CN106807654B - Light shield cleaning device - Google Patents
Light shield cleaning device Download PDFInfo
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- CN106807654B CN106807654B CN201510872212.3A CN201510872212A CN106807654B CN 106807654 B CN106807654 B CN 106807654B CN 201510872212 A CN201510872212 A CN 201510872212A CN 106807654 B CN106807654 B CN 106807654B
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- cleaning
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- free cloth
- cloth strip
- wheel
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- 238000004140 cleaning Methods 0.000 title claims abstract description 138
- 239000004744 fabric Substances 0.000 claims abstract description 78
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 18
- 238000000034 method Methods 0.000 claims abstract description 14
- 230000001681 protective effect Effects 0.000 claims abstract 2
- 230000007246 mechanism Effects 0.000 claims description 56
- 239000007788 liquid Substances 0.000 claims description 31
- 239000000463 material Substances 0.000 claims description 31
- 238000005108 dry cleaning Methods 0.000 claims description 20
- 238000005507 spraying Methods 0.000 claims description 20
- 238000005096 rolling process Methods 0.000 claims description 19
- 238000004898 kneading Methods 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims description 7
- 238000006073 displacement reaction Methods 0.000 claims description 5
- 238000011084 recovery Methods 0.000 claims description 4
- 238000001125 extrusion Methods 0.000 claims description 3
- 239000000428 dust Substances 0.000 abstract description 8
- 238000012797 qualification Methods 0.000 abstract description 4
- 230000001464 adherent effect Effects 0.000 abstract 1
- 238000003825 pressing Methods 0.000 description 7
- 238000000206 photolithography Methods 0.000 description 6
- 230000007547 defect Effects 0.000 description 5
- 239000002245 particle Substances 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000005530 etching Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 238000004804 winding Methods 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 230000009969 flowable effect Effects 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 239000013618 particulate matter Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000002791 soaking Methods 0.000 description 1
Images
Classifications
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- B08B1/143—
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- B08B1/30—
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Cleaning In General (AREA)
Abstract
The invention relates to a light shield cleaning device, especially a light shield cleaning device for cleaning the lower surface of both sides of the protective film, it is made up of a wet-type cleaning module and a dry-type cleaning module, the wet-type, dry-type cleaning module has dustless cloth strips that can be rolled, for the way that can utilize the dustless cloth strip to wipe the surface of light shield directly, so, can remove the surface adherent tiny dust or atomize rapidly and effectively, can raise the efficiency and qualification rate of the subsequent process, moreover the invention can carry on two-stage cleaning, it can wipe the moisture after cleaning, but does not leave the water mark of cleaning or spot, help to promote the cleaning quality.
Description
Technical Field
The invention relates to a photomask cleaning technology, in particular to a photomask cleaning device capable of cleaning the surface of a photomask in a wiping mode, so that the surface of the photomask can be cleaned quickly and effectively, and the qualification rate of a semiconductor manufacturing process is improved.
Background
Accordingly, in semiconductor manufacturing, Photolithography (Photolithography) and Etching (Etching Process) are used to complete the patterning of the wafer surface, wherein a Mask (Mask) for Photolithography is indispensable. The mask is a transparent glass plate painted with specific patterns, which includes a Pattern area with patterns (Pattern) for transferring the patterns on the Pattern area to the photoresist on the wafer by using a light source, and then the patterns are formed on the surface of the wafer by etching process.
Therefore, one of the most important factors affecting the wafer yield is whether the photomask is contaminated, and if the photomask has fine dust particles, the contaminated photomask will have corresponding defects (defects) on the wafer when used in the semiconductor photolithography process, so as to keep the photomask clean, a Pellicle (Pellicle) is generally disposed on the photomask to prevent the fine dust particles from adhering to the photomask, and the Pellicle is supported by a frame and keeps a distance from the photomask, so that the fine dust particles falling on the photomask are collected on the Pellicle, and the photolithography process will not affect the original photolithography process due to the considerable imaging distortion of the Pellicle.
In the conventional method for cleaning the photomask, a cleaning process is performed on the surface of the photomask by a manual method. A cleaner firmly places the photomask on a frame, washes the surface of the photomask by a cleaning solution (such as acetone, ethanol, deionized water and the like), and brushes off the particulate matter on the surface of the photomask by a brush; then, the surface of the photomask is washed by the cleaning solution again, and the photomask is dried after repeating the cleaning steps for a plurality of times, so that impurities or residues on the surface of the photomask can be removed, and the cleanliness of the surface of the photomask is ensured.
However, the above-mentioned conventional method for cleaning the photo mask has a disadvantage that the cleaning personnel is likely to be affected by the chemical substance absorbed or directly contacted in the working environment where the cleaning personnel needs to be exposed to the cleaning solution for a long time when cleaning the photo mask. In order to solve the above problems, in recent years, various automated mask cleaning apparatuses have been developed, but they still require a large amount of cleaning solution made of organic solvent, and although the contact amount of personnel is reduced, they also have the problems of cleaning solution management and contamination, and the cleaning is mainly performed by rinsing, so that it is not easy to effectively clean the mask surface;
furthermore, since the adhesive used for the pellicle is an ester structure (RCOOR) x, such as a polymer structure of polyacrylate, when the mask contacts the cleaning solution of sulfuric acid and hydrogen peroxide solution, the RCOOR x will be hydrolyzed into a flowable but water insoluble colloidal substance (RCOOH) x, and the (RCOOH) x may cause defects on the mask pattern and mask scrapping, so that the conventional mask cleaning device cannot clean the surfaces on both sides of the pellicle, but the mask has various recognition and calibration patterns formed on the surfaces on both sides of the pellicle, and the problem of defects (Defect) still occurs when the mask is contaminated, so the conventional mask cleaning device has the same requirement for cleaning.
Accordingly, in view of the above-mentioned conventional drawbacks, it is desirable to provide a mask cleaning structure capable of effectively cleaning the surfaces of both sides of the pellicle of the mask, while protecting the personal safety of the cleaning personnel, maintaining the degree of mask cleaning, and rapidly and effectively shortening the cleaning time, so as to facilitate the use of the semiconductor factory and further improve the yield of the semiconductor process.
Disclosure of Invention
Accordingly, it is a primary objective of the present invention to provide a mask cleaning apparatus for cleaning the pellicle membrane of a photomask by wiping, so as to clean the pellicle membrane quickly and effectively, thereby improving the efficiency and yield of the subsequent processes.
Another objective of the present invention is to provide a mask cleaning device with wet cleaning and dry cleaning, which can effectively clean particles or atomized stains attached on the surface of the mask by performing two-stage cleaning, and can prevent the residual cleaning water marks or stains after cleaning, thereby improving the cleaning efficiency.
Moreover, another objective of the present invention is to provide a mask cleaning device capable of directly wiping off particles and stains on the surface of the mask, which does not require a large amount of organic cleaning solution, does not generate a large amount of waste liquid to be treated, and can maintain environmental safety and reduce treatment cost.
Therefore, the present invention mainly achieves the above-mentioned objects and effects by the following technical means:
a mask cleaning device, comprising:
a body;
the wet type cleaning module is arranged in the machine body, and the dry type cleaning module is arranged in the machine body behind the wet type cleaning module;
the wet and dry cleaning modules are respectively provided with at least one wiping mechanism, the at least one wiping mechanism is provided with a vertical plate vertically arranged on the machine body, the vertical plate is respectively provided with a material placing roller and a material receiving roller for synchronously and automatically receiving and placing two ends of a dust-free cloth strip for rolling, a plurality of turning wheels are arranged between the material placing roller and the material receiving roller of the vertical plate for the dust-free cloth strip to pass through the upper edge of the wiping mechanism in the moving process, and an abutting wheel with the top edge higher than the two sides is arranged between the two turning wheels above the vertical plate for the dust-free cloth strip to form a higher wiping part;
the wiping mechanism of the wet-type cleaning module is provided with a liquid spraying mechanism for spraying cleaning liquid at the feed end of the dust-free cloth strip, which is opposite to the abutting wheel, so that the cleaning liquid can be selectively sprayed on the dust-free cloth strip;
therefore, the mask can be directly wiped relative to the wet cleaning module and the dry cleaning module in sequence, and the mask cleaning device capable of being rapidly and effectively cleaned is formed.
The photomask cleaning device, wherein: the wet and dry cleaning modules have two opposite wiping mechanisms for cleaning opposite surfaces below two sides of the pellicle respectively.
The photomask cleaning device, wherein: the material placing roller and the material receiving roller of the wiping mechanism are respectively provided with a first driving piece and a second driving piece on the vertical plate so as to be used for material placing and receiving of the material placing roller and the material receiving roller which are synchronously and positively reversed.
The photomask cleaning device, wherein: the vertical plate of the wiping mechanism is provided with a first supporting wheel group at the discharge end of the material placing roller and a second supporting wheel group at the feeding end of the material receiving roller, so that the dust-free cloth strips can be kept flat and smooth during material placing and receiving.
The photomask cleaning device, wherein: the rolling and rubbing wheel set is arranged at the moving rear part of the opposite rolling and rubbing wheel set, which is adjacent to the upper edge of the vertical plate, the rolling and rubbing wheel set is provided with a roller with a third driving piece for driving dust-free cloth strips, one side of the roller is provided with a squeezing wheel capable of selectively changing pressure for leveling the passing dust-free cloth strips, and the rolling and rubbing wheel set of the wet type cleaning module can further squeeze the dust-free cloth strips containing moisture, so that the moisture on the dust-free cloth strips can be uniformly dispersed and redundant moisture can be squeezed out.
The photomask cleaning device, wherein: the pasting and supporting wheel of the wiping mechanism is arranged on a jacking group, the jacking group is provided with a first telescopic cylinder group on a vertical plate, and the first telescopic cylinder group can drive a wheel seat for setting the pasting and supporting wheel to lift.
The photomask cleaning device, wherein: this wiping mechanism is equipped with a nip location group in the both sides branch that the riser corresponds to paste to the wheel, this nip location group is equipped with a locating plate below corresponding dustless cloth, be formed with a corresponding dustless cloth width on this locating plate, and the degree of depth is less than the constant head tank of dustless cloth thickness, nip location group is equipped with a clamp plate by the flexible jar group drive of second in corresponding dustless cloth top, make dustless cloth can by effective fixed position when cleaning, and can be along the displacement of fixed path when dustless cloth is pulled, avoid because of rocking the displacement.
The photomask cleaning device, wherein: the liquid spraying mechanism of the wiping mechanism of the wet cleaning module is provided with a water spraying pipe which can selectively spray cleaning liquid through the dust-free cloth strip, and the liquid spraying mechanism is provided with a recovery group below the dust-free cloth strip for recovering redundant cleaning liquid extruded by the rolling and kneading wheel group.
Therefore, through the specific realization of the technical means, the photomask cleaning device can rapidly and effectively remove the micro dust or atomization attached to the surface by directly wiping the surface of the photomask by using the dust-free cloth strip of the wet and dry cleaning module, can improve the efficiency and the qualification rate of the subsequent processing, can carry out two-stage cleaning, can wipe out water after cleaning, does not cause residual cleaning water marks or stains, and is beneficial to improving the cleaning quality;
and because the wet type cleaning module containing the soaking cleaning solution adopts a direct wiping mode to remove the tiny dust and the stains, a large amount of organic cleaning solution is not needed, so that a large amount of waste liquid to be treated is not generated, the effects of maintaining the environmental safety and reducing the treatment cost are achieved, the practicability is greatly improved, the additional value is increased, and the economic benefit is improved.
In order to enable the applicant to further appreciate the structure, features and other objects of the present invention, preferred embodiments of the present invention are described below in detail in connection with the accompanying drawings so as to enable one skilled in the art to practice the invention.
Drawings
FIG. 1 is a schematic top plan view of an apparatus for cleaning a reticle using the apparatus of the present invention.
FIG. 2 is a schematic perspective view of the mask cleaning device of the present invention, illustrating the relative relationship of the components in a top view.
FIG. 3 is a schematic perspective view of a wiping mechanism of the mask cleaning device of the present invention, illustrating the aspects and relative relationships of the components.
FIG. 4 is a schematic side plan view of a wiping mechanism in the mask cleaning device of the present invention.
FIG. 5 is an exploded view of a part of the wiping mechanism of the mask cleaning device according to the present invention.
FIG. 6 is a schematic end view of the wiping mechanism of the mask cleaning device according to the present invention.
Description of reference numerals: 1, a machine body; 10 a first linear slide; 15 a second linear slide; an 18 seat plate; 2 an optical detection device; 20 a photomask placing stage; 30 light shield clamping modules; 35 a gripping mechanism; a 5A wet cleaning module; 5B a dry cleaning module; 50 a wiping mechanism; a 51 vertical plate; 52, placing a material rolling wheel; 520 a first driver; 53 a first tension roller set; 541 a turning wheel; 542 a turning wheel; 543 turning wheel; 544 a breakover wheel; 55 a second supporting wheel group; 56, receiving a material winding wheel; 560 a second driver; 57 rolling and kneading wheel group; 571 a roller; 572 a third driver; 573 extrusion wheel; 58 jacking groups; 581 a first telescopic cylinder group; 582 a wheel seat; 59 abutting against the wheel; 60 a liquid spraying mechanism; 61 a water spray pipe; 65 recovery group; 70, clamping and positioning; 71 a positioning plate; 710 positioning grooves; 72, pressing plates; 75 a second telescopic cylinder group; 80 dust-free cloth strips; a 90 mask; 95 protecting the film; 96 surface.
Detailed Description
The present invention is a reticle cleaning apparatus, and the accompanying drawings illustrate embodiments of the present invention and its components, all references to front and back, left and right, top and bottom, upper and lower, and horizontal and vertical are only used for convenience of description, and do not limit the invention nor its components to any position or spatial orientation. The dimensions specified in the drawings and description may vary depending on the design and requirements of particular embodiments of the invention without departing from the scope of the invention.
The present invention relates to a mask cleaning device for cleaning the surface of a mask by wiping, and more particularly to a mask cleaning device for cleaning the surfaces of both sides of a pellicle of a mask, as shown in fig. 1, which can be mounted on a device body 1, wherein the device body 1 comprises an optical inspection device 2 arranged side by side with the mask cleaning device of the present invention, for cleaning a mask 90 and comparing the inspection before and after the cleaning, wherein the device body 1 has a first linear slide rail 10 for slidably mounting a mask placing stage 20, and the device body 1 has a second linear slide rail 15 on one side of the mask cleaning device of the present invention, for slidably mounting a mask clamping module 30 movable to the end of the optical inspection device 2, and the mask clamping module 30 has a clamping mechanism 35 (which can be selected from the clamping device of M465658 in our patent publication) for clamping the edge surface of the side of the mask 90, The mask cleaning device of the present invention is composed of a wet cleaning module 5A and a dry cleaning module 5B separately disposed on a corresponding seat plate 18 of the machine body 1, and the mask clamping module 30 is used to clamp the mask 90 to sequentially wipe and clean and remove water marks and stains relative to the wet cleaning module 5A and the dry cleaning module 5B;
as for the detailed structure of the wet and dry cleaning modules 5A, 5B, as shown in fig. 2, 3 and 4, each of the wet and dry cleaning modules has two wiping mechanisms 50 fixed to the seat plate 18 of the machine body 1, and the two wiping mechanisms 50 have the same structure for cleaning the opposite surfaces 96 (as shown in fig. 5 and 6) under the two sides of the pellicle 95 of the mask 90;
furthermore, the wiping mechanisms 50 are provided with a vertical plate 51 vertically arranged on the seat plate 18, and the vertical plate 51 is provided with a material-placing roller 52 and a material-receiving roller 56 on the opposite inner surface for winding up the two ends of the dust-free cloth strip 80, the material-placing roller 52 and the material-receiving roller 56 are respectively provided with a first driving member 520 and a second driving member 560 on the outer side of the vertical plate 51, the vertical plate 51 is provided with a first supporting wheel group 53 and a second supporting wheel group 55 at the discharging end of the material placing roller 52 and the feeding end of the material receiving roller 56 respectively, so that the dust-free cloth strip 80 can be kept flat and smooth during material placing and receiving, and the vertical plate 51 is provided with a plurality of turning wheels 541-544 between the material placing roller 52 and the material receiving roller 56, so that the dust-free cloth strip 80 can stably pass through the upper edge of the wiping mechanism 50 during the moving process;
furthermore, a rolling and kneading wheel set 57 is provided between two turning wheels 542, 543 adjacent to the upper edge of the vertical plate 51 of the wiping mechanism 50, the rolling and kneading wheel set 57 has a roller 571 with a third driving member 572 for driving the dust-free cloth strip 80, and one side of the roller 571 is provided with a pressing wheel 573 capable of selectively changing pressure for leveling the passed dust-free cloth strip 80, and when the dust-free cloth strip 80 contains moisture, the pressing wheel 573 can further press to make the moisture on the dust-free cloth strip 80 disperse uniformly and extrude the excess moisture for controlling the moisture content of the dust-free cloth strip 80, and the vertical plate 51 is provided with an abutting wheel 59 by using the jacking group 58 after the dust-free cloth strip 80 moves relative to the rolling and kneading wheel set 57 for selectively lifting the dust-free cloth strip 80 passing the abutting wheel 59 before and after wiping (as shown in fig. 5), wherein the jacking group 58 is provided with a first telescopic cylinder 581 arranged on the vertical plate 51 for driving the wheel seat 582 for abutting the abutting wheel 59 to lift, the dust-free cloth strip 80 is driven to ascend and descend by the abutting wheel 59, so that the dust-free cloth strip forms a higher wiping part;
in addition, a liquid spraying mechanism 60 for spraying cleaning liquid is arranged on the vertical plate 51 of the wiping mechanism 50 in front of the movement of the dust-free cloth strip 80 relative to the rolling and kneading wheel set 57 (wherein the wiping mechanism 50 of the dry cleaning module 5B can be arranged without, or can be arranged without starting the spraying function), the liquid spraying mechanism 60 is provided with a water spraying pipe 61 for selectively spraying the cleaning liquid through the dust-free cloth strip 80, and the liquid spraying mechanism 60 is further provided with a recovery set 65 below the rolling and kneading wheel set 57 for recovering the redundant cleaning liquid extruded by the rolling and kneading wheel set 57;
furthermore, as shown in fig. 5, the wiping mechanisms 50 further include a clamping and positioning set 70 respectively disposed on two sides of the vertical plate 51 corresponding to the abutting wheel 59, the clamping and positioning set 70 is disposed below the dust-free cloth strip 80, a positioning plate 71 is formed on the positioning plate 71, a positioning groove 710 corresponding to the width of the dust-free cloth strip 80 and having a depth slightly smaller than the thickness of the dust-free cloth strip 80 is formed on the positioning plate 71, and a pressing plate 72 driven by a second telescopic cylinder set 75 is disposed above the dust-free cloth strip 80 corresponding to the clamping and positioning set 70, so that the pressing plate 72 can selectively clamp the dust-free cloth strip 80 in the positioning plate 71 of the clamping and positioning set 70, so that the dust-free cloth strip 80 can be effectively fixed in position during wiping, and can be displaced along a fixed path when the dust-free cloth strip 80 is pulled, thereby avoiding displacement caused by shaking, and affecting the accuracy of the wiping position;
thus, the clamping mechanism 35 of the mask clamping module 30 can be used to clamp the mask 90, and the lower surfaces 96 on both sides of the mask 90 can be sequentially wiped and cleaned and remove water marks and stains with respect to the clean cloth strips 80 containing the cleaning liquid in the wet cleaning module 5A and the dry clean cloth strips 80 in the dry cleaning module 5B, thereby forming a mask cleaning device capable of rapidly and effectively cleaning.
When the invention is used to clean the lower surfaces 96 of the two sides of the pellicle 95 of the photomask 90, as shown in fig. 1 and 4, the first, second and third driving members 520, 560 and 572 in the wiping mechanisms 50 of the wet and dry cleaning modules 5A and 5B are driven synchronously to roll the dust-free cloth strip 80 and make the unused portion correspondingly abut against the wheel 59, at this time, the pressing plate 72 of the clamping and positioning set 70 is opened relative to the positioning plate 71 to make the dust-free cloth strip 80 stably move along the positioning groove 710 of the positioning plate 71 without slippage and dislocation due to shaking, and meanwhile, the spray pipe 61 of the spray mechanism 60 of the wet cleaning module 5A can spray cleaning liquid to the dust-free cloth strip 80, and when the dust-free cloth strip 80 passes through the corresponding roller set 57, the distribution of the cleaning liquid on the cloth strip 80 can be more uniform and the water content can be more in accordance with the wiping requirements through extrusion, the phenomenon that the water content is too low to be effectively removed or the phenomenon that the water content is too high to generate water marks during subsequent wiping can not occur;
then, after the clamping mechanism 35 of the mask clamping module 30 clamps the mask 90, the cleaning mechanism is sequentially moved forward to the wet cleaning module 5A and the dry cleaning module 5B (as shown in fig. 1), as further shown in fig. 4, 5 and 6, the pressing plates 72 of the clamping and positioning sets 70 on the two sides of the abutting wheels 59 of each wiping mechanism 50 are pressed down relative to the positioning plate 71, so that the dust-free cloth strips 80 are positioned at the two ends of the abutting wheels 59 and clamped and fixed, and then the wiping mechanisms 50 are lifted up by the abutting wheels 59 of the lifting sets 58 (as shown in fig. 5) to push the corresponding dust-free cloth strips 80 to partially protrude upwards;
in this way, when the mask 90 passes through the dust-free cloth strip 80 above the abutting wheels 59 of the two wiping mechanisms 50 of the wet cleaning module 5A, the dust-free cloth strip 80 containing the cleaning liquid can directly wipe the lower surfaces 96 (as shown in fig. 6) on both sides of the pellicle 95 of the mask 90, so as to directly remove the micro dust, the fog, the dirt, and the like attached to these surfaces 96. When the mask 90 passes through the dust-free cloth strips 80 above the abutting wheels 59 of the two wiping mechanisms 50 of the dry cleaning module 5B, the dust-free cloth strips 80 containing the cleaning liquid can be used to directly wipe the lower surfaces 96 (as shown in fig. 6) on both sides of the protection film 95 of the mask 90, so that the cleaning liquid on the surfaces 96 can be directly wiped, the surfaces 96 of the mask 90 are prevented from remaining water marks or stains, and the cleaning effect is greatly improved.
The wiping mechanism 50 of the wet and dry cleaning modules 5A and 5B of the present invention can be provided with a dust-free cloth 80 having a large width, which can also be used for cleaning the upper glass surface of the mask 90.
Through the above description, the present invention utilizes the dust-free cloth strip 80 of the wet and dry cleaning modules 5A and 5B to directly wipe the surface 96 of the mask 90, so as to rapidly and effectively remove the attached micro-dust or fog from the surface 96, and effectively clean the surface, thereby improving the efficiency and qualification rate of the subsequent process.
The foregoing description is intended to be illustrative rather than limiting, and it will be appreciated by those skilled in the art that many modifications, variations or equivalents may be made without departing from the spirit and scope of the invention as defined in the appended claims.
Claims (6)
1. A mask cleaning device, comprising:
a body;
the wet type cleaning module is arranged in the machine body, and the dry type cleaning module is arranged in the machine body behind the wet type cleaning module;
the wet and dry cleaning modules are respectively provided with at least one wiping mechanism, the at least one wiping mechanism is provided with a vertical plate vertically arranged on the machine body, the vertical plate is respectively provided with a material placing roller and a material receiving roller for synchronously and automatically receiving and placing two ends of a dust-free cloth strip for rolling, a plurality of turning wheels are arranged between the material placing roller and the material receiving roller of the vertical plate for the dust-free cloth strip to pass through the upper edge of the wiping mechanism in the moving process, and an abutting wheel with the top edge higher than the two sides is arranged between the two turning wheels above the vertical plate for the dust-free cloth strip to form a higher wiping part;
the wiping mechanism of the wet-type cleaning module is provided with a liquid spraying mechanism for spraying cleaning liquid at the feed end of the dust-free cloth strip, which is opposite to the abutting wheel, so that the cleaning liquid can be selectively sprayed on the dust-free cloth strip;
therefore, the photomask can be directly wiped relative to the wet cleaning module and the dry cleaning module in sequence, so as to form a photomask cleaning device capable of being rapidly and effectively cleaned;
wherein, the wet and dry cleaning modules are respectively provided with two opposite wiping mechanisms for respectively cleaning opposite surfaces below two sides of the photomask protective film;
the jacking group is provided with a first telescopic cylinder group on the vertical plate, and the first telescopic cylinder group can drive a wheel seat for arranging the jacking wheel to lift;
wherein, this wiping mechanism is equipped with a nip press location group in the both sides branch that the riser corresponds to paste to the wheel, this nip press location group is equipped with a locating plate below corresponding dustless cloth, be formed with a constant head tank that corresponds dustless cloth width, and the degree of depth is less than dustless cloth thickness on this locating plate, nip press location group is equipped with a clamp plate by the flexible jar group drive of second in corresponding dustless cloth top, make dustless cloth can by effective fixed position when cleaning, and can be along fixed path displacement when dustless cloth is pulled, avoid because of rocking the displacement.
2. The reticle cleaning device of claim 1, wherein: the material placing roller and the material receiving roller of the wiping mechanism are respectively provided with a first driving piece and a second driving piece on the vertical plate so as to be used for material placing and receiving of the material placing roller and the material receiving roller which are synchronously and positively reversed.
3. The reticle cleaning device of claim 1, wherein: the vertical plate of the wiping mechanism is provided with a first supporting wheel group at the discharge end of the material placing roller and a second supporting wheel group at the feeding end of the material receiving roller, so that the dust-free cloth strips can be kept flat and smooth during material placing and receiving.
4. The reticle cleaning device of claim 1, wherein: the rolling and rubbing wheel set is arranged in the moving front of the opposite sticking and supporting wheel of the dust-free cloth strip on the upper edge of the vertical plate, the rolling and rubbing wheel set is provided with a roller with a third driving piece for driving the dust-free cloth strip, one side of the roller is provided with an extrusion wheel capable of selectively changing pressure for leveling the passing dust-free cloth strip, and the rolling and rubbing wheel set of the wet cleaning module can further extrude the dust-free cloth strip containing moisture, so that the moisture on the dust-free cloth strip can be uniformly dispersed and redundant moisture can be extruded.
5. The reticle cleaning device of claim 4, wherein: the liquid spraying mechanism of the wiping mechanism of the wet cleaning module is provided with a water spraying pipe which can selectively spray cleaning liquid through the dust-free cloth strip, and the liquid spraying mechanism is provided with a recovery group below the dust-free cloth strip for recovering redundant cleaning liquid extruded by the rolling and kneading wheel group.
6. The reticle cleaning device of claim 1, wherein: the liquid spraying mechanism of the wiping mechanism of the wet cleaning module is provided with a water spraying pipe which can selectively spray cleaning liquid through the dust-free cloth strip.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510872212.3A CN106807654B (en) | 2015-12-02 | 2015-12-02 | Light shield cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510872212.3A CN106807654B (en) | 2015-12-02 | 2015-12-02 | Light shield cleaning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN106807654A CN106807654A (en) | 2017-06-09 |
| CN106807654B true CN106807654B (en) | 2020-06-05 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510872212.3A Active CN106807654B (en) | 2015-12-02 | 2015-12-02 | Light shield cleaning device |
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| CN107999455B (en) * | 2017-12-29 | 2023-12-12 | 深圳市利和兴股份有限公司 | Automatic screen wiping mechanism |
| CN110153057A (en) * | 2018-02-14 | 2019-08-23 | 特铨股份有限公司 | Substrate cleaning apparatus and substrate-cleaning method |
| US10871722B2 (en) | 2018-07-16 | 2020-12-22 | Taiwan Semiconductor Manufacturing Co., Ltd. | Photomask purging system and method |
| CN111017606A (en) * | 2019-12-18 | 2020-04-17 | 苏州和福汽车饰件有限公司 | Dust removal type winding machine for composite leather and working method |
| CN112707219A (en) * | 2020-12-25 | 2021-04-27 | 江苏宏芯亿泰智能装备有限公司 | Cleaning device and control method thereof |
| CN115400991B (en) * | 2022-08-24 | 2023-06-02 | 金陵科技学院 | Cleaning device for stress test |
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| US5078162A (en) * | 1990-08-21 | 1992-01-07 | Teledyne Industries, Inc. | Cleaning apparatus for tubes |
| JP3580056B2 (en) * | 1996-11-27 | 2004-10-20 | 松下電器産業株式会社 | Cream solder screen printing equipment |
| JP2003291554A (en) * | 2002-03-29 | 2003-10-15 | Sony Corp | Screen mask and method for cleaning the same screen mask |
| JP2004034449A (en) * | 2002-07-02 | 2004-02-05 | Think Laboratory Co Ltd | Inkjet printer apparatus for plate making |
| CN101364041A (en) * | 2007-08-09 | 2009-02-11 | 廖莉雯 | Method and equipment for wiping and cleaning light shield |
| KR20110124080A (en) * | 2010-05-10 | 2011-11-16 | 동우 화인켐 주식회사 | Film surface cleaning device |
| JP2015531890A (en) * | 2012-08-31 | 2015-11-05 | エーエスエムエル ネザーランズ ビー．ブイ． | Reticle cleaning using sticky surfaces |
| US9857680B2 (en) * | 2014-01-14 | 2018-01-02 | Taiwan Semiconductor Manufacturing Company, Ltd. | Cleaning module, cleaning apparatus and method of cleaning photomask |
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