CN106707694A - Experimental platform for soft lithography - Google Patents
Experimental platform for soft lithography Download PDFInfo
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- CN106707694A CN106707694A CN201510783703.0A CN201510783703A CN106707694A CN 106707694 A CN106707694 A CN 106707694A CN 201510783703 A CN201510783703 A CN 201510783703A CN 106707694 A CN106707694 A CN 106707694A
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- box body
- casing
- soft lithography
- heating system
- lamp
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Abstract
An experimental platform for soft lithography comprises a box body, a box body is provided with a single-chip microcomputer console, a lighting system, a heating system, an UV illumination system and a pressure control system; the bottom of the box body is provided with a level degree adjustable operation bench, a fixture is arranged on the level degree adjustable operation bench, a light source device is arranged on the top in the box body, a fluorescent lamp of the lighting system, an iodine-tungsten lamp of the heating system and an ultraviolet lamp of the UV illumination system are arranged in the light source device; the heating system comprises temperature sensors on two side walls in the box body and heaters on both sides of the operation bench, the pressure control system includes a vacuum pump communicated with the box body, and a gas-pressure meter is arranged beside the vacuum pump. The experimental platform for soft lithography is relatively low in cost, can realize dust control, constant temperature, controllable pressure, UV light and other functions, can meet ordinary laboratory micro transfer molding and other soft lithography operation requirements, and solves the problems that common laboratory processing equipment is relatively expensive, and a plurality of equipment required for soft lithography is difficult to purchase.
Description
Technical field
The present invention relates to soft lithography field.
Background technology
Micro ＆ nano technology is the forward position research direction of modern science and technology to be obtained for extensively using in many fields
Micro-nano technology technology as micro ＆ nano technology basis, also therefore obtain more and more widely need tradition micro-nano add
Work relies primarily on photoetching-engraving method, and its development to semiconductor, particularly IC industry serves weight
Want impetus.But, this method expensive equipment, place and personnel requirement are all very high, it is difficult to extensively should
With.The appearance of soft lithographic, solves many problems that traditional micro-processing technology faces.It is with surface self-organization
Based on duplicating molded, there are the elastic caoutchouc of specific pattern and micro-structural, such as polydimethylsiloxanes with surface
Alkane (polydimethylsiloxane, PDMS) is motherboard, it is possible to achieve (mierocontact is printed in micro- contact
Printing, CP) ", duplicating molded (replica molding, REM), micro- transfer modling (micro-transfer
Molding, μ TM), the micro- molding of capillary (micromolding incapillaries, MIMIC), solvent auxiliary
Various processing methods such as micro- molding (solvent-assistedmicromolding, SAMIM).Soft lithography
With easy to operate, efficiency high, the lot of advantages such as low cost, machining accuracy are high, shaping pattern is various,
Micro-nano technology field has obtained increasingly being widely applied.It is similar with photoetching, in soft lithographic technological process,
One dustless environment of cleaning is necessary.The micro-structural that processing is obtained is typically all nanometer or micron-sized,
Even if very trickle dust, it is likely to have influence on the quality of final molding structure.Meanwhile, it is organic processing
During material, it is often necessary to liquid polymer precursor heating and constant temperature standing solidification.Before being additionally, since liquid
Body can dissolve some gases before polymerization forming, in order to prevent thering is bubble to occur in polymer after shaping,
Needs remove the gas in solution using certain vacuum.Before this, soft lithographic be required in clean room or
Completed on person's super-clean bench.And, according to the difference of processing tasks, it is typically necessary many of vacuum drying oven etc. and sets
It is standby to realize.So, typically all costly, common lab is difficult to process equipment.
The content of the invention
The invention provides a kind of soft lithographic experimental bench of relative inexpensiveness, it is possible to achieve first dirt, constant temperature,
Various functions such as pressure controllable, ultraviolet lighting, meeting common lab carries out the soft lithographics such as micro- transfer modling behaviour
The requirement of work, to solve common lab because of process equipment costly, it is difficult to purchase many needed for soft lithographic
The problem of platform equipment.
The soft lithographic experimental bench, including casing, casing are provided with Single-chip Controlling platform, are also equipped with illumination
System, heating system, ultraviolet lighting system and control pressurer system；Bottom half is that a levelness is adjustable
The operating desk of section, there is fixture on operating desk；Casing inner top is provided with light supply apparatus, the daylight of illuminator
The uviol lamp of lamp, the iodine-tungsten lamp of heating system and ultraviolet lighting system is installed therein；Heating system also includes
The heater of temperature sensor and operating desk both sides in casing on two side；Control pressurer system includes and case
The vavuum pump of body UNICOM, is provided with air gauge by vavuum pump.
Casing both sides have 2 circular holes to be connected with the operation gloves stretched into case.
The soft lithographic experimental bench, relative inexpensiveness, it is possible to achieve first dirt, constant temperature, pressure controllable, purple
Various functions such as outer illumination, meeting common lab carries out the requirement of the soft lithographics such as micro- transfer modling operation, solution
Common lab of having determined because of process equipment costly, it is difficult to the problem of the multiple devices needed for purchasing soft lithographic.
Brief description of the drawings
Fig. 1 is structural representation of the invention.
Wherein, 1- casings, 2- Single-chip Controlling platforms, 3- air gauges, 4- vavuum pumps, 5- temperature sensors；6-
Heater；7- operating desks；8- light supply apparatuses.
Specific embodiment
For soft lithographic operational requirements, experimental bench should provide a closed operating space first, with
Exclude the influence of dust in air.Meanwhile, the processing request for high polymers such as PDMS is, it is necessary to liquid
Polymer precursor is heated, and is maintained at certain temperature for a long time, therefore, experimental bench should be able to realize constant temperature
Function.Before liquid high polymer molding, have bubble and occur, it is necessary to confined space can reach certain vacuum degree
To remove these bubbles.Additionally, ultraviolet source is also required to be integrated into platform, for part high polymer
Processing.
As shown in figure 1, the main body of the experimental bench is a closed trapezoidal cabinet 1, a Single-chip Controlling platform 2
With a vavuum pump 4.The shell of casing 1 is 2mm thickness stainless steel plates, and front bevel is 5mm thickness lucite face
Plate (watch window), is easy to monitor and observe process.During ultraviolet irradiation, window is by light tight lid
Plate is covered, and prevents the injury of the interference and ultraviolet light of ambient to operating personnel.The both sides of casing 1 have 2
Circular hole is connected with the operation gloves stretched into case.In the case where enclosed environment is not destroyed, can be by behaviour
Make gloves to operate sample in case.The inner top of casing 1 has light supply apparatus 8, is respectively provided with illuminating day
Light lamp, the iodine-tungsten lamp for drying and the uviol lamp for playing solidification.Additionally, casing 1 is gone back and Stress control system
System connection, it is ensured that the vacuum in casing 1.Control pressurer system includes the vavuum pump 4 with the UNICOM of casing 1,
Air gauge 3 is installed by vavuum pump 4.There are temperature sensor 5, the both sides of operating desk 7 in casing 1 on two side
For hotter heater 6；The bottom of casing 1 is an adjustable operating desk 7 of levelness, for fixing
Substrate material to be processed.Fixture on platform is used for ensureing fixed precision and producing in process suitable
When pressure.
Console as whole experimental bench control centre, be SCM Based control system.It can be realized
Design temperature, temperature of the measurement and automatic constant-temperature function.Simultaneously can also by illuminator, heating system,
Ultraviolet lighting and control pressurer system are incorporated into one, carry out switch control.
The testing stand is integrated with temperature with Stress control, illumination and ultraviolet light in a closed small box body
According to, the operation component such as gloves, it is possible to achieve dustless, constant temperature, pressure controllable, ultraviolet lighting, dustless operation
Etc. various functions.The experimental bench can be used for dimethyl silicone polymer carries out micro- transfer modling experimental study, investigates
Temperature, pressure etc. to dimethyl silicone polymer into module feature influence.Simultaneously, moreover it is possible to utilize poly dimethyl
Siloxanes completes transfer of the silicon microchip structure to substrate of glass with replicating twice for polyurethane.
Claims (2)
1. soft lithographic experimental bench, it is characterised in that：Including casing (1), casing (1) is provided with monolithic
Machine console (2), is also equipped with illuminator, heating system, ultraviolet lighting system and control pressurer system；
Bottom half is the adjustable operating desk of a levelness (7), there is fixture on operating desk；Top in casing (1)
Portion is provided with light supply apparatus, the fluorescent lamp of illuminator, the iodine-tungsten lamp of heating system and ultraviolet lighting system
Uviol lamp is installed therein；Heating system also includes the temperature sensor (5) on casing (1) interior two side
With the heater (6) of operating desk (7) both sides；Control pressurer system includes the vacuum with casing (1) UNICOM
Air gauge is installed by pump (4), vavuum pump (4).
2. soft lithographic experimental bench according to claim 1, it is characterised in that：Casing (1) both sides
There are 2 circular holes to be connected with the operation gloves stretched into case.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510783703.0A CN106707694A (en) | 2015-11-16 | 2015-11-16 | Experimental platform for soft lithography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510783703.0A CN106707694A (en) | 2015-11-16 | 2015-11-16 | Experimental platform for soft lithography |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106707694A true CN106707694A (en) | 2017-05-24 |
Family
ID=58931882
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201510783703.0A Pending CN106707694A (en) | 2015-11-16 | 2015-11-16 | Experimental platform for soft lithography |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106707694A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101221377A (en) * | 2008-01-16 | 2008-07-16 | 重庆大学 | Miniature constant temperature self-control experimental bench used for simple photo-etching and soft photo-etching |
| CN101403855A (en) * | 2008-11-07 | 2009-04-08 | 南京大学 | Ultraviolet/hot pressing curing type nano-printing method and stamping press |
| CN102944976A (en) * | 2012-11-02 | 2013-02-27 | 清华大学 | Ultraviolet nano imprinting system |
| CN104614935A (en) * | 2015-02-06 | 2015-05-13 | 浙江大学 | Universal high-precision micro-structure preparation system and application method of universal high-precision micro-structure |
| CN205247056U (en) * | 2015-11-16 | 2016-05-18 | 四川航达机电技术开发服务中心 | Soft light is carved and is used laboratory bench |
-
2015
- 2015-11-16 CN CN201510783703.0A patent/CN106707694A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101221377A (en) * | 2008-01-16 | 2008-07-16 | 重庆大学 | Miniature constant temperature self-control experimental bench used for simple photo-etching and soft photo-etching |
| CN101403855A (en) * | 2008-11-07 | 2009-04-08 | 南京大学 | Ultraviolet/hot pressing curing type nano-printing method and stamping press |
| CN102944976A (en) * | 2012-11-02 | 2013-02-27 | 清华大学 | Ultraviolet nano imprinting system |
| CN104614935A (en) * | 2015-02-06 | 2015-05-13 | 浙江大学 | Universal high-precision micro-structure preparation system and application method of universal high-precision micro-structure |
| CN205247056U (en) * | 2015-11-16 | 2016-05-18 | 四川航达机电技术开发服务中心 | Soft light is carved and is used laboratory bench |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| WD01 | Invention patent application deemed withdrawn after publication |
Application publication date: 20170524 |
|
| WD01 | Invention patent application deemed withdrawn after publication |