CN101354530A - Contraposition scale on mask and method for affirming shield part position using the same - Google Patents
Contraposition scale on mask and method for affirming shield part position using the same Download PDFInfo
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- CN101354530A CN101354530A CNA2008102135690A CN200810213569A CN101354530A CN 101354530 A CN101354530 A CN 101354530A CN A2008102135690 A CNA2008102135690 A CN A2008102135690A CN 200810213569 A CN200810213569 A CN 200810213569A CN 101354530 A CN101354530 A CN 101354530A
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Abstract
The invention provides an alignment scaleplate on a mask, and a position confirmation method of a shielding part using the alignment scaleplate, wherein, the alignment scaleplate on the mask is provided with a datum line and comprises a measuring part and a marking part, the measuring part is positioned at the first side of the datum line and composed of a plurality of first measuring units and a plurality of second measuring units, wherein, each first measuring unit is arranged adjacent to each second measuring unit, and the length of the first measuring unit is larger than that of the second measuring unit; while the marking part is positioned at the second side of the datum line and composed of a first marking unit and a plurality of second marking units, wherein, the first marking unit is arranged among the second marking units, and the length of the first marking unit is larger than that of the second marking unit. The invention also discloses the position confirmation method of the shielding part using the alignment scaleplate.
Description
Technical field
The invention relates to the contraposition scale on a kind of mask and use the shield part position confirmation method of contraposition scale.
Background technology
In existing display panels technology, on single motherboard 1, can design a plurality of technology blocks be arranged usually to be made as display base plate, as shown in Figure 1.But in the flow process of making these display base plates (especially exposure technology); for avoid make contiguous interfering with each other when treating technology block 11 (do not carry out exposure technology person as yet); or even destroy the block of technology 12 (having finished exposure technology person) that technology finishes; in known technology; usually can between mask (figure does not show) and motherboard 1, be provided with at least one shielding part in the exposure device; make motherboard 1 when target process block 11a is carried out exposure technology; can be by the relative position between shielding part and the motherboard 1; 11a exposes with the target process block, and shields the technology block (comprise other treat technology block 11 and technology block 12) of the protection of desire on the motherboard 1 effectively.
For instance, please refer to shown in Fig. 2 A to Fig. 2 C shielding part when it exposes in exposure device for known motherboard in regular turn and the relative position synoptic diagram between the motherboard.Wherein, shown in Fig. 2 A to Fig. 2 C, exposure device is provided with two corresponding shielding parts 22,24.At first, represent to put motherboard 1 in exposure device in the structure shown in Fig. 2 A, wherein have a plurality of blocks of technology 12, an a plurality of technology block 11 and target process block 11a for the treatment of on the motherboard 1, this moment is not owing to carry out exposure technology to target process block 11a as yet, so shielding part 22,24 moves yet.Continue, when desire is carried out exposure technology to the target process block 11a on the motherboard 1, then two shielding parts 22,24 move to the border of target process block 11a respectively, as shown in Fig. 2 B, be adjacent to the block of technology 12 treated around the technology block 11 with shielding and treat technology block 11, and after shielding part 22,24 arrived the location, 11a carried out exposure technology to this target process block.At last, after this target process block 11a finished exposure technology, then shielding part 22,24 was retracted into original position respectively, shown in Fig. 2 C.
But, in known technology, the running fix of shielding part be mostly in rough mechanical positioning mode to reach, for instance, may be by the shift position (or distance) of detent mechanism additional in the exposure device to confirm shielding part; What is more, in Bu Fen the known technology be the shift position (or distance) of confirming shielding part in the mode of range estimation.These modes are when technology block density is lower in the motherboard in the past, really can satisfy the requirement of fabrication error, but under the prerequisite that reduces cost, improves production capacity, motherboard must have higher technology block closeness, also so relatively make the scope of fabrication error dwindle thereupon, can't meet the requirement of fabrication error so so coarse shield part position is confirmed mode.
Therefore, how the contraposition scale on a kind of mask is provided and uses the shield part position confirmation method of contraposition scale, real one of the important topic that belongs to.
Summary of the invention
Purpose of the present invention is for providing the contraposition scale on a kind of mask and use the shield part position confirmation method of contraposition scale, and its design by the contraposition scale and collocation exposure technology are with the position of affirmation shielding part.
Purpose of the present invention is for providing the contraposition scale on a kind of mask and using the shield part position confirmation method of contraposition scale, and it utilizes the design of contraposition scale, to increase the precision of automatic affirmation shield part position.
For reaching above-mentioned purpose, the present invention discloses the contraposition scale on a kind of mask, its have a datum line and comprise a measurement section and a moment portion.The measuring point is in first side of datum line, and is made of a plurality of first measuring units and a plurality of second measuring unit; Wherein, each first measuring unit and the adjacent setting of each second measuring unit, and the length of first measuring unit is greater than the length of second measuring unit.Quarter, portion then was positioned at second side of datum line, and by one first quarter the unit and a plurality of second quarter the unit constituted; Wherein, first quarter the unit be arranged between the second quarter unit, and first quarter the unit length greater than second quarter the unit length.
For reaching above-mentioned purpose, the present invention discloses a kind of shield part position confirmation method of using the contraposition scale simultaneously and comprises following steps: at first, provide a substrate in an exposure device, wherein, this substrate has a plurality of blocks and adjacent one another are, and exposure device has one first shielding part and a secondary shielding spare and positioned opposite to each other; Continue, provide a mask in the substrate top, this mask has a contraposition scale, its have a datum line and comprise a measurement section and a moment portion, wherein, the measuring point is in first side of datum line, and is made of a plurality of first measuring units and a plurality of second measuring unit, each first measuring unit and the adjacent setting of each second measuring unit, and the length of first measuring unit is greater than the length of second measuring unit; Quarter, portion then was positioned at second side of datum line, and by one first quarter the unit and a plurality of second quarter the unit constituted, first quarter the unit be arranged between the second quarter unit, and first quarter the unit length greater than second quarter the unit length; Continue, move first shielding part and secondary shielding spare and make respectively and the overlapping of mask; Continue, substrate carried out first time exposure forming one first pattern in substrate, and first pattern comprise the datum line of boundary position, one first pattern of one first shielding part and one first pattern first quarter the unit; Continue, finish for the first time and return first shielding part and the secondary shielding spare after the exposure; Continuing, is benchmark with first pattern that is formed on the substrate, provides mask in the substrate top once more; Continue, move first shielding part and secondary shielding spare and make respectively and the overlapping of mask; Continue, substrate is carried out the exposure second time; Finish for the second time and return first shielding part and the secondary shielding spare after the exposure; Continue, the development substrate is to obtain a pattern; At last, the pattern that according to developing is to judge the alignment of first shielding part and secondary shielding spare.
From the above, shield part position confirmation method according to contraposition scale on the disclosed a kind of mask of the present invention and application contraposition scale, it can utilize the contraposition scale on the mask repeated exposure (mask is moved, rotates in collocation simultaneously), so make on the contraposition scale measurement section, quarter portion and shielding part on substrate, form a pattern jointly, use alignment for automatic or manual affirmation shielding part.With known art, the shield part position confirmation method of contraposition scale on a kind of mask provided by the invention and application contraposition scale, not only can meet the fabrication error requirement of high collection density substrate, more because final drawing is considerably clear and concrete, therefore can avoid erroneous judgement and cause the technology yields to reduce, and can be applied in simultaneously in robotization judgement and the artificial affirmation flow process of judging.
Description of drawings
Fig. 1 is known to make the motherboard structure synoptic diagram of display panels;
Shielding part when Fig. 2 A to Fig. 2 C exposes in exposure device for known motherboard in regular turn and the relative position synoptic diagram between the motherboard;
Fig. 3 is an embodiment of the contraposition scale on the mask of the present invention's exposure;
Fig. 4 is the disclosed a kind of process flow diagram of using the shield part position confirmation method of contraposition scale of the present invention; And
Fig. 5 A to Fig. 5 K is respectively the pairing structural representation of each step among Fig. 4.
Drawing reference numeral:
1: motherboard
11: treat the technology block
11a: target process block
12: technology block
22,24: shielding part
3,3a, 3b: contraposition scale
32: datum line
34: measurement section
341: the first measuring units
342: the second measuring units
36: quarter portion
361: the first quarters the unit
362: the second quarters the unit
381: the location mark symbol
382: layer does not indicate symbol
4: substrate
41a, 41b, 41c: block
52: the first shielding parts
54: secondary shielding spare
6: mask
10a, 10b, 10c: first pattern
The boundary position of 101: the first shielding parts
The datum line of 102: the first patterns
103: the first patterns first quarter list
20b: pattern does not develop
20b ': pattern has developed
201: the boundary position of secondary shielding spare
L1: the length of first measuring unit
L2: the length of second measuring unit
L3: first quarter the unit length
L4: second quarter the unit length
X: axis of orientation
Y: axis of orientation
Embodiment
Hereinafter with reference to correlative type, the contraposition scale on a kind of mask of preferred embodiment of the present invention is described and uses the shield part position confirmation method of contraposition scale.
Please refer to shown in Figure 3ly, it is an embodiment of the contraposition scale on the mask that the present invention discloses.This contraposition scale 3 has datum line 32 and comprises measurement section 34 and portion 36 at quarter, wherein, measurement section 34 is positioned at first side of datum line 32, and quarter, 36 in portion was second side that is positioned at datum line 32, and first side and second side of datum line 32 are positioned at corresponding position in the present embodiment.
Wherein, first quarter unit 361 length L 3 be second quarter unit 362 length L 4 twice at least, for instance, when first quarter, unit 361 length L 3 was 140 unit lengths, then second quarter unit 362 length L 4 at most can not be greater than 70 unit lengths, wherein, unit length can be micron (μ m), but not as limit.
In addition, contraposition scale 3 also comprises at least one location mark symbol 381, so that simpler and clearer location information to be provided, and location mark symbol 381 can be relatively arranged on first quarter unit 361 and/or second quarter unit 362 central extended position.For instance, disclosed in the present embodiment location mark symbol 381 include the numeral with symbol (for example: radix point), and location mark symbol 381 be with first quarter unit 361 be the center towards both sides second quarter the unit 352 be provided with in regular turn, wherein, symbol in the location mark symbol 381 then be in alignment with corresponding with it first quarter unit 361, second quarter unit 362 central extended position, the advantage of this kind design is to make the interpretation of contraposition scale 3 more easy and use the probability that reduces erroneous judgement.
In addition, contraposition scale 3 also comprises at least, and one deck does not indicate symbol 382, it can be arranged at first side or second side of contraposition scale 3, the main effect that layer does not indicate symbol 382 is to provide the information of current technology, for instance, when carrying out the first road technology, then use layer do not indicate symbol 382 for A with the alignment (as shown in this embodiment) of affirmation shielding part when the first road technology, when carrying out the second road technology, then use layer do not indicate symbol 382 for B with the alignment of affirmation shielding part when the second road technology.
Below, a kind of shield part position confirmation method is then proposed, wherein, in order to the contraposition scale of confirming shield part position then as above-mentioned shown in Figure 3.
Please be simultaneously with reference to shown in Fig. 4 and Fig. 5 A to Fig. 5 K, wherein, Fig. 4 is the disclosed a kind of process flow diagram of using the shield part position confirmation method of contraposition scale of the present invention, Fig. 5 A to Fig. 5 K then is respectively the pairing structural representation of each step among Fig. 4.
At first, please in the lump with reference to shown in Fig. 4 and Fig. 5 A, step S01 represents to provide substrate 4 in exposure device (figure does not show).Wherein, this substrate 4 has a plurality of block 41a, 41b, 41c and these blocks 41a, 41b, 41c are closely adjacent each other, in exposure device, then have first shielding part 52 and secondary shielding spare 54, and first shielding part 52 is positioned opposite to each other with secondary shielding spare 54, with the present embodiment is example, first shielding part 52 and secondary shielding spare 54 are separately positioned on the both sides of the X-direction of exposure device when not carrying out exposure technology as yet.
In addition, on the Y direction of exposure device, also be provided with two shielding parts (figure does not show) accordingly, because its start is similar to secondary shielding spare 54 to first shielding part 52 on the X-axis, so can learn the start of the shielding part on the Y direction with reference to the method for the following stated.
Then, shown in Fig. 4 and Fig. 5 B, in step S02, then provide mask 6 above substrate 4, the and arranged on left and right sides of this mask 6 is respectively arranged with contraposition scale 3a and contraposition scale 3b, and shown in present embodiment, the configuration mode of counter-rotatings that this two contraposition scale 3a and 3b have 180 degree is presented on the mask 6 in couples, and is preferable aspect with the edge that is arranged at mask 6, and for contraposition scale 3a or contraposition scale 3b, its structure all as shown in Figure 3.But, contraposition scale 3a and 3b are except can paired mode being arranged at the mask 6, certainly also can be according to the design and the demand of different process, with change contraposition scale 3a and 3b on mask 6 quantity and the position but, the structure of a contraposition scale 3 as shown in Figure 3 must be set on a mask 6 at least.
In the same manner, right contraposition scale (figure does not show) also can be arranged in the upper and lower edge of mask 6, in more detail, the contraposition scale is the upper and lower edge that is arranged on mask 6 simultaneously, and the contraposition scale that is arranged on the contraposition scale of coboundary and lower limb has the inverse relations of 180 degree.Therefore, when carrying out the displacement of Y direction, also can utilize following step to carry out the location confirmation of the shielding part on the Y direction.
Again, to move first shielding part 52 and secondary shielding spare 54, make first shielding part 52 and secondary shielding spare 54 according to the step S03 of Fig. 4 between substrate 4 and mask 6, its corresponding structure is shown in Fig. 5 C.In more detail, this moment local first shielding part 52 with secondary shielding spare 54 respectively with the mask 6 of its top with and the substrate 4 of below on the vertical projection direction, present partly overlapping state, that is to say that contraposition scale 3a on the mask 6 and contraposition scale 3b are shielded by the secondary shielding spare 54 and first shielding part 52 respectively partly in the vertical projection direction.
Continue, the step S04 in the execution graph 4 more promptly carries out exposure for the first time to substrate 4 and forms the first pattern 10a and the first pattern 10b, the structure shown in Fig. 5 D in the both sides of block 41a.Wherein, because contraposition scale 3a and contraposition scale 3b on the mask 6 are shielded by the secondary shielding spare 54 and first shielding part 52 respectively partly in the vertical projection direction, therefore through after first exposure, the first pattern 10a, the 10b that is formed on substrate 4 both sides is respectively the partial structurtes and local secondary shielding spare 54, local 52 patterns that constitute jointly of first shielding part by contraposition scale 3a, 3b on the mask 6.In more detail, because block 41a be the block at the edge of substrate 4, therefore be formed at the first pattern 10a at block 41a edge after the shielding that is subjected to first shielding part 52, only form and be locally exposed on the substrate 4, but for the zone that is adjacent to the first pattern 10a, because do not had next-door neighbour's block,, in the application of reality, can't impact though therefore the first pattern 10a is incomplete pattern in a side that is formed with the first pattern 10a.But, the first pattern 10b that on the block 41a zone adjacent, forms with block 41b, then intactly include the datum line 102 of boundary position 101, first pattern of first shielding part and first pattern first quarter unit 103.
Again, shown in Fig. 4 and Fig. 5 E, step S05 returns first shielding part 52 after being illustrated in the exposure first time of finishing substrate 4 with secondary shielding spare 54.
Then, when carrying out step S06, then be from block 41a X-shift and in alignment with next block 41b with mask 6.It should be noted that, before displacement mask 6, must confirm after datum line 102 among the first pattern 10b that contraposition scale 3b provided is in alignment with displacement the datum line 32 of contraposition scale 3a on the mask 6, simultaneously, among the first pattern 10b that provided of contraposition scale 3b first quarter unit 103 in alignment with contraposition scale 3a on the mask after the displacement 6 first quarter unit 361.
Again, in the step S07 of Fig. 4, then be to move first shielding part 52 and secondary shielding spare 54, and make respectively and the overlapping of mask 6, shown in Fig. 5 G.Similar in appearance to step S03, this moment local first shielding part 52 with local secondary shielding spare 54 respectively with the mask 6 of its top with and the substrate 4 of below on the vertical projection direction, present overlapping state, that is to say that contraposition scale 3a and 3b on the mask 6 after the directions X displacement are shielded by the secondary shielding spare 54 and first shielding part 52 respectively partly in the vertical projection direction.
Continue, according to the step S08 of Fig. 4 as can be known, its utilization is formed on the mask 6 the contraposition scale 3a that is provided with in pairs and 3b substrate 4 is exposed with the formation pattern 20b and the first pattern 10c on substrate 4, in more detail, because contraposition scale 3a and 3b are the left and right edges that is separately positioned on mask 6, and be arranged on the contraposition scale 3a of left hand edge and the contraposition scale 3b of right hand edge and have 180 inverse relations of spending, therefore, substrate 4 is carried out exposing for the second time the back to form the structure shown in Fig. 5 H.Wherein, because the pattern 20b that forms on substrate 4 this moment does not pass through developing process as yet.What deserves to be mentioned is that substrate 4 only must include (present embodiment is upper and lower symmetry) the also structure of overlapping contraposition scale 3 that is mutually symmetrical at the pattern 20b that is obtained through the double exposure back.
After representing then that in the step S09 of Fig. 4 substrate 4 is finished exposure for the second time, return first shielding part 52 and secondary shielding spare 54, and had still undeveloped pattern 20b on the substrate 4 of this moment, shown in Fig. 5 I.
Again, according to the step S10 of Fig. 4 with development substrate 4 and obtain a pattern 20b ' shown in Fig. 5 J.Wherein, for for the formed pattern 20b ' in exposure back for the second time, it is by the pattern that is formed on local contraposition scale 3a and the local common formation of secondary shielding spare 54 overlapping exposure back institutes on the first pattern 10b on the substrate 4 (being by the contraposition scale 3b of first shielding part, 52 shadow shields), the mask 6.Be the boundary position 101 that includes first shielding part among the first pattern 10b simultaneously with, pattern 20b ' with through the boundary position 201 of the formed secondary shielding spare in exposure back for the second time.In more detail, with pattern 20b ' is the example explanation, because the contraposition scale 3a when carrying out exposing for the second time on the mask 6 corresponds to the first pattern 10b, for going up each other, following inverted aspect, in other words, when carrying out exposing the second time, first side of contraposition scale 3a on the mask 6 (this side at measurement section 34 places among the contraposition scale 3a just) with overlapping second side that is exposed to the first pattern 10b (just among the first pattern 10b quarter portion 36 places this side), second side of the contraposition scale 3a on the mask 6 (just among the contraposition scale 3a quarter portion 36 places this side) then be overlapping first side (this side at measurement section 34 places among the first pattern 10b just) that is exposed to the first pattern 10b.
At last, then be to judge the alignment of first shielding part 52 and secondary shielding spare 54 in the step S11 of Fig. 4 according to the pattern 20b ' shown in Fig. 5 K, wherein, judgment mode can be by judging or artificially judge realizing automatically, and shown in Fig. 5 K, the path of judging is among the figure shown in the bold dashed lines, and with regard to the foundation of judging, then be to judge the alignment of first shielding part 52 and secondary shielding spare 54 according to the boundary position 201 of the boundary position 101 of first shielding part among the pattern 20b ' and secondary shielding spare.
With the present embodiment is example, when judgment mode is judgement automatically, then still please refer to shown in Fig. 5 K, wherein, the detection path of robotization pick-up unit is shown in bold dashed lines among Fig. 5 K, therefore, when judging the alignment of first shielding part 52, be with first pattern first quarter the unit 103 be that starting point is judged towards the boundary position 101 of first shielding part, to confirm the position after first shielding part 52 moves, in the same manner, for the judgment mode of the alignment of secondary shielding spare 54, also be with first pattern first quarter the unit 103 be that starting point is judged towards the boundary position 201 of secondary shielding spare.And when the robotization pick-up unit when judging the alignment of first shielding part 52, be to be adjacent gray scale variation situation between the zone to realize by the boundary position 101 that judgement is formed on first shielding part among the pattern 20b ' on the substrate 4, in like manner, when the robotization pick-up unit when judging the alignment of secondary shielding spare 54, be to be adjacent gray scale variation situation between the zone to realize by the boundary position 201 that judgement is formed on secondary shielding spare among the pattern 20b ' on the substrate 4, in other words, in case when the robotization pick-up unit is judged the GTG of GTG that a certain zone is arranged among the pattern 20b ' and adjacent domain significant difference is arranged, judge that then the boundary of gray scale variation is the boundary position 101 of first shielding part 52 (or secondary shielding spare 54), 201.
What deserves to be mentioned is, after substrate 4 carries out exposure for the second time and develops (as the step S06 of Fig. 4 to step S10), because the displacement of mask 6 is that the datum line 102 with first pattern of first pattern is a benchmark, so the contraposition scale 3a on the mask 6 after the displacement is presented with the first pattern 10b that has been formed on the substrate 4, following inverted aspect, in other words, measurement section 34 among the contraposition scale 3a on the postrotational mask 6 will be shielded from the portion 36 at quarter of the first pattern 10b, 36 measurement section 34 that will be shielded from the first pattern 10b of portion at quarter among the contraposition scale 3a on the postrotational mask 6 of while, based on this, design for as shown in Figure 3 contraposition scale 3, the length L 2 of second measuring unit 342 in the contraposition scale 3 will be not can less than first quarter unit 361 length L 3, to avoid the result that unit at first quarter, overlapping exposure back 361 will protrude in second measuring unit 342 and influence is judged.
In addition, forming finally can be in order to judge the method for the pattern whether shielding part is aimed at, except can reaching by the mode of mobile mask, and more can be by various mode with realization.For instance, can utilize mask on substrate, to form one first pattern earlier, again at a certain angle (for example: 180 degree) rotate mask, and utilize contraposition scale on the mask so that substrate is carried out secondary exposure, wherein, it should be noted that, rotation must be to be benchmark with first pattern on the substrate during mask, in other words, before the rotation mask, must confirm the datum line of the datum line of first pattern in first pattern in alignment with contraposition scale on the mask of rotation back, simultaneously, in first pattern first pattern first quarter the unit in alignment with contraposition scale on the mask of rotation back first quarter the unit, thereafter, again mask is carried out the rotations of 180 degree, so the pattern of final formation can be included be mutually symmetrical (on, following symmetry or left, right symmetry) and the structure of overlapping contraposition scale.
Be with, according to as can be known above-mentioned, in the single block (for example: the block 41a in the foregoing description or 41b or 41c) of substrate, (for example: directions X axle, Y axis of orientation) is formed with paired pattern usually on an axis of orientation, be used for confirming on this axis of orientation shielding part (for example: alignment first shielding part 52 and secondary shielding spare 54 in the foregoing description on the directions X axle).
And in order to reduce the False Rate that visual detection or robotization detect, the length L 2 of second measuring unit 342 and second quarter unit 362 length L 4 difference must be more than or equal to a limits value, for instance, when the decipherable minimum gauge of robotization pick-up unit is 20 microns, then above-mentioned limits value then is set at 20 microns, certainly, this limits value is except can stipulating according to the specification limits of robotization pick-up unit, and also the minimum length that can discern according to visual detection is to stipulate.
In sum, the shield part position confirmation method of contraposition scale on the disclosed a kind of mask of the present invention and application contraposition scale, it can utilize the contraposition scale on the mask exposure (by rotating mask and exposing twice to realize) of twice different directions, so make on the contraposition scale measurement section, quarter portion and shielding part on substrate, form a pattern jointly, use alignment for automatic or manual affirmation shielding part.Therefore, with known art, the present invention not only can meet the fabrication error requirement of high collection density substrate, more because final drawing is considerably clear and concrete, therefore can avoid erroneous judgement and cause the technology yields to reduce, and can be applied in simultaneously in robotization judgement and the artificial affirmation flow process of judging.
The above only is an illustrative, but not is restricted person.Anyly do not break away from spirit of the present invention and category, and, all should be contained in the appended claim scope its equivalent modifications of carrying out or change.
Claims (11)
1, the contraposition scale on a kind of mask is characterized in that, has a datum line, and described contraposition scale comprises:
One measurement section, be positioned at first side of described datum line, described measurement section is made of a plurality of first measuring units and a plurality of second measuring unit, and the length of each first measuring unit and adjacent setting of each second measuring unit and described first measuring unit is greater than the length of described second measuring unit; And
A moment portion, be positioned at second side of described datum line, described quarter portion by one first quarter the unit and a plurality of second quarter the unit constitute, described first quarter the unit be arranged between described a plurality of second quarter unit, and described first quarter the unit length greater than described a plurality of second quarter the unit length.
2, contraposition scale as claimed in claim 1 is characterized in that, also comprises:
At least one location mark symbol is positioned at described second side and is adjacent to portion at described quarter.
3, contraposition scale as claimed in claim 2 is characterized in that, described location mark symbol correspondence be arranged at described first quarter the unit or described second quarter the unit the central authorities position of extending.
4, contraposition scale as claimed in claim 1 is characterized in that, also comprises:
At least one deck does not indicate symbol, is positioned at described first side or described second side.
5, contraposition scale as claimed in claim 1 is characterized in that, the length of described second measuring unit be not less than described first quarter the unit length.
6, contraposition scale as claimed in claim 1 is characterized in that, the length of described second measuring unit and described second quarter the unit the difference of length more than or equal to 20 microns.
7, a kind of shield part position confirmation method that utilizes the contraposition scale on the mask as claimed in claim 1 is characterized in that, comprises following steps:
Provide a substrate in an exposure device, described substrate has a plurality of blocks and adjacent one another are, and described exposure device has one first shielding part and a secondary shielding spare and positioned opposite to each other;
Provide a mask in described substrate top, described mask has as the contraposition scale on the claim 1 described mask;
Move described first shielding part and described secondary shielding spare and make respectively and the overlapping of described mask;
Described substrate is carried out first time exposure forming one first pattern in described substrate, and described first pattern comprise the datum line of boundary position, one first pattern of one first shielding part and one first pattern first quarter the unit;
Finish for the first time and return described first shielding part and described secondary shielding spare after the exposure;
With described first pattern that is formed on the described substrate is benchmark, provides described mask in described substrate top once more;
Move described first shielding part and described secondary shielding spare and make respectively and the overlapping of described mask;
Described substrate is carried out the exposure second time;
Finish for the second time and return described first shielding part and described secondary shielding spare after the exposure;
Develop described substrate to obtain a pattern; And
According to described pattern to judge the alignment of described first shielding part and described secondary shielding spare.
8, shield part position confirmation method as claimed in claim 7 is characterized in that, provides described mask once more in the step of described substrate top, is to be that benchmark moves or rotate described mask with described first pattern.
9, shield part position confirmation method as claimed in claim 7 is characterized in that, described pattern comprises the boundary position of described first shielding part in described first pattern and the boundary position of a secondary shielding spare.
10, shield part position confirmation method as claimed in claim 7, it is characterized in that, the alignment of judging described first shielding part is to be adjacent gray scale variation between the zone realizing by the boundary position of judging described first shielding part, and the alignment of judging described secondary shielding spare is to be adjacent gray scale variation between the zone to realize by the boundary position of judging described secondary shielding spare.
11, shield part position confirmation method as claimed in claim 7, it is characterized in that, the method of judging the alignment of described first shielding part be with described first pattern first quarter the unit be that starting point is judged towards the boundary position of described first shielding part, to confirm the position after described first shielding part moves, and the method for judging the alignment of described secondary shielding spare be with described first pattern first quarter the unit be that starting point is judged towards the boundary position of described secondary shielding spare, to confirm the position after described secondary shielding spare moves.
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| CN2008102135690A CN101354530B (en) | 2008-09-11 | 2008-09-11 | Contraposition scale on mask and method for affirming shield part position using the same |
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| CN2008102135690A CN101354530B (en) | 2008-09-11 | 2008-09-11 | Contraposition scale on mask and method for affirming shield part position using the same |
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| CN101354530B CN101354530B (en) | 2012-02-29 |
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| CN103135342A (en) * | 2013-03-07 | 2013-06-05 | 中国科学院合肥物质科学研究院 | Method for manufacturing nanofluid channel of integrated scaleplate based on flexible template |
| CN103345117A (en) * | 2013-06-24 | 2013-10-09 | 南京中电熊猫液晶显示科技有限公司 | Mask and liquid crystal display manufacturing method |
| CN106773525A (en) * | 2017-03-01 | 2017-05-31 | 合肥京东方光电科技有限公司 | Mask plate, alignment method, display panel, display device and its to cassette method |
| CN110376775A (en) * | 2019-07-18 | 2019-10-25 | 深圳市华星光电半导体显示技术有限公司 | The method of the printed wire precision of display panel and display panel monitoring |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5770337A (en) * | 1996-03-22 | 1998-06-23 | Taiwan Semiconductor Manufacturing Company, Ltd. | Method of inspection to determine reticle pitch |
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2008
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| CN102135680A (en) * | 2010-01-27 | 2011-07-27 | 索尼公司 | Liquid crystal display device and electronic apparatus |
| CN102135680B (en) * | 2010-01-27 | 2015-01-14 | 株式会社日本显示器西 | Liquid crystal display device and electronic apparatus |
| CN102200691A (en) * | 2010-03-25 | 2011-09-28 | 上海微电子装备有限公司 | Online measuring mark and method of projection objective lens image surface of photo-etching machine |
| CN102200691B (en) * | 2010-03-25 | 2013-08-14 | 上海微电子装备有限公司 | Online measuring mark and method of projection objective lens image surface of photo-etching machine |
| CN103135342A (en) * | 2013-03-07 | 2013-06-05 | 中国科学院合肥物质科学研究院 | Method for manufacturing nanofluid channel of integrated scaleplate based on flexible template |
| CN103345117A (en) * | 2013-06-24 | 2013-10-09 | 南京中电熊猫液晶显示科技有限公司 | Mask and liquid crystal display manufacturing method |
| CN103345117B (en) * | 2013-06-24 | 2015-07-15 | 南京中电熊猫液晶显示科技有限公司 | Mask and liquid crystal display manufacturing method |
| CN106773525A (en) * | 2017-03-01 | 2017-05-31 | 合肥京东方光电科技有限公司 | Mask plate, alignment method, display panel, display device and its to cassette method |
| CN110376775A (en) * | 2019-07-18 | 2019-10-25 | 深圳市华星光电半导体显示技术有限公司 | The method of the printed wire precision of display panel and display panel monitoring |
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