CN106756863A - The method that heavy-calibre element film thickness uniformity is detected using fizeau interferometer - Google Patents
The method that heavy-calibre element film thickness uniformity is detected using fizeau interferometer Download PDFInfo
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- CN106756863A CN106756863A CN201611133619.5A CN201611133619A CN106756863A CN 106756863 A CN106756863 A CN 106756863A CN 201611133619 A CN201611133619 A CN 201611133619A CN 106756863 A CN106756863 A CN 106756863A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
- C23C14/547—Controlling the film thickness or evaporation rate using measurement on deposited material using optical methods
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Abstract
The present invention relates to a kind of method that utilization fizeau interferometer detects heavy-calibre element film thickness uniformity, comprise the following steps：The heavy-calibre element is pre-processed, heavy-calibre element internal residual stress is eliminated；After standing the first Preset Time, surface shape measurement is carried out to heavy-calibre element using fizeau interferometer, and labeled as primary face shape W1；For heavy-calibre element carries out plated film；After standing the second Preset Time, surface shape measurement is carried out to the heavy-calibre element after plated film again using fizeau interferometer, and labeled as test surfaces shape W2；The component side shape knots modification Δ W that plated film causes is obtained using formula Δ W=W2 W1；Thickness modifying mask is optimized using face shape knots modification Δ W.The present invention detects heavy-calibre element film thickness uniformity using fizeau interferometer, by the surface face shape for measuring heavy-calibre element before and after plated film respectively, by element, face graphic data is subtracted each other and obtains the face shape knots modification that plated film causes twice, accurately reflects the film thickness uniformity level of element.
Description
Technical field
It is big using fizeau interferometer detection the present invention relates to heavy-calibre element plated film detection technique field, more particularly to one kind
The method of bore element film thickness uniformity.
Background technology
The photoetching technique that develops into of semi-conductor industry proposes demand higher, in order to improve the resolution ratio of etching system,
The wavelength of exposure light source constantly reduces, while the numerical aperture (NA) of projection objective constantly increases.With the 193nm of current main flow
As a example by ArF excimer lithographies, 90nm is continuously broken through, 65nm and 45nm nodes use re-expose technology, Ke Yishi
The resolution ratio of existing 32nm.In order to improve the numerical aperture of projection objective, it is necessary to use more heavy caliber, heavy caliber/radius of curvature
Sphere and non-spherical element, and be the uniformity for ensureing heavy-calibre element surface membrane system, thickness need to be used in coating process
Modifying mask, to realize film thickness uniformity of the element surface close to 100%, it is necessary to many experiments are trimmed to thickness baffle plate.
The face shape of real elements is generally copied using metal fixture, several test pieces on metal fixture, by measuring diverse location
The thickness of test piece obtain the film thickness distribution of element surface indirectly and thickness baffle plate is trimmed with reference to the film thickness distribution, but
The method can not entirely accurate reflect the situation of real elements, it is last especially to the film thickness uniformity high element of requirement
Film thickness uniformity needs for measuring real elements.
The content of the invention
Present invention seek to address that in the prior art to the detection of heavy-calibre element film thickness uniformity can not entirely accurate it is anti-
Reflect the technical problem of real elements situation, there is provided a kind of utilization fizeau interferometer detects the side of heavy-calibre element film thickness uniformity
Method, direction is provided further to improve element film thickness uniformity.
The embodiment provides a kind of method that utilization fizeau interferometer detects heavy-calibre element film thickness uniformity,
Comprise the following steps：
The heavy-calibre element is pre-processed, heavy-calibre element internal residual stress is eliminated；
After standing the first Preset Time, surface shape measurement is carried out to heavy-calibre element using fizeau interferometer, and labeled as first
Beginning face shape W1；
For heavy-calibre element carries out plated film；
After standing the second Preset Time, face shape survey is carried out to the heavy-calibre element after plated film again using fizeau interferometer
Amount, and labeled as test surfaces shape W2；
The component side shape knots modification Δ W that plated film causes is obtained using formula Δ W=W2-W1,
Thickness modifying mask is optimized using face shape knots modification Δ W.
Further, the heavy-calibre element is pre-processed, eliminate heavy-calibre element internal residual stress the step of,
Specially：
The heavy-calibre element cleaned using supersonic wave cleaning machine or using heating anneal method to heavy caliber
Element is processed to eliminate its internal residual stress.
Further, after standing the first Preset Time, surface shape measurement is carried out to heavy-calibre element using fizeau interferometer, and
The step of labeled as primary face shape W1, specifically includes：
When the first Preset Time reaches, surface shape measurement at least twice is carried out to heavy-calibre element using fizeau interferometer；
Whether the surface shape measurement result for comparing at least twice is consistent, if so, primary face shape W1 is then recorded as, if it is not, then weighing
Multiple above-mentioned steps.
Further, it is that heavy-calibre element is specifically included the step of carrying out plated film：
Using the coating machine with planetary rotation system in the heavy-calibre element plated surface masking system,；
Further, the step of the component side shape knots modification Δ W that plated film causes is obtained using formula Δ W=W2-W1 it
Afterwards, before the step of being optimized to thickness modifying mask using face shape knots modification Δ W, also including step：
Calculate the film thickness distribution of real elements according to the actual thickness modifying mask for using, and by numerical computations by thickness
Distribution shifts are face graphic data Wt；
Compare the correlation of face shape knots modification Δ W and face graphic data Wt.
Further, after standing the second Preset Time, the heavy-calibre element after plated film is entered again using fizeau interferometer
Row surface shape measurement, and specifically include the step of labeled as test surfaces shape W2：
When the second Preset Time reaches, surface shape measurement at least twice is carried out to heavy-calibre element using fizeau interferometer；
Whether the surface shape measurement result for comparing at least twice is consistent, if so, test surfaces shape W2 is then recorded as, if it is not, then weighing
Multiple above-mentioned steps.
Further, it is right before calculating the component side shape knots modification Δ W that the plated film causes using formula Δ W=W2-W1
Preset mark point in the accurate primary face shape and the test surfaces shape.
Further, heavy-calibre element surface physics thickness is adjusted to close using thickness modifying mask during plated film
100%.
Further, it is heavy-calibre element plated film to use evaporation or sputtering method.
Further, first Preset Time and second Preset Time are not less than 24h.
Compared with prior art, beneficial effect is technical scheme：The present invention is using fizeau interferometer detection
Heavy-calibre element film thickness uniformity, by measuring the surface face shape of heavy-calibre element before and after plated film respectively, by element face shape twice
Data are subtracted each other and obtain the face shape knots modification that plated film causes, and accurately reflect the film thickness uniformity level of element, are thickness amendment gear
The optimization of plate is provided and is correctly oriented.
Brief description of the drawings
Fig. 1 is the principle that the present invention measures heavy-calibre element surface face shape using fizeau interferometer；
Fig. 2 detects the method stream of heavy-calibre element film thickness uniformity for the utilization fizeau interferometer of an embodiment of the present invention
Cheng Tu.
In figure, 1- standard microscope groups；2- canonical references face；3- is tested sphere.
Specific embodiment
Specific embodiment of the invention is described further below in conjunction with the accompanying drawings.
The surface face shape of heavy-calibre element is measured using fizeau interferometer, it is a kind of non-contacting measuring method, is had
The advantage of common light path, it has also become the important means of element surface testing.
As shown in figure 1, the plane wave that fizeau interferometer sends after standard microscope group 1 by forming spherical wave.The spherical wave one
Part is reflected back interferometer by the former road in canonical reference face 2, and formation refers to corrugated.Another part directive is tested sphere 3, and adjustment is tested
Sphere 3 makes it concentric with the plane of reference 2, makes the test corrugated of tested spheric reflection equally being capable of backtracking interferometer and the ginseng
Examine corrugated to be interfered, the face shape information on element under test surface is carried due to test corrugated, can be obtained by data processing
To the surface face shape of element.
Influence of the coating process to element shows the change of component side shape, can be by other by appropriate coating process
The influence of factor is eliminated, and makes the major influence factors that film thickness uniformity is plated film front-back deformation, therefore by measuring cell
The change of face shape, you can obtain the uniform film thickness implementations of element surface.
Shadow of the change of the face shape that coating process causes including element STRESS VARIATION, film thickness uniformity and stress in thin film etc.
Ring.Pre-processed before plated film and eliminate element internal stress, and influence of the stress in thin film to component side shape is mainly defocusing amount, can be by
Compensation, removes defocusing amount (Power) its residual aberration very little afterwards, therefore component side shape knots modification before and after plated film is mainly corresponded to
The film thickness uniformity level of element.
The method that utilization fizeau interferometer provided in an embodiment of the present invention detects heavy-calibre element film thickness uniformity, including with
Lower step：
Step S100, pre-processes to the heavy-calibre element, eliminates heavy-calibre element internal residual stress；
Step S200, after standing the first Preset Time, surface shape measurement is carried out to heavy-calibre element using fizeau interferometer, and
Labeled as primary face shape W1；
Step S300, is that heavy-calibre element carries out plated film；
Step S400, after standing the second Preset Time, is entered to the heavy-calibre element after plated film again using fizeau interferometer
Row surface shape measurement, and labeled as test surfaces shape W2；
Step S500, the component side shape knots modification Δ W that plated film causes is obtained using formula Δ W=W2-W1,
Step S600, is optimized using face shape knots modification Δ W to thickness modifying mask.
In the step s 100, it is preferable that the heavy-calibre element is cleaned using supersonic wave cleaning machine and is eliminated it
Internal residual stress, the internal residual that can also eliminate heavy-calibre element in the present embodiment by the way of heating anneal should
Power.
In step S200, when the first Preset Time reaches, at least two are carried out to heavy-calibre element using fizeau interferometer
Secondary surface shape measurement；
Whether the surface shape measurement result for comparing at least twice is consistent, if so, showing that heavy-calibre element is stood to face shape no longer
Change, be now recorded as primary face shape W1, if not, then it represents that the residual stress inside heavy-calibre element does not disappear also completely
After, it is necessary to be stood again, measurement is re-started.
In the present embodiment, first Preset Time is preferably 24 hours.First Preset Time can also be more than 24 hours,
Can be specifically determined according to actual conditions.
It is that heavy-calibre element is specially the step of carrying out plated film in the step S300：
Antireflective film system is coated with the heavy-calibre element surface using the coating machine with planetary rotation system；
Wherein, film structure is substrate/LHL/ air, and L is low-index material MgF2, H is high-index material LaF3,
Base reservoir temperature is 300 DEG C during plated film.
Previous experiments test result shows the stress of the fluoride anti-reflection membrane system between 300-500MPa, takes 500Mpa works
For stress in thin film is input into, used as constraints, using finite element analysis, obtain stress in thin film causes operating mode during using element plated film
Component side shape knots modification, change very little by its root-mean-square value (RMS) after removal defocusing amount (Power), can be ignored.
Therefore, in the step S400, specifically：
When the second Preset Time reaches, surface shape measurement at least twice is carried out to heavy-calibre element using fizeau interferometer；
Whether the surface shape measurement result for comparing at least twice is consistent, if so, test surfaces shape W2 is then recorded as, if it is not, then weighing
Multiple above-mentioned steps.
Element Deformation of surface figure amount can be ignored caused by stress in thin film can be thus effectively ensured.The present embodiment
In, second Preset Time is preferably also 24h.Second Preset Time can also be more than 24 hours, specifically can be according to actual feelings
Condition is determined.
Further, after the step S500, before step S600, also including step S550：
Calculate the film thickness distribution of real elements according to the actual thickness baffle plate for using, and by numerical computations by film thickness distribution
It is converted into face graphic data Wt；
Compare the correlation of face shape knots modification Δ W and face graphic data Wt.Such that it is able to obtain technical solution of the present invention to film
The validity of thick uniformity detection.
In above-described embodiment, the component side shape knots modification Δ W that the plated film causes is being calculated using formula Δ W=W2-W1
Before, it is necessary first to be directed at the preset mark point in the primary face shape and the test surfaces shape, ensured with this and obtained after subtracting each other
Variable quantity before and after same position plated film.Meanwhile, thickness modifying mask is used during plated film by heavy-calibre element surface physics thickness
Adjust to close to 100%.It is preferred that in the present embodiment, the repdocutbility of heavy-calibre element surface testing is (comprising element branch
Support the repdocutbility for introducing) it is better than 0.3nm.
Further, during plated film, it is heavy-calibre element plated film to use evaporation or sputtering method, and the film of preparation is effectively ensured
Tie up to reflectivity under fizeau interferometer measurement wavelength>1%；
Below with typical concave curved component bore as 252mm, radius of curvature as a example by the heavy-calibre element of 200mm to enter one
The method that step description utilization fizeau interferometer of the invention detects heavy-calibre element film thickness uniformity.
Step one, is cleaned to the heavy-calibre element using supersonic wave cleaning machine and is eliminated its internal stress, by element
Stand and shape W1 in its face is measured using fizeau interferometer after 24h.
Step 2, design makes element surface film thickness uniformity be better than 95% for the thickness modifying mask of the concave curved component.
Step 3, is coated with using the Leybold Syruspro1110 coating machines element surface with planetary rotation system
193nm anti-reflection membrane systems, film structure is substrate/LHL/ air, and L is low-index material MgF2, H is high-index material LaF3,
Film layer gross thickness is 98.1nm, and base reservoir temperature is 300 DEG C during plated film.
Step 4, coated element measures its face shape W2 using fizeau interferometer again after standing 24h, using formula Δ W=
W2-W1 obtains the component side shape knots modification that plated film causes, when subtracting each other need to by element twice face graphic data mark point alignment, ensure
The variable quantity before and after same position plated film is obtained after subtracting each other.
Verify that the stress for obtaining fluoride anti-reflection membrane system between 300~500MPa, takes 500Mpa as film by early stage
Ply stress is input into, and operating mode during using element plated film, using finite element analysis, obtains unit caused by stress in thin film as constraints
Part face shape knots modification is 25.671nm, and it is only 0.08nm that its RMS changes after removal Power, be can be ignored.
Step 5, the film thickness distribution of real elements is calculated according to the actual thickness baffle plate for using, and will by numerical computations
Film thickness distribution is converted into face graphic data Wt, and the measured result RMS of deformation behind plated film is 0.440nm, and thickness opposite shape shadow
Loud the calculated results RMS is 0.463nm, and Wt and Δ W results have high similitude, illustrate Wt and Δ W in the presence of compared with
Strong correlation, while demonstrating the validity that the method verifies film thickness uniformity.
Step 6, is optimized using face shape knots modification Δ W to thickness modifying mask.
The beneficial effects of the invention are as follows：The measurement result of above example illustrates coating process to real elements face shape
Influence, and contrasts by with the calculated results, demonstrates being closely connected for face shape variable quantity and film thickness uniformity, is that thickness is repaiied
The optimization of positive baffle plate is provided and is correctly oriented.
Merely illustrating the principles of the invention described in above-described embodiment and specification and most preferred embodiment, are not departing from this
On the premise of spirit and scope, various changes and modifications of the present invention are possible, and these changes and improvements both fall within requirement and protect
In the scope of the invention of shield.
Claims (10)
1. a kind of method that utilization fizeau interferometer detects heavy-calibre element film thickness uniformity, it is characterised in that：Including following step
Suddenly：
The heavy-calibre element is pre-processed, heavy-calibre element internal residual stress is eliminated；
After standing the first Preset Time, surface shape measurement is carried out to heavy-calibre element using fizeau interferometer, and labeled as primary face
Shape W1；
For heavy-calibre element carries out plated film；
After standing the second Preset Time, surface shape measurement is carried out to the heavy-calibre element after plated film again using fizeau interferometer, and
Labeled as test surfaces shape W2；
The component side shape knots modification Δ W that plated film causes is obtained using formula Δ W=W2-W1；
Thickness modifying mask is optimized using face shape knots modification Δ W.
2. method according to claim 1, it is characterised in that：The heavy-calibre element is pre-processed, big mouth is eliminated
The step of footpath element internal residual stress, specially：
The heavy-calibre element cleaned using supersonic wave cleaning machine or using heating anneal method to heavy-calibre element
Processed to eliminate its internal residual stress.
3. method according to claim 1, it is characterised in that：After standing the first Preset Time, using fizeau interferometer pair
Heavy-calibre element carries out surface shape measurement, and specifically includes the step of labeled as primary face shape W1：
When the first Preset Time reaches, surface shape measurement at least twice is carried out to heavy-calibre element using fizeau interferometer；
Whether the surface shape measurement result for comparing at least twice is consistent, if so, primary face shape W1 is then recorded as, if it is not, then repeating
State step.
4. method according to claim 1, it is characterised in that：The step of carrying out plated film for heavy-calibre element specifically includes：
Using the coating machine with planetary rotation system in the heavy-calibre element plated surface masking system.
5. method according to claim 1, it is characterised in that：The unit that plated film causes is being obtained using formula Δ W=W2-W1
After the step of part face shape knots modification Δ W, the step of optimized to thickness modifying mask using face shape knots modification Δ W before,
Also include step：
Calculate the film thickness distribution of real elements according to the actual thickness modifying mask for using, and by numerical computations by film thickness distribution
It is converted into face graphic data Wt；
Compare the correlation of face shape knots modification Δ W and face graphic data Wt.
6. method according to claim 1, it is characterised in that：After standing the second Preset Time, using fizeau interferometer again
The secondary heavy-calibre element to after plated film carries out surface shape measurement, and specifically includes the step of labeled as test surfaces shape W2：
When the second Preset Time reaches, surface shape measurement at least twice is carried out to heavy-calibre element using fizeau interferometer；
Whether the surface shape measurement result for comparing at least twice is consistent, if so, test surfaces shape W2 is then recorded as, if it is not, then repeating
State step.
7. method according to claim 1, it is characterised in that：Calculate what the plated film caused using formula Δ W=W2-W1
Before component side shape knots modification Δ W, the preset mark point in the primary face shape and the test surfaces shape is directed at.
8. method according to claim 4, it is characterised in that：Thickness modifying mask is used during plated film by heavy-calibre element table
Face physical thickness is adjusted to close to 100%.
9. method according to claim 4, it is characterised in that：Evaporation or sputtering method is used to be plated for heavy-calibre element
Film.
10. method according to claim 1, it is characterised in that：First Preset Time and second Preset Time
It is not less than 24h.
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| CN113847882A (en) * | 2021-09-08 | 2021-12-28 | 南京理工大学 | Large-caliber vertical absolute inspection method based on gravity deformation and refractive index non-uniformity compensation |
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