TW201939073A - Optical filter and imaging device - Google Patents

Optical filter and imaging device Download PDF

Info

Publication number
TW201939073A
TW201939073A TW108100830A TW108100830A TW201939073A TW 201939073 A TW201939073 A TW 201939073A TW 108100830 A TW108100830 A TW 108100830A TW 108100830 A TW108100830 A TW 108100830A TW 201939073 A TW201939073 A TW 201939073A
Authority
TW
Taiwan
Prior art keywords
wavelength
filter
transmittance
light
spectral transmittance
Prior art date
Application number
TW108100830A
Other languages
Chinese (zh)
Other versions
TWI787431B (en
Inventor
高城智孝
新毛勝秀
Original Assignee
日商日本板硝子股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商日本板硝子股份有限公司 filed Critical 日商日本板硝子股份有限公司
Publication of TW201939073A publication Critical patent/TW201939073A/en
Application granted granted Critical
Publication of TWI787431B publication Critical patent/TWI787431B/en

Links

Classifications

    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters

Abstract

An optical filter (1a) is provided with a light absorbing layer (10). When light having a wavelength of 300-1200 nm is made incident on the optical filter at the incident angles of 0 DEG, 30 DEG, and 40 DEG, (i-1) the spectral transmittance at a wavelength of 390 nm, (ii-1) the spectral transmittance at a wavelength of 400 nm, (iii-1) the spectral transmittance at a wavelength of 450 nm, (iv-1) the spectral transmittance at a wavelength of 700 nm, (v-1) the spectral transmittance at a wavelength of 715 nm, (vi-1) the spectral transmittance at a wavelength of 1100 nm, (vii-1) the spectral transmittance at a wavelength of 1200 nm, (viii-1) the average transmittance of a wavelength of 500-600 nm, and (ix-1) the average transmittance of a wavelength of 700-800 nm, satisfy a prescribed condition.

Description

濾光器及攝像裝置Filter and camera

本發明係關於一種濾光器及攝像裝置。The invention relates to an optical filter and an imaging device.

先前,已知有一種具備近紅外線截止濾光片等濾光器之攝像裝置。例如於專利文獻1中記載有一種近紅外線截止濾光片,其包含於玻璃板基板之至少單面具有含有近紅外線吸收劑之樹脂層之積層板。例如該近紅外線截止濾光片於積層板之至少單面具有介電多層膜。於該近紅外線截止濾光片中,波長之值(Ya)與波長之值(Yb)之差之絕對值|Ya-Yb|未達15 nm。波長之值(Ya)係於波長560〜800 nm之範圍內,自近紅外線截止濾光片之垂直方向進行測定之情形時之穿透率成為50%的波長之值。波長之值(Yb)係於波長560〜800 nm之範圍內,對近紅外線截止濾光片之垂直方向自30°之角度進行測定之情形時之穿透率成為50%的波長之值。如此,根據專利文獻1,將近紅外線截止濾光片中之穿透特性之角度依賴性調節為較小。Conventionally, an imaging device including a filter such as a near-infrared cut filter is known. For example, Patent Document 1 describes a near-infrared cut filter including a laminated plate having a resin layer containing a near-infrared absorber on at least one side of a glass plate substrate. For example, the near-infrared cut filter has a dielectric multilayer film on at least one side of the laminated board. In this near-infrared cut-off filter, the absolute value | Ya-Yb | of the difference between the wavelength value (Ya) and the wavelength value (Yb) is less than 15 nm. The value of the wavelength (Ya) is the value of the wavelength at which the transmittance becomes 50% when measured from the vertical direction of the near-infrared cut filter in the range of 560 to 800 nm. The value of the wavelength (Yb) is a value of a wavelength of 50% when the vertical direction of the near-infrared cut filter is measured from an angle of 30 ° in the range of 560 to 800 nm. As described above, according to Patent Document 1, the angle dependency of the penetration characteristics in the near-infrared cut filter is adjusted to be small.

於專利文獻2中記載有一種具備近紅外線吸收玻璃基材、近紅外線吸收層及介電多層膜之近紅外線截止濾光片。近紅外線吸收層含有近紅外線吸收色素及透明樹脂。於專利文獻2中記載有一種具備該近紅外線截止濾光片及固體攝像元件之固體攝像裝置。根據專利文獻2,藉由積層近紅外線吸收玻璃基材與近紅外線吸收層,可大致排除介電多層膜原本具有之屏蔽波長因光之入射角度而偏移之角度依賴性的影響。例如於專利文獻2中測定近紅外線截止濾光片中之入射角0°時之穿透率(T0 )及入射角30°時之穿透率(T30 )。Patent Literature 2 describes a near-infrared cut filter including a near-infrared absorbing glass substrate, a near-infrared absorbing layer, and a dielectric multilayer film. The near-infrared absorbing layer contains a near-infrared absorbing pigment and a transparent resin. Patent Document 2 describes a solid-state imaging device including the near-infrared cut filter and a solid-state imaging element. According to Patent Document 2, by laminating a near-infrared absorbing glass substrate and a near-infrared absorbing layer, the effect of the angular dependence of the shielding wavelength originally shifted by the dielectric multilayer film due to the incident angle of light can be roughly eliminated. For example, in Patent Document 2, the transmittance (T 0 ) at an incident angle of 0 ° and the transmittance (T 30 ) at an incident angle of 30 in the near-infrared cut filter are measured.

於專利文獻3及4中記載有一種具備介電基板、紅外線反射層及紅外線吸收層之紅外線截止濾光片。紅外線反射層係由介電多層膜形成。紅外線吸收層含有紅外線吸收色素。於專利文獻3及4中記載有一種具備該紅外線截止濾光片之攝像裝置。於專利文獻3及4中記載有一種光之入射角度為0°、25°及35°之情形時之紅外線截止濾光片的穿透率光譜。Patent Documents 3 and 4 describe an infrared cut filter including a dielectric substrate, an infrared reflective layer, and an infrared absorbing layer. The infrared reflecting layer is formed of a dielectric multilayer film. The infrared absorbing layer contains an infrared absorbing pigment. Patent Documents 3 and 4 describe an imaging device including the infrared cut filter. Patent Literatures 3 and 4 describe a transmittance spectrum of an infrared cut filter when the incident angles of light are 0 °, 25 °, and 35 °.

於專利文獻5中記載有一種具備吸收層及反射層,且滿足特定之要件之近紅外線截止濾光片。例如於該近紅外線截止濾光片中,入射角0°之分光穿透率曲線中之波長600〜725 nm之光之穿透率之積分值T0 600-725 與入射角30°之分光穿透率曲線中之波長600〜725 nm之光之穿透率之積分值T30 600-725 的差|T0 600-725 -T30 600-725 |為3%・nm以下。於專利文獻5中亦記載有一種具備該近紅外線截止濾光片之攝像裝置。
[先前技術文獻]
[專利文獻]
Patent Document 5 describes a near-infrared cut filter that includes an absorption layer and a reflection layer and satisfies specific requirements. For example, in this near-infrared cut-off filter, the integral value T 0 ( 600-725 ) of the transmittance of light with a wavelength of 600 to 725 nm in the spectral transmittance curve at an incident angle of 0 ° and an incident angle of 30 ° The difference between the integral value T 30 ( 600-725 ) of the transmittance of light with a wavelength of 600 to 725 nm in the spectral transmittance curve | T 0 ( 600-725 ) -T 30 ( 600-725 ) | 3%・ Nm or less. Patent Document 5 also describes an imaging device including the near-infrared cut filter.
[Prior technical literature]
[Patent Literature]

專利文獻1:日本特開2012-103340號公報
專利文獻2:國際公開第2014/030628號
專利文獻3:美國專利申請案公開第2014/0300956號說明書
專利文獻4:美國專利申請案公開第2014/0063597號說明書
專利文獻5:日本專利第6119920號公報
Patent Document 1: Japanese Patent Application Publication No. 2012-103340 Patent Document 2: International Publication No. 2014/030628 Patent Document 3: US Patent Application Publication No. 2014/0300956 Specification Patent Document 4: US Patent Application Publication No. 2014 / 0063597 Specification Patent Document 5: Japanese Patent No. 6119920

[發明所欲解決之課題][Problems to be Solved by the Invention]

於上述專利文獻中,未對光之入射角度大於35°(例如40°)之情形時之濾光器之特性具體地進行研究。因此,本發明提供一種具有如下特性之濾光器:即便於光之入射角度更大之情形時,對用於攝像裝置亦有利。又,本發明提供一種具備該濾光器之攝像裝置。
[解決課題之技術手段]
In the aforementioned patent documents, the characteristics of the filter when the incident angle of light is larger than 35 ° (for example, 40 °) are not specifically studied. Therefore, the present invention provides an optical filter having the characteristics that it is advantageous for use in an imaging device even when the incident angle of light is larger. The present invention also provides an imaging device including the filter.
[Technical means to solve the problem]

本發明提供一種濾光器,
其具備光吸收層,該光吸收層含有吸收近紅外線區域之至少一部分光之光吸收劑,
於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至該濾光器時,滿足下述條件。
(i-1)波長390 nm之分光穿透率為20%以下。
(ii-1)波長400 nm之分光穿透率為45%以下。
(iii-1)波長450 nm之分光穿透率為75%以上。
(iv-1)波長700 nm之分光穿透率為3%以下。
(v-1)波長715 nm之分光穿透率為1%以下。
(vi-1)波長1100 nm之分光穿透率為2%以下。
(vii-1)波長1200 nm之分光穿透率為15%以下。
(viii-1)波長500〜600 nm之平均穿透率為80%以上。
(ix-1)波長700〜800 nm之平均穿透率為0.5%以下。
The present invention provides an optical filter,
It includes a light absorbing layer containing a light absorbing agent that absorbs at least a part of light in the near-infrared region,
When light having a wavelength of 300 nm to 1200 nm is incident on the filter at incidence angles of 0 °, 30 °, and 40 °, the following conditions are satisfied.
(I-1) The spectral transmittance at a wavelength of 390 nm is 20% or less.
(Ii-1) The spectral transmittance at a wavelength of 400 nm is 45% or less.
(Iii-1) The spectral transmittance at a wavelength of 450 nm is more than 75%.
(Iv-1) The spectral transmittance at a wavelength of 700 nm is 3% or less.
(V-1) The spectral transmittance at a wavelength of 715 nm is 1% or less.
(Vi-1) The spectral transmittance at a wavelength of 1100 nm is 2% or less.
(Vii-1) The spectral transmittance at a wavelength of 1200 nm is 15% or less.
(Viii-1) The average transmittance at a wavelength of 500 to 600 nm is 80% or more.
(Ix-1) The average transmittance at a wavelength of 700 to 800 nm is 0.5% or less.

又,本發明提供一種攝像裝置,其具備:
透鏡系統;
攝像元件,其接收穿過上述透鏡系統之光;
濾色器,其配置於上述攝像元件之前方,且具有R(紅)、G(綠)及B(藍)3色之濾光片;及
上述濾光器,其配置於上述濾色器之前方。
[發明之效果]
In addition, the present invention provides an imaging device including:
Lens system
An imaging element that receives light passing through the lens system;
A color filter, which is arranged in front of the imaging element, and has three color filters of R (red), G (green), and B (blue); and the above-mentioned filter, which is arranged before the above-mentioned color filter square.
[Effect of the invention]

上述濾光器具有即便於光之入射角度更大之情形時,對用於攝像裝置亦有利之特性。又,根據上述攝像裝置,即便於光之入射角度更大之情形時,亦容易生成良好之畫質之圖像。The above-mentioned filter has characteristics that are advantageous for use in an imaging device even when the incident angle of light is larger. In addition, according to the imaging device described above, even when the incident angle of light is larger, it is easy to generate a good-quality image.

以下,一面參照圖式一面對本發明之實施形態進行說明。再者,以下之說明係關於本發明之一例,本發明並不受該等所限定。Hereinafter, embodiments of the present invention will be described with reference to the drawings. The following description is an example of the present invention, and the present invention is not limited thereto.

本發明者等人係基於藉由與濾光器相關之以下之研究所獲得之新見解而研究出本發明之濾光器。The inventors of the present invention have developed the optical filter of the present invention based on new insights obtained through the following research related to the optical filter.

於搭載於智慧型手機等行動資訊終端之相機模組或攝像裝置配置有屏蔽可見光線以外之無用之光線之濾光器。本發明者等人研究為了屏蔽無用之光線而具備光吸收層之濾光器之使用。如專利文獻1〜5中所記載之濾光器般,具備光吸收層之濾光器多數情況下進而具備由介電多層膜所構成之反射膜。A camera module or an imaging device mounted on a mobile information terminal such as a smart phone is provided with a filter that blocks useless light other than visible light. The present inventors have studied the use of a filter provided with a light absorbing layer in order to shield useless light. Like the filters described in Patent Documents 1 to 5, a filter provided with a light absorbing layer often includes a reflective film made of a dielectric multilayer film.

於由介電多層膜所構成之反射膜中,由於反射膜之各層之表面及背面反射之光線的干涉而確定穿透之光線之波段及反射之光線之波段。光線可自各種入射角度入射至濾光器。反射膜中之光程長度根據光對濾光器之入射角度而變化。其結果為穿透之光線及反射之光線之波段向短波長側變化。因此,考慮以濾光器之穿透率之特性不會因光之入射角度大幅變動之方式,由光之吸收而確定應屏蔽之光線之波段與應穿透之光線之波段的邊界,藉由介電多層膜使應反射之光線之波段遠離應穿透之光線之波段。In a reflective film composed of a dielectric multilayer film, the waveband of the transmitted light and the waveband of the reflected light are determined due to the interference of the light reflected from the surface and back of each layer of the reflective film. Light can enter the filter from various angles of incidence. The optical path length in the reflective film varies according to the incident angle of the light to the filter. As a result, the wavelength band of the transmitted light and the reflected light changes to the short wavelength side. Therefore, consider the way that the transmission characteristic of the filter does not change greatly due to the incident angle of light, and determine the boundary between the wavelength band of the light to be shielded and the wavelength band of the light to be penetrated by the absorption of light. The dielectric multilayer film keeps the wave band of the light that should be reflected away from the wave band of the light that should be penetrated.

於專利文獻1及2中,評價光之入射角度為0°及30°之情形時之近紅外線截止濾光片中之光的穿透特性。又,於專利文獻3及4中,評價光之入射角度為0°、25°及35°之情形時之紅外線截止濾光片的穿透率光譜。近年來,於搭載於智慧型手機等行動資訊終端之相機模組中,要求實現更廣闊之視角及進一步之低高度化。因此,較理想為於濾光器中,即便於光之入射角度更大之情形時(例如40°),穿透之光線之波段及光量亦不易變化。In Patent Documents 1 and 2, the transmission characteristics of light in the near-infrared cut filter when the incident angle of light is 0 ° and 30 ° are evaluated. Further, in Patent Documents 3 and 4, the transmittance spectrum of the infrared cut filter when the incident angle of light is 0 °, 25 °, and 35 ° was evaluated. In recent years, camera modules mounted on mobile information terminals such as smart phones have required a wider viewing angle and a further reduction in height. Therefore, it is ideal to use the filter, even when the incident angle of light is larger (for example, 40 °), the waveband and light amount of the transmitted light are not easy to change.

於具備由介電多層膜所構成之反射膜之濾光器中,有若光之入射角度較大,則於原本欲抑制反射而實現高穿透率之光線之波段,光之反射率局部增加的情況。藉此,於濾光器中產生穿透率局部減少之被稱為波紋之不良情況。例如即便為以於光之入射角度為0°〜30°之情形時不會產生波紋之方式設計的濾光器,若光之入射角度變大至40°,則亦容易產生波紋。In a filter provided with a reflective film composed of a dielectric multilayer film, if the incident angle of light is large, the reflectance of light locally increases in the wavelength band of light that originally wanted to suppress reflection and achieve high transmittance. Case. As a result, a defect called a ripple is locally generated in the filter. For example, even if the filter is designed in such a manner that moire does not occur when the incident angle of light is 0 ° to 30 °, if the incident angle of light increases to 40 °, moire is easily generated.

目前未確立綜合性地評價由穿透之光線之波段與屏蔽之光線之波段之邊界因光之入射角度之變動而偏移、及波紋之產生所產生之影響的指標。根據專利文獻5中所記載之技術,欲穿透之可見光線之波段與欲反射或吸收之近紅外線之波段之邊界相對於光之入射角度之變動而穩定。但是,關於專利文獻5中所記載之技術,就由可見光線之波段與紫外線之波段之邊界之入射角度之變動所引起的偏移、及波紋之產生之觀點而言,具有改良之餘地。At present, there is no index to comprehensively evaluate the influence of the boundary between the band of transmitted light and the band of shielded light shifted by the change in the incident angle of light, and the effect of ripples. According to the technology described in Patent Document 5, the boundary between the band of visible light to be penetrated and the band of near-infrared to be reflected or absorbed is stable relative to the change in the incident angle of light. However, the technology described in Patent Document 5 has room for improvement in terms of the offset caused by a change in the incident angle at the boundary between the visible light band and the ultraviolet band, and the generation of ripples.

於攝像裝置所具備之影像感測器之各像素組裝有RGB之濾色器,感測器之各像素所感知之光量係與屏蔽無用之光線之濾光器之分光穿透率與濾色器之分光穿透率的乘積相關。因此,較理想為濾光器具有與攝像裝置所使用之濾色器之特性適配之特性。An RGB color filter is assembled on each pixel of the image sensor provided in the camera device. The amount of light perceived by each pixel of the sensor is the spectral transmittance and color filter of the filter that shields unnecessary light. The product of the divided light transmittances is related. Therefore, it is desirable that the filter has characteristics that are compatible with the characteristics of the color filter used in the imaging device.

斟酌此種情況,對具有如下特性之濾光器日夜反覆進行研究:即便於光之入射角度更大之情形時,亦可無損亮度而適當地屏蔽無用之光線,對用於攝像裝置有利。除此以外,亦對具有如下特性之濾光器日夜反覆進行研究:即便於光之入射角度更大之情形時,亦對抑制濾光器中之光之穿透特性產生差異,進而,防止由攝像裝置生成之圖像產生色不均有利。其結果為本發明者研究出本發明之濾光器。Considering this situation, a filter having the following characteristics is studied day and night repeatedly: Even when the incident angle of light is larger, it is possible to appropriately shield useless light without damaging the brightness, which is advantageous for use in imaging devices. In addition, the filter with the following characteristics is also studied day and night. Even when the incident angle of light is larger, the transmission characteristics of the light in the filter are suppressed from being different. The image generated by the imaging device is advantageous for color unevenness. As a result, the inventors have developed the optical filter of the present invention.

於本說明書中,「分光穿透率」係特定之波長之入射光入射至試樣等物體時之穿透率,「平均穿透率」係特定之波長範圍內之分光穿透率之平均值。又,於本說明書中,「穿透率光譜」係按照波長之順序排列特定之波長範圍內之各波長之分光穿透率而成者。In this specification, "spectral transmittance" refers to the transmittance when incident light of a specific wavelength is incident on an object such as a sample, and "average transmittance" refers to the average value of the spectral transmittance in a specific wavelength range. . In addition, in this specification, a "transmittance spectrum" is obtained by arranging the spectral transmittance of each wavelength in a specific wavelength range in the order of wavelength.

於本說明書中,「IR截止波長」意指於以特定之入射角度使波長300 nm〜1200 nm之光入射至濾光器時,於600 nm以上之波長範圍內表現出50%之分光穿透率之波長。「UV截止波長」意指於以特定之入射角度使波長300 nm〜1200 nm之光入射至濾光器時,於450 nm以下之波長範圍內表現出50%之分光穿透率之波長。In this specification, "IR cut-off wavelength" means that when light with a wavelength of 300 nm to 1200 nm is incident on a filter at a specific incident angle, it exhibits a 50% spectral transmission in a wavelength range of 600 nm or more. Rate of wavelength. "UV cutoff wavelength" means a wavelength that exhibits a 50% spectral transmittance in a wavelength range below 450 nm when light with a wavelength of 300 nm to 1200 nm is incident on the filter at a specific incident angle.

如圖1A所示,濾光器1a具備光吸收層10。光吸收層10含有光吸收劑,光吸收劑吸收近紅外線區域之至少一部分光。濾光器1a係於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,滿足下述條件。
(i-1)波長390 nm之分光穿透率為20%以下。
(ii-1)波長400 nm之分光穿透率為45%以下。
(iii-1)波長450 nm之分光穿透率為75%以上。
(iv-1)波長700 nm之分光穿透率為3%以下。
(v-1)波長715 nm之分光穿透率為1%以下。
(vi-1)波長1100 nm之分光穿透率為2%以下。
(vii-1)波長1200 nm之分光穿透率為15%以下。
(viii-1)波長500〜600 nm之平均穿透率為80%以上。
(ix-1)波長700〜800 nm之平均穿透率為0.5%以下。
As shown in FIG. 1A, the filter 1 a includes a light absorbing layer 10. The light absorption layer 10 contains a light absorber, and the light absorber absorbs at least a part of light in the near-infrared region. The filter 1a satisfies the following conditions when the light having a wavelength of 300 nm to 1200 nm is incident on the filter 1a at incidence angles of 0 °, 30 °, and 40 °.
(I-1) The spectral transmittance at a wavelength of 390 nm is 20% or less.
(Ii-1) The spectral transmittance at a wavelength of 400 nm is 45% or less.
(Iii-1) The spectral transmittance at a wavelength of 450 nm is more than 75%.
(Iv-1) The spectral transmittance at a wavelength of 700 nm is 3% or less.
(V-1) The spectral transmittance at a wavelength of 715 nm is 1% or less.
(Vi-1) The spectral transmittance at a wavelength of 1100 nm is 2% or less.
(Vii-1) The spectral transmittance at a wavelength of 1200 nm is 15% or less.
(Viii-1) The average transmittance at a wavelength of 500 to 600 nm is 80% or more.
(Ix-1) The average transmittance at a wavelength of 700 to 800 nm is 0.5% or less.

濾光器1a由於滿足上述(i-1)〜(ix-1)之條件,故而即便光之入射角度自0°(垂直於濾光器1a)至40°進行變化,亦可抑制濾光器1a之穿透特性之變化。因此,例如即便組裝於搭載有廣角透鏡之相機模組或攝像裝置,亦可抑制於圖像之中心部及圖像之周邊部出現不同之色調或亮度,且可屏蔽無用之光線。Since the filter 1a satisfies the conditions (i-1) to (ix-1) described above, even if the incident angle of light changes from 0 ° (perpendicular to the filter 1a) to 40 °, the filter can be suppressed. Changes in the penetration characteristics of 1a. Therefore, even if it is assembled in a camera module or an imaging device equipped with a wide-angle lens, it is possible to suppress the occurrence of different hue or brightness in the central portion of the image and the peripheral portion of the image, and shield unnecessary light.

濾光器1a係於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,較理想為進而滿足下述條件。
(i-2)波長390 nm之分光穿透率為10%以下。
(ii-2)波長400 nm之分光穿透率為25%以下。
(iv-2)波長700 nm之分光穿透率為2.5%以下。
(vi-2)波長1100 nm之分光穿透率為1%以下。
(vii-2)波長1200 nm之分光穿透率為13%以下。
(viii-2)波長500〜600 nm之平均穿透率為85%以上。
When the filter 1a makes light having a wavelength of 300 nm to 1200 nm incident on the filter 1a at incidence angles of 0 °, 30 °, and 40 °, it is preferable to further satisfy the following conditions.
(I-2) The spectral transmittance at a wavelength of 390 nm is 10% or less.
(Ii-2) The spectral transmittance at a wavelength of 400 nm is 25% or less.
(Iv-2) The spectral transmittance at a wavelength of 700 nm is 2.5% or less.
(Vi-2) The spectral transmittance at a wavelength of 1100 nm is 1% or less.
(Vii-2) The spectral transmittance at a wavelength of 1200 nm is 13% or less.
(Viii-2) The average transmittance at a wavelength of 500 to 600 nm is 85% or more.

若濾光器1a進而滿足上述(i-2)、(ii-2)、(iv-2)、(vi-2)、(vii-2)及(viii-2)之條件,則即便光之入射角度自0°至40°進行變化,亦可更有效地抑制濾光器之穿透特性之變化。又,由於相當於可見光區域之中心之波長區域(500〜600 nm)中之穿透率更高,故而容易獲得更亮之圖像。進而,可更有效地屏蔽不包含於人之視感度之無用之光線(390 nm以下之波長之光及波長1100〜1200 nm之光)。由於該等性能於0°〜40°之入射角度之範圍內得以保持,故而容易獲得具有更高程度之色再現性之圖像。If the filter 1a further satisfies the conditions (i-2), (ii-2), (iv-2), (vi-2), (vii-2), and (viii-2) described above, Changing the incident angle from 0 ° to 40 ° can also more effectively suppress the change in the transmission characteristics of the filter. In addition, since the transmittance is higher in a wavelength region (500 to 600 nm) corresponding to the center of the visible light region, it is easy to obtain a brighter image. Furthermore, it is possible to more effectively shield useless light (light having a wavelength of 390 nm or less and light having a wavelength of 1100 to 1200 nm) which is not included in human visual sensitivity. Since these properties are maintained within an angle of incidence of 0 ° to 40 °, it is easy to obtain an image with a higher degree of color reproducibility.

濾光器1a係於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,較理想為進而滿足下述條件(ii-3),更理想為進而滿足下述條件(ii-4)。由於濾光器1a滿足(iii-1)之條件,故而波長450 nm之分光穿透率較高為75%以上。因此,滿足(iii-1)之條件與滿足(ii-3)之條件、更理想為(ii-4)之條件相互作用,於波長相對較短之區域,出現自較低之穿透率急遽變化為較高之穿透率之穿透特性。此種穿透特性係作為濾光器而較理想之特性。
(ii-3)波長400 nm之分光穿透率為15%以下。
(ii-4)波長400 nm之分光穿透率為10%以下。
When the filter 1a makes light having a wavelength of 300 nm to 1200 nm incident on the filter 1a at incident angles of 0 °, 30 °, and 40 °, it is preferable to further satisfy the following condition (ii-3), and more It is desirable to further satisfy the following condition (ii-4). Since the filter 1a satisfies the condition (iii-1), the spectral transmittance at a wavelength of 450 nm is higher than 75%. Therefore, the condition that satisfies (iii-1) interacts with the condition that satisfies (ii-3), and more desirably, the condition (ii-4) interacts. In the region with a relatively short wavelength, a sharp breakthrough occurs from a lower transmission The change is a higher penetration of the transmission characteristics. This transmission characteristic is ideal as an optical filter.
(Ii-3) The spectral transmittance at a wavelength of 400 nm is 15% or less.
(Ii-4) The spectral transmittance at a wavelength of 400 nm is 10% or less.

濾光器1a係於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,較理想為於波長600 nm〜650 nm之範圍具有IR截止波長。於此情形時,於明視野下之人之比視感度曲線中,將比視感度之最大值設為1時之於波長600 nm〜650 nm之範圍內與0.5之比視感度對應之波長與IR截止波長接近。該情況係就濾光器1a之穿透特性與比視感度曲線之一致性之觀點而言較為理想。濾光器1a係於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,更理想為於波長610 nm〜640 nm之範圍具有IR截止波長。When the filter 1a makes light having a wavelength of 300 nm to 1200 nm incident on the filter 1a at incident angles of 0 °, 30 °, and 40 °, it is preferable to have an IR cutoff in a wavelength range of 600 nm to 650 nm. wavelength. In this case, in the specific sensitivity curve of a person in a bright field of view, the wavelength corresponding to the specific sensitivity of 0.5 in the range of 600 nm to 650 nm and a wavelength of 0.5 when the maximum value of the specific sensitivity is set to 1 The IR cutoff wavelength is close. This case is preferable from the viewpoint of the consistency between the transmission characteristics of the filter 1a and the specific sensitivity curve. When the filter 1a makes light having a wavelength of 300 nm to 1200 nm incident on the filter 1a at incident angles of 0 °, 30 °, and 40 °, it is more desirable to have an IR cutoff in the range of 610 nm to 640 nm. wavelength.

濾光器1a係於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,較理想為於400 nm〜430 nm之波長範圍具有UV截止波長。就有效地屏蔽有對攝像元件或濾色器之性能劣化造成影響之虞之紫外線、與補償對感度相對較低之藍色光(包含約450 nm附近之波長之光)之感度之平衡的觀點而言,有對UV截止波長存在於400 nm〜430 nm之波長範圍之要求。因此,較理想為於濾光器1a中,UV截止波長處於此種波長範圍。濾光器1a係於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,更理想為於405 nm〜430 nm之波長範圍具有UV截止波長。When the filter 1a makes light having a wavelength of 300 nm to 1200 nm incident on the filter 1a at incident angles of 0 °, 30 °, and 40 °, it is preferable to have a UV cutoff in a wavelength range of 400 nm to 430 nm. wavelength. From the viewpoint of effectively shielding the ultraviolet rays that may affect the performance degradation of the imaging element or color filter, and the compensation of the sensitivity to the relatively low sensitivity blue light (including light with a wavelength of about 450 nm), In other words, there is a requirement that the UV cut-off wavelength exists in a wavelength range of 400 nm to 430 nm. Therefore, it is preferable that the UV cutoff wavelength in the filter 1a is in such a wavelength range. When the filter 1a makes light having a wavelength of 300 nm to 1200 nm incident on the filter 1a at incident angles of 0 °, 30 °, and 40 °, it is more desirable to have UV cutoff in a wavelength range of 405 nm to 430 nm. wavelength.

於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至濾光器1a時,較理想為IR截止波長與UV截止波長之差為200 nm以上。藉此,屬於可見光區域之光之光量增加,所獲得之圖像之亮度理想地增大。When the light having a wavelength of 300 nm to 1200 nm is incident on the filter 1a at incidence angles of 0 °, 30 °, and 40 °, the difference between the IR cutoff wavelength and the UV cutoff wavelength is preferably 200 nm or more. Thereby, the amount of light of the light belonging to the visible light region is increased, and the brightness of the obtained image is desirably increased.

將光之入射角度為θ°時之波長λ之濾光器1a之分光穿透率表示為Tθ (λ)。將波長λ之變域之最小值及最大值分別表示為λ1[nm]及λ2[nm]。將波長λ以0以上之整數n之函數表示為λ(n)=(∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ×n+λ1)[nm]。∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ之值為正常數,於本說明書中,∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ=1。即,λ(n)係以1 nm間隔而確定。於∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ為1以外之正常數之情形時,基於λ(n)之分光穿透率Tθ (λ)可藉由線性內插而求出。於濾光器1a中,較理想為IEθ1/θ2 λ1 λ2 滿足下述表(I)所示之條件。IEθ1/θ2 λ1 λ2 係針對選自0°、30°及40°中之2個入射角度θ1°及θ2°(θ1<θ2),於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域,由下述式(1)定義。The spectral transmittance of the filter 1a at the wavelength λ when the incident angle of light is θ ° is represented as T θ (λ). The minimum and maximum values of the variable range of the wavelength λ are expressed as λ1 [nm] and λ2 [nm], respectively. The function of the wavelength λ with an integer n above 0 is expressed as λ (n) = (Other fonts are used in the ∆ file, please adjust the font (please set the Chinese character to the new detail style, and the English character to the Times New Roman) Λ × n + λ1) [nm]. ∆ There are other fonts used in the document, please adjust the font (Please set the Chinese characters to the new detail style, and the English characters to the Times New Roman). The value of λ is a normal number. In this manual, other fonts are used in the ∆ file. Please adjust the fonts (please set the Chinese characters to the new detail style and the English characters to the Times New Roman type). λ = 1. That is, λ (n) is determined at 1 nm intervals. There are other fonts used in the ∆ file. Please adjust the font (for Chinese characters, please set the new detail style, for English characters, please set it to Times New Roman). When λ is a normal number other than 1, the spectral transmittance T θ (λ) based on λ (n) can be obtained by linear interpolation. In the filter 1a, it is preferable that IE θ1 / θ2 λ1 to λ2 satisfy the conditions shown in the following Table (I). IE θ1 / θ2 λ1 to λ2 are the variable domains of the wavelengths λ at λ1 = 350 and λ2 = 800 for two incident angles θ1 ° and θ2 ° (θ1 <θ2) selected from 0 °, 30 °, and 40 ° , The variable domains of the wavelength λ of λ1 = 380 and λ2 = 530, the variable domains of the wavelength λ1 of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750, from The formula (1) is defined.

[表1]
[Table 1]

入射至攝像裝置之攝像元件之中央之主光線的入射角度接近0°,入射至攝像元件之周邊部之主光線之入射角度較大。於搭載如分光感度曲線或穿透率光譜之態樣因光之入射角度而產生變化之濾光器的情形時,於顯示或印刷由攝像裝置所生成之圖像之情形時,圖像之色調可能會發生變化。因此,於顯示或印刷由攝像裝置所拍攝之圖像之情形時,應為相同之顏色之被攝體之顏色自中心部向周邊部變化,可識別為色不均。與和光之入射角度之0°至40°之變化、及光之入射角度之0°至30°之變化對應的圖像之區域相比,與光之入射角度之30°至40°之變化對應的圖像之區域較窄,於該區域更容易識別色不均。因此,即便光對濾光器之入射角度發生變化,若濾光器之分光穿透率曲線之形狀之變化較小,則由攝像裝置所生成之圖像亦不易產生色不均。由於濾光器1a滿足表(I)所示之條件,故而即便光之入射角度發生變化,分光穿透率曲線之形狀之變化亦較小,藉由攝像裝置具備此種濾光器1a,可有效地防止由攝像裝置所生成之圖像產生色不均。再者,λ1=350及λ2=800之波長λ之變域係與包含可見光線全域之波長範圍對應。另一方面,λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域分別與穿透搭載於彩色影像感測器之藍色(BLue:B)之濾色器、綠色(Green:G)之濾色器及紅色(Red:R)之濾色器的光線之波長範圍對應。於濾光器1a中,由於滿足表(I)所示之條件,故而濾光器1a可評價為容易與攝像裝置所使用之濾色器之特性適配。The incident angle of the main ray incident to the center of the imaging element of the imaging device is close to 0 °, and the incident angle of the main ray incident to the peripheral portion of the imaging element is large. When equipped with a filter such as the spectral sensitivity curve or transmittance spectrum that changes due to the incident angle of light, when displaying or printing an image generated by an imaging device, the color tone of the image Subject to change. Therefore, when displaying or printing an image captured by an imaging device, the color of a subject that should be the same color changes from the center portion to the peripheral portion, and it can be recognized as color unevenness. Corresponds to a change in the range of 30 ° to 40 ° of the incident angle of light compared to a change in the angle of incidence of light from 0 ° to 40 ° and a change in the incident angle of light of 0 ° to 30 ° The area of the image is narrower, and color unevenness is more easily recognized in this area. Therefore, even if the incident angle of light to the filter is changed, if the shape of the spectral transmittance curve of the filter is small, the image generated by the imaging device is unlikely to produce color unevenness. Since the filter 1a satisfies the conditions shown in Table (I), even if the incident angle of light changes, the shape of the spectral transmittance curve changes little. With the imaging device having such a filter 1a, it is possible to Effectively prevent color unevenness in the image generated by the imaging device. In addition, the variable domain of the wavelength λ of λ1 = 350 and λ2 = 800 corresponds to a wavelength range including the entire range of visible light. On the other hand, the variable domains of the wavelength λ of λ1 = 380 and λ2 = 530, the variable domains of the wavelength λ1 of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 respectively. The wavelength range of light of the blue (BLue: B) color filter, the green (Green: G) color filter, and the red (Red: R) color filter mounted on the color image sensor corresponds. In the filter 1a, since the conditions shown in Table (I) are satisfied, the filter 1a can be evaluated as being easily adapted to the characteristics of the color filter used in the imaging device.

如式(1)所示,IEθ1/θ2 λ1 λ2 係於λ1 nm〜λ2 nm之波長範圍內積分自選自0°及30°中之入射角度θ1°之分光穿透率Tθ1 (λ)減去選自30°及40°中之入射角度θ2°(θ1<θ2)之分光穿透率Tθ2 (λ)的差而確定。因此,藉由參照IEθ1/θ2 λ1 λ2 ,可定量地評價入射角度自θ1°變化為θ2°之情形時之λ1[nm]≦波長λ≦λ2[nm]之範圍內之分光穿透率曲線的形狀變化。As shown in formula (1), IE θ1 / θ2 λ1 to λ2 are integrated in the wavelength range of λ1 nm to λ2 nm from the spectral transmittance T θ1 (λ) integrated from the incident angle θ1 ° selected from 0 ° and 30 °. It is determined by subtracting the difference in the spectral transmittance T θ2 (λ) of the incident angle θ2 ° (θ1 <θ2) selected from 30 ° and 40 °. Therefore, by referring to IE θ1 / θ2 λ1 to λ2 , the spectral transmittance in the range of λ1 [nm] ≦ wavelength λ ≦ λ2 [nm] when the incident angle changes from θ1 ° to θ2 ° can be quantitatively evaluated. The shape of the curve changes.

於濾光器1a中,較理想為IAEθ1/θ2 λ1 λ2 滿足下述表(II)所示之條件。IAEθ1/θ2 λ1 λ2 係針對選自0°、30°及40°中之2個入射角度θ1°及θ2°(θ1<θ2),於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域,由下述式(2)定義。In the filter 1a, it is preferable that IAE θ1 / θ2 λ1 to λ2 satisfy the conditions shown in Table (II) below. IAE θ1 / θ2 λ1 to λ2 are the variable domains of the wavelengths λ at λ1 = 350 and λ2 = 800 for two incident angles θ1 ° and θ2 ° (θ1 <θ2) selected from 0 °, 30 °, and 40 ° , The variable domains of the wavelength λ of λ1 = 380 and λ2 = 530, the variable domains of the wavelength λ1 of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750, as follows Formula (2) definition.

[表2]
[Table 2]

如式(2)所示,IAEθ1/θ2 λ1 λ2 係於λ1 nm〜λ2 nm之波長範圍內積分自選自0°及30°中之入射角度θ1°之分光穿透率Tθ1 (λ)減去選自30°及40°中之入射角度θ2°(θ1<θ2)之分光穿透率Tθ2 (λ)之差的絕對值而確定。僅於藉由IEθ1/θ2 λ1 λ2 進行之評價中,可能於λ1 nm〜λ2 nm之波長範圍內,自Tθ1 (λ)減去Tθ2 (λ)之差為負之波段中之累計值由其差為正之另一波段中之累計值相抵,亦可能會有難以適當地特定濾光器之特性之情形。但是,藉由亦參照IAEθ1/θ2 λ1 λ2 ,可更適當地評價濾光器1a。As shown in equation (2), IAE θ1 / θ2 λ1 to λ2 are integrated in the wavelength range of λ1 nm to λ2 nm from the spectral transmittance T θ1 (λ) of the incident angle θ1 ° selected from 0 ° and 30 °. It is determined by subtracting the absolute value of the difference between the spectral transmittance T θ2 (λ) of the incident angle θ2 ° (θ1 <θ2) selected from 30 ° and 40 °. Only in the evaluation performed by IE θ1 / θ2 λ1 to λ2 , it is possible to accumulate the difference in the wavelength range from λ1 nm to λ2 nm from T θ1 (λ) minus T θ2 (λ) in the negative band The value is offset by the cumulative value in another band whose difference is positive, and it may be difficult to properly specify the characteristics of the filter. However, the filter 1a can be evaluated more appropriately by also referring to IAE θ1 / θ2 λ1 to λ2 .

於濾光器1a中,較理想為ISEθ1/θ2 λ1 λ2 滿足下述表(III)所示之條件。ISEθ1/θ2 λ1 λ2 係針對選自0°、30°及40°中之2個入射角度θ1°及θ2°(θ1<θ2),於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域,由下述式(3)定義。In the filter 1a, it is preferable that ISE θ1 / θ2 λ1 to λ2 satisfy the conditions shown in the following Table (III). ISE θ1 / θ2 λ1 ~ λ2 are the variable domains of the wavelengths λ at λ1 = 350 and λ2 = 800 for two incident angles θ1 ° and θ2 ° (θ1 <θ2) selected from 0 °, 30 ° and 40 ° , The variable domains of the wavelength λ of λ1 = 380 and λ2 = 530, the variable domains of the wavelength λ1 of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750, as follows Formula (3) is defined.

[表3]
[table 3]

如式(3)所示,ISEθ1/θ2 λ1 λ2 係於λ1 nm〜λ2 nm之波長範圍內積分自選自0°及30°中之入射角度θ1°之分光穿透率Tθ1 (λ)減去選自30°及40°中之入射角度θ2°(θ1<θ2)之分光穿透率Tθ2 (λ)之差(穿透率差)的平方值而確定。如上所述,僅於藉由IEθ1/θ2 λ1 λ2 進行之評價中,亦可能會有難以適當地特定濾光器之特性之情形。又,於藉由IAEθ1/θ2 λ1 λ2 進行之評價中,無法適當地評價入射角度間之穿透率差於較廣之波長範圍內緩慢變化之情形與於較窄之波長範圍內因波紋之產生等而急遽變化之情形的不同。但是,藉由將積分穿透率差之平方值而確定之ISEθ1/θ2 λ1 λ2 作為指標,可加強急遽之穿透率變化,特定而排除對畫質之影響更大之後者之圖案。因此,可更適當地評價濾光器1a。As shown in equation (3), ISE θ1 / θ2 λ1 to λ2 are integrated in the wavelength range of λ1 nm to λ2 nm from the spectral transmittance T θ1 (λ) integrated from the incident angle θ1 ° selected from 0 ° and 30 °. It is determined by subtracting the square of the difference (transmittance difference) in the spectral transmittance T θ2 (λ) of the incident angle θ2 ° (θ1 <θ2) selected from 30 ° and 40 °. As described above, in the evaluation performed by IE θ1 / θ2 λ1 to λ2 , it may be difficult to properly specify the characteristics of the filter. In addition, in the evaluation performed by IAE θ1 / θ2 λ1 to λ2 , it is not possible to properly evaluate the case where the transmittance difference between the incident angles changes slowly over a wide wavelength range and the ripple due to the narrow wavelength range. Different situations that produce rapid changes. However, the ISE θ1 / θ2 λ1 ~ λ2 , which is determined by using the squared value of the integral transmittance difference as an index, can strengthen the sharp transmittance change and specifically exclude the latter pattern that has a greater impact on image quality. Therefore, the filter 1a can be evaluated more appropriately.

只要光吸收層10中所含有之光吸收劑吸收近紅外線區域之至少一部分光,濾光器1a滿足上述(i-1)〜(ix-1)之條件,則並無特別限制。光吸收層10中所含有之光吸收劑較理想為以濾光器1a進而滿足(i-2)、(ii-2)、(iv-2)、(vi-2)、(vii-2)及(viii-2)之條件之方式確定。又,光吸收層10中所含有之光吸收劑較理想為以濾光器1a滿足表(I)、表(II)及表(III)中之至少一者所示之條件的方式確定。光吸收劑例如由膦酸及銅離子形成。於此情形時,藉由光吸收層10,可於近紅外線區域及與近紅外線區域鄰接之可見光區域之廣泛之波段吸收光。因此,濾光器1a即便不具備反射膜,亦可發揮所需之特性。又,即便於濾光器1a具備反射膜之情形時,亦可以由該反射膜反射之光線之波段充分地遠離應穿透之光線之波段的方式設計濾光器1a。例如可將由反射膜反射之光線之波段設定為距隨著波長之增加而穿透率急遽減少之躍遷區域之波段長100 nm以上的波段。藉此,即便光之入射角度較大,由反射膜反射之光線之波段向短波長側偏移,亦與由光吸收層10吸收之光線之波段重疊,濾光器1a之躍遷區域中之穿透率特性不易相對於光之入射角度之變化而變動。除此以外,藉由光吸收層10,可於紫外線區域之波段之廣泛之範圍內吸收光。As long as the light absorber contained in the light absorption layer 10 absorbs at least a part of light in the near-infrared region, the filter 1a satisfies the conditions (i-1) to (ix-1) described above, and is not particularly limited. The light absorbing agent contained in the light absorbing layer 10 preferably satisfies (i-2), (ii-2), (iv-2), (vi-2), (vii-2) with the filter 1a. And (viii-2). The light absorbing agent contained in the light absorbing layer 10 is preferably determined so that the filter 1a satisfies the conditions shown in at least one of Table (I), Table (II), and Table (III). The light absorber is formed of, for example, phosphonic acid and copper ions. In this case, the light absorption layer 10 can absorb light in a wide range of wavelengths in the near-infrared region and the visible light region adjacent to the near-infrared region. Therefore, the filter 1a can exhibit desired characteristics even if it does not include a reflective film. Moreover, even when the filter 1a is provided with a reflective film, the filter 1a can be designed such that the wavelength band of the light reflected by the reflective film is sufficiently far from the wavelength band of the light to be transmitted. For example, the wavelength band of the light reflected by the reflective film can be set to a wavelength band of more than 100 nm from the wavelength band of the transition region where the transmittance sharply decreases as the wavelength increases. Thereby, even if the incident angle of the light is large, the wavelength band of the light reflected by the reflection film is shifted to the short wavelength side, and it also overlaps with the wavelength band of the light absorbed by the light absorption layer 10, and passes through the transition area of the filter 1a. The transmittance characteristics are not easily changed with the change of the incident angle of light. In addition, the light absorbing layer 10 can absorb light over a wide range of wavelengths in the ultraviolet region.

於光吸收層10包含由膦酸及銅離子所形成之光吸收劑之情形時,該膦酸例如包含具有芳基之第一膦酸。於第一膦酸中,芳基鍵結於磷原子。藉此,於濾光器1a中,容易滿足上述條件。When the light absorbing layer 10 includes a light absorber formed of phosphonic acid and copper ions, the phosphonic acid includes, for example, a first phosphonic acid having an aryl group. In the first phosphonic acid, an aryl group is bonded to a phosphorus atom. Thereby, in the filter 1a, it is easy to satisfy the above-mentioned conditions.

第一膦酸所具有之芳基例如為苯基、苄基、甲苯甲醯基、硝基苯基、羥基苯基、苯基中之至少1個氫原子經鹵素原子取代之鹵化苯基、或苄基之苯環上之至少1個氫原子經鹵素原子取代之鹵化苄基。The aryl group of the first phosphonic acid is, for example, a phenyl group, a benzyl group, a tolylmethyl group, a nitrophenyl group, a hydroxyphenyl group, a halogenated phenyl group in which at least one hydrogen atom of the phenyl group is substituted with a halogen atom, or A benzyl halide group in which at least one hydrogen atom on the benzene ring of a benzyl group is substituted with a halogen atom.

於光吸收層10包含由膦酸及銅離子所形成之光吸收劑之情形時,該膦酸較理想為進而包含具有烷基之第二膦酸。於第二膦酸中,烷基鍵結於磷原子。When the light absorbing layer 10 includes a light absorber formed of phosphonic acid and copper ions, the phosphonic acid preferably further includes a second phosphonic acid having an alkyl group. In the second phosphonic acid, the alkyl group is bonded to a phosphorus atom.

第二膦酸所具有之烷基例如為具有6個以下之碳原子之烷基。該烷基可具有直鏈及支鏈中之任一者。The alkyl group possessed by the second phosphonic acid is, for example, an alkyl group having 6 or less carbon atoms. The alkyl group may have any of a straight chain and a branched chain.

於光吸收層10包含由膦酸及銅離子所形成之光吸收劑之情形時,光吸收層10較理想為進而包含使光吸收劑分散之磷酸酯、及基質樹脂。When the light absorbing layer 10 includes a light absorbing agent formed of phosphonic acid and copper ions, the light absorbing layer 10 preferably further includes a phosphate ester and a matrix resin in which the light absorbing agent is dispersed.

光吸收層10中所含有之磷酸酯只要可使光吸收劑適當地分散,則並無特別限制,例如包含下述式(c1)所表示之磷酸二酯及下述式(c2)所表示之磷酸單酯中之至少一者。於下述式(c1)及下述式(c2)中,R21 、R22 及R3 分別為-(CH2 CH2 O)n R4 所表示之一價官能基,n為1〜25之整數,R4 表示碳數6〜25之烷基。R21 、R22 及R3 係相互相同或不同之種類之官能基。

The phosphoric acid ester contained in the light absorbing layer 10 is not particularly limited as long as it can appropriately disperse the light absorbing agent. For example, the phosphoric acid ester represented by the following formula (c1) and the following formula (c2) are included. At least one of phosphate monoesters. In the following formula (c1) and (c2), R 21 , R 22, and R 3 are each a monovalent functional group represented by-(CH 2 CH 2 O) n R 4 , and n is 1 to 25. An integer, R 4 represents an alkyl group having 6 to 25 carbon atoms. R 21 , R 22 and R 3 are functional groups which are the same or different from each other.

磷酸酯並無特別限制,例如可為Plysurf A208N:聚氧乙烯烷基(C12、C13)醚磷酸酯、Plysurf A208F:聚氧乙烯烷基(C8)醚磷酸酯、Plysurf A208B:聚氧乙烯月桂醚磷酸酯、Plysurf A219B:聚氧乙烯月桂醚磷酸酯、Plysurf AL:聚氧乙烯苯乙烯化苯醚磷酸酯、Plysurf A212C:聚氧乙烯十三烷基醚磷酸酯、或Plysurf A215C:聚氧乙烯十三烷基醚磷酸酯。該等均為第一工業製藥公司製造之製品。又,磷酸酯可為NIKKOL DDP-2:聚氧乙烯烷基醚磷酸酯、NIKKOL DDP-4:聚氧乙烯烷基醚磷酸酯、或NIKKOL DDP-6:聚氧乙烯烷基醚磷酸酯。該等均為Nikko Chemicals公司製造之製品。The phosphate is not particularly limited, and may be, for example, Plysurf A208N: polyoxyethylene alkyl (C12, C13) ether phosphate, Plysurf A208F: polyoxyethylene alkyl (C8) ether phosphate, Plysurf A208B: polyoxyethylene lauryl ether Phosphate, Plysurf A219B: Polyoxyethylene lauryl ether phosphate, Plysurf AL: Polyoxyethylene styrenated phenyl ether phosphate, Plysurf A212C: Polyoxyethylene tridecyl ether phosphate, or Plysurf A215C: Polyoxyethylene ten Trialkyl ether phosphate. These are all products manufactured by First Industrial Pharmaceuticals. The phosphate ester may be NIKKOL DDP-2: polyoxyethylene alkyl ether phosphate, NIKKOL DDP-4: polyoxyethylene alkyl ether phosphate, or NIKKOL DDP-6: polyoxyethylene alkyl ether phosphate. These are manufactured by Nikko Chemicals.

光吸收層10中所包含之基質樹脂例如為可使光吸收劑分散,可進行熱硬化或紫外線硬化之樹脂。進而,作為基質樹脂,可使用於藉由該樹脂形成0.1 mm之樹脂層之情形時,該樹脂層對波長350 nm〜900 nm之光之穿透率例如為80%以上、較佳為85%以上、更佳為90%以上之樹脂,但只要於濾光器1a中滿足上述(i-1)〜(ix-1)之條件,則並無特別限制。基質樹脂較理想為以濾光器1a進而滿足上述(i-2)、(ii-2)、(iv-2)、(vi-2)、(vii-2)及(viii-2)之條件之方式確定。又,基質樹脂較理想為以濾光器1a滿足表(I)、表(II)及表(III)中之至少一者所示之條件之方式確定。光吸收層10中之膦酸之含量例如相對於基質樹脂100質量份為3〜180質量份。The matrix resin contained in the light absorbing layer 10 is, for example, a resin capable of dispersing a light absorbing agent and being heat-curable or ultraviolet-curable. Furthermore, when the resin is used as a matrix resin to form a resin layer of 0.1 mm, the resin layer has a transmittance of, for example, 80% or more, and preferably 85%, for light having a wavelength of 350 nm to 900 nm. The above, more preferably 90% or more of the resin is not particularly limited as long as the conditions (i-1) to (ix-1) described above are satisfied in the filter 1a. The matrix resin preferably satisfies the conditions (i-2), (ii-2), (iv-2), (vi-2), (vii-2), and (viii-2) with the filter 1a. The way is ok. The matrix resin is preferably determined so that the filter 1a satisfies the conditions shown in at least one of Table (I), Table (II), and Table (III). The content of the phosphonic acid in the light absorbing layer 10 is, for example, 3 to 180 parts by mass based on 100 parts by mass of the matrix resin.

光吸收層10中所包含之基質樹脂只要滿足上述特性,則並無特別限定,例如為(聚)烯烴樹脂、聚醯亞胺樹脂、聚乙烯醇縮丁醛樹脂、聚碳酸酯樹脂、聚醯胺樹脂、聚碸樹脂、聚醚碸樹脂、聚醯胺醯亞胺樹脂、(改質)丙烯酸樹脂、環氧樹脂或聚矽氧樹脂。基質樹脂係可包含苯基等芳基,較理想為包含苯基等芳基之聚矽氧樹脂。若光吸收層10較硬(剛性),則隨著該光吸收層10之厚度增加,於濾光器1a之製造步驟中容易因硬化收縮而產生龜裂。若基質樹脂為包含芳基之聚矽氧樹脂,則光吸收層10容易具有良好之耐龜裂性。又,若使用包含芳基之聚矽氧樹脂,則於含有上述由膦酸及銅離子所形成之光吸收劑之情形時,光吸收劑不易凝聚。進而,於光吸收層10之基質樹脂為包含芳基之聚矽氧樹脂之情形時,較理想為光吸收層10中所包含之磷酸酯如式(c1)或式(c2)所表示之磷酸酯般具有氧烷基等具有柔軟性之直鏈有機官能基。其原因在於藉由基於上述膦酸、包含芳基之聚矽氧樹脂、及具有氧烷基等直鏈有機官能基之磷酸酯之組合之相互作用,光吸收劑不易凝聚,且可給光吸收層帶來良好之剛性及良好之柔軟性。作為用作基質樹脂之聚矽氧樹脂之具體例,可列舉:KR-255、KR-300、KR-2621-1、KR-211、KR-311、KR-216、KR-212及KR-251。該等均為信越化學工業公司製造之聚矽氧樹脂。The matrix resin included in the light absorbing layer 10 is not particularly limited as long as it satisfies the above characteristics, and examples thereof include (poly) olefin resins, polyimide resins, polyvinyl butyral resins, polycarbonate resins, and polyfluorenes. Amine resin, polyfluorene resin, polyether resin, polyimide resin, (modified) acrylic resin, epoxy resin or silicone resin. The matrix resin may contain an aryl group such as a phenyl group, and is preferably a polysiloxane resin containing an aryl group such as a phenyl group. If the light absorbing layer 10 is hard (rigid), as the thickness of the light absorbing layer 10 increases, cracks are likely to occur due to hardening and shrinkage during the manufacturing process of the filter 1a. When the matrix resin is a silicone resin containing an aryl group, the light absorbing layer 10 easily has good crack resistance. In addition, when a polysiloxane resin containing an aryl group is used, the light absorber is less likely to aggregate when the light absorber formed from the phosphonic acid and copper ions described above is contained. Further, when the matrix resin of the light absorption layer 10 is a polysiloxane resin containing an aryl group, it is more preferable that the phosphoric acid ester contained in the light absorption layer 10 is a phosphoric acid represented by the formula (c1) or (c2). The ester has a flexible linear organic functional group such as an oxyalkyl group. The reason is that, based on the combination of the above-mentioned phosphonic acid, a polysiloxane resin containing an aryl group, and a phosphate ester having a linear organic functional group such as an oxyalkyl group, the light absorber is not easy to aggregate and can absorb light. The layer brings good rigidity and good softness. Specific examples of the silicone resin used as the matrix resin include KR-255, KR-300, KR-2621-1, KR-211, KR-311, KR-216, KR-212, and KR-251. . These are silicone resins manufactured by Shin-Etsu Chemical Industry Co., Ltd.

如圖1A所示,濾光器1a例如進而具備透明介電基板20。透明介電基板20之一主面經光吸收層10覆蓋。關於透明介電基板20之特性,只要於濾光器1a中滿足上述(i-1)〜(ix-1)之條件,則並無特別限制。透明介電基板20較理想為具有如濾光器1a進而滿足(i-2)、(ii-2)、(iv-2)、(vi-2)、(vii-2)及(viii-2)之條件之特性。又,透明介電基板20較理想為具有如濾光器1a滿足表(I)、表(II)及表(III)中之至少一者所示之條件之特性。透明介電基板20例如為於450 nm〜600 nm具有較高之平均穿透率(例如為80%以上,較佳為85%以上,更佳為90%以上)之介電基板。As shown in FIG. 1A, the filter 1 a further includes, for example, a transparent dielectric substrate 20. One of the main surfaces of the transparent dielectric substrate 20 is covered by the light absorbing layer 10. The characteristics of the transparent dielectric substrate 20 are not particularly limited as long as the conditions (i-1) to (ix-1) described above are satisfied in the filter 1a. The transparent dielectric substrate 20 preferably has, for example, the filter 1a and further satisfies (i-2), (ii-2), (iv-2), (vi-2), (vii-2), and (viii-2). ) Conditions. The transparent dielectric substrate 20 preferably has characteristics such that the filter 1a satisfies the conditions shown in at least one of Table (I), Table (II), and Table (III). The transparent dielectric substrate 20 is, for example, a dielectric substrate having a high average transmittance (for example, 80% or more, preferably 85% or more, and more preferably 90% or more) at 450 nm to 600 nm.

透明介電基板20例如為玻璃製或樹脂製。於透明介電基板20為玻璃製之情形時,該玻璃例如為D263 T eco等硼矽酸玻璃、鈉鈣玻璃(藍板)、B270等白板玻璃、無鹼玻璃、或者含有銅之磷酸鹽玻璃或含有銅之氟磷酸鹽玻璃等紅外線吸收性玻璃。於透明介電基板20為含有銅之磷酸鹽玻璃或含有銅之氟磷酸鹽玻璃等紅外線吸收性玻璃之情形時,藉由透明介電基板20所具有之紅外線吸收性能與光吸收層10所具有之紅外線吸收性能之組合,可給濾光器1a帶來所需之紅外線吸收性能。此種紅外線吸收性玻璃例如為SCHOTT公司製造之BG-60、BG-61、BG-62、BG-63或BG-67,為日本電氣硝子公司製造之500EXL,或者為HOYA公司製造之CM5000、CM500、C5000或C500S。又,透明介電基板20亦可具有紫外線吸收特性。The transparent dielectric substrate 20 is made of glass or resin, for example. When the transparent dielectric substrate 20 is made of glass, the glass is, for example, borosilicate glass such as D263 T eco, soda lime glass (blue plate), white glass such as B270, alkali-free glass, or phosphate glass containing copper. Or infrared-absorbing glass such as copper-containing fluorophosphate glass. When the transparent dielectric substrate 20 is an infrared absorbing glass such as copper-containing phosphate glass or copper-containing fluorophosphate glass, the infrared absorption performance of the transparent dielectric substrate 20 and the light absorption layer 10 have The combination of infrared absorption performance can bring the required infrared absorption performance to the filter 1a. Such infrared-absorbing glass is, for example, BG-60, BG-61, BG-62, BG-63, or BG-67 manufactured by SCHOTT, 500EXL manufactured by Japan Electric Glass Co., Ltd., or CM5000, CM500 manufactured by HOYA Corporation. , C5000 or C500S. The transparent dielectric substrate 20 may have ultraviolet absorption characteristics.

透明介電基板20亦可為氧化鎂、藍寶石或石英等具有透明性之結晶性之基板。例如藍寶石由於為高硬度,故而不易損傷。因此,板狀之藍寶石有作為耐擦傷性之保護材料(亦有時稱為保護濾光器或覆蓋玻璃),配置於智慧型手機及行動電話等行動終端所具備之相機模組或透鏡之前面之情形。藉由於此種板狀之藍寶石上形成光吸收層10,可保護相機模組及透鏡,並且有效地截止波長650 nm〜1100 nm之光。無須將具備波長650 nm〜1100 nm之紅外線之屏蔽性之濾光器配置於CCD(Charge-Coupled Device)感測器及CMOS(Complementary Metal Oxide Semiconductor)感測器等攝像元件之周邊或相機模組之內部。因此,若於板狀之藍寶石上形成光吸收層10,則可有助於相機模組或攝像裝置之低高度化。The transparent dielectric substrate 20 may be a transparent crystalline substrate such as magnesium oxide, sapphire, or quartz. For example, sapphire is not easily damaged due to its high hardness. Therefore, the plate-shaped sapphire has a scratch-resistant protective material (also sometimes referred to as a protective filter or cover glass), which is arranged in front of the camera module or lens provided in mobile terminals such as smart phones and mobile phones. Situation. By forming the light absorbing layer 10 on such a plate-like sapphire, the camera module and the lens can be protected, and light with a wavelength of 650 nm to 1100 nm can be effectively cut off. It is not necessary to place a filter with infrared shielding wavelength of 650 nm to 1100 nm on the periphery of a camera element such as a CCD (Charge-Coupled Device) sensor or a CMOS (Complementary Metal Oxide Semiconductor) sensor or a camera module Inside. Therefore, if the light absorbing layer 10 is formed on the plate-shaped sapphire, the height of the camera module or the imaging device can be reduced.

於透明介電基板20為樹脂製之情形時,該樹脂例如為(聚)烯烴樹脂、聚醯亞胺樹脂、聚乙烯醇縮丁醛樹脂、聚碳酸酯樹脂、聚醯胺樹脂、聚碸樹脂、聚醚碸樹脂、聚醯胺醯亞胺樹脂、(改質)丙烯酸樹脂、環氧樹脂或聚矽氧樹脂。When the transparent dielectric substrate 20 is made of resin, the resin is, for example, a (poly) olefin resin, a polyimide resin, a polyvinyl butyral resin, a polycarbonate resin, a polyimide resin, or a polyimide resin. , Polyether 碸 resin, poly 、 amine (imine resin, (modified) acrylic resin, epoxy resin or polysiloxane resin.

濾光器1a例如可藉由將用以形成光吸收層10之塗覆液塗佈於透明介電基板20之一主面而形成塗膜,使該塗膜乾燥而製造。以光吸收層10包含由膦酸及銅離子所形成之光吸收劑之情形為例,說明塗覆液之製備方法及濾光器1a之製造方法。The optical filter 1 a can be manufactured, for example, by applying a coating liquid for forming the light absorbing layer 10 on one of the main surfaces of the transparent dielectric substrate 20 to form a coating film, and drying the coating film. Taking the case where the light absorbing layer 10 contains a light absorbing agent formed of phosphonic acid and copper ions as an example, the preparation method of the coating liquid and the manufacturing method of the optical filter 1a are described.

首先,說明塗覆液之製備方法之一例。將乙酸銅一水合物等銅鹽添加於四氫呋喃(THF)等特定之溶劑中進行攪拌,獲得銅鹽之溶液。其次,於該銅鹽之溶液中加入式(c1)所表示之磷酸二酯或式(c2)所表示之磷酸單酯等磷酸酯化合物進行攪拌,製備A液。又,將第一膦酸加入至THF等特定之溶劑中進行攪拌,製備B液。其次,一面攪拌A液,一面於A液中加入B液攪拌特定時間。其次,於該溶液中加入甲苯等特定之溶劑進行攪拌,獲得C液。其次,一面加溫C液一面進行特定時間脫溶劑處理,獲得D液。藉此,去除因THF等溶劑及乙酸(沸點:約118℃)等之銅鹽之解離所產生之成分,藉由第一膦酸及銅離子生成光吸收劑。加溫C液之溫度係基於自銅鹽解離之應去除之成分之沸點確定。再者,於脫溶劑處理中,用於獲得C液之甲苯(沸點:約110℃)等溶劑亦揮發。由於該溶劑較理想為於塗覆液中殘留某一程度,故而就該觀點而言,較佳為確定溶劑之添加量及脫溶劑處理之時間。再者,為了獲得C液,亦可使用鄰二甲苯(沸點:約144℃)代替甲苯。於此情形時,由於鄰二甲苯之沸點高於甲苯之沸點,故而可將添加量降低為甲苯之添加量之4分之1左右。可於D液中加入聚矽氧樹脂等基質樹脂進行攪拌而製備塗覆液。First, an example of a method for preparing a coating liquid will be described. A copper salt such as copper acetate monohydrate is added to a specific solvent such as tetrahydrofuran (THF) and stirred to obtain a solution of the copper salt. Next, a phosphoric acid ester compound such as a phosphoric acid diester represented by the formula (c1) or a phosphoric acid monoester represented by the formula (c2) is added to the solution of the copper salt and stirred to prepare liquid A. The first phosphonic acid was added to a specific solvent such as THF and stirred to prepare a liquid B. Next, while stirring liquid A, add liquid B to liquid A and stir for a specific time. Next, a specific solvent such as toluene was added to the solution and stirred to obtain a liquid C. Next, while the C liquid was heated, the solvent was removed for a specific time to obtain a D liquid. Thereby, components generated by dissociation of a copper salt such as a solvent such as THF and acetic acid (boiling point: about 118 ° C.) are removed, and a light absorber is generated by the first phosphonic acid and copper ions. The temperature of the heating C liquid is determined based on the boiling points of the components to be removed from the dissociation of the copper salt. Furthermore, in the solvent removal treatment, solvents such as toluene (boiling point: about 110 ° C.) used to obtain liquid C are also volatilized. Since the solvent is preferably left to a certain extent in the coating liquid, from this viewpoint, it is preferable to determine the amount of the solvent to be added and the time for the desolvation treatment. Moreover, in order to obtain liquid C, o-xylene (boiling point: about 144 ° C) may be used instead of toluene. In this case, since the boiling point of o-xylene is higher than the boiling point of toluene, the amount of addition can be reduced to about one-fourth of the amount of toluene. A coating resin can be prepared by adding a matrix resin such as silicone resin to the D liquid and stirring it.

將塗覆液塗佈於透明介電基板20之一主面而形成塗膜。例如藉由模嘴塗覆、旋轉塗覆、或利用點膠機之塗佈,將塗覆液塗佈於透明介電基板20之一主面而形成塗膜。其次,對該塗膜進行特定之加熱處理而使塗膜硬化。例如將該塗膜暴露於50℃〜200℃之溫度之環境中特定時間。A coating liquid is applied to one main surface of the transparent dielectric substrate 20 to form a coating film. For example, a coating film is formed by applying a coating liquid to one main surface of the transparent dielectric substrate 20 by die coating, spin coating, or coating using a dispenser. Next, the coating film is subjected to a specific heat treatment to harden the coating film. For example, the coating film is exposed to a temperature of 50 ° C to 200 ° C for a specific time.

於濾光器1a中,光吸收層10可形成為單一之層,亦可形成為多層。於光吸收層10形成為多層之情形時,光吸收層10例如具有:第一層,其含有由第一膦酸及銅離子所形成之光吸收劑;及第二層,其含有由第二膦酸及銅離子所形成之光吸收劑。於此情形時,用以形成第一層之塗覆液可如上所述般製備。另一方面,第二層係使用與用以形成第一層之塗覆液分開製備之塗覆液而形成。用以形成第二層之塗覆液例如可以如下方式製備。In the filter 1a, the light absorption layer 10 may be formed as a single layer or may be formed as a plurality of layers. When the light absorbing layer 10 is formed in multiple layers, the light absorbing layer 10 has, for example, a first layer containing a light absorbing agent formed of a first phosphonic acid and copper ions; and a second layer containing a second absorbing layer A light absorber formed by phosphonic acid and copper ions. In this case, the coating liquid used to form the first layer may be prepared as described above. On the other hand, the second layer is formed using a coating liquid prepared separately from the coating liquid used to form the first layer. The coating liquid for forming the second layer can be prepared, for example, as follows.

將乙酸銅一水合物等銅鹽添加於四氫呋喃(THF)等特定之溶劑中進行攪拌,獲得銅鹽之溶液。其次,於該銅鹽之溶液中加入式(c1)所表示之磷酸二酯或式(c2)所表示之磷酸單酯等磷酸酯化合物進行攪拌,製備E液。又,將第二膦酸加入至THF等特定之溶劑中進行攪拌,製備F液。其次,一面攪拌E液,一面於E液中加入F液攪拌特定時間。其次,於該溶液中加入甲苯等特定之溶劑進行攪拌,進而使溶劑揮發而獲得G液。其次,於G液中加入聚矽氧樹脂等基質樹脂進行攪拌,獲得用以形成第二層之塗覆液。A copper salt such as copper acetate monohydrate is added to a specific solvent such as tetrahydrofuran (THF) and stirred to obtain a solution of the copper salt. Next, a phosphoric acid ester compound such as a phosphoric acid diester represented by the formula (c1) or a phosphoric acid monoester represented by the formula (c2) is added to the copper salt solution and stirred to prepare an E solution. The second phosphonic acid was added to a specific solvent such as THF and stirred to prepare a liquid F. Next, while stirring the E liquid, add the F liquid to the E liquid and stir for a specific time. Next, a specific solvent such as toluene is added to the solution and stirred, and the solvent is volatilized to obtain a G solution. Next, a matrix resin such as silicone resin is added to the G liquid and stirred to obtain a coating liquid for forming a second layer.

塗佈用以形成第一層之塗覆液及用以形成第二層之塗覆液而形成塗膜,對該塗膜進行特定之加熱處理而使塗膜硬化,藉此可形成第一層及第二層。例如將該塗膜暴露於50℃〜200℃之溫度之環境中特定時間。形成第一層及第二層之順序並無特別限制,第一層及第二層可於不同之時間形成,亦可於相同之時間形成。又,可於第一層與第二層之間形成保護層。保護層例如藉由SiO2 之蒸鍍膜形成。The coating liquid for forming the first layer and the coating liquid for forming the second layer are applied to form a coating film, and the coating film is subjected to a specific heat treatment to harden the coating film, thereby forming the first layer. And the second floor. For example, the coating film is exposed to a temperature of 50 ° C to 200 ° C for a specific time. The order of forming the first layer and the second layer is not particularly limited, and the first layer and the second layer may be formed at different times or may be formed at the same time. A protective layer may be formed between the first layer and the second layer. The protective layer is formed by, for example, a vapor-deposited film of SiO 2 .

<變化例>
濾光器1a可根據各種觀點而變更。例如濾光器1a可分別變更為圖1B〜圖1F所示之濾光器1b〜1f。濾光器1b〜1f係除特別說明之情形以外,以與濾光器1a相同之方式構成。對與濾光器1a之構成要素相同或對應之濾光器1b〜1f之構成要素標註相同之符號,省略詳細之說明。與濾光器1a相關之說明只要技術上不矛盾,則亦適用於濾光器1b〜1f。
< Modifications >
The filter 1a can be changed according to various viewpoints. For example, the filter 1a may be changed to the filters 1b to 1f shown in FIGS. 1B to 1F, respectively. The filters 1b to 1f are configured in the same manner as the filter 1a except for the case where it is specifically described. The constituent elements of the filters 1b to 1f that are the same as or correspond to the constituent elements of the filter 1a are denoted by the same reference numerals, and detailed descriptions are omitted. The description related to the filter 1a is also applicable to the filters 1b to 1f as long as there is no technical contradiction.

如圖1B所示,於濾光器1b中,於透明介電基板20之兩主面上形成光吸收層10。藉此,藉由2層光吸收層10而非藉由1層光吸收層10,滿足上述(i-1)〜(ix-1)之條件,較理想為進而滿足上述(i-2)、(ii-2)、(iv-2)、(vi-2)、(vii-2)及(viii-2)之條件,較理想為滿足表(I)、表(II)及表(III)中之至少一者所示之條件。透明介電基板20之兩主面上之光吸收層10之厚度可相同,亦可不同。即,濾光器1b係以均等或不均等地分配為了獲得所需之光學特性所需之光吸收層10之厚度的方式,於透明介電基板20之兩主面上形成光吸收層10。藉此,形成於濾光器1b之透明介電基板20之一主面上之各光吸收層10之厚度小於濾光器1a之透明介電基板20之一主面上之各光吸收層10之厚度。藉由於透明介電基板20之兩主面上形成光吸收層10,即便於透明介電基板20較薄之情形時,於濾光器1b中亦抑制翹曲。2層光吸收層10可分別形成為多層。As shown in FIG. 1B, in the optical filter 1 b, a light absorbing layer 10 is formed on two main surfaces of the transparent dielectric substrate 20. Accordingly, the conditions (i-1) to (ix-1) are satisfied by the two light absorption layers 10 instead of the one light absorption layer 10, and it is more desirable to further satisfy the above (i-2), The conditions of (ii-2), (iv-2), (vi-2), (vii-2), and (viii-2) are preferably to satisfy Tables (I), (II), and (III) The conditions shown in at least one of them. The thicknesses of the light absorbing layers 10 on the two main surfaces of the transparent dielectric substrate 20 may be the same or different. That is, the optical filter 1 b forms the light absorbing layers 10 on both main surfaces of the transparent dielectric substrate 20 in such a manner that the thickness of the light absorbing layer 10 required for obtaining the required optical characteristics is evenly or unevenly distributed. Thereby, the thickness of each light absorption layer 10 formed on one main surface of the transparent dielectric substrate 20 of the filter 1b is smaller than that of each light absorption layer 10 on one main surface of the transparent dielectric substrate 20 of the filter 1a. Of thickness. Since the light absorbing layers 10 are formed on both main surfaces of the transparent dielectric substrate 20, warpage is suppressed in the filter 1b even when the transparent dielectric substrate 20 is thin. Each of the two light-absorbing layers 10 may be formed in a plurality of layers.

如圖1C所示,於濾光器1c中,於透明介電基板20之兩主面上形成光吸收層10。除此以外,濾光器1c具備抗反射膜30。抗反射膜30係用以降低可見光區域之光之反射的膜,且以形成濾光器1c與空氣之界面之方式形成。抗反射膜30例如為由樹脂、氧化物及氟化物等介電體所形成之膜。抗反射膜30可為積層折射率不同之兩種以上之介電體所形成之多層膜。尤其是抗反射膜30亦可為由SiO2 等低折射率材料及TiO2 或Ta2 O5 等高折射率材料所構成之介電多層膜。於此情形時,可降低濾光器1c與空氣之界面之菲涅耳反射,增大濾光器1c之可見光區域之光量。抗反射膜30可形成於濾光器1c之兩面,亦可形成於濾光器1c之單面。As shown in FIG. 1C, in the optical filter 1 c, a light absorbing layer 10 is formed on both main surfaces of the transparent dielectric substrate 20. In addition, the filter 1 c includes an anti-reflection film 30. The antireflection film 30 is a film for reducing reflection of light in the visible light region, and is formed so as to form an interface between the filter 1c and air. The antireflection film 30 is, for example, a film made of a dielectric such as resin, oxide, and fluoride. The anti-reflection film 30 may be a multilayer film formed by laminating two or more dielectric materials having different refractive indexes. In particular, the anti-reflection film 30 may be a dielectric multilayer film composed of a low refractive index material such as SiO 2 and a high refractive index material such as TiO 2 or Ta 2 O 5 . In this case, the Fresnel reflection at the interface between the filter 1c and the air can be reduced, and the amount of light in the visible light region of the filter 1c can be increased. The anti-reflection film 30 may be formed on both sides of the filter 1c, or may be formed on one side of the filter 1c.

如圖1D所示,於濾光器1d中,於透明介電基板20之兩主面上形成光吸收層10。除此以外,濾光器1d進而具備反射膜40。反射膜40反射紅外線及/或紫外線。反射膜40例如為藉由將鋁等金屬進行蒸鍍所形成之膜、或交替地積層由高折射率材料所構成之層與由低折射率材料所構成之層而成的介電多層膜。作為高折射率材料,使用TiO2 、ZrO2 、Ta2 O5 、Nb2 O5 、ZnO及In2 O3 等具有1.7〜2.5之折射率之材料。作為低折射率材料,使用SiO2 、Al2 O3 及MgF2 等具有1.2〜1.6之折射率之材料。形成介電多層膜之方法例如為化學氣相沈積(CVD)法、濺鍍法或真空蒸鍍法。又,此種反射膜可以形成濾光器之兩主面之方式形成(省略圖示)。若於濾光器之兩主面形成反射膜,則獲得於濾光器之表面及背面兩面平衡應力,濾光器不易翹曲之優點。As shown in FIG. 1D, in the optical filter 1 d, a light absorbing layer 10 is formed on two main surfaces of the transparent dielectric substrate 20. In addition, the filter 1d further includes a reflective film 40. The reflection film 40 reflects infrared rays and / or ultraviolet rays. The reflection film 40 is, for example, a film formed by vapor deposition of a metal such as aluminum, or a dielectric multilayer film in which a layer made of a high refractive index material and a layer made of a low refractive index material are alternately laminated. As the high refractive index material, materials having a refractive index of 1.7 to 2.5, such as TiO 2 , ZrO 2 , Ta 2 O 5 , Nb 2 O 5 , ZnO, and In 2 O 3 , are used. As the low-refractive-index material, a material having a refractive index of 1.2 to 1.6, such as SiO 2 , Al 2 O 3, and MgF 2 , is used. A method of forming the dielectric multilayer film is, for example, a chemical vapor deposition (CVD) method, a sputtering method, or a vacuum evaporation method. In addition, such a reflective film can be formed so as to form both main surfaces of an optical filter (not shown). If the reflective films are formed on the two main surfaces of the filter, the advantages of balanced stress on the surface and the back surface of the filter and the filter not easily warping are obtained.

如圖1E所示,濾光器1e僅由光吸收層10構成。濾光器1e例如可藉由於玻璃基板、樹脂基板、金屬基板(例如鋼基板或不鏽鋼基板)等特定之基板塗佈塗覆液而形成塗膜,使該塗膜硬化後自基板剝離而製造。濾光器1e亦可藉由澆鑄法製造。濾光器1e由於不具備透明介電基板20,故而較薄。因此,濾光器1e可有助於攝像裝置之低高度化。As shown in FIG. 1E, the filter 1 e is composed of only the light absorption layer 10. The optical filter 1e can be manufactured, for example, by applying a coating liquid to a specific substrate such as a glass substrate, a resin substrate, or a metal substrate (such as a steel substrate or a stainless steel substrate) to form a coating film. The filter 1e can also be manufactured by a casting method. The filter 1e is thin because it does not include the transparent dielectric substrate 20. Therefore, the filter 1e can contribute to the height reduction of the imaging device.

如圖1F所示,濾光器1f具備光吸收層10、及配置於其兩面之一對抗反射膜30。於此情形時,濾光器1f可有助於攝像裝置之低高度化,且與濾光器1e相比可增大可見光區域之光量。As shown in FIG. 1F, the filter 1 f includes a light absorbing layer 10 and an antireflection film 30 disposed on one of both surfaces thereof. In this case, the filter 1f can contribute to the reduction in height of the imaging device, and can increase the amount of light in the visible light region compared to the filter 1e.

濾光器1a〜1f可分別視需要變更為具備與光吸收層10不同之紅外線吸收層(省略圖示)。紅外線吸收層例如含有花青系、酞菁系、方酸鎓系、二亞銨系及偶氮系等有機系紅外線吸收劑、或由金屬錯合物所構成之紅外線吸收劑。紅外線吸收層例如含有選自該等紅外線吸收劑中之一種或多種紅外線吸收劑。該有機系紅外線吸收劑可吸收之光之波長範圍(吸收帶)較小,適於吸收特定之範圍之波長之光。Each of the filters 1a to 1f can be changed to include an infrared absorbing layer (not shown) different from the light absorbing layer 10 as necessary. The infrared absorbing layer contains, for example, an organic infrared absorbent such as a cyanine-based, phthalocyanine-based, onium-based, diimmonium-based, or azo-based, or an infrared absorber composed of a metal complex. The infrared absorbing layer contains, for example, one or more infrared absorbing agents selected from the infrared absorbing agents. The wavelength range (absorption band) of light that this organic infrared absorber can absorb is small, and it is suitable for absorbing light in a specific range of wavelengths.

濾光器1a〜1f可分別視需要變更為具備與光吸收層10不同之紫外線吸收層(省略圖示)。紫外線吸收層例如含有二苯甲酮系、三口井系、吲哚系、部花青系及口咢唑系等之紫外線吸收劑。紫外線吸收層例如含有選自該等紫外線吸收劑中之一種或多種紫外線吸收劑。該等紫外線吸收劑例如雖然亦可包含吸收300 nm〜340 nm附近之紫外線,發出波長長於吸收之波長之光(螢光),發揮作為螢光劑或螢光增白劑之功能者,惟藉由紫外線吸收層,可降低導致樹脂等濾光器所使用之材料之劣化的紫外線之入射。Each of the filters 1 a to 1 f can be changed to include an ultraviolet absorbing layer (not shown) different from the light absorbing layer 10 as necessary. The ultraviolet absorbing layer contains, for example, benzophenone-based, three-well-based, indole-based, merocyanine-based, and oroxazole-based ultraviolet absorbers. The ultraviolet absorbing layer contains, for example, one or more ultraviolet absorbing agents selected from the ultraviolet absorbing agents. These ultraviolet absorbers may include, for example, those that absorb ultraviolet rays in the vicinity of 300 nm to 340 nm, emit light (fluorescence) having a wavelength longer than the absorption wavelength, and perform functions as fluorescent agents or fluorescent whitening agents. The ultraviolet absorbing layer can reduce the incidence of ultraviolet rays that cause deterioration of materials used in filters such as resins.

可使樹脂製透明介電基板20預先含有上述紅外線吸收劑及/或紫外線吸收劑,形成具有吸收紅外線及/或紫外線之特性之基板。於此情形時,樹脂必須可使紅外線吸收劑及/或紫外線吸收劑適當地溶解或分散且透明。作為此種樹脂,可例示:(聚)烯烴樹脂、聚醯亞胺樹脂、聚乙烯醇縮丁醛樹脂、聚碳酸酯樹脂、聚醯胺樹脂、聚碸樹脂、聚醚碸樹脂、聚醯胺醯亞胺樹脂、(改質)丙烯酸樹脂、環氧樹脂及聚矽氧樹脂。The resin-made transparent dielectric substrate 20 may include the infrared absorber and / or ultraviolet absorber described above in advance to form a substrate having characteristics of absorbing infrared and / or ultraviolet rays. In this case, the resin must be able to dissolve or disperse the infrared absorber and / or ultraviolet absorber appropriately and be transparent. Examples of such resins include (poly) olefin resins, polyimide resins, polyvinyl butyral resins, polycarbonate resins, polyimide resins, polyimide resins, polyether resins, and polyimide resins.醯 Imine resin, (modified) acrylic resin, epoxy resin and silicone resin.

如圖2所示,濾光器1a例如用於製造攝像裝置100(相機模組)。攝像裝置100具備透鏡系統2、攝像元件4、濾色器3及濾光器1a。攝像元件4接收穿過透鏡系統2之光。濾色器3配置於攝像元件4之前方,具有R(紅)、G(綠)及B(藍)3色之濾光片。濾光器1a配置於濾色器3之前方。尤其是光吸收層10係與透明介電基板20之靠近透鏡系統2之面接觸而形成。如上所述,藉由使透明介電基板20使用藍寶石等高硬度之材料,保護透鏡系統2或攝像元件4之效果增大。例如於濾色器3中,矩陣狀地配置有R(紅)、G(綠)及B(藍)3色之濾光片,於攝像元件4之各像素之正上方配置有R(紅)、G(綠)及B(藍)中之任一顏色之濾光片。攝像元件4接收穿過透鏡系統2、濾光器1a及濾色器3之來自被攝體之光。攝像裝置100係基於與由攝像元件4中接收之光所產生之電荷相關之資訊生成圖像。再者,濾色器3與攝像元件4可一體化而構成彩色影像感測器。As shown in FIG. 2, the filter 1 a is used to manufacture an imaging device 100 (camera module), for example. The imaging device 100 includes a lens system 2, an imaging element 4, a color filter 3, and an optical filter 1a. The imaging element 4 receives light passing through the lens system 2. The color filter 3 is disposed in front of the imaging element 4 and has three color filters of R (red), G (green), and B (blue). The filter 1 a is disposed in front of the color filter 3. In particular, the light absorption layer 10 is formed in contact with the surface of the transparent dielectric substrate 20 near the lens system 2. As described above, by using a high-hardness material such as sapphire for the transparent dielectric substrate 20, the effect of protecting the lens system 2 or the imaging element 4 is increased. For example, in the color filter 3, R (red), G (green), and B (blue) three color filters are arranged in a matrix, and R (red) is arranged directly above each pixel of the image sensor 4 , G (green) and B (blue) filters. The imaging element 4 receives light from a subject that has passed through the lens system 2, the filter 1a, and the color filter 3. The imaging device 100 generates an image based on information related to electric charges generated by the light received in the imaging element 4. In addition, the color filter 3 and the imaging element 4 may be integrated to form a color image sensor.

於濾光器1a中,由於滿足上述(i-1)〜(ix-1)之條件,故而具備此種濾光器1a之攝像裝置100可生成良好之畫質之圖像。於濾光器1a中,若進而滿足上述(i-2)、(ii-2)、(iv-2)、(vi-2)、(vii-2)及(viii-2)之條件,則攝像裝置100可生成具有高程度之色再現性之圖像。於濾光器1a中,若滿足表(I)、表(II)及表(III)中之至少一者所示之條件,則即便光之入射角度發生變化,分光穿透率曲線之形狀之變化亦較小,可有效地防止由攝像裝置100生成之圖像產生色不均。
實施例
In the filter 1a, since the conditions (i-1) to (ix-1) described above are satisfied, the imaging device 100 provided with such a filter 1a can generate a good-quality image. In the filter 1a, if the conditions (i-2), (ii-2), (iv-2), (vi-2), (vii-2), and (viii-2) described above are further satisfied, The imaging device 100 can generate an image having a high degree of color reproducibility. In the filter 1a, if the conditions shown in at least one of Tables (I), (II), and (III) are satisfied, the shape of the spectral transmittance curve is changed even if the incident angle of light is changed. The variation is also small, which can effectively prevent color unevenness in the image generated by the imaging device 100.
Examples

藉由實施例更詳細地說明本發明。再者,本發明並不限定於以下之實施例。The present invention will be described in more detail by way of examples. The present invention is not limited to the following examples.

<穿透率光譜測定>
使用紫外線可見分光光度計(日本分光公司製造,製品名:V-670)測定使波長300 nm〜1200 nm之光入射至實施例及比較例之濾光器、其半成品或參考例之積層體時的穿透率光譜。對實施例及比較例之濾光器、一部分半成品及一部分參考例之積層體,測定將入射光之入射角度設定為0°、30°及40°之情形時之穿透率光譜。對其他半成品及其他參考例之積層體,測定將入射光之入射角度設定為0°之情形時之穿透率光譜。
< Transmittance spectrum measurement >
When an ultraviolet-visible spectrophotometer (manufactured by JASCO Corporation, product name: V-670) was used to measure light having a wavelength of 300 nm to 1200 nm incident on the filters of the Examples and Comparative Examples, the semi-finished products thereof, or the laminated body of the Reference Example Transmission spectrum. For the filters of the Examples and Comparative Examples, a part of the semi-finished product, and a part of the Reference Example, the transmittance spectrum was measured when the incident angle of the incident light was set to 0 °, 30 °, and 40 °. For the laminated bodies of other semi-finished products and other reference examples, the transmittance spectrum was measured when the incident angle of incident light was set to 0 °.

<實施例1>
以如下方式製備塗覆液IRA1。將乙酸銅一水合物1.1 g與四氫呋喃(THF)60 g加以混合並攪拌3小時,於所獲得之液體中加入磷酸酯(第一工業製藥公司製造 製品名:Plysurf A208F)2.3 g攪拌30分鐘,獲得A液。於苯基膦酸(東京化成工業股份有限公司製造)0.6 g中加入THF 10 g攪拌30分鐘,獲得B液。一面攪拌A液一面加入B液,於室溫下攪拌1分鐘。於該溶液中加入甲苯45 g後,於室溫下攪拌1分鐘,獲得C液。將C液放入至燒瓶中,一面於調整為120℃之油浴(東京理化器械公司製造,型號:OSB-2100)中進行加溫,一面藉由旋轉蒸發器(東京理化器械公司製造,型號:N-1110SF)進行25分鐘脫溶劑處理,獲得D液。自燒瓶中取出D液,添加聚矽氧樹脂(信越化學工業公司製造,製品名:KR-300)4.4 g並於室溫下攪拌30分鐘,獲得塗覆液IRA1。
<Example 1>
The coating liquid IRA1 was prepared as follows. 1.1 g of copper acetate monohydrate and 60 g of tetrahydrofuran (THF) were mixed and stirred for 3 hours. To the obtained liquid was added 2.3 g of phosphate ester (product name of Daiichi Pharmaceutical Co., Ltd .: Plysurf A208F) and stirred for 30 minutes. A solution was obtained. To 0.6 g of phenylphosphonic acid (manufactured by Tokyo Chemical Industry Co., Ltd.) was added 10 g of THF and stirred for 30 minutes to obtain liquid B. Add liquid B while stirring liquid A, and stir at room temperature for 1 minute. After 45 g of toluene was added to the solution, the solution was stirred at room temperature for 1 minute to obtain a liquid C. Liquid C was placed in a flask, and heated in an oil bath adjusted to 120 ° C (manufactured by Tokyo R & D Co., Ltd., model: OSB-2100) while using a rotary evaporator (manufactured by Tokyo R & D Co., Ltd., model) : N-1110SF) was subjected to a solvent removal treatment for 25 minutes to obtain a D solution. The D liquid was taken out of the flask, and 4.4 g of a polysiloxane resin (manufactured by Shin-Etsu Chemical Co., Ltd., product name: KR-300) was added and stirred at room temperature for 30 minutes to obtain a coating liquid IRA1.

又,以如下方式製備塗覆液IRA2。將乙酸銅一水合物2.25 g與四氫呋喃(THF)120 g加以混合並攪拌3小時,於所獲得之液體中加入磷酸酯(第一工業製藥公司製造 製品名:Plysurf A208F)1.8 g攪拌30分鐘,獲得E液。於丁基膦酸1.35 g中加入THF 20 g攪拌30分鐘,獲得F液。一面攪拌E液一面加入F液,於室溫下攪拌3小時後,加入甲苯40 g,其後,於85℃之環境中歷時7.5小時使溶劑揮發,獲得G液。於G液中加入聚矽氧樹脂(信越化學工業公司製造,製品名:KR-300)8.8 g攪拌3小時,獲得塗覆液IRA2。The coating liquid IRA2 was prepared as follows. 2.25 g of copper acetate monohydrate and 120 g of tetrahydrofuran (THF) were mixed and stirred for 3 hours, and 1.8 g of phosphate ester (product name of Daiichi Pharmaceutical Co., Ltd .: Plysurf A208F) was added to the obtained liquid and stirred for 30 minutes, E liquid was obtained. To 1.35 g of butylphosphonic acid, 20 g of THF was added and stirred for 30 minutes to obtain F liquid. While stirring the E liquid, the F liquid was added, and after stirring at room temperature for 3 hours, 40 g of toluene was added. Thereafter, the solvent was evaporated in an environment of 85 ° C. for 7.5 hours to obtain a G liquid. 8.8 g of polysiloxane resin (manufactured by Shin-Etsu Chemical Industry Co., Ltd., product name: KR-300) was added to the G liquid and stirred for 3 hours to obtain a coating liquid IRA2.

藉由模嘴塗佈機將塗覆液IRA1塗佈於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira11。以相同之方式,亦於透明玻璃基板之相反側主面塗佈塗覆液IRA1,於與上述相同之條件下進行加熱處理使塗膜硬化,形成紅外線吸收層ira12。如此,獲得實施例1之濾光器之半成品α。紅外線吸收層ira11及紅外線吸收層ira12之厚度共計0.2 mm。將0°之入射角度之半成品α之穿透率光譜示於圖3A。半成品α具有以下之(α1)〜(α10)之特性。(α1):波長390 nm之分光穿透率為39.3%。
(α2):波長400 nm之分光穿透率為63.7%。
(α3):波長450 nm之分光穿透率為85.7%。
(α4):波長700 nm之分光穿透率為2.3%。
(α5):波長715 nm之分光穿透率為0.9%。
(α6):波長1100 nm之分光穿透率為12.1%。
(α7):波長1200 nm之分光穿透率為49.1%。
(α8):波長500〜600 nm之平均穿透率為88.0%。
(α9):波長700〜800 nm之平均穿透率為0.5%以下。
(α10):IR截止波長為632 nm,UV截止波長為394 nm,於將IR截止波長與UV截止波長之差視為穿透區域之半高寬(full width at half height)時,穿透區域之半高寬為238 nm。
The coating liquid IRA1 was applied to one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) with a die coater, and then heated at 85 ° C for 3 hours in an oven. Heat treatment was performed at 125 ° C for 3 hours, followed by heat treatment at 150 ° C for 1 hour, and then heat treatment at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira11. In the same manner, the coating liquid IRA1 was also applied to the main surface on the opposite side of the transparent glass substrate, and the coating film was hardened under the same conditions as described above to form the infrared absorption layer ira12. In this way, the semi-finished product α of the filter of Example 1 was obtained. The thickness of the infrared absorbing layer ira11 and the infrared absorbing layer ira12 is 0.2 mm in total. The transmittance spectrum of the semi-finished product α at an incident angle of 0 ° is shown in FIG. 3A. The semi-finished product α has the following characteristics (α1) to (α10). (Α1): The spectral transmittance at a wavelength of 390 nm is 39.3%.
(Α2): The spectral transmittance at a wavelength of 400 nm is 63.7%.
(Α3): The spectral transmittance at a wavelength of 450 nm is 85.7%.
(Α4): The spectral transmittance at a wavelength of 700 nm is 2.3%.
(Α5): The spectral transmittance at a wavelength of 715 nm is 0.9%.
(Α6): The spectral transmittance at a wavelength of 1100 nm is 12.1%.
(Α7): The spectral transmittance at a wavelength of 1200 nm is 49.1%.
(Α8): The average transmittance at a wavelength of 500 to 600 nm is 88.0%.
(Α9): The average transmittance at a wavelength of 700 to 800 nm is 0.5% or less.
(Α10): IR cutoff wavelength is 632 nm, UV cutoff wavelength is 394 nm. When the difference between IR cutoff wavelength and UV cutoff wavelength is regarded as the full width at half height of the penetration region, the penetration region The full width at half maximum is 238 nm.

使用真空蒸鍍裝置於半成品α之紅外線吸收層ira11之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p1)。以相同之方式,於半成品α之紅外線吸收層ira12之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p2)。藉由模嘴塗佈機於保護層p1之表面塗佈塗覆液IRA2,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira21。又,亦於保護層p2之表面,藉由模嘴塗佈機塗佈塗覆液IRA2,於相同之加熱條件下使塗膜硬化而形成紅外線吸收層ira22。如此,獲得半成品β。紅外線吸收層ira21及紅外線吸收層ira22之厚度共計50 μm。將0°之入射角度之半成品β之穿透率光譜示於圖3B。半成品β具有以下之(β1)〜(β10)之特性。
(β1):波長390 nm之分光穿透率為38.2%。
(β2):波長400 nm之分光穿透率為62.1%。
(β3):波長450 nm之分光穿透率為84.0%。
(β4):波長700 nm之分光穿透率為1.8%。
(β5):波長715 nm之分光穿透率為0.6%。
(β6):波長1100 nm之分光穿透率為1.2%。
(β7):波長1200 nm之分光穿透率為10.1%。
(β8):波長500〜600 nm之平均穿透率為87.2%。
(β9):波長700〜800 nm之平均穿透率為0.5%以下。
(β10):IR截止波長為632 nm,UV截止波長為394 nm,於將IR截止波長與UV截止波長之差視為穿透區域之半高寬時,穿透區域之半高寬為237 nm。
A vacuum evaporation device was used to form a 500 nm-thick SiO 2 vapor-deposited film (protective layer p1) on the infrared absorption layer ira11 of the semi-finished product α. In the same manner, a 500 nm-thick SiO 2 vapor-deposited film (protective layer p2) was formed on the infrared absorption layer ira12 of the semi-finished product α. The coating liquid IRA2 was coated on the surface of the protective layer p1 by a die coater, and then heated in an oven at 85 ° C for 3 hours, followed by heat treatment at 125 ° C for 3 hours, and then at 150 ° C. A heat treatment was performed for 1 hour, and then a heat treatment was performed at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira21. In addition, the coating liquid IRA2 was also applied on the surface of the protective layer p2 by a die coater, and the coating film was hardened under the same heating conditions to form an infrared absorbing layer ira22. In this way, a semi-finished product β is obtained. The thickness of the infrared absorbing layer ira21 and the infrared absorbing layer ira22 is 50 μm in total. The transmittance spectrum of the semi-finished product β at an incident angle of 0 ° is shown in FIG. 3B. The semi-finished product β has the following characteristics (β1) to (β10).
(Β1): The spectral transmittance at a wavelength of 390 nm is 38.2%.
(Β2): The spectral transmittance at a wavelength of 400 nm is 62.1%.
(Β3): The spectral transmittance at a wavelength of 450 nm is 84.0%.
(Β4): The spectral transmittance at a wavelength of 700 nm is 1.8%.
(Β5): The spectral transmittance at a wavelength of 715 nm is 0.6%.
(Β6): The spectral transmittance at a wavelength of 1100 nm is 1.2%.
(Β7): The spectral transmittance at a wavelength of 1200 nm is 10.1%.
(Β8): The average transmittance at a wavelength of 500 to 600 nm is 87.2%.
(Β9): The average transmittance at a wavelength of 700 to 800 nm is 0.5% or less.
(Β10): IR cut-off wavelength is 632 nm, UV cut-off wavelength is 394 nm. When the difference between the IR cut-off wavelength and the UV cut-off wavelength is taken as the half-width of the penetration region, the half-width of the penetration region is 237 nm .

使用真空蒸鍍裝置於半成品β之紅外線吸收層ira22之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p3)。A vacuum deposition device was used to form a 500 nm-thick SiO 2 vapor-deposited film (protective layer p3) on the infrared absorption layer ira22 of the semi-finished product β.

以如下方式製備塗覆液UVA1。作為紫外線吸收性物質,使用可見光區域中之光之吸收較少且可溶於MEK(甲基乙基酮)之二苯甲酮系紫外線吸收性物質。將該紫外線吸收性物質溶解於作為溶劑之MEK中,並且添加固形物成分之60重量%之聚乙烯醇縮丁醛(PVB),攪拌2小時而獲得塗覆液UVA1。藉由旋轉塗覆於保護層p3之上塗佈塗覆液UVA1,於140℃加熱30分鐘使之硬化而形成紫外線吸收層uva1。紫外線吸收層uva1之厚度為6 μm。另外,使用塗覆液UVA1藉由旋轉塗覆於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之表面形成6 μm之厚度之紫外線吸收層,獲得參考例1之積層體。將參考例1之積層體之穿透率光譜示於圖3C。參考例1之積層體具有以下之(r1)〜(r3)之特性。
(r1):波長350〜390 nm之穿透率為0.5%以下。
(r2):波長400 nm之穿透率為12.9%,410 nm之穿透率為51.8%,420 nm之穿透率為77.1%,450 nm之穿透率為89.8%。
(r3):波長450〜750 nm之平均穿透率為91.0%。
The coating liquid UVA1 was prepared in the following manner. As the ultraviolet absorbing substance, a benzophenone-based ultraviolet absorbing substance that has less absorption of light in the visible light region and is soluble in MEK (methyl ethyl ketone) is used. This ultraviolet absorbing substance was dissolved in MEK as a solvent, and 60% by weight of polyvinyl butyral (PVB) as a solid content was added, and the mixture was stirred for 2 hours to obtain a coating liquid UVA1. The coating liquid UVA1 was applied by spin coating on the protective layer p3, and heated at 140 ° C for 30 minutes to harden to form an ultraviolet absorbing layer uva1. The thickness of the ultraviolet absorbing layer uva1 is 6 μm. In addition, a UV-absorbing layer having a thickness of 6 μm was formed on the surface of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) by using the coating liquid UVA1 by spin coating to obtain a laminated body of Reference Example 1. The transmittance spectrum of the laminated body of Reference Example 1 is shown in FIG. 3C. The laminated body of Reference Example 1 has the following characteristics (r1) to (r3).
(R1): The transmittance at a wavelength of 350 to 390 nm is 0.5% or less.
(R2): The transmittance at a wavelength of 400 nm is 12.9%, the transmittance at 410 nm is 51.8%, the transmittance at 420 nm is 77.1%, and the transmittance at 450 nm is 89.8%.
(R3): The average transmittance at a wavelength of 450 to 750 nm is 91.0%.

使用真空蒸鍍裝置於紅外線吸收層ira21之上形成抗反射膜ar1。又,使用真空蒸鍍裝置於紫外線吸收層uva1上形成抗反射膜ar2。抗反射膜ar1及抗反射膜ar2係具有相同之規格,交替地積層SiO2 與TiO2 而成之膜,於抗反射膜ar1及抗反射膜ar2中,層數為7層,總膜厚為約0.4 μm。如此,獲得實施例1之濾光器。於與抗反射膜ar1之成膜相同之條件下於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之單面形成抗反射膜,獲得參考例2之積層體。將參考例2之積層體之穿透率光譜示於圖3D。參考例2之積層體具有以下(s1)〜(s4)之特性。
(s1):於光之入射角度為0°之情形時,波長350 nm之穿透率為73.4%,波長380 nm之穿透率為88.9%,波長400 nm之穿透率為95.3%,波長400〜700 nm之平均穿透率為95.3%,波長715 nm之穿透率為95.7%。
(s2):於光之入射角度為30°之情形時,波長350 nm之穿透率為78.5%,波長380 nm之穿透率為92.0%,波長400 nm之穿透率為94.5%,波長400〜700 nm之平均穿透率為94.3%,波長715 nm之穿透率為94.6%。
(s3):於光之入射角度為40°之情形時,波長350 nm之穿透率為82.3%,波長380 nm之穿透率為93.3%,波長400 nm之穿透率為94.3%,波長400〜700 nm之平均穿透率為94.0%,波長715 nm之穿透率為94.1%。
(s4):不取決於光之入射角度,於波長400〜700 nm不存在產生穿透率局部降低之波紋之波段。
An anti-reflection film ar1 was formed on the infrared absorbing layer ira21 using a vacuum evaporation device. Further, an anti-reflection film ar2 was formed on the ultraviolet absorbing layer uva1 using a vacuum evaporation device. The anti-reflection film ar1 and the anti-reflection film ar2 are films having the same specifications and alternately laminated with SiO 2 and TiO 2. The number of layers in the anti-reflection film ar1 and the anti-reflection film ar2 is 7 layers, and the total film thickness is Approximately 0.4 μm. In this way, the optical filter of Example 1 was obtained. An anti-reflection film was formed on one side of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) under the same conditions as the film formation of the anti-reflection film ar1 to obtain a laminate of Reference Example 2. The transmittance spectrum of the laminated body of Reference Example 2 is shown in FIG. 3D. The laminated body of Reference Example 2 has the following characteristics (s1) to (s4).
(S1): When the incident angle of light is 0 °, the transmittance at a wavelength of 350 nm is 73.4%, the transmittance at a wavelength of 380 nm is 88.9%, the transmittance at a wavelength of 400 nm is 95.3%, and the wavelength The average transmittance of 400 to 700 nm is 95.3%, and the transmittance of wavelength 715 nm is 95.7%.
(S2): When the incident angle of light is 30 °, the transmittance at a wavelength of 350 nm is 78.5%, the transmittance at a wavelength of 380 nm is 92.0%, the transmittance at a wavelength of 400 nm is 94.5%, and the wavelength The average transmittance of 400 ~ 700 nm is 94.3%, and the transmittance of wavelength 715 nm is 94.6%.
(S3): When the incident angle of light is 40 °, the transmittance at a wavelength of 350 nm is 82.3%, the transmittance at a wavelength of 380 nm is 93.3%, the transmittance at a wavelength of 400 nm is 94.3%, and the wavelength The average transmittance of 400 to 700 nm is 94.0%, and the transmittance of wavelength 715 nm is 94.1%.
(S4): It does not depend on the incident angle of light, and there is no wave band that produces a local decrease in transmittance at a wavelength of 400 to 700 nm.

將實施例1之濾光器之穿透率光譜示於圖3E及表4。又,實施例1之濾光器具有表5所示之特性。將選自0°、30°及40°中之2個入射角度之實施例1之濾光器之分光穿透率之差與波長的關係示於圖4A。將選自0°、30°及40°中之2個入射角度之實施例1之濾光器之分光穿透率之差之絕對值與波長的關係示於圖4B。將選自0°、30°及40°中之2個入射角度之實施例1之濾光器之分光穿透率之差之平方值與波長的關係示於圖4C。自0°、30°及40°之入射角度之實施例1之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表6〜8。The transmittance spectrum of the filter of Example 1 is shown in FIG. 3E and Table 4. The filter of Example 1 has the characteristics shown in Table 5. The relationship between the difference in the spectral transmittance and the wavelength of the filter of Example 1 at two incident angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 4A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Example 1 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 4B. The relationship between the square of the difference in the spectral transmittance of the filter of Example 1 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 4C. From the transmittance spectrum of the filter of Example 1 at incidence angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained according to the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and at the wavelength λ of λ1 = 380 and λ2 = 530 The variable domains, the variable domains of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 6 to 8.

<實施例2>
以與實施例1相同之方式製備塗覆液IRA1及塗覆液IRA2。藉由模嘴塗佈機將塗覆液IRA1塗佈於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira11。以相同之方式,亦於透明玻璃基板之相反側主面塗佈塗覆液IRA1,於與上述相同之條件下進行加熱處理使塗膜硬化,形成紅外線吸收層ira12。紅外線吸收層ira11及紅外線吸收層ira12之厚度共計0.2 mm。
<Example 2>
A coating liquid IRA1 and a coating liquid IRA2 were prepared in the same manner as in Example 1. The coating liquid IRA1 was applied to one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) with a die coater, and then heated at 85 ° C for 3 hours in an oven. Heat treatment was performed at 125 ° C for 3 hours, followed by heat treatment at 150 ° C for 1 hour, and then heat treatment at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira11. In the same manner, the coating liquid IRA1 was also applied to the main surface on the opposite side of the transparent glass substrate, and the coating film was hardened under the same conditions as described above to form the infrared absorbing layer ira12. The thickness of the infrared absorbing layer ira11 and the infrared absorbing layer ira12 is 0.2 mm in total.

使用真空蒸鍍裝置於紅外線吸收層ira11之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p1)。以相同之方式,於紅外線吸收層ira12之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p2)。藉由模嘴塗佈機將塗覆液IRA2塗佈於保護層p1之表面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira21。又,亦於保護層p2之表面藉由模嘴塗佈機塗佈塗覆液IRA2,於相同之加熱條件下使塗膜硬化而形成紅外線吸收層ira22。紅外線吸收層ira21及紅外線吸收層ira22之厚度共計50 μm。A vacuum evaporation device was used to form a 500 nm-thick SiO 2 vapor-deposited film (protective layer p1) on the infrared absorbing layer ira11. In the same manner, a 500 nm-thick SiO 2 vapor-deposited film (protective layer p2) was formed on the infrared absorbing layer ira12. The coating liquid IRA2 was coated on the surface of the protective layer p1 by a die coater, and then heated in an oven at 85 ° C for 3 hours, and then at 125 ° C for 3 hours, and then at 150 A heat treatment was performed at 1 ° C for 1 hour, and then a heat treatment was performed at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira21. In addition, the coating liquid IRA2 was also applied to the surface of the protective layer p2 by a die coater, and the coating film was hardened under the same heating conditions to form an infrared absorbing layer ira22. The thickness of the infrared absorbing layer ira21 and the infrared absorbing layer ira22 is 50 μm in total.

使用真空蒸鍍裝置於紅外線吸收層ira22之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p3)。以如下方式製備包含紅外線吸收色素及紫外線吸收色素之塗覆液UVIRA1。紅外線吸收色素係於波長680〜780 nm具有吸收波峰,不易吸收可見光區域之光之花青系有機色素與方酸鎓系有機色素的組合。紫外線吸收色素係由不易吸收可見光區域之光之二苯甲酮系紫外線吸收性物質所構成之色素。紅外線吸收色素及紫外線吸收色素可溶於MEK。將紅外線吸收色素及紫外線吸收色素加入至作為溶劑之MEK中,進而加入作為基質材料之PVB,其後,攪拌2小時而獲得塗覆液UVIRA1。塗覆液UVIRA1中之紅外線吸收色素之調配比及紫外線吸收色素之調配比係以參考例3之積層體表現出圖5A所示之穿透率光譜的方式確定。參考例3之積層體係藉由旋轉塗覆將塗覆液UVIRA1塗佈於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之上後,將該塗膜於140℃加熱30分鐘使之硬化而製作。於塗覆液UVIRA1中,紅外線吸收色素與PVB之固形物成分之質量比(紅外線吸收色素之質量:PVB之固形物成分之質量)為約1:199。又,紫外線吸收色素與PVB之固形物成分之質量比(紫外線吸收色素之質量:PVB之固形物成分之質量)為約40:60。參考例3之積層體具有以下之特性(t1)〜(t5)。
(t1):波長700 nm之穿透率為8.7%,波長715 nm之穿透率為13.6%,波長700〜800 nm之平均穿透率為66.2%。
(t2):波長1100 nm之穿透率為92.1%。
(t3):波長400 nm之穿透率為11.8%,450 nm之穿透率為85.3%,波長500〜600 nm之平均穿透率為89.1%。
(t4):波長600 nm〜700 nm之IR截止波長為669 nm,波長700 nm〜800 nm之IR截止波長為729 nm,該等之差為60 nm。於波長600 nm〜800 nm表現出最低之穿透率之波長(極大吸收波長)為705 nm。
(t5):波長350 nm〜450 nm之UV截止波長為411 nm。
A vacuum evaporation device was used to form a 500 nm-thick SiO 2 vapor-deposited film (protective layer p3) on the infrared absorbing layer ira22. A coating liquid UVIRA1 containing an infrared absorbing pigment and an ultraviolet absorbing pigment was prepared as follows. The infrared absorbing pigment is a combination of a cyanine-based organic pigment and a squarylium-based organic pigment that has an absorption peak at a wavelength of 680 to 780 nm and is difficult to absorb light in the visible light region. The ultraviolet-absorbing pigment is a pigment composed of a benzophenone-based ultraviolet-absorbing substance that does not easily absorb light in the visible light region. Infrared absorbing pigments and ultraviolet absorbing pigments are soluble in MEK. An infrared absorbing dye and an ultraviolet absorbing dye were added to MEK as a solvent, and PVB as a matrix material was further added, followed by stirring for 2 hours to obtain a coating liquid UVIRA1. The blending ratio of the infrared absorbing pigment and the blending ratio of the ultraviolet absorbing pigment in the coating liquid UVIRA1 is determined in such a manner that the laminated body of Reference Example 3 exhibits the transmission spectrum shown in FIG. 5A. In the multilayer system of Reference Example 3, a coating liquid UVIRA1 was applied on a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) by spin coating, and then the coating film was heated at 140 ° C for 30 minutes to make it Hardened and made. In the coating liquid UVIRA1, the mass ratio of the infrared absorption pigment to the solid content of PVB (the mass of the infrared absorption pigment: the mass of the solid content of PVB) was about 1: 199. The mass ratio of the ultraviolet absorbing dye to the solid content of PVB (the mass of the ultraviolet absorbing dye: the mass of the solid content of PVB) was about 40:60. The laminated body of Reference Example 3 has the following characteristics (t1) to (t5).
(T1): The transmittance at a wavelength of 700 nm is 8.7%, the transmittance at a wavelength of 715 nm is 13.6%, and the average transmittance at a wavelength of 700 to 800 nm is 66.2%.
(T2): 92.1% transmittance at a wavelength of 1100 nm.
(T3): The transmittance at a wavelength of 400 nm is 11.8%, the transmittance at 450 nm is 85.3%, and the average transmittance at a wavelength of 500 to 600 nm is 89.1%.
(T4): The IR cut-off wavelength of the wavelength 600 nm to 700 nm is 669 nm, the IR cut-off wavelength of the wavelength 700 nm to 800 nm is 729 nm, and the difference is 60 nm. The wavelength (maximum absorption wavelength) exhibiting the lowest transmittance at a wavelength of 600 nm to 800 nm is 705 nm.
(T5): The UV cut-off wavelength at a wavelength of 350 nm to 450 nm is 411 nm.

藉由旋轉塗覆將塗覆液UVIRA1塗佈於保護層p3之上,將該塗膜於140℃加熱30分鐘使之硬化,形成紅外線・紫外線吸收層uvira1。紅外線・紫外線吸收層uvira1之厚度為7 μm。The coating liquid UVIRA1 was applied on the protective layer p3 by spin coating, and the coating film was heated at 140 ° C for 30 minutes to harden to form an infrared / ultraviolet absorbing layer uvira1. The thickness of the infrared and ultraviolet absorption layer uvira1 is 7 μm.

使用真空蒸鍍裝置於紅外線吸收層ira21之上形成抗反射膜ar1。又,使用真空蒸鍍裝置於紅外線・紫外線吸收層uvira1之上形成抗反射膜ar2。抗反射膜ar1及抗反射膜ar2係具有相同之規格,交替地積層SiO2 與TiO2 而成之膜,於抗反射膜ar1及抗反射膜ar2中,層數為7層,總膜厚為約0.4 μm。如此,獲得實施例2之濾光器。An anti-reflection film ar1 was formed on the infrared absorbing layer ira21 using a vacuum evaporation device. An anti-reflection film ar2 was formed on the infrared / ultraviolet absorbing layer uvira1 using a vacuum evaporation device. The anti-reflection film ar1 and the anti-reflection film ar2 are films having the same specifications and alternately laminated with SiO 2 and TiO 2. The number of layers in the anti-reflection film ar1 and the anti-reflection film ar2 is 7 layers, and the total film thickness is Approximately 0.4 μm. In this way, the optical filter of Example 2 was obtained.

將實施例2之濾光器之穿透率光譜示於圖5B及表9。又,實施例2之濾光器具有表10所示之特性。將選自0°、30°及40°中之2個入射角度之實施例2之濾光器之分光穿透率之差與波長的關係示於圖6A。將選自0°、30°及40°中之2個入射角度之實施例2之濾光器之分光穿透率之差之絕對值與波長的關係示於圖6B。將選自0°、30°及40°中之2個入射角度之實施例2之濾光器之分光穿透率之差之平方值與波長的關係示於圖6C。自0°、30°及40°之入射角度之實施例2之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表11〜13。The transmittance spectrum of the filter of Example 2 is shown in FIG. 5B and Table 9. The filter of Example 2 has the characteristics shown in Table 10. The relationship between the difference in the spectral transmittance and the wavelength of the filter of Example 2 at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 6A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Example 2 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 6B. The relationship between the square value of the difference in the spectral transmittance of the filter of Example 2 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 6C. From the transmittance spectrum of the filter of Example 2 with incident angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained according to the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and the wavelength λ of λ1 = 380 and λ2 = 530 The variable domains, the variable domains of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 11 to 13.

<實施例3>
以與實施例1相同之方式製備塗覆液IRA1。藉由模嘴塗佈機塗佈於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira11。以相同之方式,亦於透明玻璃基板之相反側主面塗佈塗覆液IRA1,於與上述相同之條件下進行加熱處理使塗膜硬化,形成紅外線吸收層ira12。紅外線吸收層ira11及紅外線吸收層ira12之厚度共計0.2 mm。
<Example 3>
A coating liquid IRA1 was prepared in the same manner as in Example 1. A die coater was applied to one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco), followed by heating treatment in an oven at 85 ° C for 3 hours, and then at 125 ° C for 3 hours. Heat treatment for 1 hour, followed by heat treatment at 150 ° C for 1 hour, and heat treatment at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira11. In the same manner, the coating liquid IRA1 was also applied to the main surface on the opposite side of the transparent glass substrate, and the coating film was hardened under the same conditions as described above to form the infrared absorbing layer ira12. The thickness of the infrared absorbing layer ira11 and the infrared absorbing layer ira12 is 0.2 mm in total.

其次,使用真空蒸鍍裝置於紅外線吸收層ira11之上形成紅外線反射膜irr1。於紅外線反射膜irr1中,交替地積層16層SiO2 與TiO2 。於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於與紅外線反射膜irr1之形成相同之條件下形成紅外線反射膜,製作參考例4之積層體。將參考例4之積層體之穿透率光譜示於圖7A。參考例4之積層體具有以下之特性(u1)〜(u3)。
(u1):於光之入射角度為0°之情形時,波長380 nm之穿透率為1.8%,波長400 nm之穿透率為7.3%,波長450〜700 nm之平均穿透率為94.8%,波長450〜700 nm之穿透率之最低值為93.4%,波長700〜800 nm之平均穿透率為94.0%,波長1100 nm之穿透率為4.1%,IR截止波長為902 nm,UV截止波長為410 nm。
(u2):於光之入射角度為30°之情形時,波長380 nm之穿透率為1.8%,波長400 nm之穿透率為67.8%,波長450〜700 nm之平均穿透率為95.0%,波長450〜700 nm之穿透率之最低值為93.8%,波長700〜800 nm之平均穿透率為92.1%,波長1100 nm之穿透率為5.3%,IR截止波長為863 nm,UV截止波長為398 nm。
(u3):於光之入射角度為40°之情形時,波長380 nm之穿透率為4.0%,波長400 nm之穿透率為90.2%,波長450〜700 nm之平均穿透率為94.1%,波長450〜700 nm之穿透率之最低值為92.9%,波長700〜800 nm之平均穿透率為91.5%,波長1100 nm之穿透率為8.3%,IR截止波長為837 nm,UV截止波長為391 nm。
Next, an infrared reflecting film irr1 is formed on the infrared absorbing layer ira11 using a vacuum evaporation device. In the infrared reflection film irr1, 16 layers of SiO 2 and TiO 2 are alternately laminated. An infrared reflecting film was formed on one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) under the same conditions as the formation of the infrared reflecting film irr1, and a laminated body of Reference Example 4 was produced. The transmittance spectrum of the laminated body of Reference Example 4 is shown in FIG. 7A. The laminated body of Reference Example 4 has the following characteristics (u1) to (u3).
(U1): When the incident angle of light is 0 °, the transmittance at a wavelength of 380 nm is 1.8%, the transmittance at a wavelength of 400 nm is 7.3%, and the average transmittance at a wavelength of 450 to 700 nm is 94.8 %, The lowest transmittance of the wavelength 450 ~ 700 nm is 93.4%, the average transmittance of the wavelength 700 ~ 800 nm is 94.0%, the transmittance of the wavelength 1100 nm is 4.1%, the IR cut-off wavelength is 902 nm, The UV cut-off wavelength is 410 nm.
(U2): When the incident angle of light is 30 °, the transmittance at a wavelength of 380 nm is 1.8%, the transmittance at a wavelength of 400 nm is 67.8%, and the average transmittance at a wavelength of 450 to 700 nm is 95.0 %, The lowest value of the transmittance at the wavelength of 450 ~ 700 nm is 93.8%, the average transmittance of the wavelength of 700 ~ 800 nm is 92.1%, the transmittance of the wavelength of 1100 nm is 5.3%, and the IR cut-off wavelength is 863 nm. The UV cut-off wavelength is 398 nm.
(U3): When the incident angle of light is 40 °, the transmittance at a wavelength of 380 nm is 4.0%, the transmittance at a wavelength of 400 nm is 90.2%, and the average transmittance at a wavelength of 450 to 700 nm is 94.1 %, The lowest value of the transmittance at the wavelength of 450 ~ 700 nm is 92.9%, the average transmittance of the wavelength of 700 ~ 800 nm is 91.5%, the transmittance of the wavelength of 1100 nm is 8.3%, and the IR cut-off wavelength is 837 nm. The UV cut-off wavelength is 391 nm.

於紅外線吸收層ira12之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p2)。藉由旋轉塗覆將實施例1中所使用之塗覆液UVA1塗佈於保護層p2之上,將該塗膜於140℃加熱30分鐘使之硬化而形成紫外線吸收層uva1。紫外線吸收層uva1之厚度為6 μm。使用真空蒸鍍裝置於紫外線吸收層uva1上形成抗反射膜ar2。抗反射膜ar2係交替地積層SiO2 與TiO2 而成之膜,於抗反射膜ar2中,層數為7層,總膜厚為約0.4 μm。如此,獲得實施例3之濾光器。A 500 nm thick SiO 2 vapor-deposited film (protective layer p2) was formed on the infrared absorbing layer ira12. The coating liquid UVA1 used in Example 1 was applied on the protective layer p2 by spin coating, and the coating film was heated at 140 ° C for 30 minutes to harden to form an ultraviolet absorbing layer uva1. The thickness of the ultraviolet absorbing layer uva1 is 6 μm. An anti-reflection film ar2 is formed on the ultraviolet absorbing layer uva1 using a vacuum evaporation device. The anti-reflection film ar2 is a film in which SiO 2 and TiO 2 are alternately laminated. In the anti-reflection film ar2, the number of layers is 7 and the total film thickness is about 0.4 μm. In this way, the optical filter of Example 3 was obtained.

將實施例3之濾光器之穿透率光譜示於圖7B及表14。又,實施例3之濾光器具有表15所示之特性。將選自0°、30°及40°中之2個入射角度之實施例3之濾光器之分光穿透率之差與波長的關係示於圖8A。將選自0°、30°及40°中之2個入射角度之實施例3之濾光器之分光穿透率之差之絕對值與波長的關係示於圖8B。將選自0°、30°及40°中之2個入射角度之實施例3之濾光器之分光穿透率之差之平方值與波長的關係示於圖8C。自0°、30°及40°之入射角度之實施例3之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表16〜18。The transmittance spectrum of the filter of Example 3 is shown in FIG. 7B and Table 14. The filter of Example 3 has the characteristics shown in Table 15. The relationship between the difference in the spectral transmittance and the wavelength of the filter of Example 3 at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 8A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Example 3 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 8B. The relationship between the square of the difference in the spectral transmittance of the filter of Example 3 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 8C. From the transmittance spectra of the optical filter of Example 3 at incidence angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained according to the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and at the wavelength λ of λ1 = 380 and λ2 = 530 The variable domains, the variable domains of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 16 to 18.

<實施例4>
以與實施例1相同之方式製備塗覆液IRA1。藉由模嘴塗佈機塗佈於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira11。以相同之方式,亦於透明玻璃基板之相反側主面塗佈塗覆液IRA1,於與上述相同之條件下進行加熱處理使塗膜硬化,形成紅外線吸收層ira12。紅外線吸收層ira11及紅外線吸收層ira12之厚度共計0.2 mm。
<Example 4>
A coating liquid IRA1 was prepared in the same manner as in Example 1. A die coater was applied to one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco), followed by heating treatment in an oven at 85 ° C for 3 hours, and then at 125 ° C for 3 hours. Heat treatment for 1 hour, followed by heat treatment at 150 ° C for 1 hour, and heat treatment at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira11. In the same manner, the coating liquid IRA1 was also applied to the main surface on the opposite side of the transparent glass substrate, and the coating film was hardened under the same conditions as described above to form the infrared absorbing layer ira12. The thickness of the infrared absorbing layer ira11 and the infrared absorbing layer ira12 is 0.2 mm in total.

其次,以與實施例3相同之方式,使用真空蒸鍍裝置於紅外線吸收層ira11之上形成紅外線反射膜irr1。於紅外線反射膜irr1中,交替地積層16層SiO2 與TiO2Next, in the same manner as in Example 3, an infrared reflecting film irr1 was formed on the infrared absorbing layer ira11 using a vacuum evaporation device. In the infrared reflection film irr1, 16 layers of SiO 2 and TiO 2 are alternately laminated.

於紅外線吸收層ira12之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p2)。於與實施例2相同之條件下將實施例2中所使用之塗覆液UVIRA1塗佈於保護層p2之上,將該塗膜於140℃加熱30分鐘使之硬化而形成紅外線・紫外線吸收層uvira1。紅外線・紫外線吸收層uvira1之厚度為7 μm。使用真空蒸鍍裝置於紅外線・紫外線吸收層uvira1上形成抗反射膜ar2。抗反射膜ar2係交替地積層SiO2 與TiO2 而成之膜,於抗反射膜ar2中,層數為7層,總膜厚為約0.4 μm。如此,獲得實施例4之濾光器。A 500 nm thick SiO 2 vapor-deposited film (protective layer p2) was formed on the infrared absorbing layer ira12. Under the same conditions as in Example 2, the coating liquid UVIRA1 used in Example 2 was coated on the protective layer p2, and the coating film was heated at 140 ° C for 30 minutes to harden to form an infrared and ultraviolet absorbing layer. uvira1. The thickness of the infrared and ultraviolet absorption layer uvira1 is 7 μm. An anti-reflection film ar2 was formed on the infrared / ultraviolet absorbing layer uvira1 using a vacuum evaporation device. The anti-reflection film ar2 is a film in which SiO 2 and TiO 2 are alternately laminated. In the anti-reflection film ar2, the number of layers is 7 and the total film thickness is about 0.4 μm. In this way, the optical filter of Example 4 was obtained.

將實施例4之濾光器之穿透率光譜示於圖9及表19。又,實施例4之濾光器具有表20所示之特性。將選自0°、30°及40°中之2個入射角度之實施例4之濾光器之分光穿透率之差與波長的關係示於圖10A。將選自0°、30°及40°中之2個入射角度之實施例4之濾光器之分光穿透率之差之絕對值與波長的關係示於圖10B。將選自0°、30°及40°中之2個入射角度之實施例4之濾光器之分光穿透率之差之平方值與波長的關係示於圖10C。自0°、30°及40°之入射角度之實施例4之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表21〜23。The transmittance spectrum of the filter of Example 4 is shown in FIG. 9 and Table 19. The filter of Example 4 has the characteristics shown in Table 20. The relationship between the difference in spectral transmittance and the wavelength of the filter of Example 4 at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 10A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Example 4 and the wavelength between two incident angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 10B. The relationship between the square value of the difference in the spectral transmittance of the filter of Example 4 and the wavelength at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 10C. From the transmittance spectra of the filter of Example 4 with incident angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained according to the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and the wavelength λ of λ1 = 380 and λ2 = 530 The variable domains, the variable domains of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 21 to 23.

<實施例5>
以與實施例1相同之方式製備塗覆液IRA1及塗覆液IRA2。藉由模嘴塗佈機塗佈於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira11。以相同之方式,亦於透明玻璃基板之相反側主面塗佈塗覆液IRA1,於與上述相同之條件下進行加熱處理使塗膜硬化,形成紅外線吸收層ira12。紅外線吸收層ira11及紅外線吸收層ira12之厚度共計0.4 mm。
<Example 5>
A coating liquid IRA1 and a coating liquid IRA2 were prepared in the same manner as in Example 1. A die coater was applied to one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco), followed by heating treatment in an oven at 85 ° C for 3 hours, and then at 125 ° C for 3 hours. Heat treatment for 1 hour, followed by heat treatment at 150 ° C for 1 hour, and heat treatment at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira11. In the same manner, the coating liquid IRA1 was also applied to the main surface on the opposite side of the transparent glass substrate, and the coating film was hardened under the same conditions as described above to form the infrared absorbing layer ira12. The thickness of the infrared absorbing layer ira11 and the infrared absorbing layer ira12 is 0.4 mm in total.

使用真空蒸鍍裝置於紅外線吸收層ira11之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p1)。以相同之方式,於紅外線吸收層ira12之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p2)。藉由模嘴塗佈機將塗覆液IRA2塗佈於保護層p1之表面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira21。又,亦於保護層p2之表面,藉由模嘴塗佈機塗佈塗覆液IRA2,於相同之加熱條件下使塗膜硬化而形成紅外線吸收層ira22,獲得半成品δ。將0℃之入射角度之半成品δ之穿透率光譜示於圖11A。半成品δ具有以下之特性(δ1)〜(δ10)。
(δ1):波長390 nm之分光穿透率為15.8%。
(δ2):波長400 nm之分光穿透率為42.0%。
(δ3):波長450 nm之分光穿透率為76.7%。
(δ4):波長700 nm之分光穿透率為0.5%以下。
(δ5):波長715 nm之分光穿透率為0.5%以下。
(δ6):波長1100 nm之分光穿透率為0.5%以下。
(δ7):波長1200 nm之分光穿透率為1.1%。
(δ8):波長500〜600 nm之平均穿透率為82.7%。
(δ9):波長700〜800 nm之平均穿透率為0.5%以下。
(δ10):IR截止波長為613 nm,UV截止波長為404 nm,於將IR截止波長與UV截止波長之差視為穿透區域之半高寬時,穿透區域之半高寬為209 nm。
A vacuum evaporation device was used to form a 500 nm-thick SiO 2 vapor-deposited film (protective layer p1) on the infrared absorbing layer ira11. In the same manner, a 500 nm-thick SiO 2 vapor-deposited film (protective layer p2) was formed on the infrared absorbing layer ira12. The coating liquid IRA2 was applied to the surface of the protective layer p1 by a die coater, and then heated in an oven at 85 ° C for 3 hours, followed by heat treatment at 125 ° C for 3 hours, and then at 150 ° C. A heat treatment was performed at 1 ° C for 1 hour, and then a heat treatment was performed at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira21. In addition, the coating liquid IRA2 was also applied on the surface of the protective layer p2 by a die coater, and the coating film was hardened under the same heating conditions to form an infrared absorbing layer ira22 to obtain a semi-finished product δ. The transmittance spectrum of the semi-finished product δ at an incident angle of 0 ° C is shown in Fig. 11A. The semi-finished product δ has the following characteristics (δ1) to (δ10).
(Δ1): The spectral transmittance at a wavelength of 390 nm is 15.8%.
(Δ2): The spectral transmittance at a wavelength of 400 nm is 42.0%.
(Δ3): The spectral transmittance at a wavelength of 450 nm is 76.7%.
(Δ4): The spectral transmittance at a wavelength of 700 nm is 0.5% or less.
(Δ5): The spectral transmittance at a wavelength of 715 nm is 0.5% or less.
(Δ6): The spectral transmittance at a wavelength of 1100 nm is 0.5% or less.
(Δ7): The spectral transmittance at a wavelength of 1200 nm is 1.1%.
(Δ8): The average transmittance at a wavelength of 500 to 600 nm is 82.7%.
(Δ9): The average transmittance at a wavelength of 700 to 800 nm is 0.5% or less.
(Δ10): IR cut-off wavelength is 613 nm, UV cut-off wavelength is 404 nm. When the difference between the IR cut-off wavelength and the UV cut-off wavelength is taken as the half-width of the penetration region, the half-width of the penetration region is 209 nm .

使用真空蒸鍍裝置於紅外線吸收層ira21之上形成抗反射膜ar1。又,使用真空蒸鍍裝置於紅外線吸收層ira22之上形成抗反射膜ar2。抗反射膜ar1及抗反射膜ar2係具有相同之規格,交替地積層SiO2 與TiO2 而成之膜,於抗反射膜ar1及抗反射膜ar2中,層數為7層,總膜厚為約0.4 μm。如此,獲得實施例5之濾光器。An anti-reflection film ar1 was formed on the infrared absorbing layer ira21 using a vacuum evaporation device. An anti-reflection film ar2 was formed on the infrared absorbing layer ira22 using a vacuum evaporation device. The anti-reflection film ar1 and the anti-reflection film ar2 are films having the same specifications and alternately laminated with SiO 2 and TiO 2. The number of layers in the anti-reflection film ar1 and the anti-reflection film ar2 is 7 layers, and the total film thickness is Approximately 0.4 μm. In this way, the filter of Example 5 was obtained.

將實施例5之濾光器之穿透率光譜示於圖11B及表24。又,實施例5之濾光器具有表25所示之特性。將選自0°、30°及40°中之2個入射角度之實施例5之濾光器之分光穿透率之差與波長的關係示於圖12A。將選自0°、30°及40°中之2個入射角度之實施例5之濾光器之分光穿透率之差之絕對值與波長的關係示於圖12B。將選自0°、30°及40°中之2個入射角度之實施例5之濾光器之分光穿透率之差之平方值與波長的關係示於圖12C。自0°、30°及40°之入射角度之實施例5之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表26〜28。The transmittance spectrum of the filter of Example 5 is shown in FIG. 11B and Table 24. The filter of Example 5 has the characteristics shown in Table 25. The relationship between the difference in the spectral transmittance and the wavelength of the filter of Example 5 at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 12A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Example 5 and the wavelength at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 12B. The relationship between the square of the difference in the spectral transmittance of the filter of Example 5 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 12C. From the transmittance spectra of the optical filter of Example 5 with incident angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained according to the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and at the wavelength λ of λ1 = 380 and λ2 = 530 The variable domains, the variable domains of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 26 to 28.

<比較例1>
於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,使用真空蒸鍍裝置交替地積層24層SiO2 與TiO2 而形成紅外線反射膜irr2,獲得半成品ε。將半成品ε之穿透率光譜示於圖13A。半成品ε具有以下之特性(ε1)〜(ε3)。
(ε1):於光之入射角度為0°之情形時,波長380 nm之穿透率為0.5%以下,波長400 nm之穿透率為3.1%,波長450〜600 nm之平均穿透率為94.1%,波長450〜600 nm之穿透率之最低值為92.6%,波長700 nm之穿透率為86.2%,波長715 nm之穿透率為30.8%,波長700〜800 nm之平均穿透率為12.4%,波長1100 nm之穿透率為0.5%以下,IR截止波長為710 nm,UV截止波長為410 nm。
(ε2):於光之入射角度為30°之情形時,波長380 nm之穿透率為1.7%,波長400 nm之穿透率為77.7%,波長450〜600 nm之平均穿透率為94.1%,波長450〜600 nm之穿透率之最低值為93.0%,波長700 nm之穿透率為8.2%,波長715 nm之穿透率為2.2%,波長700〜800 nm之平均穿透率為1.1%,波長1100 nm之穿透率為1.2%,IR截止波長為680 nm,UV截止波長為397 nm。
(ε3):於光之入射角度為40°之情形時,波長380 nm之穿透率為13.1%,波長400 nm之穿透率為90.5%,波長450〜600 nm之平均穿透率為92.1%,波長450〜600 nm之穿透率之最低值為87.6%,波長700 nm之穿透率為2.0%,波長715 nm之穿透率為0.8%,波長700〜800 nm之平均穿透率為0.5%以下,波長1100 nm之穿透率為5.4%,IR截止波長為661 nm,UV截止波長為386 nm。
〈Comparative example 1〉
On a main surface of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco), a vacuum evaporation device was used to alternately laminate 24 layers of SiO 2 and TiO 2 to form an infrared reflecting film irr2 to obtain a semi-finished product ε. The transmittance spectrum of the semi-finished product ε is shown in Fig. 13A. The semi-finished product ε has the following characteristics (ε1) to (ε3).
(Ε1): When the incident angle of light is 0 °, the transmittance at a wavelength of 380 nm is 0.5% or less, the transmittance at a wavelength of 400 nm is 3.1%, and the average transmittance at a wavelength of 450 to 600 nm 94.1%, the lowest value of the transmittance at the wavelength of 450 to 600 nm is 92.6%, the transmittance of the wavelength of 700 nm is 86.2%, the transmittance of the wavelength of 715 nm is 30.8%, and the average transmittance of the wavelength of 700 to 800 nm The rate is 12.4%, the transmission rate at a wavelength of 1100 nm is less than 0.5%, the IR cutoff wavelength is 710 nm, and the UV cutoff wavelength is 410 nm.
(Ε2): When the incident angle of light is 30 °, the transmittance at a wavelength of 380 nm is 1.7%, the transmittance at a wavelength of 400 nm is 77.7%, and the average transmittance at a wavelength of 450 to 600 nm is 94.1 %, The minimum transmittance of the wavelength of 450 ~ 600 nm is 93.0%, the transmittance of the wavelength of 700 nm is 8.2%, the transmittance of the wavelength of 715 nm is 2.2%, and the average transmittance of the wavelength of 700 ~ 800 nm It is 1.1%, the transmittance at a wavelength of 1100 nm is 1.2%, the IR cut-off wavelength is 680 nm, and the UV cut-off wavelength is 397 nm.
(Ε3): When the incident angle of light is 40 °, the transmittance at a wavelength of 380 nm is 13.1%, the transmittance at a wavelength of 400 nm is 90.5%, and the average transmittance at a wavelength of 450 to 600 nm is 92.1 %, The lowest transmittance of the wavelength of 450 ~ 600 nm is 87.6%, the transmittance of the wavelength of 700 nm is 2.0%, the transmittance of the wavelength of 715 nm is 0.8%, and the average transmittance of the wavelength of 700 ~ 800 nm It is less than 0.5%, the transmission rate at the wavelength of 1100 nm is 5.4%, the IR cutoff wavelength is 661 nm, and the UV cutoff wavelength is 386 nm.

以如下方式製備包含紅外線吸收色素之塗覆液IRA3。紅外線吸收色素係可溶於MEK之花青系有機色素與方酸鎓系有機色素之組合。將紅外線吸收色素加入至作為溶劑之MEK中,進而加入作為基質材料之PVB,其後,攪拌2小時而獲得塗覆液IRA3。塗覆液IRA3之固形物成分中之基質材料之含有率為99質量%。於藉由旋轉塗覆將塗覆液IRA3塗佈於半成品ε之透明玻璃基板之另一主面後,將該塗膜於140℃加熱30分鐘使之硬化而形成紅外線吸收層ira3。另外,於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於與紅外線吸收層ira3之形成條件相同之條件下形成紅外線吸收層,獲得參考例5之積層體。將0°之入射角度之參考例5之積層體的穿透率光譜示於圖13B。參考例5之積層體具有以下之特性(v1)〜(v4)。
(v1):波長700 nm之穿透率為2.0%,波長715 nm之穿透率為2.6%,波長700〜800 nm之平均穿透率為15.9%。
(v2):波長1100 nm之穿透率為91.1%。
(v3):波長400 nm之穿透率為78.2%,450 nm之穿透率為83.8%,波長500〜600 nm之平均穿透率為86.9%。
(v4):波長600 nm〜700 nm之IR截止波長為637 nm,波長700 nm〜800 nm之IR截止波長為800 nm,該等之IR截止波長之差為163 nm,波長600〜800 nm之極大吸收波長為706 nm。
A coating liquid IRA3 containing an infrared absorbing pigment was prepared in the following manner. Infrared absorbing pigments are soluble in the combination of MEK's cyanine-based organic pigments and squarylium-based organic pigments. An infrared absorbing dye was added to MEK as a solvent, and PVB as a matrix material was further added, followed by stirring for 2 hours to obtain a coating liquid IRA3. The content of the matrix material in the solid content of the coating liquid IRA3 was 99% by mass. After the coating liquid IRA3 was applied to the other main surface of the semi-finished transparent glass substrate by spin coating, the coating film was heated at 140 ° C for 30 minutes to harden to form an infrared absorbing layer ira3. In addition, an infrared absorbing layer was formed on one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) under the same conditions as the conditions for forming the infrared absorbing layer ira3 to obtain a laminate of Reference Example 5. The transmittance spectrum of the laminated body of Reference Example 5 at an incident angle of 0 ° is shown in FIG. 13B. The laminated body of Reference Example 5 has the following characteristics (v1) to (v4).
(V1): The transmittance at a wavelength of 700 nm is 2.0%, the transmittance at a wavelength of 715 nm is 2.6%, and the average transmittance at a wavelength of 700 to 800 nm is 15.9%.
(V2): The transmission rate at the wavelength of 1100 nm is 91.1%.
(V3): The transmittance at a wavelength of 400 nm is 78.2%, the transmittance at 450 nm is 83.8%, and the average transmittance at a wavelength of 500 to 600 nm is 86.9%.
(V4): IR cut-off wavelength of 600 nm to 700 nm is 637 nm, IR cut-off wavelength of wavelength 700 nm to 800 nm is 800 nm, the difference between these IR cut-off wavelengths is 163 nm, and wavelength of 600 to 800 nm The maximum absorption wavelength is 706 nm.

於紅外線吸收層ira3之上,使用真空蒸鍍裝置,以與實施例1相同之方式形成抗反射膜ar1,獲得比較例1之濾光器。An anti-reflection film ar1 was formed on the infrared absorbing layer ira3 in the same manner as in Example 1 using a vacuum evaporation device to obtain a filter of Comparative Example 1.

將比較例1之濾光器之穿透率光譜示於圖13C及表29。又,比較例1之濾光器具有表30所示之特性。將選自0°、30°及40°中之2個入射角度之比較例1之濾光器之分光穿透率之差與波長的關係示於圖14A。將選自0°、30°及40°中之2個入射角度之比較例1之濾光器之分光穿透率之差之絕對值與波長的關係示於圖14B。將選自0°、30°及40°中之2個入射角度之比較例1之濾光器之分光穿透率之差之平方值與波長的關係示於圖14C。自0°、30°及40°之入射角度之比較例1之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表31〜33。The transmittance spectrum of the filter of Comparative Example 1 is shown in FIG. 13C and Table 29. The filter of Comparative Example 1 has the characteristics shown in Table 30. The relationship between the difference in spectral transmittance and the wavelength of the filter of Comparative Example 1 at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 14A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Comparative Example 1 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 14B. The relationship between the square of the difference in the spectral transmittance of the filter of Comparative Example 1 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 14C. From the transmittance spectra of the filter of Comparative Example 1 at incidence angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained from the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and at the wavelength λ of λ1 = 380 and λ2 = 530 The variable domains, the variable domains of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 31 to 33.

<比較例2>
準備於0°之入射角度表現出圖15A所示之穿透率光譜之紅外線吸收性玻璃基板。該紅外線吸收性玻璃基板具有以下之特性(g1)〜(g10)。
(g1):波長390 nm之分光穿透率為87.9%。
(g2):波長400 nm之分光穿透率為88.5%。
(g3):波長450 nm之分光穿透率為90.2%。
(g4):波長700 nm之分光穿透率為29.8%。
(g5):波長715 nm之分光穿透率為25.3%。
(g6):波長1100 nm之分光穿透率為32.5%。
(g7):波長1200 nm之分光穿透率為44.5%。
(g8):波長500〜600 nm之平均穿透率為86.5%。
(g9):波長700〜800 nm之平均穿透率為19.1%。
(g10):IR截止波長為653 nm,於波長600〜800 nm表現出20%之穿透率之波長為738 nm。
〈Comparative example 2〉
An infrared-absorbing glass substrate prepared to exhibit a transmittance spectrum shown in FIG. 15A at an incident angle of 0 °. This infrared-absorbing glass substrate has the following characteristics (g1) to (g10).
(G1): The spectral transmittance at a wavelength of 390 nm is 87.9%.
(G2): The spectral transmittance at a wavelength of 400 nm is 88.5%.
(G3): The spectral transmittance at a wavelength of 450 nm is 90.2%.
(G4): The spectral transmittance at a wavelength of 700 nm is 29.8%.
(G5): The spectral transmittance at a wavelength of 715 nm is 25.3%.
(G6): The spectral transmittance at a wavelength of 1100 nm is 32.5%.
(G7): The spectral transmittance at a wavelength of 1200 nm is 44.5%.
(G8): The average transmittance at a wavelength of 500 to 600 nm is 86.5%.
(G9): The average transmittance at a wavelength of 700 to 800 nm is 19.1%.
(G10): The IR cut-off wavelength is 653 nm, and the wavelength showing a 20% transmittance at a wavelength of 600 to 800 nm is 738 nm.

於具有210 μm之厚度之紅外線吸收性玻璃基板之一主面,使用真空蒸鍍裝置交替地積層20層SiO2 與TiO2 而形成紅外線反射膜irr3,獲得半成品ζ。於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於與紅外線反射膜irr3之形成條件相同之條件下形成紅外線反射膜,獲得參考例6之積層體。將參考例6之積層體之穿透率光譜示於圖15B。參考例6之積層體具有以下之特性(w1)〜(w3)。
(w1):於光之入射角度為0°之情形時,波長380 nm之穿透率為0.5%以下,波長400 nm之穿透率為0.5%以下,波長450〜600 nm之平均穿透率為95.2%,波長450〜600 nm之穿透率之最低值為93.7%,波長700〜800 nm之平均穿透率為4.7%,波長1100 nm之穿透率為0.5%以下,IR截止波長為702 nm,UV截止波長為411 nm。
(w2):於光之入射角度為30°之情形時,波長380 nm之穿透率為1.7%,波長400 nm之穿透率為77.7%,波長450〜600 nm之平均穿透率為94.1%,波長450〜600 nm之穿透率之最低值為93.0%,波長700〜800 nm之平均穿透率為1.1%,波長1100 nm之穿透率為1.2%,IR截止波長為680 nm,UV截止波長為397 nm。
(w3):於光之入射角度為40°之情形時,波長380 nm之穿透率為13.1%,波長400 nm之穿透率為90.5%,波長450〜600 nm之平均穿透率為92.1%,波長450〜600 nm之穿透率之最低值為87.6%,波長700〜800 nm之平均穿透率為0.5%以下,波長1100 nm之穿透率為5.4%,IR截止波長為661 nm,UV截止波長為386 nm。
On one main surface of an infrared-absorbing glass substrate having a thickness of 210 μm, 20 layers of SiO 2 and TiO 2 were alternately laminated using a vacuum evaporation device to form an infrared reflective film irr3, to obtain a semi-finished product ζ. An infrared reflective film was formed on one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) under the same conditions as those for forming the infrared reflective film irr3, to obtain a laminated body of Reference Example 6. The transmittance spectrum of the laminated body of Reference Example 6 is shown in FIG. 15B. The laminated body of Reference Example 6 has the following characteristics (w1) to (w3).
(W1): When the incident angle of light is 0 °, the transmittance at a wavelength of 380 nm is 0.5% or less, the transmittance at a wavelength of 400 nm is 0.5% or less, and the average transmittance at a wavelength of 450 to 600 nm It is 95.2%, the minimum value of the transmittance at the wavelength of 450 to 600 nm is 93.7%, the average transmittance of the wavelength of 700 to 800 nm is 4.7%, the transmittance of the wavelength of 1100 nm is less than 0.5%, and the IR cutoff wavelength is 702 nm, UV cut-off wavelength is 411 nm.
(W2): When the incident angle of light is 30 °, the transmittance at a wavelength of 380 nm is 1.7%, the transmittance at a wavelength of 400 nm is 77.7%, and the average transmittance at a wavelength of 450 to 600 nm is 94.1 %, The lowest value of the transmittance at the wavelength of 450 ~ 600 nm is 93.0%, the average transmittance of the wavelength of 700 ~ 800 nm is 1.1%, the transmittance of the wavelength of 1100 nm is 1.2%, and the IR cut-off wavelength is 680 nm. The UV cut-off wavelength is 397 nm.
(W3): When the incident angle of light is 40 °, the transmittance at a wavelength of 380 nm is 13.1%, the transmittance at a wavelength of 400 nm is 90.5%, and the average transmittance at a wavelength of 450 to 600 nm is 92.1 %, The minimum transmittance of the wavelength 450 ~ 600 nm is 87.6%, the average transmittance of the wavelength 700 ~ 800 nm is less than 0.5%, the transmittance of the wavelength 1100 nm is 5.4%, and the IR cut-off wavelength is 661 nm The UV cut-off wavelength is 386 nm.

以如下方式製備包含紅外線吸收色素及紫外線吸收色素之塗覆液UVIRA2。紫外線吸收色素係由不易吸收可見光區域之光之二苯甲酮系紫外線吸收性物質所構成之色素。紅外線吸收色素係花青系有機色素與方酸鎓系有機色素之組合。紅外線吸收色素及紫外線吸收色素可溶於MEK。將紅外線吸收色素及紫外線吸收色素加入至作為溶劑之MEK中,進而加入作為基質材料之PVB,其後,攪拌2小時而獲得塗覆液UVIRA2。塗覆液UVIRA2之固形物成分中之PVB之含有率為60質量%。將塗覆液UVIRA2塗佈於半成品ζ之另一主面,加熱該塗膜使之硬化,形成紅外線・紫外線吸收層uvira2。紅外線・紫外線吸收層uvira2之厚度為7 μm。於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,使用塗覆液UVIRA2,於與紅外線・紫外線吸收層uvira2之形成條件相同之條件下形成紅外線・紫外線吸收層,獲得參考例7之積層體。將0°之入射角度之參考例7之積層體的穿透率光譜示於圖15C。參考例7之積層體具有以下之特性(p1)〜(p5)。
(p1):波長700 nm之穿透率為4.9%,波長715 nm之穿透率為8.4%,波長700〜800 nm之平均穿透率為63.9%。
(p2):波長1100 nm之穿透率為92.3%。
(p3):波長400 nm之穿透率為12.6%,450 nm之穿透率為84.4%,波長500〜600 nm之平均穿透率為88.7%。
(p4):波長600 nm〜700 nm之IR截止波長為664 nm,波長700 nm〜800 nm之IR截止波長為731 nm,該等之差為67 nm。於波長600 nm〜800 nm表現出最低之穿透率之波長(極大吸收波長)為705 nm。
(p5):波長350 nm〜450 nm之UV截止波長為411 nm。
A coating liquid UVIRA2 containing an infrared absorbing pigment and an ultraviolet absorbing pigment was prepared as follows. The ultraviolet-absorbing pigment is a pigment composed of a benzophenone-based ultraviolet-absorbing substance that does not easily absorb light in the visible light region. A combination of infrared absorbing pigment-based cyanine-based organic pigments and squarylium-based organic pigments. Infrared absorbing pigments and ultraviolet absorbing pigments are soluble in MEK. The infrared absorbing dye and the ultraviolet absorbing dye were added to MEK as a solvent, and PVB as a matrix material was further added, followed by stirring for 2 hours to obtain a coating liquid UVIRA2. The content of PVB in the solid content of the coating liquid UVIRA2 was 60% by mass. The coating liquid UVIRA2 was applied to the other main surface of the semi-finished product ζ, and the coating film was heated to harden it to form an infrared / ultraviolet absorbing layer uvira2. The thickness of the infrared and ultraviolet absorption layer uvira2 is 7 μm. On one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco), a coating liquid UVIRA2 was used, and an infrared and ultraviolet absorbing layer was formed under the same conditions as those for forming the infrared and ultraviolet absorbing layer uvira2 to obtain The laminated body of Reference Example 7. The transmittance spectrum of the laminated body of Reference Example 7 at an incident angle of 0 ° is shown in FIG. 15C. The laminated body of Reference Example 7 has the following characteristics (p1) to (p5).
(P1): The transmittance at a wavelength of 700 nm is 4.9%, the transmittance at a wavelength of 715 nm is 8.4%, and the average transmittance at a wavelength of 700 to 800 nm is 63.9%.
(P2): 92.3% transmission at 1100 nm.
(P3): The transmittance at a wavelength of 400 nm is 12.6%, the transmittance at 450 nm is 84.4%, and the average transmittance at a wavelength of 500 to 600 nm is 88.7%.
(P4): The IR cut-off wavelength of wavelength 600 nm to 700 nm is 664 nm, the IR cut-off wavelength of wavelength 700 nm to 800 nm is 731 nm, and the difference is 67 nm. The wavelength (maximum absorption wavelength) exhibiting the lowest transmittance at a wavelength of 600 nm to 800 nm is 705 nm.
(P5): The UV cut-off wavelength of the wavelength from 350 nm to 450 nm is 411 nm.

於紅外線・紫外線吸收層uvira2之上,使用真空蒸鍍裝置,以與實施例1相同之方式形成抗反射膜ar1。抗反射膜ar1係交替地積層SiO2 與TiO2 而成之膜,於抗反射膜ar1中,層數為7層,總膜厚為約0.4 μm。如此,獲得比較例2之濾光器。An anti-reflection film ar1 was formed on the infrared / ultraviolet absorbing layer uvira2 in the same manner as in Example 1 using a vacuum evaporation device. The anti-reflection film ar1 is a film in which SiO 2 and TiO 2 are alternately laminated. In the anti-reflection film ar1, the number of layers is 7 and the total film thickness is about 0.4 μm. In this way, the filter of Comparative Example 2 was obtained.

將比較例2之濾光器之穿透率光譜示於圖15D及表34。又,比較例2之濾光器具有表35所示之特性。將選自0°、30°及40°中之2個入射角度之比較例2之濾光器之分光穿透率之差與波長的關係示於圖16A。將選自0°、30°及40°中之2個入射角度之比較例2之濾光器之分光穿透率之差之絕對值與波長的關係示於圖16B。將選自0°、30°及40°中之2個入射角度之比較例2之濾光器之分光穿透率之差之平方值與波長的關係示於圖16C。自0°、30°及40°之入射角度之比較例2之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表36〜38。The transmittance spectrum of the filter of Comparative Example 2 is shown in FIG. 15D and Table 34. The filter of Comparative Example 2 has the characteristics shown in Table 35. The relationship between the difference in spectral transmittance and the wavelength of the filter of Comparative Example 2 at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 16A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Comparative Example 2 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 16B. The relationship between the square value of the difference in the spectral transmittance of the filter of Comparative Example 2 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 16C. From the transmittance spectra of the filter of Comparative Example 2 at incidence angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained from the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and at the wavelength λ of λ1 = 380 and λ2 = 530 The variable domains, the variable domains of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domains of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 36 to 38.

<比較例3>
以與實施例1相同之方式製備塗覆液IRA1及塗覆液IRA2。藉由模嘴塗佈機將塗覆液IRA1塗佈於透明玻璃基板(SCHOTT公司製造,製品名:D263 T eco)之一主面,於烘箱中於85℃進行3小時之加熱處理,繼而,於125℃進行3小時之加熱處理,繼而,於150℃進行1小時之加熱處理,繼而,於170℃進行3小時之加熱處理,使塗膜硬化而形成紅外線吸收層ira11。以相同之方式,亦於透明玻璃基板之相反側主面塗佈塗覆液IRA1,於與上述相同之條件下進行加熱處理使塗膜硬化,形成紅外線吸收層ira12。如此,獲得比較例3之濾光器之半成品γ。紅外線吸收層ira11及紅外線吸收層ira12之厚度共計0.2 mm。將0°之入射角度之半成品γ之穿透率光譜示於圖17A。半成品γ具有以下之(γ1)〜(γ10)之特性。
(γ1):波長390 nm之分光穿透率為35.4%。
(γ2):波長400 nm之分光穿透率為60.9%。
(γ3):波長450 nm之分光穿透率為84.9%。
(γ4):波長700 nm之分光穿透率為1.4%。
(γ5):波長715 nm之分光穿透率為0.5%。
(γ6):波長1100 nm之分光穿透率為9.4%。
(γ7):波長1200 nm之分光穿透率為45.5%。
(γ8):波長500〜600 nm之平均穿透率為87.6%。
(γ9):波長700〜800 nm之平均穿透率為0.5%以下。
(γ10):IR截止波長為629 nm,UV截止波長為395 nm,於將IR截止波長與UV截止波長之差視為穿透區域之半高寬時,穿透區域之半高寬為234 nm。
〈Comparative example 3〉
A coating liquid IRA1 and a coating liquid IRA2 were prepared in the same manner as in Example 1. The coating liquid IRA1 was applied to one of the main surfaces of a transparent glass substrate (manufactured by SCHOTT, product name: D263 T eco) with a die coater, and then heated at 85 ° C for 3 hours in an oven. Heat treatment was performed at 125 ° C for 3 hours, followed by heat treatment at 150 ° C for 1 hour, and then heat treatment at 170 ° C for 3 hours to harden the coating film to form an infrared absorbing layer ira11. In the same manner, the coating liquid IRA1 was also applied to the main surface on the opposite side of the transparent glass substrate, and the coating film was hardened under the same conditions as described above to form the infrared absorbing layer ira12. In this way, a semi-finished product γ of the filter of Comparative Example 3 was obtained. The thickness of the infrared absorbing layer ira11 and the infrared absorbing layer ira12 is 0.2 mm in total. The transmittance spectrum of the semi-finished product γ at an incident angle of 0 ° is shown in FIG. 17A. The semi-finished product γ has the following characteristics (γ1) to (γ10).
(Γ1): The spectral transmittance at a wavelength of 390 nm is 35.4%.
(Γ2): The spectral transmittance at a wavelength of 400 nm is 60.9%.
(Γ3): The spectral transmittance at a wavelength of 450 nm is 84.9%.
(Γ4): The spectral transmittance at a wavelength of 700 nm is 1.4%.
(Γ5): The spectral transmittance at a wavelength of 715 nm is 0.5%.
(Γ6): The spectral transmittance at a wavelength of 1100 nm is 9.4%.
(Γ7): The spectral transmittance at a wavelength of 1200 nm is 45.5%.
(Γ8): The average transmittance at a wavelength of 500 to 600 nm is 87.6%.
(Γ9): The average transmittance at a wavelength of 700 to 800 nm is 0.5% or less.
(Γ10): The IR cut-off wavelength is 629 nm and the UV cut-off wavelength is 395 nm. When the difference between the IR cut-off wavelength and the UV cut-off wavelength is regarded as the half-width of the penetration region, the half-width of the penetration region is 234 nm .

於半成品γ之於紅外線吸收層ira12之上形成500 nm之厚度之SiO2 之蒸鍍膜(保護層p2)。於保護層p2之上,藉由旋轉塗覆而塗佈實施例1中所使用之塗覆液UVA1,將該塗膜於140℃加熱30分鐘使之硬化而形成紫外線吸收層uva1。紫外線吸收層uva1之厚度為6 μm。A vapor-deposited film (protective layer p2) of SiO 2 with a thickness of 500 nm was formed on the infrared absorption layer ira12 of the semi-finished product γ. On the protective layer p2, the coating liquid UVA1 used in Example 1 was applied by spin coating, and the coating film was heated at 140 ° C for 30 minutes to harden to form an ultraviolet absorbing layer uva1. The thickness of the ultraviolet absorbing layer uva1 is 6 μm.

於紅外線吸收層ira11之上,使用真空蒸鍍裝置形成抗反射膜ar1。又,於紫外線吸收層uva1上,使用真空蒸鍍裝置形成抗反射膜ar2。抗反射膜ar1及抗反射膜ar2係具有相同之規格,交替地積層SiO2 與TiO2 而成之膜,於抗反射膜ar1及抗反射膜ar2中,層數為7層,總膜厚為約0.4 μm。如此,獲得比較例3之濾光器。An anti-reflection film ar1 is formed on the infrared absorbing layer ira11 using a vacuum evaporation device. An anti-reflection film ar2 is formed on the ultraviolet absorbing layer uva1 using a vacuum evaporation device. The anti-reflection film ar1 and the anti-reflection film ar2 are films having the same specifications and alternately laminated with SiO 2 and TiO 2. The number of layers in the anti-reflection film ar1 and the anti-reflection film ar2 is 7 layers, and the total film thickness is Approximately 0.4 μm. In this way, the filter of Comparative Example 3 was obtained.

將比較例3之濾光器之穿透率光譜示於圖17B及表39。又,比較例3之濾光器具有表40所示之特性。將選自0°、30°及40°中之2個入射角度之比較例3之濾光器之分光穿透率之差與波長的關係示於圖18A。將選自0°、30°及40°中之2個入射角度之比較例3之濾光器之分光穿透率之差之絕對值與波長的關係示於圖18B。將選自0°、30°及40°中之2個入射角度之比較例3之濾光器之分光穿透率之差之平方值與波長的關係示於圖18C。自0°、30°及40°之入射角度之比較例3之濾光器的穿透率光譜,根據上述式(1)〜(3),求出IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 。IEθ1/θ2 λ1 λ2 、IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 係於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域求出。將結果示於表41〜43。The transmittance spectrum of the filter of Comparative Example 3 is shown in FIG. 17B and Table 39. The filter of Comparative Example 3 has the characteristics shown in Table 40. The relationship between the difference in spectral transmittance and the wavelength of the filter of Comparative Example 3 at two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 18A. The relationship between the absolute value of the difference in the spectral transmittance of the filter of Comparative Example 3 and the wavelength between two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 18B. The relationship between the square value of the difference in the spectral transmittance of the filter of Comparative Example 3 and the wavelength from two incidence angles selected from 0 °, 30 °, and 40 ° is shown in FIG. 18C. From the transmittance spectra of the filter of Comparative Example 3 at incidence angles of 0 °, 30 °, and 40 °, IE θ1 / θ2 λ1 to λ2 and IAE θ1 / were obtained from the above formulas (1) to (3). θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 . IE θ1 / θ2 λ1 to λ2 , IAE θ1 / θ2 λ1 to λ2, and ISE θ1 / θ2 λ1 to λ2 are in the variable range of the wavelength λ at λ1 = 350 and λ2 = 800, and at the wavelength λ of λ1 = 380 and λ2 = 530 The variable domain, the variable domain of the wavelength λ of λ1 = 450 and λ2 = 650, and the variable domain of the wavelength λ of λ1 = 530 and λ2 = 750 were obtained. The results are shown in Tables 41 to 43.

於實施例1〜5之濾光器中,滿足上述(i-1)〜(ix-1)之條件。顯示於實施例1〜5之濾光器中,700 nm以上之波長範圍內之穿透率充分低,實施例1〜5之濾光器可良好地屏蔽近紅外線。實施例2之濾光器與實施例1之濾光器相比,於700 nm以上之波長範圍內表現出較低之穿透率。於實施例2之濾光器中,藉由含有紅外線吸收色素,與實施例1之濾光器相比,可見光區域之穿透率低2點左右。但是,認為實用上不存在問題。於實施例5之濾光器中,與其他實施例之濾光器相比,波長400 nm附近之穿透率雖高,但為44.9%以下。In the filters of Examples 1 to 5, the above conditions (i-1) to (ix-1) are satisfied. The filters shown in Examples 1 to 5 have sufficiently low transmittance in a wavelength range above 700 nm, and the filters of Examples 1 to 5 can shield near infrared rays well. Compared with the filter of Example 1, the filter of Example 2 exhibits a lower transmittance in a wavelength range above 700 nm. In the filter of Example 2, by including an infrared absorbing pigment, the transmittance in the visible light region was about 2 points lower than that of the filter of Example 1. However, it is considered that there is no problem in practical use. In the optical filter of Example 5, compared with the optical filters of other Examples, the transmittance near the wavelength of 400 nm is higher, but it is 44.9% or less.

於實施例1〜5之濾光器中,滿足上述表(I)〜(III)所示之條件。尤其是實施例1、2及5之濾光器對0°、30°、40°之入射角度之分光穿透率係於各波長λ之變域未發生變化。因此,於實施例1、2及5之濾光器中,IEθ1/θ2 λ1 λ2 相對於表(I)〜(III)中所記載之上限值充分小,且相對於下限值充分大。除此以外,於實施例1、2及5之濾光器中,IAEθ1/θ2 λ1 λ2 及ISEθ1/θ2 λ1 λ2 之值相對於表(II)及表(III)之上限值充分小。於實施例3及4之濾光器之紅外線反射膜中,以使40°之入射角度之光穿透之波段與使40°之入射角度之光反射之波段之邊界成為850 nm附近的方式設定。因此,於350 nm〜800 nm之波長範圍之長波長側(600 nm〜800 nm之波長範圍),0°、30°及40°之入射角度之實施例3及4之濾光器的分光穿透率幾乎無變化。另一方面,於實施例3及4之濾光器中,光之入射角度越大則波長400 nm附近之穿透率越高。該影響係於實施例3及4之濾光器中,出現於IE0/30 380 530 、IE0/40 380 530 、IAE0/30 380 530 、IAE0/40 380 530 、ISE0/30 380 530 及ISE0/40 380 530 。實施例3及4之濾光器於30°之入射角度之波長530 nm附近的分光穿透率高於實施例3及4之濾光器於0°之入射角度及40°之入射角度之波長530 nm附近的分光穿透率。該影響出現於IE0/30 450 650 、IE30/40 450 650 、IAE0/30 450 650 、IAE30/40 450 650 、ISE0/30 450 650 及ISE30/40 450 650 。但是,任一影響均越滿足表(I)〜(III)所示之條件則越小。因此,認為於將實施例1〜5之濾光器組裝於相機模組之情形時,即便於0°〜40°之入射角度之範圍內使光線入射至濾光器,亦不會於拍攝之圖像之內部產生色不均。In the filters of Examples 1 to 5, the conditions shown in the above Tables (I) to (III) were satisfied. In particular, the spectral transmittances of the filters of Examples 1, 2, and 5 for incident angles of 0 °, 30 °, and 40 ° are unchanged in the variable domains of each wavelength λ. Therefore, in the filters of Examples 1, 2, and 5, IE θ1 / θ2 λ1 to λ2 are sufficiently smaller than the upper limit values described in Tables (I) to (III), and sufficiently sufficient for the lower limit values. Big. In addition, in the filters of Examples 1, 2, and 5, the values of IAE θ1 / θ2 λ1 to λ2 and ISE θ1 / θ2 λ1 to λ2 are relative to the upper limits of Tables (II) and (III). Small enough. In the infrared-reflective film of the filters of Examples 3 and 4, the boundary between the band of light transmitted by the incident angle of 40 ° and the band of reflected light by the incident angle of 40 ° was set to be near 850 nm . Therefore, on the long wavelength side of the wavelength range of 350 nm to 800 nm (wavelength range of 600 nm to 800 nm), the spectral splitting of the filters of Examples 3 and 4 at the incident angles of 0 °, 30 °, and 40 ° There is almost no change in transmittance. On the other hand, in the filters of Examples 3 and 4, the larger the incident angle of light, the higher the transmittance around the wavelength of 400 nm. This effect is in the filters of Examples 3 and 4, and appears in IE 0/30 380 to 530 , IE 0/40 380 to 530 , IAE 0/30 380 to 530 , IAE 0/40 380 to 530 , ISE 0/30 380 to 530 and ISE 0/40 380 to 530 . The spectral transmittance of the filters of Examples 3 and 4 near the wavelength of 530 nm at an incident angle of 30 ° is higher than the wavelengths of the filters of Examples 3 and 4 at an incident angle of 0 ° and an incident angle of 40 ° Spectroscopic transmission near 530 nm. This effect appears in IE 0/30 450 to 650 , IE 30/40 450 to 650 , IAE 0/30 450 to 650 , IAE 30/40 450 to 650 , ISE 0/30 450 to 650, and ISE 30/40 450 to 650 . However, the more any of the effects satisfies the conditions shown in Tables (I) to (III), the smaller it is. Therefore, it is considered that when the filters of Examples 1 to 5 are assembled in a camera module, even if light is incident on the filter within an angle of incidence ranging from 0 ° to 40 °, it will not be used for shooting. Color unevenness is generated inside the image.

根據比較例1之濾光器,可見光區域之與近紅外線區域鄰接之區域及近紅外線區域中之使光穿透之波段與屏蔽光之波段的邊界係由紅外線吸收層ira3而確定。但是,由於紅外線吸收層ira3之吸收頻帶較窄,故而比較例1之濾光器之穿透率光譜受到隨著光之入射角度變大,紅外線反射膜之反射頻帶向短波長側偏移之影響。又,比較例1之濾光器於紫外線區域中之光之吸收能力不足,比較例1之濾光器實質上僅藉由紅外線反射膜irr2屏蔽紫外線區域之光。因此,比較例1之濾光器係於紫外線區域,強烈受到因光之入射角度而反射頻帶向短波長側偏移之影響。因此,比較例1之濾光器不滿足上述(i-1)、(ii-1)、(vi-1)及(vii-1)之條件,進而,比較例1之濾光器於400 nm附近之分光穿透率係於0°之入射角度與30°之入射角度之間大幅變動。除此以外,比較例1之濾光器於650 nm附近之分光穿透率係於0°之入射角度與40°之入射角度之間大幅變動。除此以外,比較例1之濾光器於450 nm〜650 nm之範圍內之分光穿透率係於0°之入射角度與40°之入射角度之間、及30°之入射角度與40°之入射角度之間局部大幅變動。IAE30/40 350 800 、ISE30/40 380 800 、IAE30/40 380 530 、ISE30/40 380 530 、IE30/40 450 650 、IAE30/40 450 650 、IE30/40 530 750 、IAE30/40 530 750 及ISE30/40 530 750 未落入表(I)〜(III)所示之範圍。因此,於將比較例1之濾光器組裝於攝像裝置之情形時,顧慮於所獲得之圖像之較窄之範圍內產生較強之色不均。According to the filter of Comparative Example 1, the boundary between the visible light region adjacent to the near-infrared region and the band in which light is transmitted and the band in which light is shielded are determined by the infrared absorbing layer ira3. However, since the absorption band of the infrared absorption layer ira3 is narrow, the transmittance spectrum of the filter of Comparative Example 1 is affected by the shift of the reflection band of the infrared reflection film to the short wavelength side as the incident angle of light becomes larger. . In addition, the filter of Comparative Example 1 has insufficient light absorption capacity in the ultraviolet region, and the filter of Comparative Example 1 essentially shields light in the ultraviolet region only by the infrared reflecting film irr2. Therefore, the filter of Comparative Example 1 is located in the ultraviolet region, and is strongly affected by the shift of the reflection frequency band to the short wavelength side due to the incident angle of light. Therefore, the filter of Comparative Example 1 did not satisfy the conditions (i-1), (ii-1), (vi-1), and (vii-1) described above. Furthermore, the filter of Comparative Example 1 was at 400 nm. The nearby spectral transmittance varies greatly between an incident angle of 0 ° and an incident angle of 30 °. In addition, the spectral transmittance of the filter of Comparative Example 1 near 650 nm largely varies between an incident angle of 0 ° and an incident angle of 40 °. In addition, the spectral transmittance of the filter of Comparative Example 1 in the range of 450 nm to 650 nm is between an incident angle of 0 ° and an incident angle of 40 °, and an incident angle of 30 ° and 40 ° The incident angle varies greatly locally. IAE 30/40 350 to 800 , ISE 30/40 380 to 800 , IAE 30/40 380 to 530 , ISE 30/40 380 to 530 , IE 30/40 450 to 650 , IAE 30/40 450 to 650 , IE 30 / 40 530 to 750 , IAE 30/40 530 to 750, and ISE 30/40 530 to 750 do not fall within the ranges shown in Tables (I) to (III). Therefore, when the filter of Comparative Example 1 is incorporated in an imaging device, there is a concern that strong color unevenness is generated in a narrow range of the obtained image.

於比較例2之濾光器中,於可見光區域之與近紅外線區域鄰接之區域、近紅外線區域以及紫外線區域,使光穿透之波段與屏蔽光之波段之邊界係由紅外線・紫外線吸收層uvira2而確定。但是,由於近紅外線區域中之紅外線・紫外線吸收層uvira2之吸收頻帶較窄,故而於比較例2之濾光器中,IE30/40 350 800 表現出較大之值。又,40°之入射角度之比較例2之濾光器之穿透率光譜於可見光區域可見分光穿透率之局部變動(波紋)。因此,尤其是IE30/40 350 800 、IAE30/40 350 800 、ISE30/40 350 800 、IE30/40 380 530 、IAE30/40 380 530 、IE30/40 450 650 、IAE30/40 450 650 、IE30/40 530 750 及IAE30/40 530 750 成為較大值。因此,於將比較例2之濾光器組裝於攝像裝置之情形時,顧慮於所獲得之圖像之較窄之範圍內產生較強之色不均。In the filter of Comparative Example 2, in the region adjacent to the near-infrared region in the visible light region, the near-infrared region, and the ultraviolet region, the boundary between the band of light transmission and the shielded light band is formed by the infrared and ultraviolet absorption layer uvira2 And ok. However, since the infrared / ultraviolet absorbing layer uvira2 has a narrow absorption band in the near-infrared region, in the filter of Comparative Example 2, IE 30/40 350 to 800 shows a larger value. In addition, the transmittance spectrum of the filter of Comparative Example 2 with an incident angle of 40 ° is a local variation (moiré) of the visible spectral transmittance in the visible light region. Therefore, IE 30/40 350 to 800 , IAE 30/40 350 to 800 , ISE 30/40 350 to 800 , IE 30/40 380 to 530 , IAE 30/40 380 to 530 , and IE 30/40 450 to 650 , IAE 30/40 450 to 650 , IE 30/40 530 to 750, and IAE 30/40 530 to 750 become larger values. Therefore, when the filter of Comparative Example 2 is incorporated in an imaging device, there is a concern that a strong color unevenness is generated in a narrow range of the obtained image.

於比較例3之濾光器中,不滿足上述(vi-1)及(vii-1)之條件。因此,難謂比較例3之濾光器於1100〜1200 nm之波長範圍內具有期望特性。In the filter of Comparative Example 3, the conditions (vi-1) and (vii-1) described above were not satisfied. Therefore, it is difficult to say that the filter of Comparative Example 3 has desired characteristics in a wavelength range of 1100 to 1200 nm.

[表4]
[Table 4]

[表5]
[table 5]

[表6]
[TABLE 6]

[表7]
[TABLE 7]

[表8]
[TABLE 8]

[表9]
[TABLE 9]

[表10]
[TABLE 10]

[表11]
[TABLE 11]

[表12]
[TABLE 12]

[表13]
[TABLE 13]

[表14]
[TABLE 14]

[表15]
[Table 15]

[表16]
[TABLE 16]

[表17]
[TABLE 17]

[表18]
[TABLE 18]

[表19]
[TABLE 19]

[表20]
[TABLE 20]

[表21]
[TABLE 21]

[表22]
[TABLE 22]

[表23]
[TABLE 23]

[表24]
[TABLE 24]

[表25]
[TABLE 25]

[表26]
[TABLE 26]

[表27]
[TABLE 27]

[表28]
[TABLE 28]

[表29]
[TABLE 29]

[表30]
[TABLE 30]

[表31]
[TABLE 31]

[表32]
[TABLE 32]

[表33]
[TABLE 33]

[表34]
[TABLE 34]

[表35]
[TABLE 35]

[表36]
[TABLE 36]

[表37]
[TABLE 37]

[表38]
[TABLE 38]

[表39]
[TABLE 39]

[表40]
[TABLE 40]

[表41]
[TABLE 41]

[表42]
[TABLE 42]

[表43]
[TABLE 43]

1a〜1f‧‧‧濾光器 1a ~ 1f‧‧‧ Filter

2‧‧‧透鏡系統 2‧‧‧ lens system

3‧‧‧濾色器 3‧‧‧ color filter

4‧‧‧攝像元件 4‧‧‧ camera element

10‧‧‧光吸收層 10‧‧‧ light absorbing layer

20‧‧‧透明介電基板 20‧‧‧ transparent dielectric substrate

30‧‧‧抗反射膜 30‧‧‧Anti-reflective film

40‧‧‧反射膜 40‧‧‧Reflective film

100‧‧‧攝像裝置(相機模組) 100‧‧‧ Camera (Camera Module)

圖1A係表示本發明之濾光器之一例之剖面圖。Fig. 1A is a sectional view showing an example of an optical filter according to the present invention.

圖1B係表示本發明之濾光器之另一例之剖面圖。 Fig. 1B is a sectional view showing another example of the optical filter of the present invention.

圖1C係表示本發明之濾光器之又一例之剖面圖。 Fig. 1C is a sectional view showing still another example of the optical filter of the present invention.

圖1D係表示本發明之濾光器之又一例之剖面圖。 FIG. 1D is a sectional view showing still another example of the optical filter of the present invention.

圖1E係表示本發明之濾光器之又一例之剖面圖。 Fig. 1E is a sectional view showing still another example of the optical filter of the present invention.

圖1F係表示本發明之濾光器之又一例之剖面圖。 FIG. 1F is a sectional view showing still another example of the optical filter of the present invention.

圖2係表示本發明之攝像裝置之一例之剖面圖。 Fig. 2 is a cross-sectional view showing an example of an imaging device according to the present invention.

圖3A係實施例1之濾光器之半成品之穿透率光譜。 FIG. 3A is a transmittance spectrum of a semi-finished product of the filter of Example 1. FIG.

圖3B係實施例1之濾光器之其他半成品之穿透率光譜。 FIG. 3B is a transmittance spectrum of another semi-finished product of the filter of Example 1. FIG.

圖3C係參考例1之積層體之穿透率光譜。 FIG. 3C is a transmittance spectrum of the laminated body of Reference Example 1. FIG.

圖3D係參考例2之積層體之穿透率光譜。 FIG. 3D is a transmittance spectrum of the laminated body of Reference Example 2. FIG.

圖3E係實施例1之濾光器之穿透率光譜。 FIG. 3E is a transmittance spectrum of the filter of Example 1. FIG.

圖4A係表示實施例1之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 4A is a graph showing a difference in spectral transmittance of the filter of Example 1 at different incident angles.

圖4B係表示實施例1之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 FIG. 4B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Example 1 at different incident angles.

圖4C係表示實施例1之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 FIG. 4C is a graph showing the square of the difference between the spectral transmittances of the filters of Example 1 at different incident angles.

圖5A係參考例3之積層體之穿透率光譜。 FIG. 5A is a transmittance spectrum of the laminated body of Reference Example 3. FIG.

圖5B係實施例2之濾光器之穿透率光譜。 FIG. 5B is a transmittance spectrum of the filter of Example 2. FIG.

圖6A係表示實施例2之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 6A is a graph showing a difference in spectral transmittance of the filter of Example 2 at different incident angles.

圖6B係表示實施例2之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 FIG. 6B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Example 2 at different incident angles.

圖6C係表示實施例2之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 FIG. 6C is a graph showing the square of the difference between the spectral transmittances of the filters of Example 2 at different incident angles.

圖7A係參考例4之積層體之穿透率光譜。 FIG. 7A is a transmittance spectrum of the laminated body of Reference Example 4. FIG.

圖7B係實施例3之濾光器之穿透率光譜。 FIG. 7B is a transmittance spectrum of the filter of Example 3. FIG.

圖8A係表示實施例3之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 8A is a graph showing the difference in the spectral transmittance of the filter of Example 3 at different incident angles.

圖8B係表示實施例3之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 FIG. 8B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Example 3 at different incident angles.

圖8C係表示實施例3之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 FIG. 8C is a graph showing the square of the difference in the spectral transmittance of the filter of Example 3 at different incident angles.

圖9係實施例4之濾光器之穿透率光譜。 FIG. 9 is a transmittance spectrum of the filter of Example 4. FIG.

圖10A係表示實施例4之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 10A is a graph showing a difference in spectral transmittance of the filter of Example 4 at different incident angles.

圖10B係表示實施例4之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 FIG. 10B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Example 4 at different incident angles.

圖10C係表示實施例4之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 FIG. 10C is a graph showing the square of the difference between the spectral transmittances of the filters of Example 4 at different incident angles.

圖11A係實施例5之濾光器之半成品之穿透率光譜。 FIG. 11A is a transmittance spectrum of a semi-finished product of the filter of Example 5. FIG.

圖11B係實施例5之濾光器之穿透率光譜。 FIG. 11B is a transmittance spectrum of the filter of Example 5. FIG.

圖12A係表示實施例5之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 12A is a graph showing the difference in the spectral transmittance of the filter of Example 5 at different incident angles.

圖12B係表示實施例5之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 FIG. 12B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Example 5 at different incident angles.

圖12C係表示實施例5之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 FIG. 12C is a graph showing the square of the difference between the spectral transmittances of the filters of Example 5 at different incident angles.

圖13A係比較例1之濾光器之半成品之穿透率光譜。 FIG. 13A is a transmittance spectrum of a semi-finished product of the filter of Comparative Example 1. FIG.

圖13B係參考例5之積層體之穿透率光譜。 FIG. 13B is a transmittance spectrum of the laminated body of Reference Example 5. FIG.

圖13C係比較例1之濾光器之穿透率光譜。 FIG. 13C is a transmittance spectrum of the filter of Comparative Example 1. FIG.

圖14A係表示比較例1之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 14A is a graph showing a difference in spectral transmittance of the filter of Comparative Example 1 at different incident angles.

圖14B係表示比較例1之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 14B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Comparative Example 1 at different incident angles.

圖14C係表示比較例1之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 FIG. 14C is a graph showing the square of the difference in the spectral transmittance of the filter of Comparative Example 1 at different incident angles.

圖15A係比較例2之濾光器之紅外線吸收性玻璃基板之穿透率光譜。 FIG. 15A is a transmittance spectrum of an infrared-absorbing glass substrate of a filter of Comparative Example 2. FIG.

圖15B係參考例6之積層體之穿透率光譜。 FIG. 15B is a transmittance spectrum of the laminated body of Reference Example 6. FIG.

圖15C係參考例7之積層體之穿透率光譜。 FIG. 15C is a transmittance spectrum of the laminated body of Reference Example 7. FIG.

圖15D係比較例2之濾光器之穿透率光譜。 FIG. 15D is a transmittance spectrum of the filter of Comparative Example 2. FIG.

圖16A係表示比較例2之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 16A is a graph showing a difference in spectral transmittance of the filter of Comparative Example 2 at different incident angles.

圖16B係表示比較例2之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 16B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Comparative Example 2 at different incident angles.

圖16C係表示比較例2之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 16C is a graph showing the square of the difference in the spectral transmittance of the filter of Comparative Example 2 at different incident angles.

圖17A係比較例3之濾光器之半成品之穿透率光譜。 FIG. 17A is a transmittance spectrum of a semi-finished product of the filter of Comparative Example 3. FIG.

圖17B係比較例3之濾光器之穿透率光譜。 FIG. 17B is a transmittance spectrum of the filter of Comparative Example 3. FIG.

圖18A係表示比較例3之濾光器於不同之入射角度之分光穿透率之差的曲線圖。 FIG. 18A is a graph showing a difference in spectral transmittance of the filter of Comparative Example 3 at different incident angles.

圖18B係表示比較例3之濾光器於不同之入射角度之分光穿透率之差之絕對值的曲線圖。 18B is a graph showing the absolute value of the difference in the spectral transmittance of the filter of Comparative Example 3 at different incident angles.

圖18C係表示比較例3之濾光器於不同之入射角度之分光穿透率之差之平方值的曲線圖。 FIG. 18C is a graph showing the square of the difference in the spectral transmittance of the filter of Comparative Example 3 at different incident angles.

Claims (9)

一種濾光器, 其具備光吸收層,該光吸收層含有吸收近紅外線區域之至少一部分光之光吸收劑, 於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至該濾光器時,滿足下述條件: (i-1)波長390 nm之分光穿透率為20%以下; (ii-1)波長400 nm之分光穿透率為45%以下; (iii-1)波長450 nm之分光穿透率為75%以上; (iv-1)波長700 nm之分光穿透率為3%以下; (v-1)波長715 nm之分光穿透率為1%以下; (vi-1)波長1100 nm之分光穿透率為2%以下; (vii-1)波長1200 nm之分光穿透率為15%以下; (viii-1)波長500〜600 nm之平均穿透率為80%以上; (ix-1)波長700〜800 nm之平均穿透率為0.5%以下。An optical filter, It includes a light absorbing layer containing a light absorbing agent that absorbs at least a part of light in the near-infrared region, When light with a wavelength of 300 nm to 1200 nm is incident on the filter at incidence angles of 0 °, 30 °, and 40 °, the following conditions are satisfied: (I-1) The spectral transmittance at a wavelength of 390 nm is less than 20%; (Ii-1) The spectral transmittance at a wavelength of 400 nm is less than 45%; (Iii-1) The spectral transmittance at a wavelength of 450 nm is more than 75%; (Iv-1) The spectral transmittance at a wavelength of 700 nm is less than 3%; (V-1) The spectral transmittance of the wavelength of 715 nm is less than 1%; (Vi-1) The spectral transmittance at a wavelength of 1100 nm is less than 2%; (Vii-1) The spectral transmittance at a wavelength of 1200 nm is less than 15%; (Viii-1) The average transmittance at a wavelength of 500 to 600 nm is more than 80%; (Ix-1) The average transmittance at a wavelength of 700 to 800 nm is 0.5% or less. 如請求項1所述之濾光器,其中,於以0°、30°及40°之入射角度使波長300 nm〜1200 nm之光入射至該濾光器時,進而滿足下述條件: (i-2)波長390 nm之分光穿透率為10%以下; (ii-2)波長400 nm之分光穿透率為25%以下; (iv-2)波長700 nm之分光穿透率為2.5%以下; (vi-2)波長1100 nm之分光穿透率為1%以下; (vii-2)波長1200 nm之分光穿透率為13%以下; (viii-2)波長500〜600 nm之平均穿透率為85%以上。The filter according to claim 1, wherein when the light having a wavelength of 300 nm to 1200 nm is incident on the filter at incidence angles of 0 °, 30 °, and 40 °, the following conditions are further satisfied: (I-2) The spectral transmittance at a wavelength of 390 nm is less than 10%; (Ii-2) The spectral transmittance at a wavelength of 400 nm is less than 25%; (Iv-2) The spectral transmittance at a wavelength of 700 nm is less than 2.5%; (Vi-2) The spectral transmittance at a wavelength of 1100 nm is less than 1%; (Vii-2) The spectral transmittance at a wavelength of 1200 nm is less than 13%; (Viii-2) The average transmittance at a wavelength of 500 to 600 nm is 85% or more. 如請求項1或2所述之濾光器,其中, 於將入射角度為θ°時之波長λ之該濾光器之分光穿透率表示為Tθ (λ), 將波長λ之變域之最小值及最大值分別表示為λ1[nm]及λ2[nm], 將波長λ以0以上之整數n之函數表示為λ(n)=(∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ×n+λ1)[nm]時(其中,∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ=1), 針對選自0°、30°及40°中之2個入射角度θ1°及θ2°(θ1<θ2),於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域,由下述式(1)所定義之IEθ1/θ2 λ1 λ2 滿足下述表(I)所示之條件; The filter according to claim 1 or 2, wherein the spectral transmittance of the filter at a wavelength λ at an incident angle of θ ° is expressed as T θ (λ), and a variable range of the wavelength λ is expressed The minimum and maximum values are expressed as λ1 [nm] and λ2 [nm], respectively, and the function of the wavelength λ as an integer n above 0 is expressed as λ (n) = (∆ other fonts are used in the file, please adjust the font ( Please set the Chinese characters to be new and detailed, the English characters to be set to Times New Roman). Λ × n + λ1) [nm] (where other fonts are used in the ∆ file, please adjust the fonts (please set the Chinese characters to new details) Please set Times New Roman for English and Chinese characters. Λ = 1), for two incident angles θ1 ° and θ2 ° (θ1 <θ2) selected from 0 °, 30 °, and 40 °, λ1 = 350 And λ2 = 800 wavelength λ, λ1 = 380 and λ2 = 530 wavelength λ, λ1 = 450 and λ2 = 650 λ, and λ1 = 530 and λ2 = 750. For each variable domain of the variable domain, IE θ1 / θ2 λ1 ~ λ2 defined by the following formula (1) satisfies the conditions shown in the following table (I); 如請求項1至3中任一項所述之濾光器,其中, 於將入射角度為θ°時之波長λ之該濾光器之分光穿透率表示為Tθ (λ), 將波長λ之變域之最小值及最大值分別表示為λ1[nm]及λ2[nm], 將波長λ以0以上之整數n之函數表示為λ(n)=(∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ×n+λ1)[nm]時(其中,∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ=1), 針對選自0°、30°及40°中之2個入射角度θ1°及θ2°(θ1<θ2),於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域,由下述式(2)所定義之IAEθ1/θ2 λ1 λ2 滿足下述表(II)所示之條件; The filter according to any one of claims 1 to 3, wherein the spectral transmittance of the filter at a wavelength λ at an incident angle of θ ° is expressed as T θ (λ), and the wavelength is The minimum and maximum values of the variable range of λ are expressed as λ1 [nm] and λ2 [nm], respectively, and the function of the wavelength λ with an integer n or greater than 0 is expressed as λ (n) = (∆ other fonts are used in the file, Please adjust the font (Chinese characters should be set to new detail style, English characters should be set to Times New Roman). Λ × n + λ1) [nm] (where other fonts are used in the ∆ file, please adjust the font (Chinese characters please Set it as a new detail style and the English word as Times New Roman). Λ = 1), for two incident angles θ1 ° and θ2 ° selected from 0 °, 30 °, and 40 ° (θ1 <θ2), In the variable domains of the wavelengths λ1 = 350 and λ2 = 800, the variable domains of the wavelengths λ1 = 380 and λ2 = 530, the variable domains of the wavelengths λ1 = 450 and λ2 = 650, and λ1 = 530 and λ2 = For each of the variable domains of the wavelength λ of 750, IAE θ1 / θ2 λ1 to λ2 defined by the following formula (2) satisfy the conditions shown in the following table (II); 如請求項1至4中任一項所述之濾光器,其中, 於將入射角度為θ°時之波長λ之該濾光器之分光穿透率表示為Tθ (λ), 將波長λ之變域之最小值及最大值分別表示為λ1[nm]及λ2[nm], 將波長λ以0以上之整數n之函數表示為λ(n)=(∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ×n+λ1)[nm]時(其中,∆文件中有使用其他字體,請調整字體(中文字請設定為新細明體、英文字請設定為Times New Roman)。λ=1), 針對選自0°、30°及40°中之2個入射角度θ1°及θ2°(θ1<θ2),於λ1=350及λ2=800之波長λ之變域、λ1=380及λ2=530之波長λ之變域、λ1=450及λ2=650之波長λ之變域、以及λ1=530及λ2=750之波長λ之變域之各變域,由下述式(3)所定義之ISEθ1/θ2 λ1 λ2 滿足下述表(III)所示之條件; The filter according to any one of claims 1 to 4, wherein the spectral transmittance of the filter at a wavelength λ at an incident angle of θ ° is represented by T θ (λ), and the wavelength is The minimum and maximum values of the variable range of λ are expressed as λ1 [nm] and λ2 [nm], respectively, and the function of the wavelength λ with an integer n or greater than 0 is expressed as λ (n) = (∆ other fonts are used in the file, Please adjust the font (Chinese characters should be set to new detail style, English characters should be set to Times New Roman). Λ × n + λ1) [nm] (where other fonts are used in the ∆ file, please adjust the font (Chinese characters please Set it as a new detail style and the English word as Times New Roman). Λ = 1), for two incident angles θ1 ° and θ2 ° selected from 0 °, 30 °, and 40 ° (θ1 <θ2), In the variable domains of the wavelengths λ1 = 350 and λ2 = 800, the variable domains of the wavelengths λ1 = 380 and λ2 = 530, the variable domains of the wavelengths λ1 = 450 and λ2 = 650, and λ1 = 530 and λ2 = For each of the variable domains of the wavelength λ of 750, the ISE θ1 / θ2 λ1 to λ2 defined by the following formula (3) satisfy the conditions shown in the following table (III); 如請求項1至5中任一項所述之濾光器,其中,上述光吸收劑係由膦酸及銅離子形成。The optical filter according to any one of claims 1 to 5, wherein the light absorber is formed of phosphonic acid and copper ions. 如請求項6所述之濾光器,其中,上述膦酸包含:具有芳基之第一膦酸。The filter according to claim 6, wherein the phosphonic acid comprises: a first phosphonic acid having an aryl group. 如請求項7所述之濾光器,其中,上述膦酸進而包含:具有烷基之第二膦酸。The filter according to claim 7, wherein the phosphonic acid further includes a second phosphonic acid having an alkyl group. 一種攝像裝置,其具備: 透鏡系統; 攝像元件,其接收穿過上述透鏡系統之光; 濾色器,其配置於上述攝像元件之前方,且具有R(紅)、G(綠)及B(藍)3色之濾光片;及 請求項1至8中任一項所述之濾光器,其配置於上述濾色器之前方。A camera device includes: Lens system An imaging element that receives light passing through the lens system; A color filter, which is arranged in front of the above-mentioned imaging element and has three color filters of R (red), G (green) and B (blue); and The filter according to any one of claims 1 to 8, which is disposed in front of the color filter.
TW108100830A 2018-01-09 2019-01-09 Filters and Cameras TWI787431B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018001387 2018-01-09
JPJP2018-001387 2018-01-09

Publications (2)

Publication Number Publication Date
TW201939073A true TW201939073A (en) 2019-10-01
TWI787431B TWI787431B (en) 2022-12-21

Family

ID=67219511

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108100830A TWI787431B (en) 2018-01-09 2019-01-09 Filters and Cameras

Country Status (2)

Country Link
TW (1) TWI787431B (en)
WO (1) WO2019138976A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7344091B2 (en) * 2019-11-06 2023-09-13 日本板硝子株式会社 Light-absorbing composition, light-absorbing film, and optical filter
JP7364486B2 (en) 2020-02-04 2023-10-18 日本板硝子株式会社 Light-absorbing composition, light-absorbing film, and optical filter
JP7431078B2 (en) 2020-03-24 2024-02-14 日本板硝子株式会社 Light-absorbing composition, light-absorbing film, and optical filter

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58198404A (en) * 1983-04-07 1983-11-18 Dainippon Jiyochiyuugiku Kk Insecticide containing isovalerianic acid ester derivative
JP5463937B2 (en) * 2010-02-01 2014-04-09 旭硝子株式会社 Solid-state imaging device and imaging apparatus including the same
WO2014104370A1 (en) * 2012-12-28 2014-07-03 旭硝子株式会社 Near-infrared cut-off filter
KR101780913B1 (en) * 2015-02-18 2017-09-21 아사히 가라스 가부시키가이샤 Optical Filter and Imaging Device
JP6087464B1 (en) * 2016-06-30 2017-03-01 日本板硝子株式会社 Infrared cut filter and imaging optical system
JP6232161B1 (en) * 2017-07-27 2017-11-15 日本板硝子株式会社 Optical filter

Also Published As

Publication number Publication date
WO2019138976A1 (en) 2019-07-18
TWI787431B (en) 2022-12-21

Similar Documents

Publication Publication Date Title
JP7240234B2 (en) Optical filter and imaging device
TW201937209A (en) Optical filter and imaging device
TWI765095B (en) Filters and Cameras
TWI762722B (en) Filters and Cameras
TW201939073A (en) Optical filter and imaging device
TWI754100B (en) Filters and Cameras
JP6966334B2 (en) Optical filter and image pickup device
JP6259157B1 (en) Optical filter and imaging device
JP6259156B1 (en) Optical filter and imaging device
JP6273062B1 (en) Optical filter and imaging device
JP6516948B1 (en) Optical filter and imaging device