CN106647176A - Wave aberration measurement device and method - Google Patents
Wave aberration measurement device and method Download PDFInfo
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- CN106647176A CN106647176A CN201510731101.0A CN201510731101A CN106647176A CN 106647176 A CN106647176 A CN 106647176A CN 201510731101 A CN201510731101 A CN 201510731101A CN 106647176 A CN106647176 A CN 106647176A
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Abstract
The invention discloses a wave aberration measurement device and a wave aberration measurement method. The wave aberration measurement device comprises a light source, an illuminating system, an object plane module and an image plane detecting unit, wherein the object plane module comprises an object plane grating and an object plane level selection plate, the image plane detecting unit comprises an image plane grating, an image plane level selection plate and a detector, and the object plane grating and the image plane grating both adopt a binary phase shift grating. The object plane grating and the image plane grating both adopt the binary phase shift grating, wherein zero-level light does not exist in diffracted light, only positive/negative 1-level light exists in the diffracted light, the light intensity used for measuring is improved, the filtering effect of the 0-level diffracted light is not taken into consideration for the object plane level selection plate, and the process difficulty is reduced; the object plane module uses the object plane grating and the object plane level selection plate, the transmittance of the object plane grating is much larger than that of the initial pinhole, the time for acquiring an image plane is shortened, the signal intensity is improved, and the measurement speed and the measurement accuracy are improved.
Description
Technical field
The present invention relates to IC manufacturing field, more particularly to a kind of wave aberration measurement apparatus and method.
Background technology
Projection objective wave aberration is the key factor for affecting image forming quality of photoetching machine.For high-resolution litho machine
Projection objective wave aberration, can adopt the method interfered to measure.Cross grating lateral shear interferometer is a kind of
The conventional method using principle of interference to carry out projection objective wave aberration detection, its principle is as shown in figure 1, light
Line produces diffraction and forms an aberrationless spherical wave by initial pin hole 1.The spherical wave passes through object lens to be measured
After 2, its wavefront will carry the wave aberration of object lens 2 to be measured.On the out of focus face of object lens Image space, it is placed with
Binary raster 3.Spherical wave with wave aberration after binary raster 3, object lens image planes be diffracted to 0 grade and
+/- 1 grade of light.Object lens image planes are placed with level time and select mask 4, the level time to select mask 4 larger comprising 4
Window, its effect similar to spatial filter.+/- 1 grade of light of diffraction can be with only in X-axis and Y-axis
By window, the secondary diffraction light of 0 grade and other grade is then filtered by it.It is loaded with the wave aberration information of object lens to be measured 2
+/- 1 order diffraction light interfere, its interference fringe is recorded by CCD 5, through data processing,
The i.e. reducible wavefront of determinand mirror 2, solves objective wave aberration.The benefit of the method is directly in object lens pupil face
Wave aberration detection is carried out, accuracy of detection is high.Mask 4 is selected using level time, can be by a secondary interference image
Detected, detection time is short.
The shortcoming of the program is：
1st, object plane is measured using initial pin hole 1, and orifice size thereon is less, is made and is met what is required
Aperture difficulty is high；
2nd, to produce ideal spherical face ripple, orifice size can not be too big, thus makes light intensity transmitance low, reduces
The contrast of the measurement of image planes；
3rd, the light beam for participating in interference converges at image planes difference so that interference region is less, increases measurement noise
Greatly, precision is reduced.
The content of the invention
The present invention provides a kind of wave aberration measurement apparatus and method, to solve above-mentioned technology present in prior art
Problem.
To solve above-mentioned technical problem, the present invention provides a kind of wave aberration measurement apparatus, including：Light source, illumination
System, object plane module and image planes probe unit, wherein, the object plane module includes object plane grating and object plane level time
Option board, the image planes probe unit includes image planes grating, image planes level time option board and detector, the object plane
Grating and image planes grating adopt binary phase-shifted grating.
Preferably, the object plane grating is P, and second direction with the cycle of second direction in a first direction
Vertical with first direction, each cycle of the object plane grating includes two transmission regions and two light tight areas
Domain, light beam is through the optical path difference that 1/2 optical wavelength is added after the transmission region.
Preferably, the object plane grating is located at the out of focus of the object plane, and the first party of the object plane grating
To angled with X-axisWherein,180 degree is less than or equal to more than or equal to 0 degree.
Preferably, the object plane grating is rectangle, circular or triangle.
Preferably, the image planes grating is P × M with the cycle of second direction in a first direction, wherein,
M is object lens multiplying power, and the first direction of image planes grating is with the angle of X-axis
Preferably, be provided with multiple loopholes on the object plane level time option board, the loophole for it is square,
Circular or triangle.
Preferably, the aperture of the loophole is more than 1.22 λ/NAo, wherein λ be lambda1-wavelength, NAo
For object-side numerical aperture.
Preferably, the aperture of the loophole is more than 2dfo×NAoLess than ho×λ/do-dfo×NAo；Its
In, dfoFor the defocusing amount of object plane level time option board, hoFor the defocusing amount of object plane grating, doFor the week of object plane grating
Phase.
Preferably, being provided with a printing opacity aperture on the image planes level time option board, the printing opacity aperture is circle
Shape or polygon.
Preferably, the aperture of the printing opacity aperture is more than 2dfi×NAiLess than hi×λ/di-2dfi×NAi；Its
In, dfiFor the defocusing amount of image planes level time option board, hiFor the defocusing amount of image planes grating, diFor the week of image planes grating
Phase, NAiFor image-side numerical aperture, λ is incident wavelength.
Preferably, the image planes probe unit also includes：For supporting the image planes grating and image planes level time choosing
The grating support unit of plate is selected, and the detection circuit of IMAQ and transmission is carried out for controlling the detector
Plate.
Preferably, the object plane grating and image level time option board are arranged on same mask.
The present invention also provides a kind of wave aberration measuring method, using the wave aberration measurement apparatus, including：Arrange
Lighting window, makes the illuminating bundle that light source sends illuminate to object plane；Object plane grating is moved in the visual field of object plane
The heart, makes illuminating bundle lighting concave grating；Mobile image planes grating, makes field of view center of the image planes grating in image space,
And make object plane grating and image planes grating alignment；Detector is opened, interference image is gathered；Detector will be collected
Interference image is transmitted to main control computer；Main control computer solves the wave aberration of object lens according to the image of collection.
Compared with prior art, the present invention has advantages below：
1st, the image planes grating of image planes probe unit adopts binary phase-shifted grating, without zero order light in its diffraction light,
Only positive and negative 1 grade of light, improves the light intensity for measurement, and object plane level time option board does not consider further that 0 order diffraction light
Effect is filtered, technology difficulty is reduced；
2nd, the object plane grating and object plane level time option board that detection is used can be produced on a mask, reduced
System obtains complexity；
3rd, using object plane grating and object plane level time option board, the transmitance of object plane grating is much larger than just for object plane module
Beginning pin hole, it is possible to decrease image planes acquisition time, improves signal strength signal intensity, improves measuring speed and precision；
4th, the manufacture difficulty of object plane grating, less than the manufacture difficulty of initial pin hole in prior art, is carried in the present invention
It is the high processing and manufacturing property of device, cost-effective；
5th, object plane grating and image planes grating match in the present invention, make the light beam that participation is interfered converge at one first
Point, is dissipated afterwards, interference region increase, can be used for big NA measurements, while improving certainty of measurement.
Description of the drawings
Fig. 1 is the structural representation of prior art medium wave aberration measurement device；
Fig. 2 is the structural representation of embodiment of the invention medium wave aberration measurement device；
Fig. 3 is the structural representation of object plane grating in the embodiment of the invention；
Fig. 4 is the structural representation of object plane level time option board in the embodiment of the invention；
Fig. 5 is the structural representation of image planes grating in the embodiment of the invention；
Fig. 6 is the structural representation of image planes level time option board in the embodiment of the invention；
Fig. 7 is the schematic flow sheet of embodiment of the invention medium wave aberration measurement method.
In Fig. 1：The initial pin holes of 1-, 2- object lens to be measured, 3- binary rasters, 4- levels time select mask, 5-CCD.
In Fig. 2～Fig. 6：10- light sources, 20- illuminators, 30- object plane modules, 301- object plane gratings, 302- things
Face level time option board, 3021- loopholes, 40- image planes probe units, 401- image planes gratings, 402- image planes level time
Option board, 4021- printing opacity apertures, 403- grating support units, 404- detectors, 405- detection circuit plates, 50-
Object lens.
Specific embodiment
It is understandable to enable the above objects, features and advantages of the present invention to become apparent from, below in conjunction with the accompanying drawings to this
The specific embodiment of invention is described in detail.It should be noted that, accompanying drawing of the present invention is in the form of simplification
And non-accurately ratio is used, only to purpose that is convenient, lucidly aiding in illustrating the embodiment of the present invention.
As shown in Fig. 2 the wave aberration measurement apparatus that the present invention is provided include：Light source 10, illuminator 20,
Object plane module 30 and image planes probe unit 40, the object plane module 30 includes object plane grating 301 and object plane level time
Option board 302, the image planes probe unit 40 includes image planes grating 401, image planes level time option board 402 and visits
Device 404 is surveyed, the object plane grating 301 and image planes grating 401 adopt binary phase-shifted grating.Specifically, institute
Light source 10 is stated for producing illuminating bundle, the illuminator 20 projects the illuminating bundle positioned at object plane
On the object plane grating 301 of module 30 and there is diffraction, after object plane level time option board 302, produce positive and negative 1
Order diffraction light, the positive and negative 1 order diffraction light includes：In x-axis on positive and negative 1 order diffraction light and y-axis positive and negative 1
Order diffraction light, the positive and negative 1 order diffraction light projection to object lens 50, the wave aberration that object lens 50 are carried afterwards is incided
Image planes grating 401, the positive and negative 1 order diffraction light of the wave aberration with object lens 50 of 401 pairs of incidences of image planes grating enters
Row re-diffraction, specially：Minus 1 grade of re-diffraction light that positive 1 order diffraction light in x-axis is produced, in x-axis
Minus 1 order diffraction light produce positive 1 grade of re-diffraction light, the positive 1 order diffraction light in y-axis produce minus 1 grade it is secondary
Diffraction light, the minus 1 order diffraction light in y-axis produces positive 1 grade of re-diffraction light；Positive and negative 1 grade of re-diffraction light
Converge at the printing opacity aperture 4021 of image planes level time option board 402, through weight after image planes level time option board 402
Folded to interfere, interference image is recorded by detector 404, the interference image obtained according to record can inverse obtain object lens
50 wave aberration.
Specifically, as shown in figure 3, the object plane grating 301 is in a first direction with the cycle of second direction
P, and second direction is vertical with first direction, each cycle of the object plane grating 301 includes two transmission regions
With two light tight regions, black region as shown in Figure 3 is light tight region, and grey and white portion are
Transmission region, light beam is through the optical path difference that 1/2 optical wavelength is added after the transmission region.And the object plane grating
301 first direction is angled with x-axisWherein,180 degree is less than or equal to more than or equal to 0 degree.
With continued reference to Fig. 3, the object plane grating 301 is located at the out of focus of the object plane, to incident thereon
Illuminating bundle carries out diffraction, and diffraction light is converged at the image planes of object lens 50.Certainly, the object plane grating 301
Using various shapes, including circle, circle, triangle, rectangle, rhombus etc..
As shown in figure 4, being provided with multiple loopholes 3021, the printing opacity on the object plane level time option board 302
Hole 3021 is square, circular or triangle.Say as a example by with 4 circular loopholes 3021 in the present embodiment
Bright, the aperture of the loophole 3021 is more than 1.22 λ/NAo, wherein λ be lambda1-wavelength, NAoFor thing
Side numerical aperture.Further, it is contemplated that the out of focus situation of object plane level time option board 302, the loophole 3021
Aperture be more than 2dfo×NAoLess than ho×λ/do-dfo×NAo；Wherein, dfoFor object plane level time option board 302
Defocusing amount, hoFor the defocusing amount of object plane grating 301, doFor the cycle of object plane grating 301.
Further, the object plane grating 301 and the object plane level time option board 302 can be arranged on same covering
On mould, system complexity is reduced.Certainly, the object plane grating 301 and the object plane level time option board 302
The position at center should overlap with the positive and negative 1 order diffraction spot center position of the diffraction of object plane grating 301.
Fig. 1 is refer to, and combines Fig. 5, the image planes probe unit 40 also includes：For supporting the image planes
The grating support unit 403 of grating 401 and image planes level time option board 402, and for controlling the detector 404
Carry out the detection circuit plate 405 of IMAQ and transmission.
Further, as shown in figure 5, the image planes grating 401 is equal with the cycle of second direction in a first direction
For P × M, wherein, M is the multiplying power of object lens 50, the first direction of the image planes grating 401 and the folder of x-axis
Angle is
As shown in fig. 6, a printing opacity aperture 4021 is provided with the image planes level time option board 402, it is described
Light aperture 4021 is circular or polygon.The aperture of the printing opacity aperture 4021 is more than 2dfi×NAiLess than hi
×λ/di-2dfi×NAi；Wherein, dfiFor the defocusing amount of image planes level time option board 402, hiFor image planes grating 401
Defocusing amount, diFor the cycle of image planes grating 401, NAiFor image-side numerical aperture, λ is incident wavelength.
If it should be noted that object plane grating 301 is h relative to the out of focus of the optimal object plane of object lens 50o, then as
Concave grating 401 is h relative to the out of focus of the optimal focal plane of object lens 50i=ho/M2, M is the multiplying power of object lens 50.
Fig. 1 to Fig. 6 is continued referring to, concrete numerical value is substituted into below, describe the wave aberration measurement of the present invention in detail
Device.
In the present embodiment, the cycle of the object plane grating 301 in the object plane module 30 may be selected to be P=12um,
Object plane grating 301 adopts square grating, first direction angle to select as 0 degree.Illumination wavelengths are selected
248nm, object plane numerical aperture NAoFor 0.175, object lens multiplying power M is 0.25.Object plane level time option board 302
Loophole 3021 be circle, the distance between loophole 3021 is 240um, the aperture of loophole 3021
For 20um.Object plane level time option board 402 is located at the position of focal plane of object lens 50, and object plane grating 401 is apart from thing
Focal plane (the i.e. object plane level time option board 402) 6.35mm of mirror 50；Image planes grating in image planes probe unit 40
401 cycle is 3um (12um × 0.25), the size of the printing opacity aperture 4021 of image planes level time option board 402
For 1um.The out of focus of image planes grating 401 is 0.3985mm.
Wherein, the selection gist shear distance in the cycle of object plane grating 301, shear distance takes object plane numerical aperture
1/8.5, i.e., 0.0206.Shear distance is 1 order diffraction optical diffraction angle of object plane grating 301, so as to obtain thing
The cycle of concave grating 301 is 248/0.0206=12um, and the cycle of image planes grating 401 is object plane grating 301
0.25 times, i.e. 12 × 0.25=3um.
As shown in fig. 7, the present invention also provides a kind of wave aberration measuring method, specifically include：First, arrange and shine
Bright window, makes the illuminating bundle that light source 10 sends illuminate to the object plane of object lens 50；Then, by object plane grating 301
The field of view center of object plane is moved to, illuminating bundle lighting concave grating 301 is made；Then, mobile image planes grating 401,
Field of view center of the image planes grating 401 in image space is made, and object plane grating 301 is aligned with image planes grating 401；
Detector 404 is opened, interference image is gathered；Detector 404 transmits the interference image for collecting to master control meter
Calculation machine；Main control computer solves the wave aberration of object lens 50 according to the image of collection.
The light that light source 10 sends incides the object plane grating 301 in object plane module 30 after illuminator 20
On, there is diffraction.Diffraction light only passes through positive and negative 1 order diffraction light after object plane level time option board 302.
After object lens 50, incide on the image planes grating 401 in image planes probe unit 40, re-diffraction occurs.
Light beam after diffraction is incided on detector 404 after image planes level time option board 402, is obtained according to record
Interference image can inverse obtain the wave aberration of object lens 50.
Obviously, those skilled in the art can carry out various changes and modification without deviating from the present invention to invention
Spirit and scope.So, if the present invention these modification and modification belong to the claims in the present invention and its
Within the scope of equivalent technologies, then the present invention is also intended to including including these changes and modification.
Claims (13)
1. a kind of wave aberration measurement apparatus, it is characterised in that include：Light source, illuminator, object plane module and
Image planes probe unit, wherein, the object plane module includes object plane grating and object plane level time option board, the image planes
Probe unit includes image planes grating, image planes level time option board and detector, and the object plane grating and image planes grating are equal
Using binary phase-shifted grating.
2. wave aberration measurement apparatus as claimed in claim 1, it is characterised in that the object plane grating is first
The cycle of direction and second direction is P, and second direction is vertical with first direction, the object plane grating it is every
The individual cycle includes two transmission regions and two light tight regions, and light beam is through after the transmission region additional 1/2
The optical path difference of optical wavelength.
3. wave aberration measurement apparatus as claimed in claim 2, it is characterised in that the object plane grating is located at institute
State at the out of focus of object plane, and the first direction of the object plane grating is at an angle of with X-axisWherein,It is more than
180 degree is less than or equal to equal to 0 degree.
4. wave aberration measurement apparatus as claimed in claim 2, it is characterised in that the object plane grating be rectangle,
Circular or triangle.
5. wave aberration measurement apparatus as claimed in claim 3, it is characterised in that the image planes grating is first
The cycle of direction and second direction is P × M, wherein, M be object lens multiplying power, the first of the image planes grating
Direction is with the angle of X-axis
6. wave aberration measurement apparatus as claimed in claim 1, it is characterised in that the object plane level time option board
On be provided with multiple loopholes, the loophole is square, circular or triangle.
7. wave aberration measurement apparatus as claimed in claim 6, it is characterised in that the aperture of the loophole is big
In 1.22 λ/NAo, wherein λ be lambda1-wavelength, NAoFor object-side numerical aperture.
8. wave aberration measurement apparatus as claimed in claim 7, it is characterised in that the aperture of the loophole is big
In 2dfo×NAoLess than ho×λ/do-dfo×NAo；Wherein, dfoFor the out of focus of the object plane level time option board
Amount, hoFor the defocusing amount of the object plane grating, doFor the cycle of the object plane grating.
9. wave aberration measurement apparatus as claimed in claim 1, it is characterised in that the image planes level time option board
On be provided with a printing opacity aperture, the printing opacity aperture is circular or polygon.
10. wave aberration measurement apparatus as claimed in claim 9, it is characterised in that the printing opacity aperture
Aperture is more than 2dfi×NAiLess than hi×λ/di-2dfi×NAi；Wherein, dfiFor the image planes level time option board
Defocusing amount, hiFor the defocusing amount of the image planes grating, diFor the cycle of the image planes grating, NAiFor described
Image-side numerical aperture, λ is incident wavelength.
11. wave aberration measurement apparatus as claimed in claim 1, it is characterised in that the image planes detection is single
Unit also includes：For supporting the grating support unit of the image planes grating and image planes level time option board, and for controlling
Making the detector carries out the detection circuit plate of IMAQ and transmission.
12. wave aberration measurement apparatus as claimed in claim 1, it is characterised in that the object plane grating and
Image level time option board is arranged on same mask.
A kind of 13. wave aberration measuring methods, are surveyed using the wave aberration as described in claim 1～12 any one
Amount device, it is characterised in that include：
Lighting window is set, the illuminating bundle that light source sends is illuminated to object plane；
Object plane grating is moved to into the field of view center of object plane, makes illuminating bundle illuminate the object plane grating；
Mobile image planes grating, makes field of view center of the image planes grating in image space, and make the object plane grating with
The image planes grating alignment；
Detector is opened, interference image is gathered；
Detector transmits the interference image for collecting to main control computer；
The main control computer solves the wave aberration of projection objective according to the image of collection.
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| CN108226036A (en) * | 2017-12-06 | 2018-06-29 | 西南技术物理研究所 | Integrated laser material fuel factor measuring device based on double grating shear interference |
| CN108955905A (en) * | 2018-03-23 | 2018-12-07 | 中国科学院上海光学精密机械研究所 | Wavefront sensor and detection method based on modified Hartmann's mask |
| CN109959342A (en) * | 2017-12-26 | 2019-07-02 | 长光华大基因测序设备（长春）有限公司 | The detection method and device of numerical aperture of objective |
| CN110441992A (en) * | 2019-07-23 | 2019-11-12 | 中国科学院上海光学精密机械研究所 | Projection objective wave aberration detection device and detection method |
| CN111103769A (en) * | 2020-01-02 | 2020-05-05 | 中国科学院上海光学精密机械研究所 | Projection objective wave aberration detection device insensitive to light intensity fluctuation and detection method |
| CN111352303A (en) * | 2018-12-21 | 2020-06-30 | 上海微电子装备（集团）股份有限公司 | Projection objective wave aberration detection device and method and photoetching machine |
| CN111856885A (en) * | 2019-04-30 | 2020-10-30 | 上海微电子装备（集团）股份有限公司 | Wave aberration measuring device and photoetching machine |
| CN113049224A (en) * | 2019-12-27 | 2021-06-29 | 上海微电子装备（集团）股份有限公司 | Measuring device and measuring method thereof |
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Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108226036A (en) * | 2017-12-06 | 2018-06-29 | 西南技术物理研究所 | Integrated laser material fuel factor measuring device based on double grating shear interference |
| CN109959342A (en) * | 2017-12-26 | 2019-07-02 | 长光华大基因测序设备（长春）有限公司 | The detection method and device of numerical aperture of objective |
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| CN108955905A (en) * | 2018-03-23 | 2018-12-07 | 中国科学院上海光学精密机械研究所 | Wavefront sensor and detection method based on modified Hartmann's mask |
| CN108955905B (en) * | 2018-03-23 | 2020-10-16 | 中国科学院上海光学精密机械研究所 | Wavefront sensor based on improved Hartmann mask and detection method |
| CN111352303A (en) * | 2018-12-21 | 2020-06-30 | 上海微电子装备（集团）股份有限公司 | Projection objective wave aberration detection device and method and photoetching machine |
| CN111856885A (en) * | 2019-04-30 | 2020-10-30 | 上海微电子装备（集团）股份有限公司 | Wave aberration measuring device and photoetching machine |
| CN111856885B (en) * | 2019-04-30 | 2021-08-03 | 上海微电子装备（集团）股份有限公司 | Wave aberration measuring device and photoetching machine |
| CN110441992A (en) * | 2019-07-23 | 2019-11-12 | 中国科学院上海光学精密机械研究所 | Projection objective wave aberration detection device and detection method |
| CN113049224A (en) * | 2019-12-27 | 2021-06-29 | 上海微电子装备（集团）股份有限公司 | Measuring device and measuring method thereof |
| CN113049224B (en) * | 2019-12-27 | 2023-02-17 | 上海微电子装备（集团）股份有限公司 | Measuring device and measuring method thereof |
| CN111103769A (en) * | 2020-01-02 | 2020-05-05 | 中国科学院上海光学精密机械研究所 | Projection objective wave aberration detection device insensitive to light intensity fluctuation and detection method |
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