CN106609360A - 一种加热掺杂气体的喷淋结构 - Google Patents

一种加热掺杂气体的喷淋结构 Download PDF

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Publication number
CN106609360A
CN106609360A CN201510706405.1A CN201510706405A CN106609360A CN 106609360 A CN106609360 A CN 106609360A CN 201510706405 A CN201510706405 A CN 201510706405A CN 106609360 A CN106609360 A CN 106609360A
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gas
heating
ring
impurity gas
shower plate
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王燚
刘忆军
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Piotech Inc
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Piotech Shenyang Co Ltd
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Priority to CN201510706405.1A priority Critical patent/CN106609360A/zh
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563Gas nozzles
    • C23C16/45565Shower nozzles

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  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

一种加热掺杂气体的喷淋结构,主要解决现有的喷淋结构无法保证掺杂反应在腔体内部的基底沉积硬质膜的问题,本发明提供一种加热掺杂气体的喷淋结构,包括喷淋板本体,该喷淋结构还包括气体A入口,配气环,掺杂气体B入口及加热环。本发明的喷淋结构采用配气环及加热环结构,保证了掺杂气体的独立路径,对掺杂气体进行加热,实现了掺杂气体同时、独立、加热在基底沉积硬质膜。

Description

一种加热掺杂气体的喷淋结构
技术领域
本发明涉及一种加热掺杂气体的喷淋结构,属于半导体薄膜沉积应用及制造技术领域。
背景技术
半导体镀膜设备在进行硬质膜沉积反应时,需要少量掺杂一种气体或多种气体同时进入腔室进行薄膜沉积,要求几种气体路径相互独立,在进入腔体前不能相遇,进入腔室后都能均匀扩散到基底表面。且掺杂的气体在进入反应腔体前,需要保持加热到一定的温度。而现有的喷淋结构大都是针对单独的气体设计的路径,并且大多结构都只是在气体进口处进行分离,在进入腔室之前的气体已进行接触,使沉积反应提前进行。且现有喷淋结构没有针对掺杂气体进行加热的功能。这样一来,无法保证掺杂反应在腔体内部的基底沉积硬质膜。当需要进行掺杂气体沉积时,之前的喷淋结构已不能满足要求。针对要求掺杂气体同时、独立、加热的苛刻要求,需要一种可加热掺杂气体的喷淋结构。
发明内容
本发明以解决上述问题为目的,提供了一种加热掺杂气体的喷淋结构,该喷淋结构通过采用配气环及加热环结构,来实现掺杂气体独立、均匀的到达基底表面参加沉积反应。
为实现上述目的,本发明采用下述技术方案:
一种加热掺杂气体的喷淋结构,包括喷淋板本体,该喷淋结构还包括气体A入口,配气环,掺杂气体B入口及加热环;所述喷淋板本体上设有气体A入口向喷淋板本体中通入气体A,所述配气环上设有掺杂气体B入口向配气环中通入掺杂气体B,所述加热环安装于所述配气环外围后与配气环一同置于喷淋板主体上的凹槽内。
进一步地,所述喷淋板本体与配气环的内部为气体环形通道。
进一步地,所述加热环对所述配气环中通入的掺杂气体B进行加热。
本发明的有益效果及特点在于:
本发明的喷淋结构采用配气环及加热环结构,保证了掺杂气体的独立路径,对掺杂气体进行加热,实现了掺杂气体同时、独立、加热在基底沉积硬质膜。
附图说明
图1为本发明的加热掺杂气体的喷淋结构的立体图;
图2为本发明的结构示意图。
具体实施方式
下面结合实施例进一步对本发明进行详细说明,但发明保护内容不局限于所述实施例:
参照图1-2,一种加热掺杂气体的喷淋结构,包括喷淋板本体1,该喷淋结构还包括气体A入口2,配气环3,掺杂气体B入口4及加热环5;所述喷淋板本体1上设有气体A入口2向喷淋板本体1中通入气体A,所述配气环3上设有掺杂气体B入口4向配气环3中通入掺杂气体B,所述加热环5安装于所述配气环3外围后与配气环3一同置于喷淋板主体1上的凹槽内。
所述喷淋板本体1与配气环3的内部为气体环形通道。
所述加热环5对所述配气环3中通入的掺杂气体B进行加热。
气体A和掺杂气体B分别从气体A入口2与掺杂气体B入口4通入,通过各自独立的通道,到达各自分区,气体A和掺杂气体B在分区扩散后从各自分区中的孔中进入反应腔室。彼此独立的结构使不同气体不会提前相遇或反应,在配气环3外围安装加热环5,通过加热环5对掺杂气体B进行加热,保证了掺杂反应在腔体内部的基底沉积硬质膜。
以上所述仅为本发明的较佳实施例而已,并不用以限制本发明,凡在本发明的精神和原则之内所作的任何修改、等同替换和改进等,均应包含在本发明的保护范围之内。

Claims (3)

1.一种加热掺杂气体的喷淋结构,包括喷淋板本体,其特征在于,该喷淋结构还包括气体A入口,配气环,掺杂气体B入口及加热环;所述喷淋板本体上设有气体A入口向喷淋板本体中通入气体A,所述配气环上设有掺杂气体B入口向配气环中通入掺杂气体B,所述加热环安装于所述配气环外围后与配气一同置于喷淋板主体上的凹槽内。
2.如权利要求1所述的一种加热掺杂气体的喷淋结构,其特征在于,所述喷淋板本体与配气环的内部为气体环形通道。
3.如权利要求1所述的一种加热掺杂气体的喷淋结构,其特征在于,所述加热环对所述配气环中通入的掺杂气体B进行加热。
CN201510706405.1A 2015-10-27 2015-10-27 一种加热掺杂气体的喷淋结构 Pending CN106609360A (zh)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113136568A (zh) * 2021-04-07 2021-07-20 拓荆科技股份有限公司 一种节能型主动控温喷淋头
CN113249687A (zh) * 2021-04-14 2021-08-13 拓荆科技股份有限公司 一种真空内电加热喷淋头结构

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113136568A (zh) * 2021-04-07 2021-07-20 拓荆科技股份有限公司 一种节能型主动控温喷淋头
CN113249687A (zh) * 2021-04-14 2021-08-13 拓荆科技股份有限公司 一种真空内电加热喷淋头结构

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