CN106489073A

CN106489073A - Detection means, detection method, processing meanss and processing method

Info

Publication number: CN106489073A
Application number: CN201580034955.1A
Authority: CN
Inventors: 陈廷槐; 田中大充; 西原伸彦
Original assignee: Sumitomo Chemical Co Ltd
Current assignee: Sumitomo Chemical Co Ltd
Priority date: 2014-06-30
Filing date: 2015-06-25
Publication date: 2017-03-08
Also published as: JPWO2016002624A1; WO2016002624A1; TW201602543A

Abstract

The detection means (DA1) of the present invention includes：Supporting mass (B1), there is the bearing-surface (B1a) that the first face (OP1a) to optical thin film (OP1) is supported, at least a portion in bearing-surface (B1a) has reflecting surface (RS1)；Light source portion (IL1), from the second face (OP1b) side of optical thin film (OP1) towards optical thin film (OP1) irradiation light positioned at reflecting surface (RS1)；Image pickup part (CM1), shoots the reflected light picture of the optical thin film (OP1) being located at reflecting surface (RS1) from the second face (OP1b) side of optical thin film (OP1)；Color filter (CF1), by absorbing or reflecting the light of given wavelength components, to adjust the contrast of the reflected light picture of multiple pattern of polarization row (OP12a, OP12b)；With pattern detection portion (IP1), detect pattern of polarization row (OP12a, OP12b) on reflecting surface (RS1) based on the reflected light picture of optical thin film (OP1).

Description

Detection means, detection method, processing meanss and processing method

Technical field

The present invention relates to detection means, detection method, processing meanss and processing method.

The application was claimed priority in the Patent 2014-134352 of Japanese publication based on June 30th, 2014, and by its Content is incorporated herein.

Background technology

As display stereo-picture mode it is known that referred to as FPR (Film Patterned Retarder：Diaphragm type pattern Buffering) mode mode.In the 3D liquid crystal display of FPR mode, in order to separate right eye image and left eye image, in liquid The surface configuration of crystal panel is referred to as the patterning phase-contrast film (with reference to patent documentation 1) of FPR thin film.

FPR thin film includes right eye pattern of polarization row and left eye pattern of polarization arranges.Right eye pattern of polarization row and left eye Arranged corresponding to right eye pixel column and the left eye pixel column of liquid crystal panel with pattern of polarization and alternately configure.Right eye polarizes Pattern row and left eye are orthogonal on the direction of slow axis mutually with pattern of polarization row.It is being configured with right eye pattern of polarization row and a left side The outside of the effective coverage of ophthalmically acceptable pattern of polarization row, the also pattern of polarization row of configuration calibration sometimes.

Citation

Patent documentation

Patent documentation 1：TOHKEMY 2012-32445 publication

Content of the invention

Invention problem to be solved

In FPR thin film, multiple pattern of polarization row are formed with fine width.Therefore, FPR thin film is cut to given Width or shape, or FPR thin film is adhered to during liquid crystal panel the position it is necessary to detection pattern of polarization row exactly, and Calibrate FPR thin film based on this position.

For example, in patent documentation 1, as the detection means of pattern of polarization row, record the lower face side from FPR thin film Irradiation light the device being shot by video camera from the upper surface side of FPR thin film.

Configure polaroid between FPR thin film and light source, join successively from FPR film side between FPR thin film and video camera Put polarizer (1/4 wavelength plate) and polaroid.Right eye arranges the length along thin film with pattern of polarization row and left eye pattern of polarization Edge direction extends.These pattern of polarization arrange along with uncoiling and the conveyance of FPR thin film and are continuously detected.

But, in the structure of patent documentation 1, because the lower face side in FPR thin film is provided with light source, therefore cannot be The lower face side configuration supporting mass of FPR thin film.Thus it is necessary to not be supported by the unstable position of body supporting in FPR thin film Carry out the detection of pattern of polarization row.Although being also contemplated for arranging through hole in supporting mass, the light only by through hole cannot fill Divide ground that FPR thin film is illuminated.

Additionally, the outmost surface in FPR thin film arranges the protective films such as protection thin film, separation thin film.Protective film There is birefringence it is not intended to produce phase contrast with knowing.If there is no protective film, then right eye pattern of polarization row and left eye use Pattern of polarization row are shown as bright pattern and dark pattern, but if there is protective film, then the contrast fall of bright pattern and dark pattern Low it is impossible to clearly distinguish both.Therefore, before carrying out optical detecting, need to peel off the time of protective film etc..

In addition although FPR thin film is adhered to the surface of the polaroid of the display surface side of liquid crystal panel, but recently also discuss The one-piece type FPR thin film of polaroid that polaroid and FPR thin film have been carried out integration is adhered to the surface of liquid crystal panel Situation.In the structure shown here, due to the deviation of the optic axises in the face of polaroid, the contrast of above-mentioned bright pattern and dark pattern is entered One step reduces, and is more difficult to differentiate between both.

It is an object of the invention to provide a kind of can accurately detect pattern of polarization row detection means, detection method, Processing meanss and processing method.

Means for solving the problems

Detection means involved by the 1st aspect of the present invention, multiple pattern of polarization row of detection optical thin film, this optics Thin film is disposed with phase separation layer, patterning phase separation layer and polarizer layer from the first surface side towards the second surface side, should Patterning phase separation layer includes the mutually different above-mentioned multiple pattern of polarization row in direction of slow axis, wherein, above-mentioned detection device Including：Supporting mass, has the bearing-surface that above-mentioned first face to above-mentioned optical thin film is supported, in above-mentioned bearing-surface extremely A few part has the light having passed through above-mentioned optical thin film to above-mentioned first surface side from above-mentioned second surface side is reflected anti- Penetrate face；Light source portion, shines towards the above-mentioned optical thin film positioned at above-mentioned reflecting surface from above-mentioned second surface side of above-mentioned optical thin film Penetrate light；Image pickup part, shoots, from above-mentioned second surface side of above-mentioned optical thin film, the above-mentioned optical thin film being located at above-mentioned reflecting surface Reflected light picture；Color filter, is arranged on from above-mentioned light source portion towards the light path of the above-mentioned light of above-mentioned image pickup part, by absorbing or The light of the given wavelength components of reflection is adjusting the contrast of the reflected light picture of above-mentioned multiple pattern of polarization row；And pattern detection Portion, based on the above-mentioned reflected light picture of above-mentioned optical thin film, to detect the above-mentioned multiple pattern of polarization row on above-mentioned reflecting surface.

In detection means involved by the 1st aspect of the present invention, above-mentioned pattern detection portion can be based on above-mentioned multiple inclined The brightness of reflected light picture of the pattern that shakes row or the difference of color, to detect above-mentioned multiple pattern of polarization row.

Detection means involved by the 2nd aspect of the present invention, multiple pattern of polarization row of detection optical thin film, this optics Thin film is disposed with phase separation layer, polarizer layer and patterning phase separation layer from the first surface side towards the second surface side, should Patterning phase separation layer includes the mutually different above-mentioned multiple pattern of polarization row in direction of slow axis, wherein, above-mentioned detection device Including：Supporting mass, has the bearing-surface that above-mentioned first face to above-mentioned optical thin film is supported, in above-mentioned bearing-surface extremely A few part has the light having passed through above-mentioned optical thin film to above-mentioned first surface side from above-mentioned second surface side is reflected anti- Penetrate face；Light source portion, shines towards the above-mentioned optical thin film positioned at above-mentioned reflecting surface from above-mentioned second surface side of above-mentioned optical thin film Penetrate light；Polaroid, is arranged on from above-mentioned light source portion towards the light path of the above-mentioned light of above-mentioned optical thin film；Image pickup part, from above-mentioned Above-mentioned second surface side of optical thin film shoots the reflected light picture of the above-mentioned optical thin film being located on above-mentioned reflecting surface；Color filter, if Put on from above-mentioned light source portion towards the light path of the above-mentioned light of above-mentioned image pickup part, by absorbing or reflecting given wavelength components The contrast to adjust the reflected light picture of above-mentioned multiple pattern of polarization row for the light；And pattern detection portion, based on above-mentioned optically thin The above-mentioned reflected light picture of film, to detect the above-mentioned multiple pattern of polarization row on above-mentioned reflecting surface.

In detection means involved by the 2nd aspect of the present invention, above-mentioned pattern detection portion can be based on above-mentioned multiple inclined The brightness of reflected light picture of the pattern that shakes row or the difference of color, to detect above-mentioned multiple pattern of polarization row.

In detection means involved by the 2nd aspect of the present invention, can include：Adjustment portion, inclined to above-mentioned polaroid The relative angle of the slow axis that the axle that shakes is arranged with above-mentioned pattern of polarization is adjusted.

Detection method involved by the 1st aspect of the present invention, is the detection of multiple pattern of polarization row of detection optical thin film Method, this optical thin film is disposed with phase separation layer, patterning phase separation layer and partially from the first surface side towards the second surface side Shake element layer, the mutually different above-mentioned multiple pattern of polarization row in the direction that this patterning phase separation layer includes slow axis, wherein, on State detection method to include：Holding step, is supported to above-mentioned first face of above-mentioned optical thin film by supporting mass, this supporting mass There is the bearing-surface that above-mentioned first face to above-mentioned optical thin film is supported, and at least a portion tool in above-mentioned bearing-surface Have and passed through, to above-mentioned first surface side, the reflecting surface that the light of above-mentioned optical thin film is reflected to from above-mentioned second surface side；Irradiate step Suddenly, from above-mentioned second surface side of above-mentioned optical thin film towards the above-mentioned optical thin film irradiation light positioned at above-mentioned reflecting surface；Shooting Step, shoots the reflected light of the above-mentioned optical thin film being located at above-mentioned reflecting surface from above-mentioned second surface side of above-mentioned optical thin film Picture；Setting contrast step, is become by the wavelength being absorbed by the color filter in the light path being arranged on above-mentioned light or reflection is given The light dividing, to adjust the contrast of the reflected light picture of above-mentioned multiple pattern of polarization row；And pattern detection step, based on above-mentioned light Learn the above-mentioned reflected light picture of thin film, to detect the above-mentioned multiple pattern of polarization row on above-mentioned reflecting surface.

In detection method involved by the 1st aspect of the present invention, can be in above-mentioned pattern detection step, based on upper State the brightness of reflected light picture of multiple pattern of polarization row or the difference of color, to detect above-mentioned multiple pattern of polarization row.

Detection method involved by the 2nd aspect of the present invention, is the detection of multiple pattern of polarization row of detection optical thin film Method, this optical thin film is disposed with phase separation layer, polarizer layer and patterning from the first surface side towards the second surface side Phase separation layer, the mutually different above-mentioned multiple pattern of polarization row in the direction that this patterning phase separation layer includes slow axis, wherein, on State detection method to include：Holding step, is supported to above-mentioned first face of above-mentioned optical thin film by supporting mass, this supporting mass There is the bearing-surface that above-mentioned first face to above-mentioned optical thin film is supported, and at least a portion tool in above-mentioned bearing-surface Have and passed through, to above-mentioned first surface side, the reflecting surface that the light of above-mentioned optical thin film is reflected to from above-mentioned second surface side；Irradiate step Suddenly, shine towards the above-mentioned optical thin film positioned at above-mentioned reflecting surface from above-mentioned second surface side of above-mentioned optical thin film via polaroid Penetrate light；Image pickup step, shoots, from above-mentioned second surface side of above-mentioned optical thin film, the above-mentioned optical thin film being located at above-mentioned reflecting surface Reflected light picture；Setting contrast step, by being absorbed by the color filter in the light path being arranged on above-mentioned light or reflecting given Wavelength components light, to adjust the contrast of the reflected light picture of above-mentioned multiple pattern of polarization row；And pattern detection step, base In the above-mentioned reflected light picture of above-mentioned optical thin film, to detect the above-mentioned multiple pattern of polarization row on above-mentioned reflecting surface.

In detection method involved by the 2nd aspect of the present invention, can be in above-mentioned pattern detection step, based on upper State the brightness of reflected light picture of multiple pattern of polarization row or the difference of color, to detect above-mentioned multiple pattern of polarization row.

In detection method involved by the 2nd aspect of the present invention, can include：Set-up procedure, to above-mentioned polaroid The relative angle of the slow axis that polarization axle is arranged with above-mentioned pattern of polarization is adjusted.

Processing meanss involved by the 1st aspect of the present invention, using the detection means involved by the 1st aspect of the present invention To detect the multiple pattern of polarization row of optical thin film, and based on the position of above-mentioned pattern of polarization row above-mentioned optical thin film is carried out to Fixed process, this optical thin film from first surface side towards the second surface side be disposed with phase separation layer, patterning phase separation layer with And polarizer layer, the mutually different above-mentioned multiple pattern of polarization row in the direction that this patterning phase separation layer includes slow axis.

Processing meanss involved by the 2nd aspect of the present invention, using the detection means involved by the 2nd aspect of the present invention To detect the multiple pattern of polarization row of optical thin film, and based on the position of above-mentioned pattern of polarization row above-mentioned optical thin film is carried out to Fixed process, this optical thin film is disposed with phase separation layer, polarizer layer and figure from the first surface side towards the second surface side Case phase separation layer, the mutually different above-mentioned multiple pattern of polarization row in the direction that this patterning phase separation layer includes slow axis.

Processing method involved by the 1st aspect of the present invention, using the detection method involved by the 1st aspect of the present invention To detect the multiple pattern of polarization row of optical thin film, and based on the position of above-mentioned pattern of polarization row above-mentioned optical thin film is carried out to Fixed process, this optical thin film from first surface side towards the second surface side be disposed with phase separation layer, patterning phase separation layer with And polarizer layer, the mutually different above-mentioned multiple pattern of polarization row in the direction that this patterning phase separation layer includes slow axis.

Processing method involved by the 2nd aspect of the present invention, using the detection method involved by the 2nd aspect of the present invention To detect the multiple pattern of polarization row of optical thin film, and based on the position of above-mentioned pattern of polarization row above-mentioned optical thin film is carried out to Fixed process, this optical thin film is disposed with phase separation layer, polarizer layer and figure from the first surface side towards the second surface side Case phase separation layer, the mutually different above-mentioned multiple pattern of polarization row in the direction that this patterning phase separation layer includes slow axis.

In addition, " carrying out given process to optical thin film " in the present invention refers to, based on pattern of polarization row position Lai Control the position that optical thin film is with respect to adherend, or when cutting processing is carried out to optical thin film, control optical thin film Skew in the direction of the width.

Invention effect

In accordance with the invention it is possible to provide a kind of detection means that can accurately detect pattern of polarization row, detection method, place Reason device and processing method.

Brief description

Fig. 1 is the schematic diagram of the detection means involved by first embodiment of the present invention.

Fig. 2 is the schematic diagram of the detection means involved by the variation of first embodiment of the present invention.

Fig. 3 is the schematic diagram of the detection means involved by second embodiment of the present invention.

Fig. 4 is the schematic diagram of the detection means involved by variation of second embodiment of the present invention.

Fig. 5 is the sectional view of that represents optical thin film.

Fig. 6 is to represent the light quantity distribution of reflected light picture of optical thin film and the figure of distribution of color.

Fig. 7 is the schematic diagram of the detection means involved by third embodiment of the present invention.

Fig. 8 is the figure of the method for adjustment of opposite adhesive position that liquid crystal panel and optical thin film are described.

Fig. 9 A is the figure illustrating to bond the bonding process of optical thin film from bonding cylinder to liquid crystal panel.

Fig. 9 B is the figure illustrating to bond the bonding process of optical thin film from bonding cylinder to liquid crystal panel.

Figure 10 is the schematic diagram of the detection means involved by the 4th embodiment of the present invention.

Figure 11 is the top view of that represents optical thin film.

Figure 12 is the schematic diagram of cutting processing device.

Specific embodiment

[first embodiment]

Fig. 1 is the schematic diagram of detection means DA1 involved by first embodiment of the present invention.

Detection means DA1 of present embodiment includes supporting mass B1, image unit U1 and pattern detection portion IP1.Detection dress Put pattern of polarization row OP12a, OP12b that DA1 detection includes in optical thin film OP1.

Optical thin film OP1 at least includes phase separation layer OP11, patterning phase separation layer OP12 and polarizer layer OP13.From First face (face of the side being supported by supporting mass B1) OP1a side direction second face of optical thin film OP1 (is propped up with by supporting mass B1 The face of the contrary side in the side held) OP1b side, it is disposed with phase separation layer OP11, patterning phase separation layer OP12 and polarization Element layer OP13.The part in addition to phase separation layer OP11 in optical thin film OP1 is optical thin film main part OPC1.

Patterning phase separation layer OP12 include slow axis RTAX the mutually different multiple pattern of polarization row OP12a in direction, OP12b.Patterning phase separation layer OP12 for example includes the mutually orthogonal first pattern of polarization row OP12a in direction of slow axis RTAX With the second pattern of polarization row OP12b.Observe from the normal direction of optical thin film OP1, the slow axis of the first pattern of polarization row OP12a Polarization axle (between axlemolecules) PLAX for example with respect to polarizer layer OP13 for the RTAX and be in turn clockwise 45 ° of angle.From light The normal direction learning thin film OP1 is observed, and the slow axis RTAX of the second pattern of polarization row OP12b is for example with respect to polarizer layer The polarization axle PLAX of OP13 and be in the angle of 45 ° of rotate counterclockwise.First pattern of polarization row OP12a and the second pattern of polarization row OP12b alternately configures on the direction orthogonal with its long side direction.

Phase separation layer OP11, as the protective film (protection thin film) of optical thin film main part OPC1, is arranged to relatively Peel off in optical thin film main part OPC1.Protective film is generally extended to manufacture by two axles, has birefringence.Protection is thin Film is compared with patterning phase separation layer OP12, polarizer layer OP13 etc. it is impossible to fully control phase contrast.Therefore, protection is thin Film can unconsciously give phase contrast to the light having passed through patterning phase separation layer OP12.This phase contrast can make optical detecting Precision reduces, and therefore should exclude, but in the present embodiment, this phase contrast be positively utilized, to carry out pattern of polarization row The detection of OP12a, OP12b.With regard to this point, it is described below.

Optical thin film OP1 can include phase separation layer OP11, patterning phase separation layer OP12 and polarizer layer OP13 with Outer layer.For example, can by the optical thin film OP3 shown in Fig. 5 some or all as optical thin film OP1.

The optical thin film OP3 of Fig. 5 includes first phase difference layer (protection thin film) OP31, base material in a thickness direction successively Layer OP33, light redirecting layer OP34, patterning phase separation layer OP35, the first adhesive linkage OP36, polarizer layer OP37, the second bonding Layer OP38, polarizer protective layer OP39, adhesion layer OP40 and second phase difference layer (separation thin film) OP41.Optical thin film The part in addition to first phase difference layer OP31 and second phase difference layer OP41 in OP3 is optical thin film main part OP42.

Difference layer OP31 is corresponding with the phase separation layer OP11 of Fig. 1 for first phase, the pattern of patterning phase separation layer OP35 and Fig. 1 Change phase separation layer OP12 to correspond to, polarizer layer OP37 is corresponding with the polarizer layer OP13 of Fig. 1, optical thin film main part OP42 Corresponding with the optical thin film main part OPC1 of Fig. 1.In the present embodiment, for example the second phase will can be peeled off from optical thin film OP3 Optical thin film OP45 obtained from potential difference layer OP41 is used as optical thin film OP1.

Hereinafter, the specific structure of optical thin film OP3 is described.

Polarizer layer OP37 make to have in incident light the light transmission of the vibration plane in certain direction absorbing have with should The light of the orthogonal vibration plane of vibration plane.Become rectilinearly polarized light via the light that polarizer layer OP37 projects.

As polarizer layer OP37, for example can be using polarization film obtained from being manufactured by following operation, i.e. right Polyvinyl alcohol resin thin film carries out the operation of uniaxial extension, by being carried out to polyvinyl alcohol resin thin film by dichroic dye Dyeing and make the operation, thin to the polyvinyl alcohol resin being adsorbed with dichroic dye by boric acid aqueous solution that dichroic dye adsorbs Operation and the operation washed after the process based on boric acid aqueous solution that film is processed.

Polyvinyl alcohol resin can be obtained by carrying out saponification to polyvinyl acetate system resin.Polyvinyl acetate Be resin in addition to the polyvinyl acetate as the homopolymer of vinyl acetate, can also for vinyl acetate and can and second The copolymer of other monomers of vinyl acetate copolymerization.As can for example can with other monomers of vinyl acetate copolymerization Enumerate unsaturated carboxylic acid class, olefines, vinyl ethers, unsaturated sulfonic acid class, there is acrylic amide of ammonium etc..

As dichroic dye, for example, can adopt iodine, dichromatic organic dyestuff.Using iodine as dichroic dye In the case of, can adopt and impregnate polyvinyl alcohol resin thin film the side dyeing in the aqueous solution containing iodine and potassium iodide Method.

The uniaxial extension of polyvinyl alcohol resin thin film can carry out before the dyeing based on dichroic dye it is also possible to Carry out with the dyeing based on dichroic dye simultaneously, can also after the dyeing based on dichroic dye for example boric acid process in Carry out.

With regard to the thickness of polarizer layer OP37, for example, can be set to average thickness and be more than 5 μm and less than 40 μm.

Incident rectilinearly polarized light is projected by patterning phase separation layer OP35 as the light of two kinds of polarization states.Patterning phase Potential difference layer OP35 is formed in light redirecting layer OP34.

Light redirecting layer OP34 has orientation restraint for the material (hereinafter referred to as liquid crystal material) with liquid crystal liquid crystal property.Light Oriented layer OP34 to be formed using the light orientation material of polymerism.As light orientation material, use by being exposed by polarized light Light is thus find the material of orientation restraint.By finding the basis of orientation restraint to light orientation material exposure polarized light Upper polymerization, thus form light redirecting layer OP34 maintaining orientation restraint.As this light orientation material, can be using generally Known material.

Light redirecting layer OP34 for example includes the mutually orthogonal first orientation region in direction and the second orientation of orientation restraint Region.First orientation region is prolonged in banding respectively with second orientation region on the direction parallel with one side of optical thin film OP3 Stretch.First orientation region and second orientation region are arranged alternately on the direction orthogonal with the bearing of trend of itself.

Patterning phase separation layer OP35 includes first pattern of polarization corresponding with the first orientation region of light redirecting layer OP34 Row OP35a and second pattern of polarization row OP35b corresponding with second orientation region.First pattern of polarization row OP35a and second inclined Shake pattern row OP35b slow axis mutually orthogonal.First pattern of polarization row OP35a makes rectilinearly polarized light become and turns to the first circular polarization Light.Second pattern of polarization row OP35b makes rectilinearly polarized light become and turns to direction of rotation second circle different from the first circularly polarized light partially Shake light.

Patterning phase separation layer OP35 to be formed using the liquid crystal material of the functional group with polymerism.According to light redirecting layer The first orientation region that OP34 has and the orientation restraint in second orientation region make liquid crystal material arrange on 2 directions Row, and then make the functional group reactionses of polymerism that liquid crystal material has, the liquid crystalline phase of liquid crystal material remaining adopted simultaneously makes Its solidification, thus obtain patterning phase separation layer OP35.As the liquid crystal material of this polymerism, can adopt generally well-known Material.

Substrate layer OP33 is used as the base material that light redirecting layer OP34 and patterning phase separation layer OP35 are supported.Light takes Pass through to apply light orientation material and liquid crystal material on the surface of substrate layer OP33 to layer OP34 and patterning phase contrast OP35, Thus to be formed.

As the formation material of substrate layer OP33, for example can enumerate tri acetyl cellulose (TAC) is resin, poly- carbonic acid Ester system resin, polyvinyl alcohol resin, polystyrene resin, (methyl) acrylic ester resin, comprise cyclic polyolefin hydrocarbon system Resin, polypropylene-based resin are in interior polyolefin-based resins, polyarylate system resin, polyimides system resins, polyamide series resin Deng.

With regard to the thickness of substrate layer OP33, for example, can be set to average thickness and be more than 40 μm and less than 100 μm.

As the formation material of polarizer protective layer OP39, can be using the material same with above-mentioned substrate layer OP33 Material.As this material, for example can enumerate tri acetyl cellulose (TAC) is resin, polycarbonate-based resin, polyvinyl alcohol It is resin, polystyrene resin, (methyl) acrylic ester resin, comprise cyclic polyolefin hydrocarbon system resin, polypropylene-based resin In interior polyolefin-based resins, polyarylate system resin, polyimides system resins, polyamide series resin etc..

With regard to the thickness of polarizer protective layer OP39, for example, can be set to average thickness and be more than 5 μm and less than 80 μm.

First adhesive linkage OP36 and the formation material of the second adhesive linkage OP38, for example, can enumerate to employ polyvinyl alcohol It is that the constituent of resin or polyurethane resin as main constituent and is dissolved in water or makes it be distributed to the water system in water and glue Connect agent, the solvent-free Photocurable adhesive agent containing light-cured resin and light cationic polymerization initiator etc..When manufacturing Volume contraction is little, thickness control easy from the viewpoint of, as the first adhesive linkage OP36's and the second adhesive linkage OP38 Form material, it is preferred to use Photocurable adhesive agent, more preferably adopt ultraviolet hardening bonding agent.

As ultraviolet hardening bonding agent, as long as being provided with the state that can apply of liquid, just can be using all the time Various bonding agents used in the manufacture of polaroid.From the viewpoints such as weatherability, polymerism, ultraviolet hardening bonding agent Preferably comprise the compound of cationically polymerizable, such as epoxide, more specifically for as TOHKEMY 2004-245925 The epoxide in intramolecular without aromatic rings as publication is described, as one of ultra-violet solidified composition Bonding agent.

As this epoxide, for example, can enumerate to the aromatic ring with bisphenol A diglycidyl ether as typical example The aromatic polyhydroxy compounds of the raw material of oxygen compound carry out core hydrogenation, by hydrogenated epoxy obtained from its glycidyl ether Compound, at least to have the cycloaliphatic epoxy of the epoxy radicals being combined with ester ring type ring, aliphatic in intramolecular many The glycidyl ether of hydroxy compounds is aliphatic epoxy compound of typical example etc..

In ultraviolet hardening bonding agent, except the cationically polymerizable compound as representative examples with epoxide Outside, allotment produces cation kind or lewis acid by polymerization initiator, particularly by ultraviolet irradiation, is used for making The light cationic polymerization initiator that the polymerization of cationically polymerizable compound starts.And then, in ultraviolet hardening bonding agent, Can also allocate and the hot cationic polymerization of polymerization be started by heating, in addition with various additives such as light sensitizers.

The formation material of the first adhesive linkage OP36 and the second adhesive linkage OP38 can be identical, or it is also possible to different, but From the viewpoint of productivity ratio, on the premise of the bonding force obtaining appropriateness, it is preferred to use identical bonding agent is forming first Adhesive linkage OP36 and the second adhesive linkage OP38.

With regard to the thickness of the first adhesive linkage OP36 and the second adhesive linkage OP38, for example can be set to average thickness is 0.5 μ Less than more than m and 5 μm.

Adhesion layer OP40 is for example used for optical thin film OP45 is bonded in the display surface of liquid crystal panel.As formation adhesion layer The adhesive agent of OP40, can enumerate for example based on acrylic resin, silicon-type resin, polyester, polyurethane, polyethers etc. The adhesive agent of resin.Wherein, based on acrylic resin the acrylic acid seriess adhesive agent of resin due to optical transparent Property aspect excellent, keep wettability, the cohesiveness of appropriateness, and then excellent at aspects such as weatherability, thermostabilitys, in heating, humidification Under conditions of be difficult to produce the stripping problem floating or peeling off etc., therefore be suitable for adopt.

In the acrylic resin constituting acrylic acid seriess adhesive agent, it is suitable for that methyl, ethyl, butyl are had using ester moiety Or the alkyl acrylate of the alkyl that carbon number as 2- ethylhexyl is less than 20 and (methyl) acrylic acid, (first Base) such (methyl) acrylic monomer containing functional group of 2-Hydroxy ethyl acrylate acrylic acid series copolymer.

The adhesion layer OP40 comprising this acrylic acid series copolymer has some bad shapes after being adhered to liquid crystal panel In the case that condition is thus needing to peel off, residual thickener etc. will not be produced in glass substrate, can relatively easily be peeled off.Preferably The glass transition temperature of acrylic acid series copolymer is less than 25 DEG C, more preferably less than 0 DEG C.Additionally, this acrylic copolymer Thing generally has more than 100,000 weight average molecular weight.

With regard to the thickness of adhesion layer OP40, for example, can be set to average thickness and be more than 1 μm and less than 40 μm.

First phase difference layer (protection thin film) OP31 protects patterning phase separation layer OP35 together with substrate layer OP33.The One phase separation layer OP31 is arranged with respect to substrate layer OP33 and freely peels off.

First phase difference layer OP31 forms the resin bed of adhesion/fissility or tack using in transparent resin film Resin bed, and give the phase separation layer of weaker adhesiveness.As transparent resin film, for example, can enumerate poly terephthalic acid Glycol ester, PEN, polyethylene and the extrusion film of thermoplastic resin as polypropylene, right Co-extrusion film that they are combined, thin film that they are extended on single shaft or two axles etc..As transparent resin film, Preferably employ the transparency and the excellent and cheap polyethylene terephthalate of homogeneity or polyethylene single shaft or Two axle extension films.

As the resin bed of adhesion/fissility, for example can enumerate acrylic acid seriess adhesive agent, natural rubber system adhesive agent, Styrene butadiene copolymers resin system adhesive agent, polyisobutylene system adhesive agent, vinyl ethers system resin adhesive agent, silicon-type Resin adhesive agent etc..Additionally, as the resin bed of tack, such as ethylene-vinyl acetate c resin etc. can be enumerated.Make Resin bed for adhesion/fissility, it is preferred to use the acrylic acid seriess adhesive agent of excellent transparency.

With regard to the thickness of first phase difference layer OP31, for example, can be set to average thickness and be more than 15 μm and less than 75 μm.

Second phase difference layer (separating with thin film) OP41 covers adhesion layer OP40 and protects adhesion layer OP40.Second phase is poor Layer OP41 is arranged with respect to adhesion layer OP40 and freely peels off.As second phase difference layer OP41, can adopt and first phase The same transparent resin film of difference layer OP31.

With regard to the thickness of second phase difference layer OP41, for example, can be set to average thickness and be more than 15 μm and less than 75 μm.

Return to Fig. 1, supporting mass B1 has the bearing-surface B1a that the first face OP1a to optical thin film OP1 is supported.? Hold body B1 at least a portion in bearing-surface B1a, have and passed through optics to from the lateral first face OP1a side of the second face OP1b The reflecting surface RS1 that the light of thin film OP1 is reflected.The material of reflecting surface RS1, structure are not particularly limited.Reflecting surface RS1 is permissible By the surface of supporting mass B1 being carried out with mirror finish being formed it is also possible to by the surface configuration metallic reflection in supporting mass B1 The reflection part of film, reflection type polarizer etc. is forming.Additionally, bearing-surface B1a can integrally become reflecting surface RS1 it is also possible to Only a part of region of bearing-surface B1a becomes reflecting surface RS1.As long as supporting mass B1 can stably keep optical thin film OP1. The shape of supporting mass B1 is not particularly limited, can be using the arbitrary shape such as tabular, column, tubular.The shape of bearing-surface B1a Also can be using the arbitrary shape such as plane, flexure plane.

Image unit U1 includes light source portion IL1, image pickup part CM1 and color filter CF1.Image unit U1 for example makes light source portion Closely one keeps IL1 and image pickup part CM1, so that the light meeting arranging through a pattern of polarization and being reflected by reflecting surface RS1 Arrange and incide image pickup part CM1 through one pattern of polarization of identical.

Optical thin film OP1 on reflecting surface RS1 for the light source portion IL1 direction, from the second face OP1b side of optical thin film OP1 Irradiation light.Color filter CF1 is arranged on the light path of the light from light source portion IL1 towards image pickup part CM1.Color filter CF1 passes through to absorb Or the contrast to adjust the reflected light picture of multiple pattern of polarization row OP12a, OP12b for the light of the given wavelength components of reflection (ratio of the brightness of reflected light picture).Color filter CF1 is for example arranged on the light path of the light from light source portion IL1 towards optical thin film OP1 On, but as shown in Figure 2 it is also possible to be arranged on from optical thin film OP1 towards the light path of the light of image pickup part CM1, optical thin film OP1 In the light path of the light and reflecting surface RS1 between.

As light source portion IL1, the known light source such as LED can be adopted.Light source portion IL1 for example shines towards optical thin film OP1 Penetrate white light, but the light that light source portion IL1 irradiates is not limited to this.In the present embodiment, can be according to phase separation layer OP11, figure The phase contrast of case phase separation layer OP12 and polarizer layer OP13, wavelength dispersion characteristics etc., irradiate suitably from light source portion IL1 Wavelength light.

As color filter CF1, the light of wavelength components that can be given using absorption the light through remaining wavelength components Absorptive-type light filter, it would however also be possible to employ the given light of wavelength components of reflection and pass through remaining wavelength components light anti- The light filter of emitting.As the light filter of absorptive-type light filter and reflection-type, known light filter can be adopted.

Image pickup part CM1 shoots, from the second face OP1b side of optical thin film OP1, the optical thin film OP1 being located at reflecting surface RS1 Reflected light picture.As image pickup part CM1, the known shooting part such as ccd video camera can be adopted.

Pattern detection portion IP1 detects the pattern of polarization on reflecting surface RS1 based on the reflected light picture of optical thin film OP1 Row OP12a, OP12b, and extract the positional information of the boundary line of pattern of polarization row OP12a, OP12b.As pattern detection portion IP1, can adopt known image processing section.The picture signal of the reflected light picture being photographed by image pickup part CM1 passes through pattern Test section IP1 is transformed to by the view data of numerical data, implements the known image such as color extraction process, binary conversion treatment Process.

With regard to the first pattern of polarization row OP12a and the second pattern of polarization row OP12b, slow axis RTAX is with respect to polarizer The direction that the polarization axle PLAX of layer OP13 is constituted is different.Therefore, through polarizer layer OP13, patterning phase separation layer OP12 and phase separation layer OP11 is simultaneously reflected by reflecting surface RS1 thus being again passed through phase separation layer OP11, patterning phase The brightness of light of potential difference layer OP12 and polarizer layer OP13, color, when having passed through the first pattern of polarization row OP12a and thoroughly Cross different during the second pattern of polarization row OP12b.Thus, pattern detection portion IP1 is based on the first pattern of polarization row OP12a and second The brightness of reflected light picture of pattern of polarization row OP12b or the difference of color, to detect the first pattern of polarization row OP12a and second Pattern of polarization row OP12b.

In the present embodiment, by line translation is entered to the wavelength of the light being irradiated to optical thin film OP1 by color filter CF1, The brightness of reflected light picture or color so as to make the first pattern of polarization row OP12a and the second pattern of polarization row OP12b have Relatively big difference.Thus, the detection of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b becomes easy.

For example, (a) expression shown in Fig. 6 does not configure color filter CF1 and from light source portion IL1 before light source portion IL1 Irradiate the distribution of color of the reflected light picture of optical thin film OP1 in the case of white light.(b) shown in Fig. 6 represents in light Color filter CF1 the optical thin film OP1 in the case that light source portion IL1 has irradiated white light is not configured before source portion IL1 Light quantity distribution.(c) shown in Fig. 6 represents former configuration color filter CF1 in light source portion IL1 and irradiates from light source portion IL1 The light quantity distribution of the reflected light picture of the optical thin film OP1 in the case of white light.

As shown in (a) and (b) in Fig. 6, produce following such phenomenon, i.e. if irradiating white from light source portion IL1 Light, then for example through the first pattern of polarization row OP12a and to incide the light of image pickup part CM1 be that red R and light quantity are also big, with respect to This, through the second pattern of polarization row OP12b and to incide the light of image pickup part CM1 be green G and light quantity is also little.

On the other hand, as shown in (c) in Fig. 6, if the former configuration in light source portion IL1 for example absorbs or reflects green The light of color G and through red R light color filter CF1, then hardly include red R the second pattern of polarization row OP12b anti- Penetrate light image blackening.Thus, the brightness of reflected light picture of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b's is anti- Penetrate the ratio (hereinafter referred to as " contrast of the reflected light picture that the first pattern of polarization row are arranged ") of the brightness of light image with the second pattern of polarization Become big, the detection of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b becomes easy.

As color filter CF1 it is also possible to adopt the light absorbing or reflecting red R the color filter of the light through green G. But, using through show more bright color (in figure 6 be, for example, red R) color filter, improving the first polarization figure Case row OP12a is more favourable with the contrast of the reflected light picture of the second pattern of polarization row OP12b.

As described above, the contrast of the reflected light picture of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b Wavelength according to the light inciding optical thin film OP1 and different.Color filter CF1 enters to the wavelength of the light irradiating from light source portion IL1 Line translation, so that：Compared with the not situation using color filter CF1, the first pattern of polarization row OP12a and the second pattern of polarization arrange The contrast of the reflected light picture of OP12b relatively becomes big.

As a result, for example, shown in (b) in such as Fig. 6, in the Wavelength distribution from the first light that light source portion IL1 irradiates, that is, In the case of making the contrast of reflected light picture in the first pattern of polarization row OP12a and the second pattern of polarization row OP12b insufficient, Also by color filter CF1 the wavelength conversion of the first light can be different wavelength, thus realizing as shown in (c) in Fig. 6 High contrast.

Pattern detection portion IP1 is by implementing the public affairs such as color extraction process, binary conversion treatment to the view data of reflected light picture The image procossing known, thus to detect the first pattern of polarization row OP12a and the second pattern of polarization row OP12b.Carry with regard to color Take process, binary conversion treatment, any one also can be selected to process to use, but also can and be used with both.For example, pattern detection Portion IP1 in the view data of reflected light picture, extract have show bright color (in figure 6 in shown (c) for example, Red R) part, binary conversion treatment is carried out further to the view data extracting, thus by the first pattern of polarization row OP12a To detect as bright pattern and dark pattern with the second pattern of polarization row OP12b.At color extraction process as described above, binaryzation The algorithm of reason is in most of the cases known, is not limited to specific detection method.

As above, in detection means DA1 of present embodiment, make to have passed through polarizer layer OP13 and patterning The light of phase separation layer OP12 incides reflecting surface RS1 via phase separation layer OP11, and makes the light warp again being reflected by reflecting surface RS1 Patterning phase separation layer OP12 and polarizer layer OP13 is incided by phase separation layer OP11.Therefore, clapped by image pickup part CM1 In the reflected light picture taken the photograph, the different multiple pattern row of color, brightness are arranged with the first pattern of polarization row OP12a and the second pattern of polarization OP12b accordingly shows.In the present embodiment, from light source portion IL1 irradiate light a part absorbed by color filter CF1 or Reflection, so that the contrast of the reflected light picture of the first pattern of polarization row OP12a and the second pattern of polarization row OP12b becomes big.By This, is if the image procossing to the view data enforcement color extraction process of this reflected light picture, binary conversion treatment etc., can be high Precision ground detection the first pattern of polarization row OP12a and the second pattern of polarization row OP12b.

For example, in the case that phase separation layer OP11 is not disposed on patterning between phase separation layer OP12 and reflecting surface RS1, The reflected light picture being shot by image pickup part CM1 becomes the image that whole face is black.Thus it is impossible to detection first pattern of polarization arranges OP12a and the second pattern of polarization row OP12b.Patterning phase separation layer OP12 and reflecting surface are arranged on by phase separation layer OP11 Between RS1, thus the light spilling from polarizer layer OP13 can be produced, the color of this light, brightness are also passing through the first polarization During pattern row OP12a with passed through different during the second pattern of polarization row OP12b.

Phase separation layer OP11 is compared with patterning phase separation layer OP12, polarizer layer OP13 etc. it is impossible to fully control Its phase contrast, the situation producing undesirable condition therefore in optical detecting is more.Accordingly, it would be desirable to shell in advance before optical detecting The phase contrast of phase separation layer OP11 from the time of phase separation layer etc., but in the present embodiment, is positively utilized, does not peel off phase place Difference layer OP11 ground detection pattern of polarization row OP12a, OP12b.Thereby, it is possible to providing a kind of energy high accuracy and effectively detecting polarization The detection means of pattern row OP12a, OP12b and detection method.

[second embodiment]

Fig. 3 is the schematic diagram of detection means DA2 involved by second embodiment of the present invention.

Detection means DA2 of present embodiment includes supporting mass B2, image unit U2, pattern detection portion IP2 and adjustment portion PLR.Pattern of polarization row OP23a, OP23b that the detection of detection means DA2 includes in optical thin film OP2.

Optical thin film OP2 at least includes phase separation layer OP21, polarizer layer OP22 and patterning phase separation layer OP23.From First face (face of the side being supported by supporting mass B2) OP2a side direction second face of optical thin film OP2 (is propped up with by supporting mass B2 The face of the contrary side in the side held) OP2b side, it is disposed with phase separation layer OP21, polarizer layer OP22 and patterning phase Potential difference layer OP23.The part in addition to phase separation layer OP21 in optical thin film OP2 is optical thin film main part OPC2.

Patterning phase separation layer OP23 include slow axis RTAX the mutually different multiple pattern of polarization row OP23a in direction, OP23b.Patterning phase separation layer OP23 for example includes the mutually orthogonal first pattern of polarization row OP23a in direction of slow axis RTAX With the second pattern of polarization row OP23b.Observe from the normal direction of optical thin film OP2, the slow axis of the first pattern of polarization row OP23a Polarization axle (between axlemolecules) PLAX1 for example with respect to polarizer layer OP22 for the RTAX and be in turn clockwise 45 ° of angle.From light The normal direction learning thin film OP2 is observed, and the slow axis RTAX of the second pattern of polarization row OP23b is for example with respect to polarizer layer The polarization axle PLAX1 of OP22 and be in the angle of 45 ° of rotate counterclockwise.First pattern of polarization row OP23a and the second pattern of polarization row OP23b alternately configures on the direction orthogonal with its long side direction.

Phase separation layer OP21, as the protective film (separation thin film) of optical thin film main part OPC2, is arranged to relatively Peel off in optical thin film main part OPC2.Protective film generally passes through two axles and extends manufacture, has birefringence.Protective film It is impossible to fully control phase contrast compared with patterning phase separation layer OP23, polarizer layer OP22 etc..Therefore, protective film meeting Unconsciously give phase contrast to the light having passed through patterning phase separation layer OP23.This phase contrast can make the precision of optical detecting Reduce, therefore should exclude, but in the present embodiment, this phase contrast be positively utilized, to carry out pattern of polarization row The detection of OP23a, OP23b.With regard to this point, it is described below.

Optical thin film OP2 can include phase separation layer OP21, polarizer layer OP22 and patterning phase separation layer OP23 with Outer layer.In the present embodiment, for example, the optical thin film OP3 shown in Fig. 5 can be used as optical thin film OP2.In this situation Under, difference layer OP41 is corresponding with the phase separation layer OP21 of Fig. 3 for second phase, the polarizer layer of polarizer layer OP37 and Fig. 3 OP22 correspond to, patterning phase separation layer OP35 corresponding with the patterning phase separation layer OP23 of Fig. 3, optical thin film main part OP42 and The optical thin film main part OPC2 of Fig. 3 corresponds to.

Supporting mass B2 has the bearing-surface B2a that the first face OP2a to optical thin film OP2 is supported.Supporting mass B1 is propping up At least a portion in bearing surface B2a, has to the light having passed through optical thin film OP2 from the lateral first face OP2a side of the second face OP2b The reflecting surface RS2 being reflected.The material of reflecting surface RS2, structure are not particularly limited.Reflecting surface RS2 can be by supporting The surface of body B2 carries out mirror finish to be formed it is also possible to by the surface configuration metallic reflective coating of supporting mass B2, reflection-type The reflection parts such as polaroid are forming.Additionally, bearing-surface B2a can integrally become reflecting surface RS2, electricity can only bearing-surface B2a A part of region become reflecting surface RS2.

As long as supporting mass B2 can stably keep optical thin film OP2.The shape of supporting mass B2 is not particularly limited, energy Enough adopt the arbitrary shape such as tabular, column, tubular.The shape of bearing-surface B2a also can be arbitrary using plane, flexure plane etc. Shape.

Image unit U2 includes light source portion IL2, image pickup part CM2, polaroid PLF and color filter CF2.Image unit U2 is for example Closely one keeps to make light source portion IL2 and image pickup part CM2, so that through pattern of polarization row and anti-by reflecting surface RS2 The light penetrated can arrange and incide image pickup part CM2 through one pattern of polarization of identical.

Optical thin film OP2 on reflecting surface RS2 for the light source portion IL2 direction, from the second face OP2b side of optical thin film OP2 Irradiation light.Polaroid PLF is arranged on the light path of the light from light source portion IL2 towards optical thin film OP2.Irradiate from light source portion IL2 Light transmission polaroid PLF and be transformed to rectilinearly polarized light.As light source portion IL2, the known light source such as LED can be adopted.Light Source portion IL2 for example irradiates white light towards optical thin film OP2, but the light that light source portion IL2 irradiates is not limited to this.In this embodiment party In formula, can according to phase separation layer OP21, polarizer layer OP22, patterning phase separation layer OP23 and polaroid PLF phase Potential difference, wavelength dispersion characteristics etc., irradiate the light of suitable wavelength from light source portion IL2.

Color filter CF2 is arranged on the light path of the light from light source portion IL2 towards image pickup part CM2.Color filter CF2 passes through to absorb Or the contrast to adjust the reflected light picture of multiple pattern of polarization row OP23a, OP23b for the light of the given wavelength components of reflection (ratio of the brightness of reflected light picture).Color filter CF2 is for example arranged on the light path of the light from light source portion IL2 towards optical thin film OP2 On, but as shown in Figure 4 it is also possible to be arranged on from optical thin film OP2 towards the light path of the light of image pickup part CM2, optical thin film OP2 In the light path of the light and reflecting surface RS2 between.Color filter CF2 can be arranged on the light between polaroid PLF and optical thin film OP2 It is also possible in the light path being arranged between light source portion IL2 and polaroid PLF on road.

As color filter CF2, the light of wavelength components that can be given using absorption the light through remaining wavelength components Absorptive-type light filter, it would however also be possible to employ the given light of wavelength components of reflection and pass through remaining wavelength components light anti- The light filter of emitting.As the light filter of absorptive-type light filter and reflection-type, known light filter can be adopted.

Image pickup part CM2 shoots, from the second face OP2b side of optical thin film OP2, the optical thin film OP2 being located at reflecting surface RS2 Reflected light picture.As image pickup part CM2, the known shooting part such as ccd video camera can be adopted.

Pattern detection portion IP2 detects the pattern of polarization on reflecting surface RS2 based on the reflected light picture of optical thin film OP2 Row OP23a, OP23b, and extract the positional information of the boundary line of pattern of polarization row OP23a, OP23b.As pattern detection portion IP2, can adopt known image processing section.The picture signal of the reflected light picture being photographed by image pickup part CM2 passes through pattern Test section IP2 is transformed to by the view data of numerical data, implements the known image such as color extraction process, binary conversion treatment Process.

With regard to the first pattern of polarization row OP23a and the second pattern of polarization row OP23b, slow axis RTAX is with respect to polaroid The direction that polarization axle (between axlemolecules) PLAX2 of PLF is constituted is different.Therefore, through polaroid PLF, patterning phase contrast Layer OP23, polarizer layer OP22 and phase separation layer OP21 are simultaneously reflected thus being again passed through phase separation layer by reflecting surface RS2 The brightness of light of OP21, polarizer layer OP22 and patterning phase separation layer OP23, color, are passing through the first pattern of polarization Row OP23a when with passed through different during the second pattern of polarization row OP23b.Thus, pattern detection portion IP2 is based on the first pattern of polarization Row OP23a and the brightness of reflected light picture of the second pattern of polarization row OP23b or the difference of color, to detect the first pattern of polarization Row OP23a and the second pattern of polarization row OP23b.

In the present embodiment, by line translation is entered to the wavelength of the light being irradiated to optical thin film OP2 by color filter CF2, The brightness of reflected light picture or color so as to make the first pattern of polarization row OP23a and the second pattern of polarization row OP23b have relatively Different.Thus, the detection of the first pattern of polarization row OP23a and the second pattern of polarization row OP23b becomes easy.

Pattern detection portion IP2 is by implementing the public affairs such as color extraction process, binary conversion treatment to the view data of reflected light picture The image procossing known, thus to detect the first pattern of polarization row OP23a and the second pattern of polarization row OP23b.Carry with regard to color Take process, binary conversion treatment, any one also can be selected to process to use, but also can and be used with both.For example, pattern detection Portion IP2 in the view data of reflected light picture, extract have show bright color part, to the view data extracting Carry out binary conversion treatment further, thus using the first pattern of polarization row OP23a and the second pattern of polarization row OP23b as bright pattern To detect with dark pattern.Color extraction as described above is processed, the algorithm of binary conversion treatment is in most of the cases known, It is not limited to specific detection method.

Adjustment portion PLR adjusts the polarization axle PLAX2 of polaroid PLF and the slow axis of pattern of polarization row OP23a, OP23b The relative angle of RTAX.Adjust the first pattern of polarization row OP23a's and the second pattern of polarization row OP23b by adjustment portion PLR The polarization axle PLAX2 with respect to polaroid PLF for the slow axis RTAX and the angle that constitutes are such that it is able to increase the first pattern of polarization row The asymmetry (difference of color, brightness etc.) of the reflected light picture of OP23a and the second pattern of polarization row OP23b.Thus, pattern inspection Survey portion IP2 can accurately detect pattern of polarization row OP23a, OP23b on reflecting surface RS2.

In addition, for example, after polaroid PLF is pasted by revolvable fixture by adjustment portion PLR, operating personnel Confirm the reflected light picture of optical thin film OP2 while the polaroid PLF making to paste revolvable fixture is rotated by each fixture, from And the polarization axle PLAX2 of above-mentioned polaroid PLF and the phase of the slow axis RTAX of pattern of polarization row OP23a, OP23b can be carried out Adjustment to angle.In this case, following order can be set to, i.e. operating personnel confirms that optical thin film OP2's is anti- Penetrating light image while making fixture rotate, being judged as that the first pattern of polarization row OP23a and the second pattern of polarization row OP23b's is asymmetric Property maximum position at, stop the rotation of fixture.On the other hand, made using motor omitting diagram etc. by adjustment portion PLR Fixture rotates, thus also can automatically carry out the adjustment of above-mentioned relative angle.Additionally, the adjustment of above-mentioned relative angle is permissible Implementing in operation each time but it is also possible to confirm optical thin film when coiled strip roller (the symbol R1 in reference to Figure 12) is changed The reflected light picture of OP2, does not carry out the adjustment of relative angle, only non-right in the case that the asymmetry in this reflected light picture is big Title property is little and is adjusted when pattern identification is bad.

As above, in detection means DA2 of present embodiment, it is also the phase place that phase separation layer OP21 is positively utilized Difference, detects pattern of polarization row OP23a, OP23b with not peeling off phase separation layer OP21.Therefore, it is possible to provide a kind of can high accuracy and The detection means of detection pattern of polarization row OP23a, OP23b and detection method effectively.In the present embodiment, from light source portion A part for the light that IL2 irradiates is absorbed or reflected by color filter CF2, so that the first pattern of polarization row OP23a is inclined with second The contrast of reflected light picture of pattern row OP23b of shaking becomes big.And then, in the present embodiment, can be increased by adjustment portion PLR The asymmetry of the reflected light picture of the first pattern of polarization row OP23a and the second pattern of polarization row OP23b.Thus, pattern of polarization row The accuracy of detection of OP23a, OP23b improves.

[the 3rd embodiment]

Fig. 7 is the schematic diagram of detection means DA3 involved by third embodiment of the present invention.

Fig. 8 is the figure of the method illustrating the opposite adhesive position of liquid crystal panel P and optical thin film F1 is adjusted.

Fig. 9 A and Fig. 9 B is the figure illustrating to bond the bonding process of optical thin film F1 to liquid crystal panel P.

As shown in fig. 7, detection means DA3 of present embodiment includes supporting mass (bonding cylinder) 32, image unit 35 and Pattern detection portion IP3.Pattern of polarization row APAa that the detection of detection means DA3 includes in optical thin film F1, APAb, DPAa, DPAb (with reference to Fig. 8).

As shown in Fig. 7～Fig. 9 A, Fig. 9 B, detection means DA3 of present embodiment constitute based on pattern of polarization row APAa, Position (for example, the position of the boundary line of pattern of polarization row APAa, APAb, DPAa, DPAb of APAb, DPAa, DPAb (with reference to Fig. 8) Put) optical thin film F1 is calibrated and be adhered to liquid crystal panel P bonder 13 a part.Bonder 13 is except detection dress Put outside DA3, also include control device 25, driving means 42, adhesive platform 41, image unit 36 etc..Supporting mass 32 is to keep It is adhered to the bonding part of the cylinder shape of liquid crystal panel P in the optical thin film F1 keeping face 32a.Thus, below by " supporting mass " It is labeled as " bonding cylinder " to illustrate.

In the same manner as optical thin film OP1 shown in Fig. 1 for the optical thin film F1, at least (supported by bonding cylinder 32 from the first face Side face) side, towards the second face (with the face by the contrary side in the side that supports of bonding cylinder 32) side, includes phase successively Potential difference layer, patterning phase separation layer and polarizer layer.In the present embodiment, for example can be by the optical thin film shown in Fig. 5 OP45 is used as optical thin film F1.The first pattern of polarization row OP35a of pattern of polarization row APAa and pattern of polarization row DPAa and Fig. 5 Corresponding, pattern of polarization row APAb and pattern of polarization row DPAb is corresponding with the second pattern of polarization row OP35b of Fig. 5.

As shown in fig. 7, optical thin film F1 be including the effective coverage AC opposed with the viewing area of liquid crystal panel P and with Positioned at the opposed neighboring area SR in the neighboring area of the periphery of the viewing area of liquid crystal panel P interior lamellar thin film.

As shown in Figure 7 and Figure 8, in the AC of effective coverage, the mutually different multiple pattern of polarization row in direction of slow axis Multiple pixel columns of DPAa, DPAb and liquid crystal panel P are arranged in correspondence with.In the viewing area of liquid crystal panel P, alternately configure aobvious Show the right eye pixel column of right eye image and the left eye pixel column of display left eye image.Therefore, in the AC of effective coverage, Alternately configuration and right eye pixel column corresponding right eye pattern of polarization row DPAa and left eye corresponding with left eye pixel column With pattern of polarization row DPAb.

In the SR of neighboring area, alternately direction and the right eye of configuration slow axis with pattern of polarization row DPAa parallel first Pattern of polarization row APAa and the direction of slow axis and left eye the second parallel pattern of polarization row APAb of pattern of polarization row DPAb. Be arranged at neighboring area SR pattern of polarization row APAa, APAb can individually or with the polarization figure being arranged at effective coverage AC Case row DPAa, DPAb together, with acting on the calibration benchmark making optical thin film F1 and liquid crystal panel P calibration.In order that polarization figure The detection of case row APAa, APAb becomes easy, for example, can make to be arranged among pattern of polarization row APAa, APAb of neighboring area SR At least one pattern of polarization row width ratio be arranged at effective coverage AC pattern of polarization row DPAa, DPAb width width.

As shown in fig. 7, bonding cylinder 32 has the holding face of the cylindrical shape parallel with the width of optical thin film F1 32a.Holding face 32a is that the first face to optical thin film F1 (lower surface of the first phase difference layer OP31 of Fig. 5) is supported Bearing-surface.Holding face 32a for example has the weak stickup of adhesive surface (surface of the adhesion layer OP40 of Fig. 5) than optical thin film F1 Power, the surface protective film (the first phase difference layer OP31 of Fig. 5) of optical thin film F1 can repeatedly be stuck, peel off.Bonding rolling Cylinder 32 is for example wound around adhesion tablet by the outer peripheral face in metal cylinder and makes.The surface of this adhesion tablet becomes holding face 32a.The width central part of holding face 32a is holding area FA keeping optical thin film F1.

Many places in holding face 32a for the bonding cylinder 32, have optically thin to having passed through to the first surface side from the second surface side The reflecting surface 39 that the light of film F1 is reflected.Reflecting surface 39 for example passes through in the surface configuration metallic reflective coating keeping face 32a, anti- The reflection parts such as emitting polaroid are forming.

Reflecting surface 39 is arranged on the part being configured with the pattern of polarization row becoming calibration benchmark in holding face 32a.Join The position being equipped with reflecting surface 39 becomes the detection zone that can detect pattern of polarization row.Can be multiple by the holding face of being arranged at 32a Detected pattern of polarization row in one or more detection zone among detection zone are set to calibrate benchmark.In this enforcement In mode, such as at central part and the both ends of holding area FA, respectively along the direction of rotation bonding cylinder 32 with mutual Equal interval is arranging multiple reflectings surface 39 of same shape.Reflecting surface 39 set by the central part of holding area FA and light The central part learning the effective coverage AC of film F 1 is opposed.Reflecting surface 39 set by the end of holding area FA and optical thin film F1 Effective coverage AC and neighboring area SR boundary line opposed.

Driving means 42 make bonding cylinder 32 rotate around rotary shaft RA, and make bonding cylinder 32 with rotary shaft RA just Move in the horizontal direction handed over and vertical.Driving means 42 are electrically connected with control device 25, by control device 25 Control the driving of driving means 42.

Image unit 35 includes light source portion 35a, image pickup part 35b and color filter 35d.Image unit 35 for example makes light source portion Closely one keeps 35a and image pickup part 35b, so that the light arranging through a pattern of polarization and being reflected by reflecting surface 39 can be thoroughly Cross one pattern of polarization of identical to arrange and incide image pickup part 35b.In the figure 7, for convenience, illustrate only an image unit 35, but image unit 35 for example can with the set location of reflecting surface 39 accordingly bonding cylinder 32 width (with The parallel direction of rotary shaft RA) upper setting is multiple.Furthermore, it is possible to setting makes image unit 35 in the width of bonding cylinder 32 The travel mechanism of upper movement, and the pattern of polarization row of multiple detection zones are detected by an image unit 35.

Optical thin film F1 on reflecting surface 39 for the light source portion 35a direction, from the second surface side irradiation light of optical thin film F1. Color filter 35d is arranged on the light path of the light from light source portion 35a towards image pickup part 35b.Color filter 35d passes through to absorb or reflects The light of given wavelength components is adjusting the contrast of the reflected light picture of multiple pattern of polarization row APAa, APAb, DPAa, DPAb (ratio of the brightness of reflected light picture).Color filter 35d is for example arranged on the light path of the light from light source portion 35a towards optical thin film F1 On, but may also be arranged on from optical thin film F1 towards the light path of the light of image pickup part 35b, between optical thin film F1 and reflecting surface 39 The light path of light on.

As light source portion 35a, the known light source such as LED can be adopted.Light source portion 35a for example irradiates towards optical thin film F1 White light, but the light that light source portion 35a irradiates is not limited to this.For instance, it is possible to according to the phase contrast including in optical thin film F1 The phase contrast of layer, patterning phase separation layer and polarizer layer, wavelength dispersion characteristics etc., it is suitable to irradiate from light source portion 35a The light of wavelength.

As color filter 35d, the light of wavelength components that can be given using absorption the light through remaining wavelength components Absorptive-type light filter, it would however also be possible to employ be reflected to standing wave long component light and through remaining wavelength components light reflection The light filter of type.As the light filter of absorptive-type light filter as described above and reflection-type, known optical filtering can be adopted Device.

Image pickup part 35b shoots the reflected light of the optical thin film F1 being located at reflecting surface 39 from second surface side of optical thin film F1 Picture.As image pickup part 35b, the known shooting part such as ccd video camera can be adopted.

Pattern detection portion IP3 detects the pattern of polarization row on reflecting surface 39 based on the reflected light picture of optical thin film F1 APAa, APAb, DPAa, DPAb (with reference to Fig. 8), and extract the position of the boundary line of pattern of polarization row APAa, APAb, DPAa, DPAb Confidence ceases.As pattern detection portion IP3, known image processing section can be adopted.The reflected light being photographed by image pickup part 35b The picture signal of picture is transformed to by the view data of numerical data by pattern detection portion IP3, implement color extraction process, two The known image procossing such as value process.As described above, the reflected light picture of two different pattern of polarization row of the direction of slow axis Color, brightness different.Therefore, by the image procossing such as color extraction process, binary conversion treatment are implemented to view data, So as to accurately detect pattern of polarization row.

In the present embodiment, line translation is entered to the wavelength of the light being irradiated to optical thin film F1 by color filter 35d, thus The brightness of reflected light picture of pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Fig. 8) or color can be made to have more very much not With.Thus, the detection of pattern of polarization row APAa, APAb, DPAa, DPAb becomes easy.

Control device 25 obtains pattern of polarization row APAa, APAb, DPAa, DPAb (reference that pattern detection portion IP3 extracts The positional information of boundary line Fig. 8).The boundary line based on pattern of polarization row APAa, APAb, DPAa, DPAb for the control device 25 Positional information come to confirm optical thin film F1 with respect to bonding cylinder 32 allocation position.Control device 25 is based on pattern of polarization and arranges The positional information of the boundary line of APAa, APAb, DPAa, DPAb, makes adhesive platform 41 (with reference to Fig. 8) by driving means (not shown) Respectively on the direction orthogonal with rotary shaft RA of bonding cylinder 32 and the direction parallel with rotary shaft RA of bonding cylinder 32 Mobile, or so that adhesive platform 41 is rotated in the horizontal plane by rotary apparatuss (not shown).Thus, carry out to adjust in bonding Liquid crystal panel P and the calibration of the opposite adhesive position of optical thin film F1 keeping in bonding cylinder 32 that platform 41 keeps.

Control device 25 is configured to including computer system.Computer system include the arithmetic processing section such as CPU, memorizer, The storage parts such as hard disk.The function of pattern detection portion IP3 is realized by arithmetic processing section.Control device 25 includes executing and meter The interface of the communication of external device (ED) of calculation machine system, synthetically controls detection means DA3, driving means 42 and adhesive platform 41 The action of external device (ED)s such as (with reference to Fig. 8).

Hereinafter, the method for adjustment of the opposite adhesive position of liquid crystal panel P and optical thin film F1, using Fig. 8, is described.In Fig. 8 In, the figure of right half is the explanatory diagram of the allocation position of the optical thin film F1 pasting in bonding cylinder 32, the figure of left half be The explanatory diagram of the allocation position of liquid crystal panel P that adhesive platform 41 keeps, the figure of lower part is the explanation of the adjustment amount of adhesive platform 41 Figure.In fig. 8, for convenience, omit the diagram of reflecting surface 39.

As shown in the right half of Fig. 8, shot by image unit 35 and keeping face 32a to paste the optical thin film F1's keeping Corner.In optical thin film F1, the direction parallel with along the rotary shaft bonding cylinder 32 is disposed with multiple Pattern of polarization row APAa, APAb, DPAa, DPAb.Image unit 35 shoots along this rotation along with the rotation of bonding cylinder 32 Turn two corners on the one side of optical thin film F1 in direction.

The reflection in the corner based on the optical thin film F1 being photographed by image unit 35 for the pattern detection portion IP3 shown in Fig. 7 Light image, to detect pattern of polarization row APAa, APAb, DPAa, the DPAb positioned at the corner of optical thin film F1, and to extract pattern of polarization The positional information of the boundary line of row APAa, APAb, DPAa, DPAb.Additionally, IP3 detection in pattern detection portion is located at optical thin film F1 Pattern of polarization row APAa, APAb, DPAa, the DPA in corner among specific 2 pattern of polarization row (for example, closest to effectively 2 pattern of polarization row APAa, APAb of the neighboring area in region) the end of boundary line position, as optical thin film F1's The position EGP in corner.The position EGP in the corner of the optical thin film F1 being detected by pattern detection portion IP3 becomes optical thin film F1 is adhered to the calibration benchmark of optical thin film F1 during liquid crystal panel P.

In the following description, by between 2 corners of the optical thin film F1 being shot by image unit 35 along bonding The distance of the circumference of cylinder 32 is referred to as between video camera apart from Lc.Apart from Lc and the above-mentioned rotation along optical thin film F1 between video camera The length turning the one side in direction is probably equal.

For example, along with bonding cylinder 32 rotation and between optical thin film F1 only mobile camera apart from Lc when, optics The position of the corner EGP of film F 1 moves to terminal Ep2 from starting point Ep1.By image unit 35 and pattern detection portion IP3 detection To starting point Ep1 and the positional information of terminal Ep2 be sent to control device 25.The lower part institute of control device 25 such as Fig. 8 Show, based on video camera between apart from Lc and with starting point Ep1 on the parallel direction of rotary shaft of bonding cylinder 32 and terminal Ep2 it Between apart from Le (hereinafter referred to as start point/end point deviation Le.), calculate correction angle [alpha] (tan α=Le/Lc).

As shown in the left half of Fig. 8, shot in adhesive platform by image unit 36 (reference picture 9A and Fig. 9 B) described later The corner of the liquid crystal panel P of 41 holdings.For example, give labelling Pm (for example, in this embodiment party for each corner of liquid crystal panel P It is 3 labellings Pm1, Pm2, Pm3 in formula).The first labelling Pm1, the second labelling Pm2 and the 3rd being detected by image unit 36 The positional information of labelling Pm3 is sent to control device 25.The detection information based on image unit 36 for the control device 25 is controlling The driving of adhesive platform 41, carries out the calibration of the liquid crystal panel P in adhesive platform 41 holding.Control device 25 be based on correction angle [alpha] Lai The rotary apparatuss omitting diagram are driven controlling, make adhesive platform 41 anglec of rotation α in the horizontal plane.Thus, carry out liquid crystal Panel P is with respect to the calibration of bonding cylinder 32.

Hereinafter, using Fig. 9 A and Fig. 9 B, illustrate to bond the bonding of optical thin film F1 from bonding cylinder 32 to liquid crystal panel P Operation.

As shown in Figure 9 A, control device 25 makes bonding cylinder 32 move to the given position of the top of adhesive platform 41.Control The positional information based on the corner EGP of optical thin film F1 for the device 25 and the first labelling Pm1, the second labelling Pm2 of liquid crystal panel P And the 3rd labelling Pm3 positional information, to carry out bonding the calibration of cylinder 32 and adhesive platform 41, so that optical thin film F1 Right eye pattern of polarization row DPAa and left eye pattern of polarization row DPAb and the right eye pixel being arranged at liquid crystal panel P and Left eye pixel is in that plane earth is overlapping.

Control device 25 is by making bonding cylinder 32 decline in bonding, thus becoming the optics pasted in holding face 32a The leading section of film F 1 is pressurized from above by the state of the end of liquid crystal panel P.

Bonding cylinder 32 declines, so as to optical thin film F1 is pressed against the state of liquid crystal panel P.Now, bond Cylinder 32 is rotated by the optical thin film F1 being kept face 32a holding is pressed into liquid crystal panel P, thus by optical thin film F1 It is adhered to liquid crystal panel P.

As shown in Figure 9 B, control device 25 is in bonding, along with the rotation of bonding cylinder 32, make adhesive platform 41 with viscous Close relative movement on the direction of rotating shaft direct cross of cylinder 32.In the present embodiment, cylinder 32 rotate counterclockwise, bonding are bonded Platform 41 moves towards paper right direction.Additionally, may be configured as, do not make adhesive platform 41 mobile, while so that bonding cylinder 32 is rotated yet Bonding cylinder 32 is made to move towards paper left direction.

For example, the shift action of the rotation driving of bonding cylinder 32 and the liquid crystal panel P based on adhesive platform 41 synchronously enters OK.Thereby, it is possible to suppress to produce friction between optical thin film F1 and liquid crystal panel P.Thereby, it is possible to make while suppressing and deviate Optical thin film F1 is bonded to liquid crystal panel P.

Bonding cylinder 32 for example has the weak stickup of adhesive surface (surface of the adhesion layer OP40 of Fig. 5) than optical thin film F1 Power, can paste, peel off the surface protective film (the first phase difference layer OP31 of Fig. 5) of optical thin film F1, therefore, adhesive surface repeatedly The optical thin film F1 that side is pressed against liquid crystal panel P peels off and is adhered to liquid crystal panel P side from holding face 32a.

Although eliminating diagram, in the face of the contrary side in the face of the bonding optical thin film F1 of liquid crystal panel P, it is bonded with The optical thin films such as polaroid, the thin film of raising brightness.Thus, it is possible to provide the optical display means of energy stereo display.

As above, in detection means DA3 of present embodiment, also same with first embodiment, can high accuracy and Effectively detect pattern of polarization row APAa, APAb, DPAa, DPAb.The bonder 13 of present embodiment is based on by detection means The positional information of the boundary line of pattern of polarization row APAa, APAb, DPAa, DPAb that DA3 extracts to carry out optical thin film F1 with The calibration of liquid crystal panel P, therefore, it is possible to improve the bonding precision of optical thin film F1 and liquid crystal panel P.Thereby, it is possible to provide display Superior in quality optical display means.

[the 4th embodiment]

Figure 10 is the schematic diagram of detection means DA4 involved by the 4th embodiment.

Figure 11 is the top view of the schematic construction representing optical thin film F2.

Figure 12 is the schematic diagram of cutting processing device 50.

Detection means DA4 of present embodiment includes supporting mass 61, image unit 62, pattern detection portion IP4 and adjustment portion 63.Detection means DA4 is entered to pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Figure 11) including in optical thin film F2 Row detection.

As shown in Figure 10～Figure 12, detection means DA3 of present embodiment constitutes optical thin film F2 along line of cut SL1, SL2, SL3 carry out a part for the cutting processing device 50 of cutting processing.Cutting processing device 50 is except detection means ( One detection means) outside DA4, also include thin film offer portion 51, thinfilms portion 52,53, rim charge wound portion 54, first skew control Portion 55 processed, the second skew control unit 56, second detection device 57, cutting portion 58 and control device 70 etc..

In the same manner as optical thin film OP2 shown in Fig. 3 for the optical thin film F2, at least (supported by supporting mass 61 from the first face The face of side) side direction the second face (face of the side contrary with the side being supported by supporting mass 61) side, include phase contrast successively Layer, polarizer layer and patterning phase separation layer.In the present embodiment, for example the optical thin film OP3 shown in Fig. 5 can be used as Optical thin film F2.

As shown in figure 11, optical thin film F2 is alternately to include effect region on the width orthogonal with long side direction The thin film of the strip of AC and neighboring area SR.Effective coverage AC is, for example, the viewing area pair with the liquid crystal panel P shown in Fig. 8 The part put, neighboring area SR is the part opposed with the neighboring area of the periphery of the viewing area positioned at liquid crystal panel P.

It (is, for example, corresponding with two liquid crystal panels in Figure 11 that optical thin film F2 has amount corresponding with multiple liquid crystal panels Amount) width.Optical thin film F2 adopts cutting processing device 50 (with reference to Figure 12) described later along line of cut SL1, SL2, SL3 quilt Cut-out.Line of cut SL1, SL2, SL3 are set in the SR of neighboring area.Thus, optical thin film F2 is divided into and has and one Multiple strip thin film of the width of the corresponding amount of liquid crystal panel.Split the strip thin film obtaining and be cut into liquid crystal panel P Size, liquid crystal panel P is adhered to using the bonder 13 shown in Fig. 9 A and Fig. 9 B.

The structure of the effective coverage AC of optical thin film F2 and neighboring area SR with illustrated in the third embodiment Structure is identical.Thus, here, omitting detail explanation.Line of cut SL1, SL2, SL3 are for example set at and are arranged at Zhou Bianqu The position of the boundary line of pattern of polarization row APAa, APAb of domain SR.

As shown in Figure 10, supporting mass 61 has the columned bearing-surface 61a parallel with the width of optical thin film F2. Supporting mass 61 is, for example, to constitute the conveyance of one of multiple carrying rollers of transport path FCL (with reference to Figure 12) of optical thin film F2 Roller.First face (upper surface of the second phase difference layer 41 of Fig. 5) of supporting mass 61 supporting optical film F 2, and along with optics The conveyance of film F 2 and rotate.Supporting mass 61 for example, implements the metal roller of mirror finish, and bearing-surface 61a is overall Become reflecting surface.

Image unit 62 includes light source portion 62a, image pickup part 62b, polaroid 62c and color filter 62d.Image unit 62 is for example Closely one keeps to make light source portion 62a and image pickup part 62b, so that through pattern of polarization row and by reflecting surface (supporting Face 61a) light that reflects can arrange and incide image pickup part 62b through one pattern of polarization of identical.

Optical thin film F2 on reflecting surface for the light source portion 62a direction, from the second face (first of Fig. 5 of optical thin film F2 The lower surface of phase separation layer OP31) side irradiation light.Polaroid 62c is arranged on from light source portion 62a towards the light of optical thin film F2 In light path.It is transformed to rectilinearly polarized light from the light transmission polaroid 62c of light source portion 62a irradiation.As light source portion 62a, can Using the known light source such as LED.Light source portion 62a for example irradiates white light towards optical thin film F2, but the light that light source portion 62a irradiates Not limited to this.For instance, it is possible to according to the phase separation layer including in optical thin film F2, patterning phase separation layer and polarizer Layer, the phase contrast of polaroid 62c, wavelength dispersion characteristics etc., irradiate the light of suitable wavelength from light source portion 62a.

Color filter 62d is arranged on the light path of the light from light source portion 62a towards image pickup part 62b.Color filter 62d passes through to inhale Receive or wavelength components that reflection is given the reflected light picture to adjust multiple pattern of polarization row APAa, APAb, DPAa, DPAb for the light Contrast (ratio of the brightness of reflected light picture).Color filter 62d is for example arranged on from light source portion 62a towards optical thin film F2's In the light path of light, but may also be arranged on from optical thin film F2 towards the light path of the light of image pickup part 62b, optical thin film F2 and reflection In the light path of light between face (bearing-surface 61a).Color filter 62d can be arranged between polaroid 62c and optical thin film F2 It is also possible in the light path being arranged between light source portion 62a and polaroid 62c in light path.

As color filter 62d, the light of wavelength components that can be given using absorption the light through remaining wavelength components Absorptive-type light filter, it would however also be possible to employ the given light of wavelength components of reflection and pass through remaining wavelength components light anti- The light filter of emitting.As the light filter of absorptive-type light filter as described above and reflection-type, known filter can be adopted Light device.

Image pickup part 62b shoots the reflected light of the optical thin film F2 being located at reflecting surface from second surface side of optical thin film F2 Picture.As image pickup part 62b, the known shooting part such as ccd video camera can be adopted.

Pattern detection portion IP4 detects the pattern of polarization row on reflecting surface based on the reflected light picture of optical thin film F2 APAa, APAb, DPAa, DPAb, and extract the position of the boundary line of pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Figure 11) Confidence ceases.As pattern detection portion IP4, known image processing section can be adopted.The reflected light being photographed by image pickup part 62b The picture signal of picture is transformed to by the view data of numerical data by pattern detection portion IP4, implement color extraction process, two The known image procossing such as value process.As described above, the reflected light of two different pattern of polarization row of the direction of slow axis The color of picture, brightness are different.Therefore, by implementing at the images such as color extraction process, binary conversion treatment to view data Reason is such that it is able to accurately detect pattern of polarization row.

In the present embodiment, line translation is entered to the wavelength of the light being irradiated to optical thin film F2 by color filter 62d, thus The brightness of reflected light picture of pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Figure 11) or color can be made to have more very much not With.Thus, the detection of pattern of polarization row APAa, APAb, DPAa, DPAb becomes easy.

Adjustment portion 63 is to the polarization axle of polaroid 62c and pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Figure 11) The relative angle of slow axis be adjusted.The stagnant of pattern of polarization row APAa, APAb, DPAa, DPAb is adjusted by adjustment portion 63 The polarization axle with respect to polaroid 62c for the phase axle and the angle that constitutes are such that it is able to increase pattern of polarization row APAa, DPAa and polarization The asymmetry (difference of color, brightness etc.) of the reflected light picture of pattern row APAb, DPAb.Thus, pattern detection portion IP4 can Pattern of polarization row APAa, APAb, DPAa, DPAb that accurately detection is located on reflecting surface.

Control device 70 obtains the side of pattern of polarization row APAa, APAb, DPAa, DPAb that pattern detection portion IP4 extracts The positional information in boundary line.The positional information of the boundary line based on pattern of polarization row APAa, APAb, DPAa, DPAb for the control device 70, To confirm the allocation position that optical thin film F2 is with respect to supporting mass 61.Control device 70 be based on pattern of polarization row APAa, APAb, The positional information of the boundary line of DPAa, DPAb, the traveling-position of optical thin film F2 to detect reality is with respect to set in advance Traveling-position and deviateed which kind of degree.

Control device 70 pass through Figure 12 shown in the first skew control unit 55 make thin film offer portion 51 with optical thin film F2 The orthogonal width of conveyance direction on move, so that reducing the deviation of the traveling-position of optical thin film F2.

Control device 70 is configured to including computer system.Computer system include the arithmetic processing section such as CPU, memorizer, The storage parts such as hard disk.The function of pattern detection portion IP4 is realized by arithmetic processing section.Control device 70 includes executing and meter The interface of the communication of external device (ED) of calculation machine system, synthetically controls the first detection means DA4, thin film offer portion 51, thin film to twine Around portion 52,53, rim charge wound portion 54, the first skew control unit 55, the second skew control unit 56, second detection device 57 and cut The action of disconnected portion 58 grade external device (ED).

Hereinafter, the structure of cutting processing device 50 to be described using Figure 12.

Thin film offer portion 51 keeps being wound with the coiled strip roller R1 of optical thin film F2, and by optical thin film F2 along its long side Direction releases successively.In transport path FCL from the optical thin film F2 that thin film offer portion 51 releases successively, from conveyance direction Trip side is configured with the first skew control unit 55, the first detection means DA4, the second skew control unit 56, second detection device successively 57 and cutting portion 58.

To be detected using the first detection means DA4 the optical thin film F2 that releases successively from thin film offer portion 51 just successively Traveling-position after releasing.First detection means DA4 detection be arranged at optical thin film F2 multiple pattern of polarization row APAa, APAb, DPAa, DPAb (with reference to Figure 11).Control device 70 is based on the multiple pattern of polarization being detected by the first detection means DA4 Position (for example, the position of the boundary line of pattern of polarization row APAa, APAb, DPAa, DPAb of row APAa, APAb, DPAa, DPAb Put), to detect the deviation of the traveling-position of optics film F 2, to control the first skew control unit 55 to control the width of optical thin film F2 The skew in degree direction.

To be detected using second detection device 57 and to be controlled optical thin film F2's after skew by the first skew control unit 55 Traveling-position.Second detection device 57 detection be arranged at multiple pattern of polarization row APAa of optical thin film F2, APAb, DPAa, DPAb (with reference to Figure 11).Control device 70 based on the multiple pattern of polarization row APAa being detected by second detection device 57, APAb, The position (for example, the position of the boundary line of pattern of polarization row APAa, APAb, DPAa, DPAb) of DPAa, DPAb, to detect optics The deviation of the traveling-position of film F 2, controls the second skew control unit 56 to control the skew of the width of optical thin film F2.

First skew control unit 55 is optically thin for example based on detected by the first detection means DA4 and control device 70 The deviation of the traveling-position of film F2, makes to be released the position (position of coiled strip roller R1) of optical thin film F2 successively by thin film offer portion 51 The width of optical thin film F2 moves.The traveling of optical thin film F2 is roughly controlled by the first skew control unit 55 The deviation of position.

Second detection device 57 has and the first detection means DA4 identical structure.Second detection device 57 passes through shooting Unit 67 shoots the reflected light picture of the optical thin film F2 by the reflective surface of supporting mass 66, based on its image pickup result come detecting position Pattern of polarization row APAa, APAb, DPAa, DPAb on reflecting surface (with reference to Figure 11), and extract pattern of polarization row APAa, The positional information of the boundary line of APAb, DPAa, DPAb.

Control device 70 obtains pattern of polarization row APAa, APAb, DPAa, DPAb (ginseng that second detection device 57 extracts According to Figure 11) boundary line positional information.The boundary line based on pattern of polarization row APAa, APAb, DPAa, DPAb for the control device 70 Positional information confirming the allocation position that optical thin film F2 is with respect to supporting mass 66.Control device 70 is based on pattern of polarization and arranges The positional information of the boundary line of APAa, APAb, DPAa, DPAb, to detect reality optical thin film F2 traveling-position with respect to Traveling-position set in advance and deviateed which kind of degree.Control device 70 controls the second skew control unit 56 to adjust optical thin film The traveling-position of F2, so that the traveling-position of optical thin film F2 is consistent with traveling-position set in advance.

Second skew control unit 56 is optically thin for example based on detected by second detection device 57 and control device 70 The deviation of the traveling-position of film F2, makes the first guide reel 64 of supporting optical film F 2 and the second guide reel 65 with respect to optics The conveyance direction of film F 2 and tilt.It is parallel to each other that first guide reel 64 and the second guide reel 65 are configured to rotary shaft.Second is inclined Move the traveling side with respect to optical thin film F2 for the direction that control unit 56 makes the rotary shaft of the first guide reel 64 and the second guide reel 65 To and integrally tilt.Thus, the traveling-position of optical thin film F2 is trimmed off whole in the direction of the width, and optical thin film F2 sets in advance Fixed traveling-position travels.

Additionally, the second skew control unit 56 alternatively makes a guide reel of supporting optical film F 2 with respect to optical thin film The conveyance direction of F2 and the structure that tilts.

The traveling-position being transported to the optical thin film F2 of cutting portion 58 passes through the first skew control unit 55 and the second skew Control unit 56 is controlled very closely.The structure of the first skew control unit 55 and the second skew control unit 56 is not limited to above-mentioned Structure.As the first skew control unit 55, it is preferably able to adjust optical thin film F2 to a greater degree than the second skew control unit 56 Traveling-position.As the second skew control unit 56, it is preferably able to more optically thin than the first skew control unit 105 more closely adjusts The traveling-position of film F1.

Additionally, the first skew control unit 55, the first detection means DA4, the second skew control unit 56 and the second detection dress The configuration putting 57 is not limited to above-mentioned situation.First detection means DA4 can in the upstream side of the first skew control unit 55, Can be in downstream.Second detection device 57 can be in the upstream side of the second skew control unit 56 it is also possible in downstream.Second As long as the position of the skew than the width being controlled optical thin film F2 by the first skew control unit 55 for the detection means 57 is more leaned on Downstream and than by cutting portion 58 cut off optical thin film F2 position upstream side, to detect the multiple of optics film F 2 Pattern of polarization row APAa, APAb, DPAa, DPAb.As long as the second skew control unit 56 ratio is by the first skew control unit 55 Control optical thin film F2 the skew of width position farther downstream side and than by cutting portion 58 cut off optical thin film F2 Position upstream side, to control the skew of the width of optical thin film F2.

Cutting portion 58 cuts off optical thin film F2 along line of cut SL1, SL2, the SL3 shown in Figure 11.Cutting portion 58 is for example Can be made up of amputation knife, laser clipper etc..Between cutting portion 58 is with the configuration space identical of line of cut SL1, SL2, SL3 Every configuring multiple on the width of optical thin film F2.It is inclined that control device 70 passes through the first skew control unit 55 and second Move control unit 56 controlling the traveling-position of optical thin film F2 so that cutting portion 58 underface configuration cuts line SL1, SL2、SL3.Cutting portion 58 is controlling optical thin film F2's than by the first skew control unit 55 and the second skew control unit 56 The position of the skew of width side farther downstream, by optical thin film F2 along the line of cut SL1 parallel with its conveyance direction, SL2, SL3 are cutting off.

By the part of the inclusion effective coverage AC among cutting portion 58 in the direction of the width divided optical thin film F2, lead to Cross thinfilms portion 52,53 to be wound around, and the volume of the strip thin film as the width with amount corresponding with liquid crystal panel Expect roller R2, R3 to provide.By the part not including effective coverage AC among the divided optical thin film F2 of cutting portion 58, pass through Rim charge wound portion 54 is wound around, and goes out of use.

As above, in the first detection means DA4 of present embodiment and second detection device 57, electricity is real with second Apply mode similarly, pattern of polarization row APAa, APAb, DPAa, DPAb can be detected in high precision and effectively.The cutting of present embodiment Cut processing unit (plant) 50 based on the pattern of polarization row APAa being detected by the first detection means DA4 and second detection device 57, The positional information of the boundary line of APAb, DPAa, DPAb, to control the traveling-position of optical thin film F2.Therefore, it is possible to accurately Carry out the control of traveling-position.Further, since adopting the first skew control unit 55 and the second skew control unit 56 with two benches ground Carry out the control of traveling-position, therefore, it is possible to almost eliminate the deviation of the traveling-position of optical thin film F2.Thus, reduce due to row Sail the deviation of position and mistakenly cut off the probability of effective coverage AC, yield rate is improved.Further, since can constriction examine Consider the width of the remainder (neighboring area) of the deviation of traveling-position, the therefore waste of optical thin film F2 reduces, and is manufactured into This reduction.

More than, referring to the drawings preferred embodiment example involved in the present invention is illustrated, but the present invention is not It is limited to involved example.A simply example such as variously-shaped, combination of each component parts shown in above-mentioned example, In the scope without departing from the purport of the present invention, design requirement etc. can be based on and carry out various changes.

For example, in the above-described embodiment, as the processing meanss possessing detection means involved in the present invention Example, enumerates bonder, cutting processing device, but processing meanss is not limited to this.Detection means involved in the present invention and Detection method can be applicable to various processing meanss and the processing method being processed based on the position of pattern of polarization row.

Additionally, in the above-described embodiment, illustrate that two kinds of pattern of polarization row wrap as in patterning phase separation layer The pattern of polarization row including.But, the pattern of polarization row including in patterning phase separation layer are not limited to two kinds, also can be set to three kinds More than.In this case, the brightness of reflected light picture of multiple pattern of polarization row, color etc. are also different.Thus, pattern detection Multiple pattern of polarization row can detect based on the brightness of reflected light picture that multiple pattern of polarization arrange or the difference of color in portion.

In this case, color filter for example can adjust the contrast of the reflected light picture of multiple pattern of polarization row, so that The contrast of the reflected light picture of multiple pattern of polarization row becomes big relatively compared to the situation not adopting above-mentioned color filter.

It is above-mentioned that " contrast of the reflected light picture of multiple pattern of polarization row is compared to the situation not adopting color filter relatively Become big " it is meant that extracting all adjacent each other among multiple pattern of polarization row of the detection object becoming pattern detection portion The combination of two pattern of polarization row, calculates the brightness of the reflected light picture of two pattern of polarization row for all of combination extracting Ratio when, for all of combination calculate above-mentioned than in minimum ratio value compared to the situation not adopting above-mentioned color filter Relatively become big.

Industrial applicability

According to detection means involved in the present invention, detection method, processing meanss and processing method, using the teaching of the invention it is possible to provide can be high The detection means of precision ground detection pattern of polarization row, detection method, processing meanss and processing method.

Symbol description

13... bonder (processing meanss), 32... bonding cylinder (supporting mass), 32a... keep face (bearing-surface), 35a... light source portion, 35b... image pickup part, 35d... color filter, 39... reflecting surface, 50... cutting processing device (process dress Put), 57... second detection device, 61... supporting mass, 61a... bearing-surface, 62a... light source portion, 62b... image pickup part, 62c... polaroid, 62d... color filter, 63... adjustment portion, APAa, APAb, DPAa, DPAb... pattern of polarization row, B1, B2... supporting mass, B1a, B2a... bearing-surface, CF1, CF2... color filter, CM1, CM2... image pickup part, DA1, DA2, DA3, DA4... detection means, F1, F2... optical thin film, IL1, IL2... light source portion, IP1, IP2, IP3, IP4... pattern detection Portion, OP1, OP2, OP3, OP45... optical thin film, OP1a, OP2a... first face, OP1b, OP2b... second face, OP11, OP21, OP31, OP41... phase separation layer, OP12, OP23, OP35... patterning phase separation layer, OP12a, OP12b, OP23a, OP23b... pattern of polarization row, OP13, OP22, OP37... polarizer layer, the polarization axle of PLAX2... polaroid, PLF... Polaroid, PLR... adjustment portion, RS1, RS2... reflecting surface, the slow axis of RTAX... pattern of polarization row.

Claims

1. a kind of detection means, multiple pattern of polarization row of detection optical thin film, this optical thin film is from the first surface side direction second Surface side is disposed with phase separation layer, patterning phase separation layer and polarizer layer, and this patterning phase separation layer includes stagnant phase The mutually different above-mentioned multiple pattern of polarization row in direction of axle, wherein, above-mentioned detection device includes：

Supporting mass, has the bearing-surface that above-mentioned first face to above-mentioned optical thin film is supported, in above-mentioned bearing-surface extremely A few part has the light having passed through above-mentioned optical thin film to above-mentioned first surface side from above-mentioned second surface side is reflected anti- Penetrate face；

Light source portion, irradiates towards the above-mentioned optical thin film positioned at above-mentioned reflecting surface from above-mentioned second surface side of above-mentioned optical thin film Light；

Image pickup part, shoots the anti-of the above-mentioned optical thin film being located at above-mentioned reflecting surface from above-mentioned second surface side of above-mentioned optical thin film Penetrate light image；

Color filter, is arranged on from above-mentioned light source portion towards the light path of the above-mentioned light of above-mentioned image pickup part, by absorbing or reflecting The light of given wavelength components is adjusting the contrast of the reflected light picture of above-mentioned multiple pattern of polarization row；And

Pattern detection portion, based on the above-mentioned reflected light picture of above-mentioned optical thin film, to detect above-mentioned many on above-mentioned reflecting surface Individual pattern of polarization row.

2. detection means according to claim 1, wherein,

The brightness of reflected light picture or the difference of color that above-mentioned pattern detection portion is arranged based on above-mentioned multiple pattern of polarization, to detect Above-mentioned multiple pattern of polarization row.

3. a kind of detection means, multiple pattern of polarization row of detection optical thin film, this optical thin film is from the first surface side direction second Surface side is disposed with phase separation layer, polarizer layer and patterning phase separation layer, and this patterning phase separation layer includes stagnant phase The mutually different above-mentioned multiple pattern of polarization row in direction of axle, wherein, above-mentioned detection device includes：

Polaroid, is arranged on from above-mentioned light source portion towards the light path of the above-mentioned light of above-mentioned optical thin film；

4. detection means according to claim 3, wherein,

5. the detection means according to claim 3 or 4, wherein,

Above-mentioned detection device includes：Adjustment portion, the phase of the slow axis that the polarization axle of above-mentioned polaroid is arranged with above-mentioned pattern of polarization Angle is adjusted.

6. a kind of detection method, is the detection method of the multiple pattern of polarization row of detection optical thin film, and this optical thin film is from first Surface side is disposed with phase separation layer, patterning phase separation layer and polarizer layer, this patterning phase place towards the second surface side Difference layer includes the mutually different above-mentioned multiple pattern of polarization row in direction of slow axis, and wherein, above-mentioned detection method includes：

Holding step, is supported to above-mentioned first face of above-mentioned optical thin film by supporting mass, this supporting mass has to above-mentioned The bearing-surface that above-mentioned first face of optical thin film is supported, and at least a portion in above-mentioned bearing-surface has to from above-mentioned Second surface side has passed through, to above-mentioned first surface side, the reflecting surface that the light of above-mentioned optical thin film is reflected；

Irradiating step, shines towards the above-mentioned optical thin film positioned at above-mentioned reflecting surface from above-mentioned second surface side of above-mentioned optical thin film Penetrate light；

Image pickup step, shoots, from above-mentioned second surface side of above-mentioned optical thin film, the above-mentioned optical thin film being located at above-mentioned reflecting surface Reflected light picture；

Setting contrast step, is become by the wavelength being absorbed by the color filter in the light path being arranged on above-mentioned light or reflection is given The light dividing, to adjust the contrast of the reflected light picture of above-mentioned multiple pattern of polarization row；And

Pattern detection step, based on the above-mentioned reflected light picture of above-mentioned optical thin film, to detect above-mentioned on above-mentioned reflecting surface Multiple pattern of polarization row.

7. detection method according to claim 6, wherein,

In above-mentioned pattern detection step, the brightness of reflected light picture being arranged based on above-mentioned multiple pattern of polarization or the difference of color Different, to detect above-mentioned multiple pattern of polarization row.

8. a kind of detection method, is the detection method of the multiple pattern of polarization row of detection optical thin film, and this optical thin film is from first Surface side is disposed with phase separation layer, polarizer layer and patterning phase separation layer, this patterning phase place towards the second surface side Difference layer includes the mutually different above-mentioned multiple pattern of polarization row in direction of slow axis, and wherein, above-mentioned detection method includes：

Irradiating step, above-mentioned positioned at above-mentioned reflecting surface from the above-mentioned second surface side direction of above-mentioned optical thin film via polaroid Optical thin film irradiation light；

9. detection method according to claim 8, wherein,

10. detection method according to claim 8 or claim 9, wherein,

Above-mentioned detection method includes：Set-up procedure, polarization axle and the slow axis of above-mentioned pattern of polarization row to above-mentioned polaroid Relative angle is adjusted.

A kind of 11. processing meanss, wherein, detect the multiple inclined of optical thin film using the detection means described in claim 1 or 2 The pattern that shakes arrange, and based on above-mentioned pattern of polarization row position given process is carried out to above-mentioned optical thin film, this optical thin film from First surface side is disposed with phase separation layer, patterning phase separation layer and polarizer layer, this patterning towards the second surface side Phase separation layer includes the mutually different above-mentioned multiple pattern of polarization row in direction of slow axis.

A kind of 12. processing meanss, wherein, detect optical thin film using the detection means any one of claim 3～5 Multiple pattern of polarization row, and given process is carried out to above-mentioned optical thin film based on the position of above-mentioned pattern of polarization row, this light Learn thin film and be disposed with phase separation layer, polarizer layer and patterning phase separation layer from the first surface side towards the second surface side, The mutually different above-mentioned multiple pattern of polarization row in direction that this patterning phase separation layer includes slow axis.

A kind of 13. processing methods, wherein, detect the multiple inclined of optical thin film using the detection method described in claim 6 or 7 The pattern that shakes arrange, and based on above-mentioned pattern of polarization row position given process is carried out to above-mentioned optical thin film, this optical thin film from First surface side is disposed with phase separation layer, patterning phase separation layer and polarizer layer, this patterning towards the second surface side Phase separation layer includes the mutually different above-mentioned multiple pattern of polarization row in direction of slow axis.

A kind of 14. processing methods, wherein, are detected optically thin using the detection method any one of claim 8～10 Multiple pattern of polarization row of film, and given process is carried out to above-mentioned optical thin film based on the position of above-mentioned pattern of polarization row, should Optical thin film is disposed with phase separation layer, polarizer layer and patterning phase contrast from the first surface side towards the second surface side Layer, the mutually different above-mentioned multiple pattern of polarization row in the direction that this patterning phase separation layer includes slow axis.