even if facing air pollution, can also be formed one day
Right barrier, it is not necessary to harm of the overanxiexty worry about air pollution at all to skin, but according to investigations, with global air pollution
Aggravation, harm of the air pollution to skin has turned into beautiful formidable enemy, and the women in many areas has occurred in that clogging of pores, Cuo
The phenomenons such as sore, rotten aging, skin canceration, allergy, cutaneous immunisation reaction and infringement, allow many women to begin to focus on and find energy
The harm that enough effectively imperial preventing air contaminations bring to skin.
PM2.5 values are exceeded, and air quality is poor, health can be influenceed, particularly to the harm of respiratory system.But recently
Skin expert also draw a conclusion, the smaller excellent adsorption of PM2.5 particles, containing a large amount of pollution particles and micro- in the air of haze weather
Biology, these materials are attached on skin, cause the metabolic cycles of skin to be affected, and color spot, blackhead, pore can be made thick
Problem is more obvious.
Chinese patent application 105287248A, discloses a kind of graphene oxide facial mask and preparation method thereof.The invention is first
It is secondary that Graphene is applied in facial mask, and elaborate that Graphene kills acarid and deep layer removes the effect of acarid, but not
Further investigate the effect of graphene quantum dot.
The content of the invention
Present invention aim at a kind of facial mask is provided, reach absorption skin surface pollutant from graphene quantum dot, promote
Enter nutriment and moist composition to skin percdation and suppress the effect of pathogenic bacteria growing.
To achieve the above object, the present invention is adopted the following technical scheme that：
A kind of facial mask of the present invention, including following mass percent component：
NMF：8-21%；
Graphene quantum dot：1-5%；
Hamamelis extract：0.1-5%；
Arnica extract：0.1-1%；
Thickener：0.1-3%；
Conditioner：0.1-0.5%；
Preferably, in a preferred embodiment of the invention, a kind of described facial mask, including following mass percent group
Point：
NMF：12-16%；
Graphene quantum dot：2-4%；
Hamamelis extract：1-4%；
Arnica extract：0.3-0.8%；
Thickener：1-2%；
Conditioner：0.2-0.4%；
In a preferred embodiment of the invention, the NMF is PEG-8, glycerine, butanediol, hyalomitome
One or more in sour sodium.
In a preferred embodiment of the invention, the thickener be one kind in Carbomer, xanthans, guar gum or
It is two or more.
In a preferred embodiment of the invention, the conditioner is allantoin.
The flower of arnica and root can be used, and naturopathy personage is used to as anodyne, Eradicates phlegm agent and emerging
Put forth energy agent.Arnica external application is coated on skin, can effectively control treatment trauma, bruise and allergic.Arnica can be made
Ointment, mitigates DOMS or arthritis.
Hamamelis extract main component has tannic acid, catechin, OPC etc., can adjust sebum secretion,
With moisturizing and Milk Protein, promote lymph blood circulation.The skin such as stimulated and anaphylaxis can be relaxed, coarse wool is fully restrained
Hole, prevents blackhead and acne from producing.It has functions that deep layer cleaning.Skin is rapidly permeated into, is adjusted comprehensively from inside to outside and is cleaned
Skin, makes skin that fine and smooth, smooth, tight is quickly presented, and can effectively help the power of regeneration of night skin.Because there is receipts
Oil-control, sterilized significant curative effect are held back, is only selection for children in adolescence or the more serious skin of situation of going on a tour.
British scientist has been prepared by carbon atom with sp first within 20042It is new that the monoatomic layer of hydridization connection is constituted
Two-dimensional atomic crystal-Graphene, its thickness only has 0.3354nm, is to find most thin material in the world at present.Graphene oxide
With low cost, raw material is easy to get, with good process based prediction model, such as specific surface energy higher, good hydrophily, good
Absorption property, and have preferable dispersiveness in water and organic solvent.
Graphene quantum dot, as a kind of new quantum dot, in recent years by the extensive concern of scientist.Graphene amount
Son point is the carbon nanomaterial of quasi-zero dimension, and its particle diameter is general in 10nm or so, except inheriting Graphene good water solubility, surface area
Greatly, carrier mobility speed is high, mechanical flexibility is good and many premium properties such as stable optical performance outside, due to its size
It is small, also with significant quantum confinement effect and edge effect, and with excellent fluorescence property, good bio-compatible
The special physicochemical properties such as property, low cytotoxicity, chemical inertness.
There is graphene quantum dot of the present invention good characterization of adsorption and rush to ooze performance, can adsorb the dirt of skin surface
Thing, promotes NMF and plant extracts to be permeated in skin, and contained nutritional ingredient in facial mask is imported, and plays cleaning skin
Effect.Because graphene quantum dot belongs to nanometer materials, in easily swallowing abdomen by bacterium, germ, cause bacterium, germ it is dead
Die, thus can play a part of to suppress the bacteria growing that causes a disease.
Beneficial effects of the present invention：Compared with prior art, a kind of facial mask of the invention has the following advantages that：1. Graphene
Quantum dot has good characterization of adsorption and the rush effect of oozing, and can adsorb the dirt and various noxious materials of skin surface, quickly will
The nutritional ingredient being rich in facial mask is permeated to skin cuticula, skin corium, promotes plant nutrient ingredient to import, and is skin supplement water
Point, lifting elasticity, it is to avoid decortication phenomenon occurs in skin, strengthens corium fabric, allows skin to get well state improves skin and is immunized
Power；2. graphene quantum dot can lift skin to plant with hamamelis extract and arnica extract science compounding
The absorption of nutritional ingredient, plays deep moisturizing, and compact skin, adjusts the effect of metabolism；3. graphene quantum dot can also rise
To cleaning skin, suppress the effect of pathogenic bacteria growing.
Specific embodiment
With reference to specific embodiment, the present invention is described in further detail.
Embodiment 1~5
A kind of 5 specific embodiments of facial mask of the present invention are listed in table 1.
Table 1
A kind of 5 specific comparative examples of facial mask of the present invention are listed in table 2.
Table 2
Evaluation test on probation
Preferably to prove that a kind of facial mask provided by the present invention has excellent effect, embodiment 1,2,3,4,5 is chosen
Further investigation on probation and evaluation test are carried out with reference examples 1,2,3,4,5.Embodiment is as follows：Choose 50 special aspirations
Person, age distribution is 18-58 Sui.The wherein people of male 20, the people of women 30.Evaluation test is carried out to embodiment, each sampling
Phase is one month, and it is facial drying, acne long, aging crowd to try out object.Table 3 is test index and result.
Table 3
Result shows：
For facial drying, acne long, aging crowd, the facial mask of long-term use graphene-containing quantum dot of the present invention has substantially
Improvement and alleviation effect.And embodiment 2 has the best effect for being obviously improved and alleviating, embodiment 2 is the present invention
Optimization formula.
The above, the only present invention preferably specific embodiment, but protection scope of the present invention is not limited thereto,
Any one skilled in the art in the technical scope of present disclosure, the change or replacement that can be readily occurred in,
Should all be included within the scope of the present invention.Therefore, protection scope of the present invention should be with the protection of claims
Scope is defined.
Claims (5)
1. a kind of facial mask, including following mass percent component：NMF：8-21%, graphene quantum dot：1-5%, North America gold
Thread prunus mume extract：0.1-5%, arnica extract：0.1-1%, thickener：0.1-3%, conditioner：0.1-0.5%.
2. a kind of facial mask according to claim 1, including following mass percent component：NMF：12-16%, graphite
Alkene quantum dot：2-4%, hamamelis extract：1-4%, arnica extract：0.3-0.8%, thickener：1-2%,
Conditioner：0.2-0.4%.
3. a kind of facial mask according to claim 1 and 2, it is characterised in that the NMF is PEG-8, sweet
One or more in oil, butanediol, Sodium Hyaluronate.
4. a kind of facial mask according to claim 1 and 2, it is characterised in that the thickener is Carbomer, xanthans, melon
One or more in your glue.
5. a kind of facial mask according to claim 1 and 2, it is characterised in that the conditioner is allantoin.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710098194.7A CN106821852A (en) | 2017-02-22 | 2017-02-22 | A kind of facial mask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710098194.7A CN106821852A (en) | 2017-02-22 | 2017-02-22 | A kind of facial mask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106821852A true CN106821852A (en) | 2017-06-13 |
Family
ID=59134019
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710098194.7A Withdrawn CN106821852A (en) | 2017-02-22 | 2017-02-22 | A kind of facial mask |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106821852A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107929108A (en) * | 2017-12-01 | 2018-04-20 | 浙江海洋大学 | A kind of preparation method of high moisturizing moisturizing seaweed mask |
| WO2019110460A1 (en) | 2017-12-05 | 2019-06-13 | Prodotti Gianni S.R.L. | Eye make-up compositions comprising graphene |
| CN114712294A (en) * | 2022-05-10 | 2022-07-08 | 广州雅南无纺布制品有限公司 | Graphene mask with magnetic therapy function and preparation method thereof |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105476934A (en) * | 2016-01-19 | 2016-04-13 | 广州市美姿贺化妆品有限公司 | Mask of which deionized water solvent is replaced with peony hydrosol and preparation method of mask |
| CN105616172A (en) * | 2016-01-19 | 2016-06-01 | 广州市美姿贺化妆品有限公司 | Pure mulberry silk facial mask and preparation method thereof |
-
2017
- 2017-02-22 CN CN201710098194.7A patent/CN106821852A/en not_active Withdrawn
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105476934A (en) * | 2016-01-19 | 2016-04-13 | 广州市美姿贺化妆品有限公司 | Mask of which deionized water solvent is replaced with peony hydrosol and preparation method of mask |
| CN105616172A (en) * | 2016-01-19 | 2016-06-01 | 广州市美姿贺化妆品有限公司 | Pure mulberry silk facial mask and preparation method thereof |
Non-Patent Citations (1)
| Title |
|---|
| 孙晓丹, 刘中群, 颜昊: "石墨烯量子点的制备及其生物应用", 《无机材料学报》 * |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107929108A (en) * | 2017-12-01 | 2018-04-20 | 浙江海洋大学 | A kind of preparation method of high moisturizing moisturizing seaweed mask |
| WO2019110460A1 (en) | 2017-12-05 | 2019-06-13 | Prodotti Gianni S.R.L. | Eye make-up compositions comprising graphene |
| CN114712294A (en) * | 2022-05-10 | 2022-07-08 | 广州雅南无纺布制品有限公司 | Graphene mask with magnetic therapy function and preparation method thereof |
| CN114712294B (en) * | 2022-05-10 | 2023-05-30 | 广州雅南无纺布制品有限公司 | Graphene mask with magnetic therapy function and preparation method thereof |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20170613 |