CN106707393A - Method for making rectangular deep cut-off ultra-narrow band pass filter - Google Patents
Method for making rectangular deep cut-off ultra-narrow band pass filter Download PDFInfo
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- CN106707393A CN106707393A CN201611123567.3A CN201611123567A CN106707393A CN 106707393 A CN106707393 A CN 106707393A CN 201611123567 A CN201611123567 A CN 201611123567A CN 106707393 A CN106707393 A CN 106707393A
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- Prior art keywords
- band pass
- pass filter
- narrow band
- ultra
- film
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Classifications
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/207—Filters comprising semiconducting materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Abstract
The invention provides a method for making a rectangular deep cut-off ultra-narrow band pass filter. The method comprises the following steps of (1), determining a theoretical film structure, selecting Ta2O5 as a high-reflectivity material and SiO2 as a low-reflectivity material on the basis of the typical film structure of a multi-cavity optical filter, respectively defining H and L to be the unit optical thickness of the Ta2O5 and the SiO2 on lambda fourth by taking lambda as an operating wavelength of the optical filter, and determining the film structure of the optical filter by using film design software thin film circuit (TFC) Calc on a computer according to performance parameters required by the ultra-narrow band pass filter; (2), making a template control file for the automatic control of a coating machine by using a full-automatic coating machine according to the obtained theoretical film structure; and (3), loading selected coating materials in the coating machine and automatically completing the making of the optical filter through the control mode of eccentric monitoring by the coating machine according to a selected template. Based on the above method, the active area and the rejection rate of the band pass filter are significantly improved. Meanwhile, the adverse effects of errors are effectively controlled.
Description
Technical field
The invention belongs to 1.06 laser micrometers and its application system field, it is related to a kind of rectangular deep cut-off ultra-narrow band band logical
The preparation method of optical filter.
Background technology
Laser has four big optical characteristics of same tropism, high brightness, monochromaticjty and high-energy-density.Because its is relatively common
The special characteristics of light, laser and its application system serve more and more important effect in modern social development, extensively
It is applied to various civil and military fields.In the optical system of laser and its application system, will in order to reach system design
Ask, the optical element that light path is passed through in system is typically necessary and is coated with optical thin film.
So-called optical thin film, refers to the Coating Materials for choosing different light refractive indexes, uses the side for physically or chemically depositing
Different coating materials by the optical principle thickness for calculating and the surface for being deposited in order in membrane component to be plated, are made element finally obtain by method
Optical property with system requirements.
The very important optical element of a class is exactly bandpass filter in laser optical system.This kind of optical filter is mainly applied
In various laser detectors, receiver system.In company with the laser of operation wavelength while various in the also environment for passing through optical filter
Veiling glare, including natural light, various artificial lights etc., contains the light of each wavelength in spectral region substantially.Band logical is filtered
The function of mating plate is that the laser signal for allowing operation wavelength passes through, while filtering the unrelated light of every other wavelength.Allow to lead to
The wave-length coverage crossed i.e. passband, the wave-length coverage for filtering i.e. forbidden band.
Three main performance index of bandpass filter are：
1. rectangular degree.Preferable bandpass filter passes through completely in passband, and forbidden band is completely switched off, and its spectrum response curve exists
Passband is just as rectangle, but this result needs the film of infinite layers to approach.In actual fabrication, the passband shapes of optical filter
Due to the influence of error and membrane system in itself the number of plies it is limited and can not possibly be completely rectangular, the similarity degree of its passband shapes and rectangle
Referred to as rectangular degree.
2. cut-off degree.Optical filter is referred to as cut-off degree for the Energy suppression degree of forbidden band wave-length coverage.For any system,
Signal to noise ratio is higher, and systematic function is more excellent.The index of signal to noise ratio is particularly important for laser pick-off, detection system, because detection
Device spectral response range in itself is general all more much broader than laser work wavelength.In order to obtain signal to noise ratio as high as possible, it is necessary to
The intensity of forbidden band signal is reduced as far as possible, it is desirable to which the higher the better in the cut-off degree of forbidden band for optical filter.
3. passband width.According to the application requirement of optical filter, optical filter has different passband broadbands.Sometimes also with optical filtering
The wavelength difference i.e. half-breadth of passband both sides characterizes this index during piece peak transmittance half.General passband width is less than
The bandpass filter of below 10nm, referred to as ultra-narrow band pass filter.
The bandpass filter commonly used in laser system is all based on the interferometric filter of Fabry Perot principle design.Should
Interferometric filter chooses two kinds of materials of different refractivity as thin-film material, and wherein refractive index material high is defined as H, refraction
The low material of rate is defined as L.Typically the film structure of Fabry Perot principle interferometric filter is：Substrate/(HL) ^m H
NL (HL) ^ (m+1)/air, wherein m and n is respectively positive integer, and its unit thickness is a quarter of work wavelength of optical filter,
Its specific value depends on the index request for needing to obtain product, and said structure is an interference cavity.Fig. 4 describes existing skill
The spectrum test result of the typical 1.06 micron wave length single-chamber bandpass filter of art one.From fig. 4, it can be seen that this simply set
The optical filter of meter has following limitation：
1. rectangular degree is poor.Due to design principle limitation in itself, the interferometric filter passband shapes of single-chamber are typically all approached
Semicircle even taper, so as to cause passband very narrow, cannot provide larger passband width when needed, cause total laser energy
Amount transmitance is not high.Thus trigger it is actually used in problem be optical filter temperature resistance drift poor performance.It is well known that optical filter exists
Actually used middle spectrum can produce drift with the change of temperature.After single-chamber filter spectral is with temperature drift, in operation wavelength
On transmitance very big change may occur, be unfavorable for the stability of work.
2. cut-off degree is poor.This is equally caused by its design principle.From fig. 4, it can be seen that single-chamber optical filter is in passband
Percent of pass change is slow and forbidden band between, and cut-off degree is very low.
During the actual production of optical thin film, can the round piece that is placed in above coating materials to be evaporated of workpiece of plated film carry
In disk.Work piece carrying tray can be rotated at a high speed in plated film, and monitoring piece is placed at its center, coating machine by the transmission of monitoring piece or
The intensity of reflected light signal controls plated film process with the change of coating materials deposit thickness.This method is conventional center monitoring
Method.The characteristics of the method is that film at control point very high level can meet Theoretical Design, but from control point more away from, due to position
Error is bigger caused by putting difference, ultimately result in the film in the range of the certain radius centered on control point can reach design will
Ask, its outer as substandard products or waste product.Area in the radius is referred to as plated film effective area.Because multi-cavity optical filter is for error
The requirement of control is very high, and its effective area is much smaller than ordinary optical film product.The general coating machine of optical thin film its workpiece peace
The umbrella stand or load plate diameter of dress can easily reach more than 1.5 meters.It is with the M111 optical filter special coating systems that Japanese light speeds to produce
Example, the diameter of its work piece carrying tray only has 330 millimeters, when being actually coated with multi-cavity optical filter, and usable area is even more much smaller than the diameter,
Only have more than 20 millimeters for the diameter of the rectangular deep cut-off ultra-narrow band pass filter of high request, or even usable area.
Meanwhile, with the increase of the film layer number of plies, the requirement of control accuracy is also higher during to plated film for multilayer film.Especially for
This accurate film extremely sensitive to control error of multi-cavity optical filter, in plated film engineering between careless slightly very likely multi-cavity
Interact, cause the product piece passband for obtaining deformation or even collapse as waste product.Error how is controlled and reduced during actual plated film,
The product quality of acquisition will be largely fixed.
The content of the invention
(1) goal of the invention
The purpose of the present invention is：Part, proposes that a kind of production efficiency is high in view of the shortcomings of the prior art, it is possible to increase
Bandpass filter effective area and cut-off degree, effectively the making side of the super narrow band pass filter of the negative effect of control error
Method.
(2) technical scheme
In order to solve the above-mentioned technical problem, the present invention provides a kind of making side of rectangular deep cut-off ultra-narrow band pass filter
Method, it comprises the following steps：
(1) theoretical membrane system is determined, the performance parameter required in advance according to super narrow band pass filter determines the film of optical filter
Architecture；
(2) full-automatic coating machine is used, according to the theoretical film structure of above-mentioned acquisition, the coating machine is produced and is automatically controlled
Template contral file；
(3) selected Coating Materials is loaded in coating machine, using the control mode of eccentric monitoring, coating machine is pressed selected
Template contral file is automatically performed the making of optical filter.
Wherein, in the step (1), based on the typical film structure of multi-cavity optical filter, Ta is chosen2O5Rolled over as height
Penetrate rate material, SiO2It is low-index material, Ta is defined respectively2O5And SiO2Unit optical thickness in λ/4 is H and L.
Wherein, in the step (2), there is full-automatic coating machine quartz crystal to vibrate film-thickness monitoring, high-precision optical
Film-thickness monitoring and radio-frequency ion source assisted deposition.
Wherein, the rectangular deep cut-off ultra-narrow band pass filter works in 1064nm, typical half-breadth 5.2nm.
Wherein, the performance parameter that the super narrow band pass filter is required in advance includes：Theoretical half-breadth, Distribution Value be 5~
5.4nm, region of the passband mean transmissivity more than or equal to 95%, its width is not less than 3nm.
Wherein, in the step (1), on computers, above-mentioned H and L is carried out using Film Design software TFC Calc
Simulation, the performance parameter according to the requirement of super narrow band pass filter determines the film structure of optical filter.
Wherein, the film structure is：Substrate/(HLHLHLHLH4LHLHLHLHLHL)
(HLHLHLHLH4LHLHLHLHLHL) (HLHLHLHLH4LHLHLHLHL0.6H0.8L)/air.
Wherein, the typical film structure in the film structure is：Substrate/(HL) ^a H bL (HL) ^ (a+1) (HL) ^c
H dL (HL) ^ (c+1) ... (HL) ^m H nL (HL) ^ (m+1)/air, the quantity in chamber is specific with each chamber when being actually coated with
Parameter is determined by the performance parameter of required product.
Wherein, in the step (3), the selection of the control point of eccentric monitor mode is effective to obtain plated film as big as possible
For the purpose of area.
Wherein, in eccentric monitor mode, select from work piece carrying tray center radius to be some control point on the circumference of 22mm,
Control what plated film process was realized by monitoring the transmitted intensity of the point on substrate.
(3) beneficial effect
The preparation method of the rectangular deep cut-off ultra-narrow band pass filter that above-mentioned technical proposal is provided, with following beneficial
Effect：
The present invention, using multi-cavity optical filter, is designed on the basis of prior art single-chamber optical filter by multiple single-chambers
Stacking, can well improve rectangular degree；While substantially transitional region between compression passband and forbidden band, obtain far above single
The cut-off degree of chamber optical filter.
Improve the process for plating of optical filter.According to the experience of test of many times result, the error analysis of coupled computer software
Prove that the process control method formulated using the present invention can effectively control the negative effect of error, obtain and Theoretical Design phase
The actual product for meeting.
The present invention abandons conventional center monitoring method, using the control mode of eccentric monitoring, effectively improves plated film significant surface
Product.Through test of many times and after comparing, select from work piece carrying tray center as the point of 22mm is control point.The advantage of eccentric monitoring method exists
In：First, the method actual monitored be at a high speed on the workpiece of rotation at the radius in whole circumference average value a little, because
And error is reduced to a certain extent；Secondly as the region of control point both sides is all close to control point, hence it is evident that be better than center
One side region of monitoring method, therefore the method can significantly improve plated film effective area.By above-mentioned tailor-made of the invention
Process control method, can be promoted to 40mm by the radius of the effective area of such optical filter, largely improve production effect
Rate and yield rate.From figure 3, it can be seen that in the effective area of radius 40mm, the maximum wavelength difference for obtaining product is only
0.4nm, with good uniformity.
The method of the selected multi cavity design of the present invention, obtains the Theoretical Design knot with good rectangular degree and cut-off degree high
Really.During actual fabrication, control error is limited and reduced using eccentric monitoring method, actually obtain with big significant surface
The product of product and excellent homogeneity, can largely improve rectangular deep cut-off ultra-narrow band pass filter this kind of exigent
The production efficiency of advanced optical film product, has practical value very high particularly with bigbore such optical filter production.
Brief description of the drawings
Fig. 1 is that the present invention works in 1064nm, the reason of the rectangular deep cut-off ultra-narrow band pass filter of typical half-breadth 5.2nm
By design curve schematic diagram.
The curve synoptic diagram of the test result of the actual product that Fig. 2 is coated with according to present invention process.
Fig. 3 is the heavy caliber rectangular deep cut-off ultra-narrow band pass filter uniform distribution being coated with according to present invention process
Curve synoptic diagram.
Fig. 4 is prior art typical case's single-chamber bandpass filter curve synoptic diagram.
Specific embodiment
To make the purpose of the present invention, content and advantage clearer, with reference to the accompanying drawings and examples, to tool of the invention
Body implementation method is described in further detail.
The preparation method of the rectangular deep cut-off ultra-narrow band pass filter that the present invention is provided comprises the following steps：
(1) determine theoretical membrane system, based on the typical film structure of multi-cavity optical filter, choose Ta2O5As high index of refraction
Material, SiO2It is low-index material, Ta is defined respectively2O5And SiO2Unit optical thickness in λ/4 is H and L, according to ultra-narrow
The performance parameter required in advance with bandpass filter determines the film structure of optical filter；
(2) it is auxiliary using having quartz crystal to vibrate film-thickness monitoring, high-precision optical film-thickness monitoring and radio-frequency ion source
The full-automatic coating machine of plated film is helped, according to the theoretical film structure of above-mentioned acquisition, the mould that the coating machine is automatically controlled is produced
Plate controls file；
(3) selected Coating Materials is loaded in coating machine, using the control mode of eccentric monitoring, coating machine is pressed selected
Template contral file is automatically performed the making of optical filter.
Refering to Fig. 1.In order to solve the deficiency of single-chamber optical filter, for the application neck very harsh to filter performance requirement
Domain, generally, by the superposition of multiple interference cavities, can obtain more preferable rectangular degree, cut-off degree using the design of multi-cavity optical filter
With the passband width for needing.According to working in 1064nm, the rectangular deep cut-off ultra-narrow band pass filter of typical half-breadth 5.2nm
Theoretical Design curve, first, it is determined that theoretical membrane system, based on the typical film structure of multi-cavity optical filter, chooses Ta2O5As
High-index material, SiO2It is low-index material, with λ as 1064nm, Ta is defined respectively2O5And SiO2In the unit optics of λ/4
Thickness is H and L.The performance parameter of optical filter includes that theoretical half-breadth, Distribution Value is 5~5.4nm, and passband mean transmissivity is more than
Or the region equal to 95%, its width is not less than 3nm.On computers, using Film Design software TFC Calc to above-mentioned H and
L is simulated, and the performance parameter according to the requirement of super narrow band pass filter determines that the film structure of optical filter is：
Substrate/(HLHLHLHLH4LHLHLHLHLHL) (HLHLHLHLH4LHLHLHLHLHL)
(HLHLHLHLH4LHLHLHLHL0.6H0.8L)/air.Its typical film structure is：Substrate/(HL) ^a H bL (HL) ^ (a+
1) (HL) ^c H dL (HL) ^ (c+1) ... (HL) ^m H nL (HL) ^ (m+1)/air, the quantity in chamber and every when being actually coated with
The design parameter in individual chamber is determined by the performance parameter of required product.
During optical filter actual fabrication, film-thickness monitoring, high-precision optical film-thickness monitoring are vibrated using with quartz crystal
With the full-automatic coating machine of radio-frequency ion source.The coating machine can select the NBPF-M0111 types arrowband of Guang Chi companies of Japan production
Optical filter special coating system is carried out.Then, according to the theoretical membrane system for obtaining, the template control that the coating machine is automatically controlled is produced
File processed.In this step, using the control mode of eccentric monitoring.The selection of the control point of the eccentric monitor mode is being use up
Can select from work piece carrying tray center radius to be a little on the circumference of 22mm for the purpose of plated film effective area that may be big
Control point, controls what plated film process was realized by monitoring the transmitted intensity of the point on substrate.The region of control point both sides is all
Close to control point.Load selected Coating Materials Ta in coating machine2O5And SiO2, film-coating workpiece is placed in work piece carrying tray,
Start coating machine, coating machine is automatically performed the making of optical filter by selected template contral file.
Fig. 2 describes the spectrum test result of the chamber bandpass filter of 1.06 micron wave length 3 for using actual production of the present invention.
Wherein figure line 1 is the test result of central point on actual product, and figure line 2 is Theoretical Design.From the figure, it can be seen that being actually made
Product in addition to being slightly less than theoretical value in passband transmitance, theoretical design requirements can be properly arrived at.
Fig. 3 describes the uniform distribution of optical filter.For obtained radius 40mm circular filters, figure is have chosen respectively
The center of circle of line 3, half figure line, 20 millimeters of 4 footpath point and figure line 5 radius, 40 millimeters of points, totally 3 position measurements.Test result shows obtained
Optical filter, maximum wavelength difference is only 0.4nm in radial distribution, with good uniformity, it was demonstrated that the present invention can be fine
Be applied to the making of heavy caliber rectangular deep cut-off ultra-narrow band pass filter.
The above is only the preferred embodiment of the present invention, it is noted that for the ordinary skill people of the art
For member, on the premise of the technology of the present invention principle is not departed from, some improvement and deformation can also be made, these improve and deform
Also should be regarded as protection scope of the present invention.
Claims (10)
1. a kind of preparation method of rectangular deep cut-off ultra-narrow band pass filter, it is characterised in that comprise the following steps：
(1) theoretical membrane system is determined, the performance parameter required in advance according to super narrow band pass filter determines the membrane system knot of optical filter
Structure；
(2) full-automatic coating machine is used, according to the theoretical film structure of above-mentioned acquisition, produces what the coating machine was automatically controlled
Template contral file；
(3) selected Coating Materials is loaded in coating machine, using the control mode of eccentric monitoring, coating machine is by selected template
Control file is automatically performed the making of optical filter.
2. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 1, it is characterised in that the step
Suddenly in (1), based on the typical film structure of multi-cavity optical filter, Ta is chosen2O5As high-index material, SiO2It is low folding
Rate material is penetrated, Ta is defined respectively2O5And SiO2Unit optical thickness in λ/4 is H and L.
3. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 2, it is characterised in that the step
Suddenly in (2), there is full-automatic coating machine quartz crystal to vibrate film-thickness monitoring, high-precision optical film-thickness monitoring and radio frequency-ion
Source assisted deposition.
4. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 3, it is characterised in that the square
The shape super narrow band pass filter of cut-off deeply works in 1064nm, typical half-breadth 5.2nm.
5. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 4, it is characterised in that described super
The performance parameter that narrow band pass filter is required in advance includes：Theoretical half-breadth, Distribution Value is 5~5.4nm, passband mean transmissivity
Region more than or equal to 95%, its width is not less than 3nm.
6. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 5, it is characterised in that the step
Suddenly in (1), on computers, above-mentioned H and L is simulated using Film Design software TFC Calc, according to super narrow-band bandpass
The performance parameter of optical filter requirement determines the film structure of optical filter.
7. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 6, it is characterised in that the film
Architecture is：Substrate/(HLHLHLHLH4LHLHLHLHLHL) (HLHLHLHLH4LHLHLHLHLHL)
(HLHLHLHLH4LHLHLHLHL0.6H0.8L)/air.
8. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 7, it is characterised in that the film
Typical film structure in architecture is：Substrate/(HL) ^a H bL (HL) ^ (a+1) (HL) ^c H dL (HL) ^ (c+1) ...
(HL) ^m H nL (HL) ^ (m+1)/air, when being actually coated with the quantity in chamber and the design parameter in each chamber by required product property
Can parameter decision.
9. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 8, it is characterised in that the step
Suddenly in (3), the selection of the control point of eccentric monitor mode is for the purpose of obtaining plated film effective area as big as possible.
10. the preparation method of rectangular deep cut-off ultra-narrow band pass filter as claimed in claim 9, it is characterised in that eccentric
In monitor mode, select from work piece carrying tray center radius to be some control point on the circumference of 22mm, should on substrate by monitoring
Point transmitted intensity come control plated film process realize.
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| CN201611123567.3A CN106707393A (en) | 2016-12-08 | 2016-12-08 | Method for making rectangular deep cut-off ultra-narrow band pass filter |
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| CN108680981A (en) * | 2018-05-16 | 2018-10-19 | 德州尧鼎光电科技有限公司 | A kind of deep ultraviolet narrow-band-filter piece preparation method |
| CN109269778A (en) * | 2018-11-02 | 2019-01-25 | 天津津航技术物理研究所 | A kind of high precision measurement method of deep cut-off narrow band filter |
| CN109491004A (en) * | 2018-12-18 | 2019-03-19 | 西南技术物理研究所 | The production method that a kind of multi-angle rectangle ends broadband bandpass filter deeply |
| CN109576647A (en) * | 2018-12-24 | 2019-04-05 | 深圳正和捷思科技有限公司 | A kind of ultra-thin optical filter method for manufacturing thin film |
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| CN109269778A (en) * | 2018-11-02 | 2019-01-25 | 天津津航技术物理研究所 | A kind of high precision measurement method of deep cut-off narrow band filter |
| CN109491004A (en) * | 2018-12-18 | 2019-03-19 | 西南技术物理研究所 | The production method that a kind of multi-angle rectangle ends broadband bandpass filter deeply |
| CN109576647A (en) * | 2018-12-24 | 2019-04-05 | 深圳正和捷思科技有限公司 | A kind of ultra-thin optical filter method for manufacturing thin film |
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