CN106694497A - Cleaning technology of developing trough for dry film/solder resist ink - Google Patents
Cleaning technology of developing trough for dry film/solder resist ink Download PDFInfo
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- CN106694497A CN106694497A CN201510407943.0A CN201510407943A CN106694497A CN 106694497 A CN106694497 A CN 106694497A CN 201510407943 A CN201510407943 A CN 201510407943A CN 106694497 A CN106694497 A CN 106694497A
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- developing trough
- cleaning
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- trough
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Abstract
The invention provides a cleaning technology of a developing trough for dry film/solder resist ink. The cleaning technology comprises the following steps: completely discharging developing working solution in the developing trough and using tap water to wash sundries; using tap water to wash for 10 minutes in a circulating manner; heating the developing trough to 45-55 DEG C, and adding 40-100 wt.% of cleaning agent aqueous solution of the developing trough for soaking; starting a spraying pump, washing for 2 to 4 hours in a spraying and circulating manner, taking out filtering cotton core after each circulating hour, and putting the filtering cotton core in a lauter tub after washed with tap water; after washing in the spraying and circulating manner, discharging the waste liquid in the developing trough; using tapping water to wash for 1 hour in a circulating manner, and discharging washing water; and filling developing solution for continuous circulating using. With adoption of the cleaning technology, blockage of a spraying nozzle of the developing trough caused by dirt can be dredged, and dirt adhered to a windlass roller can be washed, so that the washing effect is improved and quality of the developing process can be improved; and the production process is pollution-free and suitable for industrial production.
Description
Technical field
The present invention relates to the cleaning of hard circuit board dry/solder mask developing trough dirt, so that the developing trough after cleaning is clean, nozzle is without blocking, row rumble roller noresidue.
Background technology
The version pattern transfer dry film development of hard circuit and solder mask development are to dissolve the calcium in unexposed dry film or ink and water, magnesium ion with carbonic acid oil developer solution easily to form dirt, adhere to cell wall, and plug nozzle has a strong impact on development effect.Adhere on row rumble roller, easily scratch dry film or ink, be that the yields of development declines so as to influence the quality of developing procedure.Many printed wiring board factories generally use dilute sulfuric acid soaking and washing, but its defect is, cleaning performance is poor, time-consuming, needs eight hours or so, and the cleaning frequency is short, clean weekly once, and nozzle and row rumble roller must be removed to be disclosed with steel wire and metal and scrape and can remove, a developing line has hundreds of nozzles, a thousands of rows rumble roller, workload is very huge and use developing trough cleaning agent.As the development of electron trade printed wiring board, production efficiency are increasingly improved, the in addition worsening shortages of operative employee shorter and shorter with the time for going out are produced so that efficiently, the quick means as seeking results.Therefore, solve the problems, such as that the cleaning of the developing trough of dry film/solder mask is extremely urgent.
The content of the invention
It is an object of the invention to a kind of cleaning of the developing trough for dry film/solder mask, so that quick, high-efficiency washing developing trough dirt can be reached.
To achieve these goals, the invention provides a kind of cleaning of the developing trough for dry film/solder mask, the cleaning comprises the following steps：1) by after development work liquid is discharged completely in the developing trough, debris are rinsed with running water；2) running water circulation flushing is used 10 minutes；3) developing trough is heated to 45~55 DEG C, adds 40~100wt.% of developing trough cleaning agent aqueous solution immersions；The cleaning agent is NaOH 100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L；4) spray pump Pu is started, circulated sprinkling is cleaned 2~4 hours, wherein, the filtering cotton core for taking out developing trough cycle filter pump for 1 hour is often circulated, clean with running water in filtering and place into after cotton core the lauter tub of developing trough cycle filter pump；5) after circulated sprinkling cleaning is finished, the waste liquid in the developing trough of draining；6) running water wash cycles are used 1 hour, rinse water of draining；And 7) developer solution is injected, used with continuing cycling through.Blocking of the developing trough spray spout caused by dirt can be dredged using the cleaning, the dirt of row rumble roller adhesion can be cleaned, so as to improve the effect of cleaning, improve the quality of developing procedure.
Further illustrated as to the cleaning of the invention, it is preferable that the pH ＞ 13 of the developing trough cleaning agent aqueous solution, proportion is 1.10~1.30g/cm3。
Further illustrated as to the cleaning of the invention, it is preferable that the water in the developing trough cleaning agent aqueous solution is deionized water.
Further illustrated as to the cleaning of the invention, it is preferable that spray pressure is 1~2kg/cm2。
Cleaning of the invention has following beneficial effect：1) nozzle and row rumble roller and process is simple need not be dismantled, need to only embathe circulation just can easily clean removing dirt, improve the cleansing power of developing trough dirt；2) because cleaning agent is thorough to the Fouling Cleaning of spray spout and row rumble roller, it is ensured that the quality of developing procedure；3) cleaning frequency only need carry out once within one month, alleviate the labour intensity of operative employee, extend the cleaning frequency of developing trough；4) raw material sources are wide, and cheap, low cost, production process is pollution-free, therefore is with a wide range of applications in printed wiring board field.
Specific embodiment
In order that auditor can further appreciate that structure of the invention, feature and other purposes, as follows in conjunction with appended preferred embodiment detailed description, embodiment described is merely to illustrate technical scheme, and the non-limiting present invention.
Embodiment 1
After development work liquid is discharged completely in developing trough, debris are rinsed with running water, then with running water circulation flushing 10 minutes.Then heating developing trough is to 45 DEG C.Add developing trough cleaning agent aqueous solution 100wt.% immersions；The cleaning agent be NaOH 100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L, wherein, the pH ＞ 13 of the developing trough cleaning agent aqueous solution, proportion is 1.10g/m3, the water in the developing trough cleaning agent aqueous solution is deionized water.Start spray pump Pu, spray pressure 1kg/cm2, circulated sprinkling cleans 2 hours, in this process, often circulates the filtering cotton core for taking out developing trough cycle filter pump for 1 hour, clean with running water in filtering and place into after cotton core the lauter tub of developing trough cycle filter pump.After circulated sprinkling cleaning is finished, the waste liquid in developing trough of draining.With running water wash cycles 1 hour, rinse water of then draining.Developer solution is reinjected, is used with continuing cycling through.Developing trough quality performance after cleaning refers to table 1.
Table 1
| Inspection project | Developing trough quality performance after cleaning |
| Developing trough | Cleaning is without dirt |
| Row rumble roller | Cleaning is without dirt |
| Spray spout | Nozzle is unobstructed |
Embodiment 2
After development work liquid is discharged completely in developing trough, debris are rinsed with running water, then with running water circulation flushing 10 minutes.Then heating developing trough is to 55 DEG C.Add developing trough cleaning agent aqueous solution 40wt.% immersions；The cleaning agent be NaOH 100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L, wherein, the pH ＞ 13 of the developing trough cleaning agent aqueous solution, proportion is 1.30g/cm2, the water in the developing trough cleaning agent aqueous solution is deionized water.Start spray pump Pu, spray pressure 2kg/cm2, circulated sprinkling cleans 4 hours, in this process, often circulates the filtering cotton core for taking out developing trough cycle filter pump for 1 hour, clean with running water in filtering and place into after cotton core the lauter tub of developing trough cycle filter pump.After circulated sprinkling cleaning is finished, the waste liquid in developing trough of draining.With running water wash cycles 1 hour, rinse water of then draining.Developer solution is reinjected, is used with continuing cycling through.Developing trough quality performance after cleaning refers to table 2.
Table 2
| Inspection project | Developing trough quality performance after cleaning |
| Developing trough | Cleaning is without dirt |
| Row rumble roller | Cleaning is without dirt |
| Spray spout | Nozzle is unobstructed |
Embodiment 3
After development work liquid is discharged completely in developing trough, debris are rinsed with running water, then with running water circulation flushing 10 minutes.Then heating developing trough is to 50 DEG C.Add developing trough cleaning agent aqueous solution 60wt.% immersion, the cleaning agent is NaOH 100g/L, sodium potassium tartrate tetrahydrate 20g/L and PEG6000#10g/L, wherein, the proportion of the pH ＞ 13 of the developing trough cleaning agent aqueous solution, NaOH is 1.30g/cm2, the water in the developing trough cleaning agent aqueous solution is deionized water.Start spray pump Pu, spray pressure 2kg/cm2, circulated sprinkling cleans 3 hours, in this process, often circulates the filtering cotton core for taking out developing trough cycle filter pump for 1 hour, clean with running water in filtering and place into after cotton core the lauter tub of developing trough cycle filter pump.After circulated sprinkling cleaning is finished, the waste liquid in developing trough of draining.With running water wash cycles 1 hour, rinse water of then draining.Developer solution is reinjected, is used with continuing cycling through.Developing trough quality performance after cleaning refers to table 3.
Table 3
| Inspection project | Developing trough quality performance after cleaning |
| Developing trough | Cleaning is without dirt |
| Row rumble roller | Cleaning is without dirt |
| Spray spout | Nozzle is unobstructed |
It is to be understood that, foregoing invention content and specific embodiment are intended to prove the practical application of technical scheme provided by the present invention, should not be construed as limiting the scope of the present invention.Those skilled in the art in spirit and principles of the present invention, when can various modifications may be made, equivalent or improvement.Protection scope of the present invention is defined by appended claims.
Claims (4)
1. a kind of cleaning of developing trough for dry film/solder mask, it is characterised in that institute
Cleaning is stated to comprise the following steps：
1) by after development work liquid is discharged completely in the developing trough, debris are rinsed with running water；
2) running water circulation flushing is used 10 minutes；
3) developing trough is heated to 45~55 DEG C, adds the developing trough cleaning agent aqueous solution
40~100wt.% soaks；The cleaning agent be NaOH 100g/L, sodium potassium tartrate tetrahydrate 20g/L and
PEG6000#10g/L；
4) spray pump Pu is started, circulated sprinkling is cleaned 2~4 hours, wherein, often circulate 1 hour
The filtering cotton core of developing trough cycle filter pump is taken out, is placed into after cleaning filtering cotton core with running water
In the lauter tub of developing trough cycle filter pump；
5) after circulated sprinkling cleaning is finished, the waste liquid in the developing trough of draining；
6) running water wash cycles are used 1 hour, rinse water of draining；
7) developer solution is injected, is used with continuing cycling through.
2. cleaning according to claim 1, it is characterised in that the developing trough is clear
The pH ＞ 13 of the lotion aqueous solution, proportion is 1.10~1.30g/cm3。
3. cleaning according to claim 1 and 2, it is characterised in that the development
Water in the groove cleaning agent aqueous solution is deionized water.
4. cleaning according to claim 1, it is characterised in that spray pressure is
1~2kg/cm2。
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510407943.0A CN106694497B (en) | 2015-07-13 | 2015-07-13 | A kind of cleaning process for dry film/solder mask developing trough |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201510407943.0A CN106694497B (en) | 2015-07-13 | 2015-07-13 | A kind of cleaning process for dry film/solder mask developing trough |
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| Publication Number | Publication Date |
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| CN106694497A true CN106694497A (en) | 2017-05-24 |
| CN106694497B CN106694497B (en) | 2019-02-05 |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114130745A (en) * | 2021-12-06 | 2022-03-04 | 广东喜珍电路科技有限公司 | Automatic maintenance method for horizontal line of circuit board |
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| JPH1039518A (en) * | 1996-07-25 | 1998-02-13 | Konica Corp | Cleaning method of developing machine |
| JP2003209337A (en) * | 2002-01-15 | 2003-07-25 | Hitachi Chem Co Ltd | Cleaning method for developing apparatus for printed wiring board |
| WO2004092320A1 (en) * | 2003-04-11 | 2004-10-28 | Asahi Denka Co., Ltd. | Detergent composition for alkali development apparatus |
| CN101859074A (en) * | 2010-07-15 | 2010-10-13 | 深圳市路维电子有限公司 | Cleaning solution for dry plate developing tank and cleaning method thereof |
| CN102053507A (en) * | 2010-10-18 | 2011-05-11 | 东莞市威迪膜科技有限公司 | Cleaning system and cleaning method of developing solution circulation process equipment |
| CN102486619A (en) * | 2010-12-02 | 2012-06-06 | 台湾永光化学工业股份有限公司 | Cleaning solution composition |
| CN102757871A (en) * | 2012-06-19 | 2012-10-31 | 瀚宇博德科技（江阴）有限公司 | Cleaning agent for dry-film developing tank of printed circuit board (PCB) and preparation method of cleaning agent |
| US20130315627A1 (en) * | 2012-05-22 | 2013-11-28 | Minoru Sugiyama | Development processing device |
| CN103923514A (en) * | 2014-05-04 | 2014-07-16 | 深圳市实锐泰科技有限公司 | PCB developing tank cleaning solution and method for cleaning developing tank by using same |
-
2015
- 2015-07-13 CN CN201510407943.0A patent/CN106694497B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1039518A (en) * | 1996-07-25 | 1998-02-13 | Konica Corp | Cleaning method of developing machine |
| JP2003209337A (en) * | 2002-01-15 | 2003-07-25 | Hitachi Chem Co Ltd | Cleaning method for developing apparatus for printed wiring board |
| WO2004092320A1 (en) * | 2003-04-11 | 2004-10-28 | Asahi Denka Co., Ltd. | Detergent composition for alkali development apparatus |
| CN1296470C (en) * | 2003-04-11 | 2007-01-24 | 株式会社Adeka | Detergent composition for alkali development apparatus |
| CN101859074A (en) * | 2010-07-15 | 2010-10-13 | 深圳市路维电子有限公司 | Cleaning solution for dry plate developing tank and cleaning method thereof |
| CN102053507A (en) * | 2010-10-18 | 2011-05-11 | 东莞市威迪膜科技有限公司 | Cleaning system and cleaning method of developing solution circulation process equipment |
| CN102486619A (en) * | 2010-12-02 | 2012-06-06 | 台湾永光化学工业股份有限公司 | Cleaning solution composition |
| US20130315627A1 (en) * | 2012-05-22 | 2013-11-28 | Minoru Sugiyama | Development processing device |
| CN102757871A (en) * | 2012-06-19 | 2012-10-31 | 瀚宇博德科技（江阴）有限公司 | Cleaning agent for dry-film developing tank of printed circuit board (PCB) and preparation method of cleaning agent |
| CN103923514A (en) * | 2014-05-04 | 2014-07-16 | 深圳市实锐泰科技有限公司 | PCB developing tank cleaning solution and method for cleaning developing tank by using same |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114130745A (en) * | 2021-12-06 | 2022-03-04 | 广东喜珍电路科技有限公司 | Automatic maintenance method for horizontal line of circuit board |
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