CN106772745A - A kind of method for designing of cutoff filter - Google Patents
A kind of method for designing of cutoff filter Download PDFInfo
- Publication number
- CN106772745A CN106772745A CN201710214835.0A CN201710214835A CN106772745A CN 106772745 A CN106772745 A CN 106772745A CN 201710214835 A CN201710214835 A CN 201710214835A CN 106772745 A CN106772745 A CN 106772745A
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- China
- Prior art keywords
- degree
- light
- transmissivity
- cutoff filter
- incidence
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- Pending
Links
- 238000000034 method Methods 0.000 title claims abstract description 18
- 239000011248 coating agent Substances 0.000 claims abstract description 18
- 238000000576 coating method Methods 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 239000000463 material Substances 0.000 claims abstract description 11
- 230000008021 deposition Effects 0.000 claims abstract description 8
- 238000005516 engineering process Methods 0.000 claims abstract description 8
- 238000002834 transmittance Methods 0.000 claims description 22
- 238000000151 deposition Methods 0.000 claims description 6
- 238000007738 vacuum evaporation Methods 0.000 claims description 3
- 238000005240 physical vapour deposition Methods 0.000 claims 1
- 238000003384 imaging method Methods 0.000 abstract description 11
- 238000001228 spectrum Methods 0.000 abstract description 3
- 238000010586 diagram Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000010408 film Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 239000012788 optical film Substances 0.000 description 1
- 230000008447 perception Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0012—Optical design, e.g. procedures, algorithms, optimisation routines
Abstract
Present invention system provides a kind of method for designing of cutoff filter, comprises the following steps：Design substrate material has a light absorbs section in the wave band of 700 750nm, when making light with 0 degree of angle incidence, 1% is less than in the transmissivity of 700 750nm wave bands；Coating of the design with different refractivity is arranged, when making light with 0 degree of angle incidence, transmissivity is reduced to the turning of 0% Thewavelengthtransmittance curve between 700 750nm, and when light is with 30 degree of angles incidence, transmissivity is reduced to the turning of 0% Thewavelengthtransmittance curve between 700 750nm；Coating according to design is arranged, and under vacuum, by physical gas phase deposition technology, makes Coating Materials uniform deposition on substrate, if forming dried layer plated film.The present invention can improve current cutoff filter in the side-play amount that incidence angle is 0 degree to 30 degree, so as to transmitted spectrum characteristic when light is incident from different perspectives is more close, the uniformity of imaging more preferably, can be effectively improved the image quality under high-end imaging demand.
Description
Technical field
The present invention relates to the method for designing of optical filter, a kind of method for designing of cutoff filter is specifically disclosed.
Background technology
Cutoff filter is alternately to plate low-refraction high on optical base-substrate using precision optics coating technique
Optical film, can realize that visible region (400-630nm) is high thoroughly, and near-infrared (700-1000nm) cut-off is mainly used in hand capable of taking pictures
The first-class refreshing horse imaging field of the camera of machine, the built-in camera of computer, automobile camera shooting, for eliminating infrared light to CCD/CMOS
The influence of imaging.By adding cutoff filter in imaging systems, stop that the infrared light of image quality is disturbed in the part,
Imaging can be made to more conform to the best perception of human eye.
Existing cutoff filter changes with incidence angle, and wavelength-transmittance graph can shift, in transmissivity
For 50% when, the wavelength difference 4-5nm of 0 degree of incidence angle and 30 degree of incidence angles, as shown in figure 1, making the light that should end originally
By cutoff filter, the quality of imaging is influenceed.
The content of the invention
Based on this, it is necessary to for prior art problem, there is provided a kind of method for designing of cutoff filter, make light
Seemingly, imagewise uniform is good, and image quality is high for transmitted spectrum characteristic close when incident from different perspectives.
To solve prior art problem, the present invention discloses a kind of method for designing of cutoff filter, including following step
Suddenly：
A, design substrate material have a light absorbs section in the wave band of 700-750nm, when making light with 0 degree of angle incidence,
The transmissivity of 700-750nm wave bands is less than 1%；
The coating of B, design with different refractivity is arranged, when making light with the incidence of 0 degree angle, transmissivity be reduced to 0% wavelength-
Between 700-750nm, when light is with 30 degree of angles incidence, wavelength-transmissivity that transmissivity is reduced to 0% is bent at the turning of transmittance graph
The turning of line is between 700-750nm；
C, the coating arrangement according to design, under vacuum, by physical gas phase deposition technology, make Coating Materials uniform
It is deposited on substrate, if forming dried layer plated film.
Further, when 0 degree of angle of light is incident in step B, transmissivity is reduced to the turning tool of 0% wavelength-transmittance graph
Body is at 700nm.
Further, when 30 degree of angles of light are incident in step B, transmissivity is reduced to the turning tool of 0% wavelength-transmittance graph
Body is at 730nm.
Further, the physical gas phase deposition technology in step C is specifically using the method for vacuum evaporation.
Beneficial effects of the present invention are：The present invention discloses a kind of method for designing of cutoff filter, can improve mesh
Preceding cutoff filter in the side-play amount that incidence angle is 0 degree to 30 degree, when transmissivity is 50%, 0 degree of incidence angle and 30 degree
The wavelength difference of incidence angle is less than 1nm, so that transmitted spectrum characteristic when light is incident from different perspectives is more close, imaging
Uniformity more preferably, can be effectively improved the image quality under high-end imaging demand.
Brief description of the drawings
Fig. 1 is 0 degree of -30 degree wavelength-transmittance graph schematic diagram of cutoff filter in the prior art.
Fig. 2 is 0 degree of -30 degree wavelength-transmittance graph schematic diagram that cutoff filter is obtained by the inventive method.
Fig. 3 is the incident wavelength-transmittance graph schematic diagram of 0 degree of substrate material.
Fig. 4 is the present invention by 0 degree of -30 degree wavelength-transmittance graph schematic diagram after the completion of software simulation plated film.
Specific embodiment
It is specific purposes, the function that can further appreciate that feature of the invention, technological means and reached, with reference to
Accompanying drawing is described in further detail with specific embodiment to the present invention.
Referring to figs. 1 to Fig. 4.
The present invention discloses a kind of method for designing of cutoff filter, comprises the following steps：
A, design substrate material have a light absorbs section in the wave band of 700-750nm, when making light with 0 degree of angle incidence,
The transmissivity of 700-750nm wave bands is less than 1%；
The coating of B, design with different refractivity is arranged, when making light with the incidence of 0 degree angle, transmissivity be reduced to 0% wavelength-
Between 700-750nm, when light is with 30 degree of angles incidence, wavelength-transmissivity that transmissivity is reduced to 0% is bent at the turning of transmittance graph
The turning of line is between 700-750nm；
C, the coating arrangement according to design, under vacuum, by physical gas phase deposition technology, make Coating Materials uniform
It is deposited on substrate, if forming dried layer plated film, physical gas phase deposition technology mainly includes vacuum evaporation, sputtering plating, ion plating, one
As using vacuum evaporation method.
Using specific substrate material, as shown in the wavelength-transmittance graph of Fig. 1 substrates, make light with 0 degree of incidence angle i.e.
During vertical incidence, 1% is less than in the refractive index of 700-750nm wave bands, supersonic cleaning is carried out to substrate material, then substrate is put
Enter in coating machine, coating machine is vacuumized to inside, until vacuum is less than 10-3Pa, sets arrangement and the number of plies of coating, such as
Shown in the wavelength-transmittance graph of Fig. 4 system simulations, when making light with 0 degree of angle incidence, transmissivity is reduced to 0% wavelength-transmissivity
Between 700-750nm, when light is with 30 degree of angles incidence, transmissivity is reduced to turning for 0% wavelength-transmittance graph at the turning of curve
Between 700-750nm, coating machine starts alternately to plate the coating with different refractivity toward on substrate, and formation is transmissive at angle
The cutoff filter of visible ray, cut-off infrared light, the wavelength-transmittance graph of formation are as shown in Fig. 20 degree of incident light
Wavelength-transmittance graph and 30 degree of wavelength-transmittance graphs of incident light are similar, and the side-play amount at 50% is less than 1nm.
As shown in the wavelength-transmittance graph of Fig. 4 system simulations, when 0 degree of angle of light is incident, transmissivity be reduced to 0% wavelength-
Specifically at 700nm, when 30 degree of angles of light are incident, transmissivity is reduced to 0% wavelength-transmittance graph at the turning of transmittance graph
Turning is specifically at 730nm.
The cutoff filter formed by a kind of method for designing of cutoff filter of the invention, light is from infrared
When edge filter difference angle is incident, the wavelength-transmittance graph of formation is similar, so that the uniformity of imaging is more preferably, can
Effectively improve the quality of imaging.
Embodiment described above only expresses several embodiments of the invention, and its description is more specific and detailed, but simultaneously
Therefore the limitation to the scope of the claims of the present invention can not be interpreted as.It should be pointed out that for one of ordinary skill in the art
For, without departing from the inventive concept of the premise, various modifications and improvements can be made, these belong to guarantor of the invention
Shield scope.Therefore, the protection domain of patent of the present invention should be determined by the appended claims.
Claims (4)
1. a kind of method for designing of cutoff filter, it is characterised in that comprise the following steps：
A, design substrate material have a light absorbs section in the wave band of 700-750nm, when making light with 0 degree of angle incidence, in 700-
The transmissivity of 750nm wave bands is less than 1%；
The coating of B, design with different refractivity is arranged, and when making light with 0 degree of angle incidence, transmissivity is reduced to 0% wavelength-transmission
Between 700-750nm, when light is with 30 degree of angles incidence, transmissivity is reduced to 0% wavelength-transmittance graph at the turning of rate curve
Turning is between 700-750nm；
C, the coating arrangement according to design, under vacuum, by physical gas phase deposition technology, make Coating Materials uniform deposition
On substrate, if forming dried layer plated film.
2. a kind of method for designing of cutoff filter according to claim 1, it is characterised in that 0 degree of light in step B
When angle is incident, transmissivity is reduced to the turning of 0% wavelength-transmittance graph specifically at 700nm.
3. a kind of method for designing of cutoff filter according to claim 1, it is characterised in that light 30 in step B
When degree angle is incident, transmissivity is reduced to the turning of 0% wavelength-transmittance graph specifically at 730nm.
4. a kind of method for designing of cutoff filter according to claim 1, it is characterised in that the thing in step C
Physical vapor deposition technology is specifically using the method for vacuum evaporation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710214835.0A CN106772745A (en) | 2017-04-01 | 2017-04-01 | A kind of method for designing of cutoff filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710214835.0A CN106772745A (en) | 2017-04-01 | 2017-04-01 | A kind of method for designing of cutoff filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106772745A true CN106772745A (en) | 2017-05-31 |
Family
ID=58965981
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710214835.0A Pending CN106772745A (en) | 2017-04-01 | 2017-04-01 | A kind of method for designing of cutoff filter |
Country Status (1)
| Country | Link |
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| CN (1) | CN106772745A (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102645697A (en) * | 2012-05-08 | 2012-08-22 | 孔令华 | Imaging spectrum filter and preparation technique thereof |
| CN106405707A (en) * | 2011-06-06 | 2017-02-15 | 旭硝子株式会社 | Optical filter, solid-state imaging element, imaging device lens and imaging device |
-
2017
- 2017-04-01 CN CN201710214835.0A patent/CN106772745A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN106405707A (en) * | 2011-06-06 | 2017-02-15 | 旭硝子株式会社 | Optical filter, solid-state imaging element, imaging device lens and imaging device |
| CN102645697A (en) * | 2012-05-08 | 2012-08-22 | 孔令华 | Imaging spectrum filter and preparation technique thereof |
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| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20170531 |
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| RJ01 | Rejection of invention patent application after publication |