CN106500846A - A kind of asymmetric correction method of infrared imaging system - Google Patents

A kind of asymmetric correction method of infrared imaging system Download PDF

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Publication number
CN106500846A
CN106500846A CN201610839361.4A CN201610839361A CN106500846A CN 106500846 A CN106500846 A CN 106500846A CN 201610839361 A CN201610839361 A CN 201610839361A CN 106500846 A CN106500846 A CN 106500846A
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China
Prior art keywords
infrared
baffle
picture data
internal baffle
imaging system
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CN201610839361.4A
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CN106500846B (en
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周云
蒋伟
闫相宏
杨皓然
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University of Electronic Science and Technology of China
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University of Electronic Science and Technology of China
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/80Calibration
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J2005/0077Imaging

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Radiation Pyrometers (AREA)

Abstract

The embodiment of the invention discloses a kind of asymmetric correction method of infrared imaging system, which gathers interior panelling data and external baffle data, the rectification building-out factor is calculated by interior outer baffle data, then Internal baffle data are compensated during Nonuniformity Correction parameter is calculated so as to be close to external baffle data.So, the temperature change of Internal baffle is compensate for during the Nonuniformity Correction of infrared imaging system, so that Nonuniformity Correction process is more accurate, the quality of infrared image is improve, and reduces illiteracy yarn sense.

Description

A kind of asymmetric correction method of infrared imaging system
Technical field
The present invention relates to infrared imagery technique field, more particularly, to a kind of Nonuniformity Correction side of infrared imaging system Method.
Background technology
With the development of science and technology, the acquisition of information is in occupation of increasingly consequence, infrared detection technique conduct A kind of important means of acquisition information, the irreplaceable advantage of the Detection Techniques with its all band, either in military affairs still Civil area, suffers from being widely applied, and receives great attention both domestic and external.
At present, third generation Infrared Detectors develops to the direction of non-brake method, array, miniaturization.Due to uncooled ir Focal plane imaging technology does not need additional refrigeration plant, reduces the add-on module of system, makes system more integrated, less, more Gently, the application of infrared imaging system has greatly been expanded, has become the emphasis of Recent study.
Limited by material and technique, infrared focal plane array cannot accomplish that each probe unit is complete in the fabrication process Repeat, and each probe unit is had differences to the response of temperature, result in the heterogeneity of infrared imaging system imaging, non-equal Even property has had a strong impact on the quality of imaging, limits the application of Infrared Detectors.At present, mainly from technique and image procossing two Reduce the spatial heterogeneity of probe unit on direction, wherein, by improve processing technology can be very good to improve non-homogeneous Property, but high due to improving process costs, it is not easy to adopt.And pass through the method for addition real time correction in image processing process not But cost is relatively low, and flexibly and easily, portable strong, can be very good to improve heterogeneity.
Improve heterogeneity using the method for image procossing to realize based on algorithm, the selection principle of algorithm is to be easy to Realize, speed is fast, efficiency high, save hardware resource.Current algorithm mainly has based on scene and based on calibration and by both In conjunction with three classes.Wherein bearing calibration and two point correction method have been obtained widely should with effect is significant because which facilitates implementation With.
In heteropical method of the method correction infrared imaging system of existing employing image procossing, it is usually used The baffle plate being arranged in infrared imaging system, is obtained infrared image by being imaged to the baffle plate, and based on the red of baffle plate Outer image carries out image procossing to be corrected heterogeneity.But, as baffle plate setting is inside infrared imaging system(Under It is referred to as Internal baffle in text), therefore over time, the movement working time is elongated, and movement internal temperature is higher than external environment condition temperature Degree so that baffle temperature becomes big with ambient temperature gap, and the difference of response is consequently increased.So so that based on interior gear The effect of the Nonuniformity Correction that plate is carried out will be by than large effect so that infrared image occurs covering yarn sense.
Content of the invention
An object of the present invention is to provide a kind of asymmetric correction method of infrared imaging system, and which can be infrared The temperature change of Internal baffle is compensated during the Nonuniformity Correction of imaging system, so that Nonuniformity Correction process is more accurate Really, the quality of infrared image is improved.
In some embodiments of the present invention, there is provided a kind of asymmetric correction method of infrared imaging system.The method Including:Outside infrared imaging system, outer baffle is set;With infrared imaging system to outer baffle and the interior gear of infrared imaging system Plate is imaged, and obtains outer baffle infrared picture data and the first Internal baffle infrared picture data;According to outer baffle infrared image Data and the first Internal baffle infrared picture data calculate the rectification building-out factor between Internal baffle and outer baffle;Using infrared imaging System is imaged to Internal baffle, obtains the second Internal baffle infrared picture data;Red with the second Internal baffle of rectification building-out factor pair Outer view data is compensated;The second Internal baffle infrared picture data after with compensation calculates the heterogeneity of infrared imaging system Correction parameter;Imageable target is imaged with infrared imaging system, obtains imageable target infrared image;Use Nonuniformity Correction Parameter carries out Nonuniformity Correction to imageable target infrared image.
In some embodiments of the present invention, the Internal baffle of outer baffle and infrared imaging system is carried out with infrared imaging system Imaging obtains outer baffle infrared picture data and the first Internal baffle infrared picture data to be included:Use under multiple design temperatures respectively Infrared imaging system is imaged to the Internal baffle of outer baffle and infrared imaging system, outer under multiple design temperatures so as to obtain Baffle plate infrared picture data and the first Internal baffle infrared picture data.
In some embodiments of the present invention, according to outer baffle infrared picture data and the first Internal baffle infrared picture data meter The rectification building-out factor that calculates between Internal baffle and outer baffle includes:Respectively according to the outer baffle infrared image under multiple design temperatures Data and the first Internal baffle infrared picture data calculate the rectification building-out factor between Internal baffle and outer baffle, multiple so as to obtain The rectification building-out factor under design temperature.
In some embodiments of the present invention, calculating also includes after obtaining the rectification building-out factor:Correction compensating factor is deposited Storage is in infrared imaging system.
In some embodiments of the present invention, according to outer baffle infrared picture data and the first Internal baffle infrared picture data meter The rectification building-out factor that calculates between Internal baffle and outer baffle includes:Infrared according to outer baffle infrared picture data and the first Internal baffle View data, the functional relation being fitted between outer baffle infrared picture data and the first Internal baffle infrared picture data, function are closed It is for the rectification building-out factor.
In some embodiments of the present invention, according to outer baffle infrared picture data and the first Internal baffle infrared picture data meter The rectification building-out factor that calculates between Internal baffle and outer baffle includes:Infrared according to outer baffle infrared picture data and the first Internal baffle View data, calculates the difference between outer baffle infrared picture data and the first Internal baffle infrared picture data, and difference is correction Compensating factor.
In some embodiments of the present invention, outer baffle is by making with Internal baffle identical material.
In the method for the embodiment of the present invention, by gathering interior panelling data and external baffle data, by interior outer baffle Data calculate the rectification building-out factor, then Internal baffle data are mended during Nonuniformity Correction parameter is calculated Repay so as to be close to external baffle data.So, Internal baffle compensate for during the Nonuniformity Correction of infrared imaging system Temperature change, so that Nonuniformity Correction process is more accurate, improves the quality of infrared image, reduces illiteracy yarn sense.
Description of the drawings
Fig. 1 is the schematic flow sheet of the asymmetric correction method of the infrared imaging system of one embodiment of the invention.
Specific embodiment
Describe the asymmetric correction method of the infrared imaging system of embodiments of the invention below in conjunction with accompanying drawing in detail Concrete steps.
Schematic flow sheets of the Fig. 1 for the asymmetric correction method of the infrared imaging system of some embodiments of the invention.
When needing to carry out Nonuniformity Correction to infrared imaging system, it is contemplated that the interior gear used by Nonuniformity Correction Plate can be affected by the temperature of the movement of infrared imaging system and be produced temperature change so that the temperature of Internal baffle and outside temperature Degree is not consistent, therefore in some embodiments of the present invention, can detect the difference of Internal baffle and outside first, then rear During continuous Nonuniformity Correction, the difference is compensated.
Therefore, in step 10, an outer baffle can be set outside infrared imaging system.The outer baffle is located at infrared The outside of imaging system, its temperature will not be affected by infrared imaging system inner member, but consistent with external temperature.Should Outer baffle for example can be arranged near the camera lens of infrared imaging system, block the camera lens of infrared imaging system.The outer baffle Material can be identical with Internal baffle.
In step 12, the Internal baffle in outer baffle and infrared imaging system can be carried out into the infrared imaging system Picture, so that obtain the infrared picture data of outer baffle infrared picture data and Internal baffle(Referred to herein as the first Internal baffle is red Outer view data).Concrete steps outer baffle and Internal baffle being imaged using infrared imaging system can be in the art Conventional step, will not be described in detail herein.
Then, at step 14, can be according to the outer baffle infrared picture data and the first Internal baffle infrared image for obtaining Data, calculate the rectification building-out factor between Internal baffle and outer baffle.
For example, in some embodiments, can according to outer baffle infrared picture data and the first Internal baffle infrared picture data, Fit the functional relation between the outer baffle infrared picture data and the first Internal baffle infrared picture data, the functional relation For the aforesaid rectification building-out factor.It can be seen that, although being described using rectification building-out " factor " herein, which does not limit to In certain or some numerical value, but certain functional relation can also be referred to.
In other embodiments, it is also possible to according to outer baffle infrared picture data and the first Internal baffle infrared picture data, The difference between the outer baffle infrared picture data and the first Internal baffle infrared picture data is calculated, using the difference as aforementioned The rectification building-out factor.
In other examples, the rectification building-out factor can also be calculated using other suitable modes, as long as which can Difference between compensation Internal baffle and outer baffle.
In some embodiments of the present invention, in step 12, infrared imaging system can be used under multiple design temperatures respectively System is imaged to the Internal baffle of outer baffle and infrared imaging system, so as to obtain the infrared figure of the outer baffle under multiple design temperatures As data and the first Internal baffle infrared picture data.Correspondingly, at step 14, can respectively according under the plurality of design temperature Outer baffle infrared picture data and the first Internal baffle infrared picture data calculate the rectification building-out between Internal baffle and outer baffle The factor, so that obtain the rectification building-out factor under the plurality of design temperature respectively.
The step of aforementioned calculating rectification building-out factor, can be carried out in advance, after the rectification building-out factor is calculated, can To store it in infrared imaging system.Follow-up in the course of work of infrared imaging system, when needing to carry out heterogeneity Timing, can be read the corresponding rectification building-out factor from infrared imaging system, and be participated in using the rectification building-out factor non- Homogeneity correction process.In other examples, can also carry out in real time the step of the aforementioned calculating rectification building-out factor.
After the aforesaid rectification building-out factor is obtained, you can formal entrance Nonuniformity Correction process.Now, example Such as, in step 16, infrared imaging can be carried out with the infrared imaging system to Internal baffle, obtain the infrared image number of Internal baffle According to(Referred to herein as the second Internal baffle infrared picture data).Then, in step 18, can with aforesaid rectification building-out because Son is compensated to the second Internal baffle infrared picture data.
For example, in some embodiments, when the rectification building-out factor is gear in aforesaid outer baffle infrared picture data and first During functional relation between plate infrared picture data, the infrared figure of the second Internal baffle after compensation can be calculated according to the functional relation As data.For example, it is possible to the second Internal baffle infrared picture data to be replaced the first Internal baffle infrared image in the functional relation Data are substituted in the functional relation, calculate the number of results corresponding with the outer baffle infrared picture data in the functional relation According to the result data that this calculates is the second Internal baffle infrared picture data after compensating.
In other embodiments, when the rectification building-out factor is outer baffle infrared picture data and the first Internal baffle infrared image During difference between data, for example, can deduct in the second Internal baffle infrared picture data or plus the difference, so as to obtain The second Internal baffle infrared picture data after must compensating.
Then, in step 20, can with compensation after the second Internal baffle infrared picture data calculate the infrared imaging system The Nonuniformity Correction parameter of system.In embodiments of the invention, Nonuniformity Correction parameter is calculated according to infrared picture data Concrete grammar and step can be conventional method and steps in the art, will not be described in detail herein.
After having calculated Nonuniformity Correction parameter, infrared imaging system can carry out formal conventional infrared imaging, And Nonuniformity Correction is carried out to the infrared image for obtaining using the Nonuniformity Correction parameter for calculating.
For example, in step 22, it is possible to use the infrared imaging system is imaged to imageable target, obtain imageable target Infrared image, is then carried out to the imageable target infrared image with the Nonuniformity Correction parameter calculated in abovementioned steps non-equal Even property correction.
In the method for the embodiment of the present invention, by gathering interior panelling data and external baffle data, by interior outer baffle Data calculate the rectification building-out factor, then Internal baffle data are mended during Nonuniformity Correction parameter is calculated Repay so as to be close to external baffle data.So, Internal baffle compensate for during the Nonuniformity Correction of infrared imaging system Temperature change, so that Nonuniformity Correction process is more accurate, improves the quality of infrared image, reduces illiteracy yarn sense.
Describe the present invention above by specific embodiment, but the present invention is not limited to these and specifically implements Example.It will be understood by those skilled in the art that various modifications, equivalent, change etc. can also be made to the present invention, these conversion Without departing from the spirit of the present invention, all should be within protection scope of the present invention.Additionally, " the reality described in above many places Apply example " represent different embodiments, naturally it is also possible to which is completely or partially combined in one embodiment.

Claims (7)

1. a kind of asymmetric correction method of infrared imaging system, it is characterised in that include:
Outside the infrared imaging system, outer baffle is set;
The Internal baffle of the outer baffle and infrared imaging system is imaged with the infrared imaging system, obtains outer baffle red Outer view data and the first Internal baffle infrared picture data;
Calculated between Internal baffle and outer baffle according to the outer baffle infrared picture data and the first Internal baffle infrared picture data The rectification building-out factor;
The Internal baffle is imaged using the infrared imaging system, obtains the second Internal baffle infrared picture data;
Compensated with the second Internal baffle infrared picture data described in the rectification building-out factor pair;
The second Internal baffle infrared picture data after with compensation calculates the Nonuniformity Correction parameter of the infrared imaging system;
Imageable target is imaged with the infrared imaging system, obtains imageable target infrared image;
Nonuniformity Correction is carried out to the imageable target infrared image with the Nonuniformity Correction parameter.
2. the method for claim 1, it is characterised in that with the infrared imaging system to the outer baffle and infrared into Include as the Internal baffle of system carries out imaging acquisition outer baffle infrared picture data and the first Internal baffle infrared picture data:Respectively The Internal baffle of the outer baffle and infrared imaging system is imaged with the infrared imaging system under multiple design temperatures, So as to obtain the outer baffle infrared picture data under multiple design temperatures and the first Internal baffle infrared picture data.
3. method as claimed in claim 2, it is characterised in that according to the outer baffle infrared picture data and the first Internal baffle The rectification building-out factor that infrared picture data is calculated between Internal baffle and outer baffle includes:Respectively according under multiple design temperatures Outer baffle infrared picture data and the first Internal baffle infrared picture data calculate rectification building-out between Internal baffle and outer baffle because Son, so that obtain the rectification building-out factor under the plurality of design temperature.
4. the method as described in any one in claims 1 to 3, it is characterised in that calculate and obtain the rectification building-out factor Also include afterwards:The rectification building-out factor is stored in the infrared imaging system.
5. the method as described in any one in claims 1 to 3, it is characterised in that according to the outer baffle infrared image number According to and the first Internal baffle infrared picture data calculate the rectification building-out factor between Internal baffle and outer baffle and include:According to described outer Baffle plate infrared picture data and the first Internal baffle infrared picture data, are fitted the outer baffle infrared picture data and described Functional relation between first Internal baffle infrared picture data, the functional relation are the rectification building-out factor.
6. the method as described in any one in claims 1 to 3, it is characterised in that according to the outer baffle infrared image number According to and the first Internal baffle infrared picture data calculate the rectification building-out factor between Internal baffle and outer baffle and include:According to described outer Baffle plate infrared picture data and the first Internal baffle infrared picture data, calculate the outer baffle infrared picture data with described Difference between first Internal baffle infrared picture data, the difference are the rectification building-out factor.
7. the method as described in any one in claim 1 to 6, it is characterised in that:The outer baffle by with the Internal baffle Identical material is made.
CN201610839361.4A 2016-09-22 2016-09-22 A kind of asymmetric correction method of infrared imaging system Expired - Fee Related CN106500846B (en)

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CN107341780A (en) * 2017-07-12 2017-11-10 成都中昊英孚科技有限公司 A kind of Infrared images pre-processing bearing calibration
CN107942510A (en) * 2017-12-21 2018-04-20 中国航空工业集团公司洛阳电光设备研究所 It is a kind of based on the infrared imaging system nonuniformity correction analysis method defocused
CN108007576A (en) * 2017-11-24 2018-05-08 烟台艾睿光电科技有限公司 The camera lens scaling method and device of a kind of thermal infrared imager
CN108322732A (en) * 2017-12-01 2018-07-24 中国航空工业集团公司洛阳电光设备研究所 The thermal infrared imager nonuniformity correction baffle test method of variable temperatures radiative material
CN108846805A (en) * 2018-05-02 2018-11-20 重庆邮电大学 A kind of thermal-induced imagery two o'clock non-uniform correction method based on scene adaptive
CN109063533A (en) * 2018-04-30 2018-12-21 李泽中 A kind of dynamic face Fast Recognition Algorithm
CN113436088A (en) * 2021-06-09 2021-09-24 浙江兆晟科技股份有限公司 Real-time suppression method and system for thermal window effect of infrared image
CN116623263A (en) * 2023-07-24 2023-08-22 深圳市顺益丰实业有限公司 Adjusting device for film coating uniformity of semiconductor device

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CN107942510A (en) * 2017-12-21 2018-04-20 中国航空工业集团公司洛阳电光设备研究所 It is a kind of based on the infrared imaging system nonuniformity correction analysis method defocused
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CN113436088A (en) * 2021-06-09 2021-09-24 浙江兆晟科技股份有限公司 Real-time suppression method and system for thermal window effect of infrared image
CN113436088B (en) * 2021-06-09 2022-07-26 浙江兆晟科技股份有限公司 Real-time suppression method and system for thermal window effect of infrared image
CN116623263A (en) * 2023-07-24 2023-08-22 深圳市顺益丰实业有限公司 Adjusting device for film coating uniformity of semiconductor device
CN116623263B (en) * 2023-07-24 2023-10-31 深圳市顺益丰实业有限公司 Adjusting device for film coating uniformity of semiconductor device

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