CN106670899B - A kind of gasbag-type electrochemical mechanical polishing head, burnishing device and polishing method - Google Patents
A kind of gasbag-type electrochemical mechanical polishing head, burnishing device and polishing method Download PDFInfo
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- CN106670899B CN106670899B CN201610963123.4A CN201610963123A CN106670899B CN 106670899 B CN106670899 B CN 106670899B CN 201610963123 A CN201610963123 A CN 201610963123A CN 106670899 B CN106670899 B CN 106670899B
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- mechanical polishing
- electrochemical mechanical
- gasbag
- workpiece
- ultrasonic vibration
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
- B24B1/04—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes subjecting the grinding or polishing tools, the abrading or polishing medium or work to vibration, e.g. grinding with ultrasonic frequency
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B41/00—Component parts such as frames, beds, carriages, headstocks
- B24B41/04—Headstocks; Working-spindles; Features relating thereto
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/16—Polishing
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F7/00—Constructional parts, or assemblies thereof, of cells for electrolytic removal of material from objects; Servicing or operating
Abstract
A kind of gasbag-type electrochemical mechanical polishing head, burnishing device and polishing method, are related to Ultraprecision Machining field.Rubbing head of the invention increases one layer of conductive layer in traditional air bag polishing head material interlayer, i.e. the structure of the rubbing head is followed successively by rubber bag tank matrix, conductive layer and the polishing material bed of material.Polishing method of the invention carries out as steps described below: the hard brittle material workpiece being processed by shot blasting will be needed to be fixed in electrolytic cell；Electrolyte is added between rubbing head and workpiece surface；Under the action of ultrasonic elliptical vibratory and extra electric field, the polished surface and gasbag-type electrochemical mechanical polishing capitiform of hard brittle material are secondary at friction；Friction pair polishes workpiece under the action of electrolyte, ultrasonic vibration and extra electric field.The present invention improves the efficiency of electrolyte using ultrasonic elliptical vibratory, achievees the purpose that improve polishing effect；The surface polishing precision of hard brittle material is improved, processing removal rate has the raising of a magnitude or more compared with conventional chemical-mechanical polishing.
Description
Technical field
It is that one is related to the improvement of Conventional electrochemical mechanical polishing technology the invention belongs to Ultraprecision Machining field
Kind carries out electrochemical mechanical polishing head, burnishing device and the polishing method of surface polishing to hard brittle materials such as ceramics and metals.
Background technique
With the progress of microelectronics, photoelectron, sensor technology and material science and technology, hard brittle material oneself become tip section
Advanced material the most active is applied in technology.Wherein, the representational semiconductor silicon for being used as chip material, germanium, arsenic
Change gallium crystal, and the materials such as silicon nitride, alumina ceramic material and silicon carbide, cubic boron nitride, diamond for being commonly used for substrate
Material.Such material is hard and crisp, and processability is very poor.
Silicon carbide because specific stiffness is high, thermal expansion coefficient is small, heating conduction is good, mechanical performance isotropism, dimensionally stable,
Very thin or porous structure can be made, the excellent physical and chemical performance such as light weight effect is obvious, it has also become space large scale is light
The material of new generation of type reflecting mirror.
Mirror surface roughness direct relation receives the accuracy of signal and the accuracy of instrument.To meet high-precision light
The imaging requirements of system, it is desirable that silicon carbide mirror surface ultra-smooth not damaged (surface roughness Ra < 1nm, surface precision
Root-mean-square value only several nanometers).But such material hardness is high, brittleness is big, poor to weld defect control, shock resistance, traditional
Slightly, carefully gradually processing efficiency is low, the time is long for grinding and polishing (polishing) method, and cosmetic bug is more.
Summary of the invention
The object of the present invention is to provide a kind of gasbag-type electrochemical mechanical polishing head, burnishing device and polishing method, the dresses
It sets and method is suitable for plane, spherical surface, aspherical, even arbitrary surface polishing.The technology is to change Ultrasonic machining and one kind
Into the comprehensive New Processing being integrated of type electrochemical mechanical polishing.
In order to solve the above technical problems, the present invention is achieved through the following technical solutions: a kind of gasbag-type electrochemical machinery
Rubbing head, including spherical air bag, support arm, inner support, shaft and gasket, spherical air bag include the rubber bag tank matrix of bottom
With the polyurethane polishing film of outer layer, support arm is fixedly connected with inner support, and the opening end cap of spherical air bag is at the bottom of interior bracket
End, support arm and inner support support jointly fixes spherical air bag, and the contact portion of spherical air bag and support arm is provided with pad
Piece, inner support are fixedly connected with shaft；One layer of conductive layer, the conductive layer are equipped between rubber bag tank matrix and polyurethane polishing film
It is pasted on the spherical crown surface of bottom rubber bag tank substrate and is formed by conducting polymer, polyurethane polishing film is adhesive in the outer of conductive layer
Surface.
Wherein, abrasive grain is inlaid in the conducting polymer, the abrasive grain is cast iron or steel.
Wherein, various holes or groove are provided on the polyurethane polishing film.
Ultrasonic vibration assisted electrochemical mechanical polishing apparatus, including supersonic generator, ultrasonic vibrator, computer, electrochemistry
Analyzer, gasbag-type electrochemical mechanical polishing head, buff spindle and its clamping device, vacuum adsorption fixture and electrolytic cell, wait throw
The workpiece of light processing is fixed in electrolytic cell by vacuum adsorption fixture, and rubbing head is installed on buff spindle；Electrochemical analysis
The working electrode of instrument is connect with workpiece, and reference electrode is arranged in cell edge, to electrode and gasbag-type electrochemical mechanical polishing
The conductive layer connection of head；Supersonic generator generates high-frequency ac electric signal and exports to ultrasonic vibrator；Ultrasonic vibrator is by high frequency
Ac signal is simultaneously converted into mechanical energy, is applied on gasbag-type electrochemical mechanical polishing head or passes through idler wheel for ultrasonic vibration
Ultrasonic vibration is applied on electrolytic cell.
Wherein, the reference electrode is graphite, is placed at the position cell edge 5mm.
Wherein, the high-frequency ac signal frequency that the supersonic generator generates is 24.3kHz, working electrode with it is right
Interelectrode applied voltage is less than 4V.
Wherein, the workpiece is aspherical hard brittle material, and the hard brittle material is ceramics or metal.
A kind of electrochemical mechanical polishing method of ultrasonic vibration auxiliary, comprising the following steps:
(1) workpiece by polished processing is fixed in electrolytic cell by vacuum adsorption fixture, by gasbag-type electrochemistry machine
Tool rubbing head, which is installed on buff spindle, makes air bag form airtight cavity, is filled with low-pressure gas in the cavity；
(2) by gasbag-type electrochemical mechanical polishing head approach workpiece surface, and gasbag-type electrochemical mechanical polishing head with
Electrolyte is added between workpiece surface；
(3) supersonic generator generates high-frequency ac electric signal and exports to ultrasonic vibrator；
(4) ultrasonic vibrator by high-frequency ac electric signal and is converted into mechanical energy, and ultrasonic vibration is applied to gasbag-type electrification
It learns on mechanical polishing head or ultrasonic vibration is applied on electrolytic cell by idler wheel；
(5) under the action of extra electric field and ultrasonic vibration, the polished surface and gasbag-type electrochemical mechanical polishing of workpiece
It is secondary that the polyurethane polishing film of head forms friction；
(6) friction pair polishes workpiece under the action of electrolyte, ultrasonic vibration and extra electric field, obtains ultraprecise
Smooth workpiece surface.
Wherein, the ultrasonic vibration is ultrasonic elliptical vibratory.
Wherein, the extra electric field is by applying between the conductive layer and workpiece of gasbag-type electrochemical mechanical polishing head
What applied voltage was formed.
Ultrasonic vibration assisted electrochemical mechanical polishing method proposed by the present invention, the material removing rate and surface quality of workpiece
Depending on applied voltage and ultrasonic vibration.The advantages of technology, is:
(1) it is processed by shot blasting under low-pressure (being less than 1.0psi).Polishing under low-pressure can reduce low-intensity medium
Tearing and cross throw, substantially reduce the sensibility of device pattern in polishing process, at the same also can be reduced lap tool abrasion, extend lap tool
Service life；
(2) it with the effect of oxidant during applied voltage substituted chemistry mechanical polishing (CMP), is free of or less containing oxidant
Electrolyte to environmental-friendly；
(3) major impetus of the electrolysis as material removing rate is applied, voltage drive program appropriate and electrolyte add
Add the combination of agent, can correctly control material remove rate, is convenient for end point determination；
(4) ultrasonic vibration is applied on electrochemical mechanical polishing tool or polished land, utilizes electrochemical mechanical polishing
The ultrasonic elliptical vibratory that tool or platform generate, improves the efficiency of electrolyte used in electrochemical mechanical polishing, reaches and change
The purpose of kind polishing effect；
(5) present invention has that high in machining efficiency, surface quality is good, at low cost, high degree of automation, easily operated excellent
Point.
Detailed description of the invention
Fig. 1 is the polishing element and its motion principle schematic diagram of conventional planar electrochemical mechanical polishing；
Fig. 2 is that the polishing element for the electrochemical mechanical polishing device that ultrasonic vibration of the invention assists and its motion principle show
It is intended to；
Fig. 3 is gasbag-type electrochemical mechanical polishing header structure schematic diagram of the invention.
Specific embodiment
The present invention will be further described in detail with reference to the accompanying drawing.
Shown in Figure 3, gasbag-type electrochemical mechanical polishing head of the invention includes spherical air bag 1, support arm 2, pad
Piece 3, inner support 4 and shaft 5, on inner support 4, open end and the step surface of inner support 4 closely paste 1 set of spherical air bag
It closes；Support arm 2 is threadedly attached on inner support 4；Gasket 3 is set between support arm 2 and spherical air bag 1；In this way, by
The support of the compression of gasket 3 and inside and outside bracket realizes positioning and the clamping of spherical air bag 1.Inner support 4 is joined by screw thread
It connects in shaft 5, while the inner hole conical surface of the small conical surface of 5 end of shaft and inner support 4 forms and cooperates, not only can guarantee in this way pair
Middle performance, moreover it is possible to reliably seal internal gas.
Spherical air bag 1 includes matrix, middle layer and conductive polymer coating.Matrix is the rubber bag tank of spherical crown shape, and inside is filled
There is gas；Middle layer is conductive layer, and the conducting polymer of, very thin thickness higher using tensile strength and conduction is pasted onto rubber bag tank
Spherical crown surface on, can be inlayed in conductive polymer coating containing the abrasive grains such as cast iron or steel, the addition of abrasive grain is in addition to that can enhance mechanical work
Change effect is outer, can also promote the chemical reaction of the hard brittle materials such as SiC；The outermost layer contacted with workpiece is polyurethane polished film,
It is firmly pasted on the electrically conductive with glue.Be provided with various holes or groove on the polyurethane polished film simultaneously, facilitate conductive layer with
The flowing of electric current between hard brittle material simultaneously can be used for storage electrolyte.
It is shown in Figure 2, the electrochemical mechanical polishing device of ultrasonic vibration auxiliary of the invention include supersonic generator,
Ultrasonic vibrator, computer, electrochemical analyser, gasbag-type electrochemical mechanical polishing head, buff spindle and its clamping device, vacuum are inhaled
Attached fixture and electrolytic cell etc..The workpiece of polished processing is fixed in electrolytic cell by vacuum adsorption fixture, and rubbing head is installed on
On buff spindle；Computer is connect with electrochemical analyser, the former latter input power signal instruction, and the latter receives the former and instructs
It works；The working electrode of electrochemical analyser is connect with workpiece, and reference electrode is arranged in cell edge, to electrode and gas
The intermediate conductive layer of bellows electrochemical mechanical polishing head connects；Supersonic generator is connect with ultrasonic vibrator, is formed complete super
Acoustic vibration system.
Apply ultrasonic elliptical vibratory on electrochemical mechanical polishing device there are two types of method, one kind is by ultrasonic elliptical vibratory
It is applied on electrochemical mechanical polishing head, ultrasonic elliptical vibratory is is applied on electrolytic cell by one kind, ultrasonic vibrator and electrolytic cell
It is contacted by the idler wheel of rotation.Electrical source of power is converted ultrasonic oval mechanical wave by ultrasonic generator, pushes electrochemical machinery
Rubbing head or electrolytic cell complete ultrasonic elliptical vibratory, improve the efficiency of electrolyte used in electrochemical mechanical polishing, reach
Improve the purpose of polishing effect.
Embodiment: will need the SiC being processed by shot blasting to be fixed on electrolytic cell, polished surface and the gasbag-type electricity of SiC
It is secondary that chemical mechanical polishing head forms friction；Deionized water, 3%NaOH is respectively adopted in electrolyte；Using graphite as reference electrode,
Reference electrode is placed in cell edge 5mm or so；SiC and to applied voltage added between electrode control in 4V or less；Polishing master
The revolving speed of axis is 200rpm/min；Electrolytic cell is static, and ultrasonic-frequency power supply frequency used in polishing process is 24.3kHz.Friction is secondary
It realizes in electrolyte and under the operating condition of applied voltage and ultrasonic elliptical vibratory to the material of SiC removal and precise polished.
Power-up size and mode have apparent influence to polishing efficiency and quality, i.e., can make when applying negative voltage to SiC
Its removal rate has apparent increase, and coefficient of friction is slightly increased；Applying backward voltage can be such that the removal rate of SiC is obviously reduced.
Under the applied voltage of+4V, aspherical SiC obtains smooth polishing table under the electrochemical mechanical polishing technology of ultrasonic wave added
Face (aspherical surface of SiC roughness value is lower than 1nm in the present invention).
A kind of electrochemical mechanical polishing method of ultrasonic vibration auxiliary, comprising the following steps:
(1) the aspherical hard brittle material of polished processing is fixed on electrolytic cell by vacuum adsorption fixture, by air bag
Formula electrochemical mechanical polishing head, which is installed on buff spindle, makes air bag form airtight cavity, is filled with low-pressure gas in the cavity；
The pressure of intracavity gas can be adjusted in real time.In this way, the air bag itself as polishing tool not only have well it is soft
Property, there are also certain intensity, the ability with good resistance to deformation.
(2) gasbag-type electrochemical mechanical polishing head is approached into aspherical hard brittle material surface, and in gasbag-type electrochemistry machine
Electrolyte is added between tool rubbing head and workpiece surface；
When polishing, rubbing head is acted on by workpiece surface with certain approach distance, the air bag of such spherical crown shape will occur
Certain deformation, and fitted closely with the surface of workpiece to be machined, form polishing contact area.
(3) supersonic generator generates high-frequency ac electric signal and exports to ultrasonic vibrator；Ultrasonic vibrator is by high-frequency ac
Electric signal is simultaneously converted into mechanical energy, and ultrasonic vibration is applied on gasbag-type electrochemical mechanical polishing head or will be surpassed by idler wheel
Acoustic vibration is applied on electrolytic cell；
Ultrasonic wave added-electrochemical mechanical polishing system is a typical friction electro-chemical systems, and theory is related to machinery
Multiple ambits such as, materialogy, tribology, control, physical chemistry, fluid dynamics and Chemical Kinetics.
(4) under the action of extra electric field and ultrasonic vibration, the polished surface and polyurethane polishing of aspherical hard brittle material
It is secondary that film forms friction；
Extra electric field is by the conductive layer (to electrode) and workpiece (work electricity in gasbag-type electrochemical mechanical polishing head
Pole) between apply applied voltage formed.
(5) friction pair polishes workpiece under the action of electrolyte, ultrasonic vibration and extra electric field, obtains ultraprecise
Smooth workpiece surface.
Workpiece surface electrochemical oxidation forms one layer of soft insoluble composite layer or passivation during electrochemical mechanical polishing
Layer, soluble layer does not pass through the mechanical removal in the contact friction process of rubbing head elasticity rough peak, the workpiece of naked leakage then for this
Surface then repeats to be electrochemically oxidized removal under the action of applying electrical potential again, can efficiently be gone to firmly crisp equal difficult-to-machine materials
It removes, and realizes not damaged surface processing, be a kind of new method that not damaged aspherical mirror machining can be achieved.
Claims (10)
1. a kind of gasbag-type electrochemical mechanical polishing head, including spherical air bag, support arm, inner support, shaft and gasket, spherical crown
Shape air bag includes the rubber bag tank matrix of bottom and the polyurethane polishing film of outer layer, and support arm is fixedly connected with inner support, spherical
The opening end cap of air bag supports fixed spherical air bag, spherical air bag in the bottom end of interior bracket, support arm and inner support jointly
The contact portion of support arm is provided with gasket, inner support is fixedly connected with shaft；It is characterized in that, in rubber bag tank matrix and gathering
One layer of conductive layer is equipped between urethane polished film, which is pasted onto the spherical crown table of bottom rubber bag tank substrate by conducting polymer
It is formed on face, polyurethane polishing film is adhesive in the outer surface of conductive layer.
2. a kind of gasbag-type electrochemical mechanical polishing head according to claim 1, which is characterized in that the conducting polymer
Abrasive grain is inlaid in object, the abrasive grain is cast iron or steel.
3. a kind of gasbag-type electrochemical mechanical polishing head according to claim 1 or 2, which is characterized in that the poly- ammonia
Various holes or groove are provided on ester polished film.
4. ultrasonic vibration assisted electrochemical mechanical polishing apparatus, including computer, electrochemical analyser, rubbing head, buff spindle and
The workpiece of its clamping device, vacuum adsorption fixture and electrolytic cell, polished processing is fixed on electrolytic cell by vacuum adsorption fixture
In, rubbing head is installed on buff spindle；The working electrode of electrochemical analyser is connect with workpiece, and reference electrode setting is being electrolysed
Pool side edge connect electrode with the conductive layer of gasbag-type electrochemical mechanical polishing head；It is characterized in that, further including ultrasonic wave
Device and ultrasonic vibrator, the rubbing head are gasbag-type electrochemical mechanical polishing head as claimed in claim 1 or 2, ultrasonic wave
Generator generates high-frequency ac electric signal and exports to ultrasonic vibrator；High-frequency ac electric signal is converted machinery by ultrasonic vibrator
Can, ultrasonic vibration is applied on gasbag-type electrochemical mechanical polishing head or ultrasonic vibration is applied to by electrolytic cell by idler wheel
On.
5. ultrasonic vibration assisted electrochemical mechanical polishing apparatus according to claim 4, which is characterized in that the reference
Electrode is graphite, is placed at the position cell edge 5mm.
6. ultrasonic vibration assisted electrochemical mechanical polishing apparatus according to claim 4, which is characterized in that the ultrasound
The high-frequency ac signal frequency that wave producer generates is 24.3kHz, and working electrode is less than 4V with to interelectrode applied voltage.
7. according to any ultrasonic vibration assisted electrochemical mechanical polishing apparatus of claim 4 or 6, which is characterized in that institute
The workpiece stated is aspherical hard brittle material, and the hard brittle material is ceramics or metal.
8. a kind of electrochemical mechanical polishing method of ultrasonic vibration auxiliary, which comprises the following steps:
(1) workpiece by polished processing is fixed in electrolytic cell by vacuum adsorption fixture, will be as claimed in claim 1 or 2
Gasbag-type electrochemical mechanical polishing head be installed on buff spindle make air bag formed airtight cavity, be filled with low pressure gas in the cavity
Body；
(2) gasbag-type electrochemical mechanical polishing head is approached into workpiece surface, and in gasbag-type electrochemical mechanical polishing head and workpiece
Electrolyte is added between surface；
(3) supersonic generator generates high-frequency ac electric signal and exports to ultrasonic vibrator；
(4) high-frequency ac electric signal is converted mechanical energy by ultrasonic vibrator, and ultrasonic vibration is applied to gasbag-type electrochemical machinery
It is applied on electrolytic cell on rubbing head or by idler wheel by ultrasonic vibration；
(5) under the action of extra electric field and ultrasonic vibration, polished surface and the gasbag-type electrochemical mechanical polishing head of workpiece
It is secondary that polyurethane polishing film forms friction；
(6) friction pair polishes workpiece under the action of electrolyte, ultrasonic vibration and extra electric field, and it is smooth to obtain ultraprecise
Workpiece surface.
9. a kind of electrochemical mechanical polishing method of ultrasonic vibration auxiliary according to claim 8, which is characterized in that described
Ultrasonic vibration be ultrasonic elliptical vibratory.
10. a kind of electrochemical mechanical polishing method of ultrasonic vibration auxiliary according to claim 8, which is characterized in that institute
The extra electric field stated is formed by applying applied voltage between the conductive layer and workpiece of gasbag-type electrochemical mechanical polishing head.
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| CN201610963123.4A CN106670899B (en) | 2016-10-28 | 2016-10-28 | A kind of gasbag-type electrochemical mechanical polishing head, burnishing device and polishing method |
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| CN201610963123.4A CN106670899B (en) | 2016-10-28 | 2016-10-28 | A kind of gasbag-type electrochemical mechanical polishing head, burnishing device and polishing method |
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| CN106670899B true CN106670899B (en) | 2019-03-15 |
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| CN107900787A (en) * | 2017-11-10 | 2018-04-13 | 南方科技大学 | A kind of plasma oxidation assistant grinding apparatus and method |
| CN108214116B (en) * | 2018-01-22 | 2019-05-28 | 集美大学 | A kind of ultrasonic vibration polishing processing device |
| CN108890408B (en) * | 2018-09-27 | 2019-04-05 | 吉林大学 | A kind of device of ultrasonic wave added grinding and polishing silicon carbide wafer |
| CN110587387A (en) * | 2019-06-24 | 2019-12-20 | 南昌大学 | Device for ultrasonic electrochemical mechanical polishing of sapphire substrate material |
| CN110883680B (en) * | 2019-12-17 | 2021-08-10 | 杭州众硅电子科技有限公司 | Polishing head pressure control device and method for chemical mechanical planarization device |
| CN111906601B (en) * | 2020-08-24 | 2022-04-05 | 钟健辉 | Ultrasonic grinding and polishing system and method for rotor wing frame of unmanned aerial vehicle |
| CN114571351B (en) * | 2022-04-13 | 2022-12-30 | 上海申和投资有限公司 | High-efficiency polishing equipment and method for silicon carbide crystals |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JPH06226612A (en) * | 1993-01-28 | 1994-08-16 | Toshiba Corp | Polishing tool |
| US6991528B2 (en) * | 2000-02-17 | 2006-01-31 | Applied Materials, Inc. | Conductive polishing article for electrochemical mechanical polishing |
| CN1670265A (en) * | 2004-12-24 | 2005-09-21 | 哈尔滨工业大学 | Frictional electrochemical grinding and buffing method for dryness material |
| CN101573212A (en) * | 2006-11-08 | 2009-11-04 | 圣劳伦斯纳米科技有限公司 | Method and apparatus for electrochemical mechanical polishing NiP substrates |
| CN101239445A (en) * | 2007-12-28 | 2008-08-13 | 欧陆不锈钢制品（深圳）有限公司 | Ultrasonic electrolyzing composite polishing processing device |
| CN101780661B (en) * | 2009-01-15 | 2012-05-23 | 贝达先进材料股份有限公司 | Conductive polishing pad and manufacturing method thereof |
| CN101844320B (en) * | 2010-06-07 | 2011-09-14 | 湖南大学 | Precise high-efficiency polishing method and device for curved surface parts |
| CN102765012B (en) * | 2012-03-23 | 2014-06-25 | 中国科学院光电技术研究所 | Electrorheological fluid-based flexible controllable air sac polishing tool |
| CN102785145B (en) * | 2012-08-16 | 2015-07-29 | 中国科学院西安光学精密机械研究所 | Based on the gasbag-type grinding and polishing device of control corrosion rate |
| CN104308670B (en) * | 2014-08-29 | 2016-09-14 | 浙江工业大学 | Ultraprecise processing method based on non-Newtonian shear thickening with electrolysis complex effect |
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