CN101221377A - Miniature constant temperature self-control experimental bench used for simple photo-etching and soft photo-etching - Google Patents
Miniature constant temperature self-control experimental bench used for simple photo-etching and soft photo-etching Download PDFInfo
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- CN101221377A CN101221377A CNA2008100692505A CN200810069250A CN101221377A CN 101221377 A CN101221377 A CN 101221377A CN A2008100692505 A CNA2008100692505 A CN A2008100692505A CN 200810069250 A CN200810069250 A CN 200810069250A CN 101221377 A CN101221377 A CN 101221377A
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Abstract
The invention provides a miniature constant-temperature autocontrol experimental bench used in simple photolithography and soft photolithography, wherein the experimental bench consists of a trapezoid airtight case, a singlechip controller and a vacuum pump; the airtight case body is formed by stainless steel plate; the front bevel face of the case body is a colorless transparent organic glass faceplate; an opaque cover plate, which is arranged above the face plate of the case body, can be closed during photolithography experiment to prevent the interference of external light; an illuminating daylight lamp, a heating iodine tungsten lamp and an ultraviolet lamp used for photolithography and solidifying are hung on the internal top of the case body, and can be controlled through a control desk; both sides of the airtight case have two round holes and samples can be processed through the gloves connected with the round holes without damaging the airtight conditions. The experimental bench can realize fundamental functions such as temperature measurement, temperature setting and automatic maintenance, and can complete on-off control of a lighting system, a heating system, an ultraviolet illumination device and the vacuum pump.
Description
Technical field
The invention belongs to the micro-processing technology field, be specifically related to be used for the thermostatic control experiment table of simple photolithography and soft lithographic.
Background technology
In the technological process of photoetching and soft lithographic, the dustless environment of cleaning is necessary.The microstructure of processing generally all is a nanometer or micron-sized, even very trickle dust all might have influence on the quality of final molding structure; Simultaneously, when processing dimethyl silicone polymer organic materials such as (PDMS), need the polymer precursor solution heating of liquid towards, and constant temperature is placed a period of time.And, because liquid precursor can some gases of dissolving before polymerization forming, occur in order to prevent to have in the polymkeric substance after moulding bubble, need utilize certain vacuum tightness to remove gas in the solution.Usually, enough vacuum tightness be produce, an airtight space and a cover air extractor needed.Before this, the equipment that is used for photoetching and soft lithographic is many, but all need finish processing technology on clean room or large-scale super-clean bench.And, according to the difference of processing tasks, generally all need multiple devices to realize.Like this, it is generally all quite expensive to process needed instrument and equipment, and the small test chamber is difficult to purchase.Based on this, we have invented this and have been used for the miniature constant temperature Experiment on Auto-Control platform of simple photolithography and soft lithographic technology.
Dalian Inst of Chemicophysics, Chinese Academy of Sciences has developed a kind of litho machine (Chinese patent literature publication number CN2555525) that is exclusively used in facture of microchip, is combined by a camera bellows, a high-pressure sodium lamp, an even optical lens.It can realize simple lithography process, but owing to do not have view window, temperature control, devices such as vacuum equipment can't be realized the soft lithographic processing technology.And this device lacks level adjustment system, causes light path and the interface out of plumb that needs photoetching when photolithographic exposure easily, influences photoetching quality.
Summary of the invention
At the deficiency that prior art exists, the present invention discloses a kind of miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic.
Technical scheme of the present invention is as follows:
This experiment table comprises controller, the experiment table casing, ultraviolet lighting equipment, illuminator, unit clamp, processing platform, baric systerm, temperature sensing and heating system, temperature control system, described controller is positioned at the top of experiment table casing, is used for the integral body control to temperature, air pressure, illumination and photoetching in the described casing; Described ultraviolet lighting jet device and illuminator are arranged on the top of experiment table box house, are used for processing of ultraviolet etching and illumination; Described processing platform is positioned at the bottom of experiment table box house, and unit clamp is used for fixing the substrate material above the processing platform, and fixedly mask and motherboard; Described baric systerm is used to realize required vacuum tightness in the case; Temperature sensing and heating system are fixed on a side of experiment table box house, and temperature control system is positioned at the inside of controller, and described temperature control system realizes the adjustment of experiment table casing and constant by control temperature sensing and heating system.
This experiment table is mainly used in photoetching and soft lithographic processing technology.Usually, in photoetching and soft lithographic processing technology, need isothermal curing, vacuum degassing bubble, sequence of operations processes such as ultraviolet irradiation curing.The equipment that is used for this technology at present all is to be in released state, and promptly finishing a photoetching or soft lithographic processing technology needs at least three equipment: constant temperature oven, vacuum tank and ultraviolet irradiation platform.The present invention has realized the integrated of photoetching and soft lithographic processing process, promptly cluster tool required in the technological process together.This experiment table is with low cost, and equipment is simple, perfect in shape and function.
Description of drawings
Fig. 1 is the synoptic diagram of this experiment table;
Fig. 2 is this experiment table temperature sensing and heating system synoptic diagram;
Fig. 3 is this experiment table temperature control system synoptic diagram;
Fig. 4 utilizes μ TM method that the microstructure of polymeric material is processed in the glass substrate surface process.
Embodiment
According to Figure of description technical scheme of the present invention is further elaborated below:
This experiment table is by controller 1, experiment table casing 2, ultraviolet lighting equipment 3, illuminator 4, unit clamp 5, processing platform 6, nut 7, surveyor's staff 8, operation gloves 9, rain glass 10, vacuum pump 11, baric systerm, temperature sensing and heating system, temperature control system are formed.Wherein, controller 1 is positioned at the top of experiment table casing 2, is used for switch control ultraviolet lighting jet device 3 and illuminator 4; Ultraviolet lighting jet device 3 and illuminator 4 are positioned at the top of experiment table casing 2 inside, are used for ultraviolet light photopolymerization operation, etching processing and illumination; Processing platform 6 is positioned at the bottom of experiment table casing 2 inside, and unit clamp 5 is used for fixing the substrate material above the processing platform 6, simultaneously, and fixing mask, motherboard and add suitable pressure; Nut 7 is positioned at the bottom of experiment table casing 2 outsides, is used to regulate the horizontal situation of processing platform 6; Surveyor's staff 8 is positioned at the external bottom end of experiment table casing 2, is used to detect the horizontal situation of processing platform 6; Usefulness glue is airtight links to each other for experiment gloves 9 and casing 2, be arranged at experiment table casing (2) both sides, rain glass 10 is positioned at the outside of experiment table casing 2, is used to detect the air pressure of box house, vacuum pump 11 also is to be positioned at experiment table casing 2 outsides, is used to regulate the casing internal gas pressure; Heating and temperature control system are positioned at experiment table casing 2 inner sides, are used to guarantee that the experimental box internal temperature is constant.The integral body of experiment table casing 2 is made up of the thick corrosion resistant plate of 2mm, and front bevel is made with the thick transparent organic glass panel of 5mm, as watch window, be convenient to observe process, the panel top is an opaque cover, covers when lithography experiments, to avoid the interference of extraneous light.Operating personnel stretch into constant temperature oven inside by gloves 9 handles sample are operated and processed.
Fig. 1 is the overall schematic of this experiment table, and the substrate material that carries out the processing of simple photolithography or soft lithographic places on the processing platform 6 of temperature control experiment table casing 2, and fixing by unit clamp 5, processing platform 6 can accurately be regulated in level and vertical direction.Temperature control system can realize the temperature setting and guarantee the constant of the interior temperature of casing.Illuminator 4 and transparent windows are convenient to add the state observation in man-hour, and transparent windows can cover when lithography experiments, to avoid the interference of extraneous light.Ultraviolet lighting equipment 3 can carry out illumination sclerosis or lithography operations, and illuminator 4 helps the observation of experimental implementation and experimental result.Baric systerm comprises vacuum pump 11 and rain glass 10, in order to reach required vacuum tightness in the guard box.In addition, airtight operation gloves 9 can conveniently be operated in case, and get rid of external interference as far as possible.Controller 1 can be realized temperature, air pressure, illumination, the integral body control of photoetching.Bottom half is an adjustable processing platform of levelness, can regulate casing from the height of institute's placed mesa and the level of casing by the nut 7 that rotates four circles.Surveyor's staff 8 positive by casing and the right side can detect the horizontal situation of casing.
Fig. 2 is this experiment table temperature sensing and heating system synoptic diagram, one side fixed temperature sensor DS1820 of casing, it is by bimetallic strip 15, moving contact 16, static contact 17 is formed, and temperature sensor and controller knob switch 22 and pilot lamp 14 and extraneous power supply are connected in series mutually.Fixing electric heater 18 on the heat proof material support, it is fixed that the resistance value of the heating wire of electric heater 18 is come according to the temperature value of setting.The co-ordination of excess temperature sensor and well heater realizes the adjusting of temperature and constant.Described temperature sensor precision is ± 1 ℃.
Fig. 3 is this experiment table temperature control system synoptic diagram, and the bottom-right rectangle glass window of the front shroud of controller 1 inner face is equipped with thermometer 21,0-99 ℃ of observable temperature scope.The upper left side is a pilot lamp 14, and temperature sensing is connected with pilot lamp 14, rotary switch 22 successively with sensor, electric heater 18 in the heating system, is connected to external power source by the plug (19) of drawing in the slave controller (1) then.When the temperature in the constant temperature oven surpassed setting value, sensor cut off circuit, and pilot lamp extinguishes, and resistance coil does not generate heat, and constant temperature the temperature inside the box descends thereupon, and when temperature drops to when being lower than desired numerical value, sensor is connected heater circuit, and the temperature inside the box increases.Like this, make the temperature in the constant temperature oven keep substantially constant.Setting by rotary switch 22 need stationary temperature.
Below, by further introduce the soft lithographic method for processing of using the constant temperature experiment table to carry out with little transfer molding (μ TM) reprography silicon micro-channel system.
Little transfer molding method is to utilize the PDMS elastic caoutchouc as transmitting medium.At first allow PDMS form an opposite printing with the duplicating molded method on motherboard, utilizing this PDMS printing then is new motherboard, utilize other polymeric material with duplicating molded method form one with the identical new microstructure of initial formwork structure.Twice duplicating molded process is called transfer molding.
The experiment motherboard is the silicon micro-channel chip of precision photolithography.Experiment purpose is to utilize μ TM method that the microstructure of polymeric material is processed on the surface of glass substrate, as shown in Figure 4.Testing two kinds of used polymeric materials is PDMS and Norland ultra-violet curing optical cement NOA73.The chemical name of Norland ultra-violet curing optical cement NOA73 is that (PolyUrethane, PU), it is a kind of optical clear to poly-imines fat, being exposed to can quick-setting liquid glue under the long wave ultraviolet light.μ TM work flow is at first to duplicate silicon micro-channel with PDMS: (1) cleans silicon micro-channel chip motherboard, puts into clean double dish.(2) pour the PDMS precursor solution that mixes into double dish slowly, mixed liquor will cover chip, exceeds 2-4mm and is advisable.Surface plate is put into the constant temperature experiment table, start vacuum pump, observe vacuum meter simultaneously, can see that the atmospheric pressure in the casing reduced to 0.8 atmospheric pressure (60.8cmHg) after about one minute, at this moment, adjust air valve, make stable gas pressure at 0.8 standard atmospheric pressure place, can see, the bubble that remains among the liquid PDMS fades away, after two hours, and the bubble complete obiteration, can close vacuum pump, make casing recover standard pressure.(3) start heating system, setting thermostat temperature is 65 ℃, heat after 4 hours, can see that liquid PDMS solidifies substantially, just it can be taken out after cooling, with scalpel and tweezers the PDMS blob of viscose that solidifies is cut out from the motherboard chip edge, uncovered, the structure on the silicon is copied on the PDMS blob of viscose fully.
Second step of using μ TM technology is in structure microchannel, glass slide surface: it is just opposite with former silicon microstructure Micro Channel Architecture to be copied on the PDMS elastomeric stamp resulting microstructure, shows on the springform to be the rectangular parallelepiped of projection one by one as Micro Channel Architecture.Obtain duplicate consistent with motherboard if desired, the structural information of PDMS elastomeric stamp need be transferred in another substrate once more: (1) makes the PDMS surface hydrophilic with oxygen plasma treatment.(2) dipped in a little poly-imines fat (PU) liquid with the PDMS module of taper, carefully in the narrow gap with these liquid filling miniature rectangular parallelepiped array on the PDMS elastomeric stamp, left standstill a moment, allowed PU fully incorporate these slits.(3) with the awl point of taper PDMS module the redundant liquid in surface is absorbed again.(4) populated PDMS elastomeric stamp is kept flat (having one of microstructure to face down) on cleaned in advance microslide, and microslide is inserted among the constant temperature experiment table, start heating system, design temperature is 40 ℃; Start vacuum pump simultaneously, the stable gas pressure in the experiment table at 0.8 standard atmospheric pressure, was vacuumized about 30 minutes, the bubble that remains among the PU is removed.(5) start ultraviolet curing lamp, because the good optical transparent characteristic (light of wavelength between 230-700nm is had good permeability) of PDMS mould, ultraviolet luminous energy directly acts on PU.From ultraviolet source 15cm place, shine and to make a PU full solidification in hour.Open the PDMS elastomeric stamp, can see and fix a series of and the Micro Channel Architecture silicon micro-channel structure basically identical in slide surface.
Claims (7)
1. miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic, this experiment table comprises controller (1), experiment table casing (2), ultraviolet lighting equipment (3), illuminator (4), unit clamp (5), processing platform (6), baric systerm, temperature sensing and heating system, temperature control system; It is characterized by:
Described controller (1) is positioned at the top of experiment table casing (2), is used for the integral body control to temperature, air pressure, illumination and photoetching in the described casing; Described ultraviolet lighting jet device (3) is arranged on the inner top of experiment table casing (2) with illuminator (4), is used for ultraviolet lighting sclerosis, etching processing and illumination; Described processing platform (6) is positioned at the bottom of experiment table casing (2), and unit clamp (5) is used for fixing the substrate material above the processing platform (6), and fixedly mask and motherboard; Described baric systerm is used to realize required vacuum tightness in the case; Temperature sensing and heating system are fixed on the inner side of experiment table casing (2), temperature control system is positioned at the inside of controller (1), and described temperature control system realizes the adjustment of experiment table casing (2) and constant by control temperature sensing and heating system.
2. the miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic according to claim 1 is characterized by:
Described temperature sensing and heating system comprise electric heater (18) fixing on temperature sensor and the heat proof material support, and wherein temperature sensor is made up of bimetallic strip (15), moving contact (16), static contact (17); Described temperature control system comprises rotary switch (22), pilot lamp (14) and a thermometer; Sensor in temperature sensing and the heating system, electric heater (18) and described pilot lamp (14), rotary switch (22) is connected successively, be connected to external power source by the plug (19) of drawing in the slave controller (1) then, when the temperature in the experiment table casing (2) surpasses setting value, sensor cuts off above-mentioned series circuit, pilot lamp extinguishes, electric heater (18) does not generate heat, the interior temperature of experiment table casing (2) descends thereupon, when temperature in the experiment table casing (2) drops to when being lower than desired numerical value, sensor is connected above-mentioned series circuit, electric heater (18) heating, the interior temperature of experiment table casing (2) increases; And can set the need stationary temperature by rotary switch (22).
3. according to the described miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic of claim 1, it is characterized in that: the integral body of experiment table casing (2) is made up of corrosion resistant plate, front bevel is made with the transparent organic glass panel, as watch window, be convenient to observe process, the panel top is an opaque cover, covers when lithography experiments, to avoid the interference of extraneous light.
4. the miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic according to claim 1, it is characterized in that: controller (1) is realized the temperature survey that experiment table casing (2) is interior by its temperature inside control system, and temperature is set and temperature keeps function automatically; Simultaneously, controller (1) can also be to illuminator (4), and ultraviolet lighting equipment (3) and baric systerm are carried out integral body control.
5. the miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic according to claim 2, it is characterized in that: the temperature sensor precision of use is ± 1 ℃, 0-99 ℃ of observable temperature scope.
6. the miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic according to claim 1, it is characterized in that: described baric systerm is made up of vacuum pump (11), closed conduit, tensimeter (10) and airtight casing, tensimeter (10) is positioned at the outside of experiment table casing (2), be used to detect the air pressure of box house, vacuum pump (11) is positioned at experiment table casing (2) outside, is used to regulate the casing internal gas pressure.
7. the miniature constant temperature Experiment on Auto-Control platform that is used for simple photolithography and soft lithographic according to claim 1, it is characterized by: this experiment table also further comprises nut (7), surveyor's staff (8), experiment gloves (9), described nut (7) is arranged at the outside bottom of experiment table casing (2), the horizontal situation that is used to regulate processing platform (6); Described surveyor's staff (8) is arranged at the external bottom end of experiment table casing (2), is used to detect the horizontal situation of processing platform (6); Described experiment gloves (9) link to each other with glue is airtight with experiment table casing (2), are arranged at experiment table casing (2) both sides, and operating personnel stretch into constant temperature oven inside by gloves (9) handle sample is operated and processed.
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102231047A (en) * | 2011-06-23 | 2011-11-02 | 上海宏力半导体制造有限公司 | Ultraviolet light curing device and alarm method thereof |
| CN106707694A (en) * | 2015-11-16 | 2017-05-24 | 四川航达机电技术开发服务中心 | Experimental platform for soft lithography |
| CN107664263A (en) * | 2016-07-29 | 2018-02-06 | 上海微电子装备（集团）股份有限公司 | A kind of gas bath device and control method and application |
| CN109538771A (en) * | 2018-12-21 | 2019-03-29 | 苏州华英光电仪器有限公司 | A kind of double-sided coating butterfly plate component |
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2008
- 2008-01-16 CN CNB2008100692505A patent/CN100565353C/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102231047A (en) * | 2011-06-23 | 2011-11-02 | 上海宏力半导体制造有限公司 | Ultraviolet light curing device and alarm method thereof |
| CN102231047B (en) * | 2011-06-23 | 2016-09-14 | 上海华虹宏力半导体制造有限公司 | UV-curing equipment and UV-curing equipment alarm method |
| CN106707694A (en) * | 2015-11-16 | 2017-05-24 | 四川航达机电技术开发服务中心 | Experimental platform for soft lithography |
| CN107664263A (en) * | 2016-07-29 | 2018-02-06 | 上海微电子装备（集团）股份有限公司 | A kind of gas bath device and control method and application |
| CN107664263B (en) * | 2016-07-29 | 2019-04-12 | 上海微电子装备（集团）股份有限公司 | A kind of gas bath device and control method and application |
| CN109538771A (en) * | 2018-12-21 | 2019-03-29 | 苏州华英光电仪器有限公司 | A kind of double-sided coating butterfly plate component |
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| CN100565353C (en) | 2009-12-02 |
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