CN106773525A - Mask plate, alignment method, display panel, display device and its to cassette method - Google Patents
Mask plate, alignment method, display panel, display device and its to cassette method Download PDFInfo
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- CN106773525A CN106773525A CN201710116532.5A CN201710116532A CN106773525A CN 106773525 A CN106773525 A CN 106773525A CN 201710116532 A CN201710116532 A CN 201710116532A CN 106773525 A CN106773525 A CN 106773525A
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- 238000000034 method Methods 0.000 title claims abstract description 47
- 239000000758 substrate Substances 0.000 claims abstract description 34
- 238000004519 manufacturing process Methods 0.000 claims description 13
- 239000010408 film Substances 0.000 description 43
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/42—Alignment or registration features, e.g. alignment marks on the mask substrates
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Liquid Crystal (AREA)
Abstract
The invention discloses a kind of mask plate, alignment method, display panel, display device and its to cassette method, the mask plate includes：Substrate, and the contraposition region on substrate；Wherein, the first alignment mark and contraposition scale are provided with contraposition region；The figure of the second alignment mark in the figure of the first alignment mark and the film layer that will be aligned matches；Contraposition scale is by the first alignment mark region corresponding with the second alignment mark.Mask plate provided in an embodiment of the present invention, by setting contraposition scale in contraposition region, and the contraposition scale is by the first alignment mark region corresponding with the second alignment mark, so during contraposition, the contraposition data between the first alignment mark and the second alignment mark can accurately be read, avoid due to alignment mark blur margin Chu, cause contraposition data inaccurate, the situation for causing contraposition to fail.
Description
Technical Field
The invention relates to the technical field of display, in particular to a mask plate, an alignment method, a display panel, a display device and a box alignment method thereof.
Background
Thin Film Transistor Liquid Crystal displays (TFT-LCDs) are currently common flat panel displays, and are widely researched and applied due to their advantages of low voltage, low power consumption, suitability for circuit integration, lightness, convenience, and the like. In the manufacturing process of the array substrate, the alignment precision between different film layers is a key parameter for process control, and whether the alignment precision meets the requirement directly determines the quality of the picture displayed by the display.
The test method of the alignment mark in the prior art is as follows: acquiring the patterns of the alignment marks of the two film layers, capturing boundary signals of the alignment mark patterns through test equipment, calculating according to the boundary signals to obtain alignment data, and adjusting the positions of the film layers according to the alignment data. However, if the edge of the pattern of the alignment mark is unclear, a boundary signal captured by the testing equipment is prone to error, so that misdetection is prone to be caused, and alignment data does not reach the standard under the condition that actual alignment is successful, so that the phenomenon that control data cannot reflect the real condition occurs, retesting or manual testing needs to be returned, and manpower and material resources are wasted.
Therefore, it is easier and more accurate to obtain the alignment data.
Disclosure of Invention
The embodiment of the invention provides a mask plate, an alignment method, a display panel, a display device and a box alignment method thereof, which are used for solving the problem that alignment data is easy to misdetect due to unclear alignment mark pattern edges in the prior art.
An embodiment of the present invention provides a mask plate, including: the alignment device comprises a substrate and an alignment area positioned on the substrate; wherein,
a first alignment mark and an alignment scale are arranged in the alignment area;
the pattern of the first alignment mark is matched with the pattern of a second alignment mark on the film layer to be aligned;
the alignment scale passes through the area corresponding to the first alignment mark and the second alignment mark.
In a possible implementation manner, in the mask blank provided in the embodiment of the present invention, a size of the first alignment mark is larger than a size of the second alignment mark;
the alignment scale includes: a horizontal scale and a vertical scale located inside the pattern of the first alignment marks.
In a possible implementation manner, in the mask plate provided by the embodiment of the present invention, distances between the horizontal scale and the geometric center of the first alignment mark and the vertical scale are within a preset range.
In a possible implementation manner, in the mask blank provided in the embodiment of the present invention, a size of the first alignment mark is smaller than a size of the second alignment mark;
the alignment scale includes: a horizontal scale and a vertical scale passing through the pattern of the first alignment mark or located at an edge of the pattern of the first alignment mark;
the length of the horizontal scale is greater than the length of the second alignment mark in the horizontal direction, and the length of the vertical scale is greater than the length of the second alignment mark in the vertical direction.
In a possible implementation manner, in the mask plate provided by the embodiment of the present invention, a width of the minimum scale of the alignment scale is in a range from 3 μm to 7 μm.
The embodiment of the invention also provides an alignment method, which comprises the following steps:
manufacturing a first film layer on a substrate by adopting the mask plate;
when a second film layer above the first film layer is manufactured, acquiring alignment data according to an alignment scale on the first film layer;
and moving and manufacturing a mask plate of the second film layer according to the alignment data.
The embodiment of the invention also provides another alignment method, which comprises the following steps:
manufacturing a first film layer on a substrate;
manufacturing a second film layer on the first film layer by adopting the mask plate, and obtaining alignment data according to an alignment scale on the mask plate;
and moving the mask plate according to the alignment data.
An embodiment of the present invention further provides a display panel, including: the device comprises a substrate base plate and an alignment area positioned on the substrate base plate; wherein,
a first alignment mark and an alignment scale are arranged in the alignment area;
the pattern of the first alignment mark is matched with the pattern of a second alignment mark on the opposite substrate to be aligned;
the alignment scale passes through the area corresponding to the first alignment mark and the second alignment mark.
The embodiment of the invention also provides a display device which comprises the display panel.
The embodiment of the invention also provides a box aligning method of the display device, which comprises the following steps:
in the box aligning process, determining alignment data according to an alignment scale on a display panel;
and moving the display panel and/or the opposite substrate of the display panel according to the alignment data.
The invention has the following beneficial effects:
the embodiment of the invention provides a mask plate, an alignment method, a display panel, a display device and a box alignment method thereof, wherein the mask plate comprises the following components: the alignment device comprises a substrate and an alignment area positioned on the substrate; wherein, a first alignment mark and an alignment scale are arranged in the alignment area; the pattern of the first alignment mark is matched with the pattern of a second alignment mark on the film layer to be aligned; the alignment scale passes through the area corresponding to the first alignment mark and the second alignment mark. According to the mask plate provided by the embodiment of the invention, the alignment scale is arranged in the alignment area and passes through the area corresponding to the first alignment mark and the second alignment mark, so that alignment data between the first alignment mark and the second alignment mark can be accurately read in the alignment process, and the condition that the alignment data is inaccurate and the alignment fails due to unclear edges of the alignment marks is avoided.
Drawings
Fig. 1 is one of schematic structural diagrams of a mask blank according to an embodiment of the present invention;
fig. 2 is a second schematic structural diagram of a mask blank according to an embodiment of the present invention;
FIG. 3 is a flowchart illustrating an alignment method according to an embodiment of the present invention;
FIG. 4 is a second flowchart of an alignment method according to the embodiment of the present invention;
FIG. 5 is a flow chart of a method of aligning a cartridge according to an embodiment of the present invention;
wherein 11 denotes a registration area; 12 denotes a first alignment mark; 13 denotes a second alignment mark; 14 denotes an alignment scale; 141 a horizontal scale; and 142, a vertical scale.
Detailed Description
Aiming at the problem that misdetection is easy to occur to alignment data due to unclear alignment mark pattern edges in the prior art, the embodiment of the invention provides a mask plate, an alignment method, a display panel, a display device and a box alignment method thereof.
Specific embodiments of a mask blank, an alignment method, a display panel, a display device, and a box alignment method according to embodiments of the present invention will be described in detail below with reference to the accompanying drawings. The sizes and shapes of the structures in the drawings are not to be considered true scale, but are merely illustrative of the present invention.
An embodiment of the present invention provides a mask plate, as shown in fig. 1, including: a substrate, and a registration area 11 located on the substrate; wherein,
a first alignment mark 12 and an alignment scale 14 are arranged in the alignment area 11;
the pattern of the first alignment mark 12 is matched with the pattern of the second alignment mark 13 on the film layer to be aligned;
the alignment scale 14 passes through the region where the first alignment mark 12 corresponds to the second alignment mark 13.
According to the mask plate provided by the embodiment of the invention, the alignment scale 14 is arranged in the alignment area 11, and the alignment scale 14 passes through the area corresponding to the first alignment mark 12 and the second alignment mark 13, so that alignment data between the first alignment mark 12 and the second alignment mark 13 can be accurately read in the alignment process, and the condition that the alignment data is inaccurate and the alignment fails due to unclear alignment mark edge is avoided.
Referring to fig. 1, the substrate pattern is omitted to clearly illustrate the pattern in the alignment area 11, and in a specific implementation, the alignment area 11 may be disposed in a non-display area of the substrate or at a position corresponding to a black matrix so as not to affect a display screen of a manufactured display device. The dashed boxes in the figure represent the second alignment marks 13, the second alignment marks 13 are alignment marks on the film layer to be aligned with the first alignment marks 12, and the three second alignment marks 13 in fig. 1 may be alignment marks of the same film layer or alignment marks of different film layers. The matching of the first alignment mark 12 and the second alignment mark 13 means that the patterns of the first alignment mark 12 and the second alignment mark 13 are generally the same in shape and have the same ratio of the respective side lengths, that is, the pattern of the second alignment mark 13 is a pattern obtained by reducing or expanding the pattern of the first alignment mark 12 by a certain factor, for example, the first alignment mark 12 is square and the side length is 100 μm, the second alignment mark 13 should also be square, the side length of the second alignment mark 13 can be 50 μm, 60 μm or 70 μm, and in practical applications, the side length of the first alignment mark 12 can be between 60 μm and 140 μm, preferably 100 μm.
In fig. 1, it is illustrated that the alignment area 11 includes three first alignment marks 12, in actual application, the number of the first alignment marks 12 may be determined according to the number of times of alignment in an actual process, for example, only one film layer is aligned with the mask plate in the process, only one first alignment mark 12 is needed, if four film layers are aligned with the mask plate in the process, four first alignment marks 12 may be set to respectively correspond to alignment of the four film layers, and certainly, several film layers may share the alignment marks, which is only illustrated by way of example, and the number of the first alignment marks 12 is not limited.
In practical implementation, the alignment scale 14 passes through the area where the first alignment mark 12 corresponds to the second alignment mark 13, so that the alignment scale 14 can ensure that the alignment data of the first alignment mark 12 and the second alignment mark 13 can be read. The area corresponding to the first alignment mark 12 and the second alignment mark 13 may refer to an overlapping area of the first alignment mark 12 and the second alignment mark 13 during the alignment process, or the size and the position of the overlapping area may be estimated according to the size of the first alignment mark 12 and the second alignment mark 13, so as to determine the position of the alignment scale 14.
The above-mentioned alignment data may refer to a distance that the second alignment mark 13 needs to move with respect to the first alignment mark 12, as shown in the first left figure in fig. 1, in the horizontal direction, the distance between the left edge of the second alignment mark 13 and the left edge of the first alignment mark 12 is a, the distance between the right edge of the second alignment mark 13 and the right edge of the first alignment mark 12 is b, in the vertical direction, the distance between the upper edge of the second alignment mark 13 and the upper edge of the first alignment mark 12 is c, the distance between the lower edge of the second alignment mark 13 and the lower edge of the first alignment mark 12 is d, the horizontal direction alignment data Dx is (a-b)/2, the vertical direction alignment data Dy is (c-d)/2, and it can be read from fig. 1 that Dx is (0.6-0.4)/2 is 0.1, Dy is (0.6-0.4)/2 is 0.1, that is, the second alignment mark 13 is only moved 0.1 to the left and 0.1 to the top to align, wherein the specific values of Dx and Dy are obtained by representing one "unit 1" by ten small scales in the figure and do not represent actual sizes.
Specifically, in the mask plate provided in the embodiment of the present invention, the setting of the alignment scale 14 may include at least the following two implementation manners:
the first method is as follows: referring also to fig. 1, the size of the first alignment mark 12 is larger than the size of the second alignment mark;
the alignment scale 14 includes: a horizontal scale 141 and a vertical scale 142 located inside the pattern of the first alignment mark 12.
Because the size of first counterpoint mark 12 is greater than the size of second counterpoint mark, only need set up counterpoint scale 14 in first scale inside just can obtain the counterpoint data like this, and divide into horizontal scale 141 and vertical scale 142 with counterpoint scale 14, be more favorable to reading respectively the horizontal and vertical orientation on the counterpoint data, thereby more convenient counterpoint, when concrete implementation, the length of horizontal scale 141 can be equal to or be a bit bigger than the length of first counterpoint mark 12 on the horizontal direction, the length of vertical scale 142 can be equal to or a bit bigger than the length of second counterpoint mark 13 on the vertical direction.
Further, the horizontal scale 141 and the vertical scale 142 are within a preset range from the geometric center of the first alignment mark 12.
The horizontal scale 141 and the vertical scale 142 are disposed near the geometric center of the first alignment mark 12, so that the second alignment mark 13 is easily overlapped with the alignment scale 14 during the process, thereby ensuring that the alignment mark can measure the second alignment scale 14. The horizontal scale 141 and the vertical scale 142 preferably pass through the geometric center of the first alignment mark 12.
The second method comprises the following steps: as shown in fig. 2, the size of the first alignment mark 12 is smaller than that of the second alignment mark;
the alignment scale 14 includes: a horizontal scale 141 and a vertical scale 142 passing through the pattern of the first alignment mark 12 or located at the edge of the pattern of the first alignment mark 12;
the length of the horizontal scale 141 is greater than the length of the second alignment mark 13 in the horizontal direction, and the length of the vertical scale 142 is greater than the length of the second alignment mark 13 in the vertical direction.
Referring to fig. 2, when the size of the first alignment mark 12 is smaller than that of the second alignment mark 13, in order to obtain alignment data, the size of the horizontal scale 141 and the vertical scale 142 is at least equal to that of the second alignment mark 13, but in an actual process, there is a certain deviation when the film layer is placed, so that it is preferable that the length of the horizontal scale 141 is greater than that of the second alignment mark 13 in the horizontal direction, the length of the vertical scale 142 is greater than that of the second alignment mark 13 in the vertical direction, and the alignment scale 14 may be disposed at a position passing through the first alignment mark 12, such as the first pattern in fig. 2, or at the edge of the first alignment mark 12, such as the middle pattern in fig. 2.
In practical applications, the width of the smallest scale of alignment scale 14 is in the range of 3 μm to 7 μm, preferably 5 μm, in order to ensure the quality of the display device.
Based on the same inventive concept, an embodiment of the present invention further provides an alignment method, as shown in fig. 3, including:
s201, manufacturing a first film layer on a substrate by adopting the mask plate;
s202, when a second film layer above the first film layer is manufactured, alignment data are obtained according to an alignment scale on the first film layer;
and S203, moving and manufacturing a mask plate of the second film layer according to the alignment data.
In step S201, the first film layer is fabricated on the substrate by using the mask plate, and the alignment mark in the first film layer includes the alignment scale, so that in step S202, when the second film layer is fabricated, alignment data can be obtained according to the alignment scale on the first film layer, and the mask plate of the second film layer can be moved according to the alignment data, so that the second film layer is aligned with the first film layer.
Based on the same inventive concept, an embodiment of the present invention further provides another alignment method, as shown in fig. 4, including:
s301, manufacturing a first film layer on a substrate;
s302, manufacturing a second film layer on the first film layer by adopting the mask plate, and obtaining alignment data according to an alignment scale on the mask plate;
and S303, moving the mask plate according to the alignment data.
In step S301, a first film layer is fabricated on a substrate, and the first film layer may use a common mask (i.e., a mask without an alignment scale) or the mask, and in step S302, the mask with the alignment scale is used when a second film layer is fabricated, so that alignment data can be read by the alignment scale, and the mask for fabricating the second film layer is moved according to the alignment data to align the second film layer with the first film layer.
Based on the same inventive concept, an embodiment of the present invention further provides a display panel, including: the alignment device comprises a substrate base plate and an alignment area positioned on the substrate base plate; wherein,
a first alignment mark and an alignment scale are arranged in the alignment area;
the pattern of the first alignment mark is matched with the pattern of a second alignment mark on the opposite substrate to be aligned;
the alignment scale passes through the area corresponding to the first alignment mark and the second alignment mark.
Similar to the mask plate, the arrangement of the alignment scale in the display panel provided in the embodiment of the present invention may also include at least the following two implementation manners:
the first method is as follows: the size of the first alignment mark is larger than that of the second alignment mark;
the alignment scale includes: a horizontal scale and a vertical scale positioned inside the pattern of the first alignment mark.
Preferably, the horizontal scale and the vertical scale are within a preset range of distance from the geometric center of the first alignment mark.
The second method comprises the following steps: the size of the first alignment mark is smaller than that of the second alignment mark;
the alignment scale includes: a horizontal scale and a vertical scale passing through the pattern of the first alignment mark or located at the edge of the pattern of the first alignment mark;
the length of the horizontal scale is larger than that of the second alignment mark in the horizontal direction, and the length of the vertical scale is larger than that of the second alignment mark in the vertical direction.
In practical applications, the width of the smallest scale of alignment scale 14 is in the range of 3 μm to 7 μm, preferably 5 μm, in order to ensure the quality of the display device.
Because the principle of the display panel for solving the problems is similar to that of the mask plate, and the characteristics of the alignment scale in the display panel are the same as those of the alignment scale in the mask plate, the implementation of the display panel can refer to the implementation of the mask plate, and repeated parts are not repeated.
Based on the same inventive concept, the embodiment of the invention also provides a display device, which comprises the display panel.
Since the principle of the display device to solve the problem is similar to that of the display panel, the display device can be implemented by the display panel, and repeated descriptions are omitted.
Based on the same inventive concept, an embodiment of the present invention further provides a box aligning method of the display device, as shown in fig. 5, including:
s401, in the box aligning process, determining alignment data according to an alignment scale on a display panel;
s402, moving the display panel and/or the opposite substrate of the display panel according to the alignment data.
Because the alignment scale is arranged in the alignment area of the display panel included in the display device, in the box aligning process, alignment data can be read according to the alignment scale on the display panel, and the opposite substrate of the display and/or display panel is moved according to the alignment data, so that the display device can be successfully aligned with the box.
According to the mask plate, the alignment method, the display panel, the display device and the box alignment method thereof provided by the embodiment of the invention, the alignment scale is arranged in the alignment area and passes through the area corresponding to the first alignment mark and the second alignment mark, so that alignment data between the first alignment mark and the second alignment mark can be accurately read in the alignment process, and the condition that the alignment fails due to inaccurate alignment data caused by unclear edges of the alignment marks is avoided.
It will be apparent to those skilled in the art that various changes and modifications may be made in the present invention without departing from the spirit and scope of the invention. Thus, if such modifications and variations of the present invention fall within the scope of the claims of the present invention and their equivalents, the present invention is also intended to include such modifications and variations.
Claims (10)
1. A mask blank, comprising: the alignment device comprises a substrate and an alignment area positioned on the substrate; wherein,
a first alignment mark and an alignment scale are arranged in the alignment area;
the pattern of the first alignment mark is matched with the pattern of a second alignment mark on the film layer to be aligned;
the alignment scale passes through the area corresponding to the first alignment mark and the second alignment mark.
2. The mask plate of claim 1, wherein the first alignment mark has a size larger than that of the second alignment mark;
the alignment scale includes: a horizontal scale and a vertical scale located inside the pattern of the first alignment marks.
3. The mask plate of claim 2, wherein the horizontal scale and the vertical scale are within a preset range of distance from a geometric center of the first alignment mark.
4. A mask blank according to claim 1. Wherein the size of the first alignment mark is smaller than the size of the second alignment mark;
the alignment scale includes: a horizontal scale and a vertical scale passing through the pattern of the first alignment mark or located at an edge of the pattern of the first alignment mark;
the length of the horizontal scale is greater than the length of the second alignment mark in the horizontal direction, and the length of the vertical scale is greater than the length of the second alignment mark in the vertical direction.
5. The mask plate according to any one of claims 1 to 4, wherein the width of the smallest scale of the alignment scale is in the range of 3 μm to 7 μm.
6. An alignment method, comprising:
manufacturing a first film layer on a substrate by using a mask plate according to any one of claims 1 to 5;
when a second film layer above the first film layer is manufactured, acquiring alignment data according to an alignment scale on the first film layer;
and moving and manufacturing a mask plate of the second film layer according to the alignment data.
7. An alignment method, comprising:
manufacturing a first film layer on a substrate;
manufacturing a second film layer on the first film layer by adopting a mask plate according to any one of claims 1 to 5, and obtaining alignment data according to an alignment scale on the mask plate;
and moving the mask plate according to the alignment data.
8. A display panel, comprising: the device comprises a substrate base plate and an alignment area positioned on the substrate base plate; wherein,
a first alignment mark and an alignment scale are arranged in the alignment area;
the pattern of the first alignment mark is matched with the pattern of a second alignment mark on the opposite substrate to be aligned;
the alignment scale passes through the area corresponding to the first alignment mark and the second alignment mark.
9. A display device characterized by comprising the display panel according to claim 8.
10. A method of aligning a display device according to claim 9, comprising:
in the box aligning process, determining alignment data according to an alignment scale on a display panel;
and moving the display panel and/or the opposite substrate of the display panel according to the alignment data.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710116532.5A CN106773525B (en) | 2017-03-01 | 2017-03-01 | Mask plate, alignment method, display panel, display device and alignment method thereof |
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| Application Number | Priority Date | Filing Date | Title |
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| CN201710116532.5A CN106773525B (en) | 2017-03-01 | 2017-03-01 | Mask plate, alignment method, display panel, display device and alignment method thereof |
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| CN106773525A true CN106773525A (en) | 2017-05-31 |
| CN106773525B CN106773525B (en) | 2020-06-16 |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN107329295A (en) * | 2017-08-25 | 2017-11-07 | 深圳市华星光电技术有限公司 | A kind of Kapton location measurement method and alignment mark |
| CN108776406A (en) * | 2018-05-29 | 2018-11-09 | 武汉华星光电技术有限公司 | A kind of manufacturing method for preparing substrate and colored filter substrate of colored filter |
| CN110147002A (en) * | 2019-04-28 | 2019-08-20 | 武汉华星光电技术有限公司 | Align feeler switch, liquid crystal display panel and contraposition method for assembling |
| CN110989217A (en) * | 2019-11-19 | 2020-04-10 | Tcl华星光电技术有限公司 | Substrate and method for monitoring boundary position of film layer on substrate |
| CN111665690A (en) * | 2019-03-08 | 2020-09-15 | 京东方科技集团股份有限公司 | Alignment mark, display substrate mother board and alignment method |
| WO2021007940A1 (en) * | 2019-07-18 | 2021-01-21 | 深圳市华星光电半导体显示技术有限公司 | Display panel and method for monitoring precision of printed circuit of display panel |
| WO2021102934A1 (en) * | 2019-11-29 | 2021-06-03 | 京东方科技集团股份有限公司 | Alignment mark, mask, and display substrate master |
| CN115274528A (en) * | 2022-09-22 | 2022-11-01 | 西北电子装备技术研究所(中国电子科技集团公司第二研究所) | Calibration glass sheet for flip chip bonding |
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