CN106507726B - The annular polishing disk modification method and its asphalt formulations of laser gyro pole low scatter reflector - Google Patents
The annular polishing disk modification method and its asphalt formulations of laser gyro pole low scatter reflectorInfo
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- CN106507726B CN106507726B CN201010049541.5A CN201010049541A CN106507726B CN 106507726 B CN106507726 B CN 106507726B CN 201010049541 A CN201010049541 A CN 201010049541A CN 106507726 B CN106507726 B CN 106507726B
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- pitch
- polishing disk
- asphalt
- laser gyro
- annular
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Abstract
The present invention relates to a kind of modification method of annular polishing disk and its asphalt formulations, are especially suitable for the annular polishing disk modification method and its asphalt formulations of high-precision laser gyroscope pole low scatter reflector.The present invention takes mechanical lathe tool turning asphalt surface, flute profile to determine, corrected parameter is controlled etc., forms a set of method for revising polishing disk；Adopt the trade mark of the global optics production in the U.S. for the Colophonium of 82# and 73#, required Colophonium proportioning is 82#: 73#=1/3～3/5.It is following that the Rq for processing part in the technical process of annular polishing applied by the polishing disk combination annular polishing disk modification method that the asphalt formulations of the application present invention make；N=0.2；Δ N=0.1；Beauty defects is 0 grade；Meet extremely low Diffusing substrate plated film to be required to meet.Positive effect is served to the lifting of high-precision laser gyroscope precision, reliability, stability.
Description
Technical field
The present invention relates to a kind of modification method and its asphalt formulations of annular polishing disk, especially with respect to
The modification method and its asphalt formulations of high-precision laser gyroscope pole low scatter reflector annular polishing disk.
Background technology
Laser gyro pole low scatter reflector as laser gyro core component, to laser gyro system
The precision of system plays vital effect.The height of the reflectivity of mirror surface decides laser
The precision of gyro system, scattering reduction, reflectivity also increases therewith.The size of scattering is that influence swashs
One of most important factor of optical circulator precision, scattering is smaller, and the precision of gyro system is higher.Influence
The factor of scattering with coating process phase with the pattern of glass surface substrate except outside the Pass, also having directly
Relation.Small roughness value, space percent ripple etc. all have positive promotion to make reduction scattering as far as possible
With.
Annular polishing is to use ring-type polishing disk, and the Pingdu amendment of disk, workpiece are polished with correction-plate
Free floating polishing is done on ring-type polishing disk.Annular polishing technology be it is a kind of it is new, stably,
High-precision processing method, the part processed with this method has high surface figure accuracy, low rough surface
Degree, the advantage of low percent ripple, are the high-precision plane surface processing methods commonly used in the world at present.
The process of annular polishing mainly directly acts on optical element by polishing pitch layer and polishing agent
Surface and carry out, pitch polishing tol layer on the one hand play a part of carry polishing agent particle, it is heavier
The one side wanted has been many chemical actions.Therefore, polishing pitch formula and annular polishing disk
Correction effect is to be related to one of key factor of polishing effect, the surface face shape and table of optical element
Surface roughness depend greatly on annular polishing disk correction effect and asphalt formulations it is suitable
Whether.
The pitch for polishing panel surface is a kind of plastic body, there is the larger coefficient of expansion and rheological characteristic, face
The holding of shape and the technological parameter such as pitch proportioning, the thickness of polished die, hardness are in close relations.
The history of foreign countries' exploitation annular polishing existing decades, have accumulated substantial amounts of experience, the technology
In all technological parameters particularly pitch formula and polishing disk modification method be core technology it
One, externally hold in close confidence.It is domestic that the technology is typically applied to normal optical processing aspect,
Also it is not involved with the application in terms of the low scatter reflector processing of laser gyro pole, and its processing technology
Parameter, asphalt formulations, polishing disk modification method are externally holded in close confidence, and this is annular polishing technique
Core technology.
It is reported that the scattering of the laser gyro speculum of the company such as the U.S. Honeywell and Litton
In 1PPM or so, the surface roughness of its speculum is less thanBut, do not retrieve on annular
The modification method of polishing laser gyro pole low scatter reflector pitch disk and asphalt formulations it is any
Document.
The content of the invention
The purpose of the present invention is：A kind of annular throwing for processing laser gyro pole low scatter reflector is provided
The modification method and asphalt formulations of CD.
The technical scheme is that：A kind of annular polishing disk of laser gyro pole low scatter reflector
Modification method and asphalt formulations, its step is as follows：
Step 1：Determine that pitch is matched
The pitch taken is the pitch that the trade mark that the global optics in the U.S. is produced is 82# and 73#, institute
The pitch proportioning needed is 82#: 73#=1/3~3/5, the pitch of weight needed for being configured by the proportioning,
And pitch is made into mixing after fritter or powder；
Step 2：Scorification pitch
When asphalt cauldron adds pitch, and heat, while stirring pitch, make pitch hot in pot
Amount is heated evenly and all melted；
Step 3：Poured asphalt mould
The pitch of thawing is slowly poured on the polishing disk of rotation, makes the automatic levelling of pitch of liquid,
After the pitch in asphalt cauldron all pours into polishing disk, blowing to asphalt surface with fire makes asphalt surface
Bubble overflow, until untill asphalt surface is without obvious intensive or big bubble, then natural cooling
Pitch；
Step 4：Mechanical turning
Mechanical lathe tool is uniformly cut into asphalt surface, 0.5~1mm of cutting depth；Feed velocity 6~
7mm/min；It is 10r/min to start spindle speed during turning, every 40~50 seconds by the speed of mainshaft
Increase 1.1 times of present speed, make lathe tool by the outer inward-facing motion of polishing disk；In working angles
In, cutter head is cooled down in time with cold water.Until the whole turning of polishing disk terminate；
Step 5：Cutting：30mm × 30mm 5~7mm of depth, 6~8mm of groove width, bottom land angle
90 degree of square groove, and polishing disk is cleaned up；
Step 6：Annular polishing disk amendment
It is 3~6r/min to control the speed of mainshaft, and it is 3~5r/min, revision board to control revision board rotating speed
Position should be -0.5~3, and the water flow speed of peristaltic pump is 5~7r/min, to polishing card shape
It is modified, when the face shape of witness plate reaches N=-4, illustrates that the amendment of annular pitch has been completed,
The processing of laser gyro pole low scatter reflector substrate can be carried out；
Step 7：Checking
Part disc is placed on the annular polishing disk being corrected, passes through the technique for adjusting annular polishing
Parameter is to control the face shape and defect of part disc, and when laser gyro pole, low scatter reflector substrate reaches N
=0.2；Δ N=0.1；Beauty defects is after 0 grade；To mirror substrate, cleaned, after plated film
Laser gyro pole low scatter reflector is prepared into, the index such as scatters, be lost to it and measuring, to test
Demonstrate,prove annular polishing disk correction effect and asphalt formulations it is whether suitable.
The annular polishing disk modification method of laser gyro pole low scatter reflector, its pitch proportioning
For 82#: 73#=1/3.
The annular polishing disk modification method of laser gyro pole low scatter reflector, its pitch, which is matched, is
82#: 73#=3/5.
Pitch used by a kind of annular polishing disk modification method of laser gyro pole low scatter reflector is matched somebody with somebody
Side, its pitch proportioning is 82#: 73#=1/3~3/5.
The pitch proportioning is 82#: 73#=1/3.
The pitch proportioning is 82#: 73#=3/5.
The beneficial effects of the invention are as follows：Thrown the present invention relates to the annular of laser gyro pole low scatter reflector
Modification method and the pitch proportioning of CD, different hardness polishing disk has been made by different pitches formula, and
Effective amendment has been carried out, with reference to stationary annular glossing, the extremely low scattering of laser gyro has been processed anti-
Penetrate mirror substrate, and scattering and loss etc. after the face shape, roughness, plated film by measuring mirror substrate
Index verifies the formula of pitch and the correction effect of annular polishing disk.The present invention by experimental verification,
The formula that the ratio range of pitch trade mark 82#: 73# is 1/3 to 3/5 is obtained, and combines a set of polishing disk
Modification method, obtain it is extremely low scattering and extremely low-loss mirror substrate.This method is effectively reduced
The roughness of part, improves the face form quality amount and defect grades of part, and the Rq of processing part isBelow；N=0.2；Δ N=0.1；Beauty defects is 0 grade, meets extremely low Diffusing substrate plated film
Requirement.The present invention, which fundamentally solves traditional burnishing surface shape and roughness, can not continue the embarrassed of raising
Border, while this technique is applied widely, is not only applicable to the polishing of extremely low scattering optical surface, simultaneously
Also there is extremely strong applicability for the optical elements such as high precision plane mirror, prism and Wafer surfaces.
And the technique is summarized in actual production and extract, asphalt formulations and annular polishing disk are highlighted
The manufacturability of amendment, with extremely strong operational and higher processing efficiency.
Brief description of the drawings
Fig. 1 is that laser gyro pole low scatter reflector substrate roughness compares AFM (AFM) figure.
Fig. 2 is scattering, loss ratio relatively figure after the inventive method use.
Embodiment
The present invention is described in further details below.
The present invention will for the laser gyro pole low scatter reflector annular polishing of high-precision laser gyroscope
Ask, determine the modification method of polishing disk asphalt formulations and polishing disk.Implement the inventive method to environment
It is required that being：Cleanliness factor：1000 grades；Temperature：25±1℃；Humidity：50%~70%.
The present invention has made different hardness polishing disk by different pitches formula, with reference to a set of annular polishing
Disk modification method, processes laser gyro pole low scatter reflector substrate, by measure substrate face shape,
The index such as scatter and be lost after roughness, plated film and determine the formula of its pitch and repairing for annular polishing disk
Plus effect.
The annular polishing process of annular polishing disk modification method is mainly straight by polishing pitch layer and polishing agent
Connect and act on optical element surface and carry out, on the one hand pitch polishing tol layer has played carrying polishing agent grain
The effect of son, prior one side has been many chemical actions.Therefore, annular polishing disk is repaiied
Plus effect is to be related to one of key factor of polishing effect, and the surface face shape of optical element and surface are thick
Rugosity depends greatly on the correction effect of annular polishing disk.
The pitch for polishing panel surface is a kind of plastic body, there is the larger coefficient of expansion and rheological characteristic, face shape
The technological parameter such as holding, the thickness of polished die, hardness it is in close relations.And effective pitch disk amendment
Method is to obtain the basis of pole low scatter reflector substrate, is to reach high surface figure accuracy, extremely low roughness
With the premise of extremely low scattering.
The present invention takes mechanical lathe tool turning asphalt surface, flute profile to determine, corrected parameter is controlled etc.,
The method for forming a set of amendment polishing disk；The correction time of pitch lap is substantially reduced, is more held
The processing request of pole low scatter reflector substrate is easily reached, efficiency is improved, reduces and personnel is passed through
The dependence with technical ability is tested, process operability is strong, with good promotion prospect.
Mechanical turning：Mechanical lathe tool is uniformly cut into asphalt surface, 0.5~1mm of cutting depth；Enter
6~7mm/min of knife speed；It was 10r/min to start spindle speed during turning, every 40~50 seconds
The speed of mainshaft is increased into 1.1 times of present speed, makes lathe tool by the outer inward-facing motion of polishing disk.
In working angles, cutter head is cooled down in time with cold water, until the whole turning of polishing disk terminate.
Cutting：30mm × 30mm 5~7mm of depth, 6~8mm of groove width, 90 degree of bottom land angle
Square groove, and polishing disk is cleaned up.
Annular polishing disk amendment：Control the speed of mainshaft be 3~6r/min, control revision board rotating speed be 3~
5r/min, amendment Board position should be -0.5~3, and the water flow speed of peristaltic pump is 5~7r/min,
Polishing card shape is modified, when the face shape of witness plate reaches N=-4, illustrates repairing for annular pitch
Just complete, the processing of laser gyro pole low scatter reflector substrate can be carried out.
Asphalt formulations：It was verified that to get over pressure release surface roughness smaller for polishing disk, and the deformation of surface face
Change faster；Pitch more crust roughness is bigger, and part surface deformationization is slower；Pitch it is soft or hard
Being equipped with properly can just process pole low scatter reflector substrate.Alice occurs in pitch workpiece really up to the mark,
Pitch is excessively soft to occur turned-down edge, and so local error is difficult to eliminate in process, particularly
Turned-down edge phenomenon.When the change of polishing condition, such as variation of ambient temperature, the speed of mainshaft and workpiece are big
It is small etc., it is necessary to adjust the proportioning of different polishing pitchs, it is suitable to obtain softening point, viscosity and hardness
Throwing CDs.
By the pitch produced to different manufacturers, polishing disk is made according to different formulas, has been passed through
Machined mirrors substrate, to verify the feasibility of its formula.By the experiment of ten asphalt formulations several times
To when summarizing refinement, suitable laser gyro pole low scatter reflector processing annular is finally determined and throws
CD asphalt formulations are：
Asphalt production producer：The global optics in the U.S.
The pitch trade mark：73#
The pitch trade mark：82#
Pitch is matched：82#: 73#=1/3~3/5
The step of the annular polishing disk modification method of high-precision laser gyroscope pole of the present invention low scatter reflector
It is rapid as follows：
Step 1：Determine that pitch is matched
The pitch taken is the pitch that the trade mark that the global optics in the U.S. is produced is 82# and 73#,
Required pitch proportioning is 82#: 73#=1/3~3/5, the drip of weight needed for being configured by the proportioning
Green grass or young crops, and pitch is pounded into mixing after fritter or powder；
Step 2：Scorification pitch
When asphalt cauldron adds pitch, and heat, while stirring pitch, make pitch hot in pot
Amount is heated evenly and all melted；
Step 3：Poured asphalt mould,
The pitch of thawing is slowly poured on the polishing disk of rotation, makes the pitch levelling of liquid, works as drip
Pitch in blue or green melting pan is all poured into after polishing disk, and blowing to asphalt surface with fire makes the gas of asphalt surface
Bubble overflows, untill asphalt surface is without substantially intensive or big bubble, then natural cooling pitch；
Step 4：Mechanical turning
Mechanical lathe tool is uniformly cut into asphalt surface, 0.5~1mm of cutting depth；Feed velocity 6~
7mm/min；It is 10r/min to start spindle speed during turning, every 40~50 seconds by the speed of mainshaft
Increase 1.1 times of present speed, make lathe tool by the outer inward-facing motion of polishing disk；In working angles
In, cutter head is cooled down in time with cold water, until the whole turning of polishing disk terminate；
Step 5：Cutting：30mm × 30mm 5~7mm of depth, 6~8mm of groove width, bottom land angle
90 degree of square groove, and polishing disk is cleaned up；
Step 6：Annular polishing disk amendment
It is 3~6r/min to control the speed of mainshaft, and it is 3~5r/min, revision board to control revision board rotating speed
Position should be -0.5~3, and the water flow speed of peristaltic pump is 5~7r/min, to polishing card shape
It is modified, when the face shape of witness plate reaches N=-4, illustrates that the amendment of annular pitch has been completed,
The processing of laser gyro pole low scatter reflector substrate can be carried out；
Step 7：Checking
Part disc is placed on the annular polishing disk being corrected, by the work for adjusting annular polishing
Skill parameter is to control the face shape and defect of part disc, and when laser gyro pole, low scatter reflector substrate reaches
To N=0.2；Δ N=0.1；Beauty defects is after 0 grade；To mirror substrate, cleaned,
Laser gyro pole low scatter reflector is prepared into after plated film, the index such as scatters, be lost to it and surveying
Amount, with verify annular polishing disk correction effect and asphalt formulations it is whether suitable.
Processing is qualified to laser gyro pole low scatter reflector substrate, through processes such as over cleaning, plated films,
Laser gyro pole low scatter reflector is prepared into, the index such as scatters, be lost to it and measuring, with
The effect of formula is verified, the index reached is as shown in Table 1：
The laser gyro pole low scatter reflector measurement index that the present invention of table one is processed
| Title | It is required that index | Touch the mark |
| Roughness | 4 angstroms | 1.7 angstroms~2.4 angstroms |
| Scattering | 90ppm | 13ppm~30ppm |
| Loss | 280ppm | 150ppm~210ppm |
Embodiment 1
The annular polishing disk modification method first of high-precision laser gyroscope pole of the present invention low scatter reflector
The step of embodiment, is as follows：
Step 1：Determine that pitch is matched
The pitch taken is the pitch that the trade mark that the global optics in the U.S. is produced is 82# and 73#, institute
The pitch proportioning needed is 82#: 73#=1/3, the pitch of weight needed for being configured by the proportioning, and will
Pitch pounded into and mixed after fritter or powder；
Step 2：Scorification pitch
When asphalt cauldron adds pitch, and heat, while stirring pitch, make pitch hot in pot
Amount is heated evenly and all melted；
Step 3：Poured asphalt mould
The pitch of thawing is slowly poured on the polishing disk of rotation, makes the automatic levelling of pitch of liquid,
After the pitch in asphalt cauldron all pours into polishing disk, blowing to asphalt surface with fire makes asphalt surface
Bubble overflow, until untill asphalt surface is without obvious intensive or big bubble, then natural cooling
Pitch；
Step 4：Mechanical turning
Mechanical lathe tool is uniformly cut into asphalt surface, cutting depth 0.6mm；Feed speed 6.5mm/min；
It is 10r/min to start spindle speed during turning, and the speed of mainshaft is increased into present speed every 45 seconds
1.1 times, make lathe tool by the outer inward-facing motion of polishing disk, it is right in time with cold water in working angles
Cutter head is cooled down.Until the whole turning of polishing disk terminate；
Step 5：Cutting：30mm × 30mm depth 6mm, groove width 8mm, 90 degree of bottom land angle
Square groove, and polishing disk is cleaned up；
Step 6：Annular polishing disk amendment
It is 4r/min to control the speed of mainshaft, and it is 3r/min to control revision board rotating speed, and amendment Board position exists
3, the water flow speed of peristaltic pump is 5r/min, and polishing card shape is modified, works as witness plate
Face shape reach N=-4, illustrate that the amendment of annular pitch has been completed, laser gyro pole can be carried out
The processing of low scatter reflector substrate；
Step 7：Checking
Part disc is placed on the annular polishing disk being corrected, by the work for adjusting annular polishing
Skill parameter is to control the face shape and defect of part disc, and when laser gyro pole, low scatter reflector substrate reaches
To N=0.2；Δ N=0.1；Beauty defects is after 0 grade；Laser gyro pole after to machining
Low scatter reflector substrate, is cleaned, is prepared into laser gyro pole low scatter reflector after plated film,
The index such as scatter, be lost to it to measure, to verify the effect of formula.
The measured index of the laser gyro pole low scatter reflector such as table processed with the pitch of the formula
Shown in two：
The laser gyro pole low scatter reflector measurement index of the processing of the formula of table two 1
| Title | It is required that index | Touch the mark |
| Roughness | 4 angstroms | 1.8 angstroms |
| Scattering | 90ppm | 15ppm |
| Loss | 280ppm | 150ppm |
Embodiment 2
The annular polishing disk modification method second of high-precision laser gyroscope pole of the present invention low scatter reflector
The step of embodiment, is as follows：
Step 1：Determine that pitch is matched
The pitch taken is the pitch that the trade mark that the global optics in the U.S. is produced is 82# and 73#, institute
The pitch proportioning needed is 82#: 73#=3/5, the pitch of weight needed for being configured by the proportioning, and will
Pitch pounded into and mixed after fritter or powder；
Step 2：Scorification pitch
When asphalt cauldron adds pitch, and heat, while stirring pitch, make pitch hot in pot
Amount is heated evenly and all melted；
Step 3：Poured asphalt mould,
The pitch of thawing is slowly poured on the polishing disk of rotation, makes the automatic levelling of pitch of liquid,
After the pitch in asphalt cauldron all pours into polishing disk, blowing to asphalt surface with fire makes asphalt surface
Bubble overflow, until untill asphalt surface is without obvious intensive or big bubble, then natural cooling
Pitch；
Step 4：Mechanical turning
Mechanical lathe tool is uniformly cut into asphalt surface, cutting depth 0.5mm；Feed velocity 6mm/min；
It is 10r/min to start spindle speed during turning, and the speed of mainshaft is increased into present speed every 40 seconds
1.1 times, make lathe tool by the outer inward-facing motion of polishing disk, it is right in time with cold water in working angles
Cutter head is cooled down, until the whole turning of polishing disk terminate；
Step 5：Cutting：30mm × 30mm depth 6mm, groove width 7mm, 90 degree of bottom land angle
Square groove, and polishing disk is cleaned up；
Step 6：Annular polishing disk amendment
It is 5r/min to control the speed of mainshaft, and it is 4.5r/min to control revision board rotating speed, corrects Board position
0, the water flow speed of peristaltic pump is 6r/min, and polishing card shape is modified, when testing
The face shape of card plate reaches N=-4, illustrates that the amendment of annular pitch has been completed, can carry out laser top
The processing of spiral shell pole low scatter reflector substrate；
Step 7：Checking
Part disc is placed on the annular polishing disk being corrected, by the work for adjusting annular polishing
Skill parameter is to control the face shape and defect of part disc, and when laser gyro pole, low scatter reflector substrate reaches
To N=0.2；Δ N=0.1；Beauty defects is after 0 grade；To mirror substrate, cleaned,
Laser gyro pole low scatter reflector is prepared into after plated film, the index such as scatters, be lost to it and surveying
Amount, with verify annular polishing disk correction effect and asphalt formulations it is whether suitable.
The measured index of laser gyro pole low scatter reflector processed with the pitch of the formula is such as
Shown in table three：The laser gyro pole low scatter reflector measurement index of the processing of the formula of table three 2
| Title | It is required that index | Touch the mark |
| Roughness | 4 angstroms | 1.7 angstroms |
| Scattering | 90ppm | 19ppm |
| Loss | 280ppm | 172ppm |
Meanwhile, Fig. 1 and Fig. 2 are referred to, wherein Fig. 1 gives conventional polishing technique roughness and this
It can see in the invention AFM collection of illustrative plates comparison diagrams of annular polishing technology roughness, figure, using this
Inventive technique, obtained mirror surface roughness declines to a great extent, and effectively increases mirror performance.
Fig. 2 then sets forth after plated film of the present invention scattering ratio compared with box traction substation and loss ratio compared with box traction substation, by
As can be seen that relative to convention polishing methods, annular polishing of the invention effectively reduces plating in figure
Scattering and loss after film, so as to better meet the performance requirement of laser gyro.
The annular polishing disk modification method of laser gyro pole of the present invention low scatter reflector, according to extremely low
The processing request of scattered reflection mirror determines modification method of the pitch with when annular polishing disk, processes
Laser gyro pole low scatter reflector substrate.And by measuring the face shape, roughness, plated film of substrate
The index such as scatter and be lost afterwards the formula correcting and feed back pitch.The present invention by experimental verification,
Obtain formula and the fixed annular of combination that the ratio range of pitch trade mark 82#: 73# is 1/3 to 3/5
Polishing disk modification method, obtains extremely low scattering and extremely low loss, can be made and meet high-precision laser
The speculum of gyro requirement.
Claims (6)
1. a kind of annular polishing disk modification method of laser gyro pole low scatter reflector, its feature exists
In step is as follows：
Step 1：Determine that pitch is matched
The pitch taken is the pitch that the trade mark that the global optics in the U.S. is produced is 82# and 73#, institute
The pitch proportioning needed is 82#: 73#=1/3~3/5, the pitch of weight needed for being configured by the proportioning,
And pitch is made into mixing after fritter or powder；
Step 2：Scorification pitch
When asphalt cauldron adds pitch, and heat, while stirring pitch, make pitch hot in pot
Amount is heated evenly and all melted；
Step 3：Poured asphalt mould,
The pitch of thawing is slowly poured on the polishing disk of rotation, makes the pitch levelling of liquid, works as drip
Pitch in blue or green melting pan is all poured into after polishing disk, and blowing to asphalt surface with fire makes the gas of asphalt surface
Bubble overflows, untill asphalt surface is without substantially intensive or big bubble, then natural cooling pitch；
Step 4：Mechanical turning
Asphalt surface, 0.5~1mm of cutting depth are uniformly cut with mechanical lathe tool；Feed velocity 6~
7mm/min；It is 10r/min to start spindle speed during turning, every 40~50 seconds by the speed of mainshaft
Increase 1.1 times of present speed, make lathe tool by the outer inward-facing motion of polishing disk；In working angles
In, cutter head is cooled down in time with cold water, until the whole turning of polishing disk terminate；
Step 5：Cutting：30mm × 30mm 5~7mm of depth, 6~8mm of groove width, bottom land angle
90 degree of square groove, and polishing disk is cleaned up；
Step 6：Annular polishing disk amendment
It is 3~6r/min to control the speed of mainshaft, and it is 3~5r/min, revision board to control revision board rotating speed
Position should be -0.5~3, and the water flow speed of peristaltic pump is 5~7r/min, to polishing card shape
It is modified, when the face shape of witness plate reaches N=-4, illustrates that the amendment of annular pitch has been completed,
The processing of laser gyro pole low scatter reflector substrate can be carried out；
Step 7：Checking
Part disc is placed on the annular polishing disk being corrected, by the work for adjusting annular polishing
Skill parameter is to control the face shape and defect of part disc, and when laser gyro pole, low scatter reflector substrate reaches
To N=0.2；Δ N=0.1；Beauty defects is after 0 grade；To mirror substrate, cleaned,
Laser gyro pole low scatter reflector is prepared into after plated film, it is scattered, loss objective is measured,
With verify annular polishing disk correction effect and asphalt formulations it is whether suitable.
2. the annular polishing disk of laser gyro pole according to claim 1 low scatter reflector is repaiied
Correction method, it is characterised in that：The pitch proportioning is 82#: 73#=1/3.
3. the annular polishing disk of laser gyro pole according to claim 1 low scatter reflector is repaiied
Correction method, it is characterised in that：The pitch proportioning is 82#: 73#=3/5.
4. the pitch used by a kind of annular polishing disk modification method of laser gyro pole low scatter reflector
Formula, it is characterised in that：The pitch proportioning is 82#: 73#=1/3~3/5.
5. the annular polishing disk of laser gyro pole according to claim 4 low scatter reflector is repaiied
Asphalt formulations used by correction method, it is characterised in that：The pitch proportioning is 82#: 73#=1/3.
6. the annular polishing disk of laser gyro pole according to claim 4 low scatter reflector is repaiied
Asphalt formulations used by correction method, it is characterised in that：The pitch proportioning is 82#: 73#=3/5.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010049541.5A CN106507726B (en) | 2010-08-27 | 2010-08-27 | The annular polishing disk modification method and its asphalt formulations of laser gyro pole low scatter reflector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201010049541.5A CN106507726B (en) | 2010-08-27 | 2010-08-27 | The annular polishing disk modification method and its asphalt formulations of laser gyro pole low scatter reflector |
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|---|---|
| CN106507726B true CN106507726B (en) | 2014-04-23 |
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| CN201010049541.5A Expired - Fee Related CN106507726B (en) | 2010-08-27 | 2010-08-27 | The annular polishing disk modification method and its asphalt formulations of laser gyro pole low scatter reflector |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110003668A (en) * | 2019-03-06 | 2019-07-12 | 中国科学院上海光学精密机械研究所 | Pitch lap of multi-cellular structure and preparation method thereof |
| CN112518566A (en) * | 2020-12-02 | 2021-03-19 | 广东先导先进材料股份有限公司 | Method for processing chalcogenide glass |
| CN113478336A (en) * | 2021-06-29 | 2021-10-08 | 中国科学院长春光学精密机械与物理研究所 | Device and method for manufacturing asphalt polishing pad |
-
2010
- 2010-08-27 CN CN201010049541.5A patent/CN106507726B/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110003668A (en) * | 2019-03-06 | 2019-07-12 | 中国科学院上海光学精密机械研究所 | Pitch lap of multi-cellular structure and preparation method thereof |
| CN112518566A (en) * | 2020-12-02 | 2021-03-19 | 广东先导先进材料股份有限公司 | Method for processing chalcogenide glass |
| CN112518566B (en) * | 2020-12-02 | 2022-07-08 | 安徽中飞科技有限公司 | Method for processing chalcogenide glass |
| CN113478336A (en) * | 2021-06-29 | 2021-10-08 | 中国科学院长春光学精密机械与物理研究所 | Device and method for manufacturing asphalt polishing pad |
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